TW200841498A - Process for making contained layers and devices made with same - Google Patents

Abstract

There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a reactive surface-active composition to form a treated first layer having a second surface energy which is lower than the first surface energy; exposing the treated first layer with radiation; and forming the second layer. There is also provided an organic electronic device made by the process.

Description

200841498 IX. Description of the Invention: [Technical Field of the Invention] "Generally speaking" the present disclosure relates to a method of manufacturing an electronic device. The present invention further relates to a device produced by the method. [Prior Art] In many different types of electronic devices, there is an electronic device using organic active materials in a white color. In these devices, an organic active layer is sandwiched between two electrodes. # One type of electronic device Organic light-emitting diodes (OLEDs). Due to their high power conversion efficiency and low processing cost, OLEDs are expected to be used in display applications. These displays are particularly desirable for battery-powered portable electrical T devices. Telephone, personal digital assistant, handheld personal computer and DVD player. This calculation uses the sub-seven g-one temple application to require the display device to have high information capacity, full color and fast video rate in addition to low power consumption.制造 μ μ μ μ μ μ μ μ μ μ 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 μ Straw is manufactured by liquid processing to produce monochrome displays, and spin coating processes have been widely used (see, for example,

AlanJ.Heeger, AppLPhys.Letters58, i982 (i99(7). However, the manufacture of a full-color display requires some modifications to the program used in the early-color display. For example, to make the display have a full-color image Each display pixel is divided into three sub-pixels, and each of the sub-pixels emits three main display colors of red, green, and blue reeds in the middle of the ^ χ 邑 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Forced to prevent liquid coloring materials (ie, 'ink' expansion and color mixing. 120l97.doc 200841498 Several documents providing ink wraps have been described in the literature. These are based on the surrounding structure, surface tension discontinuity and both. The combination of wrap structures for extended geometric obstructions: pixel wells, banks, etc. In order for these structures to be effective, they must be large, comparable to the wet thickness of the deposited material. When luminescent inks are printed in such structures At this time, since it is thirsty on the surface of the structure, the thickness of the structure is reduced near the structure. Therefore, the structures must be removed from the emission "pixel". Domain so that unevenness is not seen in the job. Due to the limited space on the display (especially the high-resolution display), this reduction = the effective emission area of the material. When depositing the charge and the continuous layer of the transport layer, The outer envelope structure usually has a negative impact on quality. Therefore, all layers must be printed. = Outside, when there is a low surface tension material (4) or a gas deposition area, the surface tension discontinuity is obtained. The low surface tension material usually has to be applied before printing or coating the first organic active layer in the :: zone. Generally, when the (four) light emitting layer is connected, the use of the material treatment affects the quality, so all layers must be printed. An ink enveloping technique ^ ^ ^ An example of 辛井, , 3 is the electric barrier treatment of the light barrier structure (image path). Usually, the active layers of the pixels must be printed. ^ All such packages The method is faint and gentleman. It is expected that the continuous coating of one or more layers will hinder the shortcoming of continuous coating. The cost of equipment is popular. Therefore, in the palm, it is required to obtain higher yield and lower [invention content]. Electronic device Improved method. ^月提供# Forming a second layer on the first layer 120I97.doc 200841498 Method 'The method comprises: forming a first layer having a first surface energy; utilizing a reactive surface active combination Treating the first layer to form a treated first layer having a second surface energy lower than the first surface energy; exposing the treated first layer to radiation; and forming a second layer. The invention provides a method for manufacturing an organic electronic device, comprising: a method of positioning a germanium on the electrode, an organic active layer and a second active layer on the organic electrode, the method comprising: the machine is on the electrode Forming a first active surface active layer with a first surface, </ RTI> </ RTI> </ RTI> using a reactive surface active composition to form the first active layer having a lower than the first surface energy; Treated by this - exposing the treated first organic active layer to light formation of the second organic active layer. The present invention also provides an organic electronic device, wherein the first organic active layer and the organic electronic device disposed on the electrode include a step including the first organic active layer and the second organic active layer and the surface activity is active combination. The above summary of the invention and the following detailed description are only for the purpose of limiting the invention, and the invention is defined by the accompanying π and the description, rather than the [the embodiment]. The present invention provides a method for forming a first layer on a first layer, the method comprising: a square layer of the second layer 120197.doc 200841498 opening &gt; forming a first layer having a surface energy; utilizing a reactive surface activity The composition treats the first layer of germanium to form - a treated first layer having a second surface energy lower than "the surface energy of the surface"; exposing the treated first layer to radiation; and applying the second layer to The treated and exposed first layer.

Several aspects and embodiments have been set forth above and are for purposes of illustration and not limitation. It will be understood by those skilled in the art <Desc/Clms Page number number> Other features and advantages of one or more embodiments will be apparent from the following detailed description and claims. This detailed description first focuses on the definition and description of the terms, the subsequent reactive surface active composition, the square &amp;, the organic electronic device and the post-table examples.丄· Definitions and Explanations of Terms Before describing the following examples in detail, some terms are defined or explained. When the term "active" refers to a layer or material, it is intended to mean a layer or material that exhibits the properties of electrons or electrical radiation. In an electronic device, the active material electronically promotes the operation of the device. Examples of active materials include, but are not limited to, materials that conduct 'inject, pass or block-charge (where the charge can be an electron or a hole) and emit radiation or exhibit electron holes when exposed to radiation Material with varying concentrations. Examples of inactive materials include, but are not limited to, planarized materials, insulating materials, and environmental barrier materials. When the term "container" refers to a layer, it is intended to mean that the 忒 忒 layer has not expanded its nitrate area. This layer can affect the combination of a physical barrier structure by the surface energy (3) surface energy. 120197.doc 200841498 § _ my "electrode" is intended to mean - fine, .. , , two structures in the electronic components of the film or structure of the carrier. For example, an electrode can be a _ pole, a cathode, a lightning electrode, a gate electrode, or the like. _Ray, including turtles, capacitors, resistors, inductors, diodes, electronic cymbals, and 仵 power supplies or any combination of them. The term "organic electronic cracking" is intended to mean a device comprising one or more organic semiconductor layers or materials. An organic organic electronic device includes (but is not limited to):

a device that converts electrical energy into a light-emitting device (for example, a light-emitting diode, a light-emitting diode, a diode laser, or a lighting panel)' (7) a device that detects signals using an electronic method (eg, an optoelectronic (four) device, Photoconductive batteries, photoresistors, photoelectric switches, photovoltaic transistors, photocells, infrared (rigid detectors or biosensing benefits)' (3) Devices that convert radiation into electrical energy (eg, photovoltaic devices or solar cells), And (4) a device comprising one or more electronic components (which include one or more organic semiconductor layers) (eg, a transistor or a diode), or any combination of devices in items (1) through (4). "Field fluorination" means an organic compound which is intended to mean that one or more hydrogen atoms in the compound have been replaced by fluorine. The term covers some and all fluorinated materials. ° The term "radiating" / radiation ( ""radiation"" refers to the addition of energy in any form, including any form of heating, the entire electromagnetic spectrum or subatomic particles, whether in the form of radiation, waves or particles. The term "reactive surface active composition" Reference is made to a composition comprising at least one light-sensitive material, and when the composition is applied to a layer, the surface energy of the layer is lowered. The reactive surface active composition is exposed to light 120197.doc •10- 200841498 The composition causes a change in at least one physical property of the composition. The term is abbreviated as "RSA" and refers to a composition that is exposed to radiation before and after. When the term "radiation-sensitive" refers to a material, it is intended to mean exposure to Radiation causes at least one chemical, positive or electrical property of the material to change. The term "surface energy" is the energy required to produce a unit surface area of a material. The surface energy is characterized by a liquid material having a given surface energy that cannot be wetted. The surface of the lower surface energy.

