RU2746730C1 - Method for producing composite metal-diamond coating on the surface of medical device, dispersed system for precipitation of metal-diamond coating and method for its producing - Google Patents

Abstract

FIELD: chemistry; medicine.

SUBSTANCE: invention relates to the production of a composite metal-diamond coating, a dispersed system and its production, it can be used for medical devices. The method for producing the said coating involves the precipitation of at least one layer of a metal membrane by chemical or electrochemical precipitation from a solution or electrolyte, respectively, containing an ion source of the precipitated substance and a dispersed system. Before and after the precipitation of each of the layers, the surface is treated with water washing, drying, chemical treatment, mechanical treatment, heat treatment, or several of them. The dispersed system consists of a mixture of a liquid dispersed medium in the form of water, a solid dispersed phase, and a stabilizer. As a solid dispersed phase, a mixture of dispersed particles of a synthetic carbon diamond-containing substance and a substance selected from a group containing diamond, graphene, fullerene, astralen, reduced graphene oxide, carbine, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbon nitride, zirconium carbon nitride, zirconium dioxide, yttrium oxide, aluminum oxide, or combinations thereof is used.

EFFECT: invention provides a composite metal-diamond coating with higher operational and technical characteristics due to increased corrosion resistance, micro-hardness, wear resistance, adhesion, as well as producing a dispersed system with increased aggregate stability.

6 cl, 3 dwg

Description

The invention relates to a method for producing a metal-diamond coating by means of chemical or electrochemical deposition from a solution or electrolyte and can be widely used for medical devices, for example, dentistry, cardiac surgery for an artificial heart valve, arthroplasty, prosthetics of the lower and upper extremities, as well as the manufacture of medical instruments and various technical devices for the provision of medical care to patients. Currently, the creation of composite metal-diamond coatings that have high operational and technical characteristics by increasing corrosion resistance, microhardness, wear resistance, adhesion to the base metal surface and the applied layer, reducing the friction coefficient and improving the quality of coating is one of their topical problems.

A known method of applying a galvanic coating to removable dentures, RU No. 2404294, 20.12.2012

The method of applying galvanic coating on removable dentures includes preliminary galvanic gilding of dentures made of cobalt-chromium or nickel-chromium alloys from a gilding electrolyte containing potassium dicyanoaurate and citric acid and the subsequent deposition of palladium from an electrolyte containing palladium dichloride, ammonium chloride, ammonium nitrate ammonia water.

The method allows you to eliminate unpleasant taste sensations due to the simultaneous use of stainless steel alloys and palladium-containing alloys [1].

A known method of producing an electrochemical chromium-diamond coating RU No. 2585608, 05/27/2016

A method of obtaining from a chromium plating electrolyte containing a suspension of diamond particles, which is a mixture of nanodispersed detonation synthesis diamonds (DND) with a single crystal size of 2 ... 20 nm and static synthesis diamonds (АСС) with a single crystal size of 2 ... 250 nm, with a total concentration of a mixture of diamonds in the electrolyte 2 ... 30 g / l [2].

Known is a composite metal-diamond coating, a method for its production, a diamond-containing electrolyte additive and a method for its production, RU No. 2699699, 09.09.2019.

The composite metal-diamond coating is made in the form of a two-layer metal film and contains a first layer of a deposited metal selected from a specific group, and a second layer of a metal of the specified group with particles of a synthetic carbon diamond-containing substance dispersed therein.

The method for its production consists in deposition on the surface of the article of the first layer by means of chemical or electrochemical deposition of the ions of the deposited metal selected from a certain group, and then the second layer is deposited from the metal of the specified group and a dispersed system consisting of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer, in this case, water is used as a dispersed medium, and particles of a synthetic carbon diamond-containing substance are used as a solid dispersed phase, and inorganic electrolytes, organic electrolytes or their mixture are used as a stabilizer.

The diamond-containing electrolyte additive consists of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer, where particles of a synthetic carbon diamond-containing substance are used as a solid dispersed phase, and inorganic electrolytes, organic electrolytes or their mixture are used as a stabilizer.

The method of obtaining a diamond-containing additive includes annealing in an inert medium of a powder of a diamond-containing mixture, then processing with various chemicals, treatment with ultrasound, vacuum, hydrodynamic action and washing the product with water with the addition of a stabilizer [3].

Known composite metal-diamond coating, a method for its production, a dispersed system for the deposition of a composite metal-diamond coating and a method for its production, RU No. 2706931, 21.11.2019

The composite metal-diamond coating is made in the form of a metal film formed on the surface of the product and contains two layers of deposited metal selected from a certain group, with particles of a synthetic carbon diamond-containing substance dispersed therein.

The method for its production consists in the fact that the first layer is deposited by means of chemical or electrochemical deposition from a solution or electrolyte, respectively, containing a source of ions of the deposited metal selected from a certain group, and a dispersed system consisting of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer, in this case, water is used as a dispersed medium, and particles of a synthetic carbon diamond-containing substance are used as a solid dispersed phase, while the stabilizer is selected from the group including a low molecular weight electrolyte, a colloidal surfactant or a combination thereof, then the second layer is deposited in a similar manner, when Before and after the deposition of each of the layers, the surface is treated by washing with water, drying, chemical treatment, mechanical treatment, heat treatment, or several of them.

A disperse system for obtaining a composite metal-diamond coating consists of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer, where particles of a synthetic carbon diamond-containing substance are used as a solid dispersed phase, and a low molecular weight electrolyte is used as a stabilizer, for example, an organic electrolyte, an inorganic electrolyte , while the colloidal surfactant is an anionic surfactant.

The method of obtaining a dispersed system includes annealing in an inert medium of a powder of a diamond-containing mixture, then treatment with various chemicals, treatment with ultrasound, vacuum, hydrodynamic action and washing the product with water with the addition of the mentioned stabilizer [4].

This decision [4] was taken as a prototype

The known solutions [1, 2, 3, 4] have a number of disadvantages.

Disadvantages of solution [1]:

1. The method uses a gold layer as the first layer or sublayer, although a less expensive nickel-chromium layer or a nickel-silver layer could be used;

2. The method considers the deposition of only two substances, gold and palladium;

3. The method of application and the electrolyte do not provide for obtaining a coating in the form of alloys of the deposited metals;

4. The method of obtaining the deposition and the electrolyte do not use a source of ions of the deposited metal in the form of: iron, nickel, chromium, titanium, tungsten, molybdenum, vanadium, cobalt, copper, silver, platinum, rhodium, zirconium, niobium, rhenium, hafnium, yttrium, and also their alloys;

5. The method of obtaining does not use dispersed particles and a dispersed system for the deposition of a composite coating.

Disadvantages of solution [2]:

1. The method of obtaining a chromium-diamond coating is carried out only from a chromium plating electrolyte;

2. The production method uses only a mixture of nanodispersed detonation synthesis diamonds (DND) with a single crystal size of 2 ... 20 nm and static synthesis diamonds (АСС) with a single crystal size of 2 ... 250 nm;

3. The method does not use a stabilizer of the dispersed system to increase its aggregate stability by preventing the adhesion of DND and ACC particles;

4. Chromium-diamond coating is only a single-layer coating in the form of a metal film containing particles of DND and ACC dispersed in the specified metal film.

Disadvantages of solution [3]:

1. Composite metal-diamond coating only in the second layer contains dispersed particles of synthetic carbon diamond-containing substances;

2. Only synthetic carbon diamond-containing substance or diamond charge is used as dispersed particles;

3. The method of obtaining a composite metal-diamond coating considers only a two-layer metal film, while the first layer contains only a metal film of a deposited metal selected from a certain group, and a second layer of a metal of the specified group with particles of a synthetic carbon diamond-containing substance dispersed therein ;

4. The method of obtaining as a stabilizer contains only inorganic and organic electrolytes and does not use a wide class of surfactants;

5. The diamond-containing electrolyte additive also contains only inorganic and organic electrolytes as a stabilizer and does not use a wide class of surfactants.

Disadvantages of solution [4]:

1. Only synthetic carbon diamond-containing substance or diamond charge is used as dispersed particles;

2. The method of obtaining a composite metal-diamond coating considers only a two-layer metal film with particles of a synthetic carbon diamond-containing substance dispersed therein;

3. The method of obtaining as a stabilizer does not use a wide class of surfactants, for example, nonionic surfactants, cationic surfactants, amphoteric surfactants or mixtures thereof;

4. Composite metal-diamond coating and its production method do not use dispersed particles of matter as a solid dispersed phase, for example, diamond, graphene, fullerene, astralen, carbyne, carbon nanotubes, pyrographite or their various combinations, boron carbide, tungsten carbide, carbide silicon, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide, alumina, or various combinations thereof;

5. The dispersed system and the method for its production do not use dispersed particles of matter, for example, diamond, graphene, fullerene, astralen, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide, alumina, or various combinations thereof;

6. In the dispersed system and the method of its production, for example, a nonionic surfactant, a cationic surfactant, an amphoteric surfactant, or mixtures thereof, are not used as a stabilizer.

The known solutions indicated above have a number of significant drawbacks and do not possess the currently required operational and technical characteristics in terms of corrosion resistance, microhardness, wear resistance, adhesion to the base metal surface, the need to reduce the coefficient of friction.

The objective of the present invention is to create a method for producing a composite metal-diamond coating on the surface of a medical product of a dispersed system for the deposition of a composite metal-diamond coating from a solution or electrolyte and a method for its production to achieve higher performance characteristics by increasing corrosion resistance, microhardness, wear resistance , adhesion to the surface of the base metal and the applied layer, the need to reduce the coefficient of friction, simplify the technology and improve the quality of coating, the use of stabilizing substances in the dispersed system to increase its aggregate stability by preventing adhesion of dispersed particles of the substance selected from this group.

