TW201325651A - Phototherapy system - Google Patents

Phototherapy system Download PDF

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TW201325651A
TW201325651A TW100149774A TW100149774A TW201325651A TW 201325651 A TW201325651 A TW 201325651A TW 100149774 A TW100149774 A TW 100149774A TW 100149774 A TW100149774 A TW 100149774A TW 201325651 A TW201325651 A TW 201325651A
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Taiwan
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light
phototherapy system
therapeutic
spot
positioning
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TW100149774A
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Chinese (zh)
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Chien-Chun Lu
Hung-Lieh Hu
Ya-Hui Chiang
Chun-Hsing Lee
Chien-Chu Chen
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Ind Tech Res Inst
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Publication of TW201325651A publication Critical patent/TW201325651A/en

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Abstract

A phototherapy system is provided. The phototherapy system comprises a location assistance module having at least two projection lamps for location, wherein each projection lamp projects a location light, in a different direction, on a target area to produce a light spot; and a light emitting module, for projecting a therapy light on the target area, having an adjustable focal length.

Description

光療系統Phototherapy system

本發明係關於光療系統之定位及對焦控制技術。The invention relates to the positioning and focus control technology of a phototherapy system.

光療法是一種利用自然光或人工光線治療疾病之技術,已廣泛應用於美容及醫療領域。第1圖即一種常見的光療系統外觀結構圖。該光療系統100,其頂部具有一發光模組110,其中具有多個燈泡,可對位於其下方的一施作平台120上所置放之特定物體(例如人體組織)投射治療用光線。Phototherapy is a technique for treating diseases using natural light or artificial light, and has been widely used in the fields of beauty and medical treatment. Figure 1 is a diagram showing the appearance of a common phototherapy system. The phototherapy system 100 has a light-emitting module 110 at the top thereof, and has a plurality of bulbs for projecting therapeutic light to a specific object (for example, human tissue) placed on an application platform 120 located below.

不同波長的光線,無論是可見光或不可見光,皆可透過不同物理效應達成不同的適應症。舉例來說,某些慢性、易復發的皮膚病變,如牛皮癬、白癜風等,特別適合以長波紫外光(UVA)進行治療。然而,雖然紫外線可治療上述特定的皮膚病,但因為其幅射能量較高,若對其所施用範圍或能量強度之掌控稍有不慎,即可能使皮膚或組織受傷,造成極為嚴重的副作用。Different wavelengths of light, whether visible or invisible, can achieve different indications through different physical effects. For example, some chronic, relapsing skin lesions, such as psoriasis, vitiligo, etc., are particularly suitable for treatment with long-wave ultraviolet (UVA). However, although ultraviolet light can treat the above-mentioned specific skin diseases, because of its high radiation energy, if the control of its application range or energy intensity is slightly inadvertent, the skin or tissue can be injured, causing extremely serious side effects. .

因此,亟需一種能夠更易精確控制新式光療系統。Therefore, there is a need for a new phototherapy system that is more easily and accurately controlled.

本發明提供一種光療系統,其包括:一定位輔助模組,包括至少二定位用之定位光源,其分別於不同方向往一目標區投射一定位用光線,以在該目標區產生一第一光斑和一第二光斑,當該定位輔助模組距該目標區一預設距離範圍時,該第一光斑與該第二光斑於該目標區重合;以及一發光模組,用以於該第一光斑與該第二光斑於目標區重合時向該目標區投射一治療用光線,其中該發光模組具有可調式焦距。The invention provides a phototherapy system, comprising: a positioning auxiliary module, comprising at least two positioning light sources for positioning, respectively, projecting a positioning light to a target area in different directions to generate a first spot in the target area; And a second spot, when the positioning auxiliary module is within a predetermined distance range from the target area, the first spot and the second spot are coincident with the target area; and a light emitting module is used for the first The light spot and the second light spot project a therapeutic light to the target area when the second light spot coincides with the target area, wherein the light emitting module has an adjustable focal length.

下文為介紹本發明之最佳實施例。各實施例用以說明本發明之原理,但非用以限制本發明。本發明之範圍當以後附之權利要求項為準。The following is a description of the preferred embodiment of the invention. The examples are intended to illustrate the principles of the invention, but are not intended to limit the invention. The scope of the invention is defined by the appended claims.

