KR20190106358A - The polishing device having means to prevent scattering polishing liquid - Google Patents

Abstract

The present invention relates to a polishing device having a unit for preventing a polishing liquid from spattering. The purpose of the present invention is to provide a pleasant surrounding work environment of the polishing device by preventing the polishing liquid from spattering while a polishing member polishes a work and from leaking outside by blocking the polishing liquid with a blocking member as the polishing device has a structure in which the blocking member is installed in a guide space penetrated in an upper bed forming the polishing device and an upper end of the blocking member is fixed to an upper table. Also, the lower part of the blocking member covers the upper end of a lower table. To achieve the purpose of the present invention, the polishing device having the unit for preventing a polishing liquid from spattering comprises: the lower table (10); a Y-axis servomotor (12) moving the lower table (10) forward and backward in a Y-axis direction; an X-axis servomotor (30) installed on the upper bed (4) installed on the upper side of a lower bed (6); the upper table (8) having a polishing cylinder (44) vertically installed in the upper part while moving to the left and right by the X-axis servomotor (30); and a polishing unit (42) connected to a front end of a rod of the polishing cylinder (44). A guide space (36) is formed by being penetrated at the middle of the upper bed (4), and the polishing unit (42) is installed in the guide space (36). The blocking member (60) is installed in the guide space (36) and is fixed to the upper table (8). So, the polishing liquid is not spattered to the outside by the blocking member (60).

Description

Polishing apparatus having polishing liquid scattering prevention means {TH POLISHING DEVICE HAVING MEANS TO PREVENT SCATTERING POLISHING LIQUID}

The present invention relates to a polishing liquid scattering prevention member for a polishing apparatus, and more particularly, while the blocking member is disposed in the penetrating guide space of the upper bed constituting the polishing apparatus, the upper end of the blocking member is fixed to the upper table, The lower part of the blocking member covers the upper end of the lower table so that the blocking member blocks the polishing liquid scattered in the process of polishing the workpiece so that the blocking member does not escape to the outside. The present invention relates to a polishing apparatus having a polishing liquid scattering prevention means that can be made significantly comfortable.

In general, the front screen window of the smartphone, tablet PC and game consoles, such as glass or crystal is used to be used, such screen window is made by polishing the polishing pad in the polishing device to be made as a finished product.

In the polishing apparatus, the polishing liquid is scattered during the polishing process to always contaminate the surroundings of the workplace. Therefore, structural improvement measures are required to prevent the polishing liquid from being scattered from the polishing apparatus.

Meanwhile, KR 10-1490458 B1 2015.1.30. The curved window glass inner diameter and the planar polishing machine of the mobile device will be described with reference to FIG. 1.

First, the vacuum suction pipe 62 is connected to the jig 111 for fixing the glass on the table 112 of the polishing machine, and the motor 221 which moves up and down is vertically positioned on the jig 111. The polishing liquid injection nozzle 32 is disposed outside the polishing jig 211.

Place the glass on the jig 111 installed as described above and fix it with vacuum pressure, then operate the motor 221 to lower the front of the glass while rotating the polishing jig 211, and at the same time the injection nozzle The polishing liquid is sprayed onto the glass.

In the above state, the polishing jig 211 polishes the glass with the polishing liquid.

The prior art as described above has a structure in which the spray nozzle is disposed outside the polishing jig 211 to spray the polishing liquid, so that the sprayed liquid is scattered to the outside of the table 112 to contaminate the surroundings. I have a problem.

Republic of Korea Patent No. 10-1490458 (2015.01.30. Registration)

The present invention has been made to solve the problems of the prior art as described above, the object of which is to arrange the blocking member in the guide space of the upper bed constituting the polishing apparatus, the upper end of the blocking member to the upper table The lower part of the blocking member to realize the structure to cover the upper end of the lower table so that the blocking member blocks the polishing liquid scattered in the process of polishing the workpiece so that the blocking member does not escape to the outside. It is in order to make the surrounding work environment of a device drastically comfortable.

