KR101086484B1 - Liquid Crystal Display Panel and Method of Fabricating the same - Google Patents

Abstract

The present invention relates to a liquid crystal display panel and a method of manufacturing the same, comprising: a black matrix formed on a substrate to partition a cell region; A color filter formed in the cell region partitioned by the black matrix; An alignment layer formed on the color filter and including a negative photoresist; And a spacer formed on the alignment layer and including a positive photoresist.

Description

Liquid Crystal Display Panel and Method of Fabricating the same

1 is a cross-sectional view showing a conventional liquid crystal display panel.

2A through 2F are cross-sectional views illustrating a method of manufacturing an upper array substrate of a conventional liquid crystal display panel.

3 is a view showing a conventional alignment film production apparatus.

4 is a diagram illustrating a liquid crystal display panel according to an exemplary embodiment of the present invention.

5A through 5J are cross-sectional views illustrating a method of manufacturing an upper array substrate of a liquid crystal display panel.

         <Explanation of symbols for the main parts of the drawings>

2,102: upper substrate 4,104: black matrix

18,118: common electrode 32,132: lower substrate

6,106: color filter 7,107: planarization layer

13, 113: column spacer 108: upper alignment layer
170: negative photoresist 172: positive photoresist

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display panel, and more particularly, to a liquid crystal display panel and a method of manufacturing the same, which can simplify the process, save time, and improve production.

In general, a liquid crystal display (LCD) displays an image corresponding to a video signal on a liquid crystal display panel in which liquid crystal cells are arranged in a matrix form by adjusting light transmittance of liquid crystal cells according to a video signal. To this end, the liquid crystal display device includes a liquid crystal display panel in which liquid crystal cells are arranged in an active matrix form, and driving circuits for driving the liquid crystal display panel.

Such liquid crystal displays are roughly classified into twisted nematic (TN) mode and in plan switch (IPS) mode using a vertical electric field according to the electric field driving the liquid crystal.

The TN mode is a mode in which a liquid crystal is driven by a vertical electric field between a pixel electrode and a common electrode disposed to face the upper substrate. The TN mode has a large aperture ratio and a narrow viewing angle. The IPS mode is a mode in which a liquid crystal is driven by a horizontal electric field between a pixel electrode and a common electrode arranged side by side on a lower substrate, and has a large viewing angle, but a small aperture ratio.

1 is a cross-sectional view showing a liquid crystal display panel of a conventional IPS mode.

Referring to FIG. 1, the liquid crystal display panel of the IPS mode has a black matrix 4, a color filter 6, and a planarization sequentially formed on an upper substrate 2 having a transparent electrode layer 3 thereon to prevent static electricity and the like on the back side. An upper array substrate (or color filter array substrate) composed of a layer 7, a spacer 13, and an upper alignment layer 8, and a thin film transistor (hereinafter referred to as "TFT") formed on the lower substrate 32 in common. Liquid crystal (not shown) injected into the inner space between the lower array substrate (or thin film transistor array substrate) composed of the electrode 18, the pixel electrode 16 and the lower alignment layer 38, and the upper array substrate and the lower array substrate. ).

In the upper array substrate, the black matrix 4 is formed to overlap the TFT region of the lower substrate 2 with the gate line and data line regions (not shown) and partitions the cell region where the color filter 6 is to be formed. . The black matrix 4 prevents light leakage and absorbs external light to increase contrast. The color filter 6 is formed in the cell region separated by the black matrix 4. The color filter 6 is formed for each of R, G, and B to implement R, G, and B colors. The planarization layer 7 is formed to cover the color filter to planarize the upper substrate 2. The column spacer 13 maintains a cell gap between the upper substrate 2 and the lower substrate 32.

In the lower array substrate, the TFT overlaps the gate electrode 9 formed on the lower substrate 32 with the gate line (not shown), and the gate electrode 9 and the gate insulating film 44 interposed therebetween. The semiconductor layers 14 and 47 and the source / drain electrodes 40 and 42 formed together with the data lines (not shown) with the semiconductor layers 14 and 47 interposed therebetween. This TFT supplies a pixel signal from the data line to the pixel electrode 16 in response to a scan signal from the gate line. The pixel electrode 16 is a transparent conductive material having a high light transmittance and is in contact with the drain electrode 42 of the TFT with the protective film 50 therebetween. The common electrode 18 is formed in a stripe shape so as to alternate with the pixel electrode 16. The common electrode 18 supplies a common voltage which is a reference when driving the liquid crystal. The liquid crystal rotates with respect to the horizontal direction by the horizontal electric field between the common voltage and the pixel voltage supplied to the pixel electrode 16.