The solution to this problem is achieved by the fact that a method for obtaining a composite metal-diamond coating on the surface of a medical product, including the deposition of a metal and a solid dispersed phase in the form of a metal film, characterized in that at least one layer is deposited on the surface of the product by means of chemical or electrochemical deposition from a solution or electrolyte, respectively, containing a source of ions of the deposited substance selected from the group: iron, nickel, chromium, titanium, cobalt, tungsten, magnesium, molybdenum, vanadium, zirconium, niobium, hafnium, yttrium, copper, gold, silver, platinum, palladium, rhodium, or their various combinations and a dispersed system consisting of a mixture: a liquid dispersed medium, a solid dispersed phase and a stabilizer, and water is used as a dispersed medium, a mixture of dispersed particles of a synthetic carbon diamond-containing substance and a substance is used as a solid dispersed phase, selected from a group containing a diamond, g rafen, fullerene, astralen, reduced graphene oxide, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, dioxide zirconium, yttrium oxide, aluminum oxide or their various combinations, and the stabilizer is introduced into the dispersed system in an amount of 0.01-12 g / l of the dispersed system and is selected from the group containing a low molecular weight electrolyte, a colloidal surfactant or a combination thereof, then, if necessary, at least one next layer is deposited by means of chemical or electrochemical deposition from a solution or electrolyte, respectively, containing a source of ions of the deposited substance selected from the specified group and the specified dispersed system, and when deposited from a solution or electrolyte, the concentration of said dispersed particles of the substance in the dispersed system is from 0.05 to 25 g / l electr it, and the particle size is from 1 to 300 nm, while before and after the deposition of each of the layers, the surface is treated by washing with water, drying, processing with chemicals by degreasing, etching, anodic pickling, sensitization, activation or several of them, mechanical treatment , heat treatment or several of them.

Chemical deposition of the coating is carried out by the displacement method, the galvanic pair method, the chemical reduction method, or a combination of methods.

The displacement method is based on the displacement of metal ions from a solution by a more active metal, for example, the deposition of copper on an iron plate placed in a solution of copper sulfate.

The galvanic pair method is based on the creation of a galvanic pair between the base metal and a more active metal, for example, when silver is deposited on a copper plate, a galvanic pair is created using the more active metal aluminum and magnesium. In this case, the more active metal donates its electrons to copper, and on a negatively charged copper surface, Ag ⁺ ions are reduced to metal.

The method of chemical reduction consists in the fact that metal coatings are obtained as a result of the reduction of metal ions from aqueous solutions containing a reducing agent. Currently, there are methods for producing coatings by chemical reduction for more than 20 different metals. The method of chemical reduction is based on the reaction of interaction of metal ions with a dissolved reducing agent on the metal surface. The oxidation of the reducing agent and the reduction of metal ions proceed at a noticeable rate on metals exhibiting autocatalytic properties, that is, the metal formed as a result of chemical reduction from the solution further catalyzes the oxidation reaction of the reducing agent. Autocatalytic properties are possessed by: nickel, iron, copper, silver, gold, palladium, platinum. There is a well-known series of activity of metals in redox reactions in aqueous solutions Li-Rb-K-Ba-Sr-Ca-Na-Mg-Al-Mn-Cr-Zn-Fe-Cd-Co-Ni-Sn-Pb-H -Sb-Bi-Cu-Hg-Ag-Pd-Pt-Au. In this row, from left to right, the reducing ability of metals decreases, and from right to left, the oxidizing ability of metal cations in an aqueous solution decreases.

For chemical or electrochemical deposition, an aqueous solution and an electrolyte are used containing substances selected from the group: inorganic salt - sulfate, chloride or cyanide, inorganic cyanide complex compound, inorganic or organic acid, and, if necessary, additional ingredients selected from the group: chromic anhydride, potassium dichromate, sodium dichromate, ammonium dichromate, sodium bisulfate, sodium carbonate, sodium sulfate, sodium hydroxide, ammonia, ammonium hydroxide, hydrazine, hydrazine sulfate, hydrazinium chloride, ammonium bicarbonate, sodium hypophosphite, boron hydrophosphite, calcium bicarbonate, bicarbonate , as well as metal ions in the lowest oxidation state Fe ²⁺ , Sn ²⁺ , Ti ³⁺ , Cr ²⁺ , Mn ²⁺ , Ce ³⁺ , Cu ⁺ , sodium titanate, potassium dicyanoargentate, potassium dicyanourate, sodium cyanide, potassium cyanide , copper cyanide, potassium dicyanoargentate, potassium dicyanourate, ammonium nitrate, sodium nitrate, sodium acetate, ammonium acetate, chromium acetate, nickel acetate, fluoro chromium read, nickel chloride, ammonium phosphinate, magnesium citrate, sodium citrate, saccharin, chromyl fluoride, thiourea, Rochelle salt, glycol, glutinic glue, disodium salt of ethylenediaminetetraacetic acid, phthalimide, sodium fluoride, vanadlic acid, phenylphthalate , butanediol, trichlorethylamide, sodium lauryl sulfate, zinc monophosphate, zinc nitrate, sodium molybdate, rhodium sulfate or combinations thereof, sulfates can be selected from the group: sodium sulfate, copper sulfate, magnesium sulfate, nickel sulfate, iron sulfate, chromium sulfate, ammonium sulfate , cobalt (II, III) sulfate, titanium sulfate (II, III, IV), rhodium (III) sulfate, tungsten disulfide, vanadium sulfate, zirconium (IV) sulfate, diniobium trioxide disulfate, hafnium sulfate, yttrium sulfate or a mixture thereof , chlorides can be selected from their groups: sodium chloride, ammonium chloride, ferric chloride, nickel chloride, chromium (II, III, IV) chloride, tungsten chloride, cobalt (II, III) chloride, vanadium chloride, niobium chloride Ia (III, IV, V), zirconium chloride (II, III, IV), rhenium chloride (III, IV, V, VI), yttrium chloride, copper (I, II) chloride, magnesium chloride, gold chloride (I, II, III), silver chloride, platinum chloride (II, IV), palladium chloride, rhodium (III) chloride, or their mixture, as inorganic or organic acids are used: sulfuric, hydrochloric, chromic, boric, hydrofluoric, hydrocyanic, coal , nitrogenous, hydrogen sulfide, hypochlorous, phosphoric, sulfamic, orthophosphoric, hypophosphorous, acrylic, methacrylic, lemon, oxalic, acetic, formic, or a mixture thereof.

As an inorganic or organic acid, the following are used: sulfuric, hydrochloric, chromic, boric, hydrogen fluoride, hydrocyanic, carbonic, nitrogenous, hydrogen sulfide, hypochlorous, orthophosphoric, acrylic, methacrylic, citric, oxalic, acetic, formic, or a mixture thereof.

Inorganic and organic acids are added to the solution and electrolyte to select and adjust the optimal pH value, which is a measure of the activity of hydrogen ions in the electrolyte, quantitatively expressing their acidity.

A dispersed system is a mixture of at least two substances that are completely or practically immiscible with each other and do not chemically react with each other.

As noted above, a dispersed system consists of a mixture: a liquid dispersed medium, a solid dispersed phase and a stabilizer, where water is used as a dispersed medium, a mixture of dispersed particles from this group is used as a solid dispersed phase, a substance selected from the group is used as a stabilizer: low molecular weight electrolyte, colloidal surfactant (surfactant), or a combination thereof.

A stabilizer is a substance, the addition of which to a dispersed system increases its aggregate stability, that is, prevents sticking of dispersed particles from this group, ensures uniform colloidal distribution of a solid dispersed phase in a liquid dispersed medium, prevents sedimentation of dispersed particles from this group, which leads to a simplification of the technology and improving the quality of the coating.

A low molecular weight electrolyte can be selected from the group: inorganic electrolyte, organic electrolyte; as an inorganic electrolyte, acids can be selected from the group: sulfuric, hydrochloric, boric, hydrofluoric, phosphoric, chromic, hydrocyanic, coal, nitrogenous, hydrogen sulfide, or a mixture thereof, or from groups of hydroxides: sodium, potassium, ammonium or their mixture, organic electrolytes can be selected from the group of acids: acetic, formic, citric, oxalic, acrylic, methacrylic, or their mixture.

Colloidal surfactant can be selected from the group: anionic surfactant, cationic surfactant, as the anionic surfactant, a substance can be selected from the group: sodium caprate, sodium dodecanoate, sodium moristinate, sodium oleate, potassium oleate potassium stearate, sodium lauryl sulfate, potassium lauryl sulfate, sodium tetraulfate , 4-dodecylbenzenesulfonate sodium, as a cationic surfactant can be selected from the group: dodecylammonium chloride, tetradecylammonium chloride, dodecylmethylammonium chloride, dodecyldimethylammonium chloride, dodecyltrimethylammonium chloride, 1-dodecylpyridinium compounds.

In the case where the stabilizer is an ionic substance, i.e. decomposes into ions in solution, then the electrostatic stability factor necessarily acts. On the surface of the particles of the synthetic carbon diamond-containing substance, a double electric layer is formed, an electrokinetic potential and corresponding electrostatic repulsive forces arise, which prevent the particles from sticking together. The stabilizing effect of inorganic and organic electrolytes is limited only by the electrostatic stability factor.

The stabilizing effect of colloidal surfactants is determined by their ability to adsorb on the interface, forming an adsorption shell. The surfactant adsorbed on the surface of particles reduces the surface energy, and long-chain hydrocarbon radicals, forming a structure in the adsorption layer, impart elasticity and strength to the protective adsorption-solvation shell with a decrease in surface tension at the particle-medium interface. Colloidal surfactant, having an amphiphilic structure, is capable of adsorbing both on polar and non-polar surfaces, lyophilizing them. In accordance with the Rebinder polarity equalization rule, the stabilizing effect of surfactants is the more significant, the greater the initial difference in the polarities of a solid particle and a liquid dispersion medium. Therefore, when a colloidal surfactant is used as a stabilizer, the adsorption-solvation factor of stability is realized.

