TWI678009B - Display panel and manufacturing method thereof - Google Patents

Abstract

A display panel includes a substrate, an active element layer disposed on the substrate, an insulating layer disposed on the active element layer, a plurality of first electrodes separated from each other, a plurality of dielectric patterns separated from each other and disposed on the first electrode, a plurality of The organic light emitting pattern and the second electrode are disposed on the organic light emitting pattern. The insulating layer has a plurality of first regions and a second region between the first regions. The first electrodes are respectively disposed on the first regions of the insulating layer. The dielectric patterns are respectively disposed on the first electrodes and have a plurality of openings. The openings overlap the first electrodes, respectively. The organic light emitting patterns are respectively disposed on the dielectric pattern and in the opening, and a gap between the dielectric patterns overlaps the second region of the insulating layer. A method for manufacturing a display panel is also proposed.

Description

Display panel and manufacturing method thereof

The present invention relates to a display panel and a manufacturing method thereof, and in particular to a display panel with a dielectric pattern and a manufacturing method thereof.

Organic light emitting diodes (OLEDs) have advantages such as long life, thin thickness, high contrast, low heat generation, and low power consumption, so they have been widely used as indicators or light sources in homes and various devices.

Ink Jet Printing (IJP) can improve the material utilization rate in the OLED manufacturing process to reduce the process cost, but before inkjet coating, a hydrophobic bank (pixels) corresponding to the pixel settings must be formed to Defines the area of each pixel. However, when liquid droplets are sprayed into the accommodating space formed by the retaining wall, the difference between the surface tension of the liquid and the adhesion of the side wall of the retaining wall causes the thickness uniformity of the film formed by the subsequent drying process to be poor, resulting in the surrounding pixels The brightness and chroma are significantly different from the center.

The invention provides a display panel, which can improve the aperture ratio and film thickness uniformity. Degrees to provide good display quality.

The display panel of the present invention includes a substrate, an active element layer disposed on the substrate, an insulating layer disposed on the active element layer, and a plurality of first regions and a second region between the first regions, and a plurality of first electrodes are separated from each other. And disposed on the first region of the insulating layer, a plurality of dielectric patterns are separated from each other and are respectively disposed on the first electrode and have a plurality of openings, a plurality of organic light emitting patterns are disposed on and in the dielectric patterns, and The second electrode is disposed on the organic light emitting pattern. The openings overlap the first electrodes, respectively. A gap between the dielectric patterns overlaps the second region of the insulating layer.

The manufacturing method of the display panel of the present invention includes the following steps. Provide a substrate. An active device layer is disposed on the substrate. An insulating layer is disposed on the active device layer, and the insulating layer has a plurality of first regions and a second region between the first regions. A plurality of first electrodes are disposed on the insulating layer, and the first electrodes are separated from each other and are respectively located on the first region. A plurality of dielectric patterns are disposed on the first electrode. The dielectric patterns are separated from each other and have a plurality of openings. The openings respectively overlap the first electrodes, a gap between the dielectric patterns overlaps a second region of the insulating layer, and the gap exposes the insulating layer. Surface treatment of the exposed insulation layer. A plurality of organic light emitting patterns are disposed on the dielectric pattern and in the openings, respectively. And, a second electrode is disposed on the organic light emitting pattern.

Based on the above, in the display panel according to an embodiment of the present invention, since the display panel is provided with a dielectric pattern on the first electrode, and the dielectric pattern has hydrophilicity and / or ink affinity, the insulation exposed by the gap between the dielectric patterns The layer can be hydrophobic and / or ink repellent through surface treatment. Therefore, the organic light emitting pattern can be fixed to the dielectric pattern. In this way, the display panel can define multiple pixel structures without the need for a conventional retaining wall structure. In addition, the mixing or color mixing of adjacent organic light emitting patterns can be avoided, and the aperture ratio of the display panel can be improved, and the display quality can be improved. In addition, since a conventional barrier wall structure is not required in this embodiment, the film thickness of the organic light emitting pattern can be uniform and uniform, so that the display panel can provide uniform brightness and good display quality.

