TWD178698S - Outer wall of reactor for semiconductor manufacturing apparatus - Google Patents

Outer wall of reactor for semiconductor manufacturing apparatus

Info

Publication number
TWD178698S
TWD178698S TW105301187F TW105301187F TWD178698S TW D178698 S TWD178698 S TW D178698S TW 105301187 F TW105301187 F TW 105301187F TW 105301187 F TW105301187 F TW 105301187F TW D178698 S TWD178698 S TW D178698S
Authority
TW
Taiwan
Prior art keywords
wall
reactor
gas inlet
semiconductor manufacturing
sectional
Prior art date
Application number
TW105301187F
Other languages
Chinese (zh)
Inventor
Hyun Soo Jang
Jeong Ho Lee
Young Hoon Kim
Original Assignee
Asm Ip Holding Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm Ip Holding Bv filed Critical Asm Ip Holding Bv
Publication of TWD178698S publication Critical patent/TWD178698S/en

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Abstract

【物品用途】;本設計係關於一種用於半導體製造設備的反應器外壁。;【設計說明】;本設計之用於半導體製造設備的反應器外壁整體呈現具有一厚度之圓形環體，在該反應器外壁之頂表面的中心處設置有一第一氣體入口及用於螺旋聯結環繞該第一氣體入口的複數個螺釘孔，一第二氣體入口係設置在該第一氣體入口和該複數個螺釘孔的外側，且用於使電漿電極棒置入其中的二個圓孔係對稱地設置在該第一氣體入口周圍。;本設計之用於半導體製造設備的反應器外壁的外觀造型已顯示於各圖式，其中A-A’全剖面視圖係沿著俯視圖中之A-A’剖面線的全剖面立體圖，且該A-A’全剖面視圖中所揭露的斜線部分用於表示A-A’端面之特徵。[Use of article]; This design is about the outer wall of a reactor used in semiconductor manufacturing equipment. ;[Design Description];The outer wall of the reactor used for semiconductor manufacturing equipment in this design is in the form of a circular ring with a thickness. A first gas inlet and a spiral are provided at the center of the top surface of the outer wall of the reactor. Connecting a plurality of screw holes surrounding the first gas inlet, a second gas inlet is arranged outside the first gas inlet and the plurality of screw holes, and is used to place the plasma electrode rod into two circles. Holes are symmetrically arranged around the first gas inlet. ;The appearance of the outer wall of the reactor designed for semiconductor manufacturing equipment has been shown in each drawing, in which the A-A' full cross-sectional view is a full cross-sectional perspective view along the A-A' cross-sectional line in the top view, and the The hatched portion disclosed in the AA' full cross-sectional view is used to indicate the characteristics of the AA' end surface.

TW105301187F 2016-01-08 2016-03-09 Outer wall of reactor for semiconductor manufacturing apparatus TWD178698S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20160000955 2016-01-08

Publications (1)

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TWD178698S true TWD178698S (en) 2016-10-01

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TW105301187F TWD178698S (en) 2016-01-08 2016-03-09 Outer wall of reactor for semiconductor manufacturing apparatus

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US (1) USD802546S1 (en)
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USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

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