本發明係透過提供更佳的定位及對焦機制來達成提升光療系統控制精準度之目的。第2圖係依據本發明一實施例之光療系統示意圖。本發明之光療系統200外型上可具如第1圖光療系統100之外觀,但不必以其為限。本發明之光療系統200至少包括一定位輔助模組210、一發光模組220以及一控制器230。在某些實施例中,本發明之光療系統200可另包括一影像擷取模組(舉例而言,其位置可與定位輔助模組210相當,甚至與該定位輔助模組210整合成一體),其可用以對該發光模組220投射光線之目標區進行影像擷取,藉以觀察治療對象之病灶與光線投射的狀況,達到提升人機介面操控性能之目的。The invention aims to improve the control precision of the phototherapy system by providing a better positioning and focusing mechanism. Figure 2 is a schematic illustration of a phototherapy system in accordance with an embodiment of the present invention. The phototherapy system 200 of the present invention may have the appearance of the phototherapy system 100 as shown in Fig. 1, but is not limited thereto. The phototherapy system 200 of the present invention includes at least a positioning assistant module 210, a lighting module 220, and a controller 230. In some embodiments, the phototherapy system 200 of the present invention may further include an image capture module (for example, the position may be equivalent to the positioning assistance module 210, or even integrated with the positioning assistance module 210) The image can be imaged by the target area of the light emitted by the light-emitting module 220, so as to observe the condition of the lesion and the light projection of the treatment object, thereby improving the manipulative performance of the human-machine interface.

本發明之發光模組220主要功能在於投射一「治療用」光線,而定位輔助模組210主要功能在於投射一「定位用」光線。值得注意的是,由於輻射能越高的光線越需要受到精確地控制,因此,本發明特別適合應用於以紫外線(UV,包括長波紫外線UVA、中波紫外線UVB、短波紫外線UVC等)作為「治療用光線」的光療系統上。然而,在其他實施例中,本發明之治療用光線不必限於特定波長之光線,舉例而言,其可為紅外線(包括遠紅外線、長波紅外線等)、各種可見光,甚至是X光。此外,該治療用光亦可為各種光波的激發形態,即雷射光(或稱「激光」)。The main function of the illumination module 220 of the present invention is to project a "therapy" light, and the main function of the positioning assistance module 210 is to project a "positioning" light. It is worth noting that the higher the radiant energy, the more precisely the light needs to be precisely controlled. Therefore, the present invention is particularly suitable for application as "treatment" by ultraviolet rays (UV, including long-wave ultraviolet UVA, medium-wave ultraviolet UVB, short-wave ultraviolet UVC, etc.). Using light on the phototherapy system. However, in other embodiments, the therapeutic light of the present invention is not necessarily limited to light of a particular wavelength, and may be, for example, infrared (including far infrared, long wave infrared, etc.), various visible light, or even X-rays. In addition, the therapeutic light may be an excitation form of various light waves, that is, laser light (or "laser").

在本發明中,定位用光線與治療用光線有所不同。在某些實施例中,若定位用光線之目的在方便光療系統之操作者以人眼識別,則其應為可見光,且通常為醒目的紅色光;在其他實施例中,若定位用光線之目的在供機器自動識別,則該定位用光線則不限於前述的可見光,然而,可以了解的是,光線所處波段必須與治療用光線存在適當之間隔以免造成混淆誤判。In the present invention, the positioning light is different from the therapeutic light. In some embodiments, if the purpose of locating light is to be recognized by the human eye by an operator of the phototherapy system, it should be visible light, and typically eye-catching red light; in other embodiments, if the light is positioned The purpose is to be automatically recognized by the machine, and the positioning light is not limited to the aforementioned visible light. However, it can be understood that the wavelength of the light must be properly spaced from the therapeutic light to avoid confusion and misjudgment.

如第2圖所示,本發明可另外包括一施作平台240,其可供欲被治療之標的置放之用。舉例而言,患者可將其頭部置於施作平台240之上,並將欲進行光療的臉部特定區域朝向發光模組220。本發明之發光模組220目的在對施作平台240上之目標區(例如患者鼻尖區域)投射一治療用光線。不同於習知技術,本發明之發光模組220具有可調式焦距,目的在於方便操縱者精確地控制治療用光線的施作範圍及能量。下文將分別參照第3A圖及第3B圖說明本發明調整發光模組220焦距的兩種實施例。As shown in Fig. 2, the present invention may additionally include an application platform 240 for placement of the subject to be treated. For example, the patient can place their head over the application platform 240 and face a particular area of the face for which phototherapy is to be performed toward the illumination module 220. The illumination module 220 of the present invention is directed to projecting a therapeutic light onto a target zone (e.g., a patient's nose region) on the application platform 240. Different from the prior art, the illumination module 220 of the present invention has an adjustable focal length for the purpose of facilitating the operator to accurately control the application range and energy of the therapeutic light. Two embodiments of adjusting the focal length of the light-emitting module 220 of the present invention will be described below with reference to FIGS. 3A and 3B, respectively.

