SG11201709951VA - Vacuum arc deposition apparatus and deposition method - Google Patents

Vacuum arc deposition apparatus and deposition method

Info

Publication number
SG11201709951VA
SG11201709951VA SG11201709951VA SG11201709951VA SG11201709951VA SG 11201709951V A SG11201709951V A SG 11201709951VA SG 11201709951V A SG11201709951V A SG 11201709951VA SG 11201709951V A SG11201709951V A SG 11201709951VA SG 11201709951V A SG11201709951V A SG 11201709951VA
Authority
SG
Singapore
Prior art keywords
vacuum arc
deposition
deposition method
deposition apparatus
arc deposition
Prior art date
Application number
SG11201709951VA
Inventor
Hiroshi Yakushiji
Yuto Watanabe
Masahiro Shibamoto
Yuzuru Miura
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Publication of SG11201709951VA publication Critical patent/SG11201709951VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C23C14/0611—Diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H01J37/32064—Circuits specially adapted for controlling the arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SG11201709951VA 2015-06-24 2015-12-16 Vacuum arc deposition apparatus and deposition method SG11201709951VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015126100 2015-06-24
PCT/JP2015/085230 WO2016208094A1 (en) 2015-06-24 2015-12-16 Vacuum arc film-forming apparatus and film-forming method

Publications (1)

Publication Number Publication Date
SG11201709951VA true SG11201709951VA (en) 2018-01-30

Family

ID=57585386

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201709951VA SG11201709951VA (en) 2015-06-24 2015-12-16 Vacuum arc deposition apparatus and deposition method

Country Status (6)

Country Link
US (1) US10731245B2 (en)
KR (1) KR102156989B1 (en)
CN (1) CN107709605B (en)
SG (1) SG11201709951VA (en)
TW (1) TWI615490B (en)
WO (1) WO2016208094A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102375601B1 (en) 2017-11-13 2022-03-16 캐논 아네르바 가부시키가이샤 Plasma processing apparatus and plasma processing method
CN111763910B (en) * 2020-07-14 2021-02-09 佛山耐信涂层技术有限公司 Device and method for preparing amorphous diamond film, amorphous diamond film and composite coating thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9503305D0 (en) 1995-02-20 1995-04-12 Univ Nanyang Filtered cathodic arc source
JP3732250B2 (en) 1995-03-30 2006-01-05 キヤノンアネルバ株式会社 In-line deposition system
RU2114210C1 (en) * 1997-05-30 1998-06-27 Валерий Павлович Гончаренко Process of formation of carbon diamond-like coat in vacuum
RU2240376C1 (en) * 2003-05-22 2004-11-20 Ооо "Альбатэк" Method of forming superhard amorphous carbon coating in vacuum
JP4373252B2 (en) * 2004-03-16 2009-11-25 浩史 滝川 Plasma generator
JP2006028563A (en) * 2004-07-14 2006-02-02 Shimadzu Corp Cathodic-arc film deposition method, and film deposition system
US9997338B2 (en) 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
ATE529881T1 (en) 2006-08-03 2011-11-15 Creepservice S A R L METHOD FOR COATING SUBSTRATES WITH DIAMOND-LIKE CARBON LAYERS
US9605338B2 (en) * 2006-10-11 2017-03-28 Oerlikon Surface Solutions Ag, Pfaffikon Method for depositing electrically insulating layers
JP2015067839A (en) 2013-09-26 2015-04-13 キヤノンアネルバ株式会社 Film forming apparatus

Also Published As

Publication number Publication date
TW201715062A (en) 2017-05-01
TWI615490B (en) 2018-02-21
KR102156989B1 (en) 2020-09-16
US10731245B2 (en) 2020-08-04
CN107709605B (en) 2020-03-20
CN107709605A (en) 2018-02-16
KR20180019201A (en) 2018-02-23
US20180066353A1 (en) 2018-03-08
WO2016208094A1 (en) 2016-12-29

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