TWI684296B - Stable organic photosensitive devices with exciton-blocking charge carrier filters utilizing high glass transition temperature materials - Google Patents
Stable organic photosensitive devices with exciton-blocking charge carrier filters utilizing high glass transition temperature materials Download PDFInfo
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- TWI684296B TWI684296B TW104123507A TW104123507A TWI684296B TW I684296 B TWI684296 B TW I684296B TW 104123507 A TW104123507 A TW 104123507A TW 104123507 A TW104123507 A TW 104123507A TW I684296 B TWI684296 B TW I684296B
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Abstract
Description
本申請案主張2014年7月18日申請之美國臨時申請案第62/026,301號之權益,該案係以其全文引用方式併入本文中。 This application claims the rights and interests of US Provisional Application No. 62/026,301 filed on July 18, 2014, which is incorporated by reference in its entirety.
本發明是在美國能源部(U.S.Department of Energy)頒發之合同編號DE-SC0000957、DE-SC0001013及DE-EE0005310、及空軍科學研究所(Air Force Office of Scientific Research)頒發之FA9550-10-1-0339下由美國政府支持進行。政府對本發明具有特定權利。 The present invention is contract numbers DE-SC0000957, DE-SC0001013 and DE-EE0005310 issued by the US Department of Energy (USDepartment of Energy), and FA9550-10-1- issued by the Air Force Office of Scientific Research It is supported by the US government under 0339. The government has certain rights in the invention.
本發明之主題係以代表且/或聯合以下各方中之一方或多方達成聯合大學-公司研究協議來進行:密西根州立大學董事會(The Regents of the University of Michigan)、南加州大學(University of Southern California)及NanoFlex Power公司。該協議係在本發明主題制定日期當天及提前生效,並制定作為在協議範疇內所進行各項活動之成果。 The subject of the present invention is carried out by representing and/or cooperating with one or more of the following parties to reach a joint university-company research agreement: The Regents of the University of Michigan, the University of Southern California (University of Southern California) and NanoFlex Power. The agreement takes effect on the day of the formulation of the subject of the invention and in advance, and is formulated as the result of various activities carried out within the scope of the agreement.
本發明大體而言係關於電活性、光學活性、太陽能及半導體裝置,及特定言之關於包括至少一個包含在裝置之操作溫度下形態上穩定之寬能隙材料的激子障蔽性電荷載體濾波器之有機光敏性光電子裝 置。本文亦揭示製造該有機光敏性光電子裝置之方法。 The present invention relates generally to electroactive, optically active, solar and semiconductor devices, and in particular to an exciton-barrier charge carrier filter including at least one wide-gap material that is morphologically stable at the operating temperature of the device Organic photosensitive optoelectronic equipment Set. This article also discloses a method of manufacturing the organic photosensitive optoelectronic device.
光電子裝置依賴材料之光學及電子性質來以電子方式產生或偵測電磁輻射或由環境電磁輻射產生電。 Optoelectronic devices rely on the optical and electronic properties of materials to electronically generate or detect electromagnetic radiation or generate electricity from environmental electromagnetic radiation.
光敏性光電子裝置將電磁輻射轉化成電。太陽能電池(亦稱作光伏打(PV)裝置)為專門用於產生電力之光敏性光電子裝置的一種類型。可自除日光外的光源產生電能之PV裝置可用於驅動功率消耗性負載來提供(例如)照明、加熱,或為電子電路或裝置(諸如計算機、收音機、電腦或遠端監測或通訊設備)供電。此等發電應用通常亦會涉及對電池或其他能量儲存裝置充電,以致於當在無法取得來自太陽或其他光源之直接照明時可繼續作業,或平衡PV裝置之功率輸出與具體應用之要求。如本文所用,術語「電阻性負載」係指任何功率消耗性或儲存電路、裝置、設備或系統。 Photosensitive optoelectronic devices convert electromagnetic radiation into electricity. Solar cells (also called photovoltaic (PV) devices) are a type of photosensitive optoelectronic devices that are specifically used to generate electricity. PV devices that can generate electricity from light sources other than sunlight can be used to drive power-consuming loads to provide, for example, lighting, heating, or power electronic circuits or devices (such as computers, radios, computers, or remote monitoring or communication equipment) . These power generation applications usually also involve charging batteries or other energy storage devices, so that when direct lighting from the sun or other light sources is not available, they can continue to operate, or balance the power output of the PV device with the requirements of the specific application. As used herein, the term "resistive load" refers to any power-consuming or storage circuit, device, equipment, or system.
另一類型的光敏性光電子裝置為光導體電池。在此功能中,訊號偵測電路係監測裝置之電阻來偵測因吸收光所致之改變。 Another type of photosensitive optoelectronic device is a photoconductor battery. In this function, the signal detection circuit monitors the resistance of the device to detect changes caused by absorbed light.
另一類型的光敏性光電子裝置為光偵測器。在操作中,光偵測器係與測量當在光偵測器暴露於電磁輻射時所產生的電流及可能會具有外加偏壓電壓之電流偵測電路結合使用。本文所述之偵測電路能夠對光偵測器提供偏壓電壓及測量光偵測器對電磁輻射之電子反應。 Another type of photosensitive optoelectronic device is a photodetector. In operation, the photodetector is used in conjunction with a current detection circuit that measures the current generated when the photodetector is exposed to electromagnetic radiation and may have an applied bias voltage. The detection circuit described herein can provide a bias voltage to the photodetector and measure the electronic response of the photodetector to electromagnetic radiation.
可根據是否存在如下定義之整流接面及亦根據裝置是否利用外加電壓(亦稱作偏壓或偏壓電壓)操作來表徵此三類光敏性光電子裝置。光導體電池不具有整流接面且通常利用偏壓操作。PV裝置具有至少一個整流接面且係在無偏壓下操作。光偵測器具有至少一個整流接面且通常(但非始終)利用偏壓操作。通常,光伏打電池為電路、裝置或設備供電,但不提供訊號或電流來控制偵測電路、或自該偵測電路輸出資訊。相反地,光偵測器或光導體提供控制偵測電路之訊號或電流、或該偵測電路之資訊輸出,但不對電路、裝置或設備供電。 These three types of photosensitive optoelectronic devices can be characterized according to whether there is a rectifying junction as defined below and also according to whether the device is operated with an applied voltage (also referred to as bias or bias voltage). Photoconductor cells do not have rectifying junctions and usually operate with bias. The PV device has at least one rectifying junction and operates without bias. The photodetector has at least one rectifying junction and usually (but not always) operates with bias. Generally, photovoltaic cells supply power to circuits, devices or equipment, but do not provide signals or current to control the detection circuit or output information from the detection circuit. Conversely, the photodetector or photoconductor provides the signal or current that controls the detection circuit, or the information output of the detection circuit, but does not power the circuit, device, or equipment.
傳統上,光敏性光電子裝置係由許多無機半導體(例如,晶型、多晶型及非晶型矽、砷化鎵、碲化鎘等等)建構。本文中術語「半導體」表示可在藉由熱或電磁激發誘導電荷載體時導電之材料。術語「光導」一般係關於吸收電磁輻射能且藉此轉換為電荷載體之激發能以致該等載體可在材料中傳導(亦即,傳輸)電荷之過程。本文中使用術語「光導體」及「光導材料」以指基於其吸收電磁輻射產生電荷載體之特性所選擇的半導體材料。 Traditionally, photosensitive optoelectronic devices have been constructed from many inorganic semiconductors (eg, crystalline, polycrystalline, and amorphous silicon, gallium arsenide, cadmium telluride, etc.). The term "semiconductor" as used herein means a material that can conduct electricity when a charge carrier is induced by thermal or electromagnetic excitation. The term "light guide" generally refers to the process of absorbing electromagnetic radiation energy and thereby converting it into the excitation energy of charge carriers so that these carriers can conduct (ie, transport) charges in the material. The terms "photoconductor" and "photoconductive material" are used herein to refer to semiconductor materials selected based on their characteristics of absorbing electromagnetic radiation to generate charge carriers.
PV裝置可由其可將入射太陽能轉換為有用電能之效率來表徵。利用晶型或非晶型矽之裝置在商業應用中佔優勢,及一些已達到23%或更大的效率。然而,有效結晶基裝置(特別是具有大表面積者)之製造因在製造無顯著效率劣化缺陷之大型結晶體中所存在的問題而變得困難且昂貴。另一方面,高效率非晶型矽裝置仍舊存在穩定性問題。最近的努力聚焦在使用有機光伏打電池來以經濟生產成本實現可接受的光伏打轉換效率上。 PV devices can be characterized by their efficiency in converting incident solar energy into useful electrical energy. Devices using crystalline or amorphous silicon dominate commercial applications, and some have reached efficiencies of 23% or greater. However, the manufacture of effective crystal-based devices (especially those with large surface areas) becomes difficult and expensive due to the problems that exist in manufacturing large crystals without significant efficiency degradation defects. On the other hand, high-efficiency amorphous silicon devices still have stability problems. Recent efforts have focused on the use of organic photovoltaic cells to achieve acceptable photovoltaic conversion efficiency at economical production costs.
PV裝置可經最佳化成在標準照明條件(亦即,標準測試條件,1000W/m2、AM1.5光譜照明)下電功率產生量最大,此時光電流乘以光電壓之乘積最大。此種電池於標準照明條件下之功率轉換效率係取決於以下三個參數:(1)於零偏壓下之電流,即,短路電流ISC,單位為安培,(2)於開路條件下之光電壓,即,開路電壓VOC,單位為伏特,及(3)填充因子FF。 The PV device can be optimized to produce the largest amount of electric power under standard lighting conditions (ie, standard test conditions, 1000 W/m 2 , AM1.5 spectral lighting), where the product of photocurrent times photovoltage is the largest. The power conversion efficiency of such a battery under standard lighting conditions depends on the following three parameters: (1) the current at zero bias, ie, the short-circuit current I SC in amperes, (2) the open circuit condition The photovoltage, that is, the open circuit voltage V OC in volts, and (3) the fill factor FF.
PV裝置當其連接到負載兩端及經光照射時產生光生電流。當在無窮大負載下進行照射時,PV裝置產生其最大可能電壓V開路(或VOC)。當在其電接觸件短接下進行照射時,PV裝置產生其最大可能電流I短路(或ISC)。當PV裝置實際上用於產生功率時,將其連接至有限電阻性負載且由電流與電壓的乘積I×V給定功率輸出。由PV裝置所產生的最大總功率本質上不會超過乘積ISC×VOC。當負載值經最佳化以 獲得最大功率提取時,電流與電壓分別具有值I最大及V最大。 The PV device generates a photo-generated current when it is connected to both ends of the load and illuminated by light. When irradiating under an infinite load, the PV device generates its maximum possible voltage V open circuit (or V OC ). When irradiated with its electrical contacts shorted, the PV device generates its maximum possible current I short circuit (or I SC ). When the PV device is actually used to generate power, it is connected to a finite resistive load and the power output is given by the product of current and voltage I×V. The maximum total power generated by the PV device does not substantially exceed the product I SC × V OC . When the load value is optimized to obtain maximum power extraction, the current and voltage have the values I max and V maximum.
PV裝置之一品質因數為填充因子FF,定義為:FF={I最大V最大}/{ISC VOC} (1) One factor is the quality of the PV device fill factor FF, defined as: FF = {I maximum V max.} / {I SC V OC} (1)
其中FF始終小於1,此乃因在實際使用中從不同時達成ISC及VOC。然而,隨著FF接近1,裝置具有較小的串聯或內部電阻,且因而在最佳條件下提供負載較大的ISC與VOC乘積百分比。當Pinc為裝置上之入射功率時,可由下式計算得裝置之功率效率ηP:ηP=FF*(ISC * VOC)/Pinc Among them, FF is always less than 1, because in actual use, I SC and V OC are never achieved at the same time. However, as FF approaches 1, the device has a smaller series or internal resistance, and thus provides a larger percentage of the product of I SC and V OC under optimal conditions. When P inc is the incident power on the device, the power efficiency η P of the device can be calculated by the following formula: η P =FF*(I SC * V OC )/P inc
為了產生佔據該半導體實質體積之內部產生電場,常見方法係並排兩層具有適宜選定導電性質(尤其就其分子量子能量狀態之分佈而言)之材料。此兩材料之界面稱作光伏打接面。在傳統半導體理論中,用於形成PV接面之材料一般表示為n或p型。本文中,n型表示多數載體類型為電子。其可被視為具有許多呈相對自由能態之電子的材料。p型表示多數載體類型為電洞。此材料具有許多呈相對自由能態之電洞。背景(即非光生)多數載體濃度之類型主要取決於缺陷或雜質之非故意摻雜。雜質之類型及濃度決定於最小導帶能與最大價帶能間之能隙(亦稱作HOMO-LUMO能隙)範圍內之費米能量(Fermi energy)的值或水平。費米能量係表徵由佔據概率等於1/2之能量值表示的分子量子能態之統計佔據。費米能量接近最小導帶(LUMO)能表示電子為主要的載體。費米能量接近最大價帶(HOMO)能表示電洞為主要的載體。因此,費米能量為傳統半導體之一主要特徵性質及原型PV接面傳統上為p-n界面。 In order to generate an internal electric field that occupies the substantial volume of the semiconductor, a common method is to arrange two layers of material with suitable conductive properties (especially in terms of the distribution of their molecular energy states). The interface between these two materials is called the photovoltaic bonding interface. In traditional semiconductor theory, the material used to form the PV junction is generally expressed as n or p type. In this article, n-type indicates that most carrier types are electrons. It can be regarded as a material with many electrons in a relatively free energy state. The p-type indicates that most carrier types are holes. This material has many holes in a relatively free energy state. The type of background (ie, non-photogenerated) concentration of most carriers mainly depends on the unintentional doping of defects or impurities. The type and concentration of impurities are determined by the value or level of Fermi energy within the energy gap (also called HOMO-LUMO energy gap) between the minimum conduction band energy and the maximum valence band energy. Fermi energy characterizes the statistical occupancy of molecular energy states represented by an energy value with an occupancy probability equal to 1/2. Fermi energy close to the minimum conduction band (LUMO) can indicate that electrons are the main carrier. Fermi energy close to the maximum valence band (HOMO) can indicate that the hole is the main carrier. Therefore, Fermi energy is one of the main characteristic properties of traditional semiconductors and the prototype PV junction is traditionally a p-n interface.
術語「整流」尤其表示界面具有不對稱導電特性,亦即,該界面較佳沿一個方向支援電子電荷傳輸。整流通常與在適宜選定材料之間之接面處發生的內建電場相關聯。 The term "rectification" especially means that the interface has asymmetric conductive properties, that is, the interface preferably supports electron charge transport in one direction. Rectification is usually associated with a built-in electric field that occurs at the junction between suitably selected materials.
有機半導體中之一顯著特性為載體遷移率。遷移率為電荷載體 可回應於電場移動通過導電材料之容易度的量度。在有機光敏性裝置情況中,可將包含因高電子遷移率而優先由電子傳導之材料的層稱作電子傳輸層(或ETL)。可將包含因高電洞遷移率而優先由電洞傳導之材料的層稱作電洞傳輸層(或HTL)。在一些情況中,受體材料可為ETL而供體材料可為HTL。 One notable characteristic of organic semiconductors is carrier mobility. Charge carrier It can respond to a measure of the ease with which the electric field moves through the conductive material. In the case of organic photosensitive devices, a layer containing a material that is preferentially conducted by electrons due to high electron mobility may be referred to as an electron transport layer (or ETL). A layer containing a material that is preferentially conducted by holes due to high hole mobility may be referred to as a hole transport layer (or HTL). In some cases, the acceptor material may be ETL and the donor material may be HTL.
習知的無機半導體PV電池可利用p-n接面來建立內部電場。然而,現當知曉除了建立p-n型接面之外,異質接面之能階偏移亦扮演重要角色。 Conventional inorganic semiconductor PV cells can use a p-n junction to establish an internal electric field. However, it is now known that in addition to establishing p-n junctions, energy level shifts of heterojunctions also play an important role.
咸信於有機供體-受體(D-A)異質接面處之能階偏移因有機材料中光發電過程之基本特性而對有機PV裝置之操作具重要性。在有機材料光激發時,即產生局部弗倫克爾(Frenkel)或電荷轉移激子。為進行電偵測或電流產生,必須使束縛激子解離為其組成電子及電洞。此過程可藉由內建電場引發,但通常存在於有機裝置中之該電場(F~106V/cm)下效率極低。有機材料中最具效率的激子解離發生在D-A界面處。在此界面處,具有低電離電位之供體材料與具有高電子親和性之受體材料形成異質接面。取決於供體及受體材料之能階之匹配,該界面處激子之解離在能量上會變得有利,從而導致受體材料中之游離電子極化子及供體材料中之游離電洞極化子。 Xianxin's energy level shift at the organic donor-acceptor (DA) heterojunction is important for the operation of organic PV devices due to the basic characteristics of the photovoltaic power generation process in organic materials. When organic materials are photoexcited, local Frenkel or charge transfer excitons are generated. For electrical detection or current generation, the bound excitons must be dissociated into their constituent electrons and holes. This process can be initiated by a built-in electric field, but the efficiency of this electric field (F~10 6 V/cm) usually present in organic devices is extremely low. The most efficient exciton dissociation in organic materials occurs at the DA interface. At this interface, the donor material with low ionization potential forms a heterojunction with the acceptor material with high electron affinity. Depending on the matching of the energy levels of the donor and acceptor materials, the dissociation of excitons at the interface will become energetically favorable, resulting in free electron polarons in the acceptor material and free holes in the donor material Polaron.
載體之產生需要激子之產生、擴散及電離或聚集。存在與各該等過程相關聯之效率η。可如下使用下標:P指功率效率、EXT指外部量子效率、A指光子吸收激子、ED指擴散、CC指聚集及INT指內部量子效率。使用此表示法:ηP~ηEXT=ηA * ηED * ηCC Carrier generation requires exciton generation, diffusion, and ionization or aggregation. There is an efficiency η associated with each of these processes. Subscripts can be used as follows: P refers to power efficiency, EXT refers to external quantum efficiency, A refers to photon absorption excitons, ED refers to diffusion, CC refers to aggregation, and INT refers to internal quantum efficiency. Use this notation: η P ~η EXT =η A * η ED * η CC
ηEXT=ηA * ηINT η EXT = η A * η INT
激子之擴散長度(LD)通常遠小於(LD~50Å)光學吸收長度(~500Å),從而需要在使用厚且因此具電阻性之具有多重或高度折疊界面之 電池、或使用具有低光學吸收效率之薄電池之間進行權衡。 Excitons' diffusion length (L D ) is usually much smaller than (L D ~50Å) optical absorption length (~500Å), which requires the use of thick and therefore resistive batteries with multiple or highly folded interfaces, or the use of low There is a trade-off between thin cells for optical absorption efficiency.
當與傳統的矽基裝置相比時,有機PV電池具有許多潛在優點。有機PV電池之重量輕,在材料使用上經濟,及可沉積於低成本基板(諸如撓性塑料箔)上。然而,就商業化而言,必須通過新材料及裝置設計方法來進一步提高裝置效率。 Organic PV cells have many potential advantages when compared to traditional silicon-based devices. Organic PV cells are lightweight, economical in material use, and can be deposited on low-cost substrates such as flexible plastic foils. However, in terms of commercialization, new materials and device design methods must be used to further improve device efficiency.
在有機PV電池中,可看到界面現象主宰關鍵過程之行為,諸如在供體/受體界面處之電荷分離及在有機材料/電極界面處之電荷提取。為增進電荷提取同時抑制激子複合,經常在光活性區域與一或兩個電極之間使用緩衝層。 In organic PV cells, it can be seen that interface phenomena dominate key processes, such as charge separation at the donor/acceptor interface and charge extraction at the organic material/electrode interface. In order to improve charge extraction and suppress exciton recombination, a buffer layer is often used between the photoactive region and one or two electrodes.
已使用諸如BCP及BPhen之寬能隙材料作為緩衝物。該等材料係藉由歸因於其寬HOMO-LUMO能隙障蔽激子之傳輸,同時使電子傳輸通過因沉積陰極所引起的缺陷能態來作用。該等寬能隙緩衝物的第二作用係使光學吸收層進一步與反射式陰極在光場中之最佳位置處隔開。然而,該等緩衝物因沉積期間所引起的缺陷能態之穿透深度而受限於極薄的膜(<10nm)及其具高電阻性。 Wide energy gap materials such as BCP and BPhen have been used as buffers. These materials act by blocking the transmission of excitons due to their wide HOMO-LUMO energy gap, while allowing electron transmission through the defect energy state caused by the deposited cathode. The second function of the wide band gap buffer is to further separate the optical absorption layer from the reflective cathode at the optimal position in the light field. However, these buffers are limited by the extremely thin film (<10 nm) and their high resistance due to the penetration depth of the defect energy state caused during the deposition.
已使用具有小HOMO能量之材料(諸如Ru(acac))作為從陰極傳輸電洞以在受體/緩衝體界面處與電子複合之緩衝物。 Materials with small HOMO energy, such as Ru(acac), have been used as buffers that transport holes from the cathode to recombine with electrons at the receptor/buffer interface.
已基於具有與受體之LUMO能量匹配之LUMO能量之材料開發第三種類型之緩衝物,諸如PTCBI及NTCDA。LUMO能階之匹配容許電子有效率地從受體傳導至陰極。該等材料在其HOMO/LUMO能隙足夠大的情況下亦可用來障蔽激子。然而,該等材料在其於與活性層材料相同之光譜區中吸收之情況下會阻礙裝置性能。必須對該等裝置架構進行改良以提高有機PV電池之轉換效率。 A third type of buffer, such as PTCBI and NTCDA, has been developed based on materials with LUMO energy that matches the LUMO energy of the receptor. The LUMO energy level matching allows electrons to be efficiently conducted from the acceptor to the cathode. These materials can also be used to block excitons when their HOMO/LUMO energy gap is large enough. However, these materials hinder device performance if they absorb in the same spectral region as the active layer material. These device architectures must be improved to improve the conversion efficiency of organic PV cells.
本發明者已開發一種新穎類型的緩衝物,於本文中揭示作為激子障蔽性電荷載體濾波器。該等新穎緩衝物包括至少一種寬能隙材料與至少一種電子或電洞傳導材料之混合物。該等濾波器係依靠其在裝 置中之位置來最佳化。換言之,激子障蔽性電洞傳導濾波器係配置在光活性區域與陽極之間以障蔽激子且傳導電洞至陽極。反之,激子障蔽性電子傳導濾波器係配置在光活性區域與陰極之間以障蔽激子且傳導電子至陰極。例如,於激子障蔽性電子濾波器中,電子係由電子傳導材料透過類似雜質能帶的機制傳輸。同時,激子係受因寬能隙材料引起之能量障蔽及因可用來轉移至電子導體之能態數減少所引起之統計障蔽之組合障蔽。 The inventor has developed a novel type of buffer, disclosed herein as an exciton-blocking charge carrier filter. The novel buffers include a mixture of at least one wide band gap material and at least one electron or hole conducting material. These filters rely on their Centered to optimize. In other words, the exciton-blocking hole conduction filter is disposed between the photoactive region and the anode to block the excitons and conduct holes to the anode. Conversely, the exciton-blocking electron conduction filter is arranged between the photoactive region and the cathode to block the excitons and conduct electrons to the cathode. For example, in an exciton-barrier electronic filter, electrons are transmitted by electron conducting materials through a mechanism similar to the energy band of impurities. At the same time, the exciton is subject to a combination of an energy barrier caused by a wide band gap material and a statistical barrier caused by a reduction in the number of energy states available for transfer to electronic conductors.
諸如BCP或BPhen之許多緩衝物之一問題係其具高度電阻性及仰賴於損傷誘發的傳輸狀態,此將實際層厚度限制於~10nm。藉由將寬能隙材料(例如BCP)與具有良好傳輸性質之材料(例如C60)混合,可藉由利用類似雜質能帶的傳輸來改良總電導率。 One problem with many buffers, such as BCP or BPhen, is that they are highly resistive and depend on damage-induced transmission states, which limits the actual layer thickness to ~10nm. By mixing a wide bandgap material (such as BCP) with a material with good transmission properties (such as C 60 ), the overall conductivity can be improved by utilizing transmission of similar impurity bands.
諸如BCP或Bphen之緩衝物的第二問題在於其可在開始接近或一些情況中超過其各自的玻璃轉換溫度(Tg)的操作溫度下變成形態上不穩定,此可造成性能經時降級,從而顯著縮短裝置之操作壽命。在此等條件下,緩衝物可結晶且降級。本發明者發現藉由將寬能隙材料與電子導體(諸如富勒烯)或電洞導體混合,緩衝層具有增加的穩定性,類似於形態之「摻雜式釘扎(doped pinning)」。除此之外,藉由將形態上穩定之寬能隙材料,亦即,具有足夠高的玻璃轉換溫度之寬能隙材料用於本文所述之激子障蔽性電荷載體濾波器,可顯著延長裝置之操作壽命。 The second problem with buffers such as BCP or Bphen is that they can become morphologically unstable at operating temperatures that begin to approach or in some cases exceed their respective glass transition temperature ( Tg ), which can cause performance degradation over time, Thereby significantly shortening the operating life of the device. Under these conditions, the buffer can crystallize and degrade. The inventors found that by mixing a wide band gap material with an electronic conductor (such as fullerene) or a hole conductor, the buffer layer has increased stability, similar to the morphological "doped pinning". In addition, by using a morphologically stable wide band gap material, that is, a wide band gap material with a sufficiently high glass transition temperature for the exciton-barrier charge carrier filter described herein, it can be significantly extended The operating life of the device.
本文所述之激子障蔽性電荷載體濾波器亦作用於防止電荷積聚於活性層中以助於減低激子之激子-極化子淬滅,從而增大裝置之短路電流及填充因子之第二作用。 The exciton-blocking charge carrier filter described herein also acts to prevent the accumulation of charge in the active layer to help reduce exciton-polaron quenching of the exciton, thereby increasing the short circuit current and fill factor of the device. Second role.