The present invention firstly, the lower table 10 is provided with a plurality of work fixing jig 24,

A y-axis servo motor 12 installed on the lower bed 6 while moving the lower table 10 forward and backward in the y-axis direction,

An x-axis servo motor 30 installed on the upper bed 4 located above the lower bed 6 and providing a transfer power in the x-axis direction;

An upper table 8 for vertically mounting the grinding cylinder 44 on the upper side while moving left and right by the x-axis servo motor 30;

Polishing unit 42 for injecting and polishing the polishing liquid supplied from the polishing liquid pump 28 to the workpiece while sequentially connecting the polishing motor 54 and the polishing member 58 to the rod front end of the polishing cylinder 44, A polishing apparatus having a polishing liquid scattering prevention means,

A rectangular guide space 36 is formed through the middle of the upper bed 4, and the grinding space 42 is disposed inside the guide space 36 to move left and right, and the guide space The fixed member is fixed to the bottom surface of the upper table 8 while arranging the blocking member 60 on the 36, so that the polishing liquid scattered by the blocking member 60 does not escape to the outside.

Second, the lower portion of the blocking member 60 is separated while covering the entire upper end of the lower table 10.

Third, the blocking member 60 is composed of a rectangular flange 62 is fixed to the bottom surface of the upper table 8 with a screw, the blocking wall 64 made of a rectangular cylindrical tube integrally with the flange 62 It extends vertically, and is formed at the lower end of the blocking wall 64 to cover the upper portion of the lower table 10 while being integrally formed with a horizontal blocking plate 66 having a horizontal shape.

In the present invention, the blocking member 60 is disposed in the guide space 36 of the upper bed 4 constituting the polishing apparatus 2, and the upper end of the blocking member 60 is fixed to the upper table 8. Since the lower portion of the blocking member 60 is configured to cover the upper end of the lower table 10, the polishing liquid scattered during the polishing process of the polishing member 58 is the blocking member 60. By being blocked so as not to escape to the outside by), the peripheral working environment of the polishing apparatus (2) has an effect that is significantly comfortable.

1 is a state in which a conventional polishing apparatus is installed on a table.
2 is a front view of a polishing apparatus provided with an embodiment of the present invention.
3 is an exploded perspective view of the upper and lower tables in which an embodiment of the present invention is installed.
4 is a front sectional view of the upper table in which the embodiment of the present invention is installed;
5 is a perspective view of a blocking member which is an embodiment of the present invention.
Figure 6 is a perspective view of another embodiment of the blocking member is installed on the upper table.
Figure 7 is a part of the upper table is installed blocking member another embodiment of the present invention
Isolated perspective view.
8 is a cross-sectional view taken along the line A-A of FIG.
Figure 9a, 9b is a state diagram of the inner blocking plate showing another embodiment of the present invention.
10A and 10B illustrate another embodiment of the auxiliary bellows connected to the polishing motor.
State diagram.

The present invention relates to a polishing apparatus (2) used for polishing a large amount of glass for mobile, the structure of which is described in Figures 2 to 5 as follows.

First, the upper and lower beds 4 and 6 are stacked in a two-layer structure in the polishing apparatus 2 (see FIG. 2), and the upper and lower tables 8 and 10 (see FIG. 3) are provided, respectively. A y-axis servo motor 12 is disposed in the y-axis direction with a ball screw 14 at the upper center of the lower bed 6, and a move mass 16 is coupled to the ball screw 14 to adjust the screw direction. Therefore, the front and the back, the y-axis servo motor 12 on both sides of the y-axis rail 18 is arranged in parallel in the y-axis direction while sliding the support mass 20 is coupled.

The move mass 16 is fixedly coupled to the center of the bottom surface of the box-shaped basket 22 constituting the lower table 10, and the support mass 20 is fixedly coupled to both bottom surfaces of the basket 22. .

Accordingly, when the moving mass 16 is moved while the ball screw 14 rotates by the power of the y-axis servo motor 12, the lower table 10 moves forward and backward along the y-axis rail 18. .

A plurality of jigs 24 are provided inside the basket 22 to fix the work, and a discharge port through which the polishing liquid flows out is connected to the recovery tank 26 at the bottom of the basket 22, and the recovery tank ( 26, a polishing liquid pump 28 for supplying a polishing liquid is provided.