The term "layer" is used interchangeably with the term "film" and refers to a coating that covers the desired area. The term is not limited by size. The zone may be as large as the entire device: or as a specific functional area such as an actual visual display, or a single sub-image 2. The layers and films can be formed by any conventional deposition technique, including gas deposition, liquid deposition (continuous and discontinuous techniques), and heat transfer. "Liquid composition" is intended to mean a material in which the material is dissolved to form a solution. A medium, a liquid medium in which a material is dispersed to form a dispersion: a suspension: a liquid medium in which a suspension or emulsion is formed. "Liquid material: ... means: a liquid _ ', that is, a material at a temperature south of its solidification temperature without adding a solvent or a carrier fluid. "The liquid envelope structure" is intended to mean a This is done in the workpiece where the liquid flows through the red piece - or the plurality of structures alone = constrain or direct the liquid in a zone or region ~, the package structure may comprise a cathode separator or well structure. - Liquid enclosure:::IT. To be referred to as a liquid material, which includes pure liquid, liquid-liquid, less knife discharge, suspension and emulsion. Whether present or not, 120197.doc 200841498 is a liquid medium that can be used in a variety of solvents. The technique used in this paper does not necessarily mean that the acoustic structure is in close proximity to or in contact with another shore, a θ member, or a thick 〇 member or structure. These may be additional, intermediate layers, members or structures. Η Γ〒 The terms “inclusion,” “deformation vocabulary are intended to cover non-existence, and have any” or any other non-exclusive nature. For example, a "process, method, object or instrument

These elements may include other elements that are not explicitly listed or that are inherent in the system. In addition, unless expressly stated to the contrary: &gt; 'No' a 'or' means an inclusive "or" and not an exclusive or ",". For example, a condition A or B can be satisfied by any of the following: A is true (or exists) & B is false (or no a is false (or non-existent) and B is true (or exists) And, the words "and" are used to describe the elements or components described herein. For the sake of convenience, the general meaning of the scope of the invention is given. Unless the term clearly indicates otherwise, it should be understood to include one or at least one and the singular form also includes the plural. The number corresponding to the number of rows in the periodic table is rNew Notation" about &amp; ' Handbook of Chemistry and Physics, % Edition (2000-2001) Unless otherwise stated, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art. Methods and materials similar or equivalent to methods and materials may be used in the practice or testing of the embodiments of the invention, but the methods and materials described in the following are described in the following. #又洛, otherwise all the publications mentioned in this article, patents, patents, and patents, and other references are incorporated herein by reference. T 1 conflicts to the right, this manual ( In addition, Henry's materials, methods, and examples are for illustrative purposes only and are not intended to limit the invention. For the scope not described herein, many specific materials and treatments are known. Details of the method and circuit and can be related to an organic light emitting diode display,

Μ ϋ ϋ 'Light f volts and semiconductor component technology teaching source found. + 2. Reactive Surface Active Composition The Resin Surface Active Composition ("RSA") is a light sensitive composition. When exposed to radiation, at least the physical properties and/or chemical properties of the RSA are altered so that the exposed or unexposed regions can be physically distinguished. The surface energy of the treated material can be reduced by using the treatment. "In 11 cases, 忒RS A is a light-hardening composition. In this case, when exposed to radiation, RSA can become more soluble or dispersed in a liquid 'I shell +, becoming less sticky. It is not soft, not easy to flow, difficult to remove or difficult to absorb. It can also affect other physical properties. In the following examples, the RSA system can radiate softening composition. In this case, 2: when exposed to radiation, RSA can Becomes less soluble or dispersible in a liquid 'I shell' becomes more viscous, softer, more fluid, easier to remove or more easily absorbed. It can also affect other physical properties. Koda Shot can be any physical change that causes RSA Type of radiation. In one embodiment the radiation is selected from the group consisting of infrared radiation, visible radiation, ultraviolet radiation, and combinations thereof, 120197.doc -13 - 200841498. Eight areas of the RSA exposed to radiation and physical areas not exposed to radiation For (hereinafter referred to as "display r-, ^^如J") hunting is performed by any conventional technique. This technique has been widely used in photoresist technology orders. Examples of development techniques include (but are limited to) using a liquid medium. Treatment, treatment with absorbent material, In the viscous material handling and the like "e embodiment 'consistent quality of the RSA - or more radiation-sensitive material constituted. In an embodiment, the RSA consists essentially of a material that becomes hard when exposed to light radiation, or that becomes less soluble, swells or disperses in a liquid medium, or becomes less viscous or less absorbing. In one embodiment, the material is substantially comprised of a material having a radiation polymerizable group. Examples of such groups include, but are not limited to, olefins, propylene (tetra), f-propyl acrylate, and ethylenic bonds. In an embodiment, the RSA material has two or more polymerizable groups that can cause crosslinking. In one embodiment, the RSA consists essentially of a material that softens when exposed to radiation, or that becomes more soluble, swells or disperses in a liquid medium, or becomes more viscous or more absorbing. In an embodiment, the RSA consists essentially of at least one polymer that undergoes degradation of the backbone when exposed to deep uv radiation having a wavelength in the range of 200-300 nm. Examples of polymers that undergo such degradation include, but are not limited to, poly (iv) vinegar, polymethyl acrylate vinegar, polyketones, polychlorite, copolymers thereof, and mixtures thereof. In an embodiment, the RSA consists essentially of at least one reactive material and at least one radiation-sensitive material. When the radiation-sensitive material is exposed to radiation, it produces an active substance that initiates the reaction of the reactive material. Radiation-sensitive fields 120197.doc -14- 200841498 Examples of materials include, but are not limited to, those that generate free radicals, acids, or combinations thereof. In an embodiment, the reactive material can be polymerized or crosslinkable. The polymerization or crosslinking reaction of the material is initiated or catalyzed by the active materials. The radiation sensitive material is typically present in an amount from 1% to 10.0% by weight of the total weight of the RSA. In a consistent embodiment, the RS A consists essentially of a material that hardens when exposed to radiation, or that becomes less soluble, swells or disperses in a liquid medium, or becomes less viscous or less absorbing. In one embodiment, the reactive material is an ethylenically unsaturated compound and the radiation-sensitive material produces a free radical. Ethylene-based unsaturated compounds include, but are not limited to, acrylates, decyl acrylates, vinyl compounds, and combinations thereof. Any of the well-known types of radiation-sensitive materials that generate free radicals can be used. Examples of radiation-sensitive materials that generate free radicals include, but are not limited to, benzoquinone, benzophenone, benzoin ether, aryl ketone, peroxide, diimidazole, benzyl dimethyl ketal, hydroxyalkyl phenyl Acetophenone, dialkoxyacetophenone, trimethylbenzimidylphosphine oxide derivative, aminoketone, benzhydrylcyclohexanol, methylthiophenylmorpholinyl ketone, morpholinylbenzene Amino ketone, α-haloacetophenone oxysulfonyl ketone, sulfonyl ketone, oxysulfonyl ketone, sulfonyl ketone, benzhydryl decyl ester, thioxanthene, camphorquinone, Coumarinone, and Michler ketone. Alternatively, the radiation-sensitive material may be a mixture of compounds, one of which provides free radicals when caused by a sensitizer activated by radiation. In one embodiment, the radiation-sensitive material is sensitive to visible or ultraviolet radiation. In one embodiment, the RSA is a compound having one or more crosslinkable groups. The crosslinkable group may have a moiety containing a double bond, a triple bond, and capable of forming a double 120197.doc -15-200841498 bond precursor or a heterocyclic addition polymerizable group in situ. Some examples of crosslinkable groups include benzocyclobutane, azide, oxirane, bis(hydrocarbyl)amine, cyanate, hydroxy, glycidyl ether, acrylic acid, vinegar, C1-10 alkyl methacrylate, alkenyl, alkenyloxy, fast radical, imine, nadimide, tri(C1-4)alkylcarboxyoxy, tris((:1,4) alkane a mercaptoalkyl group, and a halogenated derivative thereof. In one embodiment, the crosslinkable group is selected from the group consisting of vinylbenzyl, p-vinylphenyl, perfluorovinyl, perfluorovinyloxy a group consisting of benzo-3, a heart-butan-1-yl group, and a p-(benzo-3,4-cyclobutan-1-yl)phenyl group.