在本發明之第一態樣中,有機光敏性光電子裝置包括包含陽極及陰極之兩個成疊置關係之電極;配置在該兩電極之間以形成供體-受體異質接面之包含至少一種供體材料及至少一種受體材料之光活性 區域,其中該至少一種受體材料具有最低未佔用分子軌域能階(LUMOAcc)及最高佔用分子軌域能階(HOMOAcc),及該至少一種供體材料具有最低未佔用分子軌域能階(LUMOdon)及最高佔用分子軌域能階(HOMOdon);及配置在該陰極與該至少一種受體材料之間之激子障蔽性電子濾波器,其中該電子濾波器包括包含至少一種陰極側寬能隙材料與至少一種電子傳導材料之混合物,及其中該至少一種陰極側寬能隙材料具有:- 小於或等於該LUMOAcc之最低未佔用分子軌域能階(LUMOCS-WG);- 大於、等於、或於0.3eV內小於該HOMOAcc之最高佔用分子軌域能階(HOMOCS-WG);及- 寬於HOMOAcc-LUMOAcc能隙之HOMOCS-WG-LUMOCS-WG能隙;及其中該至少一種陰極側寬能隙材料具有等於或高於85℃之玻璃轉換溫度。 In the first aspect of the present invention, the organic photosensitive optoelectronic device includes two electrodes including an anode and a cathode in a stacked relationship; the electrode disposed between the two electrodes to form a donor-acceptor heterojunction includes at least A photoactive region of a donor material and at least one acceptor material, wherein the at least one acceptor material has a lowest unoccupied molecular orbital energy level (LUMO Acc ) and a highest occupied molecular orbital energy level (HOMO Acc ), and the At least one donor material has the lowest unoccupied molecular orbital energy level (LUMO don ) and the highest occupied molecular orbital energy level (HOMO don ); and the exciton barrier property disposed between the cathode and the at least one acceptor material An electronic filter, wherein the electronic filter includes a mixture comprising at least one cathode side wide band gap material and at least one electron conducting material, and wherein the at least one cathode side wide band gap material has: -a minimum value equal to or less than the LUMO Acc unoccupied molecular orbital energy level (LUMO CS-WG); - is greater than, equal to, or less than 0.3eV in the highest occupied molecular orbital energy level of the HOMO Acc (HOMO CS-WG); and - wider than the HOMO Acc - LUMO Acc energy gap of HOMO CS-WG -LUMO CS-WG bandgap; and wherein the cathode side at least one material having a wide bandgap is equal to or higher than the glass transition temperature of 85 ℃.
在第二態樣中,一種有機光敏性光電子裝置包括包含陽極及陰極之兩個成疊置關係之電極;配置在兩電極之間以形成供體-受體異質接面之包含至少一種供體材料及至少一種受體材料之光活性區域,其中該至少一種供體材料具有最低未佔用分子軌域能階(LUMODon)及最高佔用分子軌域能階(HOMODon);及配置在該陽極與該至少一種供體材料之間之激子障蔽性電洞濾波器,其中該電洞濾波器包括包含至少一種陽極側寬能隙材料與至少一種電洞傳導材料之混合物,及其中該至少一種陽極側寬能隙材料具有:- 大於或等於HOMODon之最高佔用分子軌域能階(HOMOAS-WG);- 小於、等於、或於0.3eV內大於(離真空能階更遠)LUMODon之最低未佔用分子軌域能階(LUMOAS-WG);及 - 寬於HOMODon-LUMODon能隙之HOMOAS-WG-LUMOAS-WG能隙;及其中該至少一種陽極側寬能隙材料具有等於或高於85℃之玻璃轉換溫度。 In a second aspect, an organic photosensitive optoelectronic device includes two electrodes including an anode and a cathode in a stacked relationship; the electrode disposed between the two electrodes to form a donor-acceptor heterojunction includes at least one donor A photoactive region of the material and at least one acceptor material, wherein the at least one donor material has the lowest unoccupied molecular orbital energy level (LUMO Don ) and the highest occupied molecular orbital energy level (HOMO Don ); and is disposed at the anode An exciton-barrier hole filter between the at least one donor material, wherein the hole filter includes a mixture including at least one anode-side wide band gap material and at least one hole conductive material, and the at least one of The anode-side wide bandgap material has:-greater than or equal to the highest occupied molecular orbital energy level of HOMO Don (HOMO AS-WG );-less than, equal to, or greater than (farther from the vacuum energy level) LUMO Don within 0.3eV The lowest unoccupied molecular orbital energy level (LUMO AS-WG ); and-HOMO AS-WG -LUMO AS-WG energy gap wider than the HOMO Don -LUMO Don energy gap; and at least one of the anode side wide energy gaps The material has a glass transition temperature equal to or higher than 85°C.
如本文所用,術語「有機」包括可用於製造有機光敏性裝置之聚合材料以及小分子有機材料。「小分子」係指非聚合物之任何有機材料,及「小分子」實際上可相當大。在一些情況中,小分子可包括重複單元。例如,使用長鏈烷基作為取代基並不將分子排除在「小分子」類別之外。亦可將小分子併入聚合物中,例如作為聚合物主鏈上之側基或作為主鏈之一部分。 As used herein, the term "organic" includes polymeric materials and small molecule organic materials that can be used to manufacture organic photosensitive devices. "Small molecule" refers to any organic material that is not a polymer, and "small molecules" can actually be quite large. In some cases, small molecules may include repeating units. For example, the use of long-chain alkyl groups as substituents does not exclude molecules from the category of "small molecules". Small molecules can also be incorporated into polymers, for example as side groups on the polymer backbone or as part of the backbone.
在本發明有機材料之情況中,術語「供體」及「受體」係指兩種相接觸但為不同有機材料之最高佔用分子軌域(HOMO)及最低未佔用分子軌域(LUMO)能階之相對位置。假若一與另一材料接觸之材料之LUMO能階離真空能階更遠,則該材料為受體。否則其為供體。不存在外部偏壓之情況下,在能量上有利於供體-受體接面處之電子移 至受體材料中,及有利於電洞移至供體材料中。 In the context of the organic materials of the present invention, the terms "donor" and "acceptor" refer to the highest occupied molecular orbital (HOMO) and lowest unoccupied molecular orbital (LUMO) energy of two contacting but different organic materials The relative position of the order. If the LUMO energy level of a material in contact with another material is further away from the vacuum energy level, the material is the acceptor. Otherwise, it is a donor. In the absence of external bias, it is energetically favorable for electron transfer at the donor-acceptor junction Into the acceptor material, and facilitate the migration of holes into the donor material.
本文中,術語「陰極」係依下述方式使用。在環境照射下及與電阻性負載連接且無外部施加電壓之非堆疊PV裝置或堆疊PV裝置之單一單元(例如太陽能電池)中,電子從相鄰光電導材料移動至陰極。類似地,在本文中使用術語「陽極」,因此,在照明下之太陽能電池中,電洞從相鄰光電導材料移動至陽極,此等同於電子以相反方式移動。應注意「陽極」及「陰極」電極可為電荷轉移區域或複合區,諸如彼等用於串聯式光伏打裝置中者。在光敏性光電子裝置中,可能期望能使來自裝置外部之最大量的環境電磁輻射被光導活性內部區接收。換言之,電磁輻射必須到達光傳導層,在此其可藉由光導吸收轉換為電。此通常決定至少一個電接觸件應最低程度地吸收及最低程度地反射入射電磁輻射。在一些情況中,此接觸件應為透明或至少半透明。電極在其允許相關波長之環境電磁輻射之至少50%透射透過其時被稱為「透明」。電極在其允許相關波長之環境電磁輻射之部分(但小於50%)透射時被稱為「半透明」。相對的電極可為反射材料,從而已通過電池但未被吸收之光再往回反射通過電池。 Herein, the term "cathode" is used in the following manner. In a non-stacked PV device connected to a resistive load and without an externally applied voltage or a single unit of a stacked PV device (such as a solar cell) under ambient irradiation, electrons move from the adjacent photoconductive material to the cathode. Similarly, the term "anode" is used herein, therefore, in a solar cell under illumination, holes move from adjacent photoconductive materials to the anode, which is equivalent to electrons moving in the opposite way. It should be noted that the "anode" and "cathode" electrodes may be charge transfer regions or composite regions, such as those used in tandem photovoltaic devices. In a photosensitive optoelectronic device, it may be desirable to enable the maximum amount of ambient electromagnetic radiation from outside the device to be received by the photoconductive active internal region. In other words, electromagnetic radiation must reach the light-conducting layer, where it can be converted into electricity by absorption by the light guide. This usually determines that at least one electrical contact should absorb and reflect incident electromagnetic radiation to a minimum. In some cases, this contact should be transparent or at least translucent. An electrode is said to be "transparent" when it allows at least 50% of the ambient electromagnetic radiation of the relevant wavelength to transmit through it. The electrode is said to be "translucent" when it allows a portion (but less than 50%) of the ambient electromagnetic radiation of the relevant wavelength to be transmitted. The opposite electrode may be a reflective material so that light that has passed through the battery but has not been absorbed is reflected back through the battery.
如本文所用,「光活性區域」係指裝置中吸收電磁輻射以產生激子之區域。類似地,層在其吸收電磁輻射以產生激子之情況下係「光活性」。該等激子可解離成電子及電洞以便產生電流。 As used herein, "photoactive region" refers to a region in a device that absorbs electromagnetic radiation to generate excitons. Similarly, a layer is "photoactive" if it absorbs electromagnetic radiation to produce excitons. These excitons can dissociate into electrons and holes in order to generate current.
如在本文中所使用及敘述,「層」係指其主要維度為X-Y(亦即,沿著其長度及寬度)之光敏性裝置之構件或組件。應明瞭術語層不一定受限於材料之單層或片。另外,應明瞭某些層之表面(包括該等層與其他材料或層之界面)可非完美,其中該等表面代表與其他材料或層之互穿、纏絡或盤旋網狀結構。類似地,亦應明瞭層可為不連續,以致該層沿X-Y維度之連續性可被其他層或材料干擾或以其他方式中 斷。 As used and described herein, "layer" refers to a member or component of a photosensitive device whose main dimension is X-Y (ie, along its length and width). It should be understood that the term layer is not necessarily limited to a single layer or sheet of material. In addition, it should be understood that the surface of some layers (including the interface between these layers and other materials or layers) may be imperfect, where these surfaces represent interpenetrating, entangled, or spiral network structures with other materials or layers. Similarly, it should also be understood that the layer may be discontinuous, so that the continuity of the layer along the X-Y dimension may be disturbed by other layers or materials or otherwise Break.
如本文所用,假若第一HOMO或LUMO能階與第二HOMO或LUMO能階相比更靠近真空能階,則第一HOMO或LUMO能階係「小於」第二HOMO或LUMO能階。類似地,假若第一HOMO或LUMO能階與第二HOMO或LUMO能階相比離真空能階更遠,則第一HOMO或LUMO能階係「大於」第二HOMO或LUMO能階。 As used herein, if the first HOMO or LUMO energy level is closer to the vacuum energy level than the second HOMO or LUMO energy level, the first HOMO or LUMO energy level is "less than" the second HOMO or LUMO energy level. Similarly, if the first HOMO or LUMO energy level is farther from the vacuum energy level than the second HOMO or LUMO energy level, the first HOMO or LUMO energy level is "greater than" the second HOMO or LUMO energy level.
如本文所用,當在本文中使用該術語時,假若其能量匹配到十分位,則兩軌域能階彼此「相等」。例如,基於本發明之目的,-3.70eV之LUMO能量將被視為「等於」-3.79eV之LUMO能量。 As used herein, when the term is used in this article, if its energy matches decile, the energy levels of the two orbits are "equal" to each other. For example, for the purposes of the present invention, a LUMO energy of -3.70 eV will be regarded as "equal to" a LUMO energy of -3.79 eV.
如本文所用,LUMOAcc及HOMOAcc分別代表至少一種受體材料之最低未佔用分子軌域能階及最高佔用分子軌域能階。 As used herein, LUMO Acc and HOMO Acc represent the lowest unoccupied molecular orbital energy level and the highest occupied molecular orbital energy level of at least one acceptor material, respectively.
如本文所用,LUMODon及HOMODon分別代表至少一種供體材料之最低未佔用分子軌域能階及最高佔用分子軌域能階。 As used herein, LUMO Don and HOMO Don represent the lowest unoccupied molecular orbital energy level and the highest occupied molecular orbital energy level of at least one donor material, respectively.
如本文所用,LUMOCS-WG及HOMOCS-WG分別代表至少一種陰極側寬能隙材料之最低未佔用分子軌域能階及最高佔用分子軌域能階。 As used herein, LUMO CS-WG and HOMO CS-WG respectively represent the lowest unoccupied molecular orbital energy level and the highest occupied molecular orbital energy level of at least one cathode side wide band gap material.
如本文所用,LUMOAS-WG及HOMOAS-WG分別代表至少一種陽極側寬能隙材料之最低未佔用分子軌域能階及最高佔用分子軌域能階。 As used herein, LUMO AS-WG and HOMO AS-WG respectively represent the lowest unoccupied molecular orbital energy level and the highest occupied molecular orbital energy level of at least one anode-side wide bandgap material.
如本文所用,LUMOEC及HOMOEC分別代表至少一種電子傳導材料之最低未佔用分子軌域能階及最高佔用分子軌域能階。 As used herein, LUMO EC and HOMO EC represent the lowest unoccupied molecular orbital energy level and the highest occupied molecular orbital energy level of at least one electron conductive material, respectively.
如本文所用,LUMOHC及HOMOHC分別代表至少一種電洞傳導材料之最低未佔用分子軌域能階及最高佔用分子軌域能階。 As used herein, LUMO HC and HOMO HC respectively represent the lowest unoccupied molecular orbital energy level and the highest occupied molecular orbital energy level of at least one hole conducting material.
如本文所用,HOMO-LUMO能隙為材料之HOMO與LUMO之間之能量差。 As used herein, the HOMO-LUMO energy gap is the energy difference between the HOMO and LUMO of a material.
如本文所用,術語「在...之間」在寬能隙材料之玻璃轉換溫度(Tg)值之所列範圍情況中意欲包括端點值。 As used herein, the term "between" is intended to include endpoint values in the case of the listed range of glass transition temperature (T g ) values of wide band gap materials.
本發明之裝置包括至少一個激子障蔽性電荷載體濾波器。例
如,圖1中顯示根據本發明之有機光敏性光電子裝置的示意圖。電極110包括陽極或陰極。在電極110包括陰極之情況下,電極140包括陽極。在電極110包括陽極之情況下,電極140包括陰極。光活性區域包括供體/受體有機層120及130以形成如本文所述之供體-受體異質接面。光活性區域可包括額外的供體及/或受體層,以形成(例如)混成平面混合型異質接面。有機層120包含至少一種供體材料或至少一種受體材料。在層120包含至少一種受體材料之情況下,有機層130包含至少一種供體材料。在層120包含至少一種供體材料之情況下,有機層130包含至少一種受體材料。應注意圖1中之該等供體/受體層無需為平面型。換言之,本發明涵蓋相關技術中已知用於有機光伏打裝置之所有類型的供體-受體異質接面,包括彼等具體述於本文中者。
The device of the present invention includes at least one exciton barrier charge carrier filter. example
For example, FIG. 1 shows a schematic diagram of an organic photosensitive optoelectronic device according to the present invention. The
在圖1之裝置A中,在電極110包括陰極、有機層120包含至少一種受體材料、有機層130包含至少一種供體材料、且電極140包含陽極之情況下,層115為激子障蔽性電子濾波器。在電極110包括陽極、有機層120包含至少一種供體材料、有機層130包含至少一種受體材料、且電極140包含陰極之情況下,層115為激子障蔽性電洞濾波器。
In the device A of FIG. 1, when the
在一些實施例中,如在裝置B中,裝置同時包括激子障蔽性電子濾波器及激子障蔽性電洞濾波器。在電極110包括陰極、有機層120包含至少一種受體材料、有機層130包含至少一種供體材料、層135為激子障蔽性電洞濾波器、且電極140包括陽極之情況下,層115為激子障蔽性電子濾波器。在電極110包括陽極、有機層120包含至少一種供體材料、有機層130包含至少一種受體材料、層135為激子障蔽性電子濾波器、且電極140包括陰極之情況下,層115為激子障蔽性電洞濾波器。
In some embodiments, as in device B, the device includes both exciton-barrier electronic filters and exciton-barrier hole filters. When
雖然未顯示於圖1中,但裝置A與B可包括位於激子障蔽性電子/電洞濾波器與最接近電極之間之其他緩衝層或覆蓋層。 Although not shown in FIG. 1, devices A and B may include other buffer layers or cover layers between the exciton-blocking electron/hole filter and the closest electrode.
激子障蔽性電子濾波器係配置在陰極與至少一種受體材料之間且包括包含至少一種陰極側寬能隙材料與至少一種電子傳導材料之混合物。該至少一種陰極側寬能隙材料具有:- 小於或等於LUMOAcc之最低未佔用分子軌域能階(LUMOCS-WG);- 大於、等於、或於0.3eV內小於HOMOAcc之最高佔用分子軌域能階(HOMOCS-WG);及- 寬於HOMOAcc-LUMOAcc能隙之HOMOCS-WG-LUMOCS-WG能隙。 The exciton-blocking electronic filter is disposed between the cathode and at least one acceptor material and includes a mixture including at least one cathode side wide energy gap material and at least one electron conductive material. The at least one cathode side wide energy gap material has: -a minimum unoccupied molecular orbital energy level (LUMO CS-WG ) less than or equal to LUMO Acc ;-a maximum occupied molecule greater than, equal to, or less than HOMO Acc within 0.3 eV Orbital energy level (HOMO CS-WG ); and-HOMO CS-WG -LUMO CS-WG energy gap wider than HOMO Acc -LUMO Acc energy gap.
該至少一種電子傳導材料具有大於、等於、或於0.3eV內小於(諸如於0.2eV內小於)LUMOAcc之最低未佔用分子軌域能階(LUMOEC)。 The at least one electronically conductive material having greater than, equal to, or within less than 0.3eV (such as less than 0.2 eV in) the LUMO Acc lowest unoccupied molecular orbital energy level (LUMO EC).
為藉由採用形態上穩定性材料來延長裝置之操作壽命,本發明之一些實施例使用具有足夠高的玻璃轉換溫度(例如,高於裝置通常操作的溫度或溫度範圍、高於裝置之最高操作溫度、高於臨限溫度值等)之陰極側寬能隙材料。 In order to extend the operating life of the device by using morphologically stable materials, some embodiments of the present invention use a glass transition temperature that is sufficiently high (eg, higher than the temperature or temperature range in which the device normally operates, higher than the maximum operation of the device Temperature, higher than the threshold temperature value, etc.) wide gap material on the cathode side.
在一些實施例中,HOMOCS-WG係較HOMOAcc大,諸如大至少0.2eV、大至少0.3eV、大至少0.5eV、大至少1eV、大至少1.5eV、或大至少2eV,及LUMOCS-WG係較LUMOAcc小,諸如小至少0.2eV、小至少0.3eV、小至少0.5eV、小至少1eV、小至少1.5eV、或小至少2eV。 In some embodiments, the HOMO CS-WG is larger than HOMO Acc , such as at least 0.2 eV large, at least 0.3 eV large, at least 0.5 eV large, at least 1 eV large, at least 1.5 eV large, or at least 2 eV large, and LUMO CS- The WG system is smaller than LUMO Acc , such as at least 0.2 eV small, at least 0.3 eV small, at least 0.5 eV small, at least 1 eV small, at least 1.5 eV small, or at least 2 eV small.
在一些實施例中,LUMOEC係等於LUMOAcc。 In some embodiments, LUMO EC is equal to LUMO Acc .
於一些實施例中,LUMOEC係大於LUMOAcc,諸如大0.5eV以內、大0.4eV以內、大0.3eV以內、或大0.2eV以內。 In some embodiments, the LUMO EC is greater than LUMO Acc , such as within 0.5 eV greater, within 0.4 eV greater, within 0.3 eV greater, or within 0.2 eV greater.
在一些實施例中,LUMOEC較LUMOAcc小或大不超過0.1eV。 In some embodiments, LUMO EC is less than or greater than LUMO Acc by no more than 0.1 eV.
在一些實施例中,LUMOCS-WG係小於LUMOEC,諸如小至少0.2eV、小至少0.3eV、小至少0.5eV、小至少1eV、小至少1.5eV、或 小至少2eV。 In some embodiments, the LUMO CS-WG system is smaller than LUMO EC , such as at least 0.2 eV small, at least 0.3 eV small, at least 0.5 eV small, at least 1 eV small, at least 1.5 eV small, or at least 2 eV small.
於一些實施例中,LUMOCS-WG係較LUMOAcc小超過0.2eV,諸如小超過0.3eV、小超過0.5eV、小超過1eV、小超過1.5eV、或小超過2eV。 In some embodiments, the LUMO CS-WG system is smaller than LUMO Acc by more than 0.2 eV, such as smaller than 0.3 eV, smaller than 0.5 eV, smaller than 1 eV, smaller than 1.5 eV, or smaller than 2 eV.
在一些實施例中,該至少一種陰極側寬能隙材料包括選自以下之材料:浴銅靈(BCP)、浴啡啉(BPhen;bathophenanthroline)、對-雙(三苯矽烷基)苯(UGH-2)、(4,4'-N,N'-二咔唑)聯苯(CBP)、N,N'-二咔唑基-3,5-苯(mCP)、聚(乙烯基咔唑)(PVK)、菲及經烷基及/或芳基取代之菲、經烷基及/或芳基取代之苯衍生物、苯并菲及經烷基及/或芳基取代之苯并菲、氮雜取代苯并菲、噁二唑、三唑、芳基-苯并咪唑、金剛烷及經烷基及/或芳基取代之金剛烷、四芳基甲烷及其衍生物、9,9-二烷基-茀及其寡聚物、9,9-二芳基-茀及其寡聚物、螺-聯苯及經取代衍生物、碗烯(corannulene)及其經烷基及/或芳基取代之衍生物及其衍生物。 In some embodiments, the at least one cathode-side wide energy gap material includes a material selected from the group consisting of bath copper spirit (BCP), bath morpholine (BPhen; bathophenanthroline), p-bis(triphenylsilyl)benzene (UGH -2), (4,4'-N,N'-dicarbazole) biphenyl (CBP), N,N'-dicarbazolyl-3,5-benzene (mCP), poly(vinylcarbazole ) (PVK), phenanthrene and phenanthrene substituted with alkyl and/or aryl, benzene derivatives substituted with alkyl and/or aryl, benzophenanthrene and benzophenanthrene substituted with alkyl and/or aryl , Aza-substituted benzophenanthrene, oxadiazole, triazole, aryl-benzimidazole, adamantane and adamantane substituted with alkyl and/or aryl groups, tetraarylmethane and its derivatives, 9,9 -Dialkyl-stilbene and its oligomer, 9,9-diaryl-stilbene and its oligomer, spiro-biphenyl and substituted derivatives, corannulene and its alkyl and/or Aryl substituted derivatives and their derivatives.
可藉由採用具有足夠高的,例如,高於裝置通常操作的溫度或溫度範圍,高於裝置之最高操作溫度,高於臨限溫度值等之Tg之陰極側寬能隙材料來增加裝置之操作壽命。例如,如圖31A至C及32A至D中可見,包含Bphen:C60(Bphen的Tg 62℃)混合物之激子障蔽性電荷載體濾波器之隨時間變化的性能(亦即,標準化響應度、填充因子、Voc及PCE)隨著操作溫度自50℃增加至80℃降級較包含TPBi:C70(TPBi的Tg 122℃)混合物之激子障蔽性電荷載體濾波器之隨著操作溫度自50℃增加至130℃降級更快。換言之,採用TPBi:C70之裝置之性能隨時間降級甚至在更高操作溫度下較採用BPhen之裝置更慢。因此,裝置之效率及操作壽命可藉由例如改由具有更高Tg的陰極側寬能隙材料諸如TPBi代替具有類似Tg值的Bphen及障壁性材料得以改良。 May have a sufficiently high by employing, for example, higher than the temperature or temperature range of the device is generally operated, the apparatus is higher than the maximum operating temperature, higher than the temperature threshold value or the like of the wide-gap side of the cathode material to increase the T g of the apparatus Operating life. For example, as can be seen in FIGS. 31A to C and 32A to D, including Bphen: C 60 (T g of Bphen 62°C) The time-varying performance of the mixture's exciton-blocking charge carrier filter (ie, standardized responsivity, fill factor, Voc, and PCE) as the operating temperature increases from 50°C to 80°C. The degradation includes TPBi: C 70 (TP g Tg 122°C) The exciton barrier charge carrier filter of the mixture degrades faster as the operating temperature increases from 50°C to 130°C. In other words, the performance of the device using TPBi:C 70 degrades over time even slower than the device using BPhen at even higher operating temperatures. Thus, the efficiency and operating life of the apparatus may be modified by, for example, from the cathode side of the wide-gap material having a higher T g, such as TPBi instead of having similar T g values Bphen and barrier material are improved.