For example, to obtain a dispersed system of particles from this group in water, potassium lauryl sulfate can be used, which is adsorbed by a non-polar hydrocarbon radical on dispersed particles, and the polar group directed towards water is hydrated by it, and thus the surface of the dispersed particle becomes wettable with water, that is hydrophilized and the dispersed system is stabilized. The selection of surfactants to stabilize dispersed systems is based on the hydrophilic-lipophilic balance (HLB). HLB is a numerical measure of the degree to which a substance is hydrophilic or lipophilic. Substances with an HLB less than 10 are fat-soluble, and substances with an HLB greater than 10 are water-soluble.

For example, if it is necessary to stabilize a dispersed system of polar particles in a non-polar liquid, then a colloidal surfactant with a low HLB value is used, usually 3-6, i.e. slightly soluble in water.

For example, if it is necessary to stabilize a dispersed system of non-polar particles in a polar liquid, then colloidal surfactants with high HLB values are used, usually 8-13, i.e. fairly well soluble in water.

It should be noted that the maximum stabilizing properties is observed for surfactants with 14-16 carbon atoms (Donan maximum).

Electrochemical or chemical degreasing is carried out with substances selected from the group containing an aqueous solution of sodium hydroxide, potassium hydroxide or alkali metal salts, organic solvents, surfactants, electrolytes for electrochemical degreasing.

White spirit, nefras, benzene, toluene, trichlorethylene, tetrachlorethylene, freon-113 can be useful as organic solvents.

Alkyl sulfonate, sulfanol, sintanol, syntamide can be useful as surfactants for degreasing.

For example, electrochemical degreasing is carried out in a solution of the composition, g / l: trisodium phosphate - 40-50, sodium hydroxide - 20-40, soda ash - 10-50, sulfanol - 5-8, liquid sodium glass - 3-5, at a temperature of 30 -80 ° C and a current density of 2-10 A / dm ² with processing at the cathode for 0.5-10 minutes and processing at the anode for 0.5-3 minutes, or degreasing without current for 15-20 minutes.

For example, cold degreasing in a solution of the composition, g / l: sodium hydroxide - 20-20, potassium hydroxide - 20-25, composition NA-50 - 12-18, NA-51 -10-15, dioctadecyldimethylammonium chloride - 3-5, at a cathode current density of 3-4 A / dm ² and an anode current density of 2-3 A / dm ² . Treatment on the cathode 5-10 minutes, on the anode 2-3 minutes.

Etching is carried out with aqueous solutions of sulfuric acid, hydrochloric acid, phosphoric acid, nitric acid, hydrofluoric acid or a mixture thereof, as well as with electrochemical etching electrolytes, for example, in a solution of hydrochloric acid 100-200 g / l for 1-5 minutes.

Anodic pickling is carried out in an electrolyte containing a source of ions of the deposited metal, or pickling electrolyte.

Dekapirovanie (activation) is the removal of the thinnest oxide films from the treated surface of the product, which are formed during degreasing and rinsing, as well as exposure of the metal structure. Sulfuric acid, hydrochloric acid, potassium cyanide, sodium cyanide can be useful for pickling.

For example, when chrome plating, processing is carried out in the main electrolyte for 0.5-1 minute with a current strength of 300-370 A, a current density of 20-25 A / dm ² , or in a chemical solution g / l: hydrofluoric acid (40%) - 15 -20, nitric acid (65%) - 40-50, water - 25-30, at a temperature of 18-25 ° C for 1.5-2.0 minutes.

When depositing nickel and iron, pickling is carried out with pickling electrolytes.

For example, the composition for nickel pickling, g / l: nickel sulphate - 250-300, sodium chloride - 10-20, chromic anhydride - 0.01-0.1, zinc chloride or sulphate -10-20.

Metals: copper, tungsten, titanium, as well as non-metallic materials are not catalysts for the oxidation reaction of the reducing agent; therefore, in order to impart catalytic properties to the surface of the product, it is subjected to processing, including two successive stages of sensitization and activation.

Sensitization (sensitization) is carried out with solutions of metal salts selected from the group: Sn ²⁺ , Fe ²⁺ , Ti ³⁺ , Ge ²⁺ , water, acid, ethanol or their mixtures are used as a solvent. An effective method of sensitization is to treat the surface of the product with a solution of tin chloride or ferric chloride.

For example, sensitization is carried out from a solution of the composition: tin chloride - 50 g / l, hydrochloric acid - 10 ml / l; or ferric chloride - 55 g / l, hydrofluoric acid - 5 ml / l.

Activation consists in the treatment with solutions of compounds of catalytically active metals selected from the group: palladium, platinum, silver, rhodium; water, acid, ammonia, sodium hydroxide or their mixtures are used as a solvent. Solutions containing palladium chloride or rhodium chloride have become widespread.

For example, activation is carried out from a solution of the composition: palladium chloride - 0.25 g / l, hydrochloric acid - 10 ml / l; or rhodium chloride - 0.1 g / l, hydrochloric acid - 8 ml / l.

Drying of the product is carried out in air by blowing hot air at a temperature of 20-70 ° C for 10 minutes to 1 hour.

If necessary, the product is processed by a mechanical method selected from the group: grinding, polishing, sandblasting with grinding powder, or their various combinations.

Heat treatment includes annealing the product in air or vacuum at a temperature of 50-450 ° C for 10 minutes to 3 hours.

Heat treatment also includes high-frequency current hardening of the surface layer of the metal product to a depth of 0.1-1 mm to achieve a hardness of, for example, 45-50 HRC.

It should be noted from the prior art that an alloy is a microscopically homogeneous metallic material consisting of a mixture of two or more chemical elements with a predominance of metallic components. As a method for producing an alloy, chemical or electrochemical deposition from a solution or electrolyte, respectively, containing a source of ions of the deposited substance selected from the group: iron, nickel, chromium, titanium, cobalt, tungsten, magnesium, molybdenum, vanadium, zirconium, niobium, hafnium can be used. , yttrium copper, gold, silver, platinum, palladium, rhodium or their various combinations and a dispersed system that is a mixture of dispersed particles of a synthetic carbon diamond-containing substance and substances from the group containing diamond, graphene, fullerene, astralen, reduced graphene oxide, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide, aluminum oxide, or various combinations thereof. Based on the above, it follows that the metal-diamond coating layer can be an alloy (galvanic) containing a metal (one or more) and a mixture of dispersed particles of a substance from this group, for example, a nickel-SUAB-diamond-tungsten carbide alloy, or a nickel alloy -diamond-chromium-SUAV-carbine-pyrographite, or nickel-diamond-chromium-SUAV-boron carbide-titanium nitride alloy.

For example, a nickel-diamond composite coating layer is deposited by chemical deposition of nickel on titanium alloy products from a solution of the composition, g / l: nickel sulfate or nickel chloride - 20-30; SUAV - 1-7; diamond - 2-3; carbyne -1-2; reduced graphene oxide - 0.5-1; titanium carbide - 2-3; boron nitride -1-2; sodium acetate - 10-15; sodium hypophosphite - 23-30; thiourea - 0.001-0.003; acetic acid - 5-10, at pH 4.3-5.0, temperature 85-95 ° C, loading density 1-2 dm ² / l, for 2-10 minutes. A solution of sodium hypophosphite is injected immediately before nickelization. The solution may be used and adjusted up to the accumulation of phosphites up to 50-60 g / l.

For example, chemical deposition of a nickel-chromium-vanadium-diamond alloy can also be carried out from a solution of the composition, g / l: nickel chloride - 15-25; chromium chloride - 10-15; vanadium chloride - 3-5; potassium fluoride 2.5-10; glycolic acid - 25-35; SUAV - 2-5; graphene - 0.5-1; carbon nanotubes - 0.5-1; carbon-boron nitride 2-3, at pH 2.8-3.2 - adjusted with sulfuric or hydrochloric acid, at a temperature of 18-25 ° C, for 4-10 minutes.

For example, a layer of composite metal-diamond coating is deposited by electrochemical deposition of an alloy of nickel-iron-titanium-niobium-diamond coating on steel products (KhN80TBYU, KhN77TYURU-VD) is carried out from an electrolyte of composition, g / l: nickel sulfate - 150-250; titanium sulfate - 35-50; nickel chloride - 25-60; ferric chloride -15-30; niobium chloride - 5-10; acetic acid - 5-10; 1.4 butanediol - 0.15-0.2; saccharin - 1-1.5; SUAV - 3-5; pyrographite - 3-5; tungsten carbide - 3-5; titanium carbonitride - 2-3; yttrium oxide - 0.2-0.5; aluminum oxide - 1-2, zirconium dioxide - 1-2, current density - 4-12 A / dm ² , at a temperature of 70-80 ° C, pH 2-3.

For example, a layer of a composite metal-diamond coating is deposited by electrochemical deposition of an alloy of nickel-magnesium-molybdenum-diamond coating on titanium alloy products from a solution of the composition, g / l: nickel sulfate - 140-150; sodium sulfate - 40-50; magnesium sulfate -20-25; sodium molybdate - 5-10; SUAV-1-3; diamond - 1-2; fullerene - 0.1-03; astralen - 0.5-1; zirconium nitride - 1-2; zirconium dioxide - 2-3, sodium chloride - 5-10; sodium fluoride - 2-3; citric acid - 20-25, at a temperature of 70-85 ° C, current density - up to 20 A / dm ² .