In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.

10, 10A, 10B‧‧‧ display panel

12‧‧‧ District 1

14‧‧‧Second District

100‧‧‧ substrate

120‧‧‧Active component layer

140‧‧‧ Insulation

142A, 142B‧‧‧ raised structure

150‧‧‧first electrode

160‧‧‧ Dielectric pattern

162‧‧‧ opening

170‧‧‧ electron transmission layer

180‧‧‧Second electrode

200‧‧‧Organic luminous pattern

200’‧‧‧Organic luminescent material

300‧‧‧ Surface treatment

A-A’‧‧‧ hatching

D‧‧‧ Clearance

H1A‧‧‧height

W1‧‧‧First distance

W2‧‧‧Second Distance

1A to 1F are schematic cross-sectional views illustrating a manufacturing process of a display panel according to an embodiment of the present invention.

FIG. 2A is a schematic partial top view of a display panel before a plurality of dielectric patterns are provided according to an embodiment of the present invention.

FIG. 2B is a schematic partial top view of a display panel according to an embodiment of the present invention.

3A is a schematic cross-sectional view of a display panel according to another embodiment of the present invention.

3B is a schematic cross-sectional view of a display panel according to another embodiment of the present invention.

In the drawings, the thicknesses of layers, films, panels, regions, etc. are exaggerated for clarity. Throughout the description, the same reference numerals denote the same elements. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or in conjunction with another element. Piece connections, or intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and / or electrical connection. Furthermore, "electrically connected" or "coupled" means that there are other elements between the two elements.

It should be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, and / or sections, and / Or in part should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a "first element," "component," "region," "layer," or "portion" discussed below may be referred to as a second element, component, region, layer, or section without departing from the teachings herein.

Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have meanings consistent with their meanings in the context of the related art and the present invention, and will not be interpreted as idealized or excessive Formal meaning unless explicitly defined as such in this article.

1A to 1F are schematic cross-sectional views illustrating a manufacturing process of a display panel according to an embodiment of the present invention. FIG. 2A is a schematic partial top view of a display panel before a plurality of dielectric patterns are provided according to an embodiment of the present invention. FIG. 2B is a schematic partial top view of a display panel according to an embodiment of the present invention. FIG. 2A and FIG. 2B only illustrate some components schematically for the convenience of description and observation. In this embodiment, the display panel 10 (drawing (Shown in FIG. 1F) includes a substrate 100, an active device layer 120, an insulating layer 140, a plurality of first electrodes 150, a plurality of dielectric patterns 160, a plurality of organic light emitting patterns 200, and a second electrode 180. Hereinafter, a method for manufacturing the display panel 10 will be described with an embodiment.

Referring to FIG. 1A, a substrate 100 is first provided. The material of the substrate 100 may be glass, quartz, organic polymers, opaque / reflective materials (eg, conductive materials, metals, wafers, ceramics, or other applicable materials) or other applicable materials. If a conductive material or metal is used, the substrate 100 is covered with a layer of insulating material (not shown) to avoid short circuit problems.

Next, an active device layer 120 is disposed on the substrate 100. The active device layer 120 may be, for example, an active device array (not shown), wherein the active device array includes a plurality of thin film transistors (not shown). The thin film transistor is, for example, a low temperature polycrystalline silicon (LTPS) or an amorphous silicon thin film (a-Si), but the invention is not limited thereto.

Then, an insulating layer 140 is disposed on the active device layer 120. The insulating layer 140 has a plurality of first regions 12 and a second region 14 between the first regions 12. In this embodiment, a material of the insulating layer 140 includes an inorganic material. The inorganic material includes silicon nitride (SiN _x ) or other suitable materials, and the present invention is not limited thereto.