在一些實施例中,該至少一種陰極側寬能隙材料包括具有足夠 高的,例如,高於裝置通常操作的溫度或溫度範圍,高於裝置之最高操作溫度,高於臨限溫度值等之Tg之材料。例如,在一些實施例中,該至少一種陰極側寬能隙材料包括選自以下之材料:3,3',5,5'-四[(間-吡啶基)-苯-3-基]聯苯(BP4mPy)、2,2',2"-(1,3,5-石油精三基(Benzinetriyl))-參(1-苯基-1-H-苯并咪唑)(TPBi)、雙(2-甲基-8-羥基喹啉根)-4-(苯基苯醇)鋁(BAlq)、參(8-羥基-喹啉)鋁(Alq3)、參(2,4,6-三甲基-3-(吡啶-3-基)苯基)硼烷(3TPYMB)、4,40-(1,3-伸苯基)雙(2,6-二對-甲苯基吡啶-3,5-二甲腈)(m-MPyCN)、4,40-(1,3-伸苯基)雙(2,6-二(聯苯-4-基)吡啶-3,5-二甲腈)(m-PhPyCN)、4,40-(1,3-伸苯基)雙(2,6-二苯基吡啶-3,5-二甲腈)(m-PyCN)、6,60-(1,4-伸苯基)雙(2-苯基-4-對甲苯基菸鹼腈)(p-PPtNN)、4,40-(1,4-伸苯基)雙(2-苯基-6-對甲苯基菸鹼腈)(p-PPtNT)、參(6-氟-8-羥基-喹啉)鋁(6FAlq3)、2,6-雙(4-氰基苯基)-4-苯基吡啶-3,5-二甲腈(CNPyCN)、4,40-(1,4-伸苯基)雙(2,6-二對甲苯基吡啶-3,5-二甲腈)(p-MPyCN)、雙苯并咪唑并[2,1-a:1',2-b']蒽[2,1,9-def:6,5,10-d'e'f']二異喹啉-10,21-二酮(PTCBI)、5,10,15-三苄基-5H-二吲哚并[3,2-a:3',2'-c]咔唑(TBDI)、5,10,15-三苯基-5H-二吲哚并[3,2-a:3',2'-c]咔唑(TPDI)、1,3-雙[3,5-二(吡啶-3-基)苯基]苯(BmPyPhB)、1,3,5-三(間-吡啶-3-基苯基)苯、1,3,5-參(3-吡啶基-3-苯基)苯、3,3'-[5'-[3-(3-吡啶基)苯基][1,1':3',1"-聯三苯]-3,3"-二基]雙吡啶(TmPyPB)、9,9-二甲基-10-(9-苯基-9H-咔唑-3-基)-9,10-二氫吖啶(PCZAC)、3,3-二(9H-咔唑-9-基)聯苯(mCBP)、4,40-雙(三苯矽烷基)-聯苯(BSB)及其衍生物。 In some embodiments, the at least one cathode-side wide bandgap material includes materials that are sufficiently high, for example, higher than the temperature or temperature range at which the device normally operates, higher than the maximum operating temperature of the device, higher than the threshold temperature value, etc. Tg material. For example, in some embodiments, the at least one cathode side wide energy gap material includes a material selected from the group consisting of: 3,3',5,5'-tetra[(m-pyridyl)-phenyl-3-yl] Benzene (BP4mPy), 2,2',2"-(1,3,5-Petroleum triphenyl (Benzinetriyl))-ginseng (1-phenyl-1-H-benzimidazole) (TPBi), bis( 2-methyl-8-hydroxyquinoline)-4-(phenylbenzyl alcohol) aluminum (BAlq), ginseng (8-hydroxy-quinoline) aluminum (Alq3), ginseng (2,4,6-trimethyl 3-(pyridin-3-yl)phenyl)borane (3TPYMB), 4,40-(1,3-phenylene)bis(2,6-di-p-tolylpyridine-3,5- Dicarbonitrile) (m-MPyCN), 4,40-(1,3-phenylene)bis(2,6-bis(biphenyl-4-yl)pyridine-3,5-dicarbonitrile) (m -PhPyCN), 4,40-(1,3-phenylene)bis(2,6-diphenylpyridine-3,5-dicarbonitrile) (m-PyCN), 6,60-(1,4 -Phenylene)bis(2-phenyl-4-p-tolylnicotinic acid nitrile) (p-PPtNN), 4,40-(1,4-phenylene)bis(2-phenyl-6-p Toluylnicotinonitrile) (p-PPtNT), ginseng (6-fluoro-8-hydroxy-quinoline) aluminum (6FAlq3), 2,6-bis(4-cyanophenyl)-4-phenylpyridine- 3,5-dicarbonitrile (CNPyCN), 4,40-(1,4-phenylene)bis(2,6-di-p-tolylpyridine-3,5-dicarbonitrile) (p-MPyCN), Dibenzimidazolo[2,1-a:1',2-b']anthracene[2,1,9-def:6,5,10-d'e'f']diisoquinoline-10, 21-diketone (PTCBI), 5,10,15-tribenzyl-5H-diindo[3,2-a: 3',2'-c]carbazole (TBDI), 5,10,15 -Triphenyl-5H-diindo[3,2-a: 3',2'-c]carbazole (TPDI), 1,3-bis[3,5-bis(pyridin-3-yl) Phenyl]benzene (BmPyPhB), 1,3,5-tris (m-pyridin-3-ylphenyl)benzene, 1,3,5-Shen(3-pyridyl-3-phenyl)benzene, 3, 3'-[5'-[3-(3-pyridyl)phenyl][1,1': 3',1"-terphenyl]-3,3"-diyl]bispyridine (TmPyPB), 9,9-dimethyl-10-(9-phenyl-9H-carbazol-3-yl)-9,10-dihydroacridine (PCZAC), 3,3-bis(9H-carbazole-9 -Yl) biphenyl (mCBP), 4,40-bis(triphenylsilyl)-biphenyl (BSB) and its derivatives.
在一些實施例中,陰極側寬能隙材料之玻璃轉換溫度係等於或高於85℃、等於或高於95℃、等於或高於105℃、等於或高於115℃、等於或高於125℃、等於或高於135℃、等於或高於145℃、等於或高於155℃、等於或高於165℃、等於或高於175℃、等於或高於185℃、 等於或高於195℃、等於或高於200℃、等於或高於225℃或等於或高於250℃。 In some embodiments, the cathode side wide energy gap material has a glass transition temperature equal to or higher than 85°C, equal to or higher than 95°C, equal to or higher than 105°C, equal to or higher than 115°C, equal to or higher than 125 ℃, 135 ℃ or higher, 145 ℃ or higher, 155 ℃ or higher, 165 ℃ or higher, 175 ℃ or higher, 185 ℃ or higher, Equal to or higher than 195°C, equal to or higher than 200°C, equal to or higher than 225°C or equal to or higher than 250°C.
在一些實施例中,陰極側寬能隙材料之玻璃換換溫度係介於85至200℃之間,諸如,介於90至195℃之間、介於95至190℃之間、介於100至185℃之間、介於105至180℃之間、介於110至175℃之間、介於115至170℃之間或介於120至165℃之間。應注意可使用具有高於200℃,諸如介於200至300℃、200至275℃、200至250℃或200至225℃之間之玻璃轉換溫度之材料。 In some embodiments, the glass transition temperature of the wide energy gap material on the cathode side is between 85 and 200°C, such as between 90 and 195°C, between 95 and 190°C, and between 100 To 185°C, 105 to 180°C, 110 to 175°C, 115 to 170°C, or 120 to 165°C. It should be noted that materials having a glass transition temperature above 200°C, such as between 200 to 300°C, 200 to 275°C, 200 to 250°C, or 200 to 225°C can be used.
該裝置之操作溫度可改變且取決於許多因素,諸如(例如)環境條件(例如,溫度、光強度等)及增強機構(例如,太陽能集光器)是否結合裝置使用。例如,環境溫度可根據裝置之地理位置、一年中的時間、一天中的時間等改變。類似地,光強度亦可取決於地理位置、一年中的時間及一天中的時間以及雲覆蓋量、入射角及其他因素。因此,在一些實施例中,該陰極側寬能隙材料具有足夠高的,例如,高於裝置通常操作(例如,在正常環境條件下)的溫度或溫度範圍,高於裝置在正常環境條件下之最高操作溫度等之Tg。 The operating temperature of the device can vary and depends on many factors, such as, for example, environmental conditions (eg, temperature, light intensity, etc.) and whether enhancement mechanisms (eg, solar concentrators) are used in conjunction with the device. For example, the ambient temperature may change according to the geographic location of the device, time of year, time of day, and so on. Similarly, light intensity can also depend on geographic location, time of year and time of day, and cloud coverage, angle of incidence, and other factors. Therefore, in some embodiments, the cathode-side wide bandgap material has a sufficiently high temperature, for example, above the temperature or temperature range at which the device normally operates (eg, under normal environmental conditions), and above the device under normal environmental conditions Tg of the highest operating temperature.
在一些實施例中,太陽能集中器可與裝置整合或結合裝置使用以增加、擴大或以其他方式增強導引於裝置之光。集中器及/或其他增強機構之使用可提高裝置之操作溫度超過裝置在正常環境條件下所經歷者。因此,為增加裝置之穩定性及操作壽命,陰極側寬能隙材料可具有高於裝置在增強光照條件下所經歷的最高操作溫度之Tg。 In some embodiments, the solar concentrator may be integrated with or used in conjunction with the device to increase, expand, or otherwise enhance the light directed to the device. The use of concentrators and/or other enhancement mechanisms can increase the operating temperature of the device beyond that experienced by the device under normal environmental conditions. Therefore, to increase the stability and operating life of the device, the cathode side wide bandgap material may have a Tg that is higher than the maximum operating temperature experienced by the device under enhanced light conditions.
在一些實施例中,該至少一種受體材料包括選自以下之材料:亞酞菁、亞萘酞菁、二吡咯甲烯錯合物(諸如鋅二吡咯甲烯錯合物)、BODIPY錯合物、苝、萘、富勒烯及富勒烯衍生物(例如,PCBM、ICBA、ICMA等等)及聚合物(諸如經羰基取代之聚噻吩、經氰基取代之聚噻吩、聚伸苯基乙烯、或包含缺電子單體之聚合物(諸如苝二醯 亞胺、苯并噻二唑或富勒烯聚合物))。非限制性地提及選自下列之彼等:C60、C70、C76、C82、C84、或其衍生物諸如苯基-C61-丁酸甲酯([60]PCBM)、苯基-C71-丁酸甲酯([70]PCBM)、或噻吩基-C61-丁酸甲酯([60]ThCBM)及其他受體諸如3,4,9,10-苝四甲酸-雙苯并咪唑(PTCBI)、十六氟酞菁(F16CuPc)及其衍生物。 In some embodiments, the at least one acceptor material includes a material selected from the group consisting of phthalocyanines, naphthalene phthalocyanines, dipyrrolene complexes (such as zinc dipyrrolene complexes), BODIPY complexes Compounds, perylene, naphthalene, fullerene and fullerene derivatives (for example, PCBM, ICBA, ICMA, etc.) and polymers (such as polythiophene substituted with carbonyl, polythiophene substituted with cyano, polyphenylene) Ethylene, or polymers containing electron-deficient monomers (such as perylenediamide, benzothiadiazole, or fullerene polymers). Non-limiting mention of those selected from the following: C 60 , C 70 , C 76 , C 82 , C 84 , or derivatives thereof such as phenyl-C 61 -methyl butyrate ([60]PCBM), Phenyl-C 71 -methyl butyrate ([70]PCBM), or thienyl-C 61 -methyl butyrate ([60]ThCBM) and other receptors such as 3,4,9,10-perylenetetracarboxylic acid -Bibenzimidazole (PTCBI), hexafluorophthalocyanine (F 16 CuPc) and its derivatives.
在一些實施例中,該至少一種電子傳導材料包括選自以下之材料:亞酞菁、亞萘酞菁、二吡咯甲烯錯合物(諸如鋅二吡咯甲烯錯合物)及BODIPY錯合物、苝、萘、富勒烯及富勒烯衍生物(例如,PCBM、ICBA、ICMA等等)及聚合物(諸如經羰基取代之聚噻吩、經氰基取代之聚噻吩、聚伸苯基乙烯、或包含缺電子單體之聚合物(諸如苝二醯亞胺、苯并噻二唑或富勒烯聚合物))。非限制性地提及選自下列之彼等:C60、C70、C76、C82、C84、或其衍生物諸如苯基-C61-丁酸甲酯([60]PCBM)、苯基-C71-丁酸甲酯([70]PCBM)、或噻吩基-C61-丁酸甲酯([60]ThCBM)及其他受體諸如3,4,9,10-苝四甲酸-雙苯并咪唑(PTCBI)、十六氟酞菁(F16CuPc)及其衍生物。 In some embodiments, the at least one electron conducting material includes a material selected from the group consisting of phthalocyanine, naphthalene phthalocyanine, dipyrrolene complex (such as zinc dipyrrolene complex) and BODIPY complex Compounds, perylene, naphthalene, fullerene and fullerene derivatives (for example, PCBM, ICBA, ICMA, etc.) and polymers (such as polythiophene substituted with carbonyl, polythiophene substituted with cyano, polyphenylene) Ethylene, or polymers containing electron-deficient monomers (such as perylenediamide, benzothiadiazole, or fullerene polymers). Non-limiting mention of those selected from the following: C 60 , C 70 , C 76 , C 82 , C 84 , or derivatives thereof such as phenyl-C 61 -methyl butyrate ([60]PCBM), Phenyl-C 71 -methyl butyrate ([70]PCBM), or thienyl-C 61 -methyl butyrate ([60]ThCBM) and other receptors such as 3,4,9,10-perylenetetracarboxylic acid -Bibenzimidazole (PTCBI), hexafluorophthalocyanine (F 16 CuPc) and its derivatives.
在一些實施例中,該至少一種受體材料包括選自富勒烯及官能化富勒烯衍生物之材料。在一些實施例中,該至少一種電子傳導材料包括選自富勒烯及官能化富勒烯衍生物之材料。 In some embodiments, the at least one acceptor material includes a material selected from fullerenes and functionalized fullerene derivatives. In some embodiments, the at least one electron conducting material includes a material selected from fullerenes and functionalized fullerene derivatives.
特別關注使用富勒烯作為該至少一種電子傳導材料。C60(例如)在溶液中具有由兩個特徵所主宰之吸收光譜,該兩個特徵具有歸因於容許產生弗倫克爾類型(即,單分子)激發態之電子躍遷之於260nm及340nm波長處之峰值,同時於較長波長處之吸收係歸因於對稱禁制躍遷。在自溶液轉變為固體狀態時,C60(例如)經歷在λ=400及550nm之間之吸收之顯著增加,此乃因出現起因於電子從一個富勒烯之HOMO激發至其最接近相鄰者之LUMO之分子間電荷轉移(CT)狀態。當將C60與諸如BCP之陰極側寬能隙材料混合時,CT狀態吸收相較於弗倫克爾 類型特徵之CT狀態吸收更為快速地衰減。因此,可使用與陰極側寬能隙材料混合之富勒烯作為具有減低吸收率(甚至在諸如70% C60及30%寬能隙材料之中等稀釋下)之良好電子傳導材料,以不在富勒烯電子傳導材料中產生在其他情況中將無法增進裝置效率之激子。 Particular attention is paid to the use of fullerene as the at least one electron conducting material. C 60 (for example) has an absorption spectrum dominated by two features in solution that have an electron transition due to the allowable generation of the Frenkel-type (ie, single molecule) excited state at 260 nm and 340 nm wavelengths The peak at, while the absorption at longer wavelengths is due to symmetric prohibition transitions. When transitioning from a solution to a solid state, C 60 (for example) undergoes a significant increase in absorption between λ=400 and 550 nm due to the occurrence of electrons excited from the HOMO of a fullerene to its closest neighbor The intermolecular charge transfer (CT) state of the LUMO. When C 60 is mixed with a cathode side wide bandgap material such as BCP, the CT state absorption decays more rapidly than the CT state absorption of the Frenkel type characteristic. Therefore, fullerene mixed with a wide bandgap material on the cathode side can be used as a good electron conductive material with reduced absorption rate (even when diluted in materials such as 70% C 60 and 30% wide bandgap), so as not to be rich The exciton generated in the leene electron conductive material will not improve the efficiency of the device in other cases.
在一些實施例中,該至少一種電子傳導材料包括選自C60及C70之材料。 In some embodiments, the at least one electron conductive material includes a material selected from C 60 and C 70 .
在一些實施例中,該至少一種受體材料及該至少一種電子傳導材料包括相同的材料。在某些實施例中,該相同材料為富勒烯或官能化富勒烯衍生物。在某些實施例中,該相同材料為C60或C70。在一些實施例中,該至少一種受體材料及該至少一種電子傳導材料包括不同的材料。 In some embodiments, the at least one acceptor material and the at least one electron conducting material include the same material. In certain embodiments, the same material is fullerene or a functionalized fullerene derivative. In some embodiments, the same material is C 60 or C 70 . In some embodiments, the at least one acceptor material and the at least one electron conducting material include different materials.
在一些實施例中,該至少一種受體材料及該至少一種電子傳導材料係選自不同的富勒烯及官能化富勒烯衍生物。 In some embodiments, the at least one acceptor material and the at least one electron conducting material are selected from different fullerenes and functionalized fullerene derivatives.
在一些實施例中,該混合物包含比值範圍自約10:1至1:10(以體積計)(諸如約8:1至1:8(以體積計)、約6:1至1:6(以體積計)、約4:1至1:4(以體積計)、或約2:1至1:2(以體積計))之至少一種陰極側寬能隙材料及至少一種電子傳導材料。在某些實施例中,該比值為約1:1。應明瞭所指出的比值包括整數及非整數值。 In some embodiments, the mixture comprises a ratio ranging from about 10:1 to 1:10 (by volume) (such as about 8:1 to 1:8 (by volume), about 6:1 to 1:6 ( (By volume), about 4:1 to 1:4 (by volume), or about 2:1 to 1:2 (by volume)) at least one cathode side wide band gap material and at least one electron conducting material. In some embodiments, the ratio is about 1:1. It should be understood that the indicated ratios include integer and non-integer values.
在一些實施例中,該供體-受體異質接面係選自混合異質接面、整體異質接面、平面異質接面及混成平面混合型異質接面。在某些實施例中,該供體-受體異質接面為混成平面混合型異質接面(PM-HJ)。例如,在PM-HJ結構中,有兩個主要損失機制會導致低FF。其一為自由電荷載體於PM-HJ結構之廣大供體-受體摻雜區域中之雙分子複合,其速率由kBM=γ.n.p給定。此處,γ為郎之萬(Langevin)複合常數,及n(p)為自由電子(電洞)密度。第二個顯著損失係歸因於純淨受體層中之激子-極化子淬滅。已於純淨受體/障蔽性層界面處觀察到導致淬 滅及因此內部量子效率(IQE)減低之電子-極化子積聚。應注意激子-極化子淬滅遵循與雙分子複合類似的關係,此乃因激子及極化子濃度均與強度成比例。兩種機制會導致順向偏壓下之光電流損失,其使第四象限中電流密度-電壓(J-V)特徵之斜率增加,最終使FF及PCE減低。 In some embodiments, the donor-acceptor heterojunction is selected from mixed heterojunctions, bulk heterojunctions, planar heterojunctions, and hybrid planar hybrid heterojunctions. In some embodiments, the donor-acceptor heterojunction is a hybrid planar hybrid heterojunction (PM-HJ). For example, in the PM-HJ structure, there are two main loss mechanisms that lead to low FF. One is the bimolecular recombination of free charge carriers in the vast donor-acceptor doped region of PM-HJ structure, the rate of which is k BM =γ. n. p is given. Here, γ is the Langevin recombination constant, and n(p) is the density of free electrons (holes). The second significant loss is due to the exciton-polaron quenching in the pure acceptor layer. Electron-polaron accumulation has been observed at the interface of the pure acceptor/barrier layer that leads to quenching and therefore reduced internal quantum efficiency (IQE). It should be noted that the exciton-polaron quenching follows a similar relationship with bimolecular recombination, because the concentration of both excitons and polarons is proportional to the intensity. The two mechanisms will cause the loss of photocurrent under forward bias, which increases the slope of the current density-voltage (JV) characteristic in the fourth quadrant, and ultimately reduces the FF and PCE.
配置在光活性區域與陰極之間之激子障蔽性電子濾波器可提高雙層OPV電池之效率。電子傳導材料有效率地傳導電子-極化子而寬能隙材料障蔽激子。激子-極化子淬滅在利用電子濾波器之雙層電池中因其於障蔽界面處空間分離激子及極化子之能力而可明顯地減低。此繼而可導致JSC顯著增加,同時VOC及FF保持不變。PM-HJ電池另存在於混合光活性層中之雙分子複合之問題。然而,本發明之濾波器(混合層)導致與活性層之界面場減低,此歸因於其相較於純淨習知障蔽性緩衝層之增加電導率。所致之跨光敏性區域之場增加導致更快速之電荷提取。此繼而導致電池中之雙分子複合減低。 The exciton-blocking electronic filter arranged between the photoactive area and the cathode can improve the efficiency of the double-layer OPV battery. The electron conducting material efficiently conducts electron-polaron while the wide band gap material blocks the exciton. Exciton-polaron quenching can be significantly reduced in double-layer batteries using electronic filters due to their ability to spatially separate excitons and polarons at the barrier interface. This in turn can lead to a significant increase in J SC , while V OC and FF remain unchanged. PM-HJ batteries also have the problem of bimolecular recombination in the mixed photoactive layer. However, the filter (hybrid layer) of the present invention results in a reduced interface field with the active layer due to its increased conductivity compared to the purely conventional barrier buffer layer. The resulting increase in the field across the photosensitive region leads to faster charge extraction. This in turn leads to a reduction in bimolecular recombination in the battery.
在一些實施例中,裝置進一步包括至少一個配置在激子障蔽性電子濾波器與陰極之間之額外緩衝層或覆蓋層。在一些實施例中,該至少一個覆蓋層具有大於、等於、或於0.3eV內小於(諸如於0.2eV內小於)LUMOEC之LUMO能階,以傳導電子至陰極。在某些實施例中,覆蓋層之LUMO能階係於0.5eV內大於、諸如於0.4eV內大於、於0.3eV內大於、或於0.2eV內大於LUMOEC。在一些實施例中,覆蓋層具有較LUMOEC小或大不超過0.1eV之LUMO能階。在一些實施例中,該至少一個覆蓋層係選自富勒烯及官能化富勒烯衍生物。在一些實施例中,該至少一個覆蓋層包含PTCBI。 In some embodiments, the device further includes at least one additional buffer layer or cover layer disposed between the exciton-barrier electronic filter and the cathode. In some embodiments, the at least one covering layer having a greater than, equal to, or less than 0.3 eV in the (such as less than in the 0.2eV) LUMO EC of the LUMO energy level in the conduction electrons to the cathode. In some embodiments, the LUMO energy level of the capping layer is greater than 0.5 eV, such as greater than 0.4 eV, greater than 0.3 eV, or greater than LUMO EC in 0.2 eV. In some embodiments, the capping layer has a LUMO energy level that is less than or greater than 0.1 eV than LUMO EC . In some embodiments, the at least one cover layer is selected from fullerenes and functionalized fullerene derivatives. In some embodiments, the at least one cover layer comprises PTCBI.
在一些實施例中,覆蓋層包含具有不利於電子傳導至陰極之LUMO能階之材料。在該等實施例中,覆蓋層可足夠薄以便通過損傷誘發狀態傳輸電子。在一些實施例中,該至少一個覆蓋層包括選自BCP、BPhen、UGH-2及CBP之材料。 In some embodiments, the capping layer includes a material having a LUMO level that is not conducive to conduction of electrons to the cathode. In such embodiments, the cover layer may be thin enough to transport electrons through the damage-induced state. In some embodiments, the at least one cover layer includes a material selected from BCP, BPhen, UGH-2, and CBP.
在一些實施例中,該至少一個覆蓋層及該至少一種電子傳導材料包括相同的材料。在一些實施例中,該至少一個覆蓋層、該至少一種電子傳導材料及該至少一種受體材料包括相同的材料。 In some embodiments, the at least one cover layer and the at least one electron conductive material include the same material. In some embodiments, the at least one cover layer, the at least one electron conductive material, and the at least one acceptor material include the same material.
在一些實施例中,該至少一個覆蓋層及該至少一種陰極側寬能隙材料包括相同的材料。 In some embodiments, the at least one cover layer and the at least one cathode side wide energy gap material include the same material.
激子障蔽性電洞濾波器係配置在陽極與至少一種供體材料之間且包括包含至少一種陽極側寬能隙材料與至少一種電子傳導材料之混合物。該至少一種陽極側寬能隙材料具有:- 大於或等於HOMODon之最高佔用分子軌域能階(HOMOAS-WG);- 小於、等於、或於0.3eV內大於LUMODon之最低未佔用分子軌域能階(LUMOAS-WG);及- 寬於HOMODon-LUMODon能隙之HOMOAS-WG-LUMOAS-WG能隙。 The exciton-blocking hole filter is disposed between the anode and at least one donor material and includes a mixture including at least one anode-side wide energy gap material and at least one electron conductive material. The at least one anode side wide band gap material has:-greater than or equal to the highest occupied molecular orbital energy level of HOMO Don (HOMO AS-WG );-less than, equal to, or greater than the lowest unoccupied molecule of LUMO Don within 0.3eV Orbital Energy Level (LUMO AS-WG ); and-HOMO AS-WG -LUMO AS-WG energy gap wider than HOMO Don -LUMO Don energy gap.
該至少一種電洞傳導材料具有小於(更靠近真空能階)、等於、或於0.2eV內大於(離真空能階更遠)HOMODon之最高佔用分子軌域能階(HOMOHC)。 The at least one electrically conductive material having a hole smaller than (closer to vacuum level), is equal to, or greater than 0.2eV in (farther from the vacuum level) the highest occupied molecular orbital energy level of HOMO Don (HOMO HC).
為藉由採用形態上穩定性材料來延長裝置之操作壽命,本發明之一些實施例使用具有足夠高的,例如,高於裝置通常操作的溫度或溫度範圍,高於裝置之最高操作溫度,高於臨限溫度值等之玻璃轉換溫度之陽極側寬能隙材料。 In order to extend the operating life of the device by using morphologically stable materials, some embodiments of the present invention use a sufficiently high, for example, higher than the temperature or temperature range where the device normally operates, higher than the maximum operating temperature of the device, high A wide band gap material on the anode side at the glass transition temperature such as the threshold temperature value.
