KR20070067772A - Method for fabricating pdp filter and pdp filter fabricated by the same - Google Patents

Abstract

A method for fabricating a PDP(Plasma Display Panel) filter and a PDP filter fabricated by the same are provided to enhance electromagnetic wave shielding efficiency, visible ray transmittance, and process efficiency. A method for fabricating a PDP filter includes a process for forming a laminated structure with high refractive transparent layers(120,140) and metallic layers(130,150), and a process for forming an electromagnetic wave shielding layer by performing a thermal process for the laminated structure. The thermal process is performed at the temperature of 200 to 400 degrees centigrade. The thermal process is performed under vacuum, oxygen, or nitrogen atmosphere.

Description

Method for fabricating PDP filter and PDP filter manufactured by the same

1 is a cross-sectional view of a PDP filter according to an embodiment of the present invention.

2 is a cross-sectional view of the electromagnetic shielding layer included in an embodiment of the present invention.

3 is a cross-sectional view of a PDP filter according to another embodiment of the present invention.

4 and 5 are cross-sectional views of another PDP filter according to another embodiment of the present invention.

6 and 7 are cross-sectional views of the intermediate structure during the manufacturing process of the PDP filter according to an embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

110: support 120, 140: high refractive transparent thin film

130, 150 metal thin film 170: protective film

180: electromagnetic shielding filter 210: filter base

The present invention relates to a method for manufacturing a filter for a display device and a filter for a display device manufactured thereby, and more particularly, to a method for producing a PDP filter and a PDP filter produced thereby.

In today's high information age, photoelectronics-related components and devices are remarkably advanced and popularized. Among them, display apparatuses for displaying images are widely used for television apparatuses, monitor apparatuses of personal computers, and the like, and thinning is progressing at the same time as these displays are enlarged.

Compared to the Cathode-Ray Tube (CRT) device that represents the conventional display device, the Plasma Display Panel (PDP) device can satisfy both the size and the thickness of the display device. have.

However, due to its driving characteristics, the PDP device has a high emission amount of electromagnetic waves and near infrared rays, high surface reflection of the phosphor, and color purity does not reach the cathode ray tube due to the orange light emitted from the enclosed gas, helium (He) or xenon (Xe). .

Therefore, it is required to prevent the emission of electromagnetic waves and near infrared rays emitted from the PDP apparatus below a predetermined value. To this end, in order to shield electromagnetic waves and near infrared rays, while reducing reflected light and improving color purity, a PDP filter having a function such as electromagnetic shielding, near infrared shielding, light surface reflection prevention and / or color purity improvement is employed.

In relation to the electromagnetic shielding function of the PDP filter, the PDP filter may include an electromagnetic shielding layer in the form of a conductive mesh or a conductive multilayer thin film.

The electromagnetic shielding layer in the form of a conductive multilayer thin film has a structure in which a transparent thin film having a high refractive index and a metal thin film are alternately stacked. In the case of the electromagnetic shielding layer in the form of the conductive multilayer thin film, as the number of metal thin films is laminated, the electromagnetic wave shielding ability is excellent, while the transmittance of visible light is significantly reduced. In addition, as the number of metal thin films is laminated, the process cost increases and the process time becomes long, thereby decreasing process efficiency. Therefore, there is a demand for development of a method for producing a PDP filter having excellent electromagnetic wave shielding ability and light transmittance and excellent process efficiency.

The technical problem to be achieved by the present invention is to provide a method for manufacturing a PDP filter having excellent electromagnetic shielding efficiency and visible light transmittance as well as good process efficiency.

Another object of the present invention is to provide a PDP filter manufactured by the PDP manufacturing method.

Technical problems to be achieved by the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.

According to an aspect of the present invention, there is provided a method of manufacturing a PDP filter according to an embodiment of the present invention, which provides a laminate obtained by repeatedly n-folding a high refractive transparent thin film and a metal thin film, and heat treating the laminate to form an electromagnetic shielding layer. Forming.

PDP filter according to an embodiment of the present invention for solving the above other technical problem is a high refractive transparent thin film, a metal thin film is stacked n times repeated, the metal constituting the metal thin film is diffused to the high refractive transparent thin film side An electromagnetic wave shielding layer containing a laminated body is included.

