KR0141892B1 - The correction method of deflection aberration for cathode ray tube and image display device - Google Patents

Abstract

The present invention can improve the focus characteristic in the entire screen area and the electron beam entire current region without supplying the dynamic focus voltage, obtain a good resolution, and reduce the moiré in the small current region. A method for correcting deflection aberration of a cathode ray tube having an electron gun with an electron gun, and a cathode ray tube and an image display device, wherein in the configuration, an equipotential line becomes narrower as a gap between the deflector continuations is away from the axis of symmetry of the electric field (ZZ). A fixed non-uniform electric field composed of 61 is formed to correct the deflection aberration corresponding to the deflection amount of the electron beam.

Description

Deflection aberration correction method of cathode ray tube and cathode ray tube and image display device

1 is a schematic diagram illustrating a first embodiment of a deflection aberration correction method for a cathode ray tube according to the present invention;

2 is a schematic diagram illustrating a second embodiment of a deflection aberration correction method for a cathode ray tube according to the present invention;

3 is a schematic diagram illustrating a fourth embodiment of a deflection aberration correction method for a cathode ray tube according to the present invention;

4 is a schematic diagram illustrating a fifth embodiment of a deflection aberration correction method for a cathode ray tube according to the present invention;

5 is a schematic cross-sectional view illustrating a first embodiment of a deflection aberration correction method for a cathode ray tube according to the present invention;

6 is a schematic cross-sectional view illustrating the action of the cathode ray tube according to the present invention;

7 is a main cross-sectional schematic view similar to FIG. 6 lacking a deflection aberration correction station in order to explain the operation of the deflection aberration correction station, which is a non-uniform electric field formation nation in a cathode ray tube according to an embodiment of the present invention,

8 is an explanatory diagram of an example of distribution on the axis of a deflection magnetic field, an explanatory diagram of a magnetic field distribution in a cathode ray tube having a deflection angle of less than 100 °;

9 is an explanatory diagram of the positional relationship of the deflection magnetic field generating mechanism corresponding to FIG. 8;

10 is an explanatory diagram of the distribution on the axis of the deflection magnetic field, and an explanatory diagram of the magnetic field distribution in the cathode ray tube having a deflection angle of less than 100 degrees;

11 is an explanatory diagram of the positional relationship of the deflection magnetic field generating mechanism corresponding to FIG. 10;

12 is a perspective view showing a structural example of a deflection aberration correcting electrode forming a non-uniform electric field fixed to a deflector continuation of the present invention;

13 is a sectional view showing the main parts of an example of an electron gun used in a cathode ray tube according to the present invention;

14 is a schematic diagram illustrating an example of the electron gun structure used in the cathode ray tube of the present invention;

15 is a schematic diagram illustrating an example of the electron gun structure used in the cathode ray tube of the present invention;

FIG. 16 is a structural view showing a structural example of a deflection aberration correction electrode applied to a color cathode ray tube using a three-electron beam in which the present invention is inlined;

17 is a main structural view illustrating another example of the cathode ray tube of the present invention in which a deflection aberration correction electrode is applied to a color cathode ray tube using an inline-arranged three-electron beam;

18 is a principal component diagram illustrating another example of a deflection aberration correction electrode applied to a color cathode ray tube using an inline-arranged three-electron beam of the present invention.

19 is a principal component diagram for explaining another example of a deflection aberration correction electrode applied to a color cathode ray tube using a three-electron beam inlined like in FIG. 18;

20 is an explanatory diagram of a structural example of an electron gun equipped with a deflection aberration correction electrode according to the present invention;

21 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used in the cathode ray tube of the present invention;

Fig. 22 is an explanatory diagram of still another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention;

23 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention;

24 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention;

25 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention;

26 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention;

Fig. 27 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention;

28 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used in the cathode ray tube of the present invention;

Fig. 29 is an explanatory diagram of the effect of space reduction repulsion on the electron beam between the main lens and the fluorescent film,

30 is an explanatory diagram of the relationship between the distance between the main lens and the fluorescent film and the size of the electron beam spot on the fluorescent film;

31 is a schematic sectional view illustrating a dimension example in one embodiment of a cathode ray tube according to the present invention;

32 is a schematic cross-sectional view of a cathode ray tube according to the prior art for comparing the dimension example in one embodiment of the cathode ray tube according to the present invention;

33 is a schematic diagram showing an example of a cathode ray tube according to the present invention;

34 is a schematic diagram showing another example of a cathode ray tube according to the present invention;

35 is an explanatory diagram showing the relationship between the length L of the neck portion and the temperature T of the neck portion at the deflection yoke position;

36 is a side view illustrating a detailed structural example of an electron gun used for a cathode ray tube according to the present invention;

37 is a side view in which the portion of the electron gun used for the cathode ray tube according to the present invention indicates the main portion of a detailed structural example;

38 is an explanatory diagram of various specific structural examples of deflection aberration correction electrodes for controlling the convergence state of the electron beam according to the deflection angle when deflecting the electron beam in the magnetic field of the deflection yoke at a position within the magnetic field of the deflection yoke;

39 is an explanatory diagram of the specific structure of the deflection aberration correction electrode which is located in the magnetic field of the deflection yoke and controls the convergence state of the electron beam according to the deflection angle when the electron beam is deflected in the magnetic field of the deflection yoke;

40 is an explanatory diagram of a specific structural example of the deflection aberration correction electrode which is located in the magnetic field of the deflection yoke and controls the convergence state of the electron beam according to the deflection angle when the electron beam is deflected in the magnetic field of the deflection yoke;

41 is an explanatory diagram of a specific structural example of a deflection aberration correcting electrode which is located in the magnetic field of the deflection yoke and controls the convergence state of the electron beam according to the deflection angle when the electron beam is deflected in the magnetic field of the deflection yoke;

42 is an explanatory diagram of a specific structural example of the deflection aberration correction electrode which is located in the magnetic field of the deflection yoke and controls the convergence state of the electron beam according to the deflection angle when the electron beam is deflected in the magnetic field of the deflection yoke;

43 shows that a deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle is not connected to the anode when the electron beam is deflected in the magnetic field of the deflection yoke by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke. Explanatory drawing of the structural example at the time of supplying the electric potential lower than an anode potential,

44 shows that a deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle is not connected to the anode when the electron beam is deflected in the magnetic field of the deflection yoke by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke. Explanatory drawing of the structural example at the time of supplying the electric potential lower than an anode potential,

45 shows a non-uniform electric field fixed within the magnetic field of the deflection yoke so that the deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle is not connected to the anode when the electron beam is deflected in the magnetic field of the deflection yoke. Explanatory drawing of the structural example at the time of supplying the electric potential lower than an anode potential,

46 shows that a deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle is not connected to the anode when the electron beam is deflected in the magnetic field of the deflection yoke by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke. Explanatory drawing of the structural example at the time of supplying the electric potential lower than an anode potential,

FIG. 47 illustrates a deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle when the electron beam is deflected in the magnetic field of the deflection yoke by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke with the anode. Explanatory drawing of the structural example at the time of supplying the electric potential lower than an anode potential,

48 shows that a deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle is not connected to the anode when the electron beam is deflected in the magnetic field of the deflection yoke by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke. Explanatory drawing of the structural example at the time of supplying the electric potential lower than an anode potential,

FIG. 49 shows the position of the center electron beam passing position of the deflection aberration correction electrode which corrects the deflection aberration of the electron beam according to the deflection angle when the electron beam is deflected in the deflection yoke magnetic field by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke. Explanatory drawing of the structural example in the case where the structure corresponding to a side electron beam passing position differs,

50 shows the position of the center electron beam passing position of the deflection aberration correction electrode which corrects the deflection aberration of the electron beam according to the deflection angle when the electron beam is deflected in the magnetic field of the deflection yoke by forming a nonuniform electric field fixed in the magnetic field of the deflection yoke. Explanatory drawing of the structural example in case the deflection aberration correction in an inline direction differs in the position where a front electron beam passes through,

51 is a schematic cross-sectional view illustrating an example of an electron gun basic structure of an electrode configuration to which the present invention is applied;

52 is a schematic sectional view illustrating an example of the electron gun basic structure of the electrode configuration to which the present invention is applied;

53 is a schematic sectional view illustrating an example of the electron gun basic structure of the electrode configuration to which the present invention is applied;

54 is a schematic cross-sectional view illustrating an example of an electron gun basic structure of an electrode configuration according to the present invention;

55 is a schematic sectional view illustrating an example of the electron gun basic structure of the electrode configuration to which the present invention is applied;

56 is a schematic sectional view illustrating an example of the electron gun basic structure of the electrode configuration to which the present invention is applied;

57 is a schematic diagram illustrating the configuration of another electron gun to which the present invention is applied;

58 is an explanatory diagram of a detailed configuration of the second electrode in FIG. 57;

59 is an explanatory diagram of a detailed configuration of the third electrode in FIG. 57;

60 is an explanatory diagram of a detailed configuration of the fourth electrode in FIG. 57;

61 is a sectional view showing the main parts of a structure of a color cathode ray tube electron gun using an inline-arranged three-electron beam;

62 is a structural diagram of one electrode constituting the main lens of the electron gun;

63 is a structural diagram of the other electrode constituting the main lens of the electron gun,

64 is an explanatory diagram of another example of a deflection aberration correction station in a cathode ray tube of the present invention;

65 is an explanatory diagram of the dimension comparison between an example of an image display apparatus used for a cathode ray tube according to the present invention and an image display apparatus using a conventional cathode ray tube;

66 is an explanatory diagram of the relationship between the deflection amount and the deflection aberration amount;

67 is an explanatory diagram of the relationship between the deflection amount and the deflection aberration correction amount;

68 is an explanatory diagram of a connection state of a fluorescent film of an electron beam;

69 is an explanatory diagram of a scanning line formed in a panel portion constituting a fluorescent surface of a cathode ray tube;

70 is an explanatory diagram of a configuration example of a deflection aberration correcting electrode forming a fixed nonuniform electric field;

71 is a layout view of a cylindrical electrode and a parallel plate electrode for forming a fixed non-uniform electric field;

72 is a schematic diagram illustrating a cross section of a shadow mask type color cathode ray tube equipped with an inline electron gun;

73 is an explanatory diagram of an electron beam spot when the periphery of the screen is emitted by a circular electron beam spot at the center of the screen;

74 is an explanatory diagram of a deflection magnetic field distribution with a cathode ray;

75 is a schematic diagram of an electron optical system of an electron gun for explaining deformation of an electron beam spot shape;

76 is an explanatory diagram of means for suppressing the deterioration of the image quality at the peripheral portion of the screen described with reference to FIG. 75;

FIG. 77 is a schematic diagram illustrating an electron beam spot shape of a fluorescent surface when the lens system shown in FIG. 76 is used;

78 is a schematic diagram of an electron optical system of an electron gun in which the lens intensity of the main lens is made non-rotationally symmetric, and the intensity of the horizontal (X-X) lens of the prefocus lens is enhanced.

FIG. 79 is a schematic diagram of an electron optical field of an electron gun in which a halo inhibitory effect is added to the configuration of FIG. 77;

80 is a schematic diagram illustrating a spot shape of an electron beam on a screen when a lens system having the configuration shown in FIG. 79 is used;

81 is a schematic diagram of an electron gun optical system for explaining the trajectory of an electron beam at a small current;

FIG. 82 is a schematic diagram showing an optical system of an electron gun when the lens intensity in the vertical direction (Y-Y) of the divergence lens side in the prefocus lens is increased;

83 is an overall side view illustrating an example of a cathode ray tube electron gun;

84 is a cross-sectional view of the main portion of the electron gun shown in FIG. 83;

85 is a schematic cross-sectional view of a main part for structural comparison of an electron gun by applying a focus voltage method;

FIG. 86 is an explanatory diagram of the focus potential supplied to the electron gun shown in FIG. 85;

(1) ... first electrode (2) ... second electrode

(3) ... third electrode (4) ... fourth electrode

(5) ... fifth electrode (6) ... sixth electrode

(7) ... Neck part (8) ... Funnel part

(10) ... electron beam (11) ... deflection yoke

(13) ... fluorescent film (14) ... panel portion

(38) ... main lens

(39), (39) ... deflection aberration correction electrode

(61) ... equipotential lines (62) ... electron beam passing through the center of the electric field

(63) ... electron beam passing through a part away from the center of the electric field

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cathode ray tube, and more particularly, to a deflection aberration correction method for a cathode ray tube having an electron gun capable of obtaining a good resolution by improving the focus characteristic in the entire region of the fluorescent surface and in the entire current region of the electron beam, and the cathode ray tube. It is about.

A cathode ray tube having at least an electron gun composed of a plurality of electrodes, a deflecting device, and a fluorescent surface (a screen having a fluorescent film, hereinafter referred to as a fluorescent film or simply a screen), the means for obtaining a good reproduction image from the center of the fluorescent screen to the periphery thereof. As the following, the following technique is known conventionally.

For example, on the bottom of a shield cup of an electron gun using an in-line arrayed three-electron beam, two parallel flat-plate electrodes are placed in the direction of the main lens with the path of the three-electron beams in parallel with inline. JP-A 4-52586).

An electron gun using an in-line arrayed three-electron beam, with two upper and lower parallel plate electrodes installed in parallel with the in-line with the paths of the three-electron beams facing away from the main lens opposing side, so that the electron beam enters the deflecting field. (US Patent Publication No. 4086513, Japanese Patent Application Laid-Open No. 60-7345).

An electrostatic quadrupole lens is formed between the electrodes of a part of the electron gun, and the intensity of the electrostatic quadrupole lens is dynamically changed in response to the deflection of the electron beam to achieve uniform image uniformity throughout the screen. Publication 51-61766).

An astigmatism lens is disposed in a region of the electrodes (second electrode and third electrode) forming the connection lens (Japanese Patent Laid-Open No. 53-18866).

The length of the electron beam through holes of the first electrode and the second electrode of the inline three-beam electron gun is lengthened, the shape of each of them is different, or the aspect ratio of the center electron gun is smaller than that of the side electron gun (Japanese Patent Laid-Open No. 51-64368). Publication).

A non-rotationally symmetric lens is formed by a slit formed on the cathode side of the third electrode of the inline array electron gun, and through at least one non-rotationally symmetric lens whose depth in the electron total axis direction of the slit is deeper than the side beam. There is a method of making an electron beam in the shape of a pipe (JP-A-60-81736).

In the cathode ray tube, the focus characteristic is the entire area of the screen and the resolution in the entire current region of the electron beam is good, and there is no moire in the low current region, and the screen in the entire current region. The uniformity of the overall resolution. The design of an electron gun that simultaneously satisfies such a plurality of characteristics requires a high level of skill.

According to the researches of the present inventors, in order to combine these various characteristics with the cathode ray tube, it was found that it is essential to install an electron gun having a combination of astigmatism and large-diameter lenses.

However, in the prior art, in order to obtain a good resolution over the entire area of the screen by using an electron gun that generates an astigmatism lens or a non-rotationally symmetric lens, it is necessary to apply a dynamic focus voltage to the connection electrode of the electron gun. Also, it is not considered to obtain a reproducing image having good resolution in the entire screen area by correcting the deflection aberration by a fixed and nonuniform electric field located in the deflector continuation.

FIG. 83 is an overall side view of a fluorite electron gun that applies a focus voltage to G3 and G5, which are examples of cathode ray tube electron guns, and applies an anode voltage only to G6, and FIG. 84 is a partial sectional view of the main portion thereof, wherein 1), (G1), second electrode (2), (G2), third electrode (3), (G3), fourth electrode (4), (G4), fifth electrode (5), (G5) And an electron gun provided with the sixth electrodes 6 and G6. The fifth electrodes 5 and G5 are composed of two electrodes 51 and 52.

In an isometric view, the influence on the electron beam of the electric field due to the length of each electrode, the diameter of the electron beam barrel and the hole, and the like are all different. For example, the shape of the electron beam through hole of the first electrode 1 near the cathode K determines the sport shape of the electron beam in the small current region, while the shape of the electron beam through hole of the second electrode 2 is determined from the small current region. It determines the spot shape of the electron beam up to the high current region.

In the case where the main lens is formed between the fifth electrode 6 and the sixth electrode 6 by supplying the anode voltage to the sixth electrode 6, the fifth electrode 5 and the fifth electrode constituting the main lens are formed. The shape of the electron beam through hole of the six-electrode 6 has a large influence on the electron beam spot shape in the large current region, but the effect on the electron beam spot shape in the small current region is smaller than that of the large storage region.

In addition, the length of the electron gun in the axial direction of the fourth electrode 4 affects the magnitude of the optimum focus voltage, and also significantly affects the difference between the optimum focus voltages at the time of small current and large current. The influence of the length change in the tube axis direction of the fifth electrode 5 is significantly smaller than that of the fourth electrode 4.

Therefore, in order to optimize each characteristic value of the electron beam, it is necessary to optimize the structure of the electrode that most effectively acts on each characteristic.

Also, in order to increase the resolution in the direction perpendicular to the electron beam scanning direction of the cathode tube, when the shadow mask pitch in the direction perpendicular to the electron beam scanning direction is reduced or the density of the electron beam scanning line is increased, especially in the small current region of the electron beam, Since optical interference occurs with the shadow mask, it is necessary to optimize the moire contrast.

However, in the related art, the above-described various problems cannot be overcome.

SUMMARY OF THE INVENTION An object of the present invention is to solve the problems of the prior art, improve the focus characteristic in the entire screen area and the electron beam total current area without supplying a dynamic focus voltage, and at the same time obtain a good resolution. A deflection aberration correction method for a cathode ray tube with an electron gun having a configuration capable of reducing moiré in a low current region, and a cathode ray tube thereof.

For example, FIG. 85 is a schematic cross-sectional schematic view for structural comparison of the electron gun by the focus voltage applying method, (a) shows a focus voltage fixing method, and (b) shows a dynamic focus voltage method.

The electrode configuration of the focus voltage fixed electron gun shown in Fig. (A) is the same as that shown in Figs. 83 and 84, and the same operation parts are given the same reference numerals.

In the focus voltage fixed electron gun shown in (a) above, the focus voltage vf1 at the same potential is applied to the electrodes 51 and 52 constituting the fifth electrode 5.

On the other hand, in the dynamic focus voltage electron gun shown in (b), different focus potentials are supplied to each of the fifth electrodes 5 and G5 constituted by the two electrodes 51 and 52. In particular, the dynamic focus voltage dvf is supplied to one electrode 52. In the dynamic focus voltage electron gun, as shown by (43), there are also parts inside other electrodes, which are more complicated in structure than the electron gun shown in (a), have a higher cost of parts, and are assembled as an electron gun. The drawback is that workability is inferior.

FIG. 86 is an explanatory view of a focus potential supplied to the electron gun shown in FIG. 85, (a) is a focus voltage waveform of an electron gun of a focus voltage fixed method, and (b) is a dynamic focus voltage electron gun. Is a waveform diagram of a focus voltage.

In the diagram (b), there is a fixed focus voltage vf1, and a voltage of a waveform in which the dynamic focus voltage vf2 is superimposed on another fixed focus voltage vf20 is used.

For this reason, in the dynamic focus voltage electron gun shown in FIG. 85 (b), two dynamic focus supply pins of the stem of the cathode ray tube are required, and the focus fixed electron gun shown in (a) is isolated from the other stem pins. The above attention is required. This requires a special structure of the socket for embedding into a television set, and in addition to the two fixed focus power supplies, it takes time to adjust the focus voltage in the dynamic focus voltage generator circuit and the assembly line of the television set. There is a problem.

