KR20120136957A - A detergent composition for flat panel display device - Google Patents

Abstract

PURPOSE: A cleansing composition for a flat panel display is provided to remove organic pollutant or particles on a glass substrate, electrode or wire, and to have excellent cleansing effect without corroding an electrode or wire. CONSTITUTION: A cleansing composition for a flat panel display comprises an alkoxyalkanolamine compound represented by chemical formula 1, a hydroxylamine compound represented by chemical formula 2, a water-soluble organic solvent, an organic phosphoric acid or organic phosphate, and water. The weight ratio of the comprised amount of the alkoxyalkanolamine compound and the hydroxylamine compound is 1:2-1:10. The organophosphoric acid is a potassium salt or a sodium salt.

Description

Cleaner composition for flat panel display device {A DETERGENT COMPOSITION FOR FLAT PANEL DISPLAY DEVICE}

The present invention relates to a cleaning composition for a flat panel display device.

Flat panel display devices, like semiconductor devices, are manufactured through processes such as film formation, exposure, and etching. However, by such a manufacturing process, adhesion contamination occurs due to very small particles having various organic and inorganic substances having a size of 1 μm or less on the substrate surface. When the following process treatment is performed while these particles are attached, pinholes and pits of the film, disconnection and bridges of the wiring are generated, and the production yield of the product is reduced.

Therefore, cleaning to remove contaminants is performed between the respective processes, and much research has been conducted on cleaning agents for this purpose. Korean Patent Laid-Open No. 2008-0038161 discloses a release agent composition for a semiconductor device composed of organic amine, organic phosphonic acid, linear sugar alcohol and water. However, the disclosed patent is limited to the use as a semiconductor device, there is a disadvantage that there is no anticorrosive ability for the wiring made of copper and copper alloy. Korean Patent Laid-Open Publication No. 2004-0035368 discloses a cleaning composition for a semiconductor and a TFT-LCD composed of an alkanol amine, an organic solvent, a chelating compound, and water. However, the disclosed patent lacks the ability to remove organic contaminants and particles, and may cause precipitation problems during long-term use due to catechol or gallic acid, which are polyhydroxy benzene-based chelate compounds. Korean Patent Laid-Open Publication No. 2006-0127098 discloses a cleaning liquid for a substrate for a semiconductor device including an organic acid component, an organic alkali component, a surfactant component, and water. However, since the cleaning solution of the disclosed patent is an acidic solution, the removal property of very small particles having a size of 1 μm or less, which is a basic property of the initial stage of cleaning, is insufficient. And, there is a disadvantage that only the anticorrosive effect on the copper wiring.

An object of the present invention is to provide a cleaning composition for a flat panel display device capable of removing organic contaminants or particles present on a glass substrate, an electrode or a wiring.

An object of the present invention is to provide a cleaning composition for a flat panel display device that exhibits a cleaning effect without corroding an electrode or a wiring made of a metal including copper, a metal containing aluminum, or the like used in the flat panel display device.

An object of the present invention is to provide a cleaning composition for a flat panel display device, which is economical and environmentally friendly, without causing a rinse problem.

The present invention is based on the total weight of the composition, an alkoxyalkanolamine compound represented by the formula (1); Hydroxylamine compound represented by the following formula (2); Water-soluble organic solvents; Organophosphoric acid or salts of organophosphoric acid; And it provides a cleaning composition for a flat panel display comprising a water:

≪ Formula 1 >

<Formula 2>

In the above formulas (1) and (2)

R ₁ is a C ₁ to C ₃ straight or branched hydroxyalkyl group, a C ₁ to C ₃ straight or branched thiolalkyl group or a thiol group;

R ₂ and R ₃ are each independently hydrogen, C ₁ to C ₄ alkyl group, C ₁ to C ₄ hydroxyalkyl group, C ₆ to C ₁₀ aryl group, C ₂ to C ₄ alkoxy substituted C ₁ ~ C ₄ alkyl group, an alkoxy alkane olgi containing alkoxy of C ₂ ~ C _4;

At this time, R ₁ and R ₂ may be bonded to each other to form a ring having 5 and 6 atoms, provided that R ₃ is not a C ₁ to C ₄ hydroxyalkyl group;

n is an integer from 1 to 4,

R ₄ and R ₅ are each independently a C ₁ ~ C ₁₀ alkyl group, C ₂ ~ C ₁₀ alkenyl group, C ₁ ~ C ₁₀ hydroxyalkyl group, a carboxyl group, a substituted or unsubstituted C ₁ ~ C ₁₀ ring to the hydroxyl group of the C ₁ -C ₁₀ alkyl, phenyl or benzyl group substituted with an alkoxy group.