On the other hand, the upper surface of the upper bed 4 is provided with an x-axis servo motor 30 to provide a transfer power, the x-axis servo motor 30 is installed in the x-axis direction at the rear of the upper bed (4) Then, the move mass 34 is screwed to the ball screw 32 of the x-axis servo motor 30 is moved forward, backward.

The inside of the x-axis servo motor 30 is formed with a guide space 36 penetrated in a rectangular shape, and the front and rear sides of the guide space 36 are parallel to each other while the x-axis rail 38 is installed. The slider 40 is slidably coupled to the x-axis rail 38.

The move mass 34 and the slider 40 are respectively coupled to the center, front and back of the bottom of the upper table 8, and the upper table 8 has a polishing unit for polishing the workpiece fixed to the jig 24 ( 42) A plurality of abrasives are disposed, and the polishing unit 42 is moved up and down by the polishing cylinder 44 installed on the upper table 8.

The polishing cylinder 44 (see FIG. 4) installed as described above is coupled to the fixing plate 48 coupled to the upper end of the guide rod 46 installed perpendicular to the upper table 8, and to the guide rod 46. The move block 50 is sliding, ascending and descending, the rod end of the grinding cylinder 44 is coupled to the upper end of the move block (50).

The polishing unit 42 is fixedly installed at the lower portion of the move block 50, and the rotary joint 52 which is raised and lowered together is connected to the upper end of the polishing unit 42, and is located inside the move block 50. do.

The polishing unit 42 is configured with a polishing motor 54 to provide a rotational power, the rotating shaft 56 of the polishing motor 54 is formed of a hollow shaft formed with the injection hole in the longitudinal direction.

The rotary joint 52 is connected to the injection hole while the rotary joint 52 is coupled to the upper end of the rotary shaft 56, and the polishing liquid pump 28 is connected to the rotary joint 52, and a polishing member (below) of the rotary shaft 56. 58) is connected.

Subsequently, an upper portion of the blocking member 60 is coupled around the bottom edge of the upper table 8 to prevent the polishing liquid sprayed during the polishing process from scattering and escape from the outside. The lower part covers the entire upper part of the basket 22 through the guide space 36, and at the same time, the blocking member 60 is separated from the basket 22.

In the blocking member 60 (see FIG. 5) installed as described above, a rectangular flange 62 fixed to the bottom surface of the upper table 8 with screws is formed, and the flange 62 has a rectangular cylindrical blocking wall ( 64 is integrally formed and vertically formed, and the lower portion of the blocking wall 64 is integrally formed with a horizontal blocking plate 66 having a horizontal shape to cover the upper portion of the basket 22.

At this time, a sealing main packing 68 is fixedly installed at the upper end of the basket 22 (refer to FIG. 4) to be in sliding contact with the bottom surface of the blocking plate 66, and at the bottom of the upper bed 4. The sealing auxiliary packing 70 is installed on the bottom surface of the guide space 36 to be in sliding contact with the upper surface of the blocking plate 66, and the main packing 68 and the auxiliary packing 70 are formed in the blocking plate ( By closely contacting the upper and lower surfaces of 66), the polishing liquid serves to seal while blocking the polishing liquid from escaping to the outside of the basket 22.

Referring to the operation of the embodiment of the present invention configured as described above are as follows.

First, when the operator turns on the power switch of the polishing apparatus 2 (see FIG. 3), the control unit 72 reverses and stops the lower table 10.

At this time, when the y-axis servo motor 12 is operated and stopped by the command of the control unit 72 and the ball screw 14 is rotated forward to move the move mass 16, the move unit 16 is fixed to the upper end of the move mass 16. The lower table 10 is moved backward along the y-axis rail 18 and stops while a part protrudes out of the polishing apparatus 2.

Therefore, the preparation work before the work is placed on the jig 24, and then the work is placed on the jig 24 to be fixed.

When the operation progress mode is selected by the controller 72 afterwards, the y-axis servo motor 12 is operated and stopped by the command of the controller 72 to rotate the ball screw 14 in reverse to move the move mass 16. When moved, the lower table 10 fixed to the upper end of the move mass 16 is advanced along the y-axis rail 18 to move into the interior of the polishing apparatus 2 and stop.