Then, a plurality of first electrodes 150 are disposed on the insulating layer 140. These first electrodes 150 are separated from each other and are respectively located on the first region 12. Please refer to FIG. 1A and FIG. 2A at the same time. In this embodiment, each first electrode 150 is disposed on each first region 12, and a plurality of first regions 12 are separated by the second region 14 to be independent of each other. In this real In the embodiment, each first electrode 150 is located in the corresponding first region 12 and arranged in an array manner independently of each other, but the present invention is not limited thereto. In other embodiments, each of the first electrodes 150 may be arranged in a predetermined pattern shape.

In one embodiment, the first electrode 150 may have a single-layer, double-layer or multi-layer structure. The material of the first electrode 150 may be a conductive material, such as: aluminum (Al), silver (Ag), chromium (Cr), copper (Cu), nickel (Ni), titanium (Ti), molybdenum (Mo), magnesium ( Mg), platinum (Pt), gold (Au), etc., or may be, for example, metal oxides, such as: indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium gallium oxide Etc., or another suitable material, or a stacked layer of at least two of the above. For example, the first electrode 150 may have a three-layer structure composed of ITO / Ag / ITO, but the present invention is not limited thereto. In other embodiments, the first electrode 150 may be Ti / Al / Ti or a three-layer structure composed of Mo / Al / Mo. In some embodiments, the method for forming the first electrode 150 may be chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), evaporation (VTE), sputtering (SPT), or Its combination. In some embodiments, the first electrode 150 may serve as an anode of the organic light emitting pattern 200, but the present invention is not limited thereto.

Please refer to FIG. 1B and FIG. 2A. Next, a plurality of dielectric layers 160 are disposed on the first electrodes 150. For example, the dielectric patterns 160 partially overlap the first electrodes 150 in a direction perpendicular to the substrate 100, and a portion of the dielectric patterns 160 is located in the second region 14. These dielectric patterns 160 are separated from each other and have a plurality of openings 162. These openings 162 are located in the first region 12 and overlap the corresponding first electrodes 150 in the direction perpendicular to the substrate 100. Specifically, these openings 162 are exposed These first electrodes 150. In this embodiment, the gap D between the dielectric patterns 160 overlaps the second region 14 of the insulating layer 140, and the gap D exposes the insulating layer 140. In this embodiment, a method for forming the dielectric pattern 160 is, for example, firstly forming a dielectric material (not shown) on the entire surface of the insulating layer 140 and covering the first electrode 150. The dielectric material is patterned by, for example, a yellow light lithography process to form a plurality of dielectric patterns 160 and corresponding openings 162 separated from each other, but the present invention is not limited thereto.

It is worth mentioning that please refer to FIG. 1C, and then perform a surface treatment 300 on the insulating layer 140 exposed on the gap D. For example, the step of performing the surface treatment 300 includes performing a plasma treatment on the insulating layer 140 by using tetrafluoromethane (CF ₄ ) as a working gas. In this embodiment, after the surface treatment step 300 is performed, the insulating layer 140 exposed at the gap D has a high contact angle with Propylene glycol methyl ether acetate (PGMEA), and the contact angle is greater than 40 °. In other words, the insulating layer 140 exposed by the gap D is hydrophobic and / or ink-repellent. Specifically, the exposed insulating layer 140 described above has a hydrophobic surface. In this way, compared with the conventional method of forming a receiving space through a retaining wall structure to define a pixel structure, the embodiment does not need to provide a retaining wall structure to accommodate a subsequently formed organic light emitting pattern 200, and can define pixels Structure and avoid mixing or color mixing of the organic light emitting patterns 200 on the adjacent dielectric patterns 160.

Next, referring to FIG. 1D, FIG. 1E, and FIG. 2B, a plurality of organic light emitting patterns 200 are disposed on the dielectric pattern 160 and the openings 162, respectively. Please refer to FIG. 1D first. In this embodiment, in order to improve the utilization rate of materials to reduce the manufacturing cost of the display panel 10, an ink jet printing (IJP) process may be used to form Machine light pattern 200. For example, the organic light-emitting material 200 'can be disposed on the dielectric pattern 160 by the inkjet coating process and located in the opening 162 and contacting the first electrode 150. The organic light emitting material 200 'is, for example, a liquid material of the organic light emitting pattern 200 as a pixel.