Another object of the present invention is to solve the above-mentioned problems of the prior art, and in particular, even if the voltage value of the dynamic focus voltage is low, the whole screen area and the electron beam current flow area have improved constitution, and thus, a constitution can be obtained. A deflection aberration correction method for a cathode ray tube having an electron gun and a cathode ray tube thereof are provided.

It is still another object of the present invention to provide a method for correcting deflection aberration of a cathode ray tube and a cathode ray tube for reducing focus characteristics due to spatial charge repulsion of an electron beam acting between a fluorescent surface of a cathode ray tube and a main focusing lens of an electron gun. .

In the cathode ray tube, the maximum deflection angle (hereinafter, simply referred to as deflection angle or deflection amount) of the electron beam is almost determined. As the size of the fluorescent surface becomes larger, the distance between the fluorescent surface and the main focusing lens of the electron gun is extended and acts in this region. The decrease in focus characteristics caused by the space charge repulsion of the electron beam is encouraged.

Therefore, if there is a means for reducing the deterioration of focus characteristics due to space charge repulsion, a thin electron beam such as a reduction in the size of the fluorescent surface can be heard, so that the resolution of the cathode ray tube is improved.

It is still another object of the present invention to provide an electron gun capable of improving the focus characteristic and shortening the overall length of a cathode ray tube, a method of correcting deflection aberration of a cathode ray tube having the electron gun, and the cathode ray tube thereof.

Another object of the present invention is to provide an electron gun which does not reduce the uniformity of the image of the entire screen when the deflection angle of the cathode ray tube is enlarged, a method of correcting the deflection aberration of the cathode ray tube having the electron gun, and the cathode ray tube thereof. have.

Even when the deflection angle is enlarged, the overall length of the cathode ray tube can be shortened. The depth dimension of the current television set depends on the total length of the cathode ray tube, but if the television set is considered a piece of furniture, it is desirable that the depth is short.

In addition, when carrying many television sets, such as a television set maker, the shorter the depth of a set is preferable from a storage efficiency.

In the above-mentioned prior art, the suppression of the temperature rise of the electron beam deflecting magnetic field generating sphere length portion in the neck portion of the cathode ray tube while reducing the tube axis length of the cathode ray tube is not considered.

In order to achieve the above object, the present invention is characterized in that, in a cathode ray tube having at least an electron gun composed of a plurality of electrodes, a deflecting device, and a fluorescent surface, a deflection aberration is corrected by forming an unbalanced electric field fixed to the deflector continuum. do.

The deflection aberration correction is characterized in that the deflection aberration is corrected corresponding to the deflection amount by forming a nonuniform electric field having astigmatism in the deflection continuum.

In addition, the fixed non-uniform electric field is characterized by forming a non-uniform electric field having an astigmatism in which the electron beam diverges or converges, and corrects the deflection aberration in correspondence to the amount of deflection in the scanning line direction or the direction perpendicular to the scanning line. .

The present invention is also characterized in that the deflection aberration is corrected corresponding to the deflection amount by forming a fixed non-uniform electric field with coma aberrations in the deflector continuation.

The fixed non-uniform electric field is characterized by forming a nonuniform electric field having a coma aberration for diverting or converging the electron beam, and correcting the deflection aberration corresponding to the deflection amount in the scanning line direction or the direction perpendicular to the scanning line of the electron beam.

In the cathode ray tube of the present invention having the above configuration, the following effects can be obtained.

In general, in a cathode ray tube, the amount of deflection aberration increases rapidly as the amount of deflection increases.

In the present invention, the deflection aberration can be corrected by forming a nonuniform development in which the electron beam is deflected and the connection or divergence action of the electron beam changes when the trajectory is changed when the electron beam is deflected.

2, FIG. 66 is an explanatory diagram of the relationship between the deflection amount (deflection angle) and the deflection aberration amount, and FIG. 67 is an explanatory diagram of the relationship between the deflection amount and the deflection aberration correction amount.

As shown in FIG. 66, the amount of deflection aberration increases as the deflection angle increases.

In the present invention, when the electron beam is deflected and its trajectory is shifted in the deflection grating, as shown in FIG. 67, a non-uniform electric field in which a deflection aberration correction amount increases according to the amount of deflection is rapidly increased, depending on the amount of deflection. Increased deflection aberration correction is possible.

3 An electric field with astigmatism is effective as one of nonuniform electric fields in which the electron beam is deflected and the trajectory is changed so that the connection or divergence of the electron beam is accelerated appropriately according to the amount of deflection. An electric field with astigmatism is formed as an electric field with two orthogonal planes of symmetry.

As the symmetrical plane is moved from the center to the end, the amount of action of focusing or diverging the electron beam increases.

Comparing the electron beam passing through the center of the electric field formed by the coincidence line and the electron beam passing through the part away from the center of the electric field, the electron beam passing through the part away from the center of the electric field passes through the center of the electric field as the electric continuation proceeds. The divergence amount is larger than that of the electron beam, and the entire trajectory also approaches the end of the electric field.

In addition, the change in trajectory is larger near the end of the electric field law. This is because the gap of the coincidence line becomes narrower as it falls from the center of the electric field.

In general, in the cathode ray tube, the distance from the main lens of the electron gun to the fluorescent surface is longer than the fluorescent surface center, so that the electron beam is optimally focused at the center of the fluorescent surface when there is no connection or divergence to the deflection field. Becomes

In the present invention, a fixed electric field is formed in the deflecting magnetic field, and as the amount of deflection increases, divergence by the electric field increases, thereby reducing the overfocusing around the fluorescent surface of the electron beam. The same deflection aberration correction is possible.

In the present invention, when the deflection magnetic field has an electron beam focusing action, a fixed electric field having a tendency to increase the strength is formed in the deflection magnetic field so that the increase in the divergence action due to the electric field when the amount of deflection increases increases in the deflection magnetic field. It becomes possible to exceed the increase of the focusing effect by this, and it becomes possible to correct | amend deflection aberration which also included the overfocusing shape of the electron beam around the fluorescent surface resulting from the structure of the said cathode ray tube.

4, FIG. 68 is an explanatory view of the focused state on the fluorescent film 13 of the electron beam, in (3) the third country 4 represents the fourth country, (13) the fluorescent film and 38 represents the main lens. do.

69 is an explanatory view of the scanning lines formed on the panel portion constituting the fluorescent screen (screen) of the cathode ray tube, where 14 is a panel portion and 60 is a scanning trace.

In the deflection of the cathode ray tube, as shown in the same drawing, there are many methods of scanning the electron beam in a straight line. The linear scan trace 60 is called a scan line.

The deflection magnetic field is often different in the direction (X-X) of the scanning line and in the direction (Y-Y) perpendicular to the scanning line. In addition, the electron beam is often different in the scanning line direction and the focusing direction in the direction perpendicular to the scanning line by at least one action of the plurality of electron gun stations before receiving the action of the fixed non-uniform electric field formed in the deflector continuum.

Moreover, the weighting differs depending on the application of the cathode ray tube to the deflection aberration correction in the scanning line direction or the deflection aberration correction in the direction perpendicular to the scanning line. Since the technical means corresponding to the direction of the deflection aberration with the scan line and the amount of correction content correction are not necessarily the same, and the required cost is different, the means corresponding to each are often different. Suitable for

5 On one symmetrical surface of the non-receiving electric vehicle with the focusing effect, the electron beam passing through the center of the electric field formed by the coincidence line and the electron beam passing through the part away from the center of the electric field pass through the part away from the center of the electric field. As the electron beam continues to propagate, the amount of focusing is larger than that of the electron beam passing through the center of the electric field, and the entire trajectory also approaches the center of the electric field. Also, the way of changing the trajectory is larger near the end of the electric field.

This is because the distance between the equipotential lines becomes narrower as it is separated from the center of the electric field.

When the deflection aberration has an electron beam divergence effect, as the deflection amount increases, the focusing action by the electric field increases, thereby forming a fixed electric field in the deflection magnetic field that can reduce the overfocusing around the fluorescent surface of the electron beam. Correspondingly, deflection aberration correction as shown in FIG. 67 is possible.

The technical means corresponding to the direction of the deflection aberration with the scan line, the content of the correction, and the amount of correction are not necessarily the same, that is, the price is different, and therefore, the means appropriately corresponding to each are often different. Suitable for things.

6 In the color cathode ray tube in which the 3 electron beams are arranged inline in the horizontal direction, a barrel-type magnetic field line distribution is provided in the vertical deflection magnetic field as described below to simplify the circuit for controlling the concentration of the 3 electron beams on the fluorescent surface. In the horizontal deflection field, a pin-ku-type magnetic force distribution is used.

Of the three electron beams in the in-line array, the amount of deflection aberration received by the vertical deflection field is different depending on the strength of the vertical deflection field and the direction of the horizontal deflection. For example, looking at the cathode ray tube from the fluorescent surface side, the deflection aberration is different because the magnetic flux distribution of the deflecting magnetic field passing through is different in the case where the inline right electron beam is deflected to the left and to the right of the fluorescent plane.

Image quality changes in the left and right corners on the fluorescent surface.

In order to suppress this, the side electron beam requires a state in which the electron beam converges or diverges in the case where it passes through the right and left electron orbits from the center of the electron gun.

In the present invention, it is effective to form an electric field having only one symmetry plane, that is, a fixed electric field with coma aberration on the deflector continuation.

On the symmetry plane of the coma aberration, the distance of the equipotential lines varies depending on the direction as it moves away from the center of the electric field in a direction perpendicular to the traveling direction of the electron beam.

On the symmetry plane of the coma-water electric field with diverging action, the electron beam passing through the center of the electric field formed by the equipotential lines and the electron beam passing through the part away from the center of the electric field pass through the center of the electric field as the electric continuation proceeds. The amount of divergence is larger than that of the electron beam, and the entire trajectory also approaches the end of the electric field. The orbital change is larger near the end of the electric field in the law. This is because the spacing of the equipotential lines becomes narrower as it falls from the center of the electric field.

The sharper the spacing of equipotential lines becomes, the more pronounced it is.However, the electron beam passing through the portion away from the center of the smaller electric field becomes smaller as the distance from the center of the electric field decreases. Compared to the electron beam passing through the center, the amount of divergence is large, and the entire trajectory also approaches the end of the electric field. The way of changing the trajectory is also closer to the end of the electric field, but the method of change is smaller than the change of the trajectory of the right-handed way in which the spacing of the equipotential lines becomes narrower as it falls from the center of the electric field. This is because the spacing of the equipotential lines decreases as the distance from the center of the electric field decreases.

Therefore, the deflection aberration correction as shown in FIG. 67 is made possible by forming a fixed electric field in the deflection magnet which increases as the amount of deflection increases depending on the direction of deflection.

The electron beam on the symmetric plane where the deflection magnetic field has an electron beam divergence action and the deflection aberration differs depending on the direction of deflection forms a fixed electric field in the deflection magnetic field having a tendency as shown in FIG. 66, thereby increasing the amount of deflection. When the focusing action by the electric field varies depending on the direction of the deflection, deflection aberration correction as shown in FIG. 67 is possible at an increase.

In order to improve the uniformity of the resolution in the entire fluorescent surface by forming a fixed non-uniform electric field in the deflector continuity, the trajectory of the electron beam needs to be deflected so that the electric field traverses different electric field intensities. Thus, the non-uniform electric field is constrained by the positional relationship with the deflection magnetic field.

At the same time, the effect of correcting the deflection aberration also depends on the strength of the fixed non-uniform electric field formed in the deflector continuation. The electric field is generated by a potential difference between electrodes having at least two potentials different from each other. The strength of the electric field is determined by the combination of the electrode structure, the position, and the potential difference of at least the two different potentials, but is not arbitrary, but is limited by the practical electron beam thickness and the practical potential differences when passing through the electric field. .

The generation of the electric field occurs between at least two potential differences, but the electrode for correcting the deflection aberration corresponding to the deflection amount, that is, the electrode forming the non-uniform electric field is called a deflection aberration correcting electrode. There may be more than one deflection aberration correction electrode, and there is no limitation in quantity.

Moreover, you may make another electrode work on one part.

As is well known, the magnetic flux density required for deflection depends on the voltage of the fluorescent surface and can be normalized by dividing by the square root of the fluorescent surface voltage. By using this value, the trajectory of the electron beam in the non-continuous propagation becomes clear, the precision of the electric field setting is improved, and appropriate deflection aberration correction is made possible.

The required magnetic flux density also depends on the strength of the nonuniform electric field, and the higher the strength of the electric field, the smaller the required magnetic flux density. The intensity of the nonuniform electric field also depends on the positional relationship with the electrodes of adjacent other potentials, the potential difference, and the structure of the deflection aberration correcting electrode itself forming the nonuniform electric field. As the positional relationship with adjacent electrodes of other potential approaches, the electric field becomes stronger, but the distance cannot be zero.

The electric field can be strengthened by increasing the potential with the electrodes of other adjacent potentials.

However, the significant increase in the electric field is largely deformed by the influence of the non-uniform electric field even when the electron beam is deflected in the trajectory of the electron beam, that is, in the center of the fluorescent surface of the cathode ray tube of the electron beam. It becomes impossible. Therefore, there is a limit on the potential difference with the electrodes of other potentials adjacent to each other, and considering the withstand voltage characteristics of the electrodes of other potentials, the difference between the fluorescent surface potential and the connection potential is practically the highest.

When the gap between the deflection aberration correction electrodes forming the non-uniform electric field is filled, there is also the expectation that the electron beam is connected or diverged even with a slight orbital change, but considering the thickness of the electron beam, it is practically considered that the electrode forms the non-uniform electric field. The distance is about 0.5mm.

In view of the above, in the present invention, when the maximum deflection angle of the cathode ray tube is 100 ° or more, the effect can be obtained when the magnetic flux density is only 0.007 milliseconds per square root of one volt of the fluorescent surface voltage.

When the fluorescent surface side of the electrode is woven in the tube axis direction of the cathode ray tube, the distance is the longest part.

8 When the maximum deflection angle of the cathode ray tube is determined, the maximum value is almost also determined among the magnetic flux densities normalized by the square root of the fluorescent surface voltage. There is a setting method in which the position where the fixed nonuniform expansion is formed in the deflector continuation is an area of a predetermined level or more of the maximum magnetic flux density. This method can significantly simplify the measurement of the magnetic flux density compared with the case where the absolute value of the magnetic flux density is set. In other words, the relative value comparison with the maximum magnetic flux density is sufficient, and it is very significant in practical use. However, since the maximum value of the magnetic flux density varies depending on the shape of the magnetic material, this part becomes an error, but practically does not interfere.

In the present invention, when the maximum deflection angle of the cathode ray tube is 100 ° or more, in consideration of the limitations of the electrode and the electric field relationship described in the above item 7, the level of the magnetic flux density is on the fluorescent surface side of the electrode forming the non-uniform electric field. If it is more than 25% of the maximum magnetic flux density at the end of, it can be effective in a practically practical range.

9 The magnetic flux density depends closely on the position from the magnetic material forming the core of the coil that generates the unbiased magnetic field because it depends on the magnetic flux of the magnetic path. One method of marking the region of the required magnetic flux density is the distance between the electrode and the magnetic material forming the non-uniform electric field. This method is very practical in practice since it is possible to omit the measurement of the magnetic flux density only by knowing the core position of the coil generating the deflection magnetic field. However, since the distribution of the magnetic flux density varies depending on the shape of the magnetic material, this portion is an error, but practically does not interfere.

In the present invention, when the maximum deflection angle of the cathode ray tube is 100 ° or more, considering the limitation of the electrode and the electric field relationship described in the above paragraph 7, the non-uniform electric field is applied from the end of the magnetic material that is away from the fluorescent surface of the magnetic material. When the electrode to be formed has a distance from the end of the fluorescent surface to 40 mm or less, the effect can be exhibited in a practically practical range.

The distance is the longest when the fluorescent surface side of the deflection aberration correction electrode is woven in the tube axis direction of the cathode ray tube.

10 Similarly, in the present invention, when the maximum deflection angle of the cathode ray tube is less than 100 °, the normalized magnetic flux density corresponding to the above 7 can be more than 0.004 milli Tesla near the square of 1 volt of the fluorescent surface voltage. The magnetic flux density corresponding to Clause 8 can be effective in the range of 20% or more without practical problems. The distance equivalent to Clause 9 can be effective within the range of 35mm.

In the case of 11 cathode ray tubes, considering the practicality of the whole cathode ray tube or the electron gun to be used, such as structure, ease of use, and ease of use, the non-uniform electric field cannot increase its strength indefinitely.

In the present invention, the electron beam needs to have a moderate thickness in the above-described region in order to take effect in consideration of ease of use and to exert an effect even in a relatively low electric field. In general, the larger the diameter of the electron beam in the cathode ray tube is near the main lens. Therefore, the position of the deflection aberration correction electrode forming the non-uniform electric field is limited by the distance from the main lens.

In addition, if this is provided on the cathode side from the main lens part at an extreme side, the astigmatism is easily canceled by the focusing action of the main lens, and the inconvenience that part of the electron beam is turned around part of the electron gun electrode easily occurs.

Considering the conditions such as less than 85 ° of the maximum deflection angle of the cathode ray tube, a single electron beam, or even the use of a focused magnetic beam, the fluorescent surface of the electrode forming the non-uniform electric field in the present invention is considered. The distance between the end closer to the main lens opposing surface of the electron gun anode of the cathode ray tube is the scanning line of the connection electrode opposing portion of the electron gun anode toward the fluorescent surface than the main lens opposing surface of the electron gun anode. The range of 5 times or less, or 180 mm or less, or 3 times or less, or 108 mm or less, of the opening diameter in the orthogonal direction toward the cathode can exert an effect. When the fluorescent surface side of the electrode is woven in the tube axis direction of the cathode ray tube, the distance is the shortest part.

12 In the present invention, the magnetic flux density of the deflection magnetic field is a condition in which the required amount exists in order to achieve the effect in the nonuniform electric field region. The deflection aberration correction electrode may be made of a nonmagnetic material. However, if at least a part of the deflection aberration correction electrode is made of a magnetic material, it is a method other than a mechanism for generating a deflection magnetic field, and is a means for increasing the magnetic flux density of the electric field region. Correction of the polarization aberration becomes good.

13 In the present invention, the structure of the deflection aberration correction electrode needs to be disposed close to the electron beam path. Therefore, one means is to provide an opening structure that surrounds a part of the path of the electron beam. As described in section 3, the astigmatism field has two orthogonal planes of symmetry, and the coma aberration field has one plane of symmetry.

The two types of aberration fields can be formed by the structure of the openings. In general, electron gun electrode components of cathode ray tubes are manufactured by pressing a metal plate. In recent years, the focus characteristic of a cathode ray tube is remarkably improved, the precision required for the electrode component is high, and the deflection aberration correcting electrode is no exception. In the case of mass production, the deflection aberration correction electrode is made into an integral press part with an opening, so that a part with high processing precision and low cost can be manufactured.

In the deflection of the cathode ray tube, a scan line is often formed as described above. In the cathode ray tube deflecting the scanning line system, the shape of the fluorescent surface is often substantially rectangular, and the scan is also generally parallel to the plane of the rectangular rectangle. In the degree of assembly, the external shape of the vacuum envelope in which the fluorescent surface is provided is also approximately a quadrilateral in conformity with the fluorescent surface.

Therefore, in the present invention, the two kinds of aberration fields have a structure corresponding to the scanning line and a structure corresponding to the shape of the fluorescent surface, which are convenient for image formation. The aberration field may be considered in the same direction as the scanning line or in two directions perpendicular to the scanning line, but is not uniquely determined in relation to the use type of the cathode ray tube.