在一些實施例中,HOMOAS-WG係大於HOMODon,諸如大至少0.2eV、大至少0.3eV、大至少0.5eV、大至少1eV、大至少1.5eV、或大至少2eV,及LUMOAS-WG係小於LUMODon,諸如小至少0.2eV、小至少0.3eV、小至少0.5eV、小至少1eV、小至少1.5eV、或小至少2eV。 In some embodiments, the HOMO AS-WG is larger than HOMO Don , such as at least 0.2 eV large, at least 0.3 eV large, at least 0.5 eV large, at least 1 eV large, at least 1.5 eV large, or at least 2 eV large, and LUMO AS-WG It is smaller than LUMO Don , such as at least 0.2 eV small, at least 0.3 eV small, at least 0.5 eV small, at least 1 eV small, at least 1.5 eV small, or at least 2 eV small.
在一些實施例中,HOMOHC係等於HOMODon。 In some embodiments, HOMO HC is equal to HOMO Don .
於一些實施例中,HOMOHC係小於HOMODon,諸如小0.5eV以 內、小0.4eV以內、小0.3eV以內、或小0.2eV以內。 In some embodiments, the HOMO HC is less than HOMO Don , such as less than 0.5 eV, less than 0.4 eV, less than 0.3 eV, or less than 0.2 eV.
在一些實施例中,HOMOHC較HOMODon小或大不超過0.1eV。 In some embodiments, HOMO HC is less than or greater than HOMO Don by no more than 0.1 eV.
在一些實施例中,HOMOAS-WG係大於HOMOHC,諸如大至少0.2eV、大至少0.3eV、大至少0.5eV、大至少1eV、大至少1.5eV、或大至少2eV。 In some embodiments, the HOMO AS-WG is greater than HOMO HC , such as at least 0.2 eV large, at least 0.3 eV large, at least 0.5 eV large, at least 1 eV large, at least 1.5 eV large, or at least 2 eV large.
在一些實施例中,HOMOAS-WG係較HOMODon大超過0.2eV,諸如大超過0.3eV、大超過0.5eV、大超過1eV、大超過1.5eV、或大超過2eV。 In some embodiments, the HOMO AS-WG is greater than 0.2 eV larger than HOMO Don , such as greater than 0.3 eV, greater than 0.5 eV, greater than 1 eV, greater than 1.5 eV, or greater than 2 eV.
在一些實施例中,該至少一種陽極側寬能隙材料包括選自以下之材料:諸如N,N'-二苯基-N,N'-雙(1-萘基)-1-1'聯苯-4,4'二胺(NPD)及N,N'-雙-(3-甲基苯基)-N,N'-雙-(苯基)-聯苯胺(TPD)之四芳基-聯苯胺、三芳胺、5,10-二取代蒽、寡聚噻吩、9,9-二烷基茀及其寡聚物、9,9-二芳基茀及其寡聚物、寡伸苯基、螺-聯苯及其經取代衍生物及其衍生物。 In some embodiments, the at least one anode-side wide energy gap material includes a material selected from the group consisting of: N,N'-diphenyl-N,N'-bis(1-naphthyl)-1-1' Tetraaryl of benzene-4,4'diamine (NPD) and N,N'-bis-(3-methylphenyl)-N,N'-bis-(phenyl)-benzidine (TPD)- Benzidine, triarylamine, 5,10-disubstituted anthracene, oligothiophene, 9,9-dialkyl stilbene and its oligomer, 9,9-diaryl stilbene and its oligomer, oligophenyl , Spiro-biphenyl and its substituted derivatives and their derivatives.
可藉由採用具有足夠高的,例如,高於裝置通常操作的溫度或溫度範圍,高於裝置之最高操作溫度,高於臨限溫度值等之Tg之陽極側寬能隙材料來增加裝置之操作壽命。例如,在一些實施例中,該至少一種陽極側寬能隙包括選自以下之材料:3,3',5,5'-四[(間-吡啶基)-苯-3-基]聯苯(BP4mPy)、2,2',2"-(1,3,5-石油精三基)-參(1-苯基-1-H-苯并咪唑)(TPBi)、雙(2-甲基-8-羥基喹啉根)-4-(苯基苯醇)鋁(BAlq)、參(8-羥基-喹啉)鋁(Alq3)、參(2,4,6-三甲基-3-(吡啶-3-基)苯基)硼烷(3TPYMB)、4,40-(1,3-伸苯基)(2,6-二對-甲苯基吡啶-3,5-二甲腈)(m-MPyCN)、4,40-(1,3-伸苯基)雙(2,6-二(聯苯-4-基)吡啶-3,5-二甲腈)(m-PhPyCN)、4,40-(1,3-伸苯基)雙(2,6-二苯基吡啶-3,5-二甲腈)(m-PyCN)、6,60-(1,4-伸苯基)雙(2-苯基-4-對-甲苯基菸鹼腈)(p-PPtNN)、4,40-(1,4-伸苯基)雙(2-苯基-6-對-甲苯基菸鹼腈)(p-PPtNT)、參(6-氟- 8-羥基-喹啉)鋁(6FAlq3)、2,6-雙(4-氰基苯基)-4-苯基吡啶-3,5-二甲腈(CNPyCN)、4,40-(1,4-伸苯基)雙(2,6-二對-甲苯基吡啶-3,5-二甲腈)(p-MPyCN)、雙苯并咪唑并[2,1-a:1',2-b']蒽[2,1,9-def:6,5,10-d'e'f']二異喹啉-10,21-二酮(PTCBI)、5,10,15-三苄基-5H-二吲哚[3,2-a:3',2'-c]咔唑(TBDI)、5,10,15-三苯基-5H-二吲哚[3,2-a:3',2'-c]咔唑(TPDI)、1,3-雙[3,5-二(吡啶-3-基)苯基]苯(BmPyPhB)、1,3,5-三(間-吡啶-3-基苯基)苯、1,3,5-參(3-吡啶基-3-苯基)苯、3,3'-[5'-[3-(3-吡啶基)苯基][1,1':3',1"-聯三苯]-3,3"-二基]雙吡啶(TmPyPB)、9,9-二甲基-10-(9-苯基-9H-咔唑-3-基)-9,10-二氫吖啶(PCZAC)、3,3-二(9H-咔唑-9-基)聯苯(mCBP)、4,40-雙(三苯矽烷基)-聯苯(BSB)及其衍生物。 May have a sufficiently high by employing, for example, higher than the temperature or temperature range of the device is generally operated, the apparatus is higher than the maximum operating temperature, higher than the temperature threshold value or the like of the anode side of the wide-gap material to increase the T g of the apparatus Operating life. For example, in some embodiments, the at least one wide anode-side energy gap includes a material selected from the group consisting of: 3,3',5,5'-tetra[(m-pyridyl)-benzene-3-yl]biphenyl (BP4mPy), 2,2',2"-(1,3,5-petroleum triyl)-ginseng (1-phenyl-1-H-benzimidazole) (TPBi), bis(2-methyl -8-hydroxyquinolinate)-4-(phenylbenzyl alcohol) aluminum (BAlq), ginseng (8-hydroxy-quinoline) aluminum (Alq3), ginseng (2,4,6-trimethyl-3- (Pyridin-3-yl)phenyl)borane (3TPYMB), 4,40-(1,3-phenylene) (2,6-di-p-tolylpyridine-3,5-dicarbonitrile) ( m-MPyCN), 4,40-(1,3-phenylene)bis(2,6-bis(biphenyl-4-yl)pyridine-3,5-dicarbonitrile) (m-PhPyCN), 4 ,40-(1,3-phenylene)bis(2,6-diphenylpyridine-3,5-dicarbonitrile) (m-PyCN), 6,60-(1,4-phenylene) Bis(2-phenyl-4-p-tolylnicotinonitrile) (p-PPtNN), 4,40-(1,4-phenylene)bis(2-phenyl-6-p-tolylnicotine Basic nitrile) (p-PPtNT), ginseng (6-fluoro-8-hydroxy-quinoline) aluminum (6FAlq3), 2,6-bis(4-cyanophenyl)-4-phenylpyridine-3,5 -Dicarbonitrile (CNPyCN), 4,40-(1,4-phenylene)bis(2,6-di-p-tolylpyridine-3,5-dicarbonitrile) (p-MPyCN), bisbenzene Imidazolo[2,1-a:1',2-b']anthracene[2,1,9-def:6,5,10-d'e'f']diisoquinoline-10,21- Diketone (PTCBI), 5,10,15-tribenzyl-5H-diindole[3,2-a: 3',2'-c]carbazole (TBDI), 5,10,15-triphenyl -5H-diindole[3,2-a: 3',2'-c]carbazole (TPDI), 1,3-bis[3,5-bis(pyridin-3-yl)phenyl]benzene (BmPyPhB), 1,3,5-tris(m-pyridin-3-ylphenyl)benzene, 1,3,5-Shen(3-pyridyl-3-phenyl)benzene, 3,3'-[ 5'-[3-(3-pyridyl)phenyl][1,1': 3',1"-biphenyl]-3,3"-diyl]bispyridine (TmPyPB), 9,9- Dimethyl-10-(9-phenyl-9H-carbazol-3-yl)-9,10-dihydroacridine (PCZAC), 3,3-bis(9H-carbazol-9-yl) Benzene (mCBP), 4,40-bis(triphenylsilyl)-biphenyl (BSB) and its derivatives.
在一些實施例中,陽極側寬能隙材料之玻璃轉換溫度係等於或高於85℃、等於或高於95℃、等於或高於105℃、等於或高於115℃、等於或高於125℃、等於或高於135℃、等於或高於145℃、等於或高於155℃、等於或高於165℃、等於或高於175℃、等於或高於185℃、等於或高於195℃、等於或高於200℃、等於或高於225℃或等於或高於250℃。 In some embodiments, the glass transition temperature of the anode side wide band gap material is equal to or higher than 85°C, equal to or higher than 95°C, equal to or higher than 105°C, equal to or higher than 115°C, equal to or higher than 125 ℃, 135 ℃ or higher, 145 ℃ or higher, 155 ℃ or higher, 165 ℃ or higher, 175 ℃ or higher, 185 ℃ or higher, 185 ℃ or higher, 195 ℃ or higher , Equal to or higher than 200 ℃, equal to or higher than 225 ℃ or equal to or higher than 250 ℃.
在一些實施例中,陽極側寬能隙材料之玻璃轉換溫度係介於85至200℃之間、介於90至195℃之間、介於95至190℃之間、介於100至185℃之間、介於105至180℃之間、介於110至175℃之間、介於115至170℃之間、介於120至165℃之間。應注意可使用具有高於200℃,諸如介於200至300℃、200至275℃、200至250℃或200至225℃之間之玻璃轉換溫度之材料。 In some embodiments, the glass transition temperature of the anode side wide band gap material is between 85 and 200°C, between 90 and 195°C, between 95 and 190°C, and between 100 and 185°C Between, between 105 and 180°C, between 110 and 175°C, between 115 and 170°C, and between 120 and 165°C. It should be noted that materials having a glass transition temperature above 200°C, such as between 200 to 300°C, 200 to 275°C, 200 to 250°C, or 200 to 225°C can be used.
該裝置之操作溫度可改變且取決於許多因素諸如(例如)環境條件(例如,溫度、光強度等)及增強機構(例如,太陽能集光器)是否結合裝置使用。例如,環境溫度可根據裝置之地理位置、一年中的時間、一天中的時間等改變。類似地,光強度亦可取決於地理位置、一年中 的時間及一天中的時間以及雲覆蓋量、入射角及其他因素。因此,在一些實施例中,該陽極側寬能隙材料具有足夠高的,例如,高於裝置通常操作(例如,在正常環境條件下)的溫度或溫度範圍,高於裝置裝置在正常環境條件下之最高操作溫度等之Tg。 The operating temperature of the device can vary and depends on many factors such as, for example, environmental conditions (eg, temperature, light intensity, etc.) and whether enhancement mechanisms (eg, solar collectors) are used in conjunction with the device. For example, the ambient temperature may change according to the geographic location of the device, time of year, time of day, and so on. Similarly, light intensity can also depend on geographic location, time of year and time of day, and cloud coverage, angle of incidence, and other factors. Therefore, in some embodiments, the anode-side wide bandgap material has a sufficiently high temperature, for example, above the temperature or temperature range at which the device normally operates (eg, under normal environmental conditions), above the device under normal environmental conditions Tg under the maximum operating temperature.
在一些實施例中,太陽能集中器可與裝置整合或結合裝置使用以增加、擴大或以其他方式增強導引於裝置之光。集中器及/或其他增強機制之使用可提高裝置之操作溫度超過裝置在正常環境條件下所經歷者。因此,為增加裝置之穩定性及操作壽命,陽極側寬能隙材料可具有高於裝置在增強光照條件下所經歷的最高操作溫度之Tg。 In some embodiments, the solar concentrator may be integrated with or used in conjunction with the device to increase, expand, or otherwise enhance the light directed to the device. The use of concentrators and/or other enhancement mechanisms can increase the operating temperature of the device beyond what the device experiences under normal environmental conditions. Therefore, to increase the stability and operating life of the device, the anode-side wide energy gap material may have a Tg that is higher than the maximum operating temperature experienced by the device under enhanced light conditions.
在一些實施例中,該至少一種供體材料包括選自以下之材料:酞菁(諸如銅酞菁(CuPc)、氯鋁酞菁(ClAlPc)、錫酞菁(SnPc)、鋅酞菁(ZnPc)及其他經改質酞菁)、亞酞菁(諸如硼亞酞菁(SubPc))、萘酞菁、部花青染料、硼-二吡咯甲川(BODIPY)染料、噻吩(諸如聚(3-己基噻吩)(P3HT))、低能帶隙聚合物、聚并苯(諸如并五苯及并四苯)、二茚并苝(DIP)、方酸(SQ)染料、四苯基二苯并二茚并芘(DBP;tetraphenyldibenzoperiflanthene)及其衍生物。方酸供體材料之實例包括(但不限於)2,4-雙[4-(N,N-二丙基胺基)-2,6-二羥基苯基]方酸、2,4-雙[4-(N,N-二異丁基胺基)-2,6-二羥基苯基]方酸、2,4-雙[4-(N,N-二苯基胺基)-2,6-二羥基苯基]方酸(DPSQ)。 In some embodiments, the at least one donor material includes a material selected from the group consisting of phthalocyanine (such as copper phthalocyanine (CuPc), chloroaluminum phthalocyanine (ClAlPc), tin phthalocyanine (SnPc), zinc phthalocyanine (ZnPc ) And other modified phthalocyanines), subphthalocyanines (such as boron subphthalocyanine (SubPc)), naphthalocyanine, merocyanine dyes, boron-dipyrrolidine (BODIPY) dyes, thiophenes (such as poly(3- (Hexylthiophene) (P3HT)), low-energy band gap polymer, polyacene (such as pentacene and tetracene), diindenoperylene (DIP), squaric acid (SQ) dye, tetraphenyldibenzodiene Indenopyrene (DBP; tetraphenyldibenzoperiflanthene) and its derivatives. Examples of squaric acid donor materials include, but are not limited to, 2,4-bis[4-(N,N-dipropylamino)-2,6-dihydroxyphenyl]squaric acid, 2,4-bis [4-(N,N-diisobutylamino)-2,6-dihydroxyphenyl] squaric acid, 2,4-bis[4-(N,N-diphenylamino)-2, 6-dihydroxyphenyl] squaric acid (DPSQ).
在一些實施例中,該至少一種電洞傳導材料包括選自以下之材料:酞菁(諸如銅酞菁(CuPc)、氯鋁酞菁(ClAlPc)、錫酞菁(SnPc)、鋅酞菁(ZnPc)及其他經改質酞菁)、亞酞菁(諸如硼亞酞菁(SubPc))、萘酞菁、部花青染料、硼-二吡咯甲川(BODIPY)染料、噻吩(諸如聚(3-己基噻吩)(P3HT))、低能帶隙聚合物、聚并苯(諸如并五苯及并四苯)、二茚并苝(DIP)、方酸(SQ)染料、四苯基二苯并二茚并芘(DBP)及其衍生物。方酸供體材料之實例包括(但不限於)2,4-雙[4-(N,N-二丙 基胺基)-2,6-二羥基苯基]方酸、2,4-雙[4-(N,N-二異丁基胺基)-2,6-二羥基苯基]方酸、2,4-雙[4-(N,N-二苯基胺基)-2,6-二羥基苯基]方酸(DPSQ)。 In some embodiments, the at least one hole conductive material includes a material selected from the group consisting of phthalocyanine (such as copper phthalocyanine (CuPc), chloroaluminum phthalocyanine (ClAlPc), tin phthalocyanine (SnPc), zinc phthalocyanine ( ZnPc) and other modified phthalocyanines), subphthalocyanines (such as boron subphthalocyanine (SubPc)), naphthalocyanine, merocyanine dyes, boron-dipyrrolidine (BODIPY) dyes, thiophenes (such as poly(3 -Hexylthiophene) (P3HT)), low-energy band gap polymer, polyacene (such as pentacene and tetracene), diindenoperylene (DIP), squaric acid (SQ) dye, tetraphenyldibenzo Diindenopyrene (DBP) and its derivatives. Examples of squaric acid donor materials include (but are not limited to) 2,4-bis[4-(N,N-dipropylene Aminoamino)-2,6-dihydroxyphenyl] squaric acid, 2,4-bis[4-(N,N-diisobutylamino)-2,6-dihydroxyphenyl] squaric acid, 2,4-bis[4-(N,N-diphenylamino)-2,6-dihydroxyphenyl] squaric acid (DPSQ).
在一些實施例中,該至少一種供體材料及該至少一種電洞傳導材料包括相同的材料。在一些實施例中,該至少一種供體材料及該至少一種電洞傳導材料包括不同的材料。 In some embodiments, the at least one donor material and the at least one hole conducting material include the same material. In some embodiments, the at least one donor material and the at least one hole conductive material include different materials.
在一些實施例中,該混合物包含比值範圍自約10:1至1:10(以體積計)(諸如約8:1至1:8(以體積計)、約6:1至1:6(以體積計)、約4:1至1:4(以體積計)、或約2:1至1:2(以體積計))之至少一種陽極側寬能隙材料及至少一種電洞傳導材料。在某些實施例中,該比值為約1:1。應明瞭所指出的比值包括整數及非整數值。 In some embodiments, the mixture comprises a ratio ranging from about 10:1 to 1:10 (by volume) (such as about 8:1 to 1:8 (by volume), about 6:1 to 1:6 ( By volume), about 4:1 to 1:4 (by volume), or about 2:1 to 1:2 (by volume)) of at least one anode-side wide bandgap material and at least one hole conducting material . In some embodiments, the ratio is about 1:1. It should be understood that the indicated ratios include integer and non-integer values.
在一些實施例中,裝置進一步包括至少一個配置在激子障蔽性電洞濾波器與陽極之間之額外緩衝層或覆蓋層。 In some embodiments, the device further includes at least one additional buffer layer or cover layer disposed between the exciton-barrier hole filter and the anode.
本文所揭示之有機光敏性光電子裝置可生長或置於提供所欲結構性質之任何基板上。因此,在一些實施例中,裝置進一步包括基板。例如,基板可係撓性或剛性、平坦或非平坦。基板可為透明、半透明或不透明。基板可具反射性。塑料、玻璃、金屬及石英為剛性基板材料之實例。塑料及金屬箔及薄玻璃為撓性基板材料之實例。基板之材料及厚度可經選擇以獲得所欲結構及光學性質。 The organic photosensitive optoelectronic devices disclosed herein can be grown or placed on any substrate that provides the desired structural properties. Therefore, in some embodiments, the device further includes a substrate. For example, the substrate may be flexible or rigid, flat or non-flat. The substrate may be transparent, translucent or opaque. The substrate can be reflective. Plastic, glass, metal and quartz are examples of rigid substrate materials. Plastic and metal foils and thin glass are examples of flexible substrate materials. The material and thickness of the substrate can be selected to obtain the desired structure and optical properties.
本發明之有機光敏性光電子裝置可作為(例如)PV裝置,諸如太陽能電池、光偵測器或光電導體。 The organic photosensitive optoelectronic device of the present invention can be used as, for example, a PV device such as a solar cell, a photodetector, or a photoconductor.
當本文所述之有機光敏性光電子裝置係用作PV裝置時,例如可選擇用於光傳導有機層之材料及其厚度,以最佳化裝置之外部量子效率。例如,可選擇適宜的厚度以達成裝置中之所欲光學間距及/或減低裝置中之電阻。當本文所述之有機光敏性光電子裝置係用作光偵測器或光導體時,例如可選擇用於光傳導有機層之材料及其厚度,以最 大化裝置對所需光譜區之敏感性。 When the organic photosensitive optoelectronic device described herein is used as a PV device, for example, the material and thickness of the light-conducting organic layer can be selected to optimize the external quantum efficiency of the device. For example, a suitable thickness can be selected to achieve the desired optical pitch in the device and/or to reduce the resistance in the device. When the organic photosensitive optoelectronic device described herein is used as a photodetector or photoconductor, for example, the material and thickness of the light-conducting organic layer can be selected Maximize the sensitivity of the device to the desired spectral region.
此外,裝置可進一步包括至少一個平滑層。平滑層可(例如)位於光活性層與任一個或兩個電極之間。包含3,4-聚伸乙二氧基噻吩:聚苯乙烯磺酸鹽(PEDOT:PSS)之膜為平滑層之一個實例。 In addition, the device may further include at least one smoothing layer. The smoothing layer may, for example, be located between the photoactive layer and either or both electrodes. A film containing 3,4-polyethylenedioxythiophene: polystyrene sulfonate (PEDOT: PSS) is an example of a smoothing layer.
本發明之有機光敏性光電子裝置可作為包括兩個或更多個子電池之串聯式裝置存在。子電池如本文中所用意指包括至少一個供體-受體異質接面之裝置之組件。當子電池係個別地用作光敏性光電子裝置時,其通常包括一完整的電極組。串聯式裝置可包括電荷轉移材料、電極或電荷複合材料或介於串聯式供體-受體異質接面之間之隧道接面。在一些串聯式組態中,相鄰子電池可利用共同的(亦即,共用的)電極、電荷轉移區域或電荷複合區域。在其他情況中,相鄰子電池不共用共同電極或電荷轉移區域。該等子電池可以並聯或串聯方式電連接。 The organic photosensitive optoelectronic device of the present invention can exist as a tandem device including two or more sub-cells. A sub-battery as used herein means a component of a device that includes at least one donor-acceptor heterojunction. When a sub-cell is used individually as a photosensitive optoelectronic device, it usually includes a complete set of electrodes. Tandem devices can include charge transfer materials, electrodes or charge composites or tunnel junctions between tandem donor-acceptor heterojunctions. In some tandem configurations, adjacent sub-cells may utilize a common (ie, shared) electrode, charge transfer region, or charge recombination region. In other cases, adjacent sub-cells do not share a common electrode or charge transfer area. The sub-cells can be electrically connected in parallel or in series.
在一些實施例中,電荷轉移層或電荷複合層可選自Al、Ag、Au、MoO3、Li、LiF、Sn、Ti、WO3、氧化銦錫(ITO)、氧化錫(TO)、氧化鎵銦錫(GITO)、氧化鋅(ZO)或氧化鋅銦錫(ZITO)。在另一個實施例中,電荷轉移層或電荷複合層可包含金屬奈米簇、奈米顆粒或奈米棒(nanorod)。 In some embodiments, the charge transfer layer or the charge recombination layer may be selected from Al, Ag, Au, MoO 3 , Li, LiF, Sn, Ti, WO 3 , indium tin oxide (ITO), tin oxide (TO), oxide Gallium indium tin (GITO), zinc oxide (ZO) or zinc indium tin oxide (ZITO). In another embodiment, the charge transfer layer or the charge recombination layer may include metal nanoclusters, nanoparticles, or nanorods.