For example, electrochemical deposition of an alloy of nickel-cobalt-zirconium-diamond coating can also be carried out from an electrolyte of the composition, g / l: nickel sulfate - 10-30; cobalt chloride -10-30; zirconium chloride - 20-25; ammonium oxalate - 30-50; oxalic acid -0.8-1.0; sodium fluoride - 3-15; SUAV - 3-5; carbyne - 1-2; boron carbide - 3-5; titanium nitride-2-3, at a temperature of 20-60 ° C, pH 4-8, current density up to 20 A / dm ² .

For example, the electrochemical deposition of an alloy of nickel-chromium-tungsten-cobalt-diamond coating is carried out from boron fluoride electrolyte composition, g / l: boron fluoride nickel - 200-300; nickel chloride chloride - 10-15; chromium chloride - 70-90; tungsten chloride - 20-30; cobalt chloride -10-15; hydrofluoric acid - 10-15; diamond - 1-5, carbon nanotubes - 0.5-1; silicon carbide - 3-5, at a temperature of 45-55 ° C, pH 3-3.5, current density - up to 20 A / dm ² , current efficiency 95-98%.

For example, electrochemical deposition of an alloy of nickel-zirconium-yttrium-diamond coating is carried out from a hydrofluorosilicic acid electrolyte of the composition, g / l: nickel fluorosilicate - 300-500; nickel chloride -25-50; zirconium chloride - 40-50; yttrium chloride 5-10; hydrofluoric acid - 20-30; SUAV - 2-5, aluminum oxide - 3-5; pyrographite - 2-3; zirconium nitride - 1-2, zirconium carbonitride - 1-2, at a temperature of 20-50 ° C, pH 0.5-1, current density - up to 15 A / dm ² .

For example, electrochemical deposition of an alloy of nickel-titanium-hafnium-diamond coating is carried out from a sulfamine electrolyte of the composition, g / l: sulfamic nickel - 240-270; titanium sulfate - 10-30; hafnium sulfate - 5-10; sulfamic acid - 15-20; SUAV - 1-6; yttrium oxide -1-2; aluminum oxide - 2-4; titanium carbonitride - 2-3; sodium chloride 2-3 ml / l; paratoluenesulfonamide - 1.5-2; detergent Progress - 2-3 ml / l, at a temperature of 40-45 ° C, pH 3-4.5, current density up to 20 A / dm ² .

For example, the technological process of chemical or electrochemical deposition of a metal-diamond coating on titanium alloy products includes:

1. Installation of the product on the device;

2. Degreasing in an organic solvent. Air drying until complete removal of solvent vapors;

3. Electrochemical or chemical degreasing. Cold washing, hot washing, drying;

4. Annealing the product at a temperature of 400-450 ° C for 40-60 minutes;

5. Sandblasting with grinding powder;

6. Degreasing electrochemical or chemical (item 3);

7. Chemical decapitation in a solution of acids. Washing in cold running water, washing in distilled water;

8. Chemical or electrochemical deposition of a metal-diamond coating from a solution or electrolyte, respectively;

9. Rinsing in cold running water, rinsing in hot running water, rinsing in hot distilled water or deionized water at a temperature of 65-70 ° C;

10. Drying with compressed air to remove traces of moisture;

11. Annealing the product at a temperature of 200-300 ° C for 1.5-2 hours.

For example, a layer of a composite metal-diamond coating is deposited by chemical or electrochemical deposition of a chromium-diamond coating on articles made of steel, copper and their alloys, titanium alloys.

For example, the technological process of chemical or electrochemical deposition of a metal-diamond coating on products made of steel, copper and their alloys, titanium alloys includes:

1. Degreasing with organic solvents: solvent 646, acetone. The operation is carried out if necessary (with heavy contamination). Wipe with a cloth until the grease is completely removed. In case of severe surface contamination, it is allowed to clean in an ultrasonic bath with an alkaline solution;

2. Insulating the surface of the product, not subject to coating using SC-1 electroplating tape or insulating varnish;

3. Installation of the product on the device;

4. Degreasing electrochemical composition, g / l: sodium hydroxide - 10-30, composition Chemeta Na-66 - 10-15, or composition Chemeta Na-60 - 100-150 ml / l, at a temperature of 30-50 ° С, density current 2-10 A / dm ² for 10-15 minutes;

5. Rinsing with running hot water at a temperature of 50-60 ° C for 0.3-1 minutes. The water flow rate is set taking into account 2 ^x replacement of the bath per shift. In case of insufficient leaching quality, an additional irrigation system is provided;

6. Rinsing with running cold water at a temperature of 20-22 ° C for 0.5-1 minutes. The water flow rate is set taking into account 2 ^x replacement of the bath per shift;

7. Etching with chemical compounds selected from the group:

Composition 1: nitric acid with a density of 1.41 g / cm ³ - 50 vol.%, Sulfuric acid with a density of 1.84 g / cm ³ -50 vol.%, Sodium chloride - 5-10 g / l, at a temperature of less than 25 ° C for up to 0.2 minutes;

Composition 2: acetic acid - 260-265 g / l, phosphoric acid - 830-850 g / l, thiourea - 0.2-0.3 g / l at a temperature of 15-25 ° С for up to 0.5-1 ,5 minutes;

Composition 3: hydrochloric acid with a density of 1.19 g / cm ³ - 250-300 g / l, Muriatikols composition - 5-12 g / l at a temperature of 15-25 ° C for up to 0.5-1.5 minutes. Compositions 1,2 are used for parts made of copper and scale alloys. Composition 3 is used for steels and alloys.

8. Rinsing with running cold water at a temperature of 20-22 ° C for 0.5-1 minutes. The water flow rate is set taking into account 2 ^x replacement of the bath per shift;

9. Clarification by chemical composition, g / l: chromic anhydride - 70-120, sulfuric acid - 5-30, sodium chloride - 3-5, at a temperature of 10-25 ° C for 5-10 s. for steel and 2-5 s. for copper. In the process of lightening, the parts are shaken. In the event of a loss of performance, the clarification solution is replaced. Clarification is carried out if necessary;

10. Washing with running cold water at 20-22 ° C for 0.5-1 minutes, the water flow rate is determined based on a multiple of 2 ^x water changes per shift;

11. Decapitation in hydrochloric acid with a density of 1.19 g / cm ³ - 150-200 g / l at a temperature of 15-25 ° C for 0.5-1 minutes;

12. Washing with running cold water at 20-22 ° C for 0.25-0.5 min, the water flow rate is determined based on a multiple of 2 ^x water changes per shift;

13. Chemical or electrochemical deposition of metal-diamond coating.

For example, the chemical deposition of a chromium-diamond coating is carried out from a solution of the composition g / l:

Composition 1: chromyl fluoride - 12-14; sodium citrate - 5-8; citric acid - 10; SUAV - 1-5; diamond - 1-3; pyrographite - 1-2; carbon nanotubes - 1-2; sodium hypophosphite -5-7, at a temperature of 85-90 ° C, pH 8-11, deposition rate 1-2.5 μm / h,

Composition 2: chromium acetate - 25-30; nickel acetate - 0.5-1; sodium glycolic acid - 35-40; sodium acetate - 18-25; sodium citrate - 35-40; acetic acid - 12-15; sodium hydroxide - 12-15; SUAV - 1-5; diamond - 1-3; pyrographite - 1-2; tungsten carbide - 2-4; sodium hypophosphite - 14-15, at a temperature of 85-90 ° C, pH 4-6, deposition rate 2-2.5 μm / h,

Composition 3: chromium fluoride - 5-10; chromium chloride - 5-10; sodium pyrophosphate -75-100; SUAV -1-7; reduced graphene oxide - 0.5-1; astralen - 0.5-1; sodium citrate -25-30, at a temperature of 98-100 ° C, pH 8-11, deposition rate 0.15-0.25 μm / h,

For example, electrochemical deposition of a shiny chromium-diamond coating (Hbl), hard chromium-diamond coating (Xtv.), Wear-resistant chromium-diamond coating (Life) at a deposition rate of 0.28-0.31 μm / min. is carried out from an electrolyte composition g / l

Composition 1: chromic anhydride - 230-280 g / l, sulfuric acid - 2-4 g / l; trivalent chromium - 2-3 g / l; SUAV - 1-7; graphene - 0.25-0.4 g / l; shining additive TsKN-41 - 5-10 ml / l.

Composition 2: chromic anhydride - 230-250 g / l; sulfuric acid - 2-4 g / l; trivalent chromium - 2-3 g / l; SUAV - 1-7 g / l; tungsten carbide - 2-4 g / l; pyrographite - 1-2 g / l.

Composition 3: chromic anhydride 230-250 g / l, sulfuric acid - 2-4 g / l, trivalent chromium - 2-3 g / l, SUAB - 4-7 g / l; astralen - 0.15-0.2; titanium carbonitride - 2-4 g / l.

According to the designation Hbl., Composition 1- cathode current density 30-70 A / dm ² , temperature 55 (+ -) 2 ° C.

According to the designation Xtv., Composition 1.2 - cathode current density 50-100 A / dm ² , temperature 45 (+ -) 2 ° C.

According to the designation Hizn., Composition 1,2,3- - cathode current density 40-70 A / dm ² , temperature 55 (+ -) 2 ° C. Parts made of copper and copper alloys are hung with operating current. Anode pickling is not performed. For steel parts, anodic pickling is performed with a chrome coating thickness of 0.025-0.15 microns, with a duration of 5-200 s. After pickling steel parts, chromium plating should be started with increasing current, within 1-2 minutes the current density should exceed 1.5-2 times the nominal, then the current density is reduced within 1-1.5 minutes to the nominal value.