第3A圖係本發明一實施例中發光模組220之俯視圖。在此實施例中,本發明之發光模組220係由複數個(9個)排列成矩陣的治療用光線投射燈311~319所組成,其中,各個治療用光線投射燈311~319可分別具有彼此不同但固定的焦距。本發明之控制器230即可依據一預設距離範圍控制具有特定焦距的治療用投射燈開啟或關閉。換言之,此實施例中,發光模組220具有九段焦距可供控制器230選擇。須注意到,在一最佳實施例中,本文中的「預設距離範圍」可設定為治療用光線投射燈與欲進行光療之標的間之一距離範圍,例如10公分至20公分,而控制器230可將具有與該預設距離範圍相等焦距之投射燈予以開啟,並將其他投射燈予以關閉。如此一來,治療用光線即可聚焦於其所施作之區域,並以最高能量施行光療。在某些實施例中,本發明之控制器230亦可藉由控制該發光模組220中具有特定焦距的治療用光線投射燈開啟的數量,達到控制投射光線強度之目的。舉例而言,當欲投射具有一預設強度值之光線至目標區時,可開啟兩個具有正確焦距但強度為該預設強度值之半的治療用光線投射燈。明確地說,當所開啟的兩治療用光線投射燈之光線強度皆小於該預設強度值之半時,兩者所投射之光線重疊區域的混光強度將小於該預設強度值;而當所開啟的兩治療用光線投射燈之光線強度皆大於該預設強度值之半時,兩者所投射之光線重疊區域的混光強度將大於該預設強度值。在一較佳實施例中,目標區的光線強度值應控制在預設強度值的80%至120%之間。值得注意的是,第3A圖之實施例僅為方便說明,本發明之發光模組220中的治療用光線投射燈可以具有各種數目及排列方式,不必以此實施例為限。FIG. 3A is a plan view of a light emitting module 220 according to an embodiment of the present invention. In this embodiment, the illumination module 220 of the present invention is composed of a plurality of (9) therapeutic light projection lamps 311 to 319 arranged in a matrix, wherein each of the therapeutic light projection lamps 311 to 319 may have Different but fixed focal lengths. The controller 230 of the present invention can control the therapeutic projection lamp having a specific focal length to be turned on or off according to a preset distance range. In other words, in this embodiment, the lighting module 220 has a nine-segment focal length that can be selected by the controller 230. It should be noted that in a preferred embodiment, the "preset distance range" herein may be set to a distance between the therapeutic light projection lamp and the target to be phototherapy, for example, 10 cm to 20 cm, and controlled. The projector 230 can turn on the projector lamp having the same focal length as the preset distance range and turn off the other projector lamps. In this way, the therapeutic light can be focused on the area in which it is applied and the phototherapy is performed at the highest energy. In some embodiments, the controller 230 of the present invention can also control the intensity of the projected light by controlling the number of therapeutic light projection lamps having a specific focal length in the illumination module 220. For example, when a light having a predetermined intensity value is to be projected to the target area, two therapeutic light projection lamps having the correct focal length but the intensity being half of the preset intensity value may be turned on. Specifically, when the light intensity of the two therapeutic light projection lamps that are turned on is less than half of the preset intensity value, the light mixing intensity of the overlapping regions of the light projected by the two will be less than the preset intensity value; When the light intensity of the two therapeutic light projection lamps is greater than half of the preset intensity value, the light mixing intensity of the overlapping regions of the light projected by the two will be greater than the preset intensity value. In a preferred embodiment, the light intensity value of the target zone should be controlled between 80% and 120% of the preset intensity value. It should be noted that the embodiment of FIG. 3A is for convenience of description. The therapeutic light projection lamp in the light-emitting module 220 of the present invention may have various numbers and arrangements, and is not limited to this embodiment.