At the same time, the polishing liquid pump 28 is operated by the command of the control unit 72 to supply the polishing liquid, wherein the polishing liquid is a rotary joint 52, the injection hole of the rotary shaft 56 of the polishing motor 54, the polishing member. It passes by 58 sequentially and injects to the workpiece side.

After the above, when the grinding cylinder 44 (see Fig. 4) is operated by the command of the control unit 72 to advance the rod, the move block 50 coupled to the rod tip portion is lowered along the guide rod 46. At the same time, the polishing motor 54 coupled to the lower portion of the move block 50 is lowered together, wherein the polishing member 58 coupled to the rotating shaft 56 of the polishing motor 54 descends to the work side. The touch state is maintained.

When the polishing member 58 touches the work as described above, the rotating shaft 56 rotates the polishing member 58 by the power of the polishing motor 54, and the polishing member 58 is in a downward touch with the work. Begin to polish the plane of the workpiece.

In the above state, when the x-axis servo motor 30 is operated and stopped by the command of the control unit 72 and the ball screw 32 is rotated forward to move the move mass 34, the upper end portion of the move mass 34 is moved. The upper table 8 fixed to the upper end is moved forward along the x-axis rail 38 to the right and stops, and at this time, the polishing member 58 coupled to the rotary shaft 56 of the polishing motor 54 installed on the upper table 8. ) Moves while polishing the workpiece.

After the above, the controller 72 stops the x-axis servo motor 30 and transmits an operation and stop command to the y-axis servo motor 12 to rotate the ball screw 14 forward. The back table 10 moves forward along the y-axis rail 18 while moving, and stops.

At this time, the polishing member 58 located in the upper table 8 is rotated in the stopped state, the lower table 10 is moved backward in the y-axis direction with the workpiece fixed to the jig 24, The polishing member 58 rotates in a stationary state to polish the front surface of the workpiece moving in the y-axis direction.

After the above, the controller 72 stops the y-axis servo motor 12 and transmits an operation and stop command to the x-axis servo motor 30 to reversely rotate the ball screw 32. The upper table 8 is moved backward along the x-axis rail 38 to the left while moving and stops.

As described above, the lower table 10 stops when the upper table 8 moves, and the lower table 10 moves when the upper table 8 stops.

In the process of moving the upper and lower tables 8 and 10 forward and backward according to the command of the controller 72, the polishing member 58 moves in a "-" pattern in the plane of the workpiece to be polished. do.

As described above, the polishing liquid sprayed through the polishing unit 42 in the process of polishing the workpiece is scattered in the basket 22 of the lower table 10 while hitting the workpiece, wherein the polishing liquid is scattered in the basket ( 22 hits the inner side wall of the lower surface of the upper table 8 and falls to the bottom, and some scattering polishing liquid hits the blocking plate 66 and the blocking wall 64 of the blocking member 60 to the floor. Will fall.

At this time, the blocking plate 66 moves left and right with the upper table 8 in the guide space 36 of the upper bed 4, and at the same time the blocking plate 66 is the upper end of the basket 22 In the state sandwiched between the main packing 68 and the auxiliary packing 70 installed on the bottom of the upper bed (4) is sliding.

Therefore, the gap between the top of the basket 22 and the bottom of the upper table 8 is in a closed state, so that the above-mentioned abrasive liquid splashes against the bottom of the top table 8 and the side wall of the basket 22. It will fall and you will not be able to get outside.

As described above, the polishing liquid dropped to the bottom of the basket 22 is returned to the recovery tank 26 through the outlet, and the polishing liquid is circulated while being supplied again by the polishing liquid pump 28.

On the other hand, when the polishing process for the work is completed in the above process, the y-axis servo motor 12 is operated and stopped by the command of the controller 72 to rotate the ball screw 14 forward, wherein the The lower table 10 moves backward and stops after moving to the outside of the polishing apparatus 2, and at the same time, the polishing liquid pump 28 is stopped by the command of the controller 72.