Then, referring to FIG. 1D, FIG. 1E, and FIG. 2B, a solid organic light emitting pattern 200 is formed by drying a liquid organic light emitting material 200 'through a curing process (not shown). In some embodiments, the organic light emitting pattern 200 may be a multilayer structure, including a hole injection layer (HIL), a hole transfer layer (HTL), and an emission layer (EL). FIG. 1E is shown with only one layer structure for convenience of explanation and clear representation.

In some embodiments, the material of the hole injection layer is, for example, xylylene blue copper, star-shaped aromatic amines, polyaniline, polyethylene dioxythiophene, or other suitable materials. The material of the hole transport layer is, for example, triarylamines, cross-structured diamine biphenyls, diamine biphenyl derivatives, or other suitable materials. The light-emitting layer may be a red organic light-emitting pattern, a green organic light-emitting pattern, a blue organic light-emitting pattern, or a light-emitting pattern of different colors (for example, white, orange, yellow, etc.) generated by mixing light of various spectrums.

It is worth noting that the difference between the surface tension of the liquid and the adsorption force of the retaining wall structure will cause the film thickness to be uneven during the drying process of the droplets. Therefore, the thickness of the organic light-emitting pattern formed by the above-mentioned conventional process will gradually increase as the thickness approaches. The structure of the retaining wall is increasing, resulting in uneven film thickness. The display panel 10 according to an embodiment of the present invention provides a dielectric pattern 160 on the first electrode 150, and the PGMEA contact angle of the dielectric pattern 160 is less than 10 °. In other words, the dielectric pattern 160 has hydrophilicity and / or ink affinity. because Accordingly, the droplet-shaped organic light-emitting material 200 'can be adsorbed on the dielectric pattern 160 and fixed to the dielectric pattern 160 through the hydrophobic and / or ink-repellent insulating layer 140. In this way, this embodiment does not need a conventional retaining wall structure to accommodate these organic light-emitting materials 200 ', and a plurality of pixel structures can be defined. Therefore, in addition to avoiding the mixing or color mixing of the organic light emitting patterns 200 on the adjacent dielectric patterns 160, the dielectric patterns 160 can improve the aperture ratio of the display panel 10 and improve the display quality. In addition, since a conventional barrier wall structure is not required in this embodiment, the thickness of the organic light emitting pattern 200 formed after curing the organic light emitting material 200 'can be uniform and uniform, so as to provide uniform brightness and good display quality.

Please refer to FIG. 1F and FIG. 2B. FIG. 1F is a schematic cross-sectional view of the display panel 10 of FIG. 2B along the section line A-A '. Then, a second electrode 180 is disposed on the organic light emitting pattern 200. In this embodiment, before the step of disposing the second electrode 180, the method may further include disposing an electron transport layer 170 between the organic light emitting pattern 200 and the second electrode 180. For example, the electron transport layer 170 is formed on the organic light emitting pattern 200 by a thermal evaporation process to reduce the driving voltage of the organic light emitting pattern 200. The electron transport layer 170 is, for example, disposed on the entire surface of the insulating layer 140 and covering the dielectric pattern 160, and contacts the insulating layer 140 exposed by the gap D in the second region 14. In this embodiment, the material of the electron transport layer 170 may be an oxazole derivative and a tree thereof, a metal chelate (for example, Alq3), an azole compound, a diazanthrene derivative, a silicon-containing heterocyclic compound, or other Suitable material.

In this embodiment, the second electrode 180 may be disposed on the organic light emitting pattern 200 on the entire surface and overlap the dielectric pattern 160, the organic light emitting pattern 200, and the first The electrode 150 is not limited thereto. The material of the second electrode 180 may be a transparent conductive material, such as a metal oxide such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, or indium germanium zinc oxide. In some embodiments, the method of forming the second electrode 180 may be chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), evaporation (VTE), sputtering (SPT), or Its combination. In some embodiments, the second electrode 180 may serve as a cathode of the organic light emitting pattern 200.