第3B圖係本發明另一實施例中發光模組220之側視圖。在此實施例中,發光模組220包括至少一治療用投射燈320,其係由一收光鏡322、一聚光鏡324以及一光源326所組成。收光鏡322與聚光鏡324皆可為凸透鏡,收光鏡322可自發光源326接收治療用光線,而聚光鏡324則可將自收光鏡322所接收的治療用光線進一步聚焦並投射至目標區。收光鏡322與該聚光鏡324之間具有距離L,在一實施例中,可由光療系統200之操縱者以人工方式調整該距離L;而在另一實施例中,亦可以透過控制器230調整該距離L,舉例而言,該控制器230可依據一預設距離範圍控制該該距離L。無論是透過手動或自動,改變收光鏡322與該聚光鏡324之間的距離L即可達到改變該治療用光線投射燈之焦距F之效果。值得注意的是,調整距離L包括單獨移動收光鏡322、單獨移動聚光鏡324,亦包括同時移動兩者,熟悉本技藝人士可自行選擇最適當之作法。FIG. 3B is a side view of the light emitting module 220 in another embodiment of the present invention. In this embodiment, the light-emitting module 220 includes at least one therapeutic projection lamp 320, which is composed of a light-receiving mirror 322, a condensing mirror 324, and a light source 326. Both the light-receiving mirror 322 and the condensing mirror 324 can be convex lenses. The light-receiving mirror 322 can receive the therapeutic light from the light-emitting source 326, and the collecting mirror 324 can further focus and project the therapeutic light received from the light-receiving mirror 322 to the target area. There is a distance L between the light collecting mirror 322 and the collecting mirror 324. In an embodiment, the distance L can be manually adjusted by an operator of the phototherapy system 200; in another embodiment, the controller 230 can also be adjusted. The distance L, for example, the controller 230 can control the distance L according to a predetermined distance range. Whether the distance L between the light collecting mirror 322 and the collecting mirror 324 is changed manually or automatically, the effect of changing the focal length F of the therapeutic light projection lamp can be achieved. It should be noted that the adjustment distance L includes separately moving the light collecting mirror 322 and separately moving the collecting mirror 324, and also includes moving both at the same time. Those skilled in the art can select the most appropriate method.

為了更精確地定位治療用光線,本發明之定位輔助模組210包括至少二定位光源212及214。如第2圖所示,定位光源212及214分別以不同方向往施作平台240上之目標區250投射一定位用光線,並分別在其上產生光斑A及光斑B,當定位輔助模組210距目標區250一預設距離範圍時,光斑A及光斑B於該目標區250重合或部分重合。在本發明之最佳實施例中,發光模組220會對焦於光斑A與光斑B重合之處,即對焦於位置C。在一實施例中,當光療系統200之偵測單元(圖未示)或其操縱者發現定位光源212及214所產生的光斑A及光斑B並未重合時,即可透過自動或手動方式對施作平台240與發光模組220間的相對距離進行調整,以使光斑A及光斑B確實重合或部分重合於位置C,並落於欲施行光療之目標區250上。在某些實施例中,定位輔助模組210中的定位光源212及214與發光模組220具有固定不變的相對位置,因此,當發光模組220因為與目標區的位置(即前述之「預設距離範圍」)改變而調整其所投射的治療用光線之焦距時,本發明的控制器230亦可依據該預設距離範圍控制該定位輔助模組210中該等定位光源212及214所投射之定位用光線的方向及角度(如圖中之角度α)。然而,在某些實施例中,光線投射燈212及214與發光模組220間的相對位置亦可調整,操縱者可在正式執行光療之前先行對整體光療系統200中的各項參數進行微調。可以了解的是,此實施例中採用兩個定位光源即足以達到輔助定位的效果,然而,在其他實施例中,定位光源亦可具有兩個以上之數量。In order to more accurately locate the therapeutic light, the positioning aid module 210 of the present invention includes at least two positioning light sources 212 and 214. As shown in FIG. 2, the positioning light sources 212 and 214 respectively project a positioning light to the target area 250 on the application platform 240 in different directions, and respectively generate a spot A and a spot B thereon, when the positioning auxiliary module 210 is positioned. When the target area 250 is within a predetermined distance range, the spot A and the spot B overlap or partially coincide with the target area 250. In a preferred embodiment of the invention, the illumination module 220 focuses on where the spot A coincides with the spot B, i.e., focuses on position C. In an embodiment, when the detecting unit (not shown) of the phototherapy system 200 or its operator finds that the spot A and the spot B generated by the positioning light sources 212 and 214 do not coincide, the automatic or manual mode can be adopted. The relative distance between the application platform 240 and the illumination module 220 is adjusted such that the spot A and the spot B do coincide or partially coincide with the position C and fall on the target area 250 where the phototherapy is to be performed. In some embodiments, the positioning light sources 212 and 214 of the positioning assistant module 210 and the lighting module 220 have a fixed relative position. Therefore, when the lighting module 220 is in position with the target area (ie, the foregoing When the preset distance range is changed to adjust the focal length of the projected therapeutic light, the controller 230 of the present invention can also control the positioning light sources 212 and 214 of the positioning auxiliary module 210 according to the preset distance range. The projection uses the direction and angle of the light (the angle α in the figure). However, in some embodiments, the relative position between the light projection lamps 212 and 214 and the illumination module 220 can also be adjusted, and the operator can fine tune the parameters of the overall phototherapy system 200 prior to the official execution of the phototherapy. It can be understood that the use of two positioning light sources in this embodiment is sufficient to achieve the effect of assisting positioning. However, in other embodiments, the positioning light sources may also have more than two.