After the above, after the fixing force of the jig 24 is released and the work is separated, the new work is fixed to the jig 24 and the polishing process is restarted in the above-described process.

Meanwhile, another embodiment of the present invention constituting the blocking member 60 will be described with reference to FIGS. 6 to 10.

First, a pleated main jabara 80 is provided between both sides of the guide space 36 of the upper bed 4 (see FIG. 7) and the yarn ends of the upper table 8 to prevent scattering of the polishing liquid. The rear end of the main jabara 80 is fixedly coupled to the support plates 82 provided on both sides of the guide space 36, respectively, and the front end of the main jabara 80 is fixed to the end of the upper table 8, respectively.

" 모양으로 형성 되면서 차단상부벽(84)과 차단측벽(86)으로 이루어져 있는 관계로, 상기 메인자바라(80)에 의해 비산하는 연마액은 효과적으로 차단되게 된다. In this case, the main Java 80 is "

"As formed in the shape of the block top wall 84 and the blocking side wall 86, the polishing liquid scattered by the main Java 80 is effectively blocked.

Then, the front and rear of the guide space 36, the "L" shaped inner blocking plate 88 (see Fig. 8) is fixed to the upper bed 4 along the longitudinal direction while being disposed in parallel in the transverse direction, The blocking side wall 86 of the main jabara 80 is located inside the inner wall of the inner blocking plate 88, and the outer blocking plate 90 is located outside the blocking side wall 86 of the main jabara 80. The inner blocking plate 88 is disposed inside the inner wall 94.

At this time, the upper end of the outer blocking plate 90 is fixedly installed on the upper table 8 and moved together, and the lower end of the outer blocking plate 90 is the same as the lower end of the side wall 86 of the main Java 80. There is a space from the bottom surface 92 of the inner blocking plate 88.

Accordingly, the outer blocking plate 90, the blocking side wall 86, and the inner wall 94 are sequentially arranged in the guide space 36 of the upper bed 4.

Subsequently, a discharge hole 96 is formed in the bottom surface 92 of the inner shielding plate 88 so as to allow some of the introduced polishing liquid to escape downward.

As shown in FIG. 9A, a recess 98 is bent along a lengthwise direction of the bottom surface 92 so that some of the inflow polishing liquid may be collected in the center, and the recess 98 may have a polishing liquid downward. A discharge hole 96 is formed so as to pass through in the form of a long hole.

In addition, as shown in FIG. 9B, a convex portion 102 is formed at the bottom surface 92 so that some of the inflowing polishing liquid may be separated and collected at both sides, and polished at both sides of the salve concave portion 102. A discharge hole 96 through which the liquid can escape down is formed in the form of a long hole.

On the other hand, the grinding motor 54 is slidingly coupled to the guide hole 104 (see FIG. 10A) of the upper table 8, and the lower portion of the auxiliary bar 106 is fixed to the lower end of the grinding motor 54. The upper part of the assistant bar 106 is fixedly contested to the bottom of the upper table 8.

At this time, the auxiliary bar 106 is to prevent the polishing liquid scattered to the outside through the gap between the polishing motor 54 and the guide hole 104.

Referring to the operation of another embodiment of the present invention configured as described above are as follows.

First, as described above, when the x-axis servo motor 30 (see FIG. 7) is operated and the move mass 34 is advanced by the command of the control unit 72, the upper table 8 is connected to the polishing cylinder 44. Together along the x-axis rail 38 is advanced.

At this time, the upper table 8 is pushed to the main jabara 80 located in the front end in the process of advancing, and at the same time the main jabara 80 located at the rear of the upper table 8 is pulled out to unfold, the external cut The plate 90 (see Fig. 8) causes the inside of the inner blocking plate 88 to move along the longitudinal direction.

At the same time, the lower end portion of the blocking side wall 86 and the lower end portion of the outer blocking plate 90 are moved in a state separated from the bottom surface 92 of the inner blocking plate 88.

In the above state, the polishing liquid sprayed through the polishing member 58 is scattered while hitting the work, wherein a part of the polishing liquid is scattered on the bottom surface of the upper table 8 and the upper wall of the main jabara 80. After hitting 84 and the inner wall 94 of the inner blocking plate 88, it falls down.