In an embodiment, the reactive material can undergo acid initiated polymerization and the radiation sensitive material produces an acid. Examples of such reactive materials include, but are not limited to, epoxy resins. Examples of radiation-sensitive materials that generate acid include, but are not limited to, thioindigo and rust salts, such as hexafluorophosphonate diphenyl moth. In one embodiment, the RSA consists essentially of a material that softens when exposed to radiation, or that becomes more soluble, swells or disperses in a liquid medium, or becomes more viscous or more absorbing. In one embodiment, the reactive material is a phenolic resin and the radiation-sensitive material is diazonaphthoquinone. Other radiation sensitive systems known in the art can be used as well. In an embodiment, the RS A comprises a fluorinated material. In one embodiment, the RS A comprises an unsaturated material having one or more fluoroalkyl groups. In one embodiment, the fluoroalkyl groups have from 2 to 20 carbon atoms. In one embodiment, the RSA is a fluorinated acrylate, fluorinated ester or fluorinated olefin monomer. Examples of commercially available materials that can be used as RSA materials include, but are not limited to, Zonyl Plus 8857A (a species from Ε· I· du Pont de Nemours and 120197.doc -16 - 200841498)

Company (Wilmington, DE) purchased fluorinated unsaturated ester monomer) and acrylic acid purchased from Sigma-Aldrich Co., Ltd. (St. Louis, MO) 3,3,4,4,5,5,6 6,6,7,8,8,9,9,10,10,11,11,12512512- twenty-one Dundecyl ester (H2〇CHC02CH2CH2(CF2)9CF3). In a consistent embodiment, the RSA is a fluorinated macromonomer. The term "macromonomer" as used herein, refers to an oligomeric material having one or more reactive groups that are capped or pendant from the chain. In some embodiments, the macromonomer has a greater than

The molecular weight of 1000; in some cases, greater than 50 G0. In some embodiments, the primary bond of the macromonomer comprises a shunt segment and a perfluoro bond segment. In some embodiments, the backbone of the macromonomer comprises a burn-in segment and a perfluoro-filament segment. In some embodiments, the backbone of the macromonomer comprises a partially alkylated or partially fluorinated ether segment: in some embodiments, the macromonomer has - or both capping polymerizable or Crosslinkable groups. The material of the composition, which is preferably a material having a coating of the (four) bond or a material having a side chain of the polystyrene, forms a film having a different surface energy and a different material of the side chain. In a

In the case of the genus, the RS fluorinated backbone and some or all of the fluorinated side chains. 〃

The film of the RSA of the surface chain and the RSA of the side chain will be formed. Therefore, the film formed in the spleen is low D, and 忒rsa is applied to the first sound radiation to expose the side chains to a pattern exposed to the hard enamel, sub-developed to be exposed to the radiation. chain. This is obtained