從前文可了解到,本發明可透過先以定位輔助模組210定位後再開啟發光模組220之方式,避免因光療施作位置不正確所造成的意外傷害,因此特別適用於治療用光線具有高能量而潛藏危險的光療系統上。在某些實施例中,為達到節省功耗的目的,本發明中的治療用或定位光源可由發光二極體所組成,然而,本發明不必以此為限。As can be seen from the foregoing, the present invention can be used for the treatment of light by first positioning the auxiliary module 210 and then turning on the light-emitting module 220 to avoid accidental damage caused by incorrect position of the phototherapy. High energy and hidden danger phototherapy system. In some embodiments, the therapeutic or locating light source of the present invention may be comprised of a light emitting diode for the purpose of achieving power savings. However, the invention is not necessarily limited thereto.

本發明雖以較佳實施例揭露如上,然其並非用以限定本發明的範圍,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可做些許的更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。The present invention has been described above with reference to the preferred embodiments thereof, and is not intended to limit the scope of the present invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

100...光療系統100. . . Phototherapy system

110...發光模組110. . . Light module

120...施作平台120. . . Implementation platform

200...光療系統200. . . Phototherapy system

210...定位輔助模組210. . . Positioning aid module

220...發光模組220. . . Light module

230...控制器230. . . Controller

240...施作平台240. . . Implementation platform

212、214...定位光源212, 214. . . Positioning light source

311~319...光線投射燈311~319. . . Light projection lamp

320...治療用投射燈320. . . Treatment spotlight

322...收光鏡322. . . Light collector

324...聚光鏡324. . . Condenser

326...光源326. . . light source

A、B...光斑A, B. . . Spot

C...位置C. . . position

L...距離L. . . distance

F...焦距F. . . focal length

第1圖即一種常見的光療系統外觀結構圖。Figure 1 is a diagram showing the appearance of a common phototherapy system.

第2圖係依據本發明一實施例之光療系統示意圖。Figure 2 is a schematic illustration of a phototherapy system in accordance with an embodiment of the present invention.

第3A圖係本發明一實施例中發光模組220之俯視圖。FIG. 3A is a plan view of a light emitting module 220 according to an embodiment of the present invention.

第3B圖係本發明另一實施例中發光模組220之側視圖。FIG. 3B is a side view of the light emitting module 220 in another embodiment of the present invention.

200...光療系統200. . . Phototherapy system

210...定位輔助模組210. . . Positioning aid module

220...發光模組220. . . Light module

230...控制器230. . . Controller

240...施作平台240. . . Implementation platform

250...目標區250. . . Target area

212、214...定位光源212, 214. . . Positioning light source

A、B...光斑A, B. . . Spot

C...位置C. . . position

Claims (13)