In short, since the display panel 10 according to an embodiment of the present invention provides a dielectric pattern 160 on the first electrode 150, and the dielectric pattern 160 has hydrophilicity and / or ink affinity, and the gap D between the dielectric patterns 160 is The exposed insulating layer 140 may be hydrophobic and / or oleophobic through the surface treatment 300. Therefore, the droplet-shaped organic light-emitting material 200 'can be adsorbed on the dielectric pattern 160 and pushed away by the hydrophobicity and / or ink repellency of the gap D of the insulating layer 140 to be fixed on the dielectric pattern 160. In this way, the display panel 10 can define a plurality of pixel structures without using a conventional retaining wall structure to accommodate these organic light-emitting materials 200 '. Therefore, in addition to avoiding the mixing or color mixing of the organic light emitting patterns 200 on the adjacent dielectric patterns 160, the dielectric patterns 160 can improve the aperture ratio of the display panel 10 and improve the display quality. In addition, the manufacturing process of the display panel 10 can be simplified and the manufacturing cost can be reduced. In addition, since a conventional retaining wall structure is not required in this embodiment, the thickness of the organic light emitting pattern 200 formed after curing the organic light emitting material 200 ′ can be uniform and uniform, so that the display panel 10 can provide uniform brightness and good performance. Display quality.

Structurally, please refer to FIG. 1F and FIG. 2B. The display panel 10 includes: The board 100, the active element layer 120 are disposed on the substrate 100, the insulating layer 140 is disposed on the active element layer 120, a plurality of first electrodes 150, a plurality of dielectric patterns 160, a plurality of organic light emitting patterns 200, and a second electrode 180 are disposed On the organic light emitting pattern 200. The insulating layer 140 has a plurality of first regions 12 and a second region 14 between the first regions 12. The first electrodes 150 are separated from each other and are respectively disposed on the first regions 12 of the insulating layer 140. The dielectric patterns 160 are separated from each other and are respectively disposed on the first electrodes 150 and have a plurality of openings 162. The openings 162 overlap the first electrodes 150 in a direction perpendicular to the substrate 100. The organic light emitting patterns 200 are respectively disposed on the dielectric patterns 160 and in the openings 162, and the gap D between the dielectric patterns 160 overlaps the second region 14 of the insulating layer 140. The second electrode 180 is disposed on the organic light emitting pattern 200. In this embodiment, the display panel 10 further includes an electron transport layer 170 disposed between the organic light emitting pattern 200 and the second electrode 180. The electron transport layer 170 contacts the insulating layer 140.

Please refer to FIGS. 1F, 2A, and 2B. In this embodiment, the orthographic projection of each first electrode 150 on the substrate 100 is within the orthographic projection of each dielectric pattern 160 on the substrate 100. In other words, a part of the dielectric pattern 160 may overlap and contact the first electrode 150, and another part may overlap and contact the insulating layer 140. In addition, the organic light emitting pattern 200 overlaps the dielectric pattern 160. The orthographic projection outer edge of the dielectric pattern 160 on the substrate 100 is within the orthographic projection edge of the organic light emitting pattern 200 on the substrate 100. The organic light emitting pattern 200 is in contact with the insulating layer 140 in the gap D. Under the above arrangement, the organic light emitting pattern 200 may be fixed to the dielectric pattern 160. In this way, the display panel 10 can define multiple pixel structures without using a conventional retaining wall structure, and can avoid The mixing or color mixing of the adjacent organic light emitting patterns 200 is avoided, and the display quality is improved. In addition, since a conventional barrier wall structure is not required in this embodiment, the film thickness of the organic light emitting pattern 200 can be uniform and uniform, so that the display panel 10 can provide uniform brightness and good display quality.