In the area of the side chain of your β temple, A can, and in 1, the 俾 兮 / 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 In some real I, there is a lower surface energy. (4) The side chain system escapes thermally and the system is lysed by heating (like red trap, ... 伪 pseudo-production, field shot). In this case, it is obvious that it can be exposed to infrared radiation, ~ empty or treated with a solvent, and / or 'development can be applied by the application of true u ° - some of the side chains are borrowed from Υν radiation cracking. As with the infrared system described above, development can be carried out. •, or hunting by vacuum or solvent treatment 2 In the example of 'the RSA contains a reactive group and a second type of: two materials. A second type of functional group may be present to improve the physical plasticity or photophysical properties of the RSA. Examples of groups that modify the nature of the treatment include an example group of groups that enhance the physical properties of the group, such as a saliva, a triarylamine group, or a geminyl group, in an embodiment, when the RSA is exposed to radiation. Reacts with the underlying zone. The exact mechanism of the reaction should depend on the materials used. After exposure to radiation, the RSAe in the unexposed areas is removed by suitable development treatment to remove only the RSA in the unexposed areas. In some embodiments, the same portion of the two removes the RSA in the exposed zone, which leaves a thinner layer in the zones. In some embodiments, the RSA thickness retained in the exposed area of the material is less than 50 angstroms. In some embodiments, the thickness of the Rs A retained in the exposed areas is substantially a single layer. 3 Methods In the methods provided herein, Forming a first layer, treating the first with a reactive surface composition (rRSA), exposing the treated first layer to radiation, and forming a first layer on the treated and exposed first layer Two 120197.doc •18· 200841498 layers. In an embodiment, the first layer substrate. The substrate can be inorganic or organic. Examples of substrates include, but are limited to, faces, (iv), and polymeric films (e.g., polyester and polyimide films). In the embodiment, the first layer is an electrode. The electrode can be unpatterned "patterned. In one embodiment, the electrodes are patterned in parallel lines. The electrode can be located on the substrate. • In an embodiment the first layer is deposited on the substrate. The first layer can be patterned or unpatterned. In one embodiment, the first layer is an organic active layer in an electronic device. The first layer can be formed by any deposition technique including gas deposition techniques, liquid deposition techniques, and thermal transfer techniques. In one embodiment, the first layer is deposited by a liquid deposition technique followed by drying. In this case, a first material is dissolved or dispersed in the liquid medium. The liquid deposition method can be continuous or discontinuous. Continuous liquid deposition techniques include, but are not limited to, spin coating, roller coating, curtain coating, dip coating, slot die coating, spray coating, and continuous nozzle coating. Discontinuous liquid deposition techniques include, but are not limited to, ink jet printing, gravure printing, flexographic printing, and screen printing. In one embodiment, the first layer is deposited by a continuous liquid deposition technique. The drying step can be carried out under a temperature or face/JHL as long as the first material and any underlying material are not damaged. This first layer is treated with RS A. This treatment can be carried out simultaneously with or after the formation of the first layer. In one embodiment, the RSA treatment is performed simultaneously with or after the formation of the first organic active layer 120197.doc -19- 200841498. In one embodiment, the RSA is added to the liquid composition used to form the first layer. When the deposited composition is dried to form a film, the RSA migrates to the air interface (i.e., the top surface) of the first layer to reduce the surface energy of the system. In one embodiment, the RSA processing is performed after forming the first layer. In one embodiment, the RSA applies a cover as a separate layer and directly contacts the first layer. In the case of Bayes, RS A can be applied without adding a solvent thereto. In one embodiment, the RSA is applied by gas deposition. In one embodiment, the RSA is liquid at room temperature and applied to the first layer by liquid deposition. The liquid RS A may be formed into a film or it may be absorbed or adsorbed on the surface of the first layer. In one embodiment, the liquid RSA is cooled to a temperature below its melting point to form a second layer on the first layer. In one embodiment, RsA is not liquid at room temperature and is heated above its melting point to temperature, deposited on the first layer, and cooled to room temperature to form a second layer on the first layer. For the liquid deposition, any of the above methods can be used. In one embodiment, the RS A is deposited from a second liquid composition. The liquid deposition method can be continuous or discontinuous as described above. In one embodiment, the RSA liquid composition is deposited using a continuous liquid deposition process. The choice of liquid medium used to deposit the RSA should depend on the exact nature of the material a itself. In one embodiment, the RSA is a fluorinated material and the liquid medium is a fluorinated liquid. Examples of fluorinated liquids include, but are not limited to, perfluorooctane, trifluorotoluene, and hexafluoroxylene. In some embodiments, the RSA process includes a first step of forming a 120197.doc -20-200841498 sacrificial layer on the first layer and a second step of applying an RSA layer to the sacrificial layer. The sacrificial layer is easier to process by any selected development than the RSA layer: the layer is removed. Thus, after exposure to radiation, the RSA layer and the sacrificial layer in the exposed or unexposed regions are removed in the development step as described below. The sacrificial layer is intended to promote complete removal of the RSA layer in the selected region and to protect the underlying first layer from any adverse effects of the reactive species in the RSA layer. After the (10) treatment, the treated first layer is exposed to radiation. The type of reflection should be based on the sensitivity of the RSA, as described above. The exposed field may be blanket-integrated, or the exposure may be exposed as a pattern. As used herein, the term "by" indicates that only the selected portion of the material or layer is exposed. Exposure to the pattern can be achieved using any conventional imaging technique. In a κ embodiment, the pattern is achieved by exposure by means of a mask. In the example, the pattern is achieved by using only portions of the laser exposure. Exposure time can range from a few seconds to several octaves to several knives, depending on the RSA used

Specific chemical properties. When using Emperor M to use the field, look at the power of the laser, each single