14 In the present invention, the diameter of the opening is closely related to the orbit of the electric field strength to be formed and the electron beam at the location, and the effect is reduced when extremely large. The depth of the device when the cathode ray tube is used in the image display device. This is limited to the length of the tube axis of the cathode ray tube and cannot be shortened freely.

One corresponding means is to increase the maximum deflection angle of the cathode ray tube. The maximum deflection angles that have been put into practice at the present time are 114 degrees in the case of a cathode ray tube of a single electron beam and about the same in a cathode ray tube of an inline three electron beam. Increasingly, the increase of the maximum deflection angle increases the maximum magnetic flux density of the deflection magnetic field, and is practically limited to the diameter of the neck of the cathode ray tube. The diameter of the neck portion is to save power to generate the deflection magnetic field, to save the material of the mechanism portion to generate the deflection magnetic field, and the maximum diameter of about 40mm is easy to use.

In general, the maximum diameter of the electrode of the electron gun is smaller than the inner diameter of the neck portion of the cathode ray tube, and the thickness of the inner portion of the electrode portion is required to have a thickness of several mm for mechanical strength, insulation, and leakage prevention of X-rays. In the present invention, in consideration of the limitations of the electrode and the electric field relationship described in the above item 7, the non-uniform electric field is formed in the deflector continuum to correct deflection aberrations. The optimum diameter of the narrow portion is 1.5 times or less of the opening diameter in the direction perpendicular to the scanning line of the portion facing the focusing electrode of the anode of the electron gun, or between 0.5 and 30 mm, thereby providing a good cost effect and exhibiting characteristic effects.

In the present invention, the formation of an uneven electric field can be achieved even by the opposite electrode structure with the path of the electron beam interposed therebetween.

70 is an explanatory view of the configuration of the deflection aberration correction electrode, (a) is a partial cross-sectional view of the cylindrical electrode, (b) is a front view of the cylindrical electrode, (c) is a side view of the electrode of the parallel plate, (d) is (E) is a top view of a parallel plate electrode.

71 is a layout view of a cylindrical electrode and a parallel plate electrode (deflection aberration correcting electrode) for forming non-uniform electric field formation.

In order to form a non-uniform electric field, for example, the cylindrical electrodes 67 and (e), (d) and (e) shown in FIG. 70 (a) and (b) are shown in FIG. When two parallel plates as shown are arranged as shown in FIG. 71 and a potential is applied as in the same figure, an uneven electric field is generated between the parallel plates 68.

The parallel flat plate 68 constitutes a deflection aberration correcting electrode, and the shape of the opposing part has a part which is not parallel in part, or a part which is cut off in part, so that the characteristics of the other electrode of the electron gun during use of the cathode ray tube By combining with, the optimum deflection aberration correction is possible.

In particular, in the case where the cathode ray tube is produced in small quantities of various kinds, it is expensive to make expensive press molds in accordance with each specification. The electrodes of the parallel flat plate are slightly inferior in accuracy to shaping the integrated opening by pressing, but can be easily produced by punching and bending the plate-like material. Since expensive press molds are unnecessary, low cost parts can be manufactured even in small quantity batch production.

In the present invention, the optimum dimension range of the opposing portion of the electrode is almost the same as the diameter of the opening of the item 14. Since the structure is opposed, the distance between the two electrodes does not include zero (0). In the case of the cathode ray tube which deflects the scanning line system in the same manner as in the above 14, it is preferable that the opposite direction corresponds to the scanning line direction or the direction perpendicular to the scanning line.

16 When the deflection aberration correcting electrode forming the fixed non-uniform electric field corrects the deflection aberration by immediately causing divergence in response to an increase in the amount of deflection, it is necessary to maintain the potential of the electrode at a higher potential than the adjacent electrode.

In this invention, it is achieved by making the electric potential of the said electrode into the same potential as the fluorescent surface of the said cathode ray tube. In this case, the anode potential of the fluorescent surface and the electron gun may not be the same potential.

By making the electrode have a higher potential than the anode of the electron gun, it is possible to form a nonuniform electric field that is strongly fixed by the potential difference between the anodes of the electron gun.

As one of means for generating a potential difference between the fluorescent surface and the anode of the electron gun, in the present invention, the potential of the fluorescent surface is divided by the voltage division resistance value in the cathode ray tube.

When the fluorescent surface potential and the electron total potential different from each other are controlled from the outside of the cathode ray tube, the correction of the deflection aberration can improve the accuracy.

17 When the deflection aberration correction electrode forming the fixed nonuniform electric field increases the divergence action in response to an increase in the deflection amount and corrects the deflection aberration, it is necessary to maintain the potential of the electrode at a higher potential than the adjacent electrode.

In the present invention, the potential of the electrode is achieved by making the same potential as the anode of the electron gun.

The electric field generated thereby reaches the vicinity of the electrode by appropriately setting the position and structure of the deflection aberration correcting electrode, and can be combined with the action of an appropriate deflection field to correct the deflection aberration corresponding to the amount of deflection. .

The adjacent electrodes having different potentials in the present invention are electrodes that serve as counterparts to form an electric field through openings other than electron beam through holes. The development of penetration through openings other than the electron beam through hole also helps the deflection aberration correction by increasing the divergence action in response to an increase in the amount of deflection.

In the present invention, even if the potential of the fixed deflection aberration correction electrode is different from the potential of each of the fluorescent surface of the cathode ray tube and the anode of the electron gun, it is possible to correct the deflection aberration in response to the increase in the amount of deflection.

For example, when deflection aberration correction is required to increase the divergence of the electron beam, it is possible to correct the deflection aberration in response to an increase in the amount of deflection by providing a potential between the fluorescent surface potential and the anode potential.

If deflection aberration correction is required to increase the focusing effect of the electron beam, the deflection aberration correction is increased by increasing the focusing action in response to an increase in the deflection amount by disposing an electrode having a potential lower than the anode potential inside or near the anode of the electron gun. It becomes possible. In the present invention, a potential lower than the anode potential is generated by dividing another potential inside the cathode ray tube by a resistor as described in section 17, thereby making the dedicated power supply unnecessary.

In the present invention, the potential lower than the anode potential is supplied from the outside of the cathode ray tube to simplify the process conditions such as spot knocking when the cathode ray tube is manufactured.

In the present invention, since the potential lower than the anode potential is the potential of the focusing electrode of the electron gun, a dedicated power supply is unnecessary.

19 In the present invention, when the cathode ray tube is used in an image display device by generating the potential of the focusing electrode of the electron gun by dividing another potential into a resistor inside the cathode ray tube as described in 17, the apparatus focuses. Since the power supply of the voltage can be omitted, the cost can be reduced.

20 As described in 11 above, in the case of correcting the deflection aberration by forming a fixed non-uniform electric field in the deflection field, it is preferable that the non-uniform electric field is effective even by a relatively low electric field due to the practicality. A moderate thickness is required in this area.

In general, the larger the diameter of the electron beam in the cathode ray tube is near the main lens. The deflection aberration correction electrode is constrained by the distance from the main lens to the position. The position of the deflection aberration correction electrode is constrained by the distance from the deflection magnetic field as described in paragraphs 7 to 10 above. Therefore, the position of the main lens is restricted to the distance from the deflection magnetic field.

In the cathode ray tube, especially in the in-line color water tube, color display tube, etc., the deflection magnetic field of the electron beam is uneven because of the simple adjustment of the convergence. In such a case, in order to suppress the deformation of the electron beam due to the deflection magnetic field, the main lens should preferably be separated from the deflection magnetic field generating part as much as possible, so that the deflection magnetic field generating part is usually provided at a position closer to the fluorescent surface than the main lens of the electron gun.

21 In the present invention, when the deflection aberration correction is performed by forming an unbalanced electric field fixed to the deflector continuity, the deflection field generator and the main body are formed by foreseeing the deformation of the electron beam by the uneven deflection field in advance. Enable lens access.

In the present invention, when the maximum deflection angle of the cathode ray tube is 100 ° or more, the optimum distance from the end of the magnetic material constituting the core of the coil that generates the deflection magnetic field away from the fluorescent surface of the magnetic material and the connection electrode facing surface of the electron gun anode is Within 60mm.

22 On the other hand, the length between the cathode of the electron gun and the main lens is preferably longer in order to reduce the image magnification of the electron gun and to reduce the beam spot diameter on the fluorescent surface.

Therefore, a cathode ray tube with a good resolution corresponding to these two effects necessarily incurs a length of tube axis.

However, according to the present invention, by keeping the position of the main focusing lens close to the fluorescent surface without changing the length between the cathode of the electron gun to the main lens, the image magnification of the electron gun can be further reduced to further reduce the electron beam spot diameter on the fluorescent surface. In addition, the tube length can be shortened at the same time.

Since the position of the 23 main lens is closer to the fluorescent surface, the time for which the reaction of the space charge in the electron beam is continued is shortened, so that the beam spot diameter on the fluorescent surface can be further reduced.

In order to carry out the contents similar to the above-mentioned 21 to 23 more precisely, in the present invention, the optimum distance between the deflection magnetic field and the main lens when the maximum deflection angle of the cathode ray tube is 100 ° or more is the deflection; The magnetic continuation of 25% or more of the maximum magnetic flux density of the magnetic field deflected in the magnetic field type scanning line direction or the direction perpendicular to the scanning line includes a part included in the main lens opposing portion of the electron gun anode.

25 In order to carry out the same contents as described in 21 to 24 more precisely, in the present invention, the optimum distance between the deflection magnetic field and the main lens when the maximum deflection angle of the cathode ray tube is 100 ° or more, the cathode ray tube When the magnetic flux density of the magnetic field deflected in the scanning line direction or the direction perpendicular to the scanning line in the deflection magnetic field is opposite to the main lens of the E-bolt and electron gun anode, the value of B divided by the square root of E is the anode. This includes more than 0.004 millitesla per volt of voltage.

26 In the same manner as described in 21 to 25 above, the optimum distance between the deflection magnetic field and the main lens of the electron gun in the present invention when the maximum deflection angle of the cathode ray tube is 85 ° or more but less than 100 ° is 21. The portion corresponding to the 23 to 23 is 0.03 millis. Or more.

27. In the same manner as in 21 to 25, the optimum distance between the deflection field and the main lens of the electron gun in the present invention when the maximum deflection angle with the cathode ray is less than 85 ° is 21 to 23. The portion corresponding to is within 170 mm, the portion corresponding to 24 is at least 5%, and the portion corresponding to 25 is at least 0.005 milles Tesla.

28 As can be seen from 21 to 27, the present invention can shorten the optimum distance between the deflection magnetic field and the main lens of the electron gun, unlike the prior art.

The optimal position of the neck portion of the cathode ray tube and the main lens of the electron gun in the present invention is that the position of the main lens facing surface of the electron gun anode is less than 15 mm from the fluorescent surface opposite to the fluorescent surface side of the neck portion. to be.

In the prior art, since the position of the electron gun lens is separated from the deflection magnetic field, the potential supply to the electron gun anode is performed from the inner wall of the neck portion of the upper cathode ray tube.

In the present invention, the position of the electron gun lens does not need to be separated from the deflecting force, and since it can be installed near the fluorescent surface, the potential supply to the electron gun anode can be provided from outside the inner wall of the neck of the cathode ray tube.

In the cathode ray tube, high electric field is formed in a narrow space, so stabilization of withstand voltage characteristics is one of the important technologies to stabilize the quality. The maximum field strength is near the electron gun lens. The electric field in the vicinity also depends on the graphite film applied to the inner wall of the neck portion of the cathode ray tube supplied to the electron gun anode and the adhesion of foreign matter remaining in the cathode ray tube to the inner wall of the neck portion.

In the present invention, it is also possible to set the electron gun lens on the fluorescent surface side rather than the neck portion, and can significantly stabilize the shockproof characteristics.

In many cathode ray tubes, the cathode serving as the emission source of the electron beam is often operated by heating with an electric heater. The heat of the heater is also transmitted to the deflection magnetic field generating mechanism via the neck of the cathode ray tube, thereby raising the temperature. Organic materials are used in some parts of the mechanism, and insulation may cause inconveniences when overheated.

In the present invention, the position of the electron gun lens does not need to be separated from the deflection magnetic field and can be installed when the fluorescent surface is approached, so that the distance between the heater and the mechanism is shortened, and the mechanism is easily overheated.

Usually, the maximum temperature that can be used for the mechanism part is 110 ° C. due to the nature of the material used. Since the mechanism part is usually designed by adding a part that self-heats at room temperature of 40 ° C., heat transfer from the neck part needs to be suppressed. .

In order to avoid the overheating, power saving of the heater is required. In order to maintain the temperature within the present invention, it is important that the optimum power consumption of the heater is 3 watts or less per cathode.

30 When the electron beam spot is located in the center of the fluorescent surface, it is not affected by the deflection magnetic field. Therefore, the countermeasure against deformation by the deflection magnetic field becomes unnecessary. Therefore, the lens action of the electron gun becomes the focusing system of the rotating target, and the electron beam spot diameter on the fluorescent surface becomes smaller. can do.

31. In the present invention, in addition to correcting the deflection aberration by forming a fixed non-uniform electric field in the deflector, by applying a dynamic voltage corresponding to deflection to a part of the electrode of the electron gun, the focusing of the electron beam appropriate in the entire region of the fluorescent surface is further improved. It is possible to obtain the function and obtain a good resolution characteristic in the entire area of the fluorescent surface. It is also possible to lower the required dynamic voltage.

32. In the present invention, in addition to correcting the deflection aberration by forming a non-uniform electric field fixed in the above-mentioned unbiased magnetic field, at least one of the electric fields made by a plurality of electrostatic lenses composed of a plurality of electrodes constituting the electron gun is converted into a non-rotating symmetric electric field. Therefore, the shape of the electron beam spot in the large current area of the screen center portion of the fluorescent screen is approximately circular or approximately quadrangular, and the proper focus voltage acting in the electron beam scanning direction is higher than the proper focus voltage acting in the direction perpendicular to the scanning direction. The electrostatic lens having the focus characteristic and the diameter of the scanning direction and the direction perpendicular to the scanning direction diameter of the electron beam spot in the small current region at the center of the fluorescent surface are adapted to the shadow mask pitch and the scan line density in the direction perpendicular to the scanning direction. The proper focus voltage acting in the scanning direction acts in a direction perpendicular to the scanning direction. An electrostatic lens having a focus characteristic higher than the positive focus voltage is formed, and the lens by the non-rotationally symmetric electric field causes the electron beam to have a good focus characteristic without moiré in the entire region on the screen of the fluorescent screen and in the entire current region. .

In addition, non-rotational symmetry used in this invention means the thing other than what can be displayed as the trajectory of the equidistant point from a rotation center like a circle. For example, non-rotationally symmetric beam spot refers to a non-circular beam spot.

34 As described in 28 above, in the present invention, in order to form a fixed non-uniform electric field in the deflection field and correct the deflection aberration, the main lens of the electron gun can be used closer to the deflection field used in the cathode ray tube than in the prior art. have.

Since the deflection magnetic field also penetrates into the main lens of the electron gun, a structure in which the electron beam does not step away is indispensable in the whole country closer to the fluorescent surface than the main lens. In the case of the electron gun using an inline arrayed three electron beam having a plurality of electrodes, the optimum design of the present invention is the single hole of the three electron beam common without the interception of the hole through which the three electron beam of the shield cup passes. At the same time, an electrode for correcting the deflection aberration by forming a non-uniform electric field fixed in the deflection field is provided on the fluorescent surface side rather than the passage hole of the electron beam in the bottom of the shield cup, and fixed in the anode of the shield cup and the electron gun and the deflection field. In the case where the electrode for correcting the deflection aberration is formed by forming a nonuniform electric field having the same electric field, the electric field penetration between the connecting electrode which is the adjacent electrode having a different electric potential for generating the electric field is promoted, so that the uniformity of the resolution in the entire fluorescent surface area is achieved. Enable inclination.

In the case of using an inline-arranged three-electron beam as an electron gun having a plurality of electrodes, it is important to enlarge the aperture diameter of the electron gun main lens for the same reason as in the above section 34.

In the present invention, since a deflection aberration is corrected by forming a nonuniform electric field fixed in the deflector, an opening diameter in the inline direction perpendicular to the main lens opposing portion of the electron gun anode passes through an adjacent electron beam of the three inline arrayed electron beams. In order to improve the uniformity of the resolution in the entire fluorescent surface area, the field penetration between the focusing electrode, which is the adjacent electrode having different potentials, which causes the development, is increased by 0.5 times or more of the narrowest gap among the openings of the plurality of electrodes. To make it possible.

In the case of using an in-line-arranged three-electron beam as an electron gun having a plurality of electrodes, in the optimum design of the present invention, in order to further enhance the electric field penetration, the structure of the opening of the electron beam lens is This includes the electric field common to the three electron beams.

37. In the present invention, in order to correct a deflection aberration by forming a fixed nonuniform electric field in the deflection magnetic field by using an inline-arrayed three electron beam as a electron gun having a plurality of electrodes, among the three electron beams of the electrode forming the fixed electric field. By making the structure corresponding to the central electron beam and the portion corresponding to the side electron beam different, the resolution can be balanced between the three electron beams on the fluorescent surface.

In addition, coma aberration due to a deflection magnetic field can be reduced by making the portion of the three electron beams of the electrode forming the fixed non-uniform electric field corresponding to the side electron beam different from the central electron beam in the inline direction.

Although the effects of the individual techniques of the present invention have been described above, by combining two or more of the techniques, the cathode ray tube further improves the uniformity of the resolution in the entire fluorescent surface area and the resolution improvement in the cathode current region in the center of the fluorescent surface. It is possible to shorten the tube axis of the tube.

The use of the cathode ray tube makes it possible to improve the resolution in the fluorescent whole surface area and to improve the resolution and short the depth in the front cathode current area in the center of the fluorescent surface.

Next, since the electron gun according to the present invention is used, the mechanism for improving the focus characteristic and resolution of the cathode ray tube will be described.

72 is a schematic diagram illustrating a cross-sectional view of a shadow-mast color cathode ray tube with an inline electron gun, wherein (7) is a neck, (8) is a funnel and (9) is an electron gun housed in a neck (7), (10) ) Is an electron beam, 11 is a deflection yoke, 12 is a shadow mask, 13 is a fluorescent film constituting a fluorescent surface, and 14 is a panel (screen).

In the same figure, this type of cathode ray tube passes through the shadow mask 12 while deflecting the electron beam 10 emitted from the electron gun 9 in the horizontal and vertical directions by the deflection yoke 11 to form a fluorescent film ( 13) is emitted and the pattern by the emission is observed as an image from the panel 14 side.

73 is an explanatory view of the Zaza beam spot when the periphery of the screen is emitted by a circular Zaza beam spot in the center of the screen, (14) is a screen, (15) is a beam spot at the center of the screen, ( 16, beam spot at the horizontal end of the screen (XX direction), (17) is a group, (18) beam spot at the screen vertical direction (YY direction) end, (19) diagonal screen (corner) The beam spot at the end is displayed.

FIG. 74 is an explanatory diagram of the deflection field distribution of the cathode ray tube, where H denotes a horizontal deflection field distribution, and V denotes a vertical deflection field distribution.

In a recent color cathode ray tube, in order to simplify the convergence adjustment, as shown in FIG. 74, a horizontal deflection field H is used as a pin-ku-type and a vertical deflection field V is a barrel-shaped uneven magnetic field distribution.

