TW200413980A - Overlay offset management system and method of pilot production - Google Patents

Abstract

A kind of overlay offset management method of pilot lot for use in semiconductor lithographic process contains the following steps: defining the manufacturing information of the pilot lot and the continuous lots on a user interface; performing the lithographic process of the pilot lot; measuring and evaluating the overlay offset value of the pilot lot; and automatically conducting the manufacture of the continuous lots according to the overlay offset of the pilot lot when the overlay offset value of the pilot lot fulfills the determined specifications.

Description

200413980 V. Description of the invention (1) Technical field to which the invention belongs The present invention relates to manufacturing control (process control), and in particular to trial production batches of semiconductor lithography exposure alignment machines (pi 丨 〇t 10) ) Management system and method for offset value (〇ver 1 ay 〇ffset :). Previous technology in the semiconductor industry was on a silicon substrate, meaning millions of components and external circuits. It is necessary to accurately align the sensor (a 1 ignment specific exposure area or mark measurement value) by the lithographic equipment A1 igner), such as Stepper), with the exposure pattern of the overlay offset layer. The positioning of a certain layer of the pattern exposure side is finely repeated to cause a shift, which causes a short circuit. For integrated chips, so in the current exposure, the manufacturing of very large integrated circuits (VLSI) is mainly on wafers, and semiconductors are repeatedly used. The process technology determines the semiconductor components and uses several layers of conductor connection elements in such a highly integrated integrated circuit manufacturing process. The exposure alignment machine (prc) jectiQn sighting or stepping alignment machine ( Scanner or control layer and layer overlap (〇Verlay). As an example, a stepper is usually set with alignment = ⑼S 〇Γ). Before exposure, some parts of the wafer are marked for marking. ^ Heart drag ^ Stomach, / alignment action, and then according to the detection, the mechanical positioning of the pair of compensating stones t 、, 斟 thinking back σ to ensure that the correct alignment Action: The adapter takes the entire wafer one by one. When shifting, the back-to-back components or inter-layer interconnections 'may follow the layer-by-layer adjustment of the product's yield rate, and the electrical properties cannot be connected or aligned with the inter-layer layers of the machine'. Need to be controlled in micro

200413980 V. Description of invention (2) Below meters. Without a word, the management number must be evaluated as the actual system. Because it is put into production, it needs to be approved at another time, but it is not effective. The waste film and production efficiency must be offset by various different pairs for the receiving customer. The reference to the production of different products or the trial production of this online staff in product B may be adjusted according to the original calculation. In addition, some products are separated for a long time, and the trial production needs to be re-tested before to confirm that each batch is easy to adopt due to adoption or In a wafer foundry that does not have to place an order to produce different products, and the products are trial-produced separately (pil0t 10ts), the online personnel usually must simultaneously / produce 'to get the corresponding stack offset To make. However, its shortcoming is that after the trial production without a management machine is completed, the lithography machine may be turned on. As a result, it is impossible to carry out the formal offset of product A's stacking offset in real time. After product b is completed, the offset caused by product B is caused by Guangzheng. Two Γ, ordering method, the stack offset of batch-to-lot batch production may not be applicable to large-scale manufacturing plants. If the online staff is not familiar with the stack offset of batch production, Status and time Cui's boarding of the offset value results in the new trial production of wafers and reduced production. In order to solve the above problems, the present invention effectively manages the stack offset of trial production batches for online personnel. Quickly set and review the information. One purpose is to provide an information system and method that can reduce the capital of the pilot lot. Another purpose of the invention is to provide management of trial and error stacking.

200413980 V. Description of the invention (3) The system and method of transfer can be continued in batches (f ο 1 1 〇wing to achieve the above purpose, (over 1 ay 〇f fset) control system (Comperters) Including: ^ using offset manufacturing information S to offset information in batches; and an interface 'and scheduling offset values for the lithography pair in the lithography pair based on the use of the pilot batch in batches according to the above-mentioned system, shift management method , Which is used to define the lithographic offset value of a trial production batch on a user interface; and, at that time, 'automatic production is based on the trial production batch. To effectively manage the trial production batch (pi 1 0 t 1 0 t) and stacking offset setting between 10 and 10). According to the present invention, a trial production stacking offset management system is provided, which is connected to a lithography machine or a computer for integration