14. The first collection is carried out in the collection bath for 0.5-1 minutes. The bath solution is used to replenish the chromium plating electrolyte;

15. The second capture is carried out in the capture bath for 0.5-1 minutes. The bath solution is used to replenish the solution of the first collection bath;

16. Rinsing with cold running water at a temperature of 20-22 ° C for 7-15 minutes. Water flow rate is set with the multiple ^x 4 substitutions per shift bath. In case of insufficient leaching quality, an additional irrigation system is provided;

17. Drying of the product is carried out in a drying cabinet at a temperature of 50-70 ° C with warm air blowing.

For example, electrochemical deposition of an alloy of iron-molybdenum-diamond coating on aluminum and its alloys is carried out from an electrolyte of the composition, g / l: ferric chloride - 200-300; manganese chloride -20-30; sodium molybdate - 1-10; SUAV - 3-7; diamond - 1-2; fullerene - 0.1-0.2; carbyne - 0.1-0.25; hydrochloric acid - 0.5-1, at a temperature of 60-80 ° C, current density - 30-50 A / dm ² , current efficiency 90-95%.

For example, the electrochemical deposition of an alloy of cobalt-chromium-molybdenum-diamond coating is carried out from an electrolyte of the composition, g / l:

Composition 1: cobalt sulfate - 300-450; chromium sulfate - 40-60; sodium molybdate 10-20; glycolic acid - 40-45; sodium chloride - 15-20; SUAV - 1-5; reduced graphene oxide - 0.25-0.75; carbon nanotubes -0.25-0.75, at a temperature of 40-45 ° C, pH 5.2-5.8, current density - 4-6 A / dm ² .

Composition 2: cobalt sulfate - 280-300; formic acid - 64-66; sodium formate - 39-42; sodium sulfate - 70-75; ammonium sulfate - 3-4; chromium sulfate - 40-60; sodium molybdate 10-20; SUAV - 1-5; reduced graphene oxide - 0.25-0.75; carbon nanotubes - 0.25-0.75; aluminum oxide - 2-3, at a temperature of 95-100 ° C, pH 2.0-2.5, current density - 100-250 A / dm ² .

For example, electrochemical deposition of titanium-vanadium-niobium-diamond coating alloy is carried out from an electrolyte of the composition, g / l: sodium titanate - 70-75; vanadium sulfate - 10-20; dyniobium trioxide disulfate - 5-10; sodium acetate - 25-30; sodium hydroxide - 30-35; SUAV - 1-5; titanium carbide 2-3; titanium carbonitride - 1-2; aluminum oxide - 1-2, at a temperature of 30-70 ° C, current density - 1-5 A / dm ² , current efficiency 15-25%.

From aqueous solutions, titanium is deposited on metals such as copper, iron, nickel, platinum, palladium, while diffusion of a thin titanium coating into the metal is observed upon annealing up to 700 ° C. For example, when copper is coated with titanium, the copper surface contains 21-25% Ti and 75-79% Cu.

For example, nickel-titanium alloy (up to 6%) - diamond is obtained by electrochemical deposition from an electrolyte of the composition, g / l: nickel chloride - 100; titanium in the form of metal - 1-5; boric acid - 450-500; glycol - 60-70; SUAV - 3-5 diamond - 1-2; carbyne - 0.5-1; carbon nanotubes - 0.5-1; boron carbide -1-3; lauryl sulfate - 45-50 ml / l; ethyl alcohol - 50 ml / l, at a temperature of 15-25 ° C, current density - 5-10 A / dm ² , current efficiency 40-50%.

For example, an alloy of cobalt-titanium (up to 10%) - hafnium-diamond is obtained by electrochemical deposition from an electrolyte of the composition, g / l: ammonium (bicarbonate) - 100-110; titanium in the form of metal - 10-15; cobalt in the form of metal - 28-30; hafnium sulfate - 3-5; hydrofluoric acid - 250-270; boric acid - 100-120; glutin glue - 1-2; SUAV - 5-7; boron carbide - 2-5; yttrium oxide -1-2; carbon-boron nitride - 0.5-1, at a temperature of 30-40 ° C, current density - 2.5-3.5 A / dm ² , current efficiency 10-30%.

For example, an alloy of iron-titanium (up to 2%) - chromium-zirconium-diamond is obtained by electrochemical deposition from an electrolyte of the composition, g / l: iron sulfate - 50-60; ferric chloride - 50-60; titanium oxalate - 15-20; ammonium sulfate - 80-100; chromium chloride - 15-20; zirconium chloride - 10-20; ammonium hydroxide - 0.8-1.1; SUAV - 2-6; graphene - 0.1-0.15; titanium carbide -3-8; zirconium carbonitride - 2-4; aluminum oxide - 0.5-1, at a temperature of 20-30 ° C, current density - 5-30 A / dm ² .

For example, chemical deposition of a copper-nickel-diamond coating on glass or fiberglass is carried out from a solution of the composition, g / l: copper sulfate - 5-7; nickel chloride - 2-4; SUAV - 5-7; carbon nanotubes - 0.5-0.9; silicon carbide - 1-2; titanium nitride - 1-2; Rochelle salt - 22; sodium hydroxide - 4.5; sodium carbonate - 2; formaldehyde (40%) - 26 ml / l, at a temperature of 20-30 ° C, pH 12.1-12.2 for 10-30 minutes.

For example, chemical deposition of a copper-silver-diamond coating alloy on a metal or metal alloys is carried out from a solution of the composition, g / l: copper sulfate - 10-15; silver chloride - 5-7; sulfuric acid - 8-10; SUAV - 2-5; reduced graphene oxide - 0.25-0.5; zirconium dioxide - 1-2; yttrium oxide - 0.8-1, at a temperature of 15-25 ° C, the deposition rate is 10 μm / h;

For example, the chemical deposition of a copper-diamond coating on metals or metal alloys is carried out from a solution of the composition, g / l: potassium tartrate - 150; copper sulfate - 30, sodium hydroxide - 80; SUAV - 2-8; diamond -1-2; carbyne - 0.5-1, at a temperature of 15-25 ° C, the deposition rate is 11 μm / h;

For example, electrochemical deposition of a copper-nickel-diamond coating is carried out from an electrolyte of the composition, g / l: copper sulfate - 120-180; nickel sulfate - 40-60; sulfuric acid - 50-70; diamond - 3-5; tungsten carbide 2-4; yttrium oxide - 05-1; aluminum oxide - 05-1, at a temperature of 25-45 ° C, current density 1-6 A / dm ² ;

For example, the electrochemical deposition of a tungsten-diamond coating is carried out from an electrolyte of the composition, g / l: tungsten anhydride - 120-125; SUAV - 3-7; tungsten carbide -2-4; boron carbide - 2-3; yttrium oxide -0.1-0.25, sodium carbonate - 300-350, at a temperature of 95-100 ° C, pH 3-13, current density 5-10 A / dm ² .

For example, the electrochemical deposition of a tungsten-nickel-diamond coating alloy is carried out by electrochemical deposition from an electrolyte of the composition, g / l: nickel sulfate - 20-25; sodium tungstate - 50-60; sodium citrate - 60-70; SUAV - 2-7; fullerene - 0.1-0.2; carbyne - 0.25-0.5, ammonium hydroxide - up to pH 6-9, at a temperature of 65-75 ° C, current density - 1-5 A / dm ² .

For example, the electrochemical deposition of a silver-diamond coating is carried out from an electrolyte of the composition, g / l: silver chloride - 25-30; iron-synergistic potassium - 70-100; potassium hydroxide - 0.2-0.8; potassium carbonate - 15-20; Trilon B - 60-120; SUAV - 1-5; diamond - 1-3; carbon nanotubes -0.5-1, at a temperature of 20-25 ° C, pH 1-1.5, the current density is 0.5-2 A / dm ² .

For example, electrochemical deposition of an alloy of silver-palladium-copper-diamond coating is carried out from an electrolyte of the composition, g / l: silver chloride -25-30 ;: palladium chloride-5-7; copper sulfate - 5-7; iron-synergistic potassium - 70-100; potassium hydroxide - 0.2-0.8; potassium carbonate - 15-20; Trilon B - 60-120; SUAV - 1-5; pyrocarbon - 1-2; carbon nanotubes - 0.5-1; zirconium nitride 1-2, at a temperature of 20-25 ° C, pH 1-1.5, the current density is 0.5-2 A / dm ² .

For example, electrochemical deposition of a gold-diamond coating is carried out from an electrolyte of the composition, g / l: potassium dicyanourate - 8-10; citric acid - 30-40; potassium carbonate - 15-20; SUAV - 2-5; carbyne -0.5-1; fullerene - 0.1-0.2, at a temperature of 20-25 ° C, pH 0.5-1.0, current density - 0.5-1.5 A / dm ² .

For example, electrochemical deposition of an alloy of gold-palladium-copper-silver-diamond coating is carried out from an electrolyte of the composition, g / l: potassium dicyanourate - 8-10; palladium chloride 5-7; copper sulfate - 5-7; citric acid - 20-30; potassium carbonate - 15-20; SUAV - 2-7; fullerene - 0.1-0.2; carbyne - 0.25-0.5 at a temperature of 20-25 ° C, pH 1-1.5, current density -0.1-2 A / dm ² .

For example, electrochemical deposition of platinum-diamond coating is carried out from an electrolyte of the composition, g / l: platinum diaminonitrate-6-9; ammonium nitrate - 50-70; ammonium hydroxide - 0.3-0.9; sodium nitrate - 10-15; SUAV - 2-5; fullerene - 0.2-0.4; reduced graphene oxide - 0.25-0.5; carbon nanotubes 0.25-0.75, at a temperature of 50-60 ° C, pH 0.1-0.5, current density 0.5-1.5 A / dm ² .