根據另一個實施例,本發明之裝置可包括如本文所述配置在包括兩個或更多個子電池之裝置之第一子電池與第二子電池之間之激子障蔽性電荷載體濾波器。例如,圖29中顯示根據本發明之有機串聯式光敏性光電子裝置的示意圖。電極110包括陽極或陰極。在電極110包括陰極之情況下,電極140包括陽極。在電極110包括陽極之情況下,電極140包括陰極。該等串聯式裝置包括兩個光活性區域150及160。該等區域之各者可包括供體及受體有機材料以形成如本文所述之供體-受體異質接面。
According to another embodiment, the device of the present invention may include an exciton-barrier charge carrier filter configured between the first sub-cell and the second sub-cell of the device including two or more sub-cells as described herein. For example, FIG. 29 shows a schematic diagram of an organic tandem photosensitive optoelectronic device according to the present invention. The
在圖29之裝置A中,層115可係如本文所述之激子障蔽性電子濾波器。在一些實施例中,層115可係如本文所述之激子障蔽性電洞濾波器。層115配置在子電池之光活性區域150與160之間。又於其他實施例中,如圖29之裝置B所描繪,串聯式裝置可包括額外激子障蔽性電荷載體濾波器。例如,串聯式光敏性裝置可包括兩個配置在子電池之間之電荷載體濾波器。在此組態中,假若激子障蔽性電荷濾波器115為激子障蔽性電洞濾波器,則激子障蔽性電荷濾波器135為激子障蔽性電子濾波器,及反之亦然。該串聯式裝置亦可進一步包括配置在光活性區域與電極之間,諸如,配置在光活性區域150與電極140之間之激子障蔽性電荷載體濾波器。
In device A of FIG. 29,
雖然未在圖29中顯示,但裝置A及B可進一步包括一額外的配置在子電池之間之間隔層。該間隔層可包括至少一個電極、至少一個電荷轉移層或至少一個電荷複合層。例如,在裝置A中,該間隔層可配置在激子障蔽性電荷濾波器115與光活性區域150或光活性區域160中任一者之間,且可視情況與激子障蔽性電荷濾波器115相鄰。在一些實施例中,該間隔層為如相關技術中已知或以其他方式述於本文中之電荷復合層。
Although not shown in FIG. 29, devices A and B may further include an additional spacer layer disposed between the sub-cells. The spacer layer may include at least one electrode, at least one charge transfer layer, or at least one charge recombination layer. For example, in the device A, the spacer layer may be disposed between the exciton-
作為另一實例,在裝置B中,該間隔層可配置在激子障蔽性電荷濾波器115與激子障蔽性電荷濾波器135之間,且可視情況與層115及135中之任一者或兩個相鄰。在一些實施例中,該間隔層為如相關技術中已知或以其他方式述於本文中之電荷複合層。
As another example, in device B, the spacer layer may be disposed between exciton-
為了說明,在圖29之裝置A中,假若電荷複合層配置在層115與光活性區域150之間且當電極110包括陰極時,層115可係障蔽激子且自光活性區域160傳導電洞至電荷複合層之激子障蔽性電洞濾波器。
To illustrate, in the device A of FIG. 29, if the charge recombination layer is disposed between the
或者,在相同組態中,除了當電極110為陽極時之外,層115可係障蔽激子且自光活性區域160傳導電子至電荷複合層之激子障蔽性電
子濾波器。
Or, in the same configuration, except when the
串聯式裝置亦可包括兩個或更多個如圖29之裝置B所描繪配置在子電池之間之激子障蔽性電荷濾波器。假若電荷複合層配置在層115與135之間,當電極110包括陰極時,層135可為障蔽激子且自光活性區域160傳導電洞至電荷複合層之激子障蔽性電洞濾波器。層115可為障壁激子且自光活性區域150傳導電子至電荷複合層之激子障蔽性電子濾波器。
The series device may also include two or more exciton-barrier charge filters arranged between the sub-cells as depicted in device B of FIG. 29. If the charge recombination layer is disposed between the
或者,在相同組態中,除了當電極110為陽極時之外,層135可為障壁激子且自光活性區域160傳導電子至電荷複合層之激子障蔽性電子濾波器。層115可為障壁激子且自光活性區域150傳導電洞至電荷複合層之激子障蔽性電洞濾波器。
Alternatively, in the same configuration, except when the
本發明之一個優點為該激子障蔽性電荷載體濾波器可能因其等採用寬能隙材料而呈透明。藉由將透明寬能隙材料與電子或電洞傳導材料混合,該電子或電洞傳導材料可充分地稀釋,使得激子障蔽性電荷載體濾波器在相關波長下透明。激子障蔽性電荷載體濾波器在其允許相關波長之入射電磁輻射之至少50%透射透過其時被稱為「透明」。在一些實施例中,該等濾波器允許相關波長之入射電磁輻射之至少60%、至少70%、至少80%、至少90%或約100%透射透過其。電荷載體濾波器在其吸收極少(<1%)的相關波長之電磁輻射時被稱為光學損失。 An advantage of the present invention is that the exciton-barrier charge carrier filter may be transparent due to the use of a wide band gap material. By mixing a transparent wide band gap material with an electron or hole conductive material, the electron or hole conductive material can be sufficiently diluted to make the exciton-barrier charge carrier filter transparent at the relevant wavelength. An exciton-blocking charge carrier filter is called "transparent" when it allows at least 50% of incident electromagnetic radiation of the relevant wavelength to pass through it. In some embodiments, the filters allow at least 60%, at least 70%, at least 80%, at least 90%, or about 100% of incident electromagnetic radiation of relevant wavelengths to transmit therethrough. Charge carrier filters are called optical losses when they absorb very little (<1%) electromagnetic radiation of the relevant wavelength.
在各種不同實施例中,該等裝置可採用一或多個較佳整個可見光譜中透明之緩衝層。例如,電荷收集/傳輸緩衝層可配置在光活性區域與對應之電極之間。例如,電荷收集/傳輸緩衝層亦可配置在間隔層與光活性區域之間。在某些實施例中,該等電荷收集/傳輸層包含選自金屬氧化物之材料。在某些實施例中,金屬氧化物係選自MoO3、V2O5、ZnO及TiO2。 In various embodiments, these devices may employ one or more buffer layers that are preferably transparent throughout the visible spectrum. For example, the charge collection/transport buffer layer may be disposed between the photoactive region and the corresponding electrode. For example, the charge collection/transport buffer layer can also be disposed between the spacer layer and the photoactive region. In some embodiments, the charge collection/transport layers include materials selected from metal oxides. In some embodiments, the metal oxide is selected from MoO 3 , V 2 O 5 , ZnO, and TiO 2 .
可利用相關技術中已知之技術來沉積層及材料。例如,本文所述之層及材料可自溶液、蒸氣或二者之組合來沉積或共沉積。在一些實施例中,有機材料或有機層可透過溶液處理(諸如藉由一或多種選自旋轉塗佈、旋轉澆鑄、噴霧塗佈、浸漬塗佈、刮刀式、噴墨印刷或轉移印刷之技術)來沉積或共沉積。 Layers and materials can be deposited using techniques known in the related art. For example, the layers and materials described herein can be deposited or co-deposited from solution, vapor, or a combination of both. In some embodiments, the organic material or organic layer can be treated by solution (such as by one or more techniques selected from spin coating, spin casting, spray coating, dip coating, doctor blade, inkjet printing, or transfer printing ) To deposit or co-deposit.
在其他實施例中,有機材料可利用真空蒸鍍(諸如真空熱蒸鍍、有機氣相沉積或有機蒸氣噴射印刷)來沉積或共沉積。 In other embodiments, the organic material may be deposited or co-deposited using vacuum evaporation (such as vacuum thermal evaporation, organic vapor deposition, or organic vapor jet printing).
包括材料之混合物之本發明之激子障蔽性電荷載體濾波器可藉由改變沉積條件來製造。例如,可藉由改變各材料之沉積速率來控制混合物中各材料之濃度。 The exciton-barrier charge carrier filter of the present invention including a mixture of materials can be manufactured by changing the deposition conditions. For example, the concentration of each material in the mixture can be controlled by changing the deposition rate of each material.
應明瞭本文所述之實施例可結合多種結構使用。功能性有機光伏打裝置可基於設計、性能及成本因素藉由以不同方式組合所述各種層來獲得,或可完全省略層。亦可包括未明確說明之其他層。可使用除彼等明確說明者外之材料。本文中針對各種層所給定的名稱並不欲具嚴格限制性。 It should be understood that the embodiments described herein may be used in combination with various structures. Functional organic photovoltaic devices can be obtained by combining the various layers in different ways based on design, performance, and cost factors, or the layers can be omitted altogether. It may also include other layers that are not explicitly stated. Materials other than those explicitly stated may be used. The names given for the various layers in this article are not intended to be strictly restrictive.
除了在實例中或另外指出之處之外,應瞭解用於本說明書及申請專利範圍中之所有表示成分量、反應條件、分析測量等等的數值在所有實例中均由術語「約」修飾。因此,除非有相反指示,否則陳述於本說明書及隨附申請專利範圍中之數值參數為可隨本發明企圖獲得之期望特性變化之近似值。至少而非嘗試限制均等論應用於申請專利範圍之範疇,應根據有效位數的個數及尋常捨入法來解釋各數值參數。 Except in the examples or where otherwise indicated, it should be understood that all numerical values used in this specification and in the scope of patent applications that indicate ingredient amounts, reaction conditions, analytical measurements, etc., are modified by the term "about" in all examples. Therefore, unless indicated to the contrary, the numerical parameters stated in the scope of this specification and the accompanying patent applications are approximate values that can vary with the desired characteristics that the present invention attempts to obtain. At least instead of trying to limit the scope of equality applied to the scope of patent applications, the numerical parameters should be interpreted according to the number of significant digits and the usual rounding method.
儘管陳述本發明廣泛範圍之數值範圍及參數為近似值,然而除非另外指出,否則述於具體實例中之數值係儘可能精確地報告。然而,任何數值固有地包含必然由其各別試驗測量中存在的標準差所導致之特定誤差。 Although the numerical ranges and parameters stating the broad scope of the present invention are approximate values, unless stated otherwise, the numerical values stated in the specific examples are reported as accurately as possible. However, any numerical value inherently contains a specific error necessarily caused by the standard deviation present in its respective test measurement.
本文所述之裝置及方法將進一步由僅欲作為示例之以下非限制性實例來說明。 The devices and methods described herein will be further illustrated by the following non-limiting examples that are intended only as examples.
實例1Example 1
將C60及浴銅靈(BCP)以不同濃度混合而形成激子障蔽性電子濾波器。BCP為相較於C60(1.86eV單重態,1.55eV三重態)及LUMO(-1.6eV)具有較高單重態(3.17eV)及三重態(2.62eV)能量之寬能隙材料,使得BCP為惰性摻雜劑且同時阻止能量及電子自C60轉移。經摻雜C60:BCP膜有效地障蔽激子,同時仍傳導電子。基於該等性質,施加經摻雜膜作為緩衝層/濾波器,而獲得相較於具有其他緩衝物之裝置經改良之裝置性能。 C 60 and Yutongling (BCP) were mixed in different concentrations to form an exciton-blocking electronic filter. BCP is a wide band gap material with higher singlet (3.17eV) and triplet (2.62eV) energy than C 60 (1.86eV singlet, 1.55eV triplet) and LUMO (-1.6eV), making BCP It is an inert dopant and prevents the transfer of energy and electrons from C 60 at the same time. The doped C 60 :BCP film effectively blocks excitons while still conducting electrons. Based on these properties, applying the doped film as a buffer layer/filter results in improved device performance compared to devices with other buffers.
藉由製造不同體積比之C60:BCP膜來研究BCP摻雜對富勒烯吸收之影響。純淨及經摻雜C60膜之吸收光譜顯示於圖2中。當C60之分率減少時,吸收減低且接近BCP之吸收。然而,分別對應於弗倫克爾及電荷轉移(CT)激子之於340nm及450nm處之兩個吸收峰之衰減呈現如圖2之插圖中所描繪之相當不同的速率。於340nm下之許可弗倫克爾躍遷之消光係數已如比爾定律(Beer's law)所預測與C60分率以線性衰減擬合,反映此躍遷之單分子性質。有趣地,於450nm下之分子間CT吸收之消光係數呈現指數衰減且經擬合成等式α=x2.7,其中x為C60體積分率。此意指CT激子之形成涉及2至3個分子。C60:BCP膜之吸收光譜顯示摻雜濃度對CT激子呈現顯著影響,即使在中度的摻雜水平下亦會抑制其形成。 The effect of BCP doping on fullerene absorption was studied by manufacturing C 60 :BCP films with different volume ratios. The absorption spectrum of the pure and doped C 60 film is shown in FIG. 2. When the fraction of C 60 decreases, absorption decreases and approaches BCP absorption. However, the attenuation of the two absorption peaks at 340 nm and 450 nm corresponding to Frenkel and Charge Transfer (CT) excitons exhibits quite different rates as depicted in the inset of FIG. 2. The extinction coefficient of the permitted Frenkel transition at 340 nm has been linearly fitted to the C 60 fraction as predicted by Beer's law, reflecting the single-molecule nature of this transition. Interestingly, the extinction coefficient of intermolecular CT absorption at 450 nm exhibits an exponential decay and is fitted to the equation α = x 2.7 , where x is the C 60 volume fraction. This means that the formation of CT excitons involves 2 to 3 molecules. C 60 : The absorption spectrum of the BCP film shows that the doping concentration has a significant effect on CT excitons, even at moderate doping levels it will inhibit its formation.
實例2Example 2
如下製造裝置:用肥皂清潔經塗覆圖案化ITO(圖案化條帶的寬度為2mm,厚度=150±10nm;薄片電阻=20±5Ω cm-2;於550nm下之透射率84%;Thin Film Devices,Inc.提供)之玻璃基板及在四氯乙烯、丙 酮及丙醇中煮沸(各5min)。緊接於負載至高度真空腔室中之前將ITO基板暴露於臭氧氛圍(UVOCS T10X10/OES)歷時10min。純淨材料之層之沉積速率如下:MoOx(0.02nm/s)、NPD(0.1nm/s)、C60(0.1nm/s)、BCP(0.1nm/s)及Al(0.2nm/s)。經摻雜膜之沉積速率(C60:BCP體積含量)如下:C60:BCP(2:1)-共沉積C60(0.08nm/s):BCP(0.04nm/s);C60:BCP(1:1)-共沉積C60(0.06nm/s):BCP(0.06nm/s);C60:BCP(1:2)-共沉積C60(0.04nm/s):BCP(0.08nm/s)。於有機物沉積之後,於N2下將具有2mm條帶寬度之遮罩置於基板之上,及沉積100nm之Al陰極。裝置之面積為4mm2。 The manufacturing device is as follows: clean the coated patterned ITO with soap (the width of the patterned strip is 2mm, thickness = 150±10nm; sheet resistance=20±5Ω cm -2) ; the transmittance at 550nm is 84%; Thin Film Devices, Inc.) glass substrate and boiled in tetrachloroethylene, acetone and propanol (5 min each). The ITO substrate was exposed to an ozone atmosphere (UVOCS T10X10/OES) for 10 min immediately before being loaded into the high vacuum chamber. The deposition rate of the pure material layer is as follows: MoO x (0.02nm/s), NPD (0.1nm/s), C 60 (0.1nm/s), BCP (0.1nm/s) and Al (0.2nm/s) . The deposition rate of the doped film (C 60 : BCP volume content) is as follows: C 60 : BCP (2:1)-co-deposited C 60 (0.08 nm/s): BCP (0.04 nm/s); C 60 : BCP (1:1)-Co-deposited C 60 (0.06nm/s): BCP (0.06nm/s); C 60 : BCP (1: 2)-Co-deposited C 60 (0.04nm/s): BCP (0.08nm /s). After the organics were deposited, a mask with a strip width of 2 mm was placed on the substrate under N 2 and an Al cathode of 100 nm was deposited. The area of the device is 4mm 2 .
為觀察來自C60之明確的光響應,製得使用寬能隙電洞傳輸材料N,N'-二-[(1-萘基)-N,N'-二苯基]-1,1'-聯苯)-4,4'-二胺(NPD)作為供體之具有圖3所說明結構之雙層裝置。於D/A界面處之C60之純淨層係要保持電荷分離之熱力學及動力學,以致在裝置之間觀察到的所有變化將係與整體經摻雜膜相關,而非與界面效應相關。 In order to observe the definite optical response from C 60 , a wide band gap hole transmission material N,N'-di-[(1-naphthyl)-N,N'-diphenyl]-1,1' was prepared -Biphenyl)-4,4'-diamine (NPD) as a donor, a double-layer device having the structure illustrated in FIG. 3. The pure layer of C 60 at the D/A interface maintains the thermodynamics and kinetics of charge separation, so that all changes observed between devices will be related to the overall doped film, not to interface effects.
在具有1個太陽光強度(100mW/cm2)之模擬AM1.5G照明下之電流-電壓(J-V)特徵及裝置之外部量子效率(EQE)曲線顯示於圖3中。隨著C60:BCP層之摻雜濃度自1:0增加至1:2,短路電流(Jsc)從3.0±0.1mA/cm2減小1.7mA/cm2變為1.3±0.1mA/cm2,如表1所顯示。此減小係歸因於如反映在EQE測量中的C60光響應之下降,同時開路(VOC)大致維持不變地為0.87±0.01,及填充因子(FF)隨著C60分率之減少而從0.45±0.01增加至0.49±0.01。EQE響應之下降與經摻雜C60膜之吸收特性之間有很好的相關性,其中相較於在短於400nm之波長下之響應,介於400nm及550nm之間之響應之減低更為快速地發生。藉由比較D1及D2可最為清楚地觀察CT激子之影響。在該等裝置中,於350nm下之EQE響應維持不變,而於450nm下之EQE響應自23%減低大約三分之一至15.5%。 The current-voltage (JV) characteristics under simulated AM1.5G illumination with 1 solar light intensity (100 mW/cm 2 ) and the external quantum efficiency (EQE) curve of the device are shown in FIG. 3. As the doping concentration of the C 60 :BCP layer increases from 1:0 to 1:2, the short-circuit current (J sc ) decreases from 3.0±0.1mA/cm 2 by 1.7mA/cm 2 to 1.3±0.1mA/cm 2 as shown in Table 1. This decrease is due to the decrease in the C 60 optical response as reflected in the EQE measurement, while the open circuit (V OC ) remains approximately unchanged at 0.87±0.01, and the fill factor (FF) varies with the C 60 fraction Decrease and increase from 0.45±0.01 to 0.49±0.01. There is a good correlation between the decrease in the EQE response and the absorption characteristics of the doped C 60 film, where the decrease in the response between 400 nm and 550 nm is more significant than the response at a wavelength shorter than 400 nm It happens quickly. The effect of CT excitons can be observed most clearly by comparing D1 and D2. In these devices, the EQE response at 350 nm remains unchanged, while the EQE response at 450 nm is reduced from 23% by approximately one-third to 15.5%.
觀察到光響應隨著混合層中BCP摻雜濃度之增加而減低係與Menke等人,J.Nat.Mater.2012中以寬能隙材料UGH2稀釋SubPc導致光電流顯著增加之彼等形成鮮明的對比。就SubPc之情況而言,Menke證實光電流之增加係歸因於由存在佛洛斯特半徑(Forster radius)較平均分子分離距離增加地更為快速之濃度範圍的事實所引起之激子擴散長度之增加。擴散長度之增加係歸因於光致發光效率、激發態壽命及光譜重疊積分之增加及經摻雜膜中非輻射衰減速率之減低。該等結果之間之對比可藉由檢視兩種系統中所涉及激子之來源來解釋。在SubPc中,形成單分子佛洛斯特激子。在稀釋時,吸收之損失為線性,而激子擴散長度之增加係指數型。反之,於C60中,形成顯著數量的多分子CT激子。在稀釋時,此導致CT激子形成之指數衰減,其超過擴散長度之任何增加。歸因於C60中之CT吸收特徵存於高太陽照射度區域中之事實,裝置之總體性能減低。 It is observed that the photoresponse decreases with the increase of the BCP doping concentration in the mixed layer, which is distinct from Menke et al., J. Nat. Mater. 2012, where the dilution of SubPc with a wide bandgap material UGH2 resulted in a significant increase in photocurrent. Compared. In the case of SubPc, Menke confirmed that the increase in photocurrent is attributable to the exciton diffusion length caused by the fact that there is a concentration range where the Forster radius increases faster than the average molecular separation distance. increase. The increase in diffusion length is due to the increase in photoluminescence efficiency, excited state lifetime and spectral overlap integral and the decrease in the rate of non-radiative attenuation in the doped film. The comparison between these results can be explained by examining the sources of excitons involved in the two systems. In SubPc, single molecule Frost excitons are formed. At dilution, the absorption loss is linear, and the increase in exciton diffusion length is exponential. Conversely, in C 60 , a significant number of multimolecular CT excitons are formed. At dilution, this leads to an exponential decay of CT exciton formation, which exceeds any increase in diffusion length. Due to the fact that the CT absorption features in C 60 are present in areas of high solar exposure, the overall performance of the device is reduced.
雖然混合裝置具有較低的光電流,但該等裝置之VOC維持不變,顯示保留D/A界面可達成其所欲效應。在C60稀釋時FF未減低之事實指示混合膜可有效率地傳輸電子。未改變的Voc及FF之增加與Jsc之減低組合導致於稀釋時功率轉換效率(η)自1.14%(D1)下降大於50%變為0.56%(D4)。然而,混合膜之透明度增加及有效率的電荷傳輸使C60:BCP膜成為緩衝層之吸引人的候選物。 Although hybrid devices have lower photocurrents, the V OC of these devices remains unchanged, showing that retaining the D/A interface can achieve its desired effect. The fact that FF did not decrease at the time of C 60 dilution indicates that the hybrid membrane can efficiently transfer electrons. The combination of the unchanged increase in V oc and FF and the decrease in J sc results in the power conversion efficiency (η) at dilution decreasing from 1.14% (D1) by more than 50% to 0.56% (D4). However, the increased transparency and efficient charge transport of hybrid films make C 60 :BCP films an attractive candidate for buffer layers.
實例3Example 3
圖4所顯示之裝置係依照揭示於實例2中之製造方法製得。圖4顯示裝置於1個太陽光AM1.5 G照明下之J-V曲線及外部量子效率成波長函數之圖,插圖中為裝置結構。(x=10nm(D7),20nm(D6),及30nm(D5))。表2提供此裝置之性能數據。 The device shown in FIG. 4 was manufactured according to the manufacturing method disclosed in Example 2. Figure 4 shows the device's J-V curve and external quantum efficiency as a function of wavelength under 1 sunlight AM1.5 G illumination. The illustration shows the device structure. (x=10nm (D7), 20nm (D6), and 30nm (D5)). Table 2 provides performance data for this device.
實例4Example 4
圖5所顯示之裝置係依照揭示於實例2中之製造方法製得。圖5顯示裝置於1個太陽光AM1.5G照明下之J-V曲線及外部量子效率成波長函數之圖,插圖中為裝置結構。(x=0nm(D8)、20nm(D9)及40nm(D10))。表3提供此裝置之性能數據。 The device shown in FIG. 5 was manufactured according to the manufacturing method disclosed in Example 2. Fig. 5 shows the device's J-V curve and external quantum efficiency as a function of wavelength under one AM1.5G illumination. The illustration shows the device structure. (x=0nm (D8), 20nm (D9) and 40nm (D10)). Table 3 provides performance data for this device.
實例5Example 5
製得圖6(底部插圖)所顯示之OPV裝置。利用紅色吸收供體(2,4-雙[4-(N,N-二苯基胺基)-2,6-二羥基苯基]方酸)(DPSQ)製得夾在兩個C60層(一個層為x35nm厚及另一層為[40nm-x]厚)之間之包含10nm厚BCP:C60層之OPV。純淨C60及BCP:C60膜之總厚度為50nm。圖6顯示x=5nm至35nm之裝置D20-D23之J-V及EQE特徵,其他性能參數提供於表4中。JSC隨著BCP:C60層移向D/A界面(亦即,隨著x減小)自 6.2±0.3mA/cm2減小至4.1±0.2mA/cm2。此趨勢於EQE光譜中亦明顯,其中來自C60之響應隨著與D/A界面相鄰的純淨C60層之厚度之減小(表4中的D20至D23)而減低。該等數據顯示BCP:C60防止於與金屬電極相鄰的C60膜中產生之激子擴散至D/A界面,在該D/A界面處可發生解離形成自由電荷。相對地,如由恆定及高FF=0.72±0.01及Voc=0.94±0.01V推斷得,混合層不阻礙電荷傳輸。與D/A界面相鄰的C60層之厚度自x=5nm增加至35nm使得於1個太陽光、AM 1.5G照明下之功率轉換效率自2.7±0.1%增加至4.1±0.1%。 The OPV device shown in Figure 6 (bottom inset) was produced. The red absorption donor (2,4-bis[4-(N,N-diphenylamino)-2,6-dihydroxyphenyl] squaric acid) (DPSQ) was made sandwiched between two C 60 layers (One layer is x OPV between 35nm thick and another layer [40nm-x] thick) including 10nm thick BCP: C 60 layer. Pure C 60 and BCP: The total thickness of the C 60 film is 50 nm. Figure 6 shows the JV and EQE characteristics of devices D20-D23 with x=5nm to 35nm. Other performance parameters are provided in Table 4. With the BCP:C 60 layer, the J SC moves to the D/A interface (that is, as x decreases) from 6.2±0.3 mA/cm 2 to 4.1±0.2 mA/cm 2 . This trend is also evident in the EQE spectrum, where the response from C 60 decreases as the thickness of the pure C 60 layer adjacent to the D/A interface decreases (D20 to D23 in Table 4). These data show that BCP:C 60 prevents excitons generated in the C 60 film adjacent to the metal electrode from diffusing to the D/A interface where dissociation can occur to form free charges. In contrast, as inferred from constant and high FF=0.72±0.01 and Voc =0.94±0.01V, the mixed layer does not hinder charge transfer. The thickness of the C 60 layer adjacent to the D/A interface increased from x=5nm to 35nm, which increased the power conversion efficiency under 1 sunlight and AM 1.5G illumination from 2.7±0.1% to 4.1±0.1%.
實例6Example 6
圖7所顯示之裝置係依照揭示於實例2中之製造方法製得。圖7顯示裝置於1個太陽光AM1.5G照明下之J-V曲線,其中插圖顯示裝置之特徵,及外部量子效率成波長之函數,其中插圖顯示裝置結構。該等裝置比較經覆蓋其他層以增進電荷聚集之混合緩衝層與單一純淨PTCBI緩衝層之性能。 The device shown in FIG. 7 was manufactured according to the manufacturing method disclosed in Example 2. Fig. 7 shows the J-V curve of the device under the illumination of 1 sunlight AM1.5G, in which the inset shows the characteristics of the device, and the external quantum efficiency as a function of wavelength, in which the inset shows the structure of the device. These devices compare the performance of mixed buffer layers and single pure PTCBI buffer layers that are covered with other layers to improve charge accumulation.
實例7Example 7
圖8所顯示之裝置係依照揭示於實例2中之製造方法製得。圖8顯示不同緩衝層針對零偏壓下之EQE標準化之於外加偏壓(+0.5V虛線,-1V實線)下之外部量子效率。該等數據顯示該混合緩衝層減低裝置之偏壓相依性,說明活性層/緩衝物界面處之電荷積聚減少,因此減少激子-極化子淬滅的量。 The device shown in FIG. 8 was manufactured according to the manufacturing method disclosed in Example 2. Fig. 8 shows the external quantum efficiency of different buffer layers for EQE normalization under zero bias under applied bias (+0.5V dashed line, -1V solid line). These data show that the hybrid buffer layer reduces the bias dependence of the device, indicating that the charge accumulation at the active layer/buffer interface is reduced, thus reducing the amount of exciton-polaron quenching.