A shorter exposure time can be used in a single zone. # A A — The road steps can be in the air rolling or emotional chaos::, depending on the sensitivity of the materials. In the case of K %, the radiation is selected from the group consisting of ultraviolet radiation (1G-390 nm), Koda Shot (390-770 nm), infrared light shot, and a combination thereof, and the group is not woody. Including the same day and processing. In one embodiment, the train is thermally radiated. In the case of her only exposure to radiation, the temperature and duration of the heating step by heat are such that at least the physical properties of the RSA change without damaging any underlying layers of the luminescent region. In the case of Besch, the addition, ® # / heat / dish is less than 25 〇. Hey. In one embodiment, 120197.doc -21 - 200841498 the heating temperature is below 150 °C. In an embodiment, the radiation is ultraviolet or visible radiation. In one embodiment, the radiation is applied in a pattern which results in an exposed area of the RSA and an unexposed area of the RSA. - In one embodiment, after exposure to radiation in a pattern, the first layer is treated to remove exposed or unexposed regions of the RS A. It is known in the art of photoresist to be exposed to radiation in a pattern and to remove exposed or unexposed areas. In one embodiment, exposing the RSA to radiation changes the solubility or dispersibility of the RSA in a solvent. When the exposure is carried out in a pattern, this can be followed by a wet development process. This treatment typically involves washing with a solvent that dissolves, disperses or removes a type of zone. In one embodiment, exposure to radiation in a pattern such that the exposed area of the RSA is insoluble and treated with a solvent removes the unexposed areas of the RSA. In one embodiment, exposing the RSA to visible or UV radiation causes a reaction that reduces the volatility of the RSA in the exposed zone. When the exposure is applied as a pattern, this can be followed by a thermal development process. The treatment involves heating to a temperature above the volatilization or sublimation temperature of the unexposed material and below the thermal reactivity of the material. For example, for a polymerizable monomer, the material should be heated at a temperature above the sublimation temperature and below the thermal polymerization temperature. It should be understood that the RS A material with a thermal reaction temperature near or below the volatilization temperature may not be developed in this manner. In one embodiment, exposing the RSA to radiation causes a change in the temperature at which the material melts, softens, or flows. When the exposure is carried out in a pattern, this can be followed by a dry development process. The dry development process can include contacting the outermost surface of the element 120197.doc -22- 200841498 with an absorbent surface to absorb or absorb the softer portion. This: ., member &quot; can be applied in between, as long as it does not further affect the nature of the initial unexposed area. After the RSA treatment and exposure to light shot, the t-hai layer has a lower surface energy than the treatment 1. In the case where a portion of the RSA is removed after exposure to radiation, the area of the first layer covered by the RSA will have a lower surface energy than the area not covered by the enthalpy. One way to determine relative surface energy is to compare the contact angle of a given liquid on the first organic active layer before and after treatment with RSA. The contact angle as used herein is intended to mean the angle φ shown in Fig. 1. For a drop of liquid medium, the angle Φ is defined by the plane of the surface intersecting the line from the outer edge of the drop to the surface. Moreover, the angle 〇 is measured after the droplet is applied to the equilibrium position on the surface, i.e., the "stationary contact angle". Several manufacturers have created equipment capable of measuring contact angles. A second layer is then applied to the first layer treated by RSA. This second layer can be applied by any deposition technique. In one embodiment, the second layer is applied by a liquid deposition technique. In this case, a liquid composition comprises a second material which is dissolved or dispersed in a liquid medium, applied to the rsa-treated layer, and dried to form a second layer. The liquid composition is selected to have a surface energy greater than that of the first layer treated by RSA, but substantially equal to or less than the surface energy of the untreated first layer. Thus the liquid composition will wet the untreated first layer but will be excluded from the RS A treated zone. The liquid can expand over the area treated by RSA, but it will dewet. 120197.doc -23 - 200841498 In one embodiment, the RSA is patterned and the second layer is applied using a continuous liquid deposition technique. In one embodiment, the second layer is applied using a discontinuous liquid deposition technique. In one embodiment, the RSA is unpatterned and the second layer is applied using a discontinuous liquid deposition technique. In one embodiment, the first layer is applied to a liquid enclosure structure. Month b would be desirable to use a structure that is not sufficient to completely enclose, but still allows adjustment of the thickness uniformity of the printed layer. In this case, it may be desirable to control the wetting of the thickness adjustment structure, which provides both containment and uniformity. It is therefore desirable to be able to adjust the contact angle of the luminescent ink. Most surface treatments used for wrapping (a) such as 'CF4 plasma' do not provide this level of control. In a lean embodiment, the first layer is applied to a so-called bank structure. The bank structure is typically formed from a photoresist, an organic material (e.g., polyimide), or an inorganic material (oxide, nitride, and the like). The bank structure can be used for wrapping, liquid-opening the first layer of the y type to prevent color mixing; and, or when the first layer is used to improve its thickness from its liquid form dry material; and/or Hanxia ## is free from contact with the liquid. The underlying components can include conductive traces, conductive traces around the ray, m(d), (4), lyon transistors, electrodes, and the like. It is generally desirable to achieve two or more purposes for the formation of zones having different surface energies in the structure of the slabs (e.g., to prevent color mixing and also to improve: degree uniformity). One approach is to provide a bank structure with several layers, each layer having a different surface energy. A more cost-effective way to achieve surface energy adjustment is to adjust the surface energy by adjusting the radiation used by RSA. Fortunately, this adjustment can be in the form of energy w (power * exposure time), or by using a reticle pattern of different surface energies by means of a plate to expose the rsa (for example, to help halftone density cover) Cover exposed).曰 In the embodiments of the methods provided herein, the first and second organic active layers.兮 wear. ^ ^ kiL 0 曰白句一二五海弟 an organic active layer is formed on a first electrode, the first organic active layer is treated with a reactive surface active composition to reduce the surface energy of Μ And forming the second organic active layer on the treated first organic active layer. In one embodiment, the first organic active layer is formed by liquid deposition of a liquid composition comprising the first organic active material and a liquid medium. The liquid composition is deposited on an electrode and then dried to form a layer. In one embodiment, the first organic active layer is formed by a continuous liquid deposition process. These methods result in higher yields and lower equipment costs. In one embodiment, the RSA treatment is performed after forming the first organic active layer. In an embodiment, the RSA is applied as a separate layer to cover and contact the first organic active layer. In an embodiment, the rsa is deposited from a second liquid composition. The liquid deposition method can be continuous or inconsistent, as described above. In an embodiment, the rsa liquid composition is deposited using a continuous liquid deposition process. The thickness of the rsa layer may depend on the final use of the material. In some embodiments, the RSA layer has a thickness of at least 1 angstrom. In some embodiments, the RSA layer is between 100-3 〇〇fH 々戸 · · a iVl ^ angstroms, in some embodiments 1 〇〇〇 2 埃 angstroms. After the RSA treatment, the treated first organic active layer was exposed to light 120197.doc -25-200841498. The type of light shot used should depend on the sensitivity of the RSA, as described above. The exposure can be blanket-integrated, or the exposure can be exposed as a pattern. In one embodiment, exposing the RSA to radiation changes the solubility or dispersibility of the rsa in a liquid medium. In the embodiment, the exposure is carried out in accordance with a pattern. This can then be treated with a liquid medium to remove rsa exposed or unexposed portions of the RSA. In the embodiment, the rsa is radiation hardened and the unexposed portions are removed by the liquid medium. 4. Organic electronic device The method is further explained in terms of its application in an electronic device, but it is not limited to this application. Figure 2 is an exemplary electronic device, i.e., an organic light emitting diode (〇LED) display, which includes at least two organic active layers between two electrical contact layers. The electronic device 100 includes one or more layers 120 and 13() to facilitate injecting holes from the anode layer 110 into the photoactive layer 140. Generally, when two layers are present, the layer 120 adjacent to the anode is referred to as a hole injection layer or a buffer layer. The layer 13 adjacent to the photoactive layer is referred to as a hole transport layer. An optional electron transport layer 15 is interposed between the photoactive layer 140 and the cathode layer 160. Depending on the application of the device, the photoactive layer 140 can be an illuminating layer (for example, in a light-emitting diode or a luminescent electrochemical cell) excited by an applied voltage, and can respond to radiant energy and A layer of material that produces a signal with or without an applied bias (eg, in a photodetector). The device is not limited by the system, the driving method, and the mode of use. For a multi-color device, the photoactive layer 140 is composed of at least three different colors 120197.doc -26 - 200841498

Different regions of color. The area where X is brought into the w color can be formed by printing a separate colored area. Alternatively, it may be formed by embossing the ruthenium layer and using different regions of the ruthenium layer, and luminescent materials having different colors. This method is described in U.S. Patent Application Serial No. 2004-009068. The novel method described herein can be used to apply an organic layer (layer) to an electrode layer (layer). In one embodiment, the first layer is an anode 110 and the second layer is a buffer layer 12〇.