The cleaning composition for a flat panel display device of the present invention can remove organic contaminants or particles present on a glass substrate, an electrode, or a wiring. The cleaning composition for a flat panel display device of the present invention can exert a cleaning effect without corroding an electrode or a wiring made of a metal including copper, a metal containing aluminum, or the like used in the flat panel display device. The cleaning composition for a flat panel display device of the present invention lowers the possibility of rinsing problems by using a large amount of water. In addition, the cleaning composition for a flat panel display device of the present invention is economical and environmentally friendly.

1 is a photograph showing a contact angle before and after cleaning a surface of a glass substrate on which copper is formed using the cleaning composition of Example 6. FIG.
Figure 2 is a photograph showing the contact angle before and after cleaning the surface of the glass substrate with copper using the cleaning composition of Comparative Example 4.

Hereinafter, the present invention will be described in detail.

The cleaning composition for a flat panel display device of the present invention contains an alkoxyalkanolamine compound, a hydroxylamine compound, a water-soluble organic solvent, an organic phosphoric acid or a salt of an organic phosphoric acid, and water.

The alkoxyalkanolamine compound contained in the cleaning composition for flat panel display devices of this invention is represented by following General formula (1).

&Lt; Formula 1 >

R ₁ is a C ₁ to C ₃ straight or branched hydroxyalkyl group, a C ₁ to C ₃ straight or branched thiolalkyl group or a thiol group; R ₂ and R ₃ are each independently hydrogen, C ₁ to C ₄ alkyl group, C ₁ to C ₄ hydroxyalkyl group, C ₆ to C ₁₀ aryl group, C ₂ to C ₄ alkoxy substituted C ₁ ~ C ₄ alkyl group, an alkoxy alkane olgi containing alkoxy of C ₂ ~ C _4; At this time, R ₁ and R ₂ may be bonded to each other to form a ring having 5 and 6 atoms, provided that R ₃ is not a C ₁ to C ₄ hydroxyalkyl group; n is an integer from 1 to 4.

The alkoxyalkanolamine compound represented by Chemical Formula 1 is not only a basic material capable of removing particles and organic contaminants, but also has an alkoxy structure, so when used in combination with other amines, a metal containing aluminum or a metal containing copper. Has anti-corrosion effect against

The alkoxyalkanolamine compound represented by the formula (1) is preferably contained in 0.01 to 5% by weight, more preferably 0.05 to 2% by weight based on the total weight of the composition. When the above-mentioned range is satisfied, the activity in the detergent is vigorous, so that the effect of removing organic contaminants and particles is excellent, thereby achieving a sufficient cleaning effect. And the anticorrosive effect with respect to the metal containing copper and the metal containing aluminum is increased.

The compound represented by Chemical Formula 1 is not particularly limited as long as it satisfies Chemical Formula 1, but is not limited to aminoethoxyethanol, aminopropoxyethanol, aminobutoxyethanol, dimethylaminoethoxythiol, diethylaminoethoxythiol, and dipropylamino. Ethoxythiol, dibutylaminoethoxythiol, dibutylaminoethoxyethanol dimethylaminoethoxyethanol, diethylaminoethoxyethanol, dipropylaminoethoxyethanol, dibutylaminoethoxyethanol, N- (methoxymethyl ) Morpholine, N- (ethoxymethyl) morpholine, N- (methoxyethanol) morpholine, N- (ethoxyethanol) morpholine and N- (butoxyethanol) morpholine selected from the group consisting of It is preferable that it is a species or 2 or more types. Among these, aminoethoxy ethanol and dimethylamino ethoxy ethanol are more preferable.

The hydroxylamine compound included in the cleaning composition for a flat panel display device of the present invention is represented by the following formula (2).

<Formula 2>

In Formula 2,

R ₄ and R ₅ are each independently a C ₁ ~ C ₁₀ alkyl group, C ₂ ~ C ₁₀ alkenyl group, C ₁ ~ C ₁₀ hydroxyalkyl group, a carboxyl group, a substituted or unsubstituted C ₁ ~ C ₁₀ ring to the hydroxyl group of the C ₁ -C ₁₀ alkyl, phenyl or benzyl group substituted with an alkoxy group.