Advantages and features of the present invention and methods for achieving them will be apparent with reference to the embodiments described below in detail with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the present embodiments are intended to complete the disclosure of the present invention, and the general knowledge in the art to which the present invention pertains. It is provided to fully convey the scope of the invention to those skilled in the art, and the present invention is defined only by the scope of the claims. Like reference numerals refer to like elements throughout.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. In this specification, the singular also includes the plural unless specifically stated otherwise in the phrase. Also referred to herein as "above", "top", "top" or "bottom", "bottom" of a layer or film includes intervening another layer or film.

In addition, unless there is another definition for the terminology used herein, all terms (including technical and scientific terms) used herein have a meaning that can be commonly understood by those skilled in the art. Could be used. In addition, the terms defined in the commonly used dictionaries are not ideally or excessively interpreted unless they are specifically defined clearly.

Hereinafter, a PDP filter according to an embodiment of the present invention will be described with reference to FIG. 1. 1 is a cross-sectional view of a PDP filter according to an embodiment of the present invention.

As shown in FIG. 1, a PDP filter according to an embodiment of the present invention includes a filter base 210 and an electromagnetic shielding layer 180.

First, the electromagnetic shielding layer will be described in detail with reference to FIG. 2. 2 is a cross-sectional view of the electromagnetic shielding layer included in an embodiment of the present invention.

As shown in FIG. 2, the electromagnetic shielding layer 180 includes a support 110, a laminate 160 having electromagnetic shielding ability, and a protective film 170.

The support 110 is a transparent substrate for supporting the laminate 160 having electromagnetic shielding ability, and may be omitted when the laminate 160 is directly formed on the filter base 210 according to the specification of the PDP filter. . The support 110 may be formed of, for example, an inorganic compound molding such as glass or quartz and a transparent organic polymer molding. The polymer molding may be transparent in the visible region, and examples thereof include polyethylene terephthalate (PET), polyethersulfone, polystyrene, polyethylene naphthalate, polycarbonate, polypropylene, polyimide, triacetyl cellulose, and the like. It is not limited. In addition, the transparent polymer molding may be plate or film.

The stack 160 having electromagnetic shielding capability is positioned on the support 110, and the stack 160 has a structure in which the high refractive transparent thin films 120 and 140 and the metal thin films 130 and 150 are alternately stacked. Have

The high refractive transparent thin films 120 and 140 transmit visible light, and are particularly limited as long as they have an effect of preventing light reflection in the visible light region of the metal thin films 130 and 150 by the difference in refractive index between the metal thin films 130 and 150. For example, a material having a high refractive index of 1.6 or more, preferably 1.7 or more, for visible light may be used for the high refractive transparent thin films 120 and 140. In addition, in addition to transparency and refractive index characteristics, the high refractive index thin films 120 and 140 may be formed of a material having a high deposition rate and good adhesion to the metal thin films 130 and 150.

The high refractive index thin films 120 and 140 may be, for example, Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), or Al doped Zinc Oxide), Al ₂ O ₃ , CeO _{2 It} may be made of a single film or a multilayer film containing at least one selected from SiO ₂ . The high refractive transparent thin films 120 and 140 may include a single film or multiple films having the same configuration, and as shown in FIG. 2, the high refractive transparent thin films 120 and 140 may include a single film or multiple films having different configurations. You may. For example, the high refractive transparent thin film 120 may be a multilayer film 121 and 122 each composed of Nb ₂ O ₅ / AZO, and the high refractive transparent thin film 140 may each include AZO / Nb ₂ O ₅ / AZO. It may be a multilayer film 141, 142, 143 composed of a configuration. The thickness of the high refractive transparent thin film (120, 140) is optically designed from the optical properties of the support 110, the thickness and optical properties of the metal thin film (130, 150) and the refractive index of the high refractive transparent thin film (120, 140) or the like Obtained experimentally. For example, it may be 5 µm or more and 200 µm or less, and may be 10 µm or more and 100 µm or less.

The metal thin films 130 and 150 are positioned on the high refractive index transparent films 120 and 140, respectively. The metal thin films 130 and 150 may be formed by, for example, diffusion layers 132 and 133 formed by diffusing metal layers 131 and 151 made of silver or an alloy containing silver and metals constituting the metal layers 131 and 151 into adjacent thin films. 152, 153).