實例8Example 8
混合層障蔽激子之機制可以統計方式來思考,其中可於經摻雜層中獲得之能態密度之減低使激子轉移速率減低。在混合層中存在明顯減少數量之能量可轉移進入的能態,從而有效地障蔽能態之進展。由蒙地卡羅模擬來模擬能態密度之變化效應,其結果可見於圖9。在該模型中,激子隨機地於與混合膜相鄰的純淨膜中產生。為模擬擴散,激子接著透過隨機步進移動設定數目之間距及記錄其最終位置。假設該等激子僅通過最近鄰跳躍轉移。在介於經摻雜層與純淨層之間之界面處,於層之間之跳躍機率係藉由各層中有效位點之相對數量來衡量。據該模型預測得,就介於兩種具有相等位點密度之材料之間之接面而言,50%之激子擴散至緩衝物中。在緩衝物中之位點減少50%之情況中,該情況對應於C60之弗倫克爾激子接近1:1 C60:BCP之緩衝物之情況,只有20%的激子經轉移。在模擬CT激子接近1:1 C60:BCP緩衝物之情況之80%位點減少下,小於5%之激子得以轉移。即使當僅考慮統計方法時,該等模擬亦證實經摻雜緩衝物相當良好地障蔽激子。 The mechanism of the mixed layer barrier exciton can be considered in a statistical manner, in which the reduction of the energy state density available in the doped layer reduces the exciton transfer rate. There is a significantly reduced amount of energy that can be transferred into the energy state in the mixed layer, thereby effectively blocking the progress of the energy state. The effect of energy state density was simulated by Monte Carlo simulation. The results can be seen in Fig. 9. In this model, excitons are randomly generated in the pure film adjacent to the mixed film. To simulate diffusion, the exciton then moves through random steps to set the number of distances and record its final position. Suppose that these excitons are transferred only by nearest neighbor hopping. At the interface between the doped layer and the pure layer, the probability of jumping between layers is measured by the relative number of effective sites in each layer. The model predicts that for the junction between two materials with equal site density, 50% of the excitons diffuse into the buffer. In the case where the position in the buffer is reduced by 50%, this situation corresponds to the case where the C 60 Frenkel exciton is close to 1:1 C 60 : BCP buffer, and only 20% of the excitons are transferred. When the simulated CT excitons approached 1:1 C 60 :BCP buffer and 80% of the sites were reduced, less than 5% excitons were transferred. Even when only statistical methods are considered, these simulations confirm that the doped buffers shield the excitons quite well.
實例9Example 9
如圖10所顯示,於上部圖上繪製經覆蓋不同緩衝層之C70之標準化消光光譜成波長之函數。該等數據顯示激子能量隨著更多混合而變得更大,此有助於障蔽激子。底部圖顯示經覆蓋淬滅(NPD)、障蔽(BCP)及混合緩衝層之C70之發射光譜(於450nm處激發)。 As shown in Figure 10, the normalized extinction spectrum of C 70 covered with different buffer layers as a function of wavelength is plotted on the upper graph. These data show that the exciton energy becomes larger with more mixing, which helps shield the exciton. The bottom graph shows the emission spectrum of C 70 (excitation at 450 nm) covered by quenching (NPD), barrier (BCP) and mixed buffer layers.
實例10Example 10
如圖11所顯示,經覆蓋不同緩衝層之裝置之EQE光譜(頂部)及裝置於0.8個太陽光AM1.5G照明下之J-V曲線(底部)說明由於包含複合緩衝物相較於包含其他緩衝層所致之性能提高。 As shown in FIG. 11, the EQE spectrum of the device covered with different buffer layers (top) and the JV curve (bottom) of the device under 0.8 sunlight AM1.5G illumination show that the composite buffer is included compared to other buffer layers. The resulting performance is improved.
實例11Example 11
研究包含C60:BCP之緩衝物之用途及將其性能與先前開發的緩衝物BCP及PTCBI,及於C60:BCP經覆蓋BCP或PTCBI之複合緩衝物中之 性能作比較。在此等裝置中,活性層包含DPSQ/C60。J-V、EQE及裝置架構顯示於圖12中,及相關數據顯示於表5中。裝置之Voc維持恆定在0.95±0.01V,與緩衝物無關。經覆蓋10nm PTCBI緩衝物(D13)之裝置因來自PTCBI之寄生性光學吸收而顯示7.1±0.1mA/cm2之最小Jsc。20不同於PTCBI,具有10nm厚度之其他緩衝物BCP(D11)及C60:BCP(D12)不吸收,導致JSC分別增加至7.5±0.1mA/cm2及7.6±0.1mA/cm2。具有15nm厚度之複合緩衝層(C60:BCP/PTCBI(D14)及C60:BCP/BCP(D15))具有分別為8.1±0.1mA/cm2及8.3±0.1mA/cm2之再更高的Jsc。EQE測量證實光電流之改變係因於C60響應之變化,及利用轉移矩陣形式法9之光學模型化證實JSC在緩衝物自10nm轉變至15nm時之增加係歸因於光學效應。裝置間之FF亦發生顯著改變。經覆蓋BCP(D11及D15)之裝置顯示分別為0.64±0.01及0.65±0.01之最小FF。僅包含C60:BCP(D12)之緩衝物具有0.66±0.01之略佳的FF。經覆蓋PTCBI(D13及D14)之裝置展現分別為0.68±0.01及0.71±0.01之最大FF。歸因於光電流及FF之增加,相較於C60:BCP/BCP之5.0±0.1%、C60:BCP之4.8±0.1%、PTCBI之4.8±0.0=1%及BCP之4.8±0.1%,C60:BCP/PTCBI緩衝物之功率轉換效率最大,其為5.3±0.1%。 The study included the use of C 60 : BCP buffers and compared their performance with the previously developed buffers BCP and PTCBI, and the performance in C 60 : BCP composite buffers covered with BCP or PTCBI. In these devices, the active layer contains DPSQ/C 60 . JV, EQE and device architecture are shown in Figure 12, and related data are shown in Table 5. The V oc of the device is kept constant at 0.95±0.01V, regardless of the buffer. The device covered with 10 nm PTCBI buffer (D13) showed a minimum J sc of 7.1±0.1 mA/cm 2 due to parasitic optical absorption from PTCBI. 20 Unlike PTCBI, other buffers with a thickness of 10 nm, BCP (D11) and C 60 : BCP (D12) do not absorb, resulting in J SC increasing to 7.5±0.1 mA/cm 2 and 7.6±0.1 mA/cm 2, respectively . The composite buffer layer with a thickness of 15nm (C 60 : BCP/PTCBI (D14) and C 60 : BCP/BCP (D15)) has an even higher value of 8.1±0.1mA/cm 2 and 8.3±0.1mA/cm 2 respectively Jsc. EQE measurement confirmed that the change in photocurrent was due to the change in C 60 response, and the optical modeling using transfer matrix method 9 confirmed that the increase in J SC when the buffer was changed from 10 nm to 15 nm was due to the optical effect. The FF between devices also changed significantly. The devices covered by BCP (D11 and D15) showed a minimum FF of 0.64±0.01 and 0.65±0.01, respectively. The buffer containing only C 60 :BCP(D12) has a slightly better FF of 0.66±0.01. The devices covering PTCBI (D13 and D14) exhibited maximum FF of 0.68±0.01 and 0.71±0.01, respectively. Due to the increase in photocurrent and FF, compared to C 60 : 5.0±0.1% of BCP/BCP, C 60 : 4.8±0.1% of BCP, 4.8±0.0=1% of PTCBI and 4.8±0.1% of BCP , C 60 : The power conversion efficiency of BCP/PTCBI buffer is the largest, which is 5.3±0.1%.
緩衝層間FF之差異可藉由檢視於外加偏壓下之EQE及響應度(R)成照明強度之函數來解釋。圖13繪示具有不同緩衝層之裝置針對其0V EQE標準化之於-1V偏壓下之EQE。藉由施加外部偏壓來調變介於400nm及550nm之間之來自C60之訊號,同時介於600nm及825nm之間之DPSQ響應維持不變。可以偏離零偏壓EQE之量值得知緩衝層之效應。就經覆蓋10nm BCP緩衝物(D11)之裝置而言,電壓相依性最為顯著,而就10nm C60:BCP緩衝物(D12)而言,電壓相依性最小。 The difference in FF between the buffer layers can be explained by examining the EQE and responsivity (R) under applied bias as a function of the intensity of the illumination. Figure 13 shows the EQE of a device with different buffer layers normalized to its 0V EQE under a -1V bias. The signal from the C60 between 400nm and 550nm is modulated by applying an external bias voltage, while the DPSQ response between 600nm and 825nm remains unchanged. The amount of EQE that can deviate from zero bias is worth knowing the effect of the buffer layer. For the device covered with 10nm BCP buffer (D11), the voltage dependence is the most significant, and for the 10nm C60 : BCP buffer (D12), the voltage dependence is the smallest.
經覆蓋10nm C60:BCP/5nm BCP(D15)之裝置經歷較10nm BCP(D11)小的電壓相依性。此係歸因於兩個因素。第一因素為,BCP 層較薄,使得陷留電子的數量減少。第二因素為,如上所顯示,C60:BCP層障蔽激子使不擴散至C60:BCP/BCP界面,但仍傳輸電子。此防止激子與陷留在C60:BCP/BCP界面處之電子相互作用。 The device covered by 10nm C60 : BCP/5nm BCP (D15) experienced less voltage dependence than 10nm BCP (D11). This system is due to two factors. The first factor is that the thinner BCP layer reduces the number of trapped electrons. The second factor is that, as shown above, the C 60 :BCP layer blocks excitons so as not to diffuse to the C 60 :BCP/BCP interface, but still transmits electrons. This prevents excitons from interacting with electrons trapped at the C 60 :BCP/BCP interface.
10nm PTCBI(D13)緩衝物歸因於其LUMO匹配而容許電子自C60等能傳輸。同時地,PTCBI/Ag界面不形成偶極子或針對電荷提取之能量障蔽。10nm C60:BCP/5nm PTCBI(D14)係以類似方式作用,同時亦防止激子到達PTCBI。 The 10 nm PTCBI (D13) buffer allows electrons to be transported from C 60 etc. due to its LUMO matching. At the same time, the PTCBI/Ag interface does not form dipoles or energy barriers for charge extraction. 10nm C 60 : BCP/5nm PTCBI (D14) acts in a similar manner, while also preventing excitons from reaching PTCBI.
由極化子-激子所引起之激子淬滅進一步藉由檢視圖13中所顯示之響應度成照明強度的函數來證實。響應度係經定義為裝置之短路電流密度除以入射光面積強度。此參數使吾人可比較裝置在不同照明強度下之電流產生效率。經覆蓋BCP(D11及D15)之裝置展現響應度隨著照明自1W/m2(0.01個太陽光)增加至100W/m2(1個太陽光)而明顯非線性地減低。衰減之非線性性質與由激子-極化子引起之激子淬滅一致,其中經增加之照明強度導致激子及極化子數量同時增加。用於D12、D13及D14中之其他緩衝物均展現成照明強度函數之響應度之小的改變,證實由激子-極化子引起之激子淬滅受到抑制。 The exciton quenching caused by polaron-excitons is further confirmed by the responsivity shown in view 13 as a function of illumination intensity. Responsivity is defined as the short circuit current density of the device divided by the incident light area intensity. This parameter allows us to compare the current generation efficiency of the device under different lighting intensities. The BCP (D11 and D15) covered devices exhibited a significantly non-linear response as the illumination increased from 1 W/m 2 (0.01 sunlight) to 100 W/m 2 (1 sunlight). The nonlinear nature of the attenuation is consistent with the exciton quenching caused by the exciton-polaron, where the increased illumination intensity causes the number of excitons and polarons to increase simultaneously. The other buffers used in D12, D13, and D14 all exhibit small changes in responsivity as a function of illumination intensity, confirming that the exciton quenching caused by exciton-polaron is suppressed.
實例12Example 12
為研究C60:BCP之激子障蔽特性,利用紅色吸收供體(2,4-雙[4-(N,N-二苯基胺基)-2,6-二羥基苯基]方酸)(DPSQ)20,21製得包含包含夾在兩個純淨C60層之間之經摻雜C60層之裝置(圖14)。純淨C60及 C60:BCP膜之總厚度係恆定的;僅移動經摻雜膜之位置,從D/A界面移開,朝向Ag電極。 To study the exciton-blocking properties of C 60 : BCP, the red absorption donor (2,4-bis[4-(N,N-diphenylamino)-2,6-dihydroxyphenyl]squaric acid) was used (DPSQ) 20, 21 made a device containing a doped C 60 layer sandwiched between two pure C 60 layers (Figure 14). Pure C 60 and C 60 : The total thickness of the BCP film is constant; only the position of the doped film is moved away from the D/A interface toward the Ag electrode.
裝置D16-19之J-V及EQE特徵顯示於圖14中,及相關數據顯示於表6中。隨著與D/A界面相鄰的純淨C60層之厚度自35nm減小至5nm(或C60:BCP層朝向D/A界面移動),裝置之光電流自6.2±0.1mA/cm2明顯地下降至4.1±0.1mA/cm2。此趨勢亦可在EQE光譜中觀察到,其中來自C60之響應隨著與D/A界面相鄰的純淨C60層之厚度減小(D16至D19)而減低。此等結果清楚地證實C60:BCP藉由有效地障蔽於與金屬電極相鄰的純淨C60膜中產生之激子使不擴散至D/A界面達成電荷分離而充作激子障蔽層。與其激子障蔽作用相反,經摻雜層展現良好之電荷傳導性,此乃因裝置之FF維持恆定在約0.72±0.01。VOC亦維持恆定在0.94±0.01。總體而言,與D/A界面相鄰的純淨C60層之厚度自5nm增加至35nm使得η自2.7±0.1%增加至4.1±0.1%。 The JV and EQE characteristics of device D16-19 are shown in Figure 14 and the related data is shown in Table 6. As the thickness of the pure C 60 layer adjacent to the D/A interface decreases from 35 nm to 5 nm (or C 60 : the BCP layer moves toward the D/A interface), the photocurrent of the device is significant from 6.2±0.1 mA/cm 2 Underground drops to 4.1±0.1mA/cm 2 . This trend can also be observed in the EQE spectrum, where the response from C 60 decreases as the thickness of the pure C 60 layer adjacent to the D/A interface decreases (D16 to D19). These results clearly confirm that C 60 :BCP acts as an exciton blocking layer by effectively shielding excitons generated in the pure C 60 film adjacent to the metal electrode so as not to diffuse to the D/A interface to achieve charge separation. Contrary to its exciton blocking effect, the doped layer exhibits good charge conductivity because the FF of the device is kept constant at about 0.72±0.01. V OC also maintains constant at 0.94±0.01. Overall, increasing the thickness of the pure C 60 layer adjacent to the D/A interface from 5 nm to 35 nm increases η from 2.7±0.1% to 4.1±0.1%.
實例13Example 13
圖15顯示頂部之於1個太陽光AM1.5G照明下之J-V曲線及底部之具有不同緩衝層之裝置之外部量子效率成波長函數之圖。此等裝置證實由於包含混合緩衝層所致之性能提升。 Fig. 15 shows a graph of the J-V curve under the illumination of 1 sunlight AM1.5G at the top and the external quantum efficiency of the devices with different buffer layers at the bottom as a function of wavelength. These devices confirmed the improved performance due to the inclusion of mixed buffer layers.
實例14Example 14
圖16顯示頂部之於1個太陽光AM1.5G照明下之J-V曲線及底部之具有包含不同C60相對BCP之比值之不同緩衝層之裝置之外部量子效率之圖。此等裝置證實1:1(以體積計)之最佳摻雜比。 16 shows a graph of the external quantum efficiency of a device with different buffer layers containing different ratios of C 60 to BCP at the bottom and the JV curve at the top under 1 sunlight AM1.5G illumination. These devices confirmed the best doping ratio of 1:1 (by volume).
實例15Example 15
製得具有以下結構之裝置:玻璃基板/100nm ITO/10nm MoO3/54nm 1:8 DBP:C70/緩衝物/100nm Ag。圖17顯示具有包含相對厚的1:8體積比之DBP及純淨C70層之活性層之平面混合型OPV電池於1個太陽光模擬AM1.5G照明下之照明之J-V(左上圖)及EQE(右上圖)及提取效率參數(下方)。各緩衝物之BPhen:C70之厚度及體積比提供於表中。最佳填充因子及效率係針對具有混合緩衝物且在混合區域及接觸件之間具有額外BPhen或PTCBI層之裝置,證實該接觸件亦改良混合型或整體異質接面裝置。 A device having the following structure was prepared: glass substrate/100 nm ITO/10 nm MoO 3 /54 nm 1:8 DBP: C 70 /buffer/100 nm Ag. Figure 17 shows the JV (upper left) and EQE of the illumination of a planar hybrid OPV battery with a relatively thick 1:8 volume ratio of DBP and an active layer of pure C 70 layers under 1 sunlight simulated AM1.5G illumination (Upper right) and extraction efficiency parameters (lower). The thickness and volume ratio of BPhen:C 70 for each buffer is provided in the table. The best fill factor and efficiency are for devices with mixed buffers and an additional BPhen or PTCBI layer between the mixing area and the contact, confirming that the contact also improves the hybrid or integral heterojunction device.
實例16Example 16
製得具有以下結構之裝置:玻璃基板/100nm ITO/5 nm MoO3/25nm 1:8 DBP:C70/緩衝物/100nm Ag。圖18顯示具有包含相對薄的1:8體積比之DBP及純淨C70層之活性層及各種緩衝物之平面混合型OPV電池於0.7個太陽光模擬AM1.5G照明下之照明之J-V(左上圖)及EQE(右上圖)及提取效率參數(下方)。各緩衝物之BCP:C70之厚度及體積比提供於表中。最佳填充因子及效率係針對具有混合緩衝物且在混合區域及接觸件之間具有額外BPhen或PTCBI層之裝置,證實該接觸件亦改良混合型或整體異質接面裝置及可於混合層裝置中獲得極佳的填充因子。 A device having the following structure was prepared: glass substrate/100nm ITO/5nm MoO 3 /25nm 1:8 DBP: C 70 /buffer/100nm Ag. Figure 18 shows the JV (top left) of a planar hybrid OPV battery with an active layer including a relatively thin 1:8 volume ratio of DBP and pure C 70 layers and various buffers under 0.7 sunlight simulated AM1.5G illumination Picture) and EQE (upper right picture) and extraction efficiency parameters (below). The thickness and volume ratio of BCP:C 70 for each buffer is provided in the table. The best fill factor and efficiency are for devices with mixed buffers and an additional BPhen or PTCBI layer between the mixing area and the contact, confirming that the contact also improves the hybrid or integral heterojunction device and can be used in the mixed layer device Excellent fill factor is obtained.
實例17Example 17
製得具有圖19中所示結構之裝置。圖19(a)中之裝置具有結構ITO/MoO3/DPSQ/C60/C60:BPhen(x)/BPhen/Al。圖19(b)中之裝置具有結構ITO/MoO3/DPSQ/C60/C60:BCP(x)/BPhen/Al。圖19(c)中之裝置具有結構ITO/MoO3/DPSQ/C60/C60:UGH2(x)/BPhen/Al。圖19顯示經BPhen、CBP及UGH2稀釋之EQE及J-V曲線。於所有情況中均觀察到提升,證實減少電荷積聚於C60/緩衝物界面處達成提升。 A device having the structure shown in Fig. 19 was produced. The device in FIG. 19(a) has the structure ITO/MoO 3 /DPSQ/C60/C 60 : BPhen(x)/BPhen/Al. The device in FIG. 19(b) has the structure ITO/MoO 3 /DPSQ/C60/C 60 : BCP(x)/BPhen/Al. The device in FIG. 19(c) has the structure ITO/MoO 3 /DPSQ/C60/C 60 : UGH2(x)/BPhen/Al. Figure 19 shows the EQE and JV curves diluted with BPhen, CBP and UGH2. An increase was observed in all cases, confirming the reduction of charge accumulation at the C 60 /buffer interface to achieve an increase.
實例18Example 18
藉由於2×10-7torr之基壓下於經預塗覆氧化銦錫(ITO,薄片電阻:15Ω/□)之玻璃基板上真空熱蒸鍍(VTE)來生長OPV電池。在沉積之前,於經稀釋之Tergitol®(NP-10型)、去離子水、丙酮及異丙醇中清潔該等基板,且接著暴露至紫外線-臭氧持續10min。MoO3係自Acros Organics獲得,C60係自Materials and Electrochemical Research Corp.獲得,BPhen及DBP係自Luminescence Technology Corp獲得,及C70係自SES Research獲得。藉由熱梯度昇華將DBP、C60及C70純化一次。 The OPV battery was grown by vacuum thermal evaporation (VTE) on a glass substrate pre-coated with indium tin oxide (ITO, sheet resistance: 15Ω/□) at a base pressure of 2×10 -7 torr. Prior to deposition, the substrates were cleaned in diluted Tergitol® (NP-10 type), deionized water, acetone, and isopropanol, and then exposed to UV-ozone for 10 min. MoO 3 was obtained from Acros Organics, C 60 was obtained from Materials and Electrochemical Research Corp., BPhen and DBP were obtained from Luminescence Technology Corp, and C 70 was obtained from SES Research. DBP, C 60 and C 70 were purified once by thermal gradient sublimation.
MoO3及BPhen層係以0.1nm/s之速率生長,DBP及C70係採用0.02nm/s之DBP沉積速率及0.16nm/s之C70沉積速率共沉積以達成1:8之比值。BPhen:C60混合緩衝物係藉由使BPhen及C60各自以0.05nm/s之速率共沉積建立1:1摻雜物而生長。隨後透過界定15個1mm直徑裝置(裝置面積0.008cm2)陣列之陰影遮罩來沉積100nm厚Ag陰極。於製造之後,將裝置傳送至經填充超高純度N2之手套箱中以測量J-V特徵及EQE。在測量期間,僅受測試裝置係處於照明下,而其他裝置維持在黑暗中。太陽模擬器強度係使用NREL-可追蹤Si參照電池進行校準,及JSC係針對光譜失配校正。利用鎖相放大器及來自斬波頻率在200Hz之Xe燈之單色光獲得EQE成波長(l)之函數。JSC及PCE之誤差主要來源於光強度及光譜校準之不確定性。 MoO 3 and based at BPhen layer / s rate of growth 0.1nm, DBP DBP system using C 70 and a deposition rate of 0.02nm / s and of 0.16nm / s of C 70 to achieve co-deposition deposition rate of 1: 8 ratio of. The BPhen:C 60 mixed buffer is grown by co-depositing BPhen and C 60 each at a rate of 0.05 nm/s to establish a 1:1 dopant. A 100 nm thick Ag cathode was then deposited through a shadow mask defining an array of 15 1 mm diameter devices (device area 0.008 cm 2 ). After manufacturing, the device was transferred to a glove box filled with ultra-high purity N 2 to measure JV characteristics and EQE. During the measurement, only the test device is under illumination, while the other devices are maintained in the dark. The solar simulator intensity system is calibrated using NREL-traceable Si reference cells, and the J SC system corrects for spectral mismatch. EQE is obtained as a function of wavelength (l) using a lock-in amplifier and monochromatic light from a Xe lamp with a chopping frequency of 200 Hz. The errors of J SC and PCE mainly come from the uncertainty of light intensity and spectral calibration.
藉由真空熱蒸鍍(VTE)生長具有以下結構之混合HJ電池:MoO3(10nm)/DBP:C70(54nm,1:8體積比)/緩衝物/Ag(100nm)。使用兩個不同緩衝層:8nm厚BPhen(對照組)及經覆蓋純淨5nm厚BPhen層之10nm厚的1:1比(以體積計)BPhen:C60混合層。圖20顯示使用對照組及複合緩衝物之混合HJ裝置之J-V特徵及EQE光譜。對照組如先前所述在模擬AM 1.5G,1個太陽光照明(光譜失配因子=1.00±0.01)下具有 FF=55±1%,JSC=12.5±0.3mA/cm2,VOC=0.91±0.1V及PCE=6.3±0.3%。具有複合電子-濾波器緩衝物之電池展現所有所有三種性能參數的改善,達成FF=63±1%,JSC=12.8±0.3mA/cm2,VOC=0.93±0.1V及PCE=7.5±0.4%,後者對應於對照組之19%增加。 A hybrid HJ battery having the following structure was grown by vacuum thermal evaporation (VTE): MoO 3 (10 nm)/DBP: C 70 (54 nm, 1:8 volume ratio)/buffer/Ag (100 nm). Two different buffer layers were used: 8 nm thick BPhen (control group) and a 10 nm thick 1:1 ratio (by volume) BPhen:C 60 mixed layer covered with a pure 5 nm thick BPhen layer. Figure 20 shows the JV characteristics and EQE spectrum of a mixed HJ device using a control group and a composite buffer. The control group had FF=55±1% under simulated AM 1.5G, 1 sunlight illumination (spectral mismatch factor=1.00±0.01), J SC =12.5±0.3mA/cm 2 , V OC = 0.91±0.1V and PCE=6.3±0.3%. A battery with a composite electron-filter buffer exhibits improvements in all three performance parameters, achieving FF=63±1%, J SC =12.8±0.3mA/cm 2 , V OC =0.93±0.1V and PCE=7.5± 0.4%, the latter corresponds to a 19% increase in the control group.
具有複合緩衝物之裝置之FF的顯著改善顯示於圖20(a)中(由介於兩曲線間之陰影區域指示),且圖20(b)插圖中為能階圖。上述研究顯示在富勒烯/BCP界面處發生能階彎曲,從而導致電子累積及如左側插圖中所顯示之大幅度電位下降。因此,跨活性層兩端的電場隨著電壓之再分配而減低,從而增加電荷提取時間,及因此增加電子及電洞在其有機會複合之供體-受體異質界面處之滯留時間。在複合緩衝物之情況中,1:1 BPhen:C60摻雜物之高電導率導致較少電子累積,及因此導致界面(右側插圖,圖20(b))處較小之電位下降及DBP:C70混合區域中較高之電場。此繼而導致減低之雙分子淬滅,及因此導致如圖20(b)所顯示在介於l=400nm與550nm之間之波長下之FF及EQE增加。 The significant improvement of the FF of the device with composite buffer is shown in FIG. 20(a) (indicated by the shaded area between the two curves), and the energy level diagram in the inset of FIG. 20(b). The above study shows that energy level bending occurs at the fullerene/BCP interface, resulting in electron accumulation and a large potential drop as shown in the left-hand inset. Therefore, the electric field across the active layer decreases as the voltage is redistributed, thereby increasing the charge extraction time, and therefore the retention time of electrons and holes at the donor-acceptor heterogeneous interface where they have a chance to recombine. In the case of a composite buffer, the high conductivity of the 1:1 BPhen:C 60 dopant leads to less electron accumulation, and therefore a smaller potential drop and DBP at the interface (inset on the right, Figure 20(b)) : Higher electric field in the C 70 mixed area. This in turn leads to reduced bimolecular quenching, and therefore to an increase in FF and EQE at wavelengths between 1=400 nm and 550 nm as shown in FIG. 20(b).