The compound represented by Chemical Formula 2 improves the anticorrosive effect on the metal including copper and the metal including aluminum. And, it helps to adjust the pH of the cleaning composition for a flat panel display of the present invention to the alkaline solution level.

The compound represented by Chemical Formula 2 is preferably contained in an amount of 0.01 to 10% by weight, and more preferably 0.1 to 5% by weight, based on the total weight of the composition. If the above range is satisfied, the anticorrosive effect on the metal containing copper and the metal containing aluminum is improved. And, it helps to adjust the pH of the cleaning composition for a flat panel display of the present invention to the alkaline solution level.

The compound represented by Chemical Formula 2 is not particularly limited as long as it satisfies Chemical Formula 2, but one selected from the group consisting of dimethyl hydroxylamine, diethyl hydroxylamine, dibutyl hydroxylamine, and methylphenylhydroxylamine, or It is preferable that it is 2 or more types.

Meanwhile, the alkoxyalkanolamine compound represented by Chemical Formula 1 and the hydroxylamine compound represented by Chemical Formula 2 are preferably included in the weight ratio of 1: 2 to 1:10 in the cleaning composition for a flat panel display device of the present invention. . When the above-mentioned range is satisfied, the cleaning power for organic matter and particles is appropriate while preventing corrosion of electrodes or wires made of metals containing copper, due to organic acids used for the electrodes or wires made of metals including aluminum. To maintain the pH.

The water-soluble organic solvent included in the flat panel display cleaning composition of the present invention is used to increase the dissolving power to organic contaminants or particles.

The water-soluble organic solvent is preferably contained in an amount of 0.01 to 10% by weight, more preferably 0.1 to 5% by weight based on the total weight of the composition. When included in the above-mentioned range, the solubility to organic contaminants or particles is increased, and economical and environmentally friendly.

The water-soluble organic solvent may be a protic polar solvent and an aprotic polar solvent. The proton polar solvent is ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoiso Propyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monoisopropyl ether, triethylene glycol monobutyl ether, polyethylene glycol monomethyl ether, polyethylene glycol monobutyl ether At least one selected from the group consisting of propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, and propylene glycol monomethyl ether acetate. Preferable.

The aprotic polar solvent is preferably one or two or more selected from the group consisting of a pyrrolidone compound, an imidazolidinone compound, a lactone compound, a sulfoxide compound, a phosphate compound, a carbonate compound and an amide compound. More specifically, the aprotic polar solvent is N-methyl pyrrolidone (NMP), N-ethyl pyrrolidone, 1,3-dimethyl- 2-imidazolidinone, 1,3-dipropyl-2 Imidazolidinone, γ-butyrolactone, dimethyl sulfoxide (DMSO), sulfolane, triethyl phosphate, tributyl phosphate, dimethyl carbonate, ethylene carbonato, formamide, N-methylformamide, N, N -Dimethylformamide, acetamide, N-methylacetamide, N, N-dimethylacetamide, N- (2-hydroxyethyl) acetamide, 3-methoxy-N, N-dimethylpropionamide, 3- ( It is preferable that it is 1 type, or 2 or more types chosen from the group which consists of 2-ethylhexyloxy) -N, N- dimethyl propionamide and 3-butoxy-N, N- dimethyl propionamide.

The organic phosphoric acid or the salt of the organic phosphoric acid included in the cleaning composition for a flat panel display device of the present invention binds strongly with an inorganic ion and disperses the impurity particles so that they do not aggregate with each other. The organophosphoric acid or salts of organophosphoric acid are excellent in removing the organic / inorganic contaminants. The organophosphoric acid or a salt of the organophosphoric acid serves as a chelate compound for the metal including aluminum and the metal including copper to prevent corrosion of the metal. And, by adjusting the pH of the cleaning composition for a flat panel display device of the present invention, it is possible to implement a metal corrosion prevention and excellent cleaning effect at the same time.

The organophosphoric acid or the salt of organophosphoric acid is preferably contained in an amount of 0.001 to 5% by weight, and more preferably 0.01 to 2% by weight, based on the total weight of the composition. When the above-mentioned range is satisfied, the cleaning effect is improved, and the metals containing aluminum and the metals containing copper act as chelate compounds to prevent corrosion of the metals.