Silver constituting the metal layers 131 and 151 is excellent in electrical conductivity, infrared reflectivity and visible light transmission. However, since silver lacks chemical and physical stability and degrades due to pollutants, water vapor, heat, light, and the like in the environment, silver contains at least one metal that is stable to the environment such as gold, platinum, palladium, copper, indium, tin, and the like. One alloy can be used for the metal layers 131, 151. The content of silver in the alloy containing silver is not particularly limited, but it is preferably not significantly different from the electrical conductivity and optical properties of the metal thin films 130 and 150 containing silver, for example, 50% by weight or more and less than 100% by weight. It may be contained to an extent. Detailed descriptions of the diffusion layers 132, 133, 151, and 153 will be described later in the manufacturing method of the PDP filter.

The number of laminations of the high refractive transparent thin films 120 and 140 and the metal thin films 130 and 150 in the laminate 160 as described above is not particularly limited as long as the electromagnetic wave shielding ability and the light transmittance are satisfied. For example, it may be 1 to 5 times. For example, considering the electromagnetic wave shielding ability, the light transmittance, and the process efficiency, the number of laminations of the high refractive transparent thin films 120 and 140 and the metal thin films 130 and 150 in the laminate 160 may be twice. .

A protective film 170 is positioned on the laminate 160 to supplement scratch resistance and environmental resistance of the laminate 160. The protective film 170 is not particularly limited as long as it has a function of transmitting visible light and protecting the laminate 160. The protective film 170 includes, for example, at least one selected from Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, AZO, Al ₂ O ₃ , CeO _2, and SiO ₂ . It may consist of a single film or a multilayer film. For example, the passivation layer 170 may be the multilayer layers 171 and 172 formed of AZO / Nb ₂ O ₅ . The thickness of the protective film 170 is not particularly limited, and may be optically designed from the optical properties of the support 110, the thickness and optical properties of the metal thin films 130 and 150, and the refractive indices of the high refractive transparent thin films 120 and 140. Or obtained experimentally. For example, it may be 5 µm or more and 200 µm or less, and 10 µm or more and 100 µm or less.

Referring back to FIG. 1, the electromagnetic shielding layer 180 as described above is positioned on the filter base 210. For example, the filter base 210 may be formed of only an insulating transparent substrate, or may further include, for example, an anti-reflection layer 212 on the transparent substrate 211 as illustrated in FIG. 1.

The transparent substrate 211 may be formed of, for example, an inorganic compound molding such as glass or quartz and a transparent organic polymer molding. The polymer molding may be transparent in the visible region, and examples thereof include polyethylene terephthalate (PET), polyethersulfone, polystyrene, polyethylene naphthalate, polycarbonate, polypropylene, polyimide, triacetyl cellulose, and the like. It is not limited. In addition, the transparent polymeric molding may be plate or film.

The anti-reflection layer 212 is intended to improve the visibility of the PDP device by reducing reflection of external ambient light. The anti-reflection layer 212 may be formed on either side of the both sides of the transparent substrate 211, for example, formed on the transparent substrate 211 on the side that becomes the viewer side when the PDP filter is mounted to the PDP apparatus. It is more efficient with respect to visibility.

Also, although not shown, the amount of red (R), green (G), and blue (B) of visible light emitted from the panel assembly of the PDP device and the near infrared shielding layer absorbing near infrared rays generated from the panel assembly of the PDP device are reduced. It may further include a color correction layer for changing or correcting the color balance by adjusting or adjusting. The transparent substrate 251, the anti-reflection layer 212, the near-infrared shielding layer, or the color correction layer constituting the filter base 210 may be stacked in any order. In addition, the filter base 250 may include all of the functions described above in one layer, in addition to the separate layers having the respective functions.

Subsequently, a PDP filter according to another embodiment of the present invention will be described with reference to FIG. 3. 3 is a cross-sectional view of a PDP filter according to another embodiment of the present invention.

The PDP filter according to another embodiment of the present invention includes the same electromagnetic wave shielding layer 180 as the PDP filter according to the embodiment of the present invention and an anti-Newton ring layer 213 positioned on the transparent substrate 211 on the viewer's side. Filter base 210 '. The anti-Newton ring layer 213 may prevent a Newton's ring phenomenon that occurs when the separation distance between the PDP filter and the front substrate of the panel assembly coupled thereto is uneven.