Due to such magnetic field distribution, the orbital length from the main lens of the electron gun of the electron beam 10 to the fluorescent surface is different in the central portion of the fluorescent surface (screen) and its surroundings, and at the periphery of the screen, the electron beam 10 is the fluorescent film 13 ), The shape of the light emitting spot by the electron beam 10 is not circular at the periphery of the screen.

As shown in FIG. 73, the beam spot 16 at the horizontal end is crossed while the spot 15 at the center is circular, and a group 17 is generated. For this reason, the size of the beam spot 16 at the horizontal end is increased, and the outline of the spot 10 becomes unclear due to the generation of the crowd 17, resulting in poor resolution and remarkably deteriorating the image quality.

When the current of the electron beam 10 is small, the diameter of the electron beam 10 in the vertical direction is excessively reduced, causing optical interference with the pitch of the shadow mask 12 in the vertical direction. Will cause degradation.

In addition, the spot 18 at the end of the hydration softening direction is concentrated in the vertical direction (vertical direction) by the deflecting magnetic field in the vertical direction, and becomes a shape of crushing, and a bunch 17 is generated. This results in deterioration of image quality.

In the corner portion of the screen, the electron beam spot 19 is traversed like the spot 16 and the crushed like the spot 18 acts synergistically, and the rotation of the electron beam 10 is performed. This occurs, and the light emitting spot diameter itself becomes large as well as the generation of the bunch 17, resulting in a significant decrease in image quality.

FIG. 75 is a schematic diagram of the electron optical system of the electron gun for explaining the above-described deformation of the electron beam spot image. In order to facilitate understanding, the electron optical system is replaced with an optical system.

In the same figure, the vertical (Y-Y) cross section of the screen is displayed in the upper half of the figure, and the horizontal (X-X) cross section of the screen is displayed in the lower half.

(20) and (21) are prefocus lenses, (22) are the predecessor lenses, and (23) are the main lenses, and these lenses constitute an electron optical system corresponding to the electron gun 9 of FIG. In addition, reference numeral 24 denotes a lens generated by a vertical parallel magnetic field, and 25 denotes a lens generated by a horizontal deflection magnetic field, and the electron beam due to deflection is obliquely rotated with respect to the fluorescent film 13 so that it is enlarged in the horizontal direction in appearance. Is represented as an equivalent lens.

First, the electron beam 27 of the vertical cross section of the screen emitted from the cathode K forms a crossover P between the prefocus lenses 20 and 21 at a distance l1 from the cathode K, and then the front main lens 22 Is focused toward the fluorescent film 13 by the main lens 23.

In the center of the screen where the deflection is zero, it passes through the orbit 28 and is turned to the fluorescent film 13, but in the periphery of the screen, it passes through the orbit 29 by the action of the lens 24 generated by the vertical deflection field. It becomes the night spot of the crushing. In addition, since the main lens 23 has spherical aberration, some of the electron beams focus before reaching the fluorescent film 13 as indicated by the orbit 30. This is the reason why the group 17 of the beam spots 18 at the end of the screen vertical direction as shown in FIG. 73 or the group 17 of the beam spots 19 at the corners are generated.

On the other hand, the electron beam 31 of the horizontal cross section of the screen emitted from the cathode K is similar to the electron beam 27 of the vertical cross section, and the prefocus lens 20, 21, the front main lens 22, The screen is focused by the main lens 23, and in the center portion of the screen where the action of the deflection crab is zero, passes through the trajectory 32 and is carried out to the fluorescent film 13.

Even in the region where the deflection magnetic field acts, a spot crosses the trajectory 33 for the diverging action of the lens 25 by the horizontal deflection magnetic field, but there is no excessive force in the horizontal direction.

However, since the distance between the main lens 23 and the fluorescent film 13 becomes larger compared to the center of the screen, even in the horizontal end portion 16 of FIG. 73 without vertical deflection, Since some of the electron beams focus before the fluorescent film 13 arrives, a bunch 17 occurs.

In this way, in a rotationally symmetric lens system in which the lens system of the electron gun has the same structure in both the horizontal and vertical directions, if the spot shape of the electron beam in the center of the screen is circular, the spot shape of the electron beam in the periphery of the screen is reflected. Discard the image quality significantly.

76 is an explanatory diagram of a means for suppressing the deterioration of the image quality in the peripheral portion of the screen described in FIG. 75, wherein the same reference numerals in FIG. 75 correspond to the same parts.

As shown in the figure, the focusing action of the main lens 23-1 in the vertical (Y-Y) cross section of the screen is weaker than the main lens 23 in the horizontal (X-X) cross section. As a result, the trajectory of the electron beam remains as shown in the trajectory 29 shown in the drawing even after passing through the lens 24 generated by the vertical deflection magnetic field, resulting in an extreme horizontal distortion as described in FIG. 73. Does not occur and it is difficult to generate a bunch 17. However, the trajectory 23 in the center of the screen moves in the direction of increasing the spot diameter of the electron beam.

FIG. 77 is a schematic diagram illustrating the electron beam spot shape of the fluorescent surface 14 when the lens system shown in FIG. 76 is used, and the beam spot 16 at the horizontal end and the beam spot 18 at the vertical end are shown in FIG. And the crowd 17 is suppressed in the beam spot 19 of the corner portion, that is, the beam spot in the periphery of the screen, so that the resolution of these locations is improved.

However, looking at the beam spot 15 in the center of the screen, the spot diameter dY in the vertical direction is larger than the spot diameter dx in the horizontal direction, and the resolution in the vertical direction is lowered.

Therefore, a non-rotationally symmetric electric field having a structure in which the main lens 23 has a different connection effect in the vertical and horizontal directions of the main lens 23 cannot be a fundamental solution for the purpose of simultaneously improving the resolution of the entire screen.

FIG. 78 is a schematic diagram of an electron optical system of an electron gun in which the lens intensity of the main lens 23 is made non-rotationally symmetric, and the intensity of the horizontal (XX) lens of the prefocus lens 21 is enhanced. The intensity of the horizontal prefocus lens 21-1 to diverge is made larger than that of the vertical prefocus lens 21, the incident angle of the electron beam 31 to the front main lens 22 is increased, and the main lens ( By increasing the diameter of the electron beam passing through 23, the electron beam spot diameter in the horizontal direction in the fluorescent film 13 can be reduced. However, since the electron beam trajectory in the screen vertical direction is the same as that shown in FIG. 75, there is no suppression effect of the crowd 28.

FIG. 79 is a schematic diagram of an electron optical system of an electron gun which adds a depressive effect to the configuration of FIG. 77, by increasing the lens intensity in the vertical direction (YY) as indicated by the main lens (22-1). The electron beam trajectory in the vertical direction of the main lens 23 approaches the light side, becoming a deep imaging system with a depth of focus, and the group 28 becomes inconspicuous and the resolution is improved.

80 is a schematic diagram illustrating the spot shape of the electron beam on the screen 14 when the lens system having the configuration shown in FIG. 79 is used. Beam spots 15, 16, 18, and 19 As shown by), it is possible to obtain a good resolution without any difficulty over the entire screen area.

The above is the description of the electron beam spot shape when the current amount of the electron beam is relatively large (large current region). However, when the current amount of the electron beam is small (small current region), the trajectory of the electron beam is the paraxial axis of the imaging system. ), The effect of the difference in the horizontal lens intensities of the lenses 21, 22, and 23 with large apertures is small, and (34), (35), (36) (37) in FIG. As indicated by), the beam spot is circular (34) at the center of the screen, and is horizontal (35), (36) or oblique (37) at the periphery of the screen, causing the occurrence of overcrowding. The resolution decreases due to the increase in the horizontal diameter (horizontal direction diameter).

As a countermeasure, it is necessary to cope with a lens of a portion where the lens diameter is small and the non-rotational symmetry of the lens intensity affects the near axis of the imaging system.

FIG. 81 is a schematic diagram of an electron gun optical diagram explaining the trajectory of an electron beam at a small current. In this case, the distance 12 from the cathode K to the crossover point P is closer to the cathode K than the same distance l1 in FIG. It becomes

FIG. 82 is a schematic diagram showing the optical system of the electron gun when the lens intensity in the screen vertical direction (YY) toward the divergent lens side of the prefocus lens is enlarged. FIG. 82 is a vertical intensity of the divergent lens constituting the prefocus lens 20. FIG. By increasing, the distance l3 from the cathode K of the crossover P becomes longer than the above l2.

For this reason, the position where the electron beam 27 of the vertical cross section enters the prefocus lens 21 becomes more paraxial than in the case of FIG. 81, and the lenses of the lenses 21, 22-1, and 23 are The effect becomes small and results in an image forming system having a deep depth of focus in the vertical direction of the screen.

However, the effect of each lens at high current and at low current is not completely independent, and the lens effect of the prefocus lens 20-1 in the vertical direction of the same plane affects the spot shape of the electron beam at high current. Therefore, it is necessary to make use of the characteristic of each lens to make a balanced system of the whole. In particular, since the structure of the main lens or which item of image quality is to be improved further depends on the application of the cathode ray tube, the position of the non-rotationally symmetric lens and the respective lens intensities are unique. Is not.

As described above, in a typical cathode ray tube application, in order to improve the resolution in the entire current region, it is necessary to provide a lens for forming a non-rotationally symmetric electric field at different portions by the large current region and the small current region. In addition, the non-rotational symmetry of each lens has a limit in the change of the electric field strength, and depending on the lens portion, increasing the intensity of the non-rotational symmetric electric field causes extreme deformation of the beam shape, resulting in a decrease in resolution. do.

The above is a general means for suppressing the deterioration of the focus characteristic due to the spot deformation of the electron beam.

In reality, for this purpose, in the electron gun, as described above, the focus voltage is used in a fixed state, and the optimum focus voltage at the position is dynamically changed according to the deflection angle of the electron beam on the screen of the cathode ray tube. There is a way of supplying.

Each of the two approaches has its advantages and disadvantages. The method of using the focus voltage in a fixed state has a low cost of the electron gun and a simple power supply circuit for supplying the focus voltage, and a low cost of the circuit. However, each position on the screen of the cathode ray tube for astigmatism correction is performed. Since it is not possible to achieve the optimum focus state for each, the diameter of the beam spot becomes larger than the optimum focus state.

On the other hand, the method of dynamically supplying the optimum focus voltage at the position according to the deflection angle of the electron beam on the screen of the cathode ray tube can obtain a good focus characteristic at each point on the screen, while supplying the structure and focus voltage of the electron gun. The power supply circuit is also complicated, and the cost is increased because time is required for setting the focus voltage in the assembly line of the television set or the display terminal.

The present invention provides a cathode ray tube using an electron gun which has the advantages of each of the above two methods, and also eliminates the disadvantages and also has a third advantage of shorter tube length.

EMBODIMENT OF THE INVENTION Hereinafter, implementation of this invention is described in detail with reference to drawings.

In the cathode ray tube, as described in FIG. 66, as the amount of deflection increases. Deflection aberration increases rapidly.

The present invention forms a non-uniform electric field in which the electron beam is deflected and the path of the electron beam changes when the trajectory changes, thereby enabling the proper focusing of the electron beam to uniform the resolution on the fluorescent surface. It is to improve sex.

Further, in the present invention, when the electron beam is deflected and the trajectory is shifted, the deflection amount is formed by forming a nonuniform electric field in which the deflection aberration correction amount is accelerated in accordance with the deflection amount as described in FIG. In this way, the deflection aberration rapidly increases as shown in FIG. 66, and the proper focusing of the electron beam is possible in the entire region of the fluorescent surface. As a result, the uniformity of the resolution can be improved in the entire area of the fluorescent screen.

Located in the deflector continuum, an electric field with astigmatism is effective as one of the nonuniform electric fields in which the focusing or diverging action of the electron beam is properly accelerated according to the amount of deflection when the deflected electron beam changes its trajectory.

An electric field with astigmatism is formed by an electric field with two orthogonal planes of symmetry.

As the symmetry plane moves from the center to the end, the amount of focusing or diverging of the electron beam increases.

FIG. 1 is a schematic diagram illustrating a first embodiment of a deflection aberration correction method for a cathode ray tube according to the present invention, and shows an example of distribution on one symmetrical plane of an astigmatism electric field having a diverging action of an electron beam.

In the same figure, reference numeral 61 denotes an equipotential line, 62 denotes an electron beam passing through the center of the electric field, and 63 denotes an electron beam passing through a portion away from the center of the electric field, which is formed by the equipotential line 61. The state comparison of the electron beam 62 passing through the center of the electron beam 63 passing through the portion from the center of the electric field is shown.

The electron beam 63 passing through the portion away from the center of the electric field has a larger divergence than the electron beam 62 passing through the center of the electric field as the electric continuation proceeds, and the entire trajectory approaches the end of the electric field. In addition, the way of changing the trajectory is larger near the end of the electric field.

This is because the distance between the equipotential lines 61 becomes narrower as it is separated from the axis of symmetry Z-Z of the electric field.

Such a heterogeneous electric field is formed in the deflector continuum, and when the electron beam is deflected and its trajectory is changed, the divergence of the electron beam is accelerated according to the deflection amount, and deflection aberration correction is possible when the deflection aberration strengthens the electron beam focusing. Let's do it.

For example, as shown in FIG. 68, in the cathode ray tube, the distance from the main lens of the electron gun to the fluorescent surface is generally longer than the fluorescent surface center, so that the electron beam is in the center of the fluorescent surface even when there is no focusing action in the deflection field. Optimal focusing results in overfocusing around the fluorescent surface.

In this embodiment, since a fixed electric field as shown in FIG. 1 is formed in the deflection magnetic field, the divergence action increases as the amount of deflection increases, and deflection aberration correction as shown in FIG. 67 is possible.

2 is a schematic diagram illustrating a second embodiment of the deflection aberration correction method for a cathode ray tube according to the present invention, which is an example on one symmetrical surface of an astigmatism electric field in which an electron beam has a focusing action.

In the same drawing, the states of the electron beam 62 passing through the center of the electric field formed by the equipotential lines 61 and the electron beam 63 passing through the part away from the center of the electric field are compared.

The electron beam 63 passing through the portion away from the center of the electric field has a larger focusing amount compared to the electron beam 62 passing through the center of the electric field as the electric continuation proceeds, and also the deflector field

The entire trajectory also approaches the center of the electric field. In addition, the change in the orbit is larger near the end of the electric field because the distance between the equipotential lines 61 becomes narrower as it falls from the axis of symmetry (Z-Z) of the electric field.

By forming such a non-uniform electric field in the deflector continuity, when the electron beam is deflected and its trajectory changes, the focusing action of the electron beam is accelerated according to the amount of deflection, and the deflection aberration correction is made possible when the deflection aberration strengthens the divergence of the electron beam. do.

In the deflection of the cathode ray tube, there are many methods of scanning the electron beam in a straight line as shown in FIG. The linear scan trajectory 60 is called a scan line. The deflection magnetic field is often different in the direction of the scanning line and in the direction perpendicular to the scanning line.

Also, even if the electron beam is different from the scanning line direction and the scanning line in a direction perpendicular to the scanning line by at least one action of the plurality of electron gun electrodes, before receiving the action of the fixed non-uniform electric field formed on the deflector continuum. many.

In addition, weighting differs depending on the use of the cathode ray tube whether the correction of the deflection aberration correction in the scanning line direction or the correction of the deflection aberration in the direction perpendicular to the scanning line is important. Therefore, the contents of the fixed astigmatism field formed on the deflector continuum for correcting the deflection aberration to improve the uniformity of the resolution in the entire fluorescent surface are not exceptional. Depending on the direction of the scanning line and the direction of correction, the content of correction and the amount of correction, the corresponding description and the required price are not necessarily the same. It is important to clarify and respond to the contents in accordance with each situation in realizing the improvement of characteristics and the low price as an image display apparatus.

In a third embodiment of the method for correcting the deviation of a cathode ray tube according to the present invention, a nonuniform electric field as shown in Figs. 1 and 2 is formed in the deflector continuum, and the scanning line direction or the direction perpendicular to the scanning line Deflection aberration correction.

In the correction of the deflection aberration, when the distribution of the vertical deflection field and the horizontal deflection field are displaced, and the change in the trajectory of the electron beam by the deflection field on the side farther away from the main lens is still smaller, the closer to the main lens When the trajectory change of the electron beam due to the deflecting magnetic field of the distributing side is still small, the trajectory change of the electron beam due to the deflecting magnetic field of the distributing side closer to the main lens can correct the deflection aberration corresponding to the deflection amount. If so, the electron beam passes through a trajectory on a vertical or horizontal plane passing through the approximately central axis of the electron gun at this point.

Non-uniform in the tube axis direction of the cathode ray tube, and the rotationally symmetric electric field in the central axis of the electron gun becomes substantially the same as the electric field distribution in FIGS. 1 and 2 in a plane including the central axis of the electron gun.

Therefore, in the present invention, the deflection aberration correction in the direction of the deflection field having a distribution that is displaced between the vertical deflection field and the horizontal deflection field is closer to the main lens of the electron gun, and forms a nonuniform electric field fixed to the deflector continuation. In the case of a corresponding amount, the non-uniform electric field is nonuniform in the direction of the tube axis of the cathode ray tube, and is a rotationally symmetric electric field with respect to the central axis of the electron gun, and corrects deflection aberration in the direction of the scan line or the direction perpendicular to the scan line. .

In the color cathode ray tube in which the three electron beams are arranged inline in the horizontal direction, a barrel type has a magnetic field distribution and a horizontal field in the vertical deflection field as shown in FIG. 74 to simplify the circuit for controlling the concentration of the three electron beams on the fluorescent surface. As the deflection magnetic field, a magnetic field distribution of a pin sphere electrode linear is used, respectively. Of the three electron beams in the in-line array, the amount of deflection aberration received by the vertical deflection magnetic field varies depending on the strength of the vertical deflection magnetic field and the direction of the horizontal deflection. For example, looking at the cathode ray tube from the fluorescent surface side, the deflection aberration amount is different because the magnetic field distribution of the deflecting magnetic field passing through is different in the case where the inline right electron beam is deflected to the left and to the right of the fluorescent plane. Image quality is reduced in the left and right corners on the fluorescent surface. In such a case, the formation of a coma aberration field fixed to the deflector continuity is effective for correcting the deflection aberration of the side electron beam. An electric field with coma aberration has only one plane of symmetry.

3 is a schematic diagram explaining the fourth embodiment of the deflection aberration correction method of the cathode ray tube according to the present invention, and is an example on the symmetrical plane of a coma aberration electric field having an electron beam divergence action.

In the same figure, in the state comparison of the electron beam 62 passing through the center of the electric field formed by the equipotential lines 61 and the electron beam 63-2 passing through the part away from the center of the electric field, it is separated from the center of the electric field. The electron beam 63-2 passing through the portion has a larger divergence than the electron beam 62 passing through the center of the electric field as the electric continuation proceeds, and the entire trajectory also approaches the end of the electric field.

In addition, the way of changing the orbit is larger near the end of the electric field. This is because the interval between the equipotential lines 61 becomes narrower as the distance from the axis of symmetry z-z decreases. The electron beam 63-3, which passes through the portion away from the center of the electric field, also has a greater divergence than the electron beam 62 as the electron beam 63-2 proceeds continuously, and the entire trajectory approaches the end of the electric field. In addition, the method of changing the orbit is also closer to the end of the electric field, but the changing method is smaller than that of the electron beam 63-2.