The organophosphoric acid may be methyldiphosphonic acid, aminotri (methylenephosphonic acid), ethylidenediphosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, 1-hydroxypropylidene-1,1- Diphosphonic acid, 1-hydroxybutylidene-1,1-diphosphonic acid, ethylaminobis (methylenephosphonic acid), 1,2-propylenediaminetetra (methylenephosphonic acid), dodecylaminobis (methylenephosphonic acid ), Nitrotris (methylenephosphonic acid), ethylenediaminebis (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), hexenediaminetetra (methylenephosphonic acid), diethylenetriaminepenta (methylenephosphonic acid) and cyclohexane It is preferable that it is 1 type (s) or 2 or more types chosen from the group which consists of diamine tetra (methylene phosphonic acid).

The salt of the organophosphoric acid is preferably a potassium salt of organophosphoric acid or a sodium salt of organophosphoric acid. Examples of the organophosphoric acid are the same as described above.

The water contained in the flat panel display cleaning composition of the present invention preferably contains a residual amount such that the total weight of the composition is 100% by weight. The water is used for the semiconductor process, preferably deionized water of 18 ㏁cm or more.

The cleaning composition for a flat panel display device of the present invention can impart anticorrosion ability to an electrode or a wiring made of a metal containing copper without using an azole compound.

When the azole compound is included in the cleaning composition for a flat panel display device, it may adversely affect the reason, as follows.

The azole compound is an anticorrosive agent having excellent anti-corrosion ability against electrodes or wirings made of metal containing copper because nitrogen forming azoles adsorbs on the copper surface in three dimensions and chelates with copper to prevent corrosion. . However, due to the nature of copper, an azole compound is strongly chelated with copper, remaining on the surface of copper to form a copper-azole compound on the surface. The copper-azole compound may cause an increase in resistance to the metal wiring, and when the post-process is a photolithography process, the copper-azole compound remains on the surface of the copper film to act as a secondary pollutant to lower the adhesion of the photoresist, thereby causing disconnection of the wiring. It may be the cause of the bridge.

Therefore, it is preferable that the azole compound is not included in the cleaning composition for a flat panel display device.

The present invention provides a flat panel display device made of the cleaning composition for the flat panel display device. Examples of the flat panel display include an organic light emitting display device and a liquid crystal display.

The cleaning composition for a flat panel display device of the present invention can remove organic contaminants or particles present on a glass substrate, an electrode, or a wiring. The cleaning composition for a flat panel display device of the present invention can exert a cleaning effect without corroding an electrode or a wiring made of a metal including copper, a metal containing aluminum, or the like used in the flat panel display device.

Hereinafter, the present invention will be described in more detail with reference to Examples and Test Examples. However, the scope of the present invention is not limited by the following examples and test examples.

Examples 1-12, Comparative Examples 1-5: Preparation of Cleaning Composition

In the mixing tank equipped with a stirrer, the components shown in Table 1 were mixed according to the composition ratios shown in Table 1, and stirred at a speed of 500 rpm for 1 hour at room temperature to prepare a cleaning composition.

Alkoxyalkanolamine Hydroxylamine Water soluble solvent Organophosphate compounds additive water Kinds weight% Kinds weight% Kinds weight% Kinds weight% Kinds weight% weight% Example 1 AEE 0.1 DEHA 0.2 MDG 0.5 HEDP 0.05 - - Balance Example 2 AEE 0.1 DEHA 0.5 MDG 0.5 HEDP 0.05 - - Balance Example 3 AEE 0.1 DEHA 0.5 NMP 0.5 HEDP 0.05 - - Balance Example 4 AEE 0.5 DEHA 1.0 MDG 0.5 HEDP 0.1 - - Balance Example 5 AEE 0.1 DEHA 0.5 MDG 0.5 ATMP 0.05 - - Balance Example 6 DAEE 0.1 DEHA 0.2 MTG 0.5 HEDP 0.05 - - Balance Example 7 DAEE 0.1 DEHA 0.5 DMI 0.5 HEDP 0.05 - - Balance Example 8 DAEE 0.1 DEHA 0.5 DMI 0.5 ATMP 0.05 - - Balance Example 9 DAEE 0.5 DEHA 1.0 DMI 0.5 HEDP 0.05 - - Balance Example 10 DAEE 0.5 DEHA 2.5 MDG 0.5 HEDP 0.12 - - Balance Example 11 DAEE 10 DEHA 0.5 MTG 0.5 HEDP 0.1 - - Balance Example 12 DAEE 0.5 DEHA 0.5 MTG 0.5 HEDP 0.1 - - Balance Comparative Example 1 AEE 0.5 DEHA - MTG 0.5 HEDP 0.1 - - Balance Comparative Example 2 AEE - DEHA 0.5 MTG 0.5 HEDP 0.1 - - Balance Comparative Example 3 AEE - DEHA - MTG 0.5 HEDP 0.1 - - Balance Comparative Example 4 AEE 0.5 DEHA - MTG 0.5 HEDP 0.1 BTA 0.01 Balance Comparative Example 5 AEE - DEHA 0.5 MTG 0.5 HEDP 0.1 TTA 0.01 Balance