Subsequently, a PDP filter according to another embodiment of the present invention will be described with reference to FIG. 4 is a cross-sectional view of another PDP filter according to another embodiment of the present invention.

The PDP filter according to another embodiment of the present invention includes the same electromagnetic wave shielding layer 180 as the PDP filter according to the embodiment of the present invention, and an anti-reflection layer 212 positioned on the transparent substrate 211 on the viewer's side. The anti-Newton ring layer 220 is disposed on the filter base 210 and the electromagnetic shielding layer 180 located opposite to the viewer side.

Subsequently, a PDP filter according to another embodiment of the present invention will be described with reference to FIG. 5 is a cross-sectional view of a PDP filter according to another embodiment of the present invention.

The PDP filter according to another embodiment of the present invention includes the same electromagnetic shielding layer 180 as the PDP filter according to an embodiment of the present invention, and the antiglare layer 214 positioned on the transparent substrate 211 on the viewer side. And a filter base 210 ″. The anti-glare layer 214 may prevent a glare of a viewer due to reflection of external ambient light.

Hereinafter, a method of manufacturing a PDP filter according to an embodiment of the present invention will be described with reference to FIGS. 1 to 7. 6 and 7 are cross-sectional views of the intermediate structure during the manufacturing process of the PDP filter according to an embodiment of the present invention.

As illustrated in FIG. 6, a laminate 160 and a protective film 170 are formed on the support 110.

In order to form the laminate 160 on the support 110, first, a high refractive transparent thin film 120 is formed. The high refractive transparent thin film 120 may include at least one selected from, for example, Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, AZO, Al ₂ O ₃ , CeO _2, and SiO ₂ . It may be formed of a single film or a multilayer film containing. As a method of forming the high refractive transparent thin film 120, for example, a method formed by a direct current sputtering method, a reactive sputtering method, an ion plating method, or a chemical vapor deposition (CVD) method can be used. Among them, a direct current sputtering method capable of performing uniform formation at a high speed in a large area is preferable.

For example, when the high refractive transparent thin film 120 is formed of multilayer films 121 and 122 composed of Nb ₂ O ₅ / AZO, the Nb ₂ O ₅ layer 121 may form a niobium oxide target having excellent electrical conductivity. Can be formed by a direct current sputtering method. The niobium oxide target is a target made to have an electrical conductivity enough to be used for direct current sputtering by depleting oxygen or adding other materials to the stoichiometric composition of niobium oxide. When using a niobium oxide target, it is preferable to use an inert gas containing 0.1 to 10% by volume of an oxidizing gas as the sputtering gas. Use of an inert gas containing an oxidizing gas at a concentration within this range as the sputtering gas is effective for producing the laminate 160 having high electrical conductivity. In particular, it is preferable to use an inert gas containing 0.1 to 5% by volume of oxidizing gas. As the oxidizing gas, oxygen gas may generally be used, and nitrogen monoxide, nitrogen dioxide, carbon monoxide, carbon dioxide or ozone may be used.

The AZO layer 122 is formed by a sputtering method by supplying only an inert gas without supplying an oxidizing gas using a target in which a small amount of aluminum (Al) is mixed in zinc oxide (ZnO). In the case of AZO, even if the oxidizing gas is not supplied, transparency is not lowered, and thus, supply of an oxidizing gas such as O ₂ is unnecessary.

Next, the metal thin film 130 ′ is formed on the high refractive transparent thin film 120.

The metal thin film 130 ′ may be formed of silver or an alloy component containing silver, and the method of forming the metal thin film 130 ′ may be performed by, for example, a sputtering method, a chemical vapor deposition method, or the like. In order to form a layer having a fast film forming speed and uniform characteristics in a large area, the metal thin film 130 ′ may be formed by a direct current sputtering method.

Subsequently, the high refractive transparent thin film 140 is formed on the metal thin film 130 ′.

The high refractive transparent thin film 140 may include at least one selected from, for example, Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, AZO, Al ₂ O ₃ , CeO _2, and SiO ₂ . It may be formed of a single film or a multi-layer film, including, for example, by a direct current sputtering method, a reactive sputtering method, an ion plating method, a chemical vapor deposition method. Among them, a direct current sputtering method capable of performing uniform formation at a high speed in a large area is preferable.