Integrated Manufacturing, CIM) 9 user interface 'for setting trial production batches and corresponding, and for querying and / or managing trial production batches, a management server is used to provide trial user batch settings The batches are ordered and renewed according to the batches, and the machines are manufactured first, and are manufactured according to the repeated batches of the trial batches. The present invention further provides a trial production batch stacked semiconductor lithography process, which includes the following steps: 2 batches: and manufacturing information based on the batches; enter the clothing industry, and test and evaluate the trial production batches The stack of low dreams is popular and the offset value of XI Xijing is in line with the established specifications-the offset value of the person's $ is continued according to the batch system, and the present invention further provides a trial production batch of ^ Applicable For new products that require trial production of lithography first, the private party's management method is as follows: Provide a batch and divide the batch into mothers = a ^ contains the following steps: the mother batch is a trial production batch; A user interface on the sub-batch, the second batch of manufacturing information, and set the sub-batch to continue to be manufactured according to the batch ^ meaning the mother arrives at the sub-batch and the sub-batch; measure and evaluate the stack of the batch to the partial-person The next highest value; and, when the parent batch

200413980

When the stack-pair offset value meets the predetermined specifications, the sub-batch manufacturing is automatically performed according to the stack-pair offset value of the parent batch. In order to make the above-mentioned objects, features, and advantages of the present invention more comprehensible, the following is described in detail with reference to the accompanying drawings: Embodiments The following describes in detail a variety of embodiments according to an embodiment of the present invention with reference to FIG. 1. Pilot-lot-to-offset (0Veriay 0ffset) management system. Referring to Figure 1, in a semiconductor manufacturing plant, the manufacturing execution system (Manufacturing Execution System, Magic 20) is generally used to manage the batch allocation and manufacturing requirements in the factory. When the manufacturing execution system 20 sends each batch When the manufacturing information and manufacturing requirements are met, the in-plant automated handling system (not shown) will send the appropriate batch to the wafer storage j (Stocker) 22 for further processing based on the assigned manufacturing information. And the lithography machine controller Trust uses integrated computer manufacturing system (c〇mputer)

Manufacturing, hereinafter referred to as CIM) 28 Allocates batches to be processed and relevant information on bean manufacturing 'and delivers them from the wafer storage station 22 to the lithography machine “to perform the process. Offset (—y. ⑴etVK Ξ 26 乂 乂 乂 里 篁, then, the guesswork | estimate can be performed by the measuring machine controller 27.…… The trial production stack offset management system includes a user interface 12 and a management server 14. The management server lithography machine controller 25 is connected to control the microview of the lithography machine 24

200413980 V. Description of the invention (5) 1 ^ And the management servo system 14 can also be connected to the measuring machine controller 2 7 to capture the stack of the measuring machine 2 6 after the circle lithography process. Measured offset (overlay 0ffset). In addition, preferably, the management server 14 may be connected to the CI system 28 to control the manufacturing sequence of the batches. In order to provide online personnel with a simple and effective way to manage the stack offset value of the trial batch (pi 1 01 1 ot) and correct the stack offset value correction in subsequent batches, the management server丨 4 provides user interface 丨 2, can provide online personnel to set up trial production batch (pU〇t 1〇t) and follow-up batch (f ο 1 1 〇wi ng 丨 〇t) manufacturing information on this interface . In the preferred case, the user interface 12 is shown in Figure 2 and provides online personnel to set trial production batches and performance by batch number. For example, in the case of new products, it is usually necessary to manufacture a batch of trial production batches (s p 丨 t 1 ot) ′, and only after the manufacturing quality meets the specifications, then the subsequent batches of manufacturing. In this case, the same batch of products are divided into mother and child batches, then the pilot batch (pi lot lot) field a is filled into the parent batch number on the user interface, and continued The batch (following 10) field b is filled with the sub-batch number. Still referring to FIG. 2, it is further possible to set trial production batches, the number of pieces, and the stacking offset valid period (Expiry day) f on the user interface 12. For f: man: ϋaccuracy ’, therefore, if the trial production exceeds-a fixed time, then the machine: shape, gradually shifting / at this time, the trial production must be carried out again, so it must be released: Type 5 batch breeding. The setting of the effective time limit can make the online ^ Ξ ancient: reduce production batches-people can quickly know whether the trial batch information is still valid. Still tea see Figure 2 ’In a better case, the management temple server 4 is provided