This is because the spacing of the equipotential lines 61 is not so narrow even when away from the axis of symmetry Z-Z of the electric field. As such a non-uniform electric field is formed in the deflection flux and the electron beam is deflected and its trajectory changes, the method of accelerating the divergence of the electron beam according to the amount of deflection depends on the direction of deflection, so that the amount of deflection aberration depends on the direction of deflection. Deflection aberration correction for other focusing actions. In practice, the structure of the cathode ray tube including the maximum deflection angle, the savior of the framed deflection field generator, the electrode forming the non-uniform electric field, the electron gun structure of the nation forming the non-uniform electric field, the driving conditions of the cathode ray tube It is not unique because it depends on the use of cathode ray tube.

4 is a schematic diagram illustrating a fifth embodiment of the deflection aberration correction method of a cathode ray tube according to the present invention, which is an example on the symmetrical plane of a coma aberration electric field, which is focused on an electron beam, and is formed by an equipotential line 61. It is a state comparison between the electron beam 62 passing through the center of the electric field and the electron beams 63-4 and 63-5 passing through a portion away from the center of the electric field.

The electron beam 63-4 has a larger focusing amount than the electron beam 62 as the electron beam 62 proceeds, and the entire trajectory also approaches the center of the electric field. The changing shape of the orbit is also closer to the end of the electric field. This is because the spacing of the equipotential lines 61 narrows away from the axis of symmetry Z-Z of the electric field. The electron beam (63-5) passing through the portion away from the center of the electric field also has a larger focusing amount compared to (62) as the electron beam (63-4) proceeds to carry forward, and the entire orbit also approaches toward the end of the electric field. In addition, the way of changing the trajectory is also closer to the end of the electric field, but the changing method is smaller than that of the electron beam 63-4. This is because the spacing of the equipotential lines 61 is not very narrow apart from the axis of symmetry Z-Z of the electric field.

Such a non-uniform electric field is formed in the deflector continuum, and when the electron beam is deflected and its trajectory is changed, the method of accelerating the focusing action of the electron beam depends on the deflection direction, so that the deflection aberration amount depends on the deflection direction. Therefore, deflection aberration correction in case of different divergence action. In practice, the structure of the cathode ray tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating unit, the electrode forming the non-uniform electric field, the electron gun structure other than the electrode forming the non-uniform electric field, the driving conditions of the cathode ray tube, the cathode ray It is not unique because it depends on the use of the pipe.

In the color cathode ray tube in which the three electron beams are arranged inline in the horizontal direction, a barrel-shaped magnetic field distribution in the vertical deflection field and a pincu in the horizontal deflection field are used to simplify the circuit for controlling the concentration of the three electron beams on the fluorescent surface. Each linear magnetic field distribution is used.

In such a color cathode ray tube, the direction of the inline array, that is, the horizontal direction, is the scanning line direction. Of the three electron beams in the in-line array, the amount of deflection aberration received by the vertical deflection field depends on the strength of the vertical deflection field and the direction of the horizontal deflection. For example, the amount of deflection aberration is different because the magnetic field distribution of the deflecting magnetic field passing through is different in the case where the inline right electron beam is deflected to the left of the fluorescent plane and to the right when the cathode ray tube is viewed from the fluorescent surface. In another embodiment of the present invention, a comma aberration field such as FIG. 3 or FIG. 4 is formed in the scanning line direction as a non-uniform electric field fixed to a deflector continuity corresponding to both side electron beams in the inline array to correct deflection aberration. . In practice, the structure of the cathode ray tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating unit, the electron gun structure other than the electrode forming the non-uniform electric field to form the non-uniform electric field, the driving conditions of the cathode ray tube, the cathode ray It is not unique because it depends on the use of the pipe.

5 is a cross-sectional schematic diagram illustrating a first embodiment of a cathode ray tube according to the present invention, where 1 is a first electrode G1 of the electron gun, 2 is a second electrode G2, and 3 is a first The three electrodes G3 are already the focus electrodes in this embodiment. Reference numeral 4 denotes the fourth electrode G4, which is an anode in this embodiment. Numeral 7 denotes a neck portion of the cathode ray tube that houses the electron gun, numeral 8 denotes a funnel portion, and numeral 14 denotes a panel portion. These three pieces together constitute a vacuum envelope of the cathode ray tube.

In addition, reference numeral 10 denotes an electron beam emitted from an electron gun, which passes through an opening of the shallow mask 12 and is rounded to the fluorescent film 13 formed on the inner surface of the panel 14 to emit the fluorescent film 13, The display is performed on the screen of the cathode ray tube. Denoted at 11 is a deflection yoke for deflecting the electron beam 10. A magnetic field is generated in synchronism with the video signal controlling the electron beam to control the dead stone position of the fluorescent film 13 in the electron beam 10. FIG.

In addition, reference numeral 38 denotes a main lens of the electron gun, and the electron beam 10 emitted from the cathode K is transferred to the first electrodes G1, 1, the second electrodes G2, 2, and the third electrode G3. After passing through (3), the electron beam 10 is focused on the fluorescent surface 13 by the electric field of the main lens 38 formed between the anode 4 and the anode 4.

39 is located in the magnetic field of the deflection yoke 11 to form a non-uniform electric field, and when the electron beam 10 is deflected in the magnetic field of the deflection yoke 11, the electron beam 10 according to the deflection angle. This electrode corrects the deflection aberration of

In this embodiment, the deflection aberration correcting electrode 39 is electrically connected to the anode 4 and mechanically fixed, and is composed of one and two portions each above and below the vertical direction of the electron beam 10, A non-uniform electric field is formed to diverge to the electron beam 10 passing between the two electrodes. Reference numeral 40 denotes a lead connecting the electrode of the electron gun to a stem pin (not shown).

In the same figure, the distance between the two components constituting the deflection aberration correction electrode 39 is slightly larger than that of the anode 4 on the side of the fluorescent film 13, but in reality, the mounting position of the two parts, the fluorescent film The degree of flare is not unique because it is determined by the combination of the length extending toward (13), the distribution of the deflection magnetic field, the diameter of the electron beam when passing between the two components, and the maximum deflection angle of the cathode ray tube.

As shown, in the present embodiment, the main lens 38 of the electron gun is displayed so as to be closer to the fluorescent film 13 from the deflection yoke mounting position in the deflection magnetic field of the deflection yoke 11. This main lens 38 is not limited to the position shown as long as it is in the magnetic field region of the deflection yoke.

6 is a schematic sectional view illustrating the action of the cathode ray tube according to the present invention, which is located in the magnetic field of the deflection yoke 11 of FIG. 5 to deflect the electron beam 10 in the magnetic field of the deflection yoke 11. At this time, an example of the operation of the deflection aberration correction electrode 39 for forming a non-uniform electric field for correcting the deflection aberration of the electron beam 10 in accordance with the deflection angle will be described in detail.

In this example, the heterogeneous field diverges to the electron beam 10. Parts of the same function as those in FIG. 1 are given the same reference numerals. Reference numeral 38 denotes a main lens, 41 denotes a partial electrode constituting the fourth electrodes G4 and 4, and L1 denotes a distance between the main lens 38 and the deflection center.

7 illustrates the deflection aberration correction electrode 39 in order to explain the operation of the deflection aberration correction electrode 39 which is a non-uniform field-forming electrode in the cathode ray tube according to the embodiment of the present invention. It is a principal cross-sectional schematic diagram similar to FIG.

6 and 7, the main lens 38 formed between the fourth electrodes G4 and 4 is formed by the electron beam 10 passing through the third electrodes G3 and 3 of the electron gun. Is converged by the N-axis and is not subjected to deflection due to the deflection magnetic field formed by the deflection yoke 11 (center portion of the screen), the straight line is left as it is and a beam spot having a diameter D1 is formed on the fluorescent film 13.

Here, in the case where the fluorescent film 13 is deflected upward, for example, the deflection aberration correcting electrode 39 has an action (FIG. 6) and none (FIG. 7). Qualitatively explain how it changes.

The method of claim 7, also, the outer circumference of the orbit of the electron beam 10, a lower juoe orbits proceeds as 10 _D is not much effect on the presence or absence of the deflection aberration correcting electrode 39. However, since the upper main trajectory has no action of the deflection aberration correcting electrode 39, the upper main trajectory crosses the lower outer trajectory 10 _D before reaching the fluorescent film 13 like 10 _U. As a result, a spot of diameter D2 shown in FIG. 7 is formed on the fluorescent film 13.

On the other hand, as shown in FIG. 6, when the deflection aberration correcting electrode 39 acts, the portion of the track located above the electron beam is moved by 10u by the suction force of the deflection aberration correcting electrode 39, and the Since the portion of the track located below has little influence of the deflection aberration correcting electrode 39 as described above, the upper main track 10u 'and the upper track before reaching the fluorescent film 13 as shown in FIG. The fluorescent film 13 is reached without intersecting. As a result, a diameter D3 spot smaller than the above D2 is formed on the fluorescent film 13. This is because the nonuniform electric field is formed as shown in FIG. The distribution at each position on the fluorescent film 13 of the beam spot of diameter D3 is the mounting position of the two components constituting the deflection aberration correcting electrode 39, the length extending toward the fluorescent surface 13, the distribution of the deflection magnetic field, and It can be optimized by the combination of the diameter of the electron beam and the maximum deflection angle of the cathode ray tube when passing between the two parts.The difference between the beam spot diameter D1 in the center of the screen can be reduced and the resolution is uniform in the entire screen area. can do.

As a result, according to this embodiment, it is possible to control the focus state synchronized with the deflection angle on the fluorescent film (screen) without dynamically supplying a potential in synchronism with the deflection angle of the electron beam to a part of electrodes of the tank gun. It is possible to provide a cathode ray tube which is inexpensive and uniform in display throughout the screen. These conditions are actually applied to the structure of the cathode tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating portion, the deflection aberration correction electrode to form an uneven electric field, the electron gun structure other than the deflection aberration correction electrode, and the structure of the cathode ray tube. It is not unique because it depends on the driving conditions and the use of the cathode ray tube.

In order to improve the uniformity of the resolution of the entire fluorescent surface by forming a fixed non-uniform electric field in the deflector continuity, the trajectory of the electron beam needs to be deflected so as to pass through the region having different electric field strengths even in the electric continuity. Therefore, the non-uniform electric field is constrained by the positional relationship with the deflection magnetic field.

8 is an explanatory diagram of an example of the distribution on the axis of the deflection magnetic field, and shows the magnetic field distribution in the cathode ray tube having a deflection angle of 100 ° or more.

In the same figure, the right side is closer to the fluorescent surface and the left side is farther from the fluorescent surface toward the drawing. FIG. 9 is an explanatory view of the positional relationship of the deflection magnetic field generating mechanism corresponding to FIG. 8, where A is the position at the time of the magnetic field measurement and BH has the maximum value of the magnetic flux density 64 of the magnetic field deflected in the scanning line direction. Position, BV is the position having the maximum value of the magnetic flux density 65 of the magnetic field which is deflected perpendicular to the scanning line, and C is the end of the magnetic material which forms the core of the coil which generates the deflection magnetic field away from the fluorescent surface of the cathode ray tube. .

When the fluorescent surface side of the electrode is woven in the tube axis direction of the cathode ray tube, the distance is the longest part.

FIG. 10 is an explanatory diagram of the distribution on the axis of the deflection magnetic field, and shows the magnetic field distribution in the cathode ray tube whose deflection angle is less than 100 degrees.

In the same figure, the right side is closer to the fluorescent surface and the left side is farther from the fluorescent surface toward the drawing.

FIG. 11 is an explanatory view of the positional relationship of the deflection magnetic field generating mechanism corresponding to FIG. 10, where A is the position at the time of the magnetic field measurement and BH has the maximum value of the magnetic flux density 65 of the magnetic field deflected in the scanning line direction. Position, BV is the position having the maximum value of the magnetic flux density 65 of the magnetic field deflected perpendicular to the scanning line, and C is the end of the side falling away from the fluorescent surface between the cathode rays of the magnetic material forming the core of the coil which generates the deflection magnetic field. .

12 is a perspective view showing a structural example of a deflection aberration correcting electrode forming a non-uniform electric field fixed to the deflector continuation of the present invention. The deflection aberration correction electrode 39 in the concentration plane faces the bent two metal plates in parallel so as to be spaced apart from each other. In the same figure, D is located close to the fluorescent surface of the cathode ray tube, E is located closer to the fluorescent surface, and the electron beam passes through the center of the opposing part when there is no deflection magnetic field.

The deflection aberration correcting electrode 39 is angled so that the opposite portion G is parallel to the scanning line, and is mounted on the anode of the electron gun, and actually has a fluorescent surface size of 59 cm in a color cathode ray tube with a neck diameter of 29 mm and a maximum deflection of 108 degrees. Sealed.

The deflection magnetic field shown in FIG. 8 was fitted to the cathode ray tube, and the tip portion of the D side of FIG. 12 was set at a position of 108 mm in the Z-axis position of FIG. The magnetic flux density at the position where the front end portion of the D side in FIG. 12 is set is 0.0086 milli Tesla per square root of one volt of the anode voltage. It is about 33% of the maximum magnetic flux density. The distance from the end of the core away from the fluorescent surface of the coil generating the deflection magnetic field is about 30 mm. These conditions apply to the structure of the cathode ray tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating unit, the electron gun structure other than the deflection aberration correction electrode, the driving conditions of the cathode ray tube, the use of the cathode ray tube, etc. It is not unique because it depends.

In addition, a deflection aberration correction electrode which forms a non-uniform electric field fixed to the deflector continuation shown in FIG. 12 is used in the cathode ray tube in the same manner as above, and is mounted on the anode of the electron gun so as to have an outer diameter of 29 mm and a maximum deflection angle of 90 ° The fluorescent surface size was sealed in a 48 cm colored cathode ray tube.

A deflection magnetic field of FIG. 10 was fitted to the cathode ray tube, and a tip portion of the D side of FIG. 12 was set at a position of 70 mm of the Z-axis position of FIG. 10 to use a positive voltage of 30 KV. The magnetic flux density at the position where the tip portion of Fig. 12 and D is set is 0.01 milli Tesla near the square of 1 volt of the anode voltage. It is about 50% of the maximum magnetic flux density. The distance from the core of the coil to generate the deflection magnetic field is about 13 mm. These conditions depend on the structure of the cathode ray tube including the maximum deflection angle to be applied, the structure of the matching deflection field generating unit, the electron gun structure other than the deflection aberration correction electrode, the deflection aberration correction electrode, the driving conditions of the cathode ray tube, and the use of the cathode ray tube. So it is not unique.

FIG. 13 is a sectional view showing the main portion of the electron gun used in the cathode ray tube according to the present invention, wherein the anode 6 is disposed close to the fluorescent surface inside the cathode ray tube with the main lens 38 interposed therebetween, and the connecting electrode 5 ) Is placed far from the fluorescent surface.

In the same figure, the deflection aberration correcting electrode 39, which forms a nonuniform electric field fixed to the deflector continuity, is located closer to the fluorescent surface than the opposing surface 6a of the main lens 38 of the anode 6 of the electron gun.

14 is a schematic diagram illustrating an example of the electron gun structure used in the cathode ray tube of the present invention, in which the anode 6 is disposed close to the fluorescent surface inside the cathode ray tube with the main lens 38 interposed therebetween, and the focusing electrode 5 Is closer to the cathode K than to (6).

In the same figure, the deflection aberration correction electrode which forms a non-uniform electric field fixed to the deflector continuity is provided at two places with (39) and (39-2), and the deflection aberration correction electrode 39-2 is an anode of the electron gun ( It is located in the cathode side rather than the opposing surface 6a of the main lens 38 of 6).

In Fig. 14, the deflection aberration correcting electrode 39-2 is 100 mm from the opposing surface 6a of the anode 6 of the electron gun to the cathode side from the opposing surface 6a. The opposing surface 6a of the anode 6 with the main lens 38 is a cylinder having a system diameter of 20 mm. These dimensions depend on the structure of the cathode ray tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating unit, the electron gun structure other than the deflection aberration correction electrode, the driving conditions of the cathode ray tube, the use of the cathode ray tube, etc. So it is not unique.

FIG. 15 is a schematic diagram illustrating an example of the electron gun structure used in the cathode ray tube of the present invention, wherein the cathode ray tube is a projection cathode ray tube of less than 80 °, the maximum deflection angle.

In the same figure, the electron focusing coil 7 is provided in the outer side of the neck part closer to the fluorescent screen 13 than the anode 4 is. The distance L from the main lens and the opposing surface 4a of the anode 4 to the end portion close to the fluorescent surface 13 of the deflection aberration correction electrode 39 forming a nonuniform electric field fixed to the deflector continuation is about 180 mm. to be. The opposing surface 4a of the anode 4 with the main lens 38 is a cylinder having an opening diameter of 30 mm.

In the structure of the same figure, the potential of the fluorescent film is divided by the resistance film 75 and the resistor 76 formed on the inner surface of the neck portion to generate a supply voltage to the anode 4. Detailed conditions include the structure of the cathode ray tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating unit, the electron gun structure other than the deflection aberration correction electrode, the deflection aberration correction electrode, the driving conditions of the cathode ray tube, the use of the cathode ray tube, and the like. It is not unique because it depends.

FIG. 16 is a principal structural view illustrating a structural example of a deflection aberration correction electrode applied to a color cathode ray tube using a three-electron beam in which the present invention is arranged inline, wherein (a) is a cross sectional view and (b) is a front view.

In the same figure, reference numeral 77 denotes a magnetic force line for deflecting the electron beam 10 in the in-line array direction, and forms a nonuniform electric field in which the magnetic material 39-1 is fixed to the deflector continuity. By using in part, the magnetic force line 77 is concentrated near the electron beam 10 to help deflection of the corresponding part.

FIG. 17 is a principal structural diagram illustrating another example of the cathode ray tube of the present invention in which a deflection aberration correction electrode is applied to a color cathode ray tube using an inline-arranged three-electron beam, (a) is a cross sectional view, and (b) is a front view.

In the same figure, since the magnetic material 39-1 is not provided in the deflection aberration correcting electrode 39, there is no concentration of magnetic force lines. The direction assisting the deflection includes the structure of the cathode ray tube including the maximum deflection angle, the structure of the matching deflection magnetic field generating unit, the deflection aberration correction electrode, the electron gun structure other than the deflection aberration correction electrode, the driving conditions of the cathode ray tube, and the use of the cathode ray tube. It is not unique because it depends.

FIG. 18 is a principal structural view illustrating another example of a deflection aberration correction electrode applied to a color cathode ray tube using a three-electron beam in which the present invention is arranged inline, (a) is a cross sectional view, and (b) is a front view.

In the same figure, the opening 78 of the deflection aberration correcting electrode 39 is arranged in a non-rotationally symmetrical manner to surround the electron beam 10. In general, since the direction of the scanning line of a color cathode ray tube using an inline-arrayed three-electron beam, such as the same plane, is parallel to the inline direction, the deflection aberration correction electrode 39 forms a nonuniform electric field fixed to the deflector of the same plane. The openings 78 in correspondence with the scanning line direction. The detailed conditions include the structure of the cathode ray tube including the maximum deflection angle to be applied, the structure of the matching deflection magnetic field generating unit, the electronic structure other than the deflection aberration correction electrode, the deflection aberration correction electrode, the driving conditions of the cathode ray tube, and the use of the cathode ray tube. It is not unique because it depends on the back.

19 is a principal structural diagram illustrating another example of a deflection aberration correcting electrode in which the present invention is applied to a color cathode ray tube using an inline arrayed three-electron beam as in FIG. 18, wherein (a) is a cross sectional view and (b) is a front view. to be.

