SG11201503318PA - Method for microcontact embossing - Google Patents

Method for microcontact embossing

Info

Publication number
SG11201503318PA
SG11201503318PA SG11201503318PA SG11201503318PA SG11201503318PA SG 11201503318P A SG11201503318P A SG 11201503318PA SG 11201503318P A SG11201503318P A SG 11201503318PA SG 11201503318P A SG11201503318P A SG 11201503318PA SG 11201503318P A SG11201503318P A SG 11201503318PA
Authority
SG
Singapore
Prior art keywords
microcontact
embossing
microcontact embossing
Prior art date
Application number
SG11201503318PA
Inventor
Gerald Kreindl
Markus Wimplinger
Mustapha Chouiki
Original Assignee
Ev Group E Thallner Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ev Group E Thallner Gmbh filed Critical Ev Group E Thallner Gmbh
Publication of SG11201503318PA publication Critical patent/SG11201503318PA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG11201503318PA 2012-12-10 2013-12-04 Method for microcontact embossing SG11201503318PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012112030.7A DE102012112030A1 (en) 2012-12-10 2012-12-10 Method for microcontact embossing
PCT/EP2013/075562 WO2014090661A1 (en) 2012-12-10 2013-12-04 Method for microcontact printing

Publications (1)

Publication Number Publication Date
SG11201503318PA true SG11201503318PA (en) 2015-06-29

Family

ID=49709685

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201503318PA SG11201503318PA (en) 2012-12-10 2013-12-04 Method for microcontact embossing

Country Status (8)

Country Link
US (1) US9323144B2 (en)
EP (1) EP2888629B1 (en)
JP (1) JP2016511931A (en)
KR (1) KR101759810B1 (en)
CN (2) CN104823107A (en)
DE (1) DE102012112030A1 (en)
SG (1) SG11201503318PA (en)
WO (1) WO2014090661A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160020131A1 (en) * 2014-07-20 2016-01-21 X-Celeprint Limited Apparatus and methods for micro-transfer-printing
WO2016070869A2 (en) * 2014-11-03 2016-05-12 Universität Osnabrück Device for carrying out a capillary nanoprinting method, a method for carrying out capillary nanoprinting using the device, products obtained according to the method and use of the device
CN104356740B (en) * 2014-11-05 2017-05-17 广西师范学院 Method for performing microcontact printing by using water-soluble porphyrin iron complex
US11086217B2 (en) 2014-12-22 2021-08-10 Koninklijke Philips N.V. Patterned stamp manufacturing method, patterned stamp and imprinting method
US20180169907A1 (en) * 2015-06-25 2018-06-21 Ev Group E. Thallner Gmbh Method for producing of structures on a substrate surface
CN106486209A (en) * 2015-08-31 2017-03-08 中国科学院宁波材料技术与工程研究所 A kind of patterning 3D graphene conductive film and its environment-friendly preparation method thereof and application
CN105319840A (en) * 2015-11-23 2016-02-10 南通天鸿镭射科技有限公司 Apparatus and method for manufacturing ultraviolet-light-cured seamless-moulded roller wheel through replication technology
KR102331438B1 (en) * 2016-04-06 2021-11-26 코닌클리케 필립스 엔.브이. Imprint lithography stamps, methods of making and methods of using the same
CN106542494B (en) * 2016-09-26 2017-12-26 西北工业大学 A kind of method for preparing the not contour micro-nano structure of multilayer
JP6854733B2 (en) * 2017-08-17 2021-04-07 株式会社ジェイエスピー Resin sheet
CN111747372B (en) * 2019-03-26 2024-06-14 深圳清力技术有限公司 Metal cover graphite island without edge bulge and preparation method thereof
US12055737B2 (en) * 2022-05-18 2024-08-06 GE Precision Healthcare LLC Aligned and stacked high-aspect ratio metallized structures