For example, electrochemical deposition of a platinum-rhodium-diamond alloy coating is carried out from an electrolyte of the composition, g / l: platinum diaminonitrate-6-12; ammonium nitrate - 50-70; ammonium hydroxide - 0.3-0.9; rhodium in terms of metal - 0.1-0.25; sodium nitrate 8-12; SUAV - 2-4; reduced graphene oxide - 0.5-1; carbon nanotubes 0.5-1, at a temperature of 50-60 ° C, pH 0.1-0.5, current density - 0.5-1.5 A / dm ² .

For example, the electrochemical deposition of rhodium-diamond coating is carried out from an electrolyte of the composition, g / l: rhodium phosphate - 1-2; phosphoric acid 50-60; SUAV - 1-2; astralen - 1-2; carbon nanotubes - 1-2, at a temperature of 18-20 ° C, current density - 0.5-1.5 A / dm ² .

For example, the electrochemical deposition of an alloy of rhodium-platinum-copper-diamond coating is carried out from an electrolyte of the composition, g / l: rhodium phosphate - 1-2; phosphoric acid - 50-60; platinum diaminonitrate - 6-12; ammonium nitrate - 50-70; ammonium hydroxide - 0.3-0.9; copper sulfate - 30; SUAV - 2-3; reduced graphene oxide - 0.5-1; carbon nanotubes - 1-2, at a temperature of 18-20 ° C, current density - 0.5-1.5 A / dm ² .

For example, electrochemical deposition of a palladium-diamond coating is carried out from an electrolyte of the composition, g / l: palladium chloride-4-7; ammonium chloride - 15-25; sodium nitrate - 25-35; ammonium sulfamic acid - 10-15; aqueous ammonia - 7-14; SUAV - 1-5; reduced graphene oxide - 0.25-0.75; carbon nanotubes - 0.25-0.75, at a temperature of 25-30 ° C, pH 7.5-8.5, the current density is 0.5-1.0 A / dm ² .

For example, electrochemical deposition of a palladium-platinum-copper-diamond alloy coating is carried out from an electrolyte of the composition, g / l: palladium chloride-4-7; platinum chloride - 3-5; copper sulfate - 3-5; ammonium chloride - 15-25; sodium nitrate - 25-35; ammonium sulfamic acid - 10-15; aqueous ammonia - 7-14; SUAV - 3-5; diamond - 1-2; carbon nanotubes - 0.25-0.75, at a temperature of 25-30 ° C, pH 7.5-8.5, current density - 0.5-1.0 A / dm ² .

In the technological processes of chemical and electrochemical deposition of metal-diamond coatings, baths are used, equipped with special systems: heating, cooling, ventilation, irrigation, stirring, bubbling, ultrasonic action, hydrodynamic action of a liquid jet with a high velocity head, and others.

A dispersed system for chemical or electrochemical deposition from a solution or electrolyte, respectively, of a composite metal-diamond coating on the surface of a medical device, characterized in that it consists of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer in an amount of 0.01-12 g / l dispersed systems, and water is used as a dispersed medium, dispersed particles of a substance are used as a solid dispersed phase, at a concentration of 0.05-300 g / l, while the size of these particles is from 1 to 300 nm and they are a mixture of dispersed particles of synthetic carbon diamond-containing substances and substances from the group containing diamond, graphene, fullerene, astralen, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, carbonitride titanium, zirconium carbonitride, zirconium dioxide, yttrium oxide, aluminum oxide inium or their various combinations, while a low molecular weight electrolyte, a colloidal surfactant (surfactant) was used as a stabilizer, while a low molecular weight electrolyte was selected from the group containing an inorganic electrolyte and an organic electrolyte, acids from the group containing sulfuric acid were selected as an inorganic electrolyte. , hydrochloric, boric, hydrofluoric, phosphoric, chromic, hydrocyanic, carbonic, nitrogenous, hydrogen sulfide, or a mixture thereof, or hydroxides from the group containing sodium hydroxide, potassium hydroxide, ammonium hydroxide or a mixture thereof, organic electrolytes are selected from the group of acids containing acetic, formic, lemon, oxalic, acrylic, methacrylic or a mixture thereof, while the colloidal surfactant is selected from the group containing an anionic surfactant, a cationic surfactant, as an anionic surfactant, a substance is selected from the group containing sodium caprate, sodium dodecanote, sodium myristinate, sodium oleate, potassium oleate potassium stearate, sodium lauryl sulfate I, potassium lauryl sulfate, sodium tetradecyl sulfate, 4-dodecylbenzene sulfonate, as a cationic surfactant, a substance was selected from the group containing dioctadecyldimethylammonium chloride, trimethylcocoammonium chloride, oleyltrimethylammonium chloride, dimethylcobenzylammonium chloride, dimethylcobenzylammonium chloride, dimethylcobenzylammonium chloride

Dispersion is fine grinding of solids, that is, directional transformation in the direction of reducing the size of dispersed particles. The quantitative characteristic of fineness (fragmentation, grinding) is the degree of fineness (degree of fragmentation or grinding), that is, the reciprocal of the size of dispersed particles.

The dispersed system contains dispersed particles of the substance of the specified group in a concentration of 0.05-300 g / l of the dispersed system, the particle size being from 1 to 300 nm. Dispersed particles of size: 1-10 nm are ultrafine particles; 10-100 nm (1 μm) are highly dispersed particles; 1-100 microns are coarse particles. Methods for obtaining nanosized dispersed particles of a substance can be selected from the group: mechanical dispersion in planetary, ball, vibration and other mills, ultrasonic dispersion in a liquid medium based on the cavitation effect, mechanochemical dispersion, electrical dispersion, condensation of nanoparticles, detonation synthesis of nanodiamonds, cavitation synthesis of nanodiamonds , self-propagating high-temperature synthesis (SHS), sol-gel synthesis (ZGS).

For example, the composition of the dispersed system, g / l: liquid dispersed medium in the form of water - 1000 g; solid dispersed phase in the form: SUAV - 3-5, diamond - 1-2, carbon nanotubes - 0.25-0.75; stabilizer in the form of: ammonium hydroxide - 0.3-1.1, sodium lauryl sulfate - 0.9-1.5

For example, the composition of the dispersed system, g / l: liquid dispersed medium in the form of water - 1000 g; solid dispersed phase in the form: SUAB - 1-5, reduced graphene oxide - 0.25-0.75, carbon nanotubes - 0.25-0.75; stabilizer in the form: citric acid - 3-3.5, dioctadecyldimethylammonium chloride - 0.5-1.

For example, the composition of the dispersed system, g / l: liquid dispersed medium in the form of water - 1000 g; solid dispersed phase in the form: SUAB - 2-3, reduced graphene oxide - 0.5-1, carbon nanotubes - 1-2; stabilizer in the form of: potassium hydroxide - 0.2-0.8, sodium oleate 0.01-0.1, 4-dodecylbenzenesulfonate 0.9-1.5, dioctadecyldimethylammonium chloride 0.25-0.3.

For example, the composition of the dispersed system, g / l: liquid dispersed medium in the form of water - 1000 g; solid dispersed phase in the form: SUAV - 1-2, astralen -1-2, carbon nanotubes - 1-2; stabilizer in the form: boric acid - 2-6, potassium oleate 0.8-1.0, trimethyl cocoammonium chloride - 0.3-0.5. For example, the composition of the dispersed system, g / l: liquid dispersed medium in the form of water - 1000 g; solid dispersed phase in the form: SUAB - 0.05, reduced graphene oxide - 0.15-0.3, carbon nanotubes 0.1-0.2; stabilizer in the form: sodium hydroxide - 0.01-0.1, dimethyldodecylbenzylammonium chloride - 0.01-0.05. For example, the composition of the dispersed system, g / l: liquid dispersed medium in the form of water - 1000 g; solid dispersed phase in the form: SUAV - 100-150; fullerene - 20-40; reduced graphene oxide - 35-60; carbon nanotubes 25-50; stabilizer in the form of: hydrochloric acid - 6-7, potassium oleate -1-1.5, dimethyl cocobenzylammonium chloride - 1-1.5.

The solution to this problem is achieved by the fact that the method for obtaining a dispersed system, characterized by the fact that annealing in an inert medium or vacuum of a solid dispersed phase powder, which is a mixture of dispersed SUAB particles and a substance selected from the group containing diamond, graphene, fullerene, astralen, reduced graphene oxide, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide, aluminum oxide or combinations thereof, mixing said mixture of dispersed particles with an aqueous solution containing a substance selected from the group consisting of sodium hypophosphite, calcium hypophosphite, borohydride, borazole, hydrazineborane, as well as metal ions in the lowest oxidation state Fe ²⁺ , Sn ²⁺ , Ti ³⁺ , Cr ² *, Mn ²⁺ , Ce ²⁺ , Cu ⁺ or a mixture thereof, or from the group including nitric acid, hydrochloric acid Otu, sulfuric acid, hydrofluoric acid or a mixture thereof, or from the group including sodium hydroxide, potassium hydroxide, ammonium hydroxide, tin hydroxide or a mixture thereof, or with aqueous solutions containing substances from these groups, and treatment of said mixture of dispersed particles with substances from of these groups at a temperature of 20-450 ° C, a pressure of 0.1-8 MPa, ultrasonic action with a frequency of 22-42 kHz, a vacuum of 1.3 * 10 ^-1 -1.3 * 10 ^-2 Pa, for 5 minutes up to 4 hours, separating the obtained product in the form of a mixture of dispersed particles of a substance from the specified group from waste substances, washing the product with distilled or deionized water using hydrodynamic treatment with a water jet with a pressure of 8-15 MPa, and then ultrasonic treatment, adding a liquid dispersed medium in the form water and stabilizer until the dispersed system reaches a pH of 4.5-7.1. During hydrodynamic treatment, the dynamic effect on the surface of particles, which is a mixture of dispersed particles of a substance from this group, is carried out by supplying water with high pressure and flow rate through hydraulic nozzles that provide a high speed pressure of the water jet.