In some embodiments, the novel methods described herein may be directed to any continuous organic layer pair in the device, wherein the second layer is contained in a particular zone. In one embodiment of the novel method, the second organic active layer is a photoactive layer 140, and the first organic active layer is a device layer applied just prior to layer 14〇. In many cases, the device begins to construct with the anode layer. When the hole transport layer 13 is present, the RSA process should be applied to layer 130 prior to application of the photoactive layer 14 layer. The RSA process is applied to layer 120 when layer 13 is absent. In the case where the device is constructed with the cathode, the RSA treatment should be applied to the electron transporting sound 150 before the photoactive layer 14 is applied. θ In one embodiment of the novel method, the second organic active layer is a hole transport layer 130, and the first organic active layer is a device layer applied just prior to layer 13〇. In an embodiment in which the device is constructed with the anode layer, the RS treatment should be applied to the buffer layer 120 prior to application of the hole transport layer 13 . In one embodiment, the anode 110 is in a parallel strip pattern. form. The buffer layer 120 and optionally the hole transport layer 130 is formed as a continuous layer on the anode 120197.doc -27- 200841498. The RSA system is applied as a separate layer directly to the layer 130 (when present or layer 120 (when the sound is sixties) The RSA is exposed in a pattern to expose the areas between the anode strips and the outer edges of the anode strips. The layers in the apparatus can be used in any conventional layer. The device may comprise a carrier or substrate (not shown) that may be adjacent to the anode layer 110 or the cathode layer 150. In most cases, the carrier is adjacent to the anode layer 110. The body may be flexible or A rigid, organic or inorganic material. Typically, a glass or flexible organic film can be used as a carrier. The anode layer 110 is an electrode that is more efficient for electrical injection than the cathode layer 150. The anode can include a metal, Mixing materials of metals, alloys, metal oxides or mixed oxides. Suitable materials include Group 2 elements (ie, Be, Mg, Ca, Sr, Ba, 、, Group 11 elements, Groups 4, 5 and 6 elements and 81〇) a mixed oxide of a family transition element. If the anode layer 110 is For light, a mixed oxide of elements of Groups 12, 13 and 14 can be used, such as a s-tin oxide. The phrase "mixed oxide" as used herein means having an element selected from Group 2 elements or Groups 12 and 13 Oxides of two or more different cations. Some non-limiting specific examples of materials for the breeze layer 110 include, but are not limited to, steel tin oxide ("TM"), in-tin oxide, Gold, silver, copper and recorded. The anode may also be coated with an organic material such as 'polyaniline, polythiophene or polypyrrole. The anode layer 110 may be formed by a chemical or physical gas deposition process or a rotary casting process. Deposition can be performed as a chemically enhanced chemical gas deposition ("PECVD") or metal organic chemical gas deposition ("MOCVD"). Physical gas deposition can include all forms of sputtering, including ion beam emission and electron beam Evaporation and resistance evaporation. Physics 120197.doc -28- 200841498 Specific forms of gas deposition include "magnetron sputtering and induced coupling plasma physical gas deposition ("IMP-PVD"). These sputtering techniques are semi-conducting industry It is well known to us. t Typically, the anode layer 110 is patterned in a lithographic process. The pattern can be varied as desired. The layers can be patterned, for example, prior to application of the first electrical contact layer material. The mask or the anti-caries agent Newton-flexible composite barrier is structurally formed in a pattern. Alternatively, the layers may be applied as a unitary 2 (also known as blanket deposition) and subsequently used (for example) A patterned anti-money layer and wet chemical or dry (four) technique are used for patterning. Other patterning processes known in the art can also be used. When the electronic devices are in the array, the anode layers 110 are typically formed substantially parallel and A plurality of strips extending substantially in the same direction in the length direction. The σ buffer layer 120 serves to cause holes to be injected into the photoactive layer and to smooth the surface of the anode to prevent shorting of the device. The buffer layer is typically formed from a polymeric material that is typically doped with a protic acid (e.g., polyaniline (poly) or poly = oxy phenoxy (PEDOT). The protic acids may be, for example, poly(phenylethylene sulfonic acid), poly(2-acrylamido-2-methyl-propanesulfonic acid), and the like. Buffer layer 120 may comprise a charge transfer compound, and the like, such as copper phthalocyanine and tetrathiafulvalene-tetracyanonono-methane system (T T F _ tCNQ). In one embodiment, the buffer layer i2 is formed from a dispersion of a conductive polymer and a colloid-forming polymeric acid. Such materials are described in, for example, U.S. Patent Application Serial Nos. 2004-0102577 and 2004- 0127637. Buffer layer 120 can be applied by any deposition technique. In an embodiment, 120197.doc • 29- 200841498. The buffer layer is applied by a solution deposition method as described above. In one embodiment, the buffer layer is applied by a continuous solution deposition process.

An example of a hole transport material for the optional layer 130 has been summarized by Y. Wang in, for example, Kirk-〇thmer Encyclopedia of Chemical Technology (Fourth Edition, Vol. 18, pp. 837-860, 1996). Holes can be used to transport both molecules and polymers. Common hole transport molecules include, but are not limited to, 4,4',4&quot;(N,N-diphenyl-amino)triphenylamine (TDATA); 4'4,4-volume (N -3-nonylphenyl-N-phenyl-amino)·triphenylamine (MTDATA), N,N′-diphenyl-N,N匕bis(3_fluorenylphenyl) -biphenyl]_4,4'-diamine (TPD); hydrazine, 1-bis[(di-4-tolylamino)phenyl]cyclohexane (TAPC); N,N'-double (4 -Methylphenyl)_n,N,-bis(4-ethylphenyl)-[1,1-(3,3'-diindenyl)biphenyl]-4,4'-diamine (] £卩〇()); tetrakis-(3-methylphenyl)-team&gt;1,,&gt;^2,5-phenylenediamine (1&gt;〇8); (^phenyl_4 long ^Diphenylaminostyrene (TPS); p-(diethylamino)benzaldehyde diphenylsulfonium (DEH), triphenylamine (TPA); bis[4-(N,N•diethylamine) Base)_2_methylphenyl](4·nonylphenyl)methane (MPMP); 1-phenyl_3_[p-(diethylamino)styryl]-5-[p--(two Ethylamino)phenyl]oxazoline (ppR or DEASP); l,2-trans-bis(9H-isoxazolidine)cyclobutane (Dczb); N,N,N',N'-tetra 4-nonylphenylbiphenyl &Gt;4,4,-diamine(TTB); Ν, &gt; Γ-bis(naphthalene-ij)_N,N,-bis-(phenyl)benzidine (α-ΝρΒ); and porphyrin compounds, For example, copper phthalocyanine. Common hole transport polymers include, but are not limited to, polyethylene. Kawa, (phenyl phenyl) polyglycol, poly (dioxy sin), polyaniline and polypyrrole It is also possible to obtain 120197.doc -30- 200841498 two-pass polymer by doping a hole transporting molecule (for example, the above) into a polymer such as polystyrene and polycarbonate. In some embodiments, the hole-passing material comprises a polymerizable polymer or a polymer material. After forming the hole # wheel layer, the bucket is treated with Koda to perform cross-linking. In some embodiments, private Thermal radiation. The radio transmission layer 13 can be applied by any deposition technique. In the embodiment the nominal/co-transport layer is applied by a solution deposition technique, as described above. In one embodiment, the electricity The hole transport layer is applied by a continuous solution deposition method. Any organic electroluminescence ("EL") material can be used in the photoactive layer. Including, but not limited to, small molecule organic fluorescent compounds, fluorescent and phosphorescent metal complexes, conjugated polymers, and mixtures thereof. Examples of fluorescent compounds include, but are not limited to, pentaphthalene, anthracene, and fluorene. , coumarin, derivatives thereof, and mixtures thereof. Examples of metal complexes include, but are not limited to, organochelating compounds such as ruthenium (8-hydroxyquinolinyl) aluminum (A1 q 3 ) ) 'Red metal metallized surface and electroluminescent compound, such as a complex with a phenyl hydrazine bite, a phenylquinoline, or a phenylpyrimidine ligand (eg