In the same figure, the opening 78 of the deflection aberration correcting electrode 39 is arranged in a non-rotationally symmetrical manner to surround the electron beam 10. In general, since the direction of the scanning line of a color cathode ray tube using an inline-arrayed three-electron beam such as the same plane is parallel to the inline direction, the deflection aberration correction electrode forming an uneven electric field fixed to the deflector of the same plane (39) The opening portion 78 in Fig. 2 corresponds to the scanning line direction. In the same figure, the opening diameter in the direction perpendicular to the scanning line of the opening portion 78 is not uniform, and the narrowest dimension is L at the position facing the angular electron beam.

In this embodiment, even when the electron beam is deflected in the inline direction, the deflection aberration correction amount is changed corresponding to the deflection amount. In reality, L was set to 3 mm and mounted on the electron gun as shown in FIG. At this time, good results were obtained at the 8 mm setting of the gage diameter in the scanning line direction and the perpendicular direction of the main lens opposing surface of the electron gun anode. Detailed conditions include the structure of the cathode ray tube including the maximum deflection angle to be applied, the structure of the matching deflection magnetic field generating unit, the electronic structure other than the deflection aberration correction electrode, the deflection aberration correction electrode, the driving conditions of the cathode ray tube, and the use of the cathode ray tube. It is not unique because it depends on the back. For example, when the location of L is located at a location that does not face the electron beam 10, L is also a zero condition.

16, 17, and 18, the deflection aberration correction electrode 39, which forms a non-uniform electric field fixed in the two deflection magnetic fields, is disposed so as to face the electron beam 10 in an inclined manner. have.

In FIG. 16, only the part which opposes the electron beam 10 of the front-end | tip part 39-2 of an opposing part protrudes in A direction, but it protrudes uniformly in FIG. This protruding method is not only dependent on the material of the deflection aberration correcting electrode 39 but also in the case of a nonmagnetic material.

In general, since the direction of the scanning line of a color cathode ray tube using an inline-arrayed three-electron beam as shown in the respective figures is parallel to the inline direction, deflection aberration which forms a non-uniform electric field fixed to the deflector continuity in an isometric view The opposing part of the correction electrode 39 corresponds to the scanning line direction.

20 is an explanatory diagram of a structural example of an electron gun equipped with a deflection aberration correction electrode. In FIG. 17, the electron gun was mounted as in FIG. 20 with the distance L in the direction perpendicular to the scanning line of the opposing tip end portion 39-2 being 3 mm. A good result was obtained by setting the opening diameter in the scanning line direction and the right angle direction of the main lens opposing surface of the electron gun anode at 8 mm. Detailed conditions include the structure of the cathode ray tube including the maximum deflection angle to be applied, the structure of the matching deflection magnetic field generating unit, the electronic structure other than the deflection aberration correction electrode, the deflection aberration correction electrode, the driving conditions of the cathode ray tube, and the use of the cathode ray tube. It is not unique because it depends on the back.

21 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention. In the same figure, the deflection aberration correction electrode 39 which forms a nonuniform electric field fixed to the deflector continuity is connected at the fluorescent surface of the cathode ray tube to supply the same potential as the fluorescent surface.

The anode 6 of the electron gun is generated by dividing the potential of the fluorescent surface into voltage division resistors 69 and 70 inside the cathode ray tube. The end of the resistor 70, which is not connected to the positive electrode 6, is electrically connected to the outside of the cathode ray tube and grounded as it is, or connected to another power supply.

22 is an explanatory diagram of still another example of the configuration of the deflection aberration correction electrode in the electron gun used in the cathode ray tube of the present invention.

In this configuration example, the voltage supply in FIG. 77 is grounded via the variable resistor so that the anode voltage can be adjusted from the outside of the cathode ray tube.

However, the voltage supply system in each of the above figures is not unique.

23 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention.

In the same figure, the deflection aberration correcting electrode 39 which forms a nonuniform electric field fixed to the deflector continuity is connected to the fluorescent surface of the cathode ray tube and supplies the same potential as the fluorescent surface. The anode 6 of the electron gun is generated by dividing the potential of the fluorescent surface by the resistors 69 and 70 inside the cathode ray tube, but the resistor 70 is focused with the focusing electrode 5 inside the cathode ray tube. When mounted on an image display device, it can be adjusted in conjunction with the adjustment of the focusing voltage.

24 is another example of the configuration of the deflection aberration correction electrode in the electron gun used for the cathode ray tube of the present invention.

The same potential is supplied to the deflection aberration correcting electrode 39 which forms a nonuniform electric field fixed to the deflector continuation in the same figure. This connection eliminates the need for a special potential supply including the deflection aberration correcting electrode 39, minimizes the considerations between the electrodes and withstand voltage characteristics, and facilitates assembly. Can be supplied.

25 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used in the cathode ray tube of the present invention.

The same aberration as the anode 6 of the electron gun is supplied to the deflection aberration correction electrode 39 which forms a non-uniform electric field fixed to the deflector continuation in the same plane, but the opening 6 other than the electron beam through hole is provided to the anode 6. In addition, the non-uniform electric field is controlled by allowing the electric field formed between the anode 6 and the electrode having a different potential to penetrate through the vicinity of the deflection aberration correcting electrode 39.

This structure eliminates the need for special potential supply, including the deflection aberration correcting electrode 39, minimizes the consideration of the breakdown voltage characteristics between the electrodes, and facilitates the assembly of electron guns. Can be provided.

26 is another explanatory diagram of the configuration of the deflection aberration correcting electrode in the electron gun used in the cathode ray tube of the present invention, (a) is a schematic diagram of the electron gun, and (b) is a front view of the deflection aberration correcting electrode.

The deflection 39, which forms a non-uniform electric field fixed to the deflector continuation in the same plane, is supplied with a potential different from the anode 6 of the electron gun and the fluorescent surface of the cathode ray tube.

This structure makes it possible to freely set the potential of the deflection aberration correcting electrode 39, thereby providing a flexible electron gun which increases the degree of freedom to the cathode ray tube to be applied.

FIG. 27 is another explanatory diagram of the configuration of the deflection aberration correction electrode in the electron gun used in the cathode ray tube of the present invention, (a) is a schematic diagram of the electron gun, and (b) is a front view of the deflection aberration correction electrode.

The deflection aberration correction electrode 39, which forms a non-uniform electric field fixed to the deflector continuation in the same plane, is disposed inside the anode 6 of the electron gun, so that a potential lower than that of the anode 6 is supplied.

Moreover, in the same figure, the potential of the upper lower level supplies the same potential as the focusing electrode 5.

In the same figure, the potential of the connection electrode 5 is generated by dividing the potential supplied to the anode 6 by the resistors 79 and 80 in the polar tube.

In the same figure, the deflector from the outside of the cathode ray tube is connected by connecting a side of the resistor 80 which is not connected to the focusing electrode 5 to another separate power source from the outside of the cathode ray tube or by grounding a variable resistor. The potential of the polarization aberration correction electrode 39 forming a fixed nonuniform electric field can be adjusted. In this way, when the cathode ray tube is used in the image display device, the power supply of the focusing voltage can also be omitted, thereby enabling cost reduction.

28 is an explanatory diagram of another example of the configuration of the deflection aberration correction electrode in the electron gun used in the cathode ray tube of the present invention, (a) is a schematic diagram of the electron gun, (b) is a front view of the deflection aberration correction electrode, ( c) is a top view of the deflection aberration correction electrode.

In the same figure, the deflection aberration correcting electrode 39, which forms a non-uniform electric field fixed to the deflector continuity, is disposed inside the anode 6 of the electron gun, and a potential lower than the anode 6 is supplied.

The low potential is generated by dividing the potential supplied to the anode 6 by the resistors 81 and 82 in the polar tube.

In the same figure, the non-uniform electric field fixed to the deflector continuation of the resistor 82 is not connected to the deflection aberration correcting electrode 39 to another separate power source outside the cathode ray tube or to a variable resistor. Through the grounding, the potential of the deflection aberration correction electrode 39 fixed to the deflector continuation from the outside of the cathode ray tube can be adjusted. In particular, it is preferable to set the potential of the deflection aberration correcting electrode 39 which forms an imbalanced electric field fixed to the deflector to a potential close to the anode 6.

FIG. 29 is an explanatory diagram showing how repulsion of space charge affects the electron beam 10 between the main lens 38 and the fluorescent film 13, where L2 is the fluorescence of the main lens 38 and fluorescence. Distance from the membrane 13.

In the same drawing, when the electron beam 10 is sufficiently separated from the anode 4 (fourth electrode), the periphery of the electron beam becomes the anode potential, and the electric field almost disappears. In this state, the electron beam 10, which has been advanced by the connection action by the main lens 38, has an increased effect on the orbital change caused by the repulsion of space charge, and reaches the minimum diameter D ₄ before reaching the fluorescent film 13. Then, as the fluorescent film 13 approaches, the diameter increases to become the diameter D ₁ in the fluorescent film 13.

30 is an explanatory diagram of the relationship between the distance between the main lens and the fluorescent film and the size of the electron beam spot on the fluorescent film. The above operation is performed when the cathode ray tube is driven under the same conditions. Depending on the distance L ₂ between them, D ₁ also increases as L ₂ increases, as shown in FIG.

Taking the cathode ray tube used in color television, for example, L ₂ increases as the screen size of the cathode ray tube is increased when the maximum deflection angle is determined. Therefore, when the screen size of the cathode ray tube increases, the electron beam spot diameter on the fluorescent film 13 increases, and the resolution does not increase much despite the increase in the screen size.

FIG. 31 is a schematic cross-sectional view illustrating an example of dimensions in an embodiment of a cathode ray tube according to the present invention, and FIG. 32 is a conventional example for comparing dimensions of an example of an anode ray tube according to the present invention. As a schematic cross-sectional view of a cathode ray tube, the same reference numerals as those in FIG. 5 correspond to the same parts. Neither 31 nor 32 use the electron gun of the same specification. Therefore, the distance L ₃ from the stem which is the bottom of the cathode ray tube to the main lens 38 is equal in both.

However, in the cathode ray tube according to the prior art shown in FIG. 32, the main lens 38 is deflected yoke 11 to avoid the electron beam passing through the main lens 38 of the electron gun being disturbed by the deflection magnetic field. Since the electron gun was installed at a position retracted from the deflection yoke 11 in the direction of the neck portion 7, the main gun 38 and the fluorescent film 13 had to be separated from the deflection magnetic field region formed by The distance L2 between and cannot be shorter than the distance between the deflection yoke 11 and the fluorescent film 13.

In order to improve the resolution in the center of the fluorescent film of the cathode ray tube, the large diameter of the main lens is constantly progressing in the related art. The effect of large-diameter hardening is exerted by the enlargement of the diameter of the electron beam passing through the main lens 38. The larger the diameter of the electron beam passing through the main lens 38 in the deflecting magnetic field is, the more often it is confused. Therefore, the large diameter hardened main lens has to gradually drop the electron gun from the deflecting magnetic field. On the other hand, in the structural example of the present invention shown in FIG. 31, deflection aberration correction which forms a nonuniform electric field fixed to the deflector continuity in anticipation of the disturbance of the electron beam passing through the main lens 38 in the deflection magnetic field By having the structure in which the electrode 39 is disposed, this distance L2 can be made shorter than the distance between the deflection yoke 11 and the fluorescent film 13. Therefore, according to the embodiment of the present invention, the distance between the main lens and the fluorescent surface of the cathode ray tube can be shorter than that of the cathode ray tube according to the prior art, and the suitability to the large diameter primary lens is also matched with each other, so that the screen size of the cathode ray tube is matched. Even if is increased, the effect of the space charge repulsion can be reduced, and the electron beam spot diameter on the fluorescent film 13 can be reduced to provide a high-resolution cathode ray tube.

As described above, since it is difficult to shorten the length of the electron gun by suppressing the deterioration of the focus characteristic of the electron gun, it has been difficult to shorten the total length L ₄ of the cathode ray tube. Similarly, in one embodiment of the present invention, the total length L ₄ of the cathode ray tube is reduced by the shortening of the distance between the main lens 38 and the fluorescent film 13, without changing the portion from the cathode of the electron gun to the main lens. Compared to the above, it can be greatly shortened.

In one embodiment of the present invention, a deflection aberration correction electrode for forming a non-uniform electric field fixed to the deflector continuity is mounted on the electron gun anode 6 as shown in FIG. The color cathode ray tube using an inline three-electron beam with an outer diameter of 29 mm, a maximum deflection angle of 108 °, and a diagonal diameter of a fluorescent film of 59 cm was applied. The opening diameter L ₂ in the direction perpendicular to the scanning line of the main lens opposing surface 6a of the electron gun anode 6 is 8 mm. The deflection magnetic field shown in FIG. 8 is fitted to the cathode ray tube, and the main lens facing surface 6a of the anode 6 is set at a position of 85 mm Z-axis position on the same plane to drive at a cathode voltage of 30 KV, yielding good results. Got it. The same magnetic flux density is 0.017 milli Tesla per square root of anode voltage. Also, about 66% of the maximum magnetic flux density. It is a position of about 20 mm from the end of the side falling away from the fluorescent film of the core of the coil generating the deflection magnetic field. In the same confirmation using the prior art, the influence of the disturbance of the electron beam due to the deflection magnetic field was observed when the Z axis position of the main lens facing surface was 100 mm, and the resolution around the fluorescent film was lowered.

In another embodiment of the present invention, a deflection aberration correction electrode for forming a non-uniform electric field fixed to the deflector continuity is mounted on the electron gun anode 6 as shown in FIG. Each of the 90 ° and fluorescent films with a diagonal diameter of 48 cm was applied to a color cathode ray tube using an inline three-electron beam. The opening diameter L2 in the direction perpendicular to the scanning line of the main lens opposing surface 6a of the electron gun anode 6 is 8 mm. The deflection magnetic field shown in FIG. 10 is fitted to the cathode ray tube, and the main lens facing surface 6a of the anode 6 is set at a position of 70 mm in the z-axis position on the same plane to drive at a positive voltage of 30 KV, yielding good results. Got it. The magnetic flux density at this location is 0.01 milli Tesla near the square of 1 volt of anode voltage. It is about 55% of the maximum magnetic flux density. It is a position of about 13 mm from the end of the side falling away from the fluorescent film of the core of the coil generating the deflection magnetic field. In the same confirmation using the prior art, the influence of the disturbance of the electron beam due to the deflection magnetic field was observed when the Z axis position of the main lens opposing surface was 82 mm or less, and the resolution around the fluorescent film was lowered.

In another embodiment of the present invention, as the deflection aberration correcting electrode 39 forming a non-uniform electric field fixed to the deflector continuum, the components of FIG. 12 are mounted on the electron gun anode as shown in FIG. 15 and sealed. The cathode ray tube is a projection tube having a maximum deflection angle of 75 °, and uses an electron focusing coil 74 in addition to the electron gun lens. In the same figure, the anode voltage of the electron gun uses the neck portion 74 as the fluorescent surface voltage. In the same figure, the anode voltage of the electron gun is generated at the partial pressure by the resistor film 75 formed on the inner wall of the neck portion 7 and the resistor 76 provided inside the cathode ray tube. The distance from the main lens side facing surface 4a of the anode 4 of the electron gun to the fluorescent film side end portion of the electrode 39 is 180 mm.

33 is a main schematic diagram showing an example of a cathode ray tube according to the present invention, by suppressing the influence of a deflection magnetic field by installing a deflection aberration correction electrode 39 which forms a non-uniform electric field fixed to a deflector continuum. 38 can be brought closer to the fluorescent film 13, and is installed by approaching the fluorescent surface from the main lens opposing surface 6a of the anode 6 toward the fluorescent surface than the fluorescent film side end 7-1 of the neck portion 7-1. Can be.

The electron gun of cathode ray tube applies high voltage to narrow electrode interval, so high electric field is generated, and stabilization of voltage resistance requires high design technique and high technique is required for quality control in manufacturing part. The maximum high field is near the main lens 38. The electric field near the main lens 38 is also affected by the charging of the inner wall of the neck and the adhesion of the fine dust remaining in the cathode ray tube to the electron gun electrode. In this embodiment, since the main lens 38 does not face the neck portion 7, the inconvenience can be avoided.

In addition, since the power supply to the electron gun 6 is transferred from the inner wall of the short portion 97 to the inner wall of the funnel portion 8, it is also possible to prevent a decrease in the breakdown voltage characteristic due to the shaping of the graphite film on the inner wall of the neck portion 7.

34 is a schematic diagram showing another example of the cathode ray tube according to the present invention, in which the influence of the deflection magnetic field is suppressed by the installation of the deflection aberration correction electrode 39 which forms a non-uniform electric field fixed to the deflection continuum. The fluorescent film 13 can be brought closer to the fluorescent film 13, and the closer to the fluorescent surface is provided from the main lens facing surface 6a of the anode 6 than the fluorescent film end portion 7-1 of the neck portion 7-1. can do. As a result, the heat of the heater H, which heats the cathode K of the electron gun, causes the deflection yoke 11 to overheat together with the heat generation of the deflection yoke 11 itself through the neck portion 7.

35 is an explanatory diagram showing the relationship between the length L of the neck portion and the temperature T of the neck portion at the deflection yoke position. If L is long, T goes down. According to the experiment, the heater power was operated at 2 watts per cathode in the conventional neck part. The temperature rise at the deflection yoke position when the length of the 40 mm neck part was reduced is about 15, and this state was close to the original temperature. The heater power for returning to was less than 1.5 Watts per cathode.

In general, in the display device of a color television set or a computer terminal, the depth of the cabinet depends on the total length L ₄ of the cathode ray tube. In particular, in the recent color television sets, the screen size of the cathode ray tube tends to increase, and the depth dimension of the cabinet cannot be ignored when installed in a residential home. In particular, the case of a side 10mm in depth when running alongside other instruments is a problem, shortening the dimensions of the cabinet can be said to be extremely effective in terms of installation efficiency and ease of use.

Thus, according to this embodiment of the present invention, there is provided a display device for a color television set or a computer terminal, in which the depth dimension of the cabinet is drastically shorter than that of the conventional products without impairing the focus characteristic by the shortening of the overall length of the cathode ray tube. You can do it, and it can be a big selling point.

In general, the component materials of cathode ray tubes such as color television sets, finished cathode ray tubes, and funnel portions are significantly larger in volume than electronic components such as semiconductor devices, so that the transportation cost per unit is expensive. In particular, if the transportation route is huge, such as overseas, the advantage cannot be ignored. In the embodiment of the present invention, since the total length of the cathode ray tube is short and the depth dimension of the cabinet can be provided, it is possible to reduce the transportation cost.

Next, the structure of the embodiment of the present invention will be described in more detail. 36 is a side view illustrating the detailed structure of the electron gun used in the cathode ray tube according to the present invention, and FIG. 37 is a partially broken side view showing the main portion thereof, and the same reference numerals as those in FIGS. 83 and 84 denote the same parts. .

In the isometric view, five electrodes, namely, the first electrode 1, the second electrode 2, the third electrode 3, and the fourth electrode, from the cathode K to the anode 6 (the sixth electrode) 4) and a fifth electrode 5 (consisting of the electrodes 51 and 52), the focus potential of the third electrode 3 and the fifth electrode 5, the second electrode (2) and The screen potentials are respectively supplied to the fourth electrodes 4. The shielding potential is applied to the first electrode 1, and in general, this is often grounded.

36 is a side view of the inline-arranged integrated three-electron electron gun in a direction perpendicular to the inline, and FIG. 37 is a side view of the vicinity of the main lens of FIG. 36 in the inline direction.