Ultrasonic treatment consists in the combined effect of various effects that occur in a liquid under the influence of powerful ultrasonic vibrations. These effects are: cavitation, acoustic flows, sound pressure, sound capillary effect, of which cavitation plays a decisive role. Cavitation bubbles, pulsating and collapsing near pollution, destroy them, creating the well-known effect of cavitation erosion.

For example, the technological process of the method for producing a dispersed system includes:

1. Annealing a mixture of dispersed particles of substances from the specified group, for example, composition wt. %: SUAV -50, diamond -20, carbine -5, pyrographite -15, tungsten carbide -10, in an inert gas environment selected from the group: argon, neon, xenon, krypton or a mixture thereof. Annealing is carried out at a temperature of 400-450 ° C for 10-60 minutes;

2. Treatment with an aqueous solution of a reducing agent, for example, composition, wt. %: borohydride - 20, hydrazineborane - 10, sodium hypophosphite -20, hydrazine sulfate - 10, titanium oxide - 10, tin sulfate - 5, germanium chloride - 5, water -20. Processing is carried out in an ultrasonic bath at a temperature of 70-90 ° C for 5-20 minutes;

3. Rinsing with cold running water at a temperature of 20-22 ° C for 5-15 minutes. Water flow rate is set with the multiple ^x 4 substitutions per shift bath. In case of insufficient leaching quality, an additional irrigation system is provided;

4. Treatment with an aqueous solution, for example, ammonium hydroxide concentration of 10-40 wt. %. Processing is carried out in an ultrasonic bath at a temperature of 45-60 ° C for 5-30 minutes;

5. Rinsing with cold running water at a temperature of 20-22 ° C for 5-15 minutes. Water flow rate is set with the 4 ^x multiple substitutions bath per shift;

6. Separation of a mixture of dispersed particles of the substance and drying in a vacuum of 1.3 * 10 ^-1 Pa at a temperature of 70-80 ° C for 1 hour;

7. Treatment in a chemical reactor with an aqueous solution, for example, composition, wt. %: nitric acid - 57-62, hydrofluoric acid-25-35 at a temperature of 200 ° C, a pressure of 8 MPa, for 7-10 minutes;

8. Rinsing with running cold water in an ultrasonic bath with a temperature of 20-22 ° C for 5-7 minutes. Water flow rate is set with the 4 ^x multiple substitutions bath per shift;

9. Treatment, for example, with an aqueous solution of hydrochloric acid with a concentration of 15-40 wt. %. Processing is carried out at the temperature of the reaction mixture for 40-50 minutes;

10. Rinsing with distilled cold water in a hydrodynamic treatment bath with a pressure of 12 MPa, a temperature of 20-22 ° C for 5-7 minutes.

11. Rinsing with distilled cold water in a bath for ultrasonic treatment at a temperature of 20-22 ° C for 5-7 minutes;

12. Separation of the obtained product in the form of a mixture of dispersed particles of the substance and the addition of a liquid dispersed medium and a stabilizer until the dispersed system reaches a pH of 4.5-7.1.

For example, according to the solutions presented, a two-layer composite metal-diamond coating was obtained based on a nickel-silver-diamond alloy and a gold-palladium-copper-silver-diamond alloy with particles of a substance from this group dispersed in them, a medical product (dental implant) made of titanium alloy VT-9 (Fig. 1).

The first layer is an alloy of nickel-silver-diamond coating, by means of electrochemical deposition from a solution of the composition, g / l: nickel chloride - 20-30; silver chloride - 25-30; iron-synergistic potassium - 70-100; potassium hydroxide - 0.2-0.8; potassium carbonate - 15-20; Trilon B - 60-120; SUAV - 1-5; diamond - 1-3; carbon nanotubes - 0.5-1; boron carbide - 1-2; boron nitride -1-2; titanium carbonitride - 1-2; yttrium oxide - 0.25-0.8, at a temperature of 20-25 ° C, pH 1-1.5, current density - 0.5-2 A / dm ² .

The second layer of the alloy gold-palladium-copper-silver-diamond coating by means of electrochemical deposition from an electrolyte composition, g / l: g / l: potassium dicyanourate - 8-10; palladium chloride 5-7; copper sulfate - 5-7; silver chloride - 5-7; citric acid - 20-30; potassium carbonate - 15-20; SUAV - 2-7; fullerene - 0.1-0.2; carbyne - 0.25-0.5; titanium carbide - 2-3; titanium nitride - 1-2; titanium carbonitride - 1-2; zirconium dioxide - 1-2 at a temperature of 20-25 ° C, pH 1-1.5, current density - 0.1-2 A / dm ² .

The results showed that:

1. The thickness of nickel-silver-diamond coating is 8-12 microns;

2. The thickness of the gold-palladium-copper-silver-diamond coating is 8-12 microns;

3. The microhardness of the implant titanium alloy VT-9 is 338-352HB, the nickel-silver-diamond coating layer is 450-480 HB, the gold-palladium-copper-silver-diamond coating layer is 490-510 HB.

For example, according to the presented solutions, a two-layer composite metal-diamond coating was obtained based on a nickel-diamond and gold-palladium-copper-silver-diamond alloy with particles of a substance from this group dispersed in them, a medical product made of a titanium alloy VT-6 (Fig. 2).

The first layer of the nickel-diamond composite coating is deposited by chemical deposition of nickel on stainless steel products from a solution of the composition, g / l: nickel sulfate or nickel chloride - 20-30; SUAV - 1-7; diamond - 2-3; carbyne -1-2; reduced graphene oxide - 0.5-1; titanium carbide - 2-3; boron nitride -

12; carbon-boron nitride - 0.25-0.5; zirconium carbonitride - 1-2; aluminum oxide - 0.5-0.8, sodium acetate - 10-15; sodium hypophosphite -23-30; thiourea - 0.001-0.003; acetic acid - 5-10, at pH 4.3-5.0, temperature 85-95 ° C, loading density 1-2 dm ² / l, for 2-10 minutes. A solution of sodium hypophosphite is injected immediately before nickelization.

The second layer of the chromium-diamond composite coating by electrochemical chromium deposition is carried out from an electrolyte of the composition, g / l: chromic anhydride 230-250, sulfuric acid - 2-4, trivalent chromium -

2- 3, SUAV- 4-7, astralen - 0.15-0.2, silicon carbide - 0.5-1; titanium carbonitride - 1-2, boron nitride - 0.5-1; zirconium dioxide - 0.5-1; yttrium oxide 0.1-0.25, cathode current density 50-100 A / dm ² , temperature 45 (+ -) 2 ° C.

The results of the study showed that: the microhardness of the material of an article made of titanium alloy VT-6 is 280-335HB, a layer of nickel-diamond coating 520-550 HB, chromium-diamond coating 790-860 HB.

For example, according to the solutions presented, a single-layer composite metal-diamond coating was obtained based on an alloy of cobalt-chromium-molybdenum-diamond coating on a product made of stainless steel 12X18H10T (Fig. 3) by means of electrochemical deposition from an electrolyte of composition, g / l: cobalt sulfate - 300 -450; chromium sulfate - 40-60; sodium molybdate 10-20; glycolic acid - 40-45; sodium chloride - 15-20; SUAV - 1-5; reduced graphene oxide - 0.25-0.75; carbon nanotubes - 0.25-0.75, boron carbide - 0.5-1; tungsten carbide - 0.5-1; zirconium nitride - 1-2; zirconium carbonitride - 0.5-1; aluminum oxide - 1-2, at a temperature of 40-45 ° C, pH 5.2-5.8, current density - 4-6 A / dm ² .

The results of the study showed that: the microhardness of a product made of stainless steel 12X18H10T is 175-179HV, and a layer of cobalt-chromium-molybdenum-diamond coating is 840-980HV.

Experimental tests have convincingly confirmed that all the tasks have been successfully solved. It should be noted that the metals of this group are the most technologically advanced, interchangeable and preferred in use. Therefore, the use of any metal from the specified group or combinations thereof will provide the specified technical result. However, it is possible to use other metals suitable for the implementation of this invention.

Literature:

1. Method for applying galvanic coating to removable dentures, RU No. 2404294, published on 20.12.2012.

2. Method for producing electrochemical chromium-diamond coating RU No. 2585608, published on May 27, 2016.

3. Composite metal-diamond coating, a method for its production, a diamond-containing electrolyte additive and a method for its production, RU No. 2699699, published 09.09.2019.

4. Composite metal-diamond coating, a method for its production, a dispersed system for the deposition of a composite metal-diamond coating and a method for its production, RU No. 2706931, published on November 21, 2019.