一種光療系統,包括:一定位輔助模組,包括至少二定位用之定位光源,其分別於不同方向往一目標區投射一定位用光線,以在該目標區產生一第一光斑和一第二光斑,當該定位輔助模組距該目標區一預設距離範圍時,該第一光斑與該第二光斑於該目標區重合。A phototherapy system includes: a positioning assisting module, comprising at least two positioning light sources for positioning, respectively, projecting a positioning light to a target area in different directions to generate a first spot and a second in the target area; The first spot and the second spot coincide with the target area when the positioning auxiliary module is within a predetermined distance range from the target area. 如申請專利範圍第1項所述之光療系統,更包括:一發光模組,用以於該第一光斑與該第二光斑於目標區重合時向該目標區投射一治療用光線,其中該發光模組具有可調式焦距。The phototherapy system of claim 1, further comprising: a light emitting module, configured to project a therapeutic light to the target area when the first light spot and the second light spot coincide with the target area, wherein The lighting module has an adjustable focal length. 如申請專利範圍第1項所述之光療系統,更包括:一控制器,耦接至該定位輔助模組,用以依據該預設距離範圍控制該定位輔助模組中該等定位光源投射該定位用光線之方向。The phototherapy system of claim 1, further comprising: a controller coupled to the positioning auxiliary module, configured to control the positioning light source in the positioning auxiliary module according to the preset distance range Position the direction of the light. 如申請專利範圍第2項所述之光療系統,更包括:一控制器,耦接至該發光模組,用以依據該預設距離範圍控制該發光模組投射該治療用光線之焦距。The phototherapy system of claim 2, further comprising: a controller coupled to the illumination module for controlling the focal length of the illumination module to project the treatment light according to the preset distance range. 如申請專利範圍第4項所述之光療系統,其中該發光模組包括複數個治療用光線投射燈,分別具有不同的焦距;而該控制器用以控制具有特定焦距的治療用投射燈之啟閉。The phototherapy system of claim 4, wherein the illumination module comprises a plurality of therapeutic light projection lamps each having a different focal length; and the controller is configured to control the opening and closing of the therapeutic projection lamp having a specific focal length. . 如申請專利範圍第4項所述之光療系統,其中該發光模組包括至少一治療用投射燈,更包括:一收光鏡,用以自一發光源接收該治療用光線;以及一聚光鏡,用以將自該收光鏡所接收的該治療用光線投射至該目標區;其中,該控制器用以控制該收光鏡與該聚光鏡之間的距離,藉以改變該治療用光線投射燈之焦距。The phototherapy system of claim 4, wherein the illumination module comprises at least one therapeutic projection lamp, further comprising: a light receiving mirror for receiving the therapeutic light from a light source; and a collecting mirror, The therapeutic light received from the light receiving mirror is projected to the target area; wherein the controller is configured to control a distance between the light collecting mirror and the collecting mirror, thereby changing a focal length of the therapeutic light projection lamp . 如申請專利範圍第2項所述之光療系統,其中,其中該發光模組包括複數個治療用光線投射燈;該光療系統更包括:一控制器,耦接至該發光模組,用以依據該預設光線強度值控制該發光模組中該等治療用光線投射燈所開啟之數量。The phototherapy system of claim 2, wherein the illumination module comprises a plurality of therapeutic light projection lamps; the phototherapy system further comprises: a controller coupled to the illumination module for The preset light intensity value controls the number of the therapeutic light projection lamps that are turned on in the light emitting module. 如申請專利範圍第1項所述之光療系統,其中,該第一光斑與第二光斑於目標區為完全重合。The phototherapy system of claim 1, wherein the first spot and the second spot are completely coincident with each other in the target area. 如申請專利範圍第1項所述之光療系統,其中,該第一光斑與該第二光斑於該目標區為部分重合。The phototherapy system of claim 1, wherein the first spot and the second spot are partially coincident with the target zone. 如申請專利範圍第2項所述之光療系統,其中該發光模組係對焦於該至少二定位光源所產生之該等光斑重合之處。The phototherapy system of claim 2, wherein the illumination module focuses on where the spots generated by the at least two positioning light sources coincide. 如申請專利範圍第1項所述之光療系統,更包括一影像擷取模組,用以擷取該目標區之影像。The phototherapy system of claim 1, further comprising an image capturing module for capturing an image of the target area. 如申請專利範圍第2項所述之光療系統,其中該治療用光線為紫外線(UV)。The phototherapy system of claim 2, wherein the therapeutic light is ultraviolet (UV). 如申請專利範圍第2項所述之光療系統,其中該發光模組包括至少一治療用投射燈,而該治療用投射燈係由發光二極體所組成。The phototherapy system of claim 2, wherein the illumination module comprises at least one therapeutic projection lamp, and the therapeutic projection lamp is composed of a light-emitting diode.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI633904B (en) * 2014-02-14 2018-09-01 生旭生物科技有限公司 Sinusoidal drive system and method for phototherapy
TWI785699B (en) * 2021-07-27 2022-12-01 國立臺北科技大學 Phototherapy apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI633904B (en) * 2014-02-14 2018-09-01 生旭生物科技有限公司 Sinusoidal drive system and method for phototherapy
TWI785699B (en) * 2021-07-27 2022-12-01 國立臺北科技大學 Phototherapy apparatus

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