In the cathode ray tube, the electron gun forms a non-uniform electric field fixed in the magnetic field of the deflection yoke 11, so that the electron beam 10 is deflected in the magnetic field of the deflection yoke 11 in accordance with the deflection angle. The deflection aberration correcting electrode 39 for correcting the deflection aberration of (10) has a length L ₅ extending toward the fluorescent surface of a portion passing when the 3 electron beam is not deflected in the inline direction (scanning direction), and the 3 electron beam is in the inline direction. When it is deflected, the length of the light beam extending toward the fluorescent surface of the passing portion is shorter than L ₆ .

The deflection aberration correction electrode 39 is connected to the anode 6 and is fixed. This structure allows the following functions to be performed.

The operation in the case where the electron gun is arranged in the cathode ray tube as shown in FIG. 5 above and the electron beam 10 is deflected only in the inline direction and at right angles is the same as described in FIG. However, in this state, when deflecting in the inline direction at the same time, the electron beam 10 passes through the long portion of the length L6 of the deflection aberration correction electrode 39, so that the deflection aberration described in FIG. The action becomes stronger. As a result, for example, the crowd 17 in the beam spot 19 of the screen corner portion shown in FIG. 73 can be effectively suppressed.

38, 39, 40, 41, and 42 form a non-uniform electric field fixed in the magnetic field of the deflection yoke, and the deflection angle when the electron beam is deflected by the magnetic field of the deflection yoke. Various specific structures of the deflection aberration correction electrode for correcting the deflection aberration of the electron beam, for example, the deflection aberration correction electrode 39 of FIGS. 36 and 37 and the electrode for correcting the deflection aberration when the anode potential is supplied Three views (FIGS. 38, 39, 40) or 4 views (FIGS. 41, 42) illustrate an example, and (a) is a top view viewed from an inline direction and a direction perpendicular to (b). (a) is the front view which looked at the direction A by arrow, (c) is the side view which looked at (a) degree from the direction B, and (d) is the rear view which looked at the direction (a) from the arrow C direction. In the figure, E denotes an electron beam in the case where there is no deflection.

The deflection aberration correcting electrode 39 of FIG. 38 is composed of a first plate body 39-1 and a second plate body 39-2 extending in parallel from the sixth electrode 6 toward the fluorescent film 13, and each plate The sieves 39-1 and 39-2 each have trapezoidal cutouts 390 at the passing positions of the three electron beams, and in a state where there is no deflection, the electron beams are positioned at the center of the cutouts 390. It is meant to pass. The length of the cut portion 390 in the upper-lower fluorescent film 13 direction is L ₅ , and the length of each plate body in the fluorescent film 13 direction L ₆ .

The deflection aberration correcting electrode 39 of FIG. 39 is formed such that the first plate body 39-3 and the second plate body 39-4 having the same shapes as those of FIG. 38 gradually become narrow in the direction of the fluorescent film 13. It is an extended configuration.

The deflection aberration correction electrode 39 of FIG. 40 is composed of a first plate body 39-5 and a second plate body 39-6 extending in parallel in the direction of the fluorescent film 13 from the sixth electrode 6, Each plate body 39-5 and 39-6 has semicircular cut portions 391 at the passing positions of the three electron beams, and in the state where there is no deflection, the center position of the cut portions 391 is the electron beam. It is supposed to pass. The length of the cutout portion 391 in the direction of the fluorescent film 13 at the center edge is L ₅ , and the length of the plate body in the direction of the fluorescent film 13 is L ₆ . That is, the length L ₅ in the direction of the fluorescent film 13 at the upper and lower center edges of the cut portions 390 and 391 is longer than the length L ₆ extending toward the fluorescent surface of the portion passing when the three electron beams are deflected in the in-line direction. It is short.

The deflection aberration correcting electrode 39 of FIG. 41 is composed of a first plate body 39-7 and a second plate body 39-8 extending from the sixth electrode 6 in the direction of the fluorescent film 13, and the fluorescent film It has a configuration with a curved surface gradually widening in the direction (13).

The deflection aberration correcting electrode 39 of FIG. 42 is composed of a first plate body 39-9 and a second plate body 39-10 extending in parallel from the sixth electrode 6 in the direction of the fluorescent film 13, It has a curved surface that gradually widens in the direction of the fluorescent film 13, and has a semi-elliptical cut portion 392, so that the electron beam passes through the center position of the cut portion 392 in a state where there is no deflection. It is. The length of the cutout portion 392 in the direction of the fluorescent film 13 at the center edge is L ₅ , the length of the fluorescent film 13 in the direction of each plate, that is, the fluorescent surface of the portion passing when the three electron beams are deflected in the in-line direction. L ₆ is the length extending toward.

In addition, the space | interval of two board | substrates is not limited to being non-parallel when parallel as mentioned above, It goes without saying that it can be partially non-parallel in an inline direction. 43, 44, 45, 46, 47, 48, 49, and 50 form a non-uniform electric field fixed within the magnetic field of the deflection yoke and deflect the electron beam. When deflecting in the magnetic field of the actuator, a deflection aberration correction electrode for correcting the deflection aberration of the electron beam according to the deflection angle is provided at a position as shown in Figs. 36 and 37, for example. 3 views (FIGS. 43, 44, 45, 50) or 4 views (FIG. 46, 47, 48, 49).

In the isometric view, (a) is the top view viewed from the inline direction and at right angles, (b) is the (d) view from the arrow, A is the front view, and (c) is the (a) view from the arrow, B Side view seen from the direction, (d) is a flue gas view seen from the direction of the arrow (a) in the C direction. In the figure, E denotes an electron beam in the case where there is no deflection.

The deflection aberration correcting electrode 39 'in FIG. 43 is formed of two sheets of the first plate body 39-11 and the second plate body 39-12 extending in parallel in the direction of the fluorescent film 13 from the sixth electrode 6; Each plate body 39-11, 39-12 has projections 393 which protrude in the direction of the fluorescent film 13 as shown in the passage positions of the three electron beams, respectively, and are subjected to deflection. In this state, the electron beam E passes through the center position of the protrusion 393. The maximum protrusion length of the protrusion 393 in the direction of the fluorescent film 13 is L _5, and the protrusion length gradually decreases in the in-line direction.

The deflection aberration correcting electrode 39 'in FIG. 44 is formed of the first plate body 39-13 and the second plate body 39-14 extending from the sixth electrode 6 toward the fluorescent film 13 gradually. Each plate body 39-13, 39-14 has projections 393 similar to those of FIG. 43, in which three electron beams respectively protrude in the direction of the fluorescent film 13 at a passing position. In the state where the deflection is not applied, the electron beam E passes through the center position of the protrusion 393. Then, the maximum protrusion length in the direction of the fluorescent film 13 of the protrusion 393 is L ₅ , and the protrusion length gradually decreases in the in-line direction.

The deflection aberration correcting electrode 39 'of FIG. 45 is formed of two pieces of the first plate body 39-15 and the second plate body 39-16 extending in parallel from the sixth electrode 6 to the fluorescent film 13 direction. Each plate body 39-15 and 39-16 has a flat plate 3, which has three projections 394 protruding in the direction of the fluorescent film 13 as shown in the passage position, respectively. In this state, the electron beam E passes through the center position of the protrusion 394. The maximum protrusion length of the protrusion 394 in the direction of the fluorescent film 13 is L ₅ .

The deflection aberration correcting electrode 39 'in FIG. 46 is formed of two pieces of the first plate body 39-17 and the second plate body 39-18 extending in parallel from the sixth electrode 6 to the fluorescent film 13 direction. Each plate body 39-17, 39-18 has a projection 393 which projects in the direction of the fluorescent film 13 as shown in the passage position, respectively, and is composed of a flat plate. The electrode 6 has a concave portion 395 concave in the direction of the fluorescent film 13, and in a state where there is no deflection, the electron beam E passes through the center position of the concave portion 395 and the protrusion 393. It is supposed to be. Then, the maximum protrusion length in the direction of the fluorescent film 13 of the protrusion 393 is L5, and the protrusion length gradually decreases in the inline direction.

The deflection aberration correcting electrode 39 'of FIG. 47 is formed of the first plate body 39-19 and the second plate body 39-20 extending from the sixth electrode 6 toward the fluorescent film 13 gradually. Each plate body (13-19) and (13-20) have projections (393) similar to 46 degrees projecting in the direction of the fluorescent film (13) at the passage positions of the three electron beams, respectively. Has a corrugated surface that forms a concave surface surrounding each electron beam E in the inline direction, and has a concave portion 395 that is concave in the fluorescent film 13 direction on the sixth electrode 6 side, and is not subjected to deflection. In this state, the electron beam E passes through the center positions of the concave portion 395 and the protruding portion 393.

Then, the maximum protrusion length in the direction of the fluorescent film 13 of the protrusion 393 is L ₅ , and the protrusion length gradually decreases in the inline direction.

The deflection aberration correction electrode 39 'of FIG. 48 is formed of two pieces of the first plate body 39-21 and the second plate body 39-22 extending in parallel from the sixth electrode 6 to the fluorescent film 13 direction. Each plate body 13-21, 13-22 has a semicircular protrusion 394 projecting in the direction of the fluorescent film 13 at 45 degrees at the passage position of the three electron beams, respectively. The six-electrode side has a concave portion 396 larger than the protruding portion 394 concave in the direction of the fluorescent film 13, and in the state where it is not deflected, the concave portion 396 and the lead portion 394. The electron beam E passes through the central position of the beam. The maximum protrusion length of the protruding portion 394 in the direction of the fluorescent film 13 is L ₅ .

The deflection aberration correcting electrode 39 'in FIG. 49 is formed of two pieces of the first plate body 39-23 and the second plate body 39-24 extending from the sixth electrode 6 in the direction of the fluorescent film 13, respectively. Consisting of plates, each plate (39-23),

The fluorescent film 13 having the parallel plate portions 39-23-1 and 39-24-1 corresponding to the passage position of the center electron beam, and corresponding to the passage position of the adjacent electron beam in 39-24. Is formed by (39-23-2) and (39-24-2) bent in a direction in which the distance between the two plates increases. As for the 6th electrode 6, the space | interval of 2 sheets of board | substrate is equal to the space | interval of the part corresponding to the passage position of the center electron beam, and the board | substrate of 2 sheets of the part corresponding to the passage position of the adjacent electron beam.

The deflection aberration correcting electrode 39 'of FIG. 50 is formed of two sheets of the first plate body 39-25 and the second plate body 39-26 extending in parallel in the direction of the fluorescent film 13 from the sixth electrode 6; and a plate configuration, the leg plate member (39-25), (39-26) has portions (39-25-1) in the length of the corresponding phosphor layer 13, the direction in which the passage position of the center electron beam is in L ₅ , (39-26-1), and the length extending in the direction toward the fluorescent film 13 corresponding to the passing position of the electron beam next to it is L _{5 at the} center electron beam and arc at the side away from the center electron beam. In addition, there are portions (39-25-2) and (39-26-2) having a maximum projection length of L ₆ extending outwardly in the direction of the fluorescent film 13 toward the outer circumference.

By using the electrode for correcting such deflection aberration, when deflecting the electron beam in the inline direction, deflection aberration correction by coma aberration can be corrected corresponding to the deflection angle with respect to the adjacent electron beam.

As described in the respective embodiments of the deflection aberration correcting electrodes shown in FIGS. 43 to 48, the length L ₅ extending toward the fluorescent film of the portion passing when the 3 electron beam E is not deflected in the inline direction is 3 electron beam. When E is deflected in the in-line direction, it has a shape longer than the length extending toward the fluorescent film in the passing portion.

With this configuration, when the electron beam E passing through the electrode for correcting this deflection aberration is deflected, the trajectory is deflected more than if it is not deflected, and the beam spot on the fluorescent surface is increased or unreasoned by the deflection angle. The occurrence of can be suppressed.

The spacing between the two plates constituting the deflection aberration correcting electrode in FIGS. 43 to 50 is different from the above-described parallel arrangement, non-parallel arrangement, or partially non-parallel arrangement. Not to mention that deployment is possible.

Further, as shown in FIGS. 43 to 50, a nonuniform electric field fixed in the magnetic field of the deflection yoke is formed, and when the electron beam is deflected by the generating magnetic field of the deflection yoke, the angle of the electron beam is changed. As a means for obtaining a potential lower than the anode potential for supplying a potential lower than the anode potential without connecting the deflection aberration correction electrode for correcting the deflection aberration, the required voltage can be supplied independently from the stem pin. If an electrical resistor is provided inside the cathode ray tube, for example, one end thereof is connected to the anode, and the other end is connected to another low potential electrode or grounded, and an appropriate voltage is drawn from the middle thereof. The required voltage supply can be performed in the power supply structure as it is.

51, 52, 53, 54, 55, and 56 are cross-sectional schematic diagrams illustrating basic electron gun structural examples of various electrode configurations to which the present invention is applied. Cathode, G1 is the first electrode, G2 is the second electrode, G3 is the third electrode, G4 is the fourth electrode, G5 is the fifth electrode, G6 is the sixth electrode, Vf is the focus voltage, Eb is the anode voltage to be.

51 is a BPF type gun, 52 is an UPF type gun, 53 is an electron gun having the same connection as a BPF type gun with a long focus electrode length, and 54 is an electron gun having the same connection as a UPF type gun with a long focus electrode length. 55 degrees gives a focus voltage to G3 and G5, an electron gun giving a positive voltage to G4 and G6, 56 degrees gives a first focus voltage to G3 and G5, a second focus voltage to G4, It is an electron gun that gives the anode voltage to G6.

The main lens electrode portion of each type of electron gun is placed in a deflection magnetic field formed by the deflection yoke of the cathode ray tube, and when the electron beam is deflected by the magnetic field of the deflection yoke, the deflection of the electron beam is made in accordance with the deflection angle. By providing a deflection aberration correction electrode having the configuration described in FIGS. 36 to 48, which corrects aberrations, the desired effect of the present invention can be obtained.

It goes without saying that the present invention can be assembled with an electron gun other than the above-described form.

FIG. 57 is a schematic view for explaining the structure of another electron gun to which the present invention is applied, and the same reference numerals as described above correspond to the same parts, and (1a) and (1b) are the cathodes of the first electrodes (1) (G1). K side, the second electrode G2 side, (2a), (2b) is the first electrode (G1) side, the third electrode (G3) side of the second electrode (2) (G2), (3a), 3b is the second electrode G2 side of the third electrode 3 (G3), the fourth electrode G4 side, (4a), (4b) is the third of the fourth electrode (4) (G4) The electrode G3 side, the fifth electrode G5 side, 5a, 5b are the fourth electrode G4 side of the fifth electrode 56 (G5), the sixth electrode G6 side, (6a) Indicates the electron beam inlet side and the outlet side of the sixth electrode 6 (G6), which is the anode, on the fifth electrode G5 side. The electron gun shown in the drawing shows the grounding of the first electrode G1. The suppression voltage Ec2 is applied to the second electrode G2 and the fourth electrode G4, and the focus voltage Vf is applied to the third electrode G3 and the fifth electrode G5.

FIG. 58 is an explanatory diagram of a detailed configuration of the second electrode in FIG. 57, wherein 2c is an electron beam through hole, and 2d is an inline direction formed around the outlet side 2b of the electron beam through hole 2c. A slit having a long axis in the direction parallel to (XX), W1 and W2 are long side dimensions, short side dimensions of the slit 2d, and D is a length dimension of the slit 2d.

FIG. 59 is an explanatory view of the detailed configuration of the third electrode in FIG. 57, (a) is an entrance perspective view of the electron beam, and (b) is a diagram cut along the line A-A in FIG.

In the figure, 3c denotes an electron beam through hole, and 3d denotes a long axis in a direction YY perpendicular to the inline direction formed around each electron beam through hole on the electron beam inlet side 3a of the third electrode 3. It's a slit.

60 is an explanatory diagram of a detailed configuration of the fourth electrode in FIG. 57, where 4c is an electron beam through hole, and 4d is an electron beam through hole on the electron beam exit side 4b of the fourth electrode 4. FIG. A slit with a long axis in the inline direction and at the right angle (YY).

As described above, the electron gun of this type has a non-circular electrode having a structure near the electron beam through-hole as shown in FIGS. 58, 59, and 60 on the electrode surface indicated by oblique lines in FIG. 58. FIG. By combining with, astigmatism correction is performed to improve the focus characteristic.

According to the cathode ray tube which provided such an electron gun in the conventional neck-to-position, the uniformity of the focus over the whole screen improves drastically. However, if the amount of astigmatism correction is added to increase the uniformity of focus on the entire screen, the electron beam spot diameter at the center of the screen increases, and the resolution decreases. In such a case, as in the present invention, the main lens is positioned in the magnetic field of the deflection yoke, and the deflection aberration correction electrode described above is disposed to deflect the electron beam by the magnetic field of the deflection yoke, thereby improving its focus characteristics. Can be.

61 is a sectional view showing the principal parts of the structure of the electron gun for color cathode ray tubes using the three electron beams arranged in-line.

62 and 63 are structural diagrams of the electrodes constituting the main lens of the electron gun, (a) is a front view, and (b) is a silver side cross-sectional view.

The electron gun shown in FIG. 61 explains the structure of an electron gun for color cathode ray tubes using an inline-arranged three-electron beam forming the main lens 38 by facing the connecting electrode of FIG. 62 and the anode having the shape of FIG. It is a sectional view of the main part.

In the main lens composed of the above-described electrodes, the equipotential lines 81 penetrate into the opening 6a and the focusing electrode opening 5b of the anode to form a large electron lens common to the three electron beams as shown in FIG. . When the opening diameter of the beam through hole 82 at the bottom of the shield cup 81 is sufficiently large, the electric field penetrating into the opening 6a of the anode reaches the vicinity of the opening 83 different from the 82 of the shield cup 81. do.

64 is an explanatory view of another example of a deflection aberration correcting electrode in the cathode ray tube of the present invention, where (a) is a front view and (b) is a horizontal partial cross-sectional view. In the same drawing, in the color cathode ray tube using three electron beams arranged in-line, an electrode 39 for forming a non-uniform electric field fixed in the deflection magnetic field and correcting the deflection aberration according to the deflection angle is provided on the fluorescent surface rather than the bottom of the shield cup 81. If it is, display it.

In order to increase the electric field strength near the deflection aberration correcting electrode 39, the beam through hole in the bottom of the shield cup 81 can be achieved by using a single beam through hole of three electron beams in common.

In an example of the electrode portion of the color cathode ray tube electron gun using the three electron beams arranged in-line of FIG. 61, an electron beam through hole for aligning a plurality of electrodes and passing each electron beam at an interval L ₈ is provided in each electrode. Formed. The main lens of the electron gun electrode is constituted by the electrodes shown in Figs. 62 and 63 as described above.

In order to improve the resolution on the fluorescent film, it is necessary to enlarge the main lens diameter, but the main lens diameter is limited to the electron beam spacing L ₈ . In addition, electric field penetration to the bottom of the shield cup 81 of FIG. 64 can be assisted by enlargement of the main lens diameter, in particular, the enlargement of the diameter in the scanning line direction at the main lens opposing opening of the anode 6. In the present embodiment, the shield cup of Fig. 64 is used by using the anode 6 of the opening diameter in the scanning line direction that is 0.5 times or more of the narrowest value of the gap between the adjacent electron beam through holes provided in the plurality of electrodes. Helping field penetration to the bottom of 81).

In the embodiment of the present invention, the deflection aberration correction electrode having the shape of FIG. 64 and the assembly provided on the fluorescent surface side rather than the bottom of the shield cup of the single hole, the main lens constituting electrode of FIG. 61, and the main lens opposing portion of the anode 6 are shown. In the opening, a part whose diameter in the scanning line direction was 1.4 times or more of the narrowest value of the interval between adjacent electron beam through holes among the electron beam through holes provided in the plurality of electrodes was used.