Claims (6)

1. A method of obtaining a composite metal-diamond coating on the surface of a medical product, including the deposition of a metal and a solid dispersed phase in the form of a metal film, characterized in that at least one layer is deposited on the surface of the product by means of chemical or electrochemical deposition from a solution or electrolyte, respectively, containing a source of ions of the deposited substance selected from the group: iron, nickel, chromium, titanium, cobalt, tungsten, magnesium, molybdenum, vanadium, zirconium, niobium, hafnium, yttrium, copper, gold, silver, platinum, palladium, rhodium or their various combinations , and a dispersed system consisting of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer, and water is used as a liquid dispersed medium, a mixture of dispersed particles of a synthetic carbon diamond-containing substance and a substance selected from the group containing diamond is used as a solid dispersed phase , graphene, fullerene, astralen, restored graphene oxide, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide, oxide aluminum or a combination thereof, and the stabilizer is introduced into the dispersed system in an amount of 0.01-12 g / l of the dispersed system and is selected from the group containing a low molecular weight electrolyte, a colloidal surfactant or a combination thereof, then, if necessary, at least one the next layer by means of chemical or electrochemical deposition from a solution or electrolyte, respectively, containing an ion source of the deposited substance selected from the specified group, and the specified dispersed system, and when deposited from a solution or electrolyte, the concentration of said dispersed particles of the substance in the dispersed system is from 0.05 to 25 g / L electrolyte, and the particle size ranges from 1 to 300 n m, while before and after the deposition of each of the layers, the surface is treated by washing with water, drying, processing with chemicals by degreasing, etching, anodic pickling, sensitization, activation or several of them, mechanical treatment, heat treatment or several of them. 2. The method according to claim 1, characterized in that the chemical deposition of the coating is carried out by the displacement method, the galvanic pair method, the chemical reduction method or a combination of methods, while for the chemical or electrochemical deposition an aqueous solution and an electrolyte containing substances selected from the group are used, containing an inorganic compound in the form of sulfate, chloride or cyanide, an inorganic cyanide compound, an inorganic or organic acid, and, if necessary, additional ingredients selected from the group containing chromic anhydride, potassium dichromate, sodium dichromate, ammonium dichromate, sodium bisulfate, sodium carbonate , sodium sulfate, sodium hydroxide, ammonia, ammonium hydroxide, hydrazine, hydrazine sulfate, hydrazinium chloride, ammonium bicarbonate, sodium hypophosphite, calcium hypophosphite, borohydride, borazol, hydrazineborane, as well as metal ions in the lowest oxidation state Fe ²⁺ , Sn ²⁺ , Ti ³⁺ , Cr ²⁺ , Mn ²⁺ , Ce ²⁺ , Cu ⁺ or their mixture, sodium titanate, ammonium nitrate, sodium nitrate, sodium acetate, ammonium acetate, chromium acetate, nickel acetate, chromium fluoride, ammonium phosphinate, magnesium citrate, sodium citrate, saccharin, chromyl fluoride, thiourea, Rochelle salt, glycol, glutin glue, disodium salt ethylenediaminetetraacetic acid, phthalimide, sodium fluoride, vanadic acid, beryllic acid, bismuth acid, phenolphthalein, butanediol, trichlorethylamide, sodium lauryl sulfate, zinc monophosphate, zinc nitrate, sodium molybdate, rhodium phosphate or combinations thereof sodium, copper sulfate, magnesium sulfate, nickel sulfate, iron sulfate, chromium sulfate, ammonium sulfate, cobalt (II, III) sulfate, titanium sulfate (II, III, IV), rhodium (III) sulfate, tungsten disulfide, vanadium sulfate, zirconium (IV) sulfate, diniobium trioxide disulfate, hafnium sulfate, yttrium sulfate or a mixture thereof, the chlorides are selected from the group containing sodium chloride, ammonium chloride, ferric chloride, n ikel, chromium chloride (II, III, IV), tungsten chloride, cobalt chloride (I, III), vanadium chloride, niobium chloride (III, IV, V), zirconium chloride (II, III, IV), yttrium chloride, chloride copper (I, II), magnesium chloride, gold chloride (I, II, III), silver chloride, platinum (II, IV) chloride, palladium chloride, rhodium (III) chloride or a mixture thereof, cyanides are selected from the group containing cyanide sodium, potassium cyanide, copper cyanide, an inorganic cyanide compound is selected from the group containing potassium dicyanoargentate, potassium dicyanourate, sulfuric, hydrochloric, chromic, boric, hydrofluoric, hydrocyanic, carbonic, chlorine nitrous, hydrogen sulfide, orthohydrogenic acids are used as inorganic or organic acids. , phosphoric, sulfamic, hypophosphorous, acrylic, methacrylic, lemon, oxalic, acetic, formic, or a mixture thereof. 3. The method according to p. 1, characterized in that the low molecular weight electrolyte is selected from the group containing an inorganic electrolyte, an organic electrolyte, while the inorganic electrolyte is selected from the group containing sulfuric acid, hydrochloric acid, boric acid, hydrofluoric acid, orthophosphoric acid, chromic acid, hydrocyanic acid, carbonic acid, nitrous acid, hydrosulfuric acid or a mixture thereof, or from the group of hydroxides containing sodium hydroxide, potassium hydroxide, ammonium hydroxide or a mixture thereof, organic electrolytes are selected from the group containing acetic acid, formic acid , citric acid, oxalic acid, acrylic acid, methacrylic acid or a mixture thereof, while the colloidal surfactant is selected from the group containing an anionic surfactant, a cationic surfactant, as an anionic surfactant, a substance is selected from the group containing sodium caprate, sodium dodecanoate, sodium myristinate, sodium oleate, potassium oleate, potassium stearate, laurils sodium ulfate, potassium lauryl sulfate, sodium tetradecyl sulfate, 4-dodecylbenzenesulfonate or a mixture thereof, as a cationic surfactant, a substance is selected from the group: dioctadecyl dimethylammonium chloride, trimethyl cocoammonium chloride, oleyltrimethylammonium chloride, dimethylmoniumbenzene chloride 4. The method of claim 1, characterized in that the degreasing is carried out with substances selected from the group containing an aqueous solution of sodium hydroxide, potassium hydroxide or alkali metal salts, organic solvents, surfactants and electrolytes for electrochemical degreasing, etching is carried out with aqueous solutions of sulfuric acid , hydrochloric acid, phosphoric acid, nitric acid, hydrofluoric acid or a mixture thereof, as well as with electrochemical etching electrolytes, anodic pickling is carried out in an electrolyte containing a source of ions of the deposited metal, sensitization is carried out with solutions of metal salts selected from the group containing Sn ²⁺ , Fe ²⁺ , Ti ³⁺ , Ge ²⁺ , while water, acid, ethanol or their mixture is used as a solvent, activation is carried out with solutions of compounds of catalytically active metals selected from the group containing palladium, platinum, silver, rhodium, ruthenium, osmium , iridium, while the solvent is used water, acid, ammonia, sodium hydroxide, or a mixture thereof. 5. Disperse system for chemical or electrochemical deposition from a solution or electrolyte, respectively, of a composite metal-diamond coating on the surface of a medical device, characterized in that it consists of a mixture of a liquid dispersed medium, a solid dispersed phase and a stabilizer in the amount of 0.01-12 g / l of a dispersed system, and water is used as a liquid dispersed medium, dispersed particles of a substance in a concentration of 0.05-300 g / l are used as a solid dispersed phase, while the size of these particles is from 1 to 300 nm, and they are a mixture dispersed particles of synthetic carbon diamond-containing substances and substances from the group containing diamond, graphene, fullerene, astralen, reduced graphene oxide, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, nitride titanium, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide, alumina or their combinations, while a low molecular weight electrolyte, a colloidal surfactant was used as a stabilizer, while a low molecular weight electrolyte was selected from the group containing an inorganic electrolyte and an organic electrolyte, acids from the group containing sulfuric acid were selected as an inorganic electrolyte , hydrochloric, boric, hydrofluoric, phosphoric, chromic, hydrocyanic, carbonic, nitrogenous, hydrogen sulfide, or a mixture thereof, or hydroxides from the group containing sodium hydroxide, potassium hydroxide, ammonium hydroxide or a mixture thereof, organic electrolytes are selected from the group of acids containing acetic, formic, lemon, oxalic, acrylic, methacrylic or a mixture thereof, while the colloidal surfactant is selected from the group containing an anionic surfactant and a cationic surfactant, as an anionic surfactant, a substance is selected from the group containing sodium caprate, sodium dodecanoate, sodium myristinate, sodium oleate, potassium oleate, potassium stearate, sodium lauryl sulfate rium, potassium lauryl sulfate, sodium tetradecyl sulfate, 4-dodecylbenzenesulfonate or a mixture thereof, as a cationic surfactant selected a substance from the group containing dioctadecyl dimethylammonium chloride, trimethylcocoammonium chloride, oleyltrimethylammonium chloride, dimethylammonium chloride from the specified groups. 6. A method for producing a dispersed system according to claim 5, characterized in that annealing is carried out in an inert medium or vacuum of a solid dispersed phase powder, which is a mixture of dispersed particles of a synthetic carbon diamond-containing substance and a substance selected from the group containing diamond, graphene, fullerene, astralen, reduced graphene oxide, carbyne, carbon nanotubes, pyrographite, boron carbide, tungsten carbide, silicon carbide, titanium carbide, boron nitride, zirconium nitride, titanium nitride, carbon-boron nitride, titanium carbonitride, zirconium carbonitride, zirconium dioxide, yttrium oxide , aluminum oxide or combinations thereof, mixing said mixture of dispersed particles with an aqueous solution containing a substance selected from the group consisting of sodium hypophosphite, calcium hypophosphite, borohydride, borazole, hydrazineborane, as well as metal ions in the lowest oxidation state Fe ²⁺ , Sn ^{2 +} , Ti ³⁺ , Cr ² *, Mn ²⁺ , Ce ²⁺ , Cu ⁺ or a mixture thereof, or from the group including nitric acid lot, hydrochloric acid, sulfuric acid, hydrofluoric acid or a mixture thereof, or from the group including sodium hydroxide, potassium hydroxide, ammonium hydroxide, tin hydroxide or a mixture thereof, or with aqueous solutions containing substances from these groups, and processing said mixture of dispersed particle substances of said groups at a temperature of 20-450 ° C, a pressure of 0.1-8 MPa, with a sonication frequency of 22-42 kHz, vacuum 1.3 * 10 ^-1 -1.3 * 10 ^-2 Pa, for from 5 minutes to 4 hours, separating the resulting product in the form of a mixture of dispersed particles of a substance from the specified group from waste substances, washing the product with distilled or deionized water using hydrodynamic treatment with a water jet with a pressure of 8-15 MPa, and then ultrasonic treatment and adding a liquid dispersed medium in the form of water and a stabilizer until the dispersed system reaches a pH of 4.5-7.1.

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