兩種電池於l<400nm及λ>550nm下均顯示幾近相同的EQE(參見圖20(b))。於λ<400nm下,在複合緩衝物電池中由BPhen:C60混合緩衝物中之寄生性吸收導致光活性區域吸收減低,同時內部量子效率(IQE)因經減低之雙分子複合而提高。總體而言,複合緩衝物電池之EQE幾近等於對照組電池。於λ>550nm下,經吸收之光學功率峰以及電荷分佈峰向陽極移位,此乃因於DBP:C70混合區域中產生之激子幾近立即地解離成電荷。此使得電子堆積於對照組電池中之DBP:C70/BPhen界面(靠近陰極側)處之電洞數量減少,而同時改良電洞提取。電洞及電子於較長激發波長下之空間分離使得對照組電池中之雙分子複合減低,亦導致幾近相等的EQE。 Both batteries showed almost the same EQE at l<400nm and λ>550nm (see Figure 20(b)). At λ<400nm, the parasitic absorption in the BPhen:C 60 mixed buffer in the composite buffer battery leads to a decrease in the absorption of the photoactive region, and the internal quantum efficiency (IQE) is increased by the reduced bimolecular recombination. Overall, the EQE of the composite buffer battery is almost equal to the control battery. At λ>550nm, the absorbed optical power peak and the charge distribution peak shift toward the anode. This is because the excitons generated in the DBP:C 70 mixed region dissociate into charges almost immediately. This reduces the number of holes at the DBP:C 70 /BPhen interface (near the cathode side) of electrons deposited in the control battery, while improving hole extraction. The spatial separation of holes and electrons at longer excitation wavelengths reduces the bimolecular recombination in the control cell and also results in nearly equal EQE.
研究兩種電池之響應度(R)成光強度(I)之函數關係以明瞭雙分子複合之作用。發現對照組電池具有R隨I之單調減低,從I=0.6個太陽 光下之R=12.7±0.4 A/W減低至I=2.7個太陽光下之11.8±0.3 A/W,而就複合緩衝物電池而言,在相同強度範圍內R僅降低0.2 A/W(參見圖21)。一般而言,JSC=JG-JMM-JBM,其中JG為光生電流密度,JMM為單分子複合電流密度及JBM為雙分子複合電流密度。JG及JMM均與I成線性比例,而JBM γ.n.p b.I2,其中γ為郎之萬係數及b為常數。因此,R=JSC/I=R0-β.I,其中R0為不存在雙分子複合下之響應度。就兩種電池而言,針對該分析之線性擬合(虛線,圖21)獲得R0=12.9 A/W。兩種電池於零光強度下之相同截距顯示兩種OPV電池具有與不存在雙分子複合情況下I→0相同的響應度。然而,對照組之β係四倍大於具有複合緩衝物之電池之複合緩衝物電池之較小的β顯示雙分子複合僅為對照組電池之25%,指示電子及電洞濃度因混合區域中電場之增加而各自平均減低50%。就指定外部偏壓而言與對照組者相比複合緩衝物電池中異質接面兩端之此種較大內部電場導致經改良之電荷提取及因此較高之FF。 The functional relationship between the responsivity (R) and light intensity (I) of two batteries was studied to understand the effect of bimolecular recombination. It was found that the battery of the control group had a monotonous decrease in R with I, from R=12.7±0.4 A/W under I=0.6 sunlight to 11.8±0.3 A/W under I=2.7 sunlight, and the compound buffer For the battery, R only decreases by 0.2 A/W in the same intensity range (see Figure 21). Generally speaking, J SC =J G -J MM -J BM , where J G is the photogenerated current density, J MM is the single-molecule composite current density and J BM is the bi-molecular composite current density. J G and J MM are linearly proportional to I, while J BM γ. n. p b. I 2 , where γ is the Langevin coefficient and b is a constant. Therefore, R=J SC /I=R 0 -β. I, where R 0 is the responsivity in the absence of bimolecular recombination. For the two batteries, R 0 =12.9 A/W was obtained for the linear fit of the analysis (dashed line, Figure 21). The same intercept of the two batteries at zero light intensity shows that the two OPV batteries have the same responsivity as I → 0 in the absence of bimolecular recombination. However, the β of the control group is four times larger than the smaller β of the composite buffer battery of the battery with a composite buffer. The bimolecular recombination is only 25% of the battery of the control group, indicating the concentration of electrons and holes due to the electric field in the mixed region The increase has been reduced by an average of 50%. This larger internal electric field at both ends of the heterojunction in the composite buffer battery compared to the control group for the specified external bias voltage resulted in improved charge extraction and therefore higher FF.
進一步藉由以Matlab程式化之層之3-D蒙地卡羅模擬來研究複合緩衝物之電荷傳輸性質。該緩衝物係經模型化為BPhen及C60分子隨機分佈於立方晶格上,其中電子傳輸係歸因於C60分子之間之最近鄰跳躍。在此模型中,忽略電荷間之庫倫(Columbic)相互作用,及假設晶格位點除了由外加電場所致之能量差異外為等能。根據Miller-Abrahams理論計算轉移機率,由該轉移機率獲得注入於緩衝層一側上之電荷之提取時間中位數。接著由提取時間與電場間之關係計算得層之遷移率,藉由設定純淨C60層中電子之零場遷移率為5.1×10-2cm2/V.s之實驗值而標準化。就1:1混合緩衝物而言,該模型預測4.7×10-3cm2/V.s之有效遷移率,僅較純淨C60之有效遷移率低一個數量級。比較言之,純淨BPhen膜具有1.9×10-5cm2/V.s之明顯更低之電子遷移率,導致電荷堆積於緩衝物界面處而促進淬滅。 The charge transfer properties of the composite buffer were further studied by 3-D Monte Carlo simulation of the layer programmed with Matlab. The buffer system is modeled as BPhen and C 60 molecules are randomly distributed on the cubic lattice, where the electron transport is attributed to the nearest neighbor hop between C 60 molecules. In this model, the Columbic interaction between charges is ignored, and it is assumed that the lattice sites are isoenergetic except for the energy difference caused by the applied electric field. The transfer probability is calculated according to the Miller-Abrahams theory, and the median extraction time of the charge injected on the side of the buffer layer is obtained from the transfer probability. Then, the mobility of the layer is calculated from the relationship between the extraction time and the electric field. By setting the zero field mobility of the electrons in the pure C 60 layer to 5.1×10 -2 cm 2 /V. The experimental value of s is standardized. For 1:1 mixed buffer, the model predicts 4.7×10 -3 cm 2 /V. The effective mobility of s is only an order of magnitude lower than the effective mobility of pure C 60 . In comparison, the pure BPhen film has 1.9×10 -5 cm 2 /V. The significantly lower electron mobility of s leads to charge accumulation at the buffer interface and promotes quenching.
藉由檢視針對1:1混合緩衝物之不同厚度之預測來測試該模型,結果顯示於圖22(a)中。於指定電壓下之提取時間(對應於膜遷移率)與混合層之厚度之間存在線性關係,假設電荷密度恆定(亦即,照明強度恆定),則此關係轉換成串聯電阻之線性增加。針對混合緩衝物DBP:C60 OPV之實驗數據之擬合顯示於圖22(a)之插圖中。接著,純淨BPhen層透過金屬沉積期間引起之缺陷能態傳導電子,因而導致厚度與電阻間之超線性關係。相對地,混合緩衝物電阻隨著厚度即使高達20nm亦呈線性地增加,顯示混合緩衝物中之電子主要係由混合物中之C60傳導。 The model was tested by examining the predictions for different thicknesses of the 1:1 mixed buffer, and the results are shown in Figure 22(a). There is a linear relationship between the extraction time at a specified voltage (corresponding to the film mobility) and the thickness of the mixed layer. Assuming that the charge density is constant (that is, the illumination intensity is constant), this relationship is converted into a linear increase in series resistance. The fitting of the experimental data for the mixed buffer DBP: C 60 OPV is shown in the inset of FIG. 22(a). Next, the pure BPhen layer conducts electrons through the defect energy states caused during metal deposition, resulting in an ultra-linear relationship between thickness and resistance. In contrast, the resistance of the mixed buffer increases linearly with thickness up to 20 nm, showing that the electrons in the mixed buffer are mainly conducted by C 60 in the mixture.
以實驗方式研究利用於石英上經覆蓋1:1 BPhen:C60摻雜物之40nm厚C70膜之光致發光(PL)激發光譜之激子障蔽效率。藉由比較沉積至所研究摻雜物之表面上之層之PL強度與「完全」障蔽層或淬滅層中任一者之PL強度,可確定該等製程之相對重要性。基於此點,因此分別使用8nm厚BPhen或N,N'-二苯基-N,N'-雙(1-萘基)-1-1'-聯苯-4,4'二胺(NPD)層作為參照、完全激子障蔽或淬滅層。混合緩衝物之PL強度與障蔽參照物之實測強度幾近相等(參見圖22(b)),證實BPhen:C60混合層可有效率地障蔽激子。由於BPhen:C60混合物具有相對高的電子遷移率,故混合緩衝層可在空間上分離充作有效濾波器之激子及極化子,從而導致純淨富勒烯層中激子-極化子淬滅之減低。 The experimental method was used to study the exciton blocking efficiency of the photoluminescence (PL) excitation spectrum of a 40 nm thick C 70 film covered with 1:1 BPhen:C 60 dopant on quartz. The relative importance of these processes can be determined by comparing the PL intensity of the layer deposited on the surface of the dopant under study with the PL intensity of either the "complete" barrier layer or the quenching layer. Based on this, 8nm thick BPhen or N,N'-diphenyl-N,N'-bis(1-naphthyl)-1-1'-biphenyl-4,4'diamine (NPD) are used respectively The layer serves as a reference, completely exciton masking or quenching layer. The PL intensity of the mixed buffer is almost equal to the measured intensity of the barrier reference (see Figure 22(b)), confirming that the BPhen:C 60 mixed layer can effectively block excitons. Due to the relatively high electron mobility of the BPhen:C 60 mixture, the mixed buffer layer can spatially separate the excitons and polarons that serve as effective filters, resulting in exciton-polaron in the pure fullerene layer Reduced quenching.
實例19Example 19
依照揭示於實例18中之實驗製得具有混成平面混合型異質接面(PM-HJ)之OPV電池。在OPV電池中分別使用DBP及C70作為供體及受體。OPV電池具有氧化銦錫(ITO)/MoO3(10nm)/DBP:C70(54nm,1:8體積比)/C70(9nm)/緩衝物/Ag(100nm)之裝置結構。在DBP:C70 PM-HJ OPV電池中使用三個不同緩衝層:(1)8nm厚浴啡啉(BPhen)(對照組);(2)10nm厚的1:1比之BPhen:C60混合層;及(3)經覆蓋純淨5nm厚 BPhen層之與(2)相同的混合緩衝物。 According to the experiment disclosed in Example 18, an OPV battery with a hybrid planar hybrid heterojunction (PM-HJ) was produced. In OPV batteries, DBP and C 70 are used as donors and acceptors, respectively. The OPV battery has a device structure of indium tin oxide (ITO)/MoO 3 (10 nm)/DBP: C 70 (54 nm, 1:8 volume ratio)/C 70 (9 nm)/buffer/Ag (100 nm). Use three different buffer layers in the DBP: C 70 PM-HJ OPV battery: (1) 8 nm thick bath morpholine (BPhen) (control group); (2) 10 nm thick 1:1 ratio to BPhen: C 60 mix Layer; and (3) the same mixed buffer as (2) covered with a pure 5 nm thick BPhen layer.
圖23顯示使用緩衝層結構(1)至(3)之裝置之電流密度相對電壓(J-V)特徵及比較性能的外部量子效率EQE光譜,概述於表7中。 FIG. 23 shows external quantum efficiency EQE spectra of current density versus voltage (J-V) characteristics and comparative performance of devices using buffer layer structures (1) to (3), summarized in Table 7.
對照組電池具有FF=56%及短路電流JSC=13.8±0.4mA/cm2,與上述結果相當或稍佳。1因此,對照組電池顯示於模擬AM 1.5G,1個太陽光照明下功率轉換效率PCE=7.1±0.2%。相較於對照組電池,比值上僅具有BPhen:C60(1:1)濾波器之電池具有類似的開路電壓(VOC)=0.91±0.01V、但增加之FF=62±1%,此乃由於減低之極化子-激子淬滅所致。2,3然而,JSC=12.8±0.3mA/cm2,其略有減小,此乃因由於就λ<420nm及λ>550nm而言減低之EQE之結果,如圖23(b)所顯示。總體而言,於1個太陽光照明下,PCE略微增加至7.2±0.2%。 The battery in the control group has FF=56% and short-circuit current J SC =13.8±0.4 mA/cm 2 , which is equivalent to or slightly better than the above results. 1 Therefore, the battery of the control group is shown in the simulated AM 1.5G, and the power conversion efficiency under one sunlight illumination PCE=7.1±0.2%. Compared with the control battery, the battery with only BPhen:C 60 (1:1) filter has a similar open circuit voltage (V OC )=0.91±0.01V, but the increased FF=62±1%. It is due to the reduced quenching of polaron-excitons. 2,3 However, J SC =12.8±0.3mA/cm 2 , which is slightly reduced, this is due to the result of reduced EQE for λ<420nm and λ>550nm, as shown in Figure 23(b) . Overall, under one sunlight, PCE increased slightly to 7.2±0.2%.
具有BPhen:C60/BPhen複合緩衝物之OPV電池具有FF=66±1%,相較於對照組改善18%。此外,VOC從對照組之0.91±0.1V增加至具有BPhen:C60/BPhen緩衝物之電池之0.93±0.1V。然而,JSC減低至13.2±0.4mA/cm2,相較於對照組減低5%。總體而言,具有BPhen:C60/BPhen緩衝物之OPV電池展現於模擬AM 1.5G、1個太陽光照明下PCE=8.1±0.4%,相較於對照組電池增加14%。 The OPV battery with BPhen: C 60 /BPhen composite buffer has FF=66±1%, which is an improvement of 18% compared with the control group. In addition, V OC increased from 0.91±0.1V of the control group to 0.93±0.1V of the battery with BPhen: C 60 /BPhen buffer. However, J SC decreased to 13.2±0.4 mA/cm 2 , which was 5% lower than that of the control group. Overall, the OPV battery with BPhen: C 60 /BPhen buffer exhibited PCE=8.1±0.4% under simulated AM 1.5G and 1 sunlight, an increase of 14% compared to the control battery.
在圖24中,利用轉移矩陣方法4,5及兩種電池之內部量子效率 (IQE)計算得有機活性區域(即DBP:C70混合層及純淨C70覆蓋層)之吸收效率ηA。如先前所述3,由於BPhen:C60混合緩衝物之吸收,經覆蓋緩衝物電池之吸收在λ=350nm至500nm之間減低。於λ>500nm下,混合緩衝物為透明,且因此,兩種電池具有接近相同的吸收光譜。 In FIG. 24, the absorption efficiency η A of the organic active region (ie, DBP: C 70 mixed layer and pure C 70 cover layer) is calculated using the transfer matrix method 4, 5 and the internal quantum efficiency (IQE) of the two batteries. As previously mentioned 3 , due to the absorption of the BPhen:C 60 mixed buffer, the absorption of the covered buffer battery decreases between λ=350nm and 500nm. At λ>500 nm, the mixed buffer is transparent, and therefore, the two batteries have nearly the same absorption spectrum.
類似地,具有BPhen:C60/BPhen緩衝物之電池相較於對照組電池在λ=350nm至550nm之間之IQE增加。例如,具有BPhen:C60/BPhen緩衝物之電池之IQE在λ=350nm至λ=500nm之間具有EQE~90%,在λ=430nm處達到~100%,指示被吸收的每個光子皆轉化成經電極聚集之電荷載體。 Similarly, the battery with BPhen:C 60 /BPhen buffer had an increased IQE between λ=350 nm and 550 nm compared to the control battery. For example, the IQE of a battery with BPhen: C 60 /BPhen buffer has an EQE of ~90% between λ=350nm and λ=500nm, and reaches ~100% at λ=430nm, indicating that every photon absorbed is converted The charge carriers accumulated by the electrodes.
研究具有BPhen:C60/BPhen濾波器之電池及對照組之響應度(R)及PCE成範圍自0.4個太陽光至2.7個太陽光之光強度之函數關係(圖25)。對照組電池之響應度係隨強度單調地減低,從0.4個太陽光下之R=14.9±0.4 A/W減低至2.7個太陽光下之13.0±0.4 A/W,而具有濾波器之電池在該相同太陽能聚光範圍內維持不變。如圖25所顯示,對照組電池亦顯示隨光強度增加其PCE滾降,此乃歸因於響應度之單調減低。具有BPhen:C60/BPhen緩衝物之電池之PCE於1個太陽光下略微增加達到最大值,接著在較高光強度下由於FF減低而開始滾降,可能係因高光強度下之增強雙分子複合所致。 The responsivity (R) and PCE of the battery with BPhen: C 60 /BPhen filter and the control group were studied as a function of light intensity ranging from 0.4 sunlight to 2.7 sunlight (Figure 25). The response of the battery in the control group decreased monotonously with the intensity, from R=14.9±0.4 A/W under 0.4 sunlight to 13.0±0.4 A/W under 2.7 sunlight, while the battery with filter was The same solar concentration range remains unchanged. As shown in Figure 25, the control battery also showed a roll-off of its PCE with increasing light intensity, which was attributed to the monotonous decrease in responsivity. The PCE of the battery with BPhen: C 60 /BPhen buffer increases slightly under 1 sunlight to reach the maximum value, and then begins to roll off due to the decrease of FF at higher light intensity, which may be due to the enhanced bimolecular recombination at high light intensity Caused by.
亦改變具有BPhen:C60/BPhen緩衝物之DBP:C70 PM-HJ電池中混合緩衝層之厚度。於1個太陽光照明下之J-V特徵及EQE光譜顯示於圖26中及裝置性能概述於表8中。 The thickness of the mixed buffer layer in the DBP: C 70 PM-HJ battery with BPhen: C 60 /BPhen buffer is also changed. The JV characteristics and EQE spectrum under 1 sunlight illumination are shown in FIG. 26 and the device performance is summarized in Table 8.
JSC隨混合緩衝物厚度之增加單調地減低。如圖26(b)所顯示,EQE在整個可見光譜內隨混合層厚度之增加而減低。VOC從不具有混合緩衝層之電池之0.91±0.01V略微增加至具有10nm厚混合緩衝物之電池之0.93±0.01V,及就較厚混合緩衝層而言保持穩定。FF從對照組電池之0.56±0.01增加至10nm厚混合緩衝物之0.66±0.01V且接著就較厚混合緩衝物而言滾降,起因於如表8所顯示之增加串聯電阻。 J SC decreases monotonically as the thickness of the mixed buffer increases. As shown in Fig. 26(b), EQE decreases with the thickness of the mixed layer in the entire visible spectrum. V OC slightly increased from 0.91±0.01V for batteries without a mixed buffer layer to 0.93±0.01V for batteries with a 10nm thick mixed buffer, and remained stable for thicker mixed buffer layers. The FF increased from 0.56±0.01 of the control battery to 0.66±0.01V of the 10nm thick mixed buffer and then rolled off for the thicker mixed buffer, due to the increased series resistance as shown in Table 8.
同時,使用立方晶格中最近鄰跳躍輸送之3-D蒙地卡羅模擬,將混合層模型化為C60及BPhen分子之隨機分佈,來模型化電荷傳輸通過混合緩衝層。忽略電荷間之庫倫相互作用及假設晶格位點除了由外加電場引起之能量差異外為等能。利用Miller-Abrahams表式計算得在位點間之相對跳躍機率。於該模型之每個時間距中,電荷挑選隨機最近鄰來跳躍,以相對跳躍機率加權。若所選位點包含BPhen分子,則就該間距而言電荷係相反地維持靜止。於混合及純淨層中電荷之行為在其他方面係相同。 At the same time, the 3-D Monte Carlo simulation of the nearest-neighbor jump transport in the cubic lattice is used to model the mixed layer as a random distribution of C 60 and BPhen molecules to model charge transport through the mixed buffer layer. Ignore the Coulomb interaction between charges and assume that the lattice sites are isoenergetic except for the energy difference caused by the applied electric field. The Miller-Abrahams table was used to calculate the relative jump probability between sites. In each time interval of the model, the charge chooses random nearest neighbors to jump, weighted by the relative jump probability. If the selected site contains a BPhen molecule, the charge system will remain stationary in terms of this distance. The behavior of the charge in the mixed and pure layers is otherwise the same.
藉由注入電荷於100×100模擬位點晶格之一側上及量測電荷於電場下自相對側逃逸之時間,計算得針對不同厚度之提取時間中位數。圖27顯示提取時間中位數相對電場成混合層厚度之函數。就指定厚度 之混合層而言,電場加速電荷於混合層中傳輸,因此隨著電場增加提取時間中位數減低。隨著混合緩衝物厚度增加,電荷要耗費更長時間來行進通過該混合層。因此,提取時間中位數隨著混合層厚度增加而變得較長。 By injecting charge on one side of the 100×100 simulated site lattice and measuring the time for the charge to escape from the opposite side under the electric field, the median extraction time for different thicknesses was calculated. Figure 27 shows the median extraction time versus electric field as a function of the thickness of the mixed layer. Just specify the thickness For the hybrid layer, the electric field accelerates the charge transfer in the hybrid layer, so the median extraction time decreases as the electric field increases. As the thickness of the mixed buffer increases, the charge takes longer to travel through the mixed layer. Therefore, the median extraction time becomes longer as the thickness of the mixed layer increases.
為測試該模型之預測,將如表8所顯示之藉由擬合黑暗中之J-V特徵獲得之串聯電阻與藉由模型化具有不同混合層厚度之PM-HJ電池獲得的值作比較。自提取時間之電場相依性計算得具有不同厚度之混合層之遷移率及所有模擬層均顯示4.7×10-3cm2/V‧s之有效遷移率,在1/提取時間之電場相依性下。此預測層之電阻應與厚度線性相關,如圖27之插圖所顯示。1:1混合緩衝層之預測遷移率僅比純C60小一個數量級,對於有機物質而言相對地高,此說明該等層可如何有效率地從純淨層提取電荷。如先前模擬所顯示,該等層有效率地障蔽激子,導致激子及極化子之空間分離而抑制淬滅。 To test the prediction of the model, the series resistance obtained by fitting the JV characteristics in the dark as shown in Table 8 was compared with the value obtained by modeling PM-HJ cells with different mixed layer thicknesses. The mobility of the mixed layer with different thicknesses is calculated from the electrical field dependence of the extraction time and all simulated layers show an effective mobility of 4.7×10 -3 cm 2 /V‧s, under the electrical field dependence of 1/extraction time . The resistance of this prediction layer should be linearly related to the thickness, as shown in the inset of Figure 27. The predicted mobility of the 1:1 mixed buffer layer is only an order of magnitude lower than that of pure C 60 , which is relatively high for organic substances. This shows how efficiently these layers can extract charge from the pure layer. As shown in previous simulations, these layers effectively block excitons, leading to spatial separation of excitons and polarons to suppress quenching.
實例20Example 20
如所說明製得圖28所顯示之裝置。完整結構為玻璃基板/ITO(100nm)/MoO3(100nm)/緩衝物1/DBP(20nm)/C60(40nm)/緩衝物2/Ag(100nm),其中緩衝物1及緩衝物2及對應的效率參數測量值顯示於表9中。圖28(a)顯示於1個太陽光模擬AM1.5G照明下之照明之J-V,其中插圖顯示NPD,及(b)顯示具有包含DBP及C60之活性層及各種緩衝物之OPV電池之外部量子效率。
The device shown in Fig. 28 was produced as explained. The complete structure is glass substrate/ITO (100nm)/MoO 3 (100nm)/
各濾波器之厚度、組成及效率參數測量值提供於表9中。相較於參照例,包含NPD之純淨層作為濾波器導致JSC顯著增加同時FF下降。使用包含DBP與NPD之1:1摻雜物之濾波器相較於僅使用NPD可改良FF,同時相較於參照裝置仍可改良JSC。與電極處之電子濾波器結合使用,NDP:DBP電洞濾波器導致PCE之10%增加。 The measured values of the thickness, composition and efficiency parameters of each filter are provided in Table 9. Compared to the reference example, a pure layer containing NPD as a filter causes a significant increase in J SC and a decrease in FF. The use of a 1:1 dopant filter that includes DBP and NPD can improve FF compared to using NPD alone, while still improving J SC compared to a reference device. Used in conjunction with the electronic filter at the electrode, NDP: DBP hole filter results in a 10% increase in PCE.
實例21Example 21
如圖所說明製得圖30所顯示之裝置。完整結構為玻璃基板/ITO/MoO3(10nm)/DBP:C70(1:8)(54nm)/C70(9nm)/緩衝物/Al(100nm)。使此裝置生長於市面購得的預圖案化ITO基板上。採用溶劑及UV-臭氧系統清潔該基板。有機層、金屬氧化物及陰極係在熱蒸發器中以0.1nm/秒之速率沉積。接著藉由在裝置周圍放置環氧層且將載玻片壓在頂部以封裝該裝置。將環氧UV固化。 The device shown in FIG. 30 was produced as illustrated. The complete structure is glass substrate/ITO/MoO 3 (10 nm)/DBP: C 70 (1:8) (54 nm)/C 70 (9 nm)/buffer/Al (100 nm). This device was grown on a commercially available pre-patterned ITO substrate. A solvent and UV-ozone system are used to clean the substrate. The organic layer, metal oxide and cathode are deposited in a thermal evaporator at a rate of 0.1 nm/sec. The device is then encapsulated by placing an epoxy layer around the device and pressing the glass slide on top. Cures epoxy UV.