AEE: aminoethoxyethanol DAEE: dimethylaminoethoxyethanol

DEHA: diethylhydroxylamine MDG: diethylene glycol monomethyl ether

NMP: N-methylpyrrolidone MTG: triethylene glycol monomethyl ether

DMI: 1,3-dimethyl-2-imidazolidinone HEDP: 1-hydroxyethylidene-1,1-diphosphonic acid

ATMP: aminotri (methylenephosphonic acid) BTA: benzotriazole

TTA: tolytriazole

Test Example: Evaluation of Characteristics of Cleaning Composition

1) aluminum, copper etching rate evaluation

First, a glass substrate having an aluminum thickness of 2000 kPa and copper of 2500 kPa was immersed in the cleaning composition of Examples 1 to 12 and Comparative Examples 1 to 5 for 30 minutes. At this time, the temperature of the cleaning liquid is measured at room temperature before and after immersing the thickness of the aluminum and copper film, and is calculated by calculating the dissolution rate of the aluminum and copper film from the thickness change of the film. Corrosion evaluation was evaluated based on the following criteria, the results are shown in Table 2.

※ Corrosion Evaluation Criteria

(Double-circle): Excellent (less than 2 s / min) ○: Good (2 s / min or more and less than 5 s / min)

(Triangle | delta): Inadequate (5 mW / min or more and less than 10 mW / min)

2) Evaluation of organic pollutant removal

In order to evaluate the removal power of organic contaminants, the fingerprint substrate is contaminated with a human fingerprint on a glass substrate formed of 5 cm x 5 cm, and the contaminated substrate is cleaned at room temperature for 1 minute using a spray-type glass substrate cleaning device. 12, the cleaning composition of Comparative Examples 1 to 5 was washed. After washing, it was washed with ultrapure water for 30 seconds and then dried with nitrogen.

At this time, the presence or absence of the organic contaminants in Table 2, when removed, was marked with X, when not removed.

3) Air pollutant removal ability evaluation

In addition, the glass substrate and the glass substrate having a copper thickness of 2500Å was left in the air for 24 hours to contaminate various organic materials, inorganic materials, and the like in the air, and then, at room temperature for 1 minute using a spray-type glass substrate cleaning device, Example 1 It was washed with the cleaning agent composition of Example 12 and Comparative Examples 1 to 5 after washing to 30 seconds in ultrapure water and then dried with nitrogen. 0.5 μl of ultrapure water was dropped on the glass substrate to measure the contact angle after washing. Contact angle evaluation was evaluated based on the following criteria, the results are shown in Table 2.

※ Evaluation criteria of contact angle

(Double-circle): Excellent (reduced more than 40 degrees), (circle): Good (40-30 degrees reduced)

△: Insufficient (30-20 ° decrease), X: Poor (less than 20 ° decrease)

4) Particle removal ability evaluation

The glass substrates having the cleaning composition of Examples 1, 4, 6, 9, and Comparative Examples 1 to 3 and contaminated with silicon nitride particle solution were washed. That is, the glass substrate was contaminated with a silicon nitride particle solution of submicron, spin-dried at 3000 rpm for 1 minute, and then cleaned with each cleaning solution at room temperature for 1 minute using a spray-type glass substrate cleaner. After washing, it was washed with ultrapure water for 30 seconds and then dried with nitrogen. The number of particles before and after cleaning was measured by a particle size measuring instrument (Topcon WM-1500) of 0.1 μm or more, and is shown in Table 2.