U.S. Patent No. 6,670,64, to the disclosure of U.S. Pat. / 0 0 8 4 2 4, as disclosed in WO 03/091688 and WO 03/040257; and mixtures thereof. An electroluminescent layer comprising a charged host material and a metal complex has been described by Thompson et al. in U.S. Patent No. 6,303,238, and to Burrows and Thompson, the disclosure of PCT applications WO 00/70655 and WO 01/41512. Examples of conjugated polymers include, but are not limited to, poly(phenylene extended ethylene 120197.doc -31 - 200841498 base), polydiene, poly(spirobifluorene), polythiophene, poly(p-phenylene), Its copolymers, and mixtures thereof. Photoactive layer 140 can be applied by any deposition technique. In one embodiment, the photoactive layer is applied by a solution deposition process as described above. In the embodiment, the photoactive layer is applied by a continuous solution deposition method. The 0k layer 150 can have electron injection/transportation and can also serve as a limiting layer to prevent the reaction at the layer interface from being suspended. Role. More specifically, the layer promotes electron migration and reduces the likelihood of a low reaction suspension in the case where the layer 14 is in direct contact with 16 〇. Examples of materials for the optional layer 150 include, but are not limited to, metal chelated (tetra) octyl compounds (eg, qing or the like); phenanthroline-based compounds (eg, 2,9-dimethyl-4, 7_Diphenyl-l,l-phenanthroline ("DDPA"), 4,7-diphenyl-u〇•phenanthroline ("DPA") or the like); azole compounds (eg, Phenyl)-5-(4-t-butylphenyl)oxadiazole ("pBD" or such a ruthenium), 3-(4-biphenyl)_4_phenyl·5_(4_ Tri-butylphenyl h, 2, cardiotriazole ("TAZ" or the like); other similar compounds; or a combination of any one or more thereof. Alternatively, the optional layer 15 can be inorganic and can contain ruthenium, LiF, Li20 or the like. Cathode 160 is an electrode that is particularly effective for injecting electrons or negative charge carriers. Cathode 160 can be any of its work functions compared to the first electrical contact layer (in the context of the present invention, anode layer 110) Low metal or non-metal. In one embodiment, the term "low work function" means that the work function of a material is not greater than about 4.4 eV. In one embodiment, "high power" The number is intended to refer to a material's work function 120197.doc -32- 200841498. The number is at least about 4.4 eV. The material used for the cathode layer is [can, call, 2 family all ^^"; metal (such as ^, he , Group 12 metals, shots, Mg, Ca, Ba, or the like), 蜀镧糸7G (for example, elemental elements (eg, Th, uu, or the like) and indium, yttrium, etc., and a group" Specific examples of materials such as, for example, indefinite examples including &quot;Η π 曰 160 include, but are not limited to, ruthenium, samarium, magnesium, strontium, alloys and combinations thereof. 铕, 铷, cathode The layer 160 is usually formed by a servant or a physical gas deposition process in the basin. (IV) η, an additional layer may exist in the electronic device. The field device is based on the anode side and the RSA processing step can be used to capture the shellfish. After the novel method described herein, after forming the Ray '10, the formation of the buffer layer 120 into the hole transport layer 130, or any group of devices thereof is started on the cathode side.

Treatment of the bolus / J The procedure at the R. SA of the novel method described herein can be carried out after the formation of the cathode 16 〇. The ruthenium transport layer 150, or any combination thereof, can have any suitable thickness.妒 妒 妒 妁 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , No more than about 25 〇 half, ice only α, wood, for example, about 50-200 奈, '(三) 140 usually not more than about 1000 is too much. The ring, the raft is not wood, for example about 50-80 is not, the layer 15 〇 usually does not exceed about 1 〇〇 半 半 · a a a , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ,芒会# Kun, not always, for example, about 1-50, the right depolarization layer 110 or the cathode layer 160 needs to pass through the thick voice of the household and pass at least part of the light, then the degree of A potential should not exceed 100 nm. 120197.doc -33 - 200841498 EXAMPLES The following examples will further illustrate the concepts described herein, and are not intended to limit the scope of the invention described in the claims. Example 1 Example 1 illustrates the RSA treatment performed simultaneously with the formation of the first layer. The first layer is an organic active layer. ~ Coating 1: The first organic active layer of material A (the kind of crosslinkable hole transport material from Sumit〇m〇Chemicai c〇i, • T〇ky〇, Japan) is spin-coated on p-xylene On the slide. Coating 2 · The first organic active layer will be self-contained with 95% material and used as a fluorinated unsaturated ester monomer of RSA (z〇nyl(g) 8857A, from E. L plus p(10) de Nemours and Company, Wilmingi A solution of 〇n, DE purchased) was prepared by spin coating on a glass slide. Both coatings were dried in air on a hot plate at 130. The spin coating conditions are adjusted to provide a film having a similar thickness after drying. The coated material was thermally cured at 200 ° C for 30 minutes in a convection oven with a nitrogen atmosphere. The ratio was 5% from BD052 and BH140 (Idemitsu Kosan Co., Ltd., Chiba, Japan) at a ratio of 8:92. The luminescent ink consisting of total solids in anisole was printed on each of the coatings using a MicroFab printer with a stage temperature of 50 °C. The spread of the ink on both surfaces was compared by measuring the diameter of the ink droplets printed after drying. Compared to coating 1 without RSA, the ink spread was reduced by 7% on coating 2 containing RSA. The contact angle of anisole was about 9 degrees on the coating 1 and about 15 degrees on the surface of the coating 2 containing z〇nyl88857A. 120197.doc -34- 200841498 Example 2 Example 2 illustrates the RSA treatment after formation of the first layer. The first layer is an organic active layer. A coating of material A was prepared on a glass slide and cured in a convection oven with a nitrogen atmosphere at 200 ° C for 30 minutes. A solution of a monofluorinated acrylate monomer as RSA (Zonyl® TA-N, available from I. du Pont de Nemours and Company, Wilmington, DE) was spin-coated on the surface of the cured material A. The RSA solution was stored in hexafluoropropoxybenzene at about 20% solids. The RSA was cured in air on a hot plate at 130 °C. Any uncured RS A was rinsed off by soaking in a petri dish for 15 minutes in trifluorotoluene and dried in air at ambient temperature. The contact angle of the cured uncoated material A was about 9 degrees as measured using phenyl ether. If the surface is simply rinsed with trifluorotoluene (without RSA coating), the contact angle of the cured uncoated material A is the same within experimental error. If the RS A system is coated on material A and washed with trifluorotoluene without reacting RSA in an oven, the contact angle is the same within experimental error. The contact angle of the oven-cured RSA surface was 27 degrees. This indicates that the RS A can be applied and removed without affecting the underlying surface energy, and the difference in the cured film can be easily measured. Example 3 Example 3 illustrates the RSA treatment after formation of the first layer. The first layer is an organic active layer. The slides were coated with material A and thermally cured as described above. On some slides, material A was coated with a solution of the above RSA (Zonyl® TA-N) and the RSA was dried under ambient conditions. Using the VEECO NT3300 Interference 120197.doc -35- 200841498 The profilometer was used to determine that the RSA was coated with RSA at *Friends' soil; the sub-degree was about 1 〇〇 (A). In the work milk (4) minus μ (365_4{) 5 nm, 2 7 cm); shading - car + 杳 4 μ 十方 "Mosquito Feng this slide to prevent exposure. After exposure, will RSA by exposure Soaked in trifluoromethyl A'. The contact angle of anisole in the region of the exposure to actinic radiation is within the error range. The contact angle in the unexposed area is the same as that of material a, indicating that Exposure to RSA is completely soluble and can be rinsed from the surface of material 8. The material A without RSA is exposed to the actinic shot and the contact angle is unchanged. This indicates that '# is exposed to actinic radiation in RSA' The pattern, and the change in surface energy, is due to the R s A rather than the processing steps. Example 4 Example 4 illustrates the formation of the first layer after the RSA treatment. This example also broadly describes the package as implemented during printing of the luminescent ink. The same is shown in Figures 3 to 6.