The upper and lower alignment layers 8 and 38 for liquid crystal alignment are formed by applying an alignment material such as polyimide and then performing a rubbing process.

Meanwhile, in the twisted nematic (TN) mode liquid crystal display panel, the common electrode 18 is formed on the color filter 6 of the upper array substrate, and the planarization layer 7 may be removed.

2A through 2F are cross-sectional views illustrating a method of manufacturing an upper array substrate of a conventional liquid crystal display panel. The upper array substrate illustrated in FIGS. 2A to 2F is one of a twisted nematic (TN) mode and an in plan switch (IPS) mode.

First, the transparent conductive layer 3 is formed on the back surface of the upper substrate 2 by a deposition method such as sputtering. Subsequently, after the opaque resin is applied to the entire surface of the upper substrate 2, the black matrix 4 is formed as shown in FIG. 2A by patterning the photolithography process and the etching process using the first mask. Here, chromium (Cr) or the like may be used as the black matrix 4 material.

After the red resin is deposited on the upper substrate 2 on which the black matrix 4 is formed, the red resin R is patterned by a photolithography process and an etching process using a second mask, as shown in FIG. 2B. The red color filter R is formed.

After the green resin is deposited on the upper substrate 2 on which the red color filter R is formed, the green resin is patterned by a photolithography process and an etching process using a third mask, thereby displaying the green color filter as shown in FIG. 2C. (G) is formed. After the blue resin is deposited on the upper substrate 2 on which the green color filter G is formed, the blue resin is patterned by a photolithography process and an etching process using a fourth mask, thereby as shown in FIG. 2D. By forming (B), the red, green and blue color filters 6 are formed.

The organic material is entirely deposited on the upper substrate 2 on which the red, green, and blue color filters 6 are formed, thereby forming the planarization layer 7 as shown in FIG. 2E. The planarization layer 7 prevents the phenomenon of disclination due to the step generated by the black matrix 2 formed of the opaque resin. Here, in the twisted nematic (TN) mode liquid crystal display panel, the planarization layer 7 may not be formed, or the common electrode 18 may be formed on the color filter 6.

After the spacer material is deposited on the upper substrate 2 on which the planarization layer 7 is formed, the spacer material is patterned by a photolithography process using a fifth mask or the like, thereby forming the column spacers 13 as shown in FIG. 2F. do.

Thereafter, an alignment layer is formed using a manufacturing apparatus as shown in FIG. 3.

The manufacturing apparatus shown in FIG. 3 is a printing roller with a supply roller 58 to which an alignment material such as polyimide is applied, and a resin plate 60 to contain an alignment material to be applied to the surface of the supply roller 58 ( 64 and a substrate 2 loaded below the printing roller 64.                         

In the supply roller 58, the alignment material is separated from the dispenser 60 disposed above. A blade 66 is installed on the surface of the feed roller 58 so that the alignment material is uniformly applied onto the resin plate 66. The printing roller 64 forms an alignment film on the substrate 2 by transferring the alignment material applied to the supply roller 48 onto the resin plate 66 attached thereto while being rotated by the rotational force and printing the printed material onto the substrate 2. . Thereafter, the rubbing process using the rubbing cloth is performed to rub the surface of the alignment film.

On the other hand, the conventional alignment film is formed by using a separate alignment film manufacturing apparatus shown in Figure 3 after the color filter 6, the planarization layer 7 and the like is formed, a small amount of foreign matter remaining due to the process limitations in the alignment film printing The problem is frequently caused that the alignment film is not formed satisfactorily. In addition, by forming the alignment film using a separate alignment film production apparatus, the manufacturing process becomes complicated, such as the length of the process time such as the preparation of the manufacturing apparatus, the movement to the manufacturing apparatus, and the like.

The present invention provides a liquid crystal display panel and a method of manufacturing the same, which can simplify the process, save time, and improve production.

The present invention provides a liquid crystal display panel and a method for manufacturing the same, which can prevent misalignment by forming an alignment layer without a separate manufacturing apparatus.