Page 9 200413980 V. Description of the invention (6) Query and / or manage various types of manufacturing information on the user interface 12. For example, providing a set of trial production ^ batch # —batch times and continuation by batch values' includes various lithographic positioning setting values d, and ^ sets of lithographic settings where the stack offset preset value e can be based on the second of the manufacturer Material: shift preset value e. Set as a result. For example, the manufacturer can use the "feedback" control system to evaluate the stack offset offset 4-potential feedback field of the lithography machine; this stack of pre-production batches is m: there is a previous batch of Historical records can be stored in: … For inquiries, for example, stored in the CIM system 28 in the library. The online clerk uses the user interface 12 to inquire about the chaos of each trial production batch. For example, whether it is still within the expiration date, or to delete, set, and overlap offset values after trial production, etc. After the user 'I side 1 2 Fan Cheng is set, the management servo setting' controls the lithography machine controller 25, and the lithography machine 24 enters the production batch at the lithography machine 24 first. When the lithography process is completed, the trial production batch will be sent to the stacker: 2 6 to perform the measurement of the offset. The measurement result is evaluated by the measuring machine controller 27 to determine whether it meets the predetermined specifications. If the trial production passes, the management server 14 is operated by the measuring machine controller 27 to obtain the stack offset value of the trial production batch. Asia further corrects and sets the lithography machine to continue to manufacture the followmg lot according to the stack offset value of the trial production lot. In a better case, the management server 14 will control the remaining batches. Before completing the overall lithography process of the parent batch (trial production) + sub-batch (continued), other batches that want to perform the lithography process will be processed. It is included in the waiting list until the child batch is finished after the parent batch, to ensure that the child batch can be placed immediately after the parent batch.

200413980

200413980 V. Description of the invention (8) ® Offset value, #, # ,, Trial production batch:; f2 :: Machine controller 27 calculates and sets the specification i: When the trial production batch is stacked The offset value is in line with the former. Two = After the offset value of the trial production batch is checked, then be careful ;: The result of the lithography controller 25 or the CIM control & system of the trial production batch is 27. , And link to the lithography machine ^-"Batch-by-" lithography process, in the lithography machine; the system then continues to hunt by the above management system and method, which can be processed. Convenient interface to set the B's as for online The personnel quickly and externally "use the above-mentioned management of the stack offset data of the batch produced by Li. The product of this mother and child batch:" = "For the same batch to be batched into a filming process, there will be no L in the meantime. This ensures that the micro batches are completed in both the mother and child batches. This ensures that the trial batch of the mother batch ^ Jingsi is to be inserted into the lithography process. Stacked offsets borrowed by. I pair offset 'can be directly used in syndrome batches. Although the present invention is relatively poor in determining the present invention, anyone familiar with this item = disclosed as above, but it is not intended to be used within the scope and scope. Without departing from the spirit of the present invention, the attached patents are subject to the following patent applications and modifications, so the scope of the protection scope of the present invention shall prevail. Page 12 0503-8766TWF (Nl); TSMC2001-1264; Peggy.ptd 200413980 Brief Description of Drawings Figure 1 shows the structure of a stack-to-stack offset management system in a trial production according to an embodiment of the present invention. Figure 2 is a schematic diagram of a user interface according to an embodiment of the present invention. FIG. 3 is a flowchart of a method for managing a stack-to-stack offset in a trial production according to an embodiment of the present invention. Explanation of symbols 12 ·· User interface 14 Management of shrine service ^ 3. · For, 20: Manufacturing execution system; 22 Wafer storage station; 24: Lithography machine j 25 Lithography machine controller 25 ^ 26 ·· Stack For measuring machine: 27: measuring machine control, 2 8 ·· computer integrated manufacturing (CIM) system; a ~ f ·· user interface field:) S302 S308; process steps ζ

0503-8766TWF (Nl); TSMC2001-1264; Peggy.ptd page 13

Claims (1)