As described above, according to the embodiment of the present invention, the focus characteristic can be improved in the entire screen area and in the electron beam entire current area without supplying the dynamic focus voltage, so that a good resolution can be obtained. A cathode ray tube having an electron gun having a configuration capable of reducing moiré in a current region can be provided.

FIG. 65 is an explanatory view of a dimension comparison between an example of an image display apparatus using a cathode ray tube according to the present invention and an image display apparatus using a conventional cathode ray tube, and (a) and (b) show a cathode ray tube according to the present invention. Are front and side views, (c) and (d) are front and side views of the conventional cathode ray tube.

In the figure, the depth of the cabinet 83 of the image display device L ₇ is the drawing to (b) of the present invention separate, shorter as compared to a separate conventional (d), it is possible to save space to install .

It is possible to shorten the depth L ₇ by making the deflection aberration corresponding to the deflection angle of the electron beam by forming a non-uniform electric field fixed to the deflector continuity to bring the lens of the electron gun of the cathode ray tube close to the deflection yoke. This is because the length L ₄ of the cathode ray tube 84 can be shortened.

As described above, according to the embodiment of the present invention, it is possible to improve the focus characteristic in the entire screen area and in the entire electron beam current area without supplying the dynamic focus voltage, so that a good resolution can be obtained and a small current can be obtained. It is possible to provide an image display device having a short depth of field having a structure capable of reducing moiré in an area.

As described above, according to the present invention, a fluorescent film is formed by forming a nonuniform electric field fixed to the deflector continuum and correcting deflection aberration of the electron beam according to the deflection angle when the electron beam is deflected and its trajectory changes. It is possible to obtain proper focusing of the electron beam in the entire area of the (screen) and the entire current area of the electron beam, and a cathode ray tube with a drastic improvement in resolution in the entire screen area can be obtained.

That is, by forming a fixed non-uniform electric field in which the deflection aberration correction action of the electron beam changes in accordance with the deflection angle, the deflection aberration is corrected by the electron beam whose trajectory has been changed by the deflection, so that it is suitable even at a position away from the center of the fluorescent surface. It is possible to obtain the focusing effect of the electron beam.

The voltage applied to a part of the electrode (deflection aberration correction electrode) forming a nonuniform electric field in which the deflection aberration correction action of the electron beam changes depending on the deflection angle may be the same potential as that of the other electrode of the cathode ray tube or may be a different voltage. For other voltages, for example, a large value electrical resistor is provided inside the cathode ray tube, and one end thereof is connected to, for example, a fluorescent film, the other end to a potential such as ground, and the appropriate position of the intermediate part. The required voltage can be drawn from the

In addition, the place where the diameter of the electron beam is maximized in the electron gun is near the main focusing lens. In particular, in the in-line type color tube or the color display tube, in general, the deflection flux of the electron beam is uneven due to the ease of convergence adjustment. In this case, in order to suppress the deformation of the electron beam due to the deflecting magnetic field, the main focusing lens should preferably be separated from the deflecting magnetic field generating part as much as possible. Therefore, the deflecting magnetic field generating part is usually provided at a position closer to the fluorescent surface than the main focusing lens of the electron gun. On the other hand, the length between the cathode of the electron gun and the main focusing lens is preferably longer in order to reduce the image magnification of the electron gun and reduce the beam spot diameter on the fluorescent surface. Therefore, a cathode ray tube with a good resolution corresponding to these two actions necessarily incurs a long observation length.

However, according to the present invention, by bringing the position of the main focusing lens closer to the fluorescent surface without changing the length between the cathode of the electron gun to the main focusing lens, the image magnification of the electron gun is further reduced to reduce the electron beam spot diameter on the fluorescent surface. Can be made smaller, and the tube length can be shortened at the same time.

This shortening of the tube axis length shortens the time for which the main lens position approaches the fluorescent film and the reaction of the space charge in the electron beam continues, so that the beam spot diameter on the fluorescent surface can be reduced.

In this state, the electron beam in the main focusing lens approaches the deflection magnetic field generating portion or enters into the deflection magnetic field generating portion, so that it is easy to deform by the deflection magnetic field, but the deflection aberration correction according to the deflection angle causes the deformation. Is suppressed.

In order to make the diameter of the beam spot at the center of the fluorescent surface smaller, efforts have always been made in the related art for the large diameter of the main focusing lens. Large diameter hardening is effective by increasing the electron beam diameter through the main focusing lens. In this state, the electron beam in the main focusing lens is more likely to be affected by the deflection magnetic field, so the main focusing lens must be separated from the deflecting magnetic field, and the tube length of the cathode ray tube becomes long. In the present invention, the tube axis length can be shortened even in this case by the deflection aberration correction vehicle according to the deflection amount, thereby sufficiently exhibiting the characteristics of the large-focus cured main focusing lens.

When the electron beam spot is located at the center of the screen, the deflection field is not affected by the deflection field. Therefore, the deflection field is not required. Therefore, the lens action of the electron gun becomes the rotationally symmetric focusing system, and the electron beam spot diameter on the screen. Can be made smaller.

In addition, if a dynamic focus voltage is applied to the focusing electrode of the electron gun, a proper focusing of the electron beam is possible in the entire area of the screen, and a good resolution can be obtained in the entire area of the screen. By combining with the fixed non-uniform electric field according to the present invention in which the electron beam is deflected and its trajectory is changed and the deflection aberration correction amount of the electron beam changes according to the deflection angle, it becomes possible to lower the required dynamic focus voltage.

Also, the non-rotationally symmetric electric field of at least one electric field made by a plurality of electrostatic lenses constituted by electrodes constituting the electron gun makes the shape of the electron beam spot in the large current region at the center of the screen substantially circular or approximately rectangular. In addition, the proper focus voltage acting in the electron beam scanning direction is higher than the electrostatic lens having a high focus characteristic by the proper focus voltage acting in the direction perpendicular to the scanning direction, and the scanning direction diameter of the electron beam spot in the small current region in the center of the screen. The diameter of the scanning direction and the direction perpendicular to the scan mask and the scanning line density in the direction perpendicular to the scanning direction and the proper focus voltage acting in the scanning direction are higher than the proper focus voltage acting in the direction perpendicular to the scanning direction. And an electrostatic lens having a non-rotational symmetric electric field. Across the light surface region on the screen it can be provided a cathode ray tube having a good focus characteristic without the moiré even to the entire current region.

Further, in the present invention, since the tube axis length of the cathode ray tube can be shortened, the inner length of the cabinet of the image display apparatus using the cathode ray tube can be shortened, thereby saving the space for installing the image display apparatus. The shortening of the depth of the cabinet is extremely difficult in the prior art and is a big selling point. In addition, the cabinet having a short depth increases the transportation efficiency, thereby saving the transportation cost of the image display apparatus.

In addition, in the present invention, the tube axis length of the cathode ray tube can be shortened, thereby improving transportation efficiency of the cathode ray tube, thereby saving transportation cost.

Claims (52)

A method for correcting deflection aberration of a cathode ray tube having at least a plurality of electrodes, a deflecting device, and a fluorescent surface, wherein a non-uniform electric field is fixed within a deflection field downstream of the cathode end of the anode of the electron gun. A method for correcting deflection aberration of a cathode ray tube, comprising arranging a pair of electrodes extending toward the fluorescent surface on both sides of a path to correct deflection aberration of an electron beam. In a deflection aberration correction method of a cathode ray tube having at least an electron gun, a deflecting device, and a fluorescent surface composed of a plurality of electrodes, a non-uniform electric field fixed downstream of the cathode end of the anode of the electron gun is formed within the deflection field, A deflection aberration correction method for a cathode ray tube, characterized in that the deflection aberration corresponding to the deflection amount of the electron beam is corrected by arranging a pair of electrodes extending toward the fluorescent surface on both sides of the path. In a deflection aberration correction method of a cathode ray tube having at least a plurality of electrodes, a deflecting device, and a fluorescent surface, a fixed non-uniform electric field having astigmatism is formed downstream of a cathode end of an anode of the electron gun in a deflection field. And arranging a pair of electrodes extending toward the fluorescent surface on both sides of the path of the electron beam so as to correct deflection aberration corresponding to the deflection amount of the electron beam. 4. The method of claim 3, wherein the fixed non-uniform electric field has astigmatism for emitting an electron beam. 4. The method of claim 3, wherein the fixed non-uniform electric field has astigmatism for emitting an electron beam, and corrects deflection aberration corresponding to a deflection amount in a direction perpendicular to the scanning line of the electron beam. 4. The method of claim 3, wherein the fixed non-uniform electric field has astigmatism for emitting an electron beam, and corrects a deflection aberration corresponding to the deflection amount in the scanning line direction of the electron beam. 4. The method of claim 3, wherein the fixed non-uniform electric field has astigmatism that focuses an electron beam. 4. The method of claim 3, wherein the fixed non-uniform electric field has astigmatism for focusing the electron beam, and corrects the deflection aberration corresponding to the deflection amount in a direction perpendicular to the scanning line of the electron beam. The method of claim 3, wherein the fixed non-uniform electric field has astigmatism for focusing the electron beam, and corrects the deflection aberration corresponding to the deflection amount in the scanning line direction of the electron beam. In a deflection aberration correction method of a cathode ray tube having at least a plurality of electrodes, a deflector, and a fluorescent surface, a fixed non-uniform magnetic field with coma aberration is formed downstream of a cathode end of an anode of the electron gun within a deflection field. And arranging a pair of electrodes extending toward the fluorescent surface on both sides of the path of the electron beam to correct the deflection aberration corresponding to the deflection amount of the electron beam. The method of claim 10, wherein the fixed non-uniform electric field has a coma aberration that emits an electron beam. The method of claim 10, wherein the fixed non-uniform electric field has a coma aberration that emits an electron beam, and corrects a deflection aberration corresponding to a deflection amount in a direction perpendicular to the scan line of the electron beam. The method of claim 10, wherein the fixed non-uniform electric field has a coma aberration that emits an electron beam, and corrects a deflection aberration corresponding to the scanning line direction and the amount of deflection of the electron beam. The method of claim 10, wherein the fixed non-uniform electric field has a coma aberration that focuses an electron beam. The method of claim 10, wherein the fixed non-uniform electric field has a coma aberration that focuses the electron beam, and corrects the deflection aberration corresponding to the deflection amount in a direction perpendicular to the scan line of the electron beam. The method of claim 10, wherein the fixed non-uniform electric field has a coma aberration that focuses the electron beam, and corrects the deflection aberration corresponding to the scanning line direction and the deflection amount of the electron beam. A cathode ray tube having at least an electron gun consisting of a plurality of electrodes, a deflection device for forming a deflection magnetic field, and a fluorescent surface, in the deflection field, downstream of the cathode end of the anode of the electron gun to correct deflection aberrations. And a deflection aberration correcting electrode comprising a pair of electrodes arranged to form a fixed non-uniform electric field and to extend toward the fluorescent surface on both sides of the path of the electron beam. A cathode ray tube having at least an electron gun composed of a plurality of electrodes, a deflection device for forming a deflection magnetic field, and a fluorescent surface, wherein the anode of the electron gun is corrected in the deflection field to correct deflection aberration corresponding to the deflection amount of the electron beam. And a deflection aberration correcting electrode comprising a pair of electrodes arranged to form a non-uniform electric field fixed downstream of the cathode end of the cathode and to extend toward the fluorescent surface on both sides of an electron beam path. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correction electrode has astigmatism corresponding to the deflection amount of the electron beam. 19. The cathode ray tube according to claim 18, wherein said deflection aberration correcting electrode has astigmatism for emitting an electron beam in response to a deflection amount. 19. The cathode ray tube according to claim 18, wherein said deflection aberration correcting electrode has astigmatism for emitting an electron beam corresponding to a deflection amount perpendicular to the scanning line. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correcting electrode has astigmatism for emitting an electron beam corresponding to the deflection amount in the scanning line direction. 19. The cathode ray tube according to claim 18, wherein said deflection aberration correcting electrode has astigmatism for focusing an electron beam corresponding to a deflection amount. 19. The cathode ray tube according to claim 18, wherein said deflection aberration correcting electrode has astigmatism for focusing an electron beam corresponding to a deflection amount perpendicular to the scanning line. 19. The cathode ray tube according to claim 18, wherein said deflection aberration correcting electrode has astigmatism for focusing an electron beam corresponding to the deflection amount in the scanning line direction. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correcting electrode has coma aberration corresponding to the deflection amount of the electron beam. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correction electrode has a coma aberration for emitting an electron beam corresponding to the deflection amount of the electron beam. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correction electrode has a coma aberration for emitting an electron beam corresponding to a deflection amount perpendicular to the scanning line of the electron beam. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correcting electrode has a coma aberration for emitting an electron beam in correspondence with the scanning line direction and the amount of deflection of the electron beam. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correction electrode has a coma aberration for focusing the electron beam corresponding to the deflection amount of the electron beam. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correcting electrode has a coma aberration for focusing the electron beam corresponding to the deflection amount in a direction perpendicular to the scanning line of the electron beam. 19. The cathode ray tube according to claim 18, wherein the deflection aberration correction electrode has a coma aberration for focusing the electron beam in correspondence with the scanning line direction and the deflection amount of the electron beam. An image display apparatus using an electron gun composed of a plurality of electrodes, a deflection apparatus for forming a deflection magnetic field, and a cathode ray tube having at least a fluorescent surface, wherein the anode of the electron gun is used to correct deflection aberration in the deflection magnetic field. A cathode ray tube having a deflection aberration correction electrode comprising a pair of electrodes formed to form a non-uniform electric field fixed downstream of the cathode end of the electron beam and extending toward the fluorescent surface on both sides of the path of the electron beam. An image display device. An image display device using an electron gun composed of a plurality of electrodes, a deflection device for forming a deflection magnetic field, and a cathode ray tube having at least a fluorescent surface, wherein the deflection aberration corresponding to the deflection amount of the electron beam is generated within the deflection magnetic field. And a deflection aberration correction electrode comprising a pair of electrodes arranged to form a fixed non-uniform electric field downstream of the cathode end of the anode of the electron gun and to extend toward the fluorescent surface on both sides of the path of the electron beam. An image display apparatus using a cathode ray tube. 35. An image display apparatus according to claim 34, wherein the deflection aberration correction electrode of said cathode ray tube has astigmatism corresponding to the deflection amount of an electron beam. 35. An image display apparatus according to claim 34, wherein the deflection aberration correction electrode of said cathode ray tube has coma aberration corresponding to the deflection amount of an electron beam. Along the tube axis, a cathode is formed in line with the cathode, an electrode for forming the main lens for shaping the electron beam, and a shield cup disposed adjacent to the electrode for forming the main lens for protecting the shaped electron beam from the external environment. An electron gun including in the above order; A deflection yoke for generating a deflection magnetic field to deflect the electron beam in an inline direction and in a direction perpendicular to the inline direction; A color cathode ray tube having a fluorescent surface that emits light when irradiated with a deflected electron beam to form an image, wherein a shield cup of the electron gun is disposed in the region of the deflection magnetic field of the deflection yoke, and a deflection aberration correcting electrode member passes through the three electron beams. And a deflection aberration correcting electrode member for changing the diameter of the electron beam in correspondence with the deflection amount of the electron beam. Color cathode ray tube, characterized in that. 38. The color cathode ray tube according to claim 37, wherein the deflection aberration correcting electrode member has an opposing portion that sandwiches a path of the three electron beams from a direction perpendicular to the inline direction. The color cathode ray tube according to claim 38, wherein the deflection aberration correcting electrode member forms an astigmatism electric field. The color cathode ray tube according to claim 38, wherein the deflection aberration correcting electrode member forms a coma field. Observation is made by observation of a cathode which forms an electron beam in-line, an electrode forming a main lens to shape the electron beam, and a shield cup disposed adjacent to the electrode forming the main lens to protect the shaped electron beam from the external environment. An electron gun including in the above order; A deflection yoke for generating a deflection magnetic field to deflect the electron beam in an inline direction and in a direction perpendicular to the inline direction; And a color cathode ray tube having a fluorescent surface that emits light when irradiated with a deflected electron beam to form an image, wherein a shield cup of the electron gun is disposed in an area of the deflection magnetic field of the deflection yoke, and a common single opening is passed through the three electron beams. A deflection aberration correcting electrode member is formed at the bottom of the shield cup on the cathode side to allow the electron beam to focus on the electron beam closer to the fluorescent surface than the common single opening to change the diameter of the electron beam according to the deflection amount of the electron beam. Color cathode ray tube, characterized in that installed to change the divergence action. 42. The color cathode ray tube according to claim 41, wherein the deflection aberration correcting electrode member has an opposing portion that sandwiches a path of the three electron beams from a direction perpendicular to the inline direction. 43. The color cathode ray tube according to claim 42, wherein the deflection aberration correcting electrode member forms an astigmatism electric field. 43. The color cathode ray tube according to claim 42, wherein the deflection aberration correcting electrode member forms a coma field. Observation is made by observation of a cathode which forms an electron beam in-line, an electrode forming a main lens to shape the electron beam, and a shield cup disposed adjacent to the electrode forming the main lens to protect the shaped electron beam from the external environment. An electron gun including in the above order; A deflection yoke having a coil and a core and generating a deflection magnetic field to deflect the electron beam in an inline direction and in a direction perpendicular to the inline direction; A color cathode ray tube having a fluorescent surface that emits light when irradiated with a deflected electron beam to form an image, wherein a deflection aberration correcting electrode member passes through three electron beams so as to change the diameter of the electron beam corresponding to the deflection amount of the electron beam. It is provided to change the focusing or diverging operation of the electron beam closer to the fluorescent surface than the opening formed in the bottom of the shield cup on the cathode side, and the distance in the tube axis direction is from the end of the core of the deflection yoke on the cathode side to the fluorescent surface. The color cathode ray tube, characterized in that it is set to 40mm or less to the end of the deflection aberration correction electrode member. 46. The color cathode ray tube according to claim 45, wherein the deflection aberration correcting electrode member has an opposing portion that sandwiches a path of the three electron beams from a direction perpendicular to the inline direction. The color cathode ray tube according to claim 46, wherein the deflection aberration correcting electrode member forms an astigmatism electric field. 47. The color cathode ray tube according to claim 46, wherein the deflection aberration correcting electrode member forms a coma field. Along the tube axis, a cathode is formed in line with the cathode, an electrode for forming the main lens for shaping the electron beam, and a shield cup disposed adjacent to the electrode for forming the main lens for protecting the shaped electron beam from the external environment. An electron gun including in sequence as described above; A deflection yoke having a coil and a core and generating a deflection magnetic field to deflect the electron beam in an inline direction and in a direction perpendicular to the inline direction; A color cathode ray tube having a fluorescent surface that emits light when irradiated with a deflected electron beam to form an image, wherein a common single opening is formed at the bottom of the shield cup on the cathode side to allow passage of three electron beams, and is deflected. In order to change the diameter of the electron beam corresponding to the deflection amount of the electron beam, the aberration correction electrode member is provided to change the focusing or diverging action of the electron beam closer to the fluorescent surface than the common single opening, and in the tube axis direction. And a distance of 40 mm or less from the end of the core of the deflection yoke on the cathode side to the deflection aberration correction electrode member on the fluorescent surface side. The color cathode ray tube according to claim 49, wherein the deflection aberration correcting electrode member has an opposing portion that sandwiches a path of the three electron beams from a direction perpendicular to the inline direction. 51. The color cathode ray tube according to claim 50, wherein the deflection aberration correcting electrode member forms an astigmatism electric field. 51. The color cathode ray tube according to claim 50, wherein the deflection aberration correcting electrode member forms a coma field.