In this embodiment, the distance W1 from the edge of the opening 162 to the second region 14 in the direction perpendicular to the substrate 100 is 1 μm or more and 5 μm or less. In addition, the distance W2 from the edge of the first electrode 150 to the outer edge of the dielectric pattern 160 is 1 μm or more and 5 μm or less. Under the above settings, the size of the opening 162 can be adjusted to increase the aperture ratio, and the distance between adjacent organic patterns 200 can be further reduced to increase the number of pixel structures, so the display panel 10 can be further improved. Display quality.

In short, since the display panel 10 according to an embodiment of the present invention provides a dielectric pattern 160 on the first electrode 150, and the dielectric pattern 160 has hydrophilicity and / or ink affinity, and the gap D between the dielectric patterns 160 is The exposed insulating layer 140 may be hydrophobic and / or oleophobic through the surface treatment 300. Therefore, the organic light emitting pattern 200 may be fixed on the dielectric pattern 160. In this way, the display panel 10 can define multiple pixel structures without using a conventional retaining wall structure, and can avoid mixing or color mixing of adjacent organic light emitting patterns 200, and can further improve the aperture ratio of the display panel 10. To improve display quality. In addition, since a conventional barrier wall structure is not required in this embodiment, the film thickness of the organic light emitting pattern 200 can be uniform and uniform, so that the display panel 10 can provide uniform brightness and good display quality.

In the following embodiments, the component numbers and parts of the foregoing embodiments are used. The same reference numerals are used to denote the same or similar elements. For the descriptions that omit the same technical content, reference may be made to the foregoing embodiments, which will not be repeated in the following embodiments.

3A is a schematic cross-sectional view of a display panel according to another embodiment of the present invention. The display panel 10A shown in this embodiment is similar to the display panel 10 shown in FIG. 1F. The main difference is that the second region 14 of the insulating layer 140 has a convex structure 142A, and the convex structure 142A is on the substrate 100. The projection is separated from the orthographic projection of the first electrode 150 on the substrate 100. In this embodiment, the protruding structure 142A and the insulating layer 140 are the same film layer. For example, after the insulating layer 140 is formed, the insulating layer 140 may be patterned through a yellow light lithography process to form a convex structure 142A in the second region 14. Under the above arrangement, the convex structure 142A may be formed between the adjacent first electrodes 150 and assist the dielectric pattern 160 to define a plurality of pixel structures. Specifically, the protruding structure 142A can further avoid mixing or color mixing of adjacent organic light emitting patterns 200 due to flow. In addition, the convex structure 142A is located in the second region 14 having no light-emitting function between the first electrodes 150, so it does not affect the aperture ratio of the display panel 10A. As such, the display panel 10A can obtain technical effects similar to those of the above embodiments.

In this embodiment, the height H1A of the protruding structure 142A is 0.1 μm or more and 10 μm or less. For example, the height H1A of the protruding structure 142A is the height from the top surface 143A of the protruding structure 142A to the surface of the insulating layer 140. Under the above setting, the height H1A of the protruding structure 142A can be adjusted to a thickness similar to that of the organic light emitting pattern 200. Therefore, the film thickness of the organic light emitting pattern 200 can be uniform, and the generation of leakage current can be reduced, so that the display panel 10 can provide a uniform Brightness and good display quality.

3B is a schematic cross-sectional view of a display panel according to another embodiment of the present invention. The display panel 10B shown in this embodiment is similar to the display panel 10A shown in FIG. 3A. The main difference is that the cross-sectional shape of the convex structure 142B of the display panel 10B is circular, and the convex structure 142A of the display panel 10A The cross-sectional shape is trapezoidal. In this way, the display panel 10B can obtain technical effects similar to those of the above embodiment.