For example, when the high refractive transparent thin film 140 is to be formed of the multilayer films 141, 142, and 143 composed of AZO / Nb ₂ O ₅ / AZO, the AZO layer 141 may be formed on zinc oxide (ZnO) as described above. Using a target in which a small amount of aluminum (Al) is mixed, it is formed by a sputtering method by only supplying an inert gas without supplying an oxidizing gas. Since the supply of the oxidizing gas such as O ₂ is unnecessary in forming the AZO layer 141, the oxidation of the metal thin film 130 ′ disposed under the AZO layer 141 does not occur, so that electricity of the metal thin film 130 ′ is not generated. There is no problem of dissipation of conductivity. The remaining Nb ₂ O ₅ and AZO may be formed by the same direct current sputtering method as described above.

Subsequently, the metal thin film 150 ′ is formed on the high refractive index transparent thin film 140.

The metal thin film 150 ′ may be formed of silver or an alloy component containing silver, and the method of forming the metal thin film 150 ′ may be performed by, for example, a sputtering method, a chemical vapor deposition method, or the like. In order to form a layer having a fast film forming speed and uniform characteristics in a large area, the metal thin film 150 ′ may be formed by a direct current sputtering method.

Next, a passivation layer 170 is formed on the metal thin film 150 ′.

The protective film 170 includes, for example, at least one selected from Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, AZO, Al ₂ O ₃ , CeO _2, and SiO ₂ . It may be formed as a single film or a multilayer film. The protective film 170 may be formed by, for example, a method formed by a direct current sputtering method, a reactive sputtering method, an ion plating method, or a chemical vapor deposition method. Among them, a direct current sputtering method capable of performing uniform formation at a high speed in a large area is preferable.

For example, when the protective film 170 is to be formed of the multilayer films 171 and 172 formed of AZO / Nb ₂ O ₅ , the AZO layer 171 may be formed of aluminum (Al) on zinc oxide (ZnO) as described above. This small amount of mixed target is used to form the sputtering method only by supplying an inert gas without supplying an oxidizing gas. Since the supply of an oxidizing gas such as O ₂ is unnecessary in forming the AZO layer 171, the oxidation of the metal thin film 150 ′ positioned under the AZO layer 171 does not occur, thereby providing electricity to the metal thin film 150 ′. There is no problem of dissipation of conductivity. The remaining Nb ₂ O ₅ may be formed by the same direct current sputtering method as described above.

Subsequently, as shown in FIG. 7, the structure composed of the support 110, the laminate 160, and the protective film 170 is heat-treated. The structure as described above may be placed in a vacuum chamber and heat treated at a temperature of about 200 to 400 ° C. When the heat treatment is performed in the temperature range as described above, the agglomeration of the metal contained in the metal thin films 130 ′ and 150 ′ in the laminate 160 does not occur and the crystal state is improved. At this time, the atmosphere in the chamber may be a vacuum, oxygen or nitrogen atmosphere, the heat treatment time may be about 15 minutes to about 75 minutes. By performing heat treatment with the atmosphere and time in the chamber as described above, the crystal state of the metal contained in the metal thin films 130 ′ and 150 ′ can be improved.

By the heat treatment, the metal contained in the metal thin films 130 ′ and 150 ′ of the laminate 160 is transferred to the high refractive transparent thin film layers 120 and 140 or the protective film 170 side, for example, the high refractive transparent thin film layers 120 and 140. Diffuses to the AZO layer 122, 141 side or the AZO layer 171 side of the protective film 170, thereby forming the diffusion layer (132, 133, 152, 153), as shown in FIG. Layer 180 is complete.

The diffusion layers 132, 133, 152 and 153 formed at the interface between the metal thin films 130 and 150 and the high refractive transparent thin films 120 and 140 not only lower the sheet resistance at the interface but also the film adhesion at the interface. The better the contact resistance is. As a result, an electromagnetic wave shielding layer 180 having excellent electromagnetic shielding ability can be formed by performing heat treatment on a structure composed of the support 110, the laminate 160, and the protective film 170 to lower the sheet resistance and the contact resistance than before the heat treatment.

