TWI563587B - Wafer carrier, apparatus and method for processing wafer - Google Patents
Wafer carrier, apparatus and method for processing waferInfo
- Publication number
- TWI563587B TWI563587B TW102103642A TW102103642A TWI563587B TW I563587 B TWI563587 B TW I563587B TW 102103642 A TW102103642 A TW 102103642A TW 102103642 A TW102103642 A TW 102103642A TW I563587 B TWI563587 B TW I563587B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- processing
- carrier
- wafer carrier
- processing wafer
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102103642A TWI563587B (en) | 2013-01-31 | 2013-01-31 | Wafer carrier, apparatus and method for processing wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102103642A TWI563587B (en) | 2013-01-31 | 2013-01-31 | Wafer carrier, apparatus and method for processing wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201430987A TW201430987A (en) | 2014-08-01 |
TWI563587B true TWI563587B (en) | 2016-12-21 |
Family
ID=51797015
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102103642A TWI563587B (en) | 2013-01-31 | 2013-01-31 | Wafer carrier, apparatus and method for processing wafer |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI563587B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4391511A (en) * | 1980-03-19 | 1983-07-05 | Hitachi, Ltd. | Light exposure device and method |
US4666291A (en) * | 1985-04-17 | 1987-05-19 | Hitachi, Ltd. | Light-exposure apparatus |
US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
US20070195306A1 (en) * | 2006-02-20 | 2007-08-23 | Yun Jang-Hyun | Semiconductor wafer flatness correction apparatus and method |
CN101916739A (en) * | 2010-07-13 | 2010-12-15 | 上海技美电子科技有限公司 | Wafer carrying device |
-
2013
- 2013-01-31 TW TW102103642A patent/TWI563587B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4391511A (en) * | 1980-03-19 | 1983-07-05 | Hitachi, Ltd. | Light exposure device and method |
US4666291A (en) * | 1985-04-17 | 1987-05-19 | Hitachi, Ltd. | Light-exposure apparatus |
US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
US20070195306A1 (en) * | 2006-02-20 | 2007-08-23 | Yun Jang-Hyun | Semiconductor wafer flatness correction apparatus and method |
CN101916739A (en) * | 2010-07-13 | 2010-12-15 | 上海技美电子科技有限公司 | Wafer carrying device |
Also Published As
Publication number | Publication date |
---|---|
TW201430987A (en) | 2014-08-01 |
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