A liquid crystal display panel according to the present invention comprises: a black matrix formed on a substrate to define a cell region; A color filter formed in the cell region partitioned by the black matrix; An alignment layer formed on the color filter and including a negative photoresist; And a spacer formed on the alignment layer and including a positive photoresist.
The liquid crystal display panel further includes a planarization layer formed between the color filter and the alignment layer.
The liquid crystal display panel further includes a common electrode formed on the color filter and forming a vertical electric field with a pixel electrode formed on a second substrate facing the substrate.
The manufacturing method of the liquid crystal display panel comprises the steps of forming a black matrix partitioning a cell region on a substrate; Forming a color filter in a cell region partitioned by the black matrix; Forming a negative photoresist material on the color filter and exposing the negative photoresist material to form an alignment film; Forming a spacer by forming a positive photoresist material on the alignment layer and exposing and developing the positive photoresist material.
The exposed portion of the positive photoresist is removed in the developing process of the positive photoresist material, while portions other than the exposed portion of the positive photoresist and the exposed negative photoresist remain.

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Other objects and features of the present invention in addition to the above objects will become apparent from the description of the embodiments with reference to the accompanying drawings.

Hereinafter, exemplary embodiments of the present invention will be described with reference to FIGS. 4 to 5J.

4 is a cross-sectional view illustrating a liquid crystal display panel according to an exemplary embodiment of the present invention. In particular, FIG. 4 is a cross-sectional view showing a liquid crystal display panel in the IPS mode.

Referring to FIG. 4, the liquid crystal display panel may be provided on the upper substrate 102 (the transparent electrode layer 103 in the case of the TN mode) having the transparent electrode layer 103 to prevent static electricity or the like on the rear surface thereof. An upper array substrate (or color filter array substrate) composed of a black matrix 104, a color filter 106, a planarization layer 107, a spacer 113, and an upper alignment layer 108 formed sequentially, and a lower substrate ( A lower array substrate (or thin film transistor array substrate) formed of a thin film transistor (hereinafter referred to as "TFT"), a common electrode 118, a pixel electrode 116, and a lower alignment layer 138 formed on the 132, and an upper array The liquid crystal is injected into an internal space between the substrate and the lower array substrate.

In the upper array substrate, the black matrix 104 is formed to overlap the TFT region of the lower substrate 102 and the gate line and data line regions (not shown) and partitions a cell region in which the color filter 106 is to be formed. . The black matrix 104 prevents light leakage and absorbs external light to increase contrast. The color filter 106 is formed in the cell region separated by the black matrix 104. The color filter 106 is formed for each of R, G, and B to implement R, G, and B colors. The planarization layer 107 is formed to cover the color filter to planarize the upper substrate 102. The column spacer 113 is formed of a positive photoresist to maintain a cell gap between the upper substrate 102 and the lower substrate 132.

In the lower array substrate, the TFTs include gate electrodes 109 formed on the lower substrate 132 together with gate lines, and semiconductor layers 114 and 147 overlapping the gate electrodes 109 and the gate insulating layer 144 therebetween. And source / drain electrodes 140 and 142 formed together with the data lines with the semiconductor layers 114 and 147 interposed therebetween. The TFT supplies a pixel signal from the data line to the pixel electrode 116 in response to a scan signal from the gate line. The pixel electrode 116 is a transparent conductive material having a high light transmittance and contacts the drain electrode 142 of the TFT with the passivation layer 150 therebetween. The common electrode 118 is formed in a stripe shape so as to alternate with the pixel electrode 116. The common electrode 118 supplies a common voltage which is a reference when driving the liquid crystal. The liquid crystal rotates with respect to the horizontal direction by the horizontal electric field between the common voltage and the pixel voltage supplied to the pixel electrode 116.

The upper and lower alignment layers 108 and 138 for liquid crystal alignment are formed by applying an alignment material such as polyimide and then performing a rubbing process. Here, the upper alignment layer 108 is formed of a negative photoresist. In the negative photoresist, the molecules corresponding to the exposed regions are hardened in the exposure process, and when the developing process is performed, the photoresist except the exposed regions is removed. In contrast, in positive photoresist, the exposed areas are removed in the developing process.

Meanwhile, in the twisted nematic (TN) mode liquid crystal display panel, the common electrode 118 is formed on the color filter 106 of the upper array substrate, and the planarization layer 107 may be removed or may be provided as necessary. have.

In the liquid crystal display panel according to the present invention, the upper alignment layer 108 is formed using a negative photoresist rather than a material such as polyimide. Therefore, it is possible to form the alignment layer by the photoresist coating and exposure process without the printing process using the separate manufacturing apparatus shown in FIG. As a result, the process is simplified, so that the process time is shortened and the yield is improved.

In addition, by not using a separate manufacturing apparatus, a problem of misalignment, such as foreign matter, is generated during printing of a conventional alignment film.