Subsequently, the electromagnetic shielding layer 180 is attached to the filter base 210. In this case, the filter base 210 may include a transparent substrate 211 and an anti-reflection layer 212 as shown in FIGS. 1 and 4, and the filter base 210 ′ is transparent as shown in FIG. 3. The substrate 211 and the anti-Newton layer 213 may be included, and the filter base 210 ″ may include the transparent substrate 211 and the antiglare layer 214 as shown in FIG. 5. 4, for example, an anti-Newton layer 220 may be further formed on the electromagnetic shielding layer 180.

As described above, the PDP filter manufactured by the method according to an embodiment of the present invention may be heat-treated even if the metal thin films 120 and 150 included in the electromagnetic shielding layer 180 are stacked twice. Since the electromagnetic wave shielding ability can be improved by this, the PDP filter which can satisfy | fill all the requirements of the outstanding light transmittance, process efficiency, and an electromagnetic wave shielding capability can be provided.

Hereinafter, the present invention will be described in more detail with reference to experimental and comparative examples. However, the following experimental examples are for illustrating the present invention, it should be understood that the present invention is not limited by the following experimental examples.

Experimental Example  One

A first high refractive transparent thin film composed of Nb ₂ O ₅ / AZO, a first silver thin film, a second high refractive transparent thin film composed of AZO / Nb ₂ O ₅ / AZO, and a second silver thin film on one surface of the transparent glass support by a direct current sputtering method. , AZO / Nb ₂ O _{5 A} protective layer composed of in order. In this case, the thicknesses of the Nb ₂ O ₅ / AZO of the first high refractive transparent thin film are about 28 nm and about 5 nm, respectively, and the thickness of the first silver thin film is about 11 nm and the AZO / Nb ₂ O of the second high refractive transparent thin film. The thicknesses of ₅ / AZO are about 7 nm, 56 nm and 5 nm, respectively, and the thickness of the second silver thin film is about 11 nm, and the thicknesses of the AZO / Nb ₂ O ₅ of the protective layer are about 5 nm and 28 nm, respectively. . After placing the structure as described above in a vacuum chamber, a nitrogen gas flow rate of 50 sccm and a temperature of about 350 ℃ heat treatment for about 20 minutes to complete the electromagnetic shielding layer.

The sheet resistance before heat treatment and the sheet resistance after heat treatment of the electromagnetic shielding layer were measured using a non-contact four point probe, and the results are shown in Table 1 below.

Experimental Example  2

The electromagnetic shielding layer was completed in the same manner as in Experiment 1 except that the heat treatment was performed for about 10 minutes. The sheet resistance values before and after the heat treatment of the electromagnetic shielding layer are shown in Table 1 below.

Experimental Example  3

An electromagnetic wave shielding layer was completed in the same manner as in Experiment 1 except that the heat treatment was performed for about 30 minutes. The sheet resistance values before and after the heat treatment of the electromagnetic shielding layer are shown in Table 1 below.

Experimental Example  4

An electromagnetic wave shielding layer was completed in the same manner as in Experiment 1 except that the heat treatment was performed at a temperature of about 400 ° C. for about 10 minutes. The sheet resistance values before and after the heat treatment of the electromagnetic shielding layer are shown in Table 1 below.

Table 1

As shown in Table 1, the electromagnetic wave shielding layer of each test example was subjected to a heat treatment, thereby lowering the sheet resistance. From this result, it can be seen that the electromagnetic shielding ability of the electromagnetic shielding layer is improved through the heat treatment.

Experimental Example  5

The electromagnetic shielding layer was completed in the same manner as in Experiment 1 except that the heat treatment was performed for about 60 minutes. The average light transmittance of the electromagnetic shielding layer and the light transmittance in the near infrared region (850 nm and 950 nm) were measured using a Lambda 900 manufactured by Perking Elmer, and the color coordinates were measured by a spectrophotometer. Measured using and the results are shown in Table 2 below.

Experimental Example  6

The electromagnetic shielding layer was completed in the same manner as in Experiment 1 except that the heat treatment was performed in a vacuum atmosphere. The average transmittance of the electromagnetic shielding layer and the light transmittance and color coordinate values in the near infrared region are shown in Table 2 below.