Al etching rate
(Å / min) Cu etching rate
(Å / min) Organic fingerprint Glass substrate contact angle Copper Substrate Contact Angle Number of particles before cleaning Number of particles after cleaning Removal rate
(%) Example 1 ○ ○ ○ ◎ ◎ 2635 325 88 Example 2 ○ ◎ ○ ◎ ◎ - - - Example 3 ○ ◎ ○ ◎ ◎ - - - Example 4 ○ ◎ ○ ◎ ◎ 2754 315 89 Example 5 ○ ○ ○ ◎ ◎ - - - Example 6 ◎ ◎ ○ ◎ ◎ 2908 427 85 Example 7 ◎ ◎ ○ ◎ ◎ - - - Example 8 ○ ○ ○ ◎ ◎ - - - Example 9 ◎ ◎ ○ ◎ ◎ 2893 307 89 Example 10 ◎ ◎ ○ ◎ ◎ - - - Example 11 ○ X ○ ◎ ◎ - - - Example 12 ○ X ○ ◎ ◎ - - - Comparative Example 1 X X ○ ◎ ◎ 2693 317 88 Comparative Example 2 X ○ ○ △ ◎ 2741 1560 43 Comparative Example 3 ○ X X △ ◎ 2821 1743 38 Comparative Example 4 ○ ○ X △ X - - - Comparative Example 5 ○ ○ X △ X - - -

Referring to Table 2, it can be seen that the cleaning composition of Examples 1 to 10 according to the present invention is excellent in anticorrosive performance for aluminum and copper, and also excellent in removing organic fingerprints and air pollutants. In particular, in Example 1, Example 4, Example 6 and Example 9, it can be seen that the particle removal ability is excellent. However, in the case of Example 11 and Example 12, the anticorrosive performance for copper was insufficient compared to other examples. However, other performances, corrosion protection for aluminum, organic fingerprints and removal of air pollutants were all excellent.

On the other hand, Figure 1 is a photograph showing the contact angle before and after cleaning the surface of the glass substrate with copper using the cleaning composition of Example 6.

Referring to FIG. 1, since the change in contact angle is remarkable, it can be seen that air pollutants have been removed.

On the other hand, in the case of Comparative Example 1, the anticorrosive performance for aluminum and copper is not excellent, in the case of Comparative Example 2, it can be seen that the anticorrosive performance for aluminum is not excellent. And, in the case of Comparative Example 3, it can be seen that the anticorrosive performance for copper is not excellent, the cleaning power for the organic fingerprint is not excellent. In Comparative Example 4 and Comparative Example 5 it can be seen that the cleaning power for organic fingerprints and air pollutants are not excellent.

Figure 2 is a photograph showing the contact angle before and after cleaning the surface of the glass substrate with copper using the cleaning composition of Comparative Example 4.

Referring to FIG. 2, since there is almost no change in contact angle, it can be seen that air pollutants are hardly removed.

In addition, in the case of Comparative Example 4 containing an azole anticorrosive agent compared to Comparative Example 1, even if the used azole anticorrosive agent is adsorbed on the copper surface and the contaminants are removed by washing, the change in contact angle is not large or rather increased than that of the non-cleaning substrate. It can be seen that the phenomenon appears.

Claims (9)

An alkoxyalkanolamine compound represented by Formula 1 below;
Hydroxylamine compound represented by the following formula (2);
Water-soluble organic solvents;
Organophosphoric acid or salts of organophosphoric acid; And
A cleaning composition for a flat panel display comprising water:
&Lt; Formula 1 >

(2)