5A through 5F are cross-sectional views sequentially illustrating a method of manufacturing an upper array substrate of a conventional liquid crystal display panel. The upper array substrate illustrated in FIGS. 5A to 5F is one of a twisted nematic (TN) mode and an in plan switch (IPS) mode.

First, the transparent conductive layer 103 is formed on the back surface of the upper substrate 102 by a deposition method such as sputtering. Here, the transparent conductive layer 103 may not be formed in the twisted nematic (TN) mode liquid crystal display panel.

Subsequently, after the opaque resin is applied to the entire surface of the upper substrate 2, the black matrix 104 partitioning the cell region as shown in FIG. 5A is patterned by a photolithography process and an etching process using a first mask. Is formed. Here, chromium (Cr) or the like may be used as the black matrix 104 material.

After the red resin is deposited on the upper substrate 102 on which the black matrix 104 is formed, the red resin R is patterned by a photolithography process and an etching process using a second mask, thereby providing red color as shown in FIG. 5B. The color filter R is formed.

After the green resin is deposited on the upper substrate 102 on which the red color filter R is formed, the green resin is patterned by a photolithography process and an etching process using a third mask, thereby displaying the green color filter as shown in FIG. 5C. (G) is formed. After the blue resin is deposited on the upper substrate 102 on which the green color filter G is formed, the blue resin is patterned by a photolithography process and an etching process using a fourth mask, as shown in FIG. 5D. By forming (B), the red, green, and blue color filters 106 are formed.

An organic material is entirely deposited on the upper substrate 102 on which the red, green, and blue color filters 106 are formed, so that the planarization layer 107 is formed as shown in FIG. 5E. The planarization layer 107 prevents the phenomenon of disclination due to the step generated by the black matrix 102 formed of the opaque resin (planarizes the substrate on which the color filter and the black matrix are formed). The flattening layer 107 may not be formed in the twisted nematic (TN) mode liquid crystal display panel, or the common electrode 118 may be formed on the color filter 106.

A negative photoresist 170 is applied to the upper substrate 102 on which the planarization layer 107 is formed, as shown in FIG. 5F. Since the exposure process is performed on the negative photoresist 170 as shown in FIG. 5G, the negative photoresist 170 is exposed and the uniformity of the surface thereof is improved.

Subsequently, a positive photoresist 172 is applied to the substrate 102 on which the negative photoresist 170 is formed, as shown in FIG. 5H. Thereafter, an exposure process is performed using a mask that exposes a desired area of the positive photoresist 172. Thereafter, the development process is performed to remove the positive photoresist 172 in the exposed region, thereby forming the column spacer 113 made of the positive photoresist material as shown in FIG. 5I. On the other hand, when the positive photoresist 172 is developed, the negative photoresist 170 is not removed.

Thereafter, a rubbing process using a rubbing cloth or the like is performed to rub the alignment film made of the negative photoresist 170 as illustrated in FIG. 5J.

 As described above, in the liquid crystal display panel according to the exemplary embodiment of the present invention and the manufacturing method thereof, an upper alignment layer is formed using a negative photoresist, not a material such as polyimide. Therefore, the alignment film can be formed by a photoresist coating and exposure process without a printing process using a separate alignment film printing apparatus. As a result, the process is simplified, so that the process time is shortened and the yield is improved.

Furthermore, by not using a separate manufacturing apparatus, the problem of misalignment, which is frequently generated in conventional alignment film printing, is prevented.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (9)

A black matrix formed on the substrate and partitioning the cell region; A color filter formed in the cell region partitioned by the black matrix; An alignment layer formed on the color filter and including a negative photoresist; And a spacer formed on the alignment layer and including a positive photoresist. The method of claim 1, And a planarization layer covering the color filter. The method of claim 1, And a common electrode formed on the color filter and forming a vertical electric field with a pixel electrode formed on a second substrate facing the substrate. Forming a black matrix partitioning the cell region on the substrate; Forming a color filter in a cell region partitioned by the black matrix; Forming a negative photoresist material on the color filter and exposing the negative photoresist material to form an alignment film; Forming a spacer by forming a positive photoresist material on the alignment layer and exposing and developing the positive photoresist material; While the exposed portion of the positive photoresist is removed in the developing process of the positive photoresist material, a portion other than the exposed portion of the positive photoresist and the exposed negative photoresist remain. Way. The method of claim 4, wherein And rubbing the alignment layer. delete delete The method of claim 4, wherein And forming a planarization layer covering the color filter. The method of claim 4, wherein And forming a common electrode formed on the color filter and forming a vertical electric field with a pixel electrode formed on a second substrate facing the substrate.

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