At the same time, a part of the polishing liquid splashes and flows into the inner blocking plate 88 after hitting the blocking side wall 86 of the main Java 80, and then the polishing liquid is bottom surface 92 of the inner blocking plate 88. ) To move inwardly and hit the outer shielding plate 90 again and then drop to the bottom surface 92, after which the polishing liquid exits through the discharge hole 96 formed in the bottom surface 92. do.

Unlike the above, as shown in FIG. 9A, the polishing liquid hit by the blocking side wall 86 and the outer shielding plate 90 of the main Java 80 flows into the recess 98 while falling to the bottom surface 92. Thereafter, the polishing liquid is discharged downward through the discharge hole 96.

In addition, unlike the above, as shown in FIG. 9B, the polishing liquid hit by the blocking side wall 86 and the outer shielding plate 90 of the main Java 80 is dropped by the convex portion 102 while falling to the bottom surface 92. It is divided into both sides and flows thereafter, and the polishing liquid exits downward through the discharge hole 96 formed in the bottom surface 92.

On the other hand, if the polishing motor 54 is lowered as shown in FIG. 10A to FIG. 10B while the rod is advanced by the operation of the polishing cylinder 44, the lower portion of the auxiliary bar 106 is formed by the polishing bolt 54. It is pushed out and unfolds.

At this time, the polishing liquid sprayed through the polishing member 58 is scattered toward the polishing motor 54, but is blocked by the auxiliary bar 106 coupled over the upper table 8 and the polishing motor 54. Thus, the polishing liquid does not escape to the outside through the gap between the guide hole 104 of the upper table 8 and the polishing motor 54.

Although the preferred embodiments of the present invention as described above in detail by the accompanying drawings, the present invention is not limited to the embodiments described herein, those skilled in the art having ordinary skill in the art Various modifications and variations can be made without departing from the scope.

2: Polishing device 4: Upper bed
6: lower bed 8: upper table
10: lower table 12: y axis servo motor
14, 32: Ball screw 16, 34: Move mass
18: y-axis rail 20: Supporting mass
22: basket 24: jig
26: recovery tank 28: polishing liquid pump
30: x servo motor 36: information space
38: x axis rail 40: slider
42: polishing part 44: polishing cylinder
46: Information stick 48: Fixed plate
50: Move block 52: Rotary joint
54: polishing motor 56: rotating shaft
58: polishing member 60: blocking member
62: flange 64: barrier wall
66: blocking plate 68: main packing
70: secondary packing 72: control unit
80: Mainzabara 82: support plate
84: blocking top wall 86: blocking side wall
88: internal blocking plate 90: external blocking plate
92: bottom 94: inner wall
96: discharge hole 98: main part
102: iron 104: guide
106: Assistant zabara

Claims (13)