Experimental Example  7

On one surface of the transparent glass supporter, a high refractive transparent thin film composed of Nb ₂ O ₅ / AZO, a silver thin film, and a protective layer composed of AZO / Nb ₂ O ₅ are sequentially laminated by a direct current sputtering method. In this case, the thicknesses of the Nb ₂ O ₅ / AZO of the high refractive transparent thin film are about 28 nm and about 5 nm, respectively, and the thickness of the silver thin film is about 11 nm, and the thickness of the AZO / Nb ₂ O ₅ of the protective layer is about 5, respectively. Nm and 28 nm. After placing the structure as described above in a vacuum chamber, a nitrogen gas flow rate of 50 sccm and a temperature of about 300 ℃ heat treatment for about 60 minutes to complete the electromagnetic shielding layer. The light transmittance in the near infrared region of the electromagnetic shielding layer is shown in Table 2 below.

Experimental Example  8

The electromagnetic shielding layer was completed in the same manner as in Experiment 7 except that the heat treatment was performed for about 75 minutes. The light transmittance in the near infrared region of the electromagnetic shielding layer is shown in Table 2 below.

Comparative example  One

A first high refractive transparent thin film composed of Nb ₂ O ₅ / AZO by a direct current sputtering method on one surface of the transparent support, a first silver thin film, a second high refractive transparent thin film composed of AZO / Nb ₂ O ₅ / AZO, a second silver thin film, A protective layer composed of AZO / Nb ₂ O ₅ is laminated in order to complete the electromagnetic shielding layer. In this case, the thicknesses of the Nb ₂ O ₅ / AZO of the first high refractive transparent thin film are about 28 nm and about 5 nm, respectively, and the thickness of the first silver thin film is about 11 nm and the AZO / Nb ₂ O of the second high refractive transparent thin film. The thicknesses of ₅ / AZO are about 7 nm, 56 nm and 5 nm, respectively, and the thickness of the second silver thin film is about 11 nm, and the thicknesses of the AZO / Nb ₂ O ₅ of the protective layer are about 5 nm and 28 nm, respectively. . The average transmittance of the electromagnetic shielding layer and the light transmittance and color coordinate values in the near infrared region are shown in Table 2 below.

Comparative example  2

On one surface of the transparent glass supporter, a high refractive transparent thin film composed of Nb ₂ O ₅ / AZO, a silver thin film, and a protective layer composed of AZO / Nb ₂ O ₅ are sequentially laminated by a direct current sputtering method to complete the electromagnetic shielding layer. In this case, the thicknesses of the Nb ₂ O ₅ / AZO of the high refractive transparent thin film are about 28 nm and about 5 nm, respectively, and the thickness of the silver thin film is about 11 nm, and the thickness of the AZO / Nb ₂ O ₅ of the protective layer is about 5, respectively. Nm and 28 nm. The light transmittance in the near infrared region of the electromagnetic shielding layer is shown in Table 2 below.

TABLE 2

As shown in Table 2, looking at the average light transmittance of the electromagnetic shielding layer of Experimental Example 5 and Experimental Example 6 and Comparative Example 1 in which the metal thin film is laminated twice, it can be seen that similar values are shown. In addition, looking at the light transmittance in the near infrared region, it can be seen that the electromagnetic shielding layer of Experimental Example 5 and Experimental Example 6, in which the metal thin films were stacked twice, was significantly lower than that of Comparative Example 1, and the metal thin film was once It can be seen that the stacked electromagnetic shielding layers of Experimental Example 7 and Experimental Example 8 are considerably lower than those of Comparative Example 2. That is, it can be seen that the near-infrared shielding ability in the electromagnetic shielding layer of Experimental Example 5 to Experimental Example 8 is improved by the heat treatment. In addition, looking at the color coordinates X and Y, it can be seen that the electromagnetic shielding layer of Experimental Example 5 and Experimental Example 6 and Comparative Example 1 shows similar values. From these results, it can be seen that the electromagnetic shielding layers of Experimental Example 5 and Experimental Example 6, while the near-infrared shielding ability is improved through heat treatment, the average light transmittance and color coordinate characteristics do not change significantly.