In summary, a display panel and a manufacturing method thereof according to an embodiment of the present invention, because the display panel is provided with a dielectric pattern on the first electrode, and the dielectric pattern has hydrophilicity and / or ink affinity, and the dielectric pattern is between the dielectric patterns. The insulation layer exposed by the gap can be hydrophobic and / or ink repellent through surface treatment. Therefore, the organic light emitting pattern can be fixed to the dielectric pattern. In this way, the display panel can define multiple pixel structures without the need for a conventional retaining wall structure, and can avoid mixing or color mixing of adjacent organic light emitting patterns, and can further improve the aperture ratio of the display panel and the display. quality. In addition, since a conventional barrier wall structure is not required in this embodiment, the film thickness of the organic light emitting pattern can be uniform and uniform, so that the display panel can provide uniform brightness and good display quality. In addition, a convex structure may be formed between adjacent first electrodes to further avoid mixing or color mixing of adjacent organic light emitting patterns due to flow. In addition, the raised structure is located in the second region having no light-emitting function between the first electrodes, so it does not affect the aperture ratio of the display panel. In addition, the height of the raised structure can be adjusted to a thickness similar to the organic light emitting pattern. Therefore, the film thickness of the organic light emitting pattern can be uniform, and the leakage current can be reduced, so that the display panel can provide uniform brightness and good display quality.

Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.

Claims (11)

A display panel includes: a substrate; an active element layer disposed on the substrate; an insulating layer disposed on the active element layer, and having a plurality of first regions and a first region between the first regions. Two regions; a plurality of first electrodes separated from each other and respectively disposed on the first regions of the insulating layer; a plurality of dielectric patterns separated from each other and respectively disposed on the first electrodes and having a plurality of openings The openings overlap with the first electrodes, respectively; a plurality of organic light emitting patterns are respectively disposed on the dielectric patterns and in the openings, and the organic light emitting patterns overlap the dielectric patterns, wherein A gap between the dielectric patterns overlaps the second region of the insulating layer, and an outer edge of the orthographic projection of each of the dielectric patterns on the substrate is within an orthographic projection edge of each of the organic light emitting patterns on the substrate; And a second electrode is disposed on the organic light emitting patterns. The display panel according to item 1 of the scope of patent application, wherein the orthographic projection of each of the first electrodes on the substrate is within the orthographic projection of each of the dielectric patterns on the substrate. The display panel according to item 1 of the scope of patent application, wherein a distance from an edge of each of the openings to the second region is 1 μm or more and 5 μm or less in a direction perpendicular to the substrate. The display panel according to item 1 of the scope of patent application, wherein each of the organic light emitting patterns is in contact with the insulating layer in the gap. The display panel according to item 1 of the scope of patent application, further includes an electron transport layer disposed between the organic light emitting patterns and the second electrode, and the electron transport layer contacts the insulating layer. The display panel according to item 1 of the scope of patent application, wherein the second region of the insulating layer has a convex structure, and the convex structure is the same film layer as the insulating layer. The display panel according to item 6 of the scope of patent application, wherein the height of the raised structure is 0.1 μm or more and 10 μm or less. The display panel according to item 6 of the application, wherein the orthographic projection of the convex structure on the substrate is separated from the orthographic projection of the first electrode on the substrate. A method for manufacturing a display panel includes: providing a substrate; providing an active element layer on the substrate; and providing an insulating layer on the active element layer. The insulating layer has a plurality of first regions and a plurality of first regions. A second region in between; providing a plurality of first electrodes on the insulating layer, the first electrodes being separated from each other and being respectively located on the first regions; providing a plurality of dielectric patterns on the first electrodes, The dielectric patterns are separated from each other and have a plurality of openings, the openings respectively overlap the first electrodes, a gap between the dielectric patterns overlaps the second region of the insulating layer, and the gap is exposed The insulating layer; performing a surface treatment on the insulating layer exposed in the gap; providing a plurality of organic light emitting patterns on the dielectric patterns and the openings; and providing a second electrode on the organic light emitting patterns . The method for manufacturing a display panel according to item 9 of the scope of patent application, wherein after performing the surface treatment step, the insulating layer exposed in the gap has a contact angle with propylene glycol methyl ether acetate, and the contact angle is greater than 40 °. The method for manufacturing a display panel according to item 9 of the scope of patent application, wherein the step of performing the surface treatment includes performing plasma treatment on the insulating layer using tetrafluoromethane as a working gas.