A lower table 10 provided with a plurality of workpiece fixing jigs 24,
A y-axis servo motor 12 installed on the lower bed 6 while moving the lower table 10 forward and backward in the y-axis direction,
An x-axis servo motor 30 installed on the upper bed 4 located above the lower bed 6 and providing a transfer power in the x-axis direction;
An upper table 8 for vertically mounting the grinding cylinder 44 on the upper side while moving left and right by the x-axis servo motor 30;
Polishing unit 42 for injecting and polishing the polishing liquid supplied from the polishing liquid pump 28 to the workpiece while sequentially connecting the polishing motor 54 and the polishing member 58 to the rod front end of the polishing cylinder 44, A polishing apparatus having a polishing liquid scattering prevention means,
Through-shaped rectangular guide space 36 in the middle of the upper bed 4,
The grinding unit 42 is disposed in the guide space 36 to move left and right,
By arranging the blocking member 60 in the guide space 36 while being fixed to the bottom of the upper table 8,
Polishing apparatus having a polishing liquid scattering prevention means characterized in that the blocking member 60 is blocked to prevent the polishing liquid scattered to escape to the outside. The method according to claim 1,
The lower portion of the blocking member (60) is a polishing apparatus having a polishing liquid scattering prevention means, characterized in that separated while covering the upper end of the lower table (10). The method according to claim 2,
The blocking member 60 is formed with a rectangular flange 62 fixed to the bottom surface of the upper table 8 with screws,
The flange 62 is vertically formed while integrally extending the blocking wall 64 made of a rectangular tub,
Polishing apparatus having a polishing liquid scattering prevention means, characterized in that the lower portion of the blocking wall (64) is formed with a horizontal blocking plate (66) integrally formed to cover the upper end of the lower table (10). The method according to claim 3,
Polishing device having a polishing liquid scattering prevention means, characterized in that the upper end of the lower table 10, the sealing main packing (68) is fixedly installed in sliding contact with the blocking plate (66). The method according to claim 3 or 4,
Polishing apparatus having a polishing liquid scattering prevention means characterized in that the bottom surface of the upper bed (4) is in sliding contact with the blocking plate 66 while the sealing auxiliary packing 70 is installed along the inner side of the guide space (36). . A lower table 10 provided with a plurality of workpiece fixing jigs 24,
A y-axis servo motor 12 installed on the lower bed 6 while moving the lower table 10 forward and backward in the y-axis direction,
An x-axis servo motor 30 installed on the upper bed 4 located above the lower bed 6 and providing a transfer power in the x-axis direction;
An upper table 8 for vertically mounting the grinding cylinder 44 on the upper side while moving left and right by the x-axis servo motor 30;
Polishing unit 42 for injecting and polishing the polishing liquid supplied from the polishing liquid pump 28 to the workpiece while sequentially connecting the polishing motor 54 and the polishing member 58 to the rod front end of the polishing cylinder 44, A polishing apparatus having a polishing liquid scattering prevention means,
Through-shaped rectangular guide space 36 in the middle of the upper bed 4,
The grinding unit 42 is disposed in the guide space 36 to move left and right,
Polishing liquid scattering, characterized in that the pleated main jabara 80 is fixedly installed between both sides of the guide space 36 and both ends of the upper table 8 so that the scattering polishing liquid does not escape to the outside. Polishing apparatus having prevention means. The method according to claim 6,
The main Java 80 is "

Polishing device having a polishing liquid scattering prevention means, characterized in that formed in the shape consisting of a blocking upper wall 84 and the blocking side wall (86). The method according to claim 7,
On the front side and the rear side of the guide space 36, the "L" shaped inner blocking plate 88 is fixedly installed on the upper bed 4 while being disposed in parallel in the transverse direction,
Polishing apparatus having a polishing liquid scattering prevention means, characterized in that the blocking side wall (86) of the main Java (80) is disposed inside the inner wall (94) of the inner blocking plate (88). The method according to claim 8,
The outer shielding plate 90 is disposed inside the inner shielding plate 88 while the outer shielding plate 90 is positioned parallel to the outer side of the blocking side wall 86 of the main Java 80,
Polishing device having a polishing liquid scattering prevention means, characterized in that the upper end of the outer shielding plate 90 is fixed to the upper table (8) to move together. The method according to claim 8 or 9,
Polishing device having a polishing liquid scattering prevention means, characterized in that the bottom surface 92 of the inner shielding plate 88 is formed through the discharge hole 96 through which part of the polishing liquid flows out. The method according to claim 10,
A recessed portion 98 is formed in the bottom surface 92 of the inner blocking plate 88,
A polishing apparatus having a polishing liquid scattering prevention means, characterized in that the recess portion (98) is formed through the recessed portion (98). The method according to claim 10,
The convex portion 102 is formed on the bottom surface 92 of the inner blocking plate 88,
Polishing apparatus having a polishing liquid scattering prevention means, characterized in that the discharge hole (96) is formed through each side of the convex portion (102). The method according to claim 6,
The lower end of the auxiliary bar 106 is fixedly coupled to the lower end of the polishing motor 54,
The upper portion of the auxiliary bar 106 is fixedly coupled to the bottom of the upper table (8),
The auxiliary bar (106) is a polishing apparatus having a polishing liquid scattering prevention means, characterized in that to prevent the scattering polishing liquid to escape to the outside through the gap between the polishing motor (54) and the guide hole (104).

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