Experimental Example  9

A first high refractive transparent thin film composed of Nb ₂ O ₅ / AZO by a direct current sputtering method on one surface of the transparent support, a first silver thin film, a second high refractive transparent thin film composed of AZO / Nb ₂ O ₅ / AZO, a second silver thin film, The protective layer consisting of AZO / Nb ₂ O ₅ is laminated in order. In this case, the thicknesses of the Nb ₂ O ₅ / AZO of the first high refractive transparent thin film are about 28 nm and about 5 nm, respectively, and the thickness of the first silver thin film is about 11 nm and the AZO / Nb ₂ O of the second high refractive transparent thin film. The thicknesses of ₅ / AZO are about 7 nm, 56 nm and 5 nm, respectively, and the thickness of the second silver thin film is about 11 nm, and the thicknesses of the AZO / Nb ₂ O ₅ of the protective layer are about 5 nm and 28 nm, respectively. . After placing the structure as described above in a vacuum chamber, a nitrogen gas flow rate of 50 sccm and a temperature of about 350 ℃ heat treatment for about 20 minutes to complete the electromagnetic shielding layer.

The electromagnetic wave shielding layer as described above is placed in a moisture resistant chamber at a temperature of about 60 ° C. and a humidity of about 90% for about 500 hours to perform reliability verification. The results are shown in Table 3 below.

TABLE 3

As shown in Table 3, it can be seen that the electromagnetic shielding layer of Experimental Example 9 including the heat treatment process has no problem in reliability from the reliability verification result.

Although embodiments of the present invention have been described above with reference to the accompanying drawings, those skilled in the art to which the present invention pertains may implement the present invention in other specific forms without changing the technical spirit or essential features thereof. I can understand that. Therefore, it should be understood that the embodiments described above are exemplary in all respects and not restrictive.

As described above, the PDP filter manufacturing method according to the present invention may provide a PDP filter having excellent process efficiency as well as excellent electromagnetic shielding efficiency and visible light transmittance through a heat treatment process.

Claims (18)

A method of manufacturing a PDP filter comprising providing a laminate obtained by repeatedly laminating a high refractive transparent thin film and a metal thin film n times, and heat treating the laminate to form an electromagnetic shielding layer. The method of claim 1, The heat treatment is a method of manufacturing a PDP filter is carried out at a temperature of 200 to 400 ℃. The method of claim 2, The heat treatment is a method of manufacturing a PDP filter is carried out in a vacuum, oxygen or nitrogen atmosphere. The method of claim 1, The high refractive transparent thin film is a single film including at least one selected from Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, AZO, Al ₂ O ₃ , CeO ₂ and SiO ₂ The manufacturing method of the PDP filter which consists of a multilayer film. The method of claim 1, The high refractive index transparent thin film is a method for producing a PDP filter consisting of a multilayer film containing Nb ₂ O ₅ / AZO or AZO / Nb ₂ O ₅ / AZO. The method of claim 1, And a protective film is further formed on the laminate before the heat treatment of the laminate. The method of claim 6, The protective film is composed of a single layer or multiple layers including at least one selected from Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, Al ₂ O ₃ , CeO ₂ and SiO ₂ . Method for producing a PDP filter. The method of claim 6, The protective film is a method of manufacturing a PDP filter consisting of a multilayer film containing AZO / Nb ₂ O ₅ . The method of claim 1, The metal thin film is a method of producing a PDP filter containing silver or an alloy containing silver. The method of claim 1, N is a method of manufacturing a PDP filter having a value of 2 or less. A PDP filter comprising an electromagnetic shielding layer comprising a laminate in which a high refractive transparent thin film and a metal thin film are repeatedly stacked n times, and the metal constituting the metal thin film is diffused toward the high refractive transparent thin film. The method of claim 11, The high refractive transparent thin film is formed of a single layer or a multilayer including at least one selected from Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, Al ₂ O ₃ , CeO ₂ and SiO ₂ PDP Filter. The method of claim 11, The high refractive transparent thin film is a PDP filter consisting of a multilayer film containing Nb ₂ O ₅ / AZO or AZO / Nb ₂ O ₅ / AZO. The method of claim 11, A PDP filter further comprising a protective film on the laminate, wherein metal constituting the metal thin film is diffused to the protective film side. The method of claim 14, The protective film is a PDP composed of a single film or a multilayer film including at least one selected from Nb ₂ O ₅ , TiO ₂ , ZnO, SnO ₂ , SiN ₄ , ZrO ₂ , ITO, IZO, Al ₂ O ₃ , CeO _2, and SiO ₂ . filter. The method of claim 14, The protective film is a PDP filter consisting of a multilayer film containing AZO / Nb ₂ O ₅ . The method of claim 11, And the metal thin film comprises silver or an alloy containing silver. The method of claim 12, N is a PDP filter having a value of 2 or less.

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