六 、 Application scope of patents 1. Management of offsets (° veriay offset) of ° type production Linked with a lithography machine, the system contains ... System 7: User 2 left for setting-trial production batch And-continuously based on the manufacturing capital talk 'Asia used to query and / or manage the overlay of trial production batches, and offset management management server to provide the user interface and use The trial production batch and the renewal batch set in the interface are first scheduled to be manufactured next to the lithography machine, and the renewal batch is performed according to the offset value of the trial production batch. Manufacture. 、 Move 2 · According to the trial production stack offset (0ν er 1 ay 0 ffset) management system described in item 1 of the scope of patent application, where the trial production batch is the same / batch mother as the illness , Sub-batch. x. Reliance only 3. According to the overlay ○ ff set management system for trial production described in item 1 of the scope of the patent application, where the trial production batch and the continuation > according to & second manufacturing The information includes _ · The trial production batch and the continuation according to the batch number, the ^] batch number $ for the preset offset value and / or the valid time limit for the offset value. 4. The overlay of f set management system for trial production according to item 3 of the scope of patent application, wherein the manufacturing information of the trial production batch further includes the lithographic setting value of the trial production batch. 5 • According to the trial production of the overlay of f set management system described in item 3 of the scope of the patent application, wherein the overlay offset preset value is set according to the overlay offset feedback control result. 6. According to the trial production of the overlay of f set management system described in item 1 of the scope of patent application, the management server is further connected to a stack of f set 0503-8766TWF (Nl)-TSMC2001-1264; Peggy.ptd Page 14 200413980 VI. Application for patent range offset measurement system to capture 4 ± _ ^ ^ ^ .rw value. 7 · According to the application of the patent scope of the patent (圊 verlay〇ffset) to manage the pair of offset value people 1 φ 矛 in the Xixi batch of this bureau, the cage device will be trial-produced to make the lithography machine automatically. Manufacturing system to control n German 4-Tianding 4 continued to manufacture by batch. 8 · A variety of yield reductions to low πρ & A 蒌 qing foreign / system of each spear (〇ver lay 〇ff set) management is applicable to the process of the film production, # 一 丄 △ King method, your land The method includes the following steps: Set the gas on the user interface to 4L A cold grid ^. I owe me a trial production batch and a performance based on the information, and then the next batch of the trial production batch Filming process; measure and evaluate the stacking offset value of the trial batch 4 ^ @ 里, block; and when the stacking offset value of the trial batch conforms to a predetermined specification _ according to the trial batch The stacking offset value is carried out in the following batch-by-batch: Automatic 9 · According to the stacking %% of the trial production described in item 8 of the scope of patent application. (overlay offset) management method, in which the trial production batch and the current green shift are the same batch of mother and child batches. I., according to the over (I 0 of the overtime) management method according to the trial production r lay of f set described in item 8 of the scope of patent application, wherein the trial production batch and gas = shifted manufacturing The information includes ... The trial production batch and the continuation batch number, the number of batches in the batch, the preset offset value of the overlap pair and / or the offset value are protected ^ type II. According to the scope of the patent application The freshest limit for trial production described in item 10 of the household. (over lay of f set) management method, wherein the trial production batch production and production offset further include the lithographic setting value of the trial production batch. ^ Alum 1 2 · According to the optimal pair shift of trial production described in item 10 of the scope of patent application 0503-8766TW (Nl); TSMC200M264; Peggy.ptd page 15 200413980 6. The method of managing an overlay of f set (patent application), wherein the preset value of the stack offset is set according to the feedback control result of the stack offset. ', Root 1 3 · According to the management method of overlay of f set described in item 8 of the scope of patent application, the overlay of the trial production batch is imported into a computer for integration Manufacturing (CI) system to automate the manufacturing of batches. μ, 'According to 14. A trial production method of 对 veriay 〇ffset) management method, suitable for semiconductor lithography process, the method includes the following steps: Provide a batch, and divide the batch into a mother The batch and a child arrive 3 The parent batch is a trial production batch; a user defines the manufacturing information of the parent batch and the child batch on a user interface, and sets the child batch as a continuation batch; Beam manufactures the parent batch; measures and evaluates the stack offset value of the parent batch; and when the stack offset value of the parent batch meets a predetermined specification, automatically The offset value is manufactured for this sub-batch.乂 1 5 · According to the method of management of overlay of f set for trial production described in item 丨 4 of the scope of patent application, the manufacturing information of the parent batch and the child batch includes: the parent batch and the The sub-batch number, the number of pieces of the parent batch, the preset value of the stack offset and / or the valid time limit of the stack offset. 1 6 · According to the trial production method of stack-to-stack offset (〇ve r 1 ay 〇ffset) described in item 5 of the patent application scope, wherein the manufacturing information of the parent batch further includes the lithography of the parent batch Set value. 1 7.According to the scope of the application for the scope of the patent application, the offset of the type 5 property is described in Item 1 200413980 VI. Application scope of patent management (〇 v er 1 a y f f s et) management method, wherein the preset value of the stack offset is set according to the control result of the stack offset feedback. 1 8. According to the trial production stack offset (0ver 1 ay ffset) management method described in item 14 of the scope of the patent application, the stack offset value of the parent batch is imported into a computer integrated manufacturing (CI M) system to automate the manufacturing of this sub-batch. 0503-8766TWF (Nl); TSMC2001-1264; Peggy.ptd page 17