在一個裝置中,該緩衝層為具有BPhen覆蓋層(5nm)之BPhen:C60(1:1)(10nm)之混合層。在另一裝置中,緩衝層為具有TPBi覆蓋層(3nm)之TPBI:C70(1:1)(10nm)之混合層。應注意,可使用其他寬能隙材料,諸如彼等列於下表10中者及其他述於上文者。 In one device, the buffer layer is a mixed layer of BPhen:C 60 (1:1) (10 nm) with a BPhen cover layer (5 nm). In another device, the buffer layer is a mixed layer of TPBI:C 70 (1:1) (10 nm) with a TPBi cover layer (3 nm). It should be noted that other wide band gap materials may be used, such as those listed in Table 10 below and others described above.
為測試在提高溫度下之壽命,將裝置置於由印刷電路板製成之載體板中。焊接接觸件。用電阻加熱器將銅板附接至裝置以使熱在整個裝置區域散開。採用熱電偶測量溫度。採用氙弧燈以1000W/m2照射該裝置,及每隔30分鐘採用經Matlab程式控制的電流-電壓源電錶進行測量。 To test the life at elevated temperatures, the device was placed in a carrier board made of printed circuit boards. Welding contacts. A resistance heater was used to attach the copper plate to the device to dissipate the heat throughout the device area. Use a thermocouple to measure the temperature. A xenon arc lamp was used to irradiate the device at 1000 W/m 2 , and every 30 minutes, a current-voltage source electric meter controlled by a Matlab program was used for measurement.
圖31A至C顯示採用BPhen之裝置在各種溫度下之標準化性能值,及圖32A至D顯示採用TPBi之裝置在各種溫度下之標準化性能值。如圖31A至C及32A至D中所顯示,歸因於如由其各自的Tg指示的BPhen與TPBi相比之形態不穩定性之故,採用BPhen之裝置的性能尤其隨著溫度增加隨時間降級顯著較採用TPBi之裝置更快速。 Figures 31A to C show the standardized performance values of the device using BPhen at various temperatures, and Figures 32A to D show the standardized performance values of the device using TPBi at various temperatures. As shown in FIGS. 31A to C and 32A to D, due to the morphological instability of BPhen as indicated by their respective T g compared to TPBi, the performance of the device using BPhen in particular increases with temperature. Time degradation is significantly faster than devices using TPBi.
實例22Example 22
圖33所顯示之裝置係如圖所說明且採用與實例21中所述相同的技術製得。完整結構為具有如所顯示各種緩衝層之玻璃基板/ITO/MoO3(10nm)/C70:DBP(8:1)(54nm)/C70(9nm)/緩衝物(15nm)/Al(100nm),該等緩衝層具有寬能隙材料及電子傳導材料之混合層且包含寬能隙材料之覆蓋層。應注意,可使用其他寬能隙材料,諸如彼等述於上文者。圖33顯示55℃下之在緩衝層中採用BPhen之裝置相較於三種各使用一不同的具有高於BPhen的Tg之寬能隙材料(即BAlq、3TPYMB及TPBi)之裝置的相對標準化功率轉換效率。 The device shown in FIG. 33 was as illustrated and manufactured using the same technique as described in Example 21. The complete structure is a glass substrate with various buffer layers as shown/ITO/MoO 3 (10nm)/C 70 : DBP(8:1)(54nm)/C 70 (9nm)/buffer (15nm)/Al(100nm ), the buffer layers have a mixed layer of a wide band gap material and an electron conductive material and include a cover layer of a wide band gap material. It should be noted that other wide band gap materials may be used, such as those described above. Figure 33 shows the relative normalized power of devices using BPhen in the buffer layer at 55°C compared to three devices each using a different wide-gap material with a higher Tg than BPhen (ie, BAlq, 3TPYMB, and TPBi). Conversion efficiency.
如圖33中所顯示,包含具有具有較BPhen高的Tg之寬能隙材料之混合緩衝層之裝置的裝置性能隨時間之降級顯著更低。此等材料之分子結構及其他寬能隙材料Alq3及BP4mPy之分子結構顯示於圖34至38中。 As shown in FIG. 33, the performance of a device including a mixed buffer layer with a wide band gap material having a higher Tg than BPhen is significantly lower in degradation over time. The molecular structures of these materials and the molecular structures of other wide band gap materials Alq 3 and BP4mPy are shown in FIGS. 34 to 38.
圖39至41顯示具有分別包含C70、與TPBi、3TPYMB及BAlq中之一者之混合物之混合緩衝物之裝置在55℃下隨時間變化之標準化響應度、填充因子、VOC及PCE。如圖所顯示,包含TPBi、3TPYMB及BAlq中一者之裝置之標準化性能值(例如,以PCE、VOC、FF及R為主)與包含BPhen之裝置之性能(圖31A至C及圖33中所顯示之BPhen裝置之性能)相比隨時間保持顯著較高。 Figures 39 to 41 show the normalized responsivity, fill factor, V OC, and PCE of the device with a mixed buffer containing C 70 and a mixture with one of TPBi, 3TPYMB, and BAlq, respectively, at 55°C over time. As shown in the figure, the standardized performance values of devices including one of TPBi, 3TPYMB and BAlq (for example, mainly PCE, V OC , FF and R) and the performance of devices including BPhen (FIGS. 31A to C and FIG. 33 The performance of the BPhen device shown in Figure 1) remains significantly higher than time.
實例23Example 23
圖42所顯示之裝置係如圖所說明且採用與實例21中所述相同的技術製得。完整結構為玻璃基板/ITO(160nm)/MoO3(10nm)/C70:DBP(8:1)(54nm)/C70(9nm)/3TPYMB:C60(1:1)(10nm)/Al(100nm)。10nm的3TPYMN:C60層為包含寬能隙材料3TPYMB(3TPYMB的Tg 106℃)之緩衝層。採用與實例21中所述相同的技術測試裝置在高溫下的壽命。圖43至46顯示圖42的裝置分別在55℃、70℃、85℃及100℃下之隨時間變化之標準化響應度、填充因子、VOC及PCE。 The device shown in FIG. 42 is as illustrated and made using the same technique as described in Example 21. The complete structure is glass substrate/ITO(160nm)/MoO 3 (10nm)/C 70 : DBP(8:1)(54nm)/C 70 (9nm)/3TPYMB: C 60 (1:1)(10nm)/Al (100nm). 10nm of 3TPYMN: C 60 layer comprises a wide bandgap material 3TPYMB T g (3TPYMB of 106℃) buffer layer. The life of the device at high temperature was tested using the same technique as described in Example 21. Figures 43 to 46 show the normalized responsivity, fill factor, V OC and PCE of the device of Figure 42 over time at 55°C, 70°C, 85°C and 100°C, respectively.
110‧‧‧電極 110‧‧‧electrode
115‧‧‧激子障蔽性電子/電洞濾波器 115‧‧‧ Excitonic barrier electron/hole filter
120‧‧‧供體/受體 120‧‧‧ Donor/Recipient
130‧‧‧供體/受體 130‧‧‧ Donor/Recipient
135‧‧‧激子障蔽性電子/電洞濾波器 135‧‧‧ exciton shielding electron/hole filter
140‧‧‧電極 140‧‧‧electrode
150‧‧‧光活性區域 150‧‧‧Photoactive area
160‧‧‧光活性區域 160‧‧‧Photoactive area
附圖經併入及構成本說明書之一部分。 The drawings are incorporated and form part of this description.
圖1((a)及(b))顯示根據本發明之例示性有機光敏性光電子裝置之示意圖。裝置A包括激子障蔽性電子濾波器或激子障蔽性電洞濾波器,及裝置B包括激子障蔽性電子濾波器及激子障蔽性電洞濾波器。 FIG. 1 ((a) and (b)) shows a schematic diagram of an exemplary organic photosensitive optoelectronic device according to the present invention. Device A includes an exciton-barrier electronic filter or exciton-barrier hole filter, and device B includes an exciton-barrier electronic filter and an exciton-barrier hole filter.
圖2顯示由依光譜橢圓光度法所測得k計算得的具有1:0()、3:1(▼)、1:1(●)、1:2(■)及0:1()體積摻雜比之C60:BCP膜之消光光譜。插圖:消光之衰減成C60分率之函數。450nm(■),360nm(●)。 Figure 2 shows that calculated from the measured k by spectral ellipsometry with a value of 1:0 ( ), 3:1(▼), 1:1(●), 1:2(■) and 0:1( ) C 60 of volume doping ratio: extinction spectrum of BCP film. Inset: The attenuation of extinction as a function of C 60 fraction. 450nm (■), 360nm (●).
圖3顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線,其中頂部插圖顯示裝置之特徵,及底部之外部量子效率之圖,其中底部插圖顯示裝置結構。(A:B)=1:0(D1),2:1(D2),1:1(D3),及1:2(D4)。 Figure 3 shows the J-V curve of the device at the top under 1 sunlight AM1.5G. The top inset shows the characteristics of the device, and the bottom figure of the external quantum efficiency. The bottom inset shows the structure of the device. (A:B)=1:0 (D1), 2:1 (D2), 1:1 (D3), and 1:2 (D4).
圖4顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線及底部之外部量子效率之圖,其中插圖顯示裝置結構。x=10nm(D7),20nm(D6),30nm(D5)。 Figure 4 shows a graph of the J-V curve of the device at the top under 1 sunlight AM1.5G illumination and the external quantum efficiency of the bottom, where the illustration shows the structure of the device. x=10nm (D7), 20nm (D6), 30nm (D5).
圖5顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線及底部之外部量子效率之圖,其中插圖顯示裝置結構。x=0nm(D8),20nm(D9),及40nm(D10)。 Figure 5 shows the J-V curve of the device at the top under 1 sunlight AM1.5G illumination and the external quantum efficiency of the bottom, where the illustration shows the structure of the device. x=0nm (D8), 20nm (D9), and 40nm (D10).
圖6顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線,及底部之外部量子效率,其中底部插圖顯示裝置結構。「第一C60厚度」係指形成具有DPSQ(x=5nm、15nm、25nm、35nm)之供體-受體異質接面之該至少一種受體材料之厚度。 Figure 6 shows the JV curve of the device at the top under 1 sunlight AM1.5G illumination, and the external quantum efficiency at the bottom, where the bottom illustration shows the structure of the device. "First C 60 thickness" refers to the thickness of the at least one acceptor material forming a donor-acceptor heterojunction with DPSQ (x=5nm, 15nm, 25nm, 35nm).
圖7顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線,及底 部之外部量子效率,其中底部插圖顯示裝置結構。 Figure 7 shows the J-V curve of the top device under the illumination of 1 sunlight AM1.5G, and the bottom The external quantum efficiency of the Department, where the bottom illustration shows the structure of the device.
圖8顯示不同緩衝層針對零偏壓下之EQE標準化之於外加偏壓(+0.5V虛線,-1V實線)下之外部量子效率。 Fig. 8 shows the external quantum efficiency of different buffer layers for EQE normalization under zero bias under applied bias (+0.5V dashed line, -1V solid line).
圖9顯示激子擴散至位於純淨C60活性層頂部之BCP:C60混合層中之蒙地卡羅(Monte Carlo)模擬,僅基於混合膜中可用於激子轉移之減少數目之C60分子。激子係隨機地於活性層中產生。其等隨機地移動設定數目之間距,接著記錄其最終位置。假設激子僅藉由最近鄰跳躍擴散。於混合與活性層之間之界面處,於層之間跳躍之機率係依各層中C60分子之相對數量來衡量。 Figure 9 shows the Monte Carlo simulation of exciton diffusion into the BCP on top of the pure C 60 active layer: C 60 mixed layer, based only on the reduced number of C 60 molecules available in the mixed film for exciton transfer . Excitons are randomly generated in the active layer. They randomly move the distance between the set numbers, and then record their final positions. Assume that excitons only diffuse by nearest neighbor hopping. At the interface between the mixing and active layers, the probability of jumping between layers is measured by the relative number of C 60 molecules in each layer.
圖10在頂部顯示覆蓋不同緩衝層之C70之標準化消光光譜及在底部顯示於底部覆蓋淬滅(NPD)、障蔽(BCP)及混合緩衝層之C70(於450nm下激發)之發射光譜。 Figure 10 shows the normalized extinction spectrum of C 70 covering different buffer layers at the top and the emission spectrum of C 70 (excited at 450 nm) covered by quenching (NPD), barrier (BCP) and mixed buffer layers at the bottom.
圖11顯示覆蓋不同緩衝層之裝置之EQE光譜(頂部)及裝置於0.8個太陽光AM1.5G照明下之J-V曲線。 Fig. 11 shows the EQE spectrum (top) of the device covering different buffer layers and the J-V curve of the device under 0.8 sunlight AM1.5G illumination.
圖12顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線,及底部之外部量子效率之圖,其中底部插圖顯示裝置結構。緩衝物:10nm BCP(D11)、10nm C60:BCP(D12)、10nm PTCBI(D13)、10nm C60:BCP/5nm PTCBI(D14)、10nm BCP:C60/5nm BCP(D15)。 Fig. 12 shows the JV curve of the device at the top under the illumination of 1 sunlight AM1.5G, and the graph of the external quantum efficiency at the bottom, where the bottom illustration shows the structure of the device. Buffers: 10 nm BCP (D11), 10 nm C 60 : BCP (D12), 10 nm PTCBI (D13), 10 nm C 60 : BCP/5 nm PTCBI (D14), 10 nm BCP: C 60 /5 nm BCP (D15).
圖13在頂部顯示具有不同緩衝層之圖12之裝置針對0V EQE標準化之於-1V下之EQE,及在底部顯示裝置之響應度成照明強度之函數。緩衝物:10nm BCP(D11)、10nm BCP:C60(D12)、10nm PTCBI(D13)、10nm BCP:C60/5nm PTCBI(D14)、10nm BCP:C60/5nmBCP(D15)。
Figure 13 shows the EQE of the device of Figure 12 with different buffer layers normalized to 0V EQE at -1V at the top, and the responsivity of the display device at the bottom as a function of the illumination intensity. Buffers: 10nm BCP (D11), 10nm BCP: C 60 (D12), 10nm PTCBI (D13), 10nm BCP:
圖14顯示頂部之裝置於1個太陽光AM1.5G照明下之J-V曲線,及底部之外部量子效率之圖,其中底部插圖顯示裝置結構。x=5nm(D16),15nm(D17),25nm(D18),及35nm(D19)。 Fig. 14 shows the J-V curve of the device at the top under 1 sunlight AM1.5G illumination, and a graph of the external quantum efficiency at the bottom, where the bottom illustration shows the structure of the device. x=5nm (D16), 15nm (D17), 25nm (D18), and 35nm (D19).
圖15顯示頂部之於1個太陽光AM1.5G照明下之J-V曲線及底部之具有不同緩衝層之裝置之外部量子效率之圖。 15 shows a graph of the external quantum efficiency of the J-V curve at the top under 1 sunlight AM1.5G illumination and the devices with different buffer layers at the bottom.
圖16顯示頂部之於1個太陽光AM1.5G照明下之J-V曲線及底部之具有包含不同C60相對BCP之比值之不同緩衝層之裝置之外部量子效率之圖。 16 shows a graph of the external quantum efficiency of a device with different buffer layers containing different ratios of C 60 to BCP at the bottom and the JV curve at the top under 1 sunlight AM1.5G illumination.
圖17顯示具有包含相對厚的1:8體積比之DBP及純淨C70層之活性層之平面混合型OPV電池於1個太陽光模擬AM1.5G照明下之照明之J-V(左上圖)及EQE(右上圖)及提取效率參數(下方)。各緩衝物之BPhen:C70之厚度及體積比提供於表中。 Figure 17 shows the JV (upper left) and EQE of the illumination of a planar hybrid OPV battery with a relatively thick 1:8 volume ratio of DBP and an active layer of pure C 70 layers under 1 sunlight simulated AM1.5G illumination (Upper right) and extraction efficiency parameters (lower). The thickness and volume ratio of BPhen:C 70 for each buffer is provided in the table.
圖18顯示具有包含相對薄的1:8體積比之DBP及純淨C70層之活性層及各種緩衝物之平面混合型OPV電池於0.7個太陽光模擬AM1.5G照明下之照明之J-V(左上圖)及EQE(右上圖)及提取效率參數(下方)。各緩衝物之BCP:C70之厚度及體積比提供於表中。 Figure 18 shows the JV (top left) of a planar hybrid OPV battery with an active layer including a relatively thin 1:8 volume ratio of DBP and pure C 70 layers and various buffers under 0.7 sunlight simulated AM1.5G illumination Picture) and EQE (upper right picture) and extraction efficiency parameters (below). The thickness and volume ratio of BCP:C 70 for each buffer is provided in the table.
圖19((a)、(b)及(c))顯示以BPhen、CBP及UGH2稀釋之EQE及J-V曲線。 Figure 19 ((a), (b) and (c)) shows the EQE and J-V curves diluted with BPhen, CBP and UGH2.
圖20(a)顯示DBP:C70混合-HJ OPV電池於模擬AM 1.5G、1個太陽光照明下之光譜校正電流密度相對電壓(J-V)特徵。陰影區域突顯兩種電池之填充因子(及因此最大功率輸出)之差。插圖顯示裝置結構之示意圖,及(b)顯示(a)中電池之外部量子效率(EQE)光譜。插圖顯示於DBP:C70/緩衝物界面(左側:純淨BPhen緩衝物;右側:BPhen:C60複合緩衝物)處之能階之示意圖。 Figure 20(a) shows the spectrally corrected current density relative voltage (JV) characteristics of DBP: C 70 hybrid-HJ OPV battery under simulated AM 1.5G and 1 sunlight. The shaded area highlights the difference in the fill factor (and therefore maximum power output) of the two batteries. The inset shows a schematic diagram of the structure of the device, and (b) shows the external quantum efficiency (EQE) spectrum of the battery in (a). The inset shows a schematic diagram of the energy levels at the DBP: C 70 /buffer interface (left: pure BPhen buffer; right: BPhen: C 60 composite buffer).
圖21顯示根據雙分子複合理論進行線性擬合(虛線)之混合-HJ對照組電池及複合緩衝物電池之響應度相對光強度。 Fig. 21 shows the relative light intensity of the hybrid-HJ control battery and the composite buffer battery with a linear fit (dashed line) according to the bimolecular recombination theory.
圖22(a)顯示利用3-D蒙地卡羅模擬計算得之不同層厚度之電荷提取時間相對電場。插圖顯示電池串聯電阻(R S )相對層厚度及對自OPV電池獲得之數據(正方形)的線性擬合(虛線)(插圖中之誤差槓較數據點 小),及(b)顯示在λ=520nm之激發波長下獲得之與BPhen(障蔽)、NPD(淬滅)及BPhen:C60混合層接觸之純淨C70層之光致發光(PL)光譜。 Fig. 22(a) shows the relative electric field of charge extraction time of different layer thicknesses calculated by 3-D Monte Carlo simulation. The inset shows the battery series resistance (R S) and the data relative to the layer thickness (squares) OPV cells obtained from the linear fit of the (broken line) (Error bars are smaller than the data points of the illustration), and (b) shown in the λ = The photoluminescence (PL) spectrum of a pure C 70 layer in contact with BPhen (barrier), NPD (quenching) and BPhen: C 60 mixed layer at an excitation wavelength of 520 nm.
圖23(a)顯示於模擬AM 1.5G、1個太陽光照明下之光譜校正電流密度相對電壓(J-V)特徵,及(b)顯示具有不同緩衝層之DBP:C70 PM-HJ OPV電池之外部量子效率光譜。 Figure 23 (a) shows the characteristics of the spectral corrected current density relative voltage (JV) under simulated AM 1.5G and 1 sunlight, and (b) shows the DBP with different buffer layers: C 70 PM-HJ OPV battery. External quantum efficiency spectrum.
圖24顯示對照組電池及具有BPhen:C60/BPhen緩衝物之電池之吸收光譜計算值及內部量子效率計算值。 Figure 24 shows the calculated values of the absorption spectrum and the calculated internal quantum efficiency of the control battery and the battery with BPhen: C 60 /BPhen buffer.
圖25顯示對照組電池及具有BPhen:C60/BPhen緩衝物之電池之響應度(實心正方形)及功率轉換效率(空心正方形)相對光強度。 FIG. 25 shows the response light intensity (solid square) and power conversion efficiency (open square) of the control battery and the battery with BPhen: C 60 /BPhen buffer relative to the light intensity.
圖26(a)顯示於模擬AM 1.5G、1個太陽光照明下之光譜校正J-V特徵,及(b)顯示具有BPhen:C60/BPhen緩衝物之電池中之外部量子效率光譜成BPhen:C60混合層之厚度之函數。 Fig. 26 (a) shows the spectrally corrected JV characteristics under simulated AM 1.5G and 1 sunlight, and (b) shows the external quantum efficiency spectrum in the battery with BPhen: C 60 /BPhen buffer to BPhen: C 60 as a function of the thickness of the mixed layer.
圖27顯示模型化中值提取時間相對電場成BPhen:C60混合層厚度之函數,及插圖顯示串聯電阻相對混合層厚度與擬合。 Figure 27 shows the modeled median extraction time versus electric field as a function of BPhen:C 60 mixed layer thickness, and the inset shows the series resistance relative to the mixed layer thickness and fit.
圖28(a)顯示於1個太陽光模擬AM1.5G照明下之照明之J-V,其中插圖顯示NPD,及(b)顯示具有包含DBP及C60之活性層及各種緩衝物之OPV電池之外部量子效率。 Fig. 28 (a) shows a JV illuminated under 1 sunlight simulation AM1.5G illumination, where the illustration shows NPD, and (b) shows the outside of an OPV battery with an active layer including DBP and C 60 and various buffers Quantum efficiency.
圖29((a)及(b))顯示根據本發明之例示性串聯式有機光敏性光電子裝置之示意圖。裝置A包括激子障蔽性電子濾波器或激子障蔽性電洞濾波器,及裝置B包括激子障蔽性電子濾波器及激子障蔽性電洞濾波器。 29 ((a) and (b)) show schematic diagrams of an exemplary tandem organic photosensitive optoelectronic device according to the present invention. Device A includes an exciton-barrier electronic filter or exciton-barrier hole filter, and device B includes an exciton-barrier electronic filter and an exciton-barrier hole filter.
圖30顯示在混合緩衝層與Al電極之間具有薄BPhen覆蓋層(5nm)之混合BPhen:C60緩衝層(10nm)、或者在混合緩衝層與Al電極之間具有薄TPBi覆蓋層(3nm)之混合TPBi:C70緩衝層(10nm)之DBP:C70裝置。 Figure 30 shows a mixed BPhen with a thin BPhen cover layer (5 nm) between the mixed buffer layer and the Al electrode: C 60 buffer layer (10 nm), or a thin TPBi cover layer (3 nm) between the mixed buffer layer and the Al electrode The mixed TPBi: C 70 buffer layer (10 nm) DBP: C 70 device.
圖31A至31C顯示圖30的具有具有薄BPhen覆蓋層之混合 Bphen:C60緩衝層之裝置分別在50℃、60℃及80℃下之隨時間變化的標準化響應度、填充因子、VOC及PCE。 FIGS. 31A to 31C show the normalized responsivity, fill factor, V OC and time-varying variation of the device of FIG. 30 with a mixed Bphen:C 60 buffer layer with a thin BPhen cover layer at 50°C, 60°C, and 80°C, respectively. PCE.
圖32A至32D顯示圖30的具有具有薄TPBi覆蓋層之混合TPBi:C60緩衝層之裝置分別在50℃、80℃、105℃及130℃下之隨時間變化的標準化響應度、填充因子、VOC及PCE。 FIGS. 32A to 32D show the normalized responsivity, fill factor, and time-varying variation of the device of FIG. 30 with a mixed TPBi:C 60 buffer layer with a thin TPBi cover layer at 50°C, 80°C, 105°C, and 130°C V OC and PCE.
圖33顯示具有各種緩衝物之DBP:C70混合異質接面之隨時間變化之標準化功率轉換效率。 Figure 33 shows the standardized power conversion efficiency of DBP: C 70 hybrid heterojunction with various buffers over time.
圖34至38分別顯示例示性寬能隙材料BAlq、TPBi、Alq3、BP4mPy及3TPYMB之分子結構。 34 to 38 show the molecular structures of exemplary wide band gap materials BAlq, TPBi, Alq 3 , BP4mPy, and 3TPYMB, respectively.
圖39至41顯示具有分別包含C70、與TPBi、3TPYMB及BAlq中之一者之混合物之混合緩衝物之裝置在55℃下隨時間變化之標準化響應度、填充因子、VOC及PCE。 Figures 39 to 41 show the normalized responsivity, fill factor, V OC, and PCE of the device with a mixed buffer containing C 70 and a mixture with one of TPBi, 3TPYMB, and BAlq, respectively, at 55°C over time.
圖42顯示具有混合3TPYMB:C60緩衝層之DBP:C70裝置。 Figure 42 shows a DBP: C 70 device with a mixed 3TPYMB: C 60 buffer layer.
圖43至46顯示圖42的裝置分別在55℃、70℃、85℃及100℃下之隨時間變化之標準化響應度、填充因子、VOC及PCE。 Figures 43 to 46 show the normalized responsivity, fill factor, V OC and PCE of the device of Figure 42 over time at 55°C, 70°C, 85°C and 100°C, respectively.
110‧‧‧電極 110‧‧‧electrode
115‧‧‧激子障蔽性電子/電洞濾波器 115‧‧‧ Excitonic barrier electron/hole filter
120‧‧‧供體/受體 120‧‧‧ Donor/Recipient
130‧‧‧供體/受體 130‧‧‧ Donor/Recipient
135‧‧‧激子障蔽性電子/電洞濾波器 135‧‧‧ exciton shielding electron/hole filter
140‧‧‧電極 140‧‧‧electrode
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