A glass substrate (shown as 200 in Figure 3) having an indium tin oxide (IT〇) coating of about 1100 angstroms is patterned in a lithographically etched manner to produce an array of ιτ〇 lines (not 210), wherein The width is about 9 microns and the distance between the lines is 1 inch. The layer of material tantalum 220 was coated onto a wire array and cured in a convection oven with nitrogen gas for 3 minutes, as shown in Figure 4. The ITO line coated with material A is shown as 211. A coating 230 of Zonyl® TA-N was applied to the material a by spin coating from a hexafluoropropoxybenzene on a substrate and dried in air as shown in FIG. The coating is exposed to radiation from a source that emits primarily between 365-404 nm using a negative mask such that the exposed area covers the gap between the ITO lines and the edge of the line is 2-3 microns. 120197.doc -36- 200841498 The exposure is about 3.8 J/cmA2. The plates were washed in trifluorotoluene to remove unexposed RSA. Figure 6 shows the developed workpiece having an rSA footprint 211 and a material A footprint 230 on the ITO and a material a footprint 220 on the glass. BH119 and BH215 (both from Idemitsu) were printed on the ιτο line in an environment using a Mig〇Fab printer at a ratio of 8:92 with 1.5% total solids in anisole. The drop volume is about 4 〇 45 45 μl and the ink drop pitch is 〇 · 〇 8 ms' which produces a continuous print line. On panels without RS A, the printed line extends approximately 200-300 microns; in other words, the ink extends over 3 ITO lines. This will result in an inexplicable color mixing in the actual printing process. On panels with printed RSA, the ink is completely enclosed in the area treated by the remote RSA and a high quality printing unit is obtained. Example 5 Example 5 illustrates the rS a treatment after formation of the first layer. The coating of material A was prepared as described above and thermally cured. These were then coated with ZONyl® TA-N RSA coating as described above. These RSA coatings receive a blanket exposure of up to about 4 J/cm 2 . After exposure, the coatings were washed in trifluorotoluene and the contact angle was measured using anisole. The phenyl ether ether contact angle was adjusted from about 9 degrees (surface of material A) to 40-45 degrees. If exposure is carried out in air or an inert atmosphere, no significant difference can be observed. Example 6 Example 6 illustrates the rs A treatment after formation of the first layer, wherein removal of the unexposed regions was carried out via sublimation. The coating of material A was prepared as described above and thermally cured. These are then coated with propionate eleven fluorododecyl vinegar; the RS A coating is applied by spin coating from a 3% by weight/volume solution stored in Quandeng 120197.doc -37-200841498. cloth. One of the rsa coatings was bonded to a blanket coating of about 1.5 J/cm2; the other coating was not exposed and exposed. The two coatings were baked in air on a hot plate at 195 ° C for 20 minutes and the contact angle was measured using anisole. The contact angle of the anisole in the RSA coating exposed to UV radiation was about 55 degrees. The contact angle of the nail is 10 degrees on a coating that is not exposed to UV radiation. This indicates that the legs that are not exposed to the shot can be removed by heating. If the RSA coating has been exposed to light in a pattern, heating '(10) retained in the exposed areas will have an angle of about 55 degrees, and the unexposed areas will have a contact of about 1 degree. angle. It should be understood that the above description is not necessarily to be construed as a More progress' (4) is held in the Iron Moon Book, which has been described with reference to specific examples. Change, this does not deviate from the following modifications and changes in the application of the patent, so the shore... The scope of the invention is broad. </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; What has been described herein with respect to specific embodiments and any achievable benefits, advantages, or problems are not to be construed as any more critical, essential, or essential. One of the scope of the patents is to be understood to be provided in combination in the sole-embodiments of the specific embodiments described herein in connection with the individual embodiments. Conversely, (4) the features described in connection with the prior art examples may be provided separately or in any sub-combination. Further, when a numerical value is recited in the range, it includes each individual value within the range. BRIEF DESCRIPTION OF THE DRAWINGS The embodiments are set forth in the Ik drawings to provide a better understanding of the concepts presented herein.

Figure 1 includes a diagram depicting contact angles. Figure 2 includes an illustration of an organic electronic device. Figure 3 includes an illustration of a substrate having an anode line. 4 includes an illustration of the substrate of FIG. 3 coated with a buffer material. Figure 5 includes an illustration of a further reactive surface active composition of the substrate of Figure 4. The figure includes the illustration of the substrate after exposure and development of Figure 5. It should be understood by those skilled in the art that the workpieces in the drawings are drawn for the purpose of simplicity and clarity, and are not necessarily drawn to scale. Port I helps to better understand the embodiment, and the dimensions of some of the workpieces in the drawings are exaggerated for other workpieces. This phase is inclined [Main component symbol description] 100 Electronic device 110 Anode layer 120 Hole injection layer or buffer layer 130 Hole transport layer 140 photoactive layer 120197.doc -39- 200841498 150 optional electron transport layer 160 cathode layer 200 glass substrate 210 array of ITO lines 211 RSA footprint 220 material A on the glass A coverage area 230 on ITO Material A coverage area 120197.doc -40-

Claims (1)

200841498 X. Patent application scope: 1 · A second method for forming a wrap around a first &gt;匕#&amp; layer includes: forming a first layer having a first surface energy; Treating the first layer with a reactive surface active intrusion surface active composition to form a treated first having the surface energy lower than the surface energy of the first surface, wherein the reactive surface active composition The liquid portion 3 exposes the first layer of the δ hai treatment to radiation, and forms a second layer. 2. The method of claim 1, wherein the fluorinated material. 3. The method of claim 1, wherein the radiation hardenable material is used. 4. The method of claim 1, wherein the fluorinated surfactant is cross-linkable. 5. The method of claim 1, wherein the /f is deposited together. 6. The method of claim 1, wherein a separate layer is applied to the first layer. 7. The method of claim 1, wherein the reactive surface active composition is 8. The method of claim 7, the initiating composition Exposure or non-exposure 9. The method of claim 8, wherein it is removed. 120197.doc 200841498 II: The method of (4), wherein the regions are removed by heating. A method of claim 8, wherein the regions are removed by absorbing or aspirating the softer regions by contacting the outermost surface with an absorbing surface. , I2. A device having a device, the organic electronic device comprising ', a first organic active layer on an electrode and a second organic active layer, the method comprising: forming a first surface energy on the electrode a first organic active layer, • a treatment of the first organic activity with a reactive surface active composition; a green layer to form a treated first organic active layer, θ J 吏 the treated first organic active layer is exposed Radiation, whereby a surface energy, and - formation of the second organic active layer. 13. An organic electronic device comprising a first active layer and a second organic active layer positioned on an electrode, and further comprising a reactive surface between the first organic layer and the second organic active layer Born to win. / Sex combination 120197.doc