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE601401A (en) * 1960-03-16 1900-01-01
US3678848A (en) * 1969-08-25 1972-07-25 Weber Marking Systems Inc Inking pad and use thereof
US3709647A (en) * 1970-10-21 1973-01-09 Clear Pack Co Apparatus for forming an embossed thermoplastic sheet
JPS5436617B2 (en) * 1973-02-07 1979-11-10
US3971315A (en) * 1974-08-12 1976-07-27 Porelon, Inc. Macroporous microporous marking structure
JPH10278217A (en) * 1997-04-09 1998-10-20 Asahi Optical Co Ltd Printing plate, its manufacture, and printer using the plate
US6276272B1 (en) * 1996-10-01 2001-08-21 Brother Kogyo Kabushiki Kaisha Stamp plate producing apparatus for producing stamp plate used in a stamp device
US6048623A (en) * 1996-12-18 2000-04-11 Kimberly-Clark Worldwide, Inc. Method of contact printing on gold coated films
DE19949993C1 (en) * 1999-10-15 2001-05-03 Peter Barth Microcontact printing process, for structuring oxidized surfaces using stamp in microelectronics, comprises wetting surface of stamp with silane or thiol molecules before contacting the stamp with oxidized surfaces
DE60118843T2 (en) * 2000-02-07 2006-11-30 Koninklijke Philips Electronics N.V. STAMP FOR A LITHOGRAPHIC PROCESS, METHOD FOR STAMP MAKING, AND METHOD FOR PRODUCING A PATTERNED LAYER ON A SUBSTRATE
JP4278977B2 (en) * 2000-11-22 2009-06-17 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Stamp, method and apparatus
US6817293B2 (en) * 2001-03-28 2004-11-16 Dainippon Printing Co., Ltd. Patterning method with micro-contact printing and its printed product
JP5055672B2 (en) * 2001-07-31 2012-10-24 大日本印刷株式会社 Thin film pattern forming stamp
US20030127002A1 (en) * 2002-01-04 2003-07-10 Hougham Gareth Geoffrey Multilayer architechture for microcontact printing stamps
GB0326904D0 (en) * 2003-11-19 2003-12-24 Koninkl Philips Electronics Nv Formation of self-assembled monolayers
KR20070072877A (en) * 2004-10-22 2007-07-06 코닌클리케 필립스 일렉트로닉스 엔.브이. Roller micro-contact printer with pressure control
EP2087403B1 (en) * 2006-11-01 2012-02-01 Koninklijke Philips Electronics N.V. Imprint method for forming a relief layer and use of it as an etch mask
US20080230773A1 (en) 2007-03-20 2008-09-25 Nano Terra Inc. Polymer Composition for Preparing Electronic Devices by Microcontact Printing Processes and Products Prepared by the Processes
US7959975B2 (en) 2007-04-18 2011-06-14 Micron Technology, Inc. Methods of patterning a substrate
WO2010002788A1 (en) 2008-06-30 2010-01-07 3M Innovative Properties Company Solvent assisted method of microcontact printing
JP2010171281A (en) * 2009-01-23 2010-08-05 Jsr Corp Imprinting method
WO2010115027A1 (en) * 2009-04-01 2010-10-07 Nano Terra Inc. Methods of patterning substrates using microcontact printed polymer resists and articles prepared therefrom
WO2011079032A1 (en) * 2009-12-22 2011-06-30 3M Innovative Properties Company Apparatus and method for microcontact printing using a pressurized roller

Also Published As

Publication number Publication date
CN110376844A (en) 2019-10-25
JP2016511931A (en) 2016-04-21
KR20150092139A (en) 2015-08-12
EP2888629B1 (en) 2016-03-02
DE102012112030A1 (en) 2014-06-12
KR101759810B1 (en) 2017-07-19
EP2888629A1 (en) 2015-07-01
CN104823107A (en) 2015-08-05
WO2014090661A1 (en) 2014-06-19
US9323144B2 (en) 2016-04-26
US20150293442A1 (en) 2015-10-15

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