In Chemical Formula 1 and Chemical Formula 2,
R ₁ is a C ₁ -C ₃ straight or branched hydroxyalkyl group, a C ₁ -C ₃ straight or branched thiolalkyl group, or a thiol group;
R ₂ and R ₃ are each independently hydrogen, C ₁ to C ₄ alkyl group, C ₁ to C ₄ hydroxyalkyl group, C ₆ to C ₁₀ aryl group, C ₂ to C ₄ alkoxy substituted C ₁ ~ C ₄ alkyl group, an alkoxy alkane olgi containing alkoxy of C ₂ ~ C _4;
At this time, R ₁ and R ₂ may be bonded to each other to form a ring having 5 and 6 atoms, provided that R ₃ is not a C ₁ to C ₄ hydroxyalkyl group;
n is an integer of 1 to 4,
R ₄ and R ₅ are each independently a C ₁ ~ C ₁₀ alkyl group, C ₂ ~ C ₁₀ alkenyl group, C ₁ ~ C ₁₀ hydroxyalkyl group, a carboxyl group, a substituted or unsubstituted C ₁ ~ C ₁₀ ring to the hydroxyl group of the C ₁ -C ₁₀ alkyl, phenyl or benzyl group substituted with an alkoxy group. The method according to claim 1,
With respect to the total weight of the composition,
0.01 to 5% by weight of an alkoxyalkanolamine compound represented by Formula 1;
0.01 to 10% by weight of a hydroxylamine compound represented by Formula 2;
0.01 to 10% by weight of the water-soluble organic solvent;
0.001 to 5% by weight of the organophosphoric acid or the salt of organophosphoric acid; And
The cleaning composition for a flat panel display comprising the remaining amount of water. The method according to claim 1,
The alkoxyalkanolamine compound represented by Chemical Formula 1 and the hydroxylamine compound represented by Chemical Formula 2 may be included in a weight ratio of 1: 2 to 1:10. The method according to claim 1,
Compound represented by Formula 1 is amino ethoxy ethanol, amino propoxy ethanol, amino butoxy ethanol, dimethyl amino ethoxy thiol, diethyl amino ethoxy thiol, dipropyl amino ethoxy thiol, dibutyl amino ethoxy thiol, Dibutylaminoethoxyethanol dimethylaminoethoxyethanol, diethylaminoethoxyethanol, dipropylaminoethoxyethanol, dibutylaminoethoxyethanol, N- (methoxymethyl) morpholine, N- (ethoxymethyl) Morpholine, N- (methoxyethanol) morpholine, N- (ethoxyethanol) morpholine and N- (butoxyethanol) morpholine Detergent composition for the device. The method according to claim 1,
The compound represented by the formula (2) is one or two or more selected from the group consisting of dimethyl hydroxyl amine, diethyl hydroxyl amine, dibutyl hydroxyl amine, and methyl phenyl hydroxyl amine for Detergent composition. The method according to claim 1,
The water-soluble organic solvent is ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoisopropyl Ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monoisopropyl ether, triethylene glycol monobutyl ether, polyethylene glycol monomethyl ether, polyethylene glycol monobutyl ether, Propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, N-methyl pyrrolidone (NMP), N-ethyl pyrrolidone, 1,3-dimethyl- 2- already Dazolidinone, 1,3-dipropyl-2-imidazolidinone, γ-butyrolactone, dimethyl sulfoxide (DMSO), sulfolane, triethyl phosphate, tributyl phosphate, dimethyl carbonate, ethylene carbonato, Formamide, N-methylformamide, N, N-dimethylformamide, acetamide, N-methylacetamide, N, N-dimethylacetamide, N- (2-hydroxyethyl) acetamide, 3-methoxy 1 or 2 selected from the group consisting of -N, N-dimethylpropionamide, 3- (2-ethylhexyloxy) -N, N-dimethylpropionamide and 3-butoxy-N, N-dimethylpropionamide The cleaning composition for flat panel display devices characterized by the above-mentioned. The method according to claim 1,
The organophosphoric acid may be methyldiphosphonic acid, aminotri (methylenephosphonic acid), ethylidenediphosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, 1-hydroxypropylidene-1,1- Diphosphonic acid, 1-hydroxybutylidene-1,1-diphosphonic acid, ethylaminobis (methylenephosphonic acid), 1,2-propylenediaminetetra (methylenephosphonic acid), dodecylaminobis (methylenephosphonic acid ), Nitrotris (methylenephosphonic acid), ethylenediaminebis (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), hexenediaminetetra (methylenephosphonic acid), diethylenetriaminepenta (methylenephosphonic acid) and cyclohexane The cleaning composition for a flat panel display device characterized by the 1 type (s) or 2 or more types chosen from the group which consists of diamine tetra (methylene phosphonic acid). The method according to claim 1,
The salt of the organic phosphoric acid is one or two or more cleaning composition for a flat panel display, characterized in that the potassium salt of organic phosphoric acid or the sodium salt of organic phosphoric acid. A flat panel display comprising a cleaning composition for a flat panel display according to claim 1.

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