JPWO2006129800A1 - Surface treatment agent for pattern formation - Google Patents

Abstract

Surface treatment agent for photolithography comprising at least one of the following fluorine-based monomer (A) and fluorine-based polymer (B) comprising the fluorine-containing monomer: (A-1) having 1 to 6 carbon atoms An α-substituted acrylate having a fluoroalkyl group, (A-2) a fluorine-containing silsesquioxane monomer (A-3) containing a fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group (A-3) having a perfluoropolyether group Polymerizable monomer (A-4) A fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group are -SO2 (CH2) n- (n is 1 to 10) (A-5) Monomers (A-1) to (A And 4) at least one fluorine-based monomer selected from the group consisting of macromonomers having a (meth) acryloyl group at the end of the polymer having at least one repeating unit. Even if the surface treatment agent has a short-chain Rf group having 6 or less carbon atoms, it provides a sufficiently high water and oil repellency to the liquid repellent region.

Description

  The present invention relates to a surface treatment agent for producing a pattern surface comprising a lyophilic region and a liquid repellent region by a photolithography method.

  Fluoroalkyl group (hereinafter abbreviated as Rf group) -containing monomer [J. Poly. Sci. Part A, 37, 77 (1999)], or copolymer of Rf group-containing monomer and crosslinkable functional group-containing monomer 2003-300323) is blended with a crosslinkable monomer and a photopolymerization initiator and photopolymerized. These techniques can be applied as a surface treatment agent for producing a pattern surface composed of lyophobic and lyophilic regions having different wettability by a photolithography method. In the prior art, an Rf group-containing monomer having a long-chain Rf group having 8 or more carbon atoms, which is advantageous for liquid repellency, has been used.

  However, an Rf group-containing monomer having a long-chain Rf group having 8 or more carbon atoms, or a copolymer of the Rf group-containing monomer is compatible with the crosslinkable monomer, photopolymerization initiator, solvent, etc. constituting the surface treatment agent. There was a difficult problem.

  On the other hand, if a long-chain Rf group having 8 or more carbon atoms is used for the Rf group-containing monomer, there is a concern about environmental and biological accumulation problems. Conventionally, Rf group-containing compounds having a long chain Rf group having 8 to 12 carbon atoms, which have been widely used as a surface treatment agent for imparting high water and oil repellency to a substrate, have recently been applied to the environment and living organisms. Accumulation problems have been pointed out. Recent Research Results [EPA Report “Draft Risk Assessment of the Potential Human Health Effects Associated With Exposure to Perfluorooctanoic Acid and Its Salts (PFOA)” (https://www.epa.gov/opptintr/pfoa/pfoarisk.pdf)] From the above, concerns about the accumulation of PFOA (perfluorooctanoic acid), a type of long-chain Rf group-containing compound, in the human body have been revealed. On April 14, 2003, EPA (United States Environmental Protection Agency) announced PFOA. Announced that it would strengthen scientific research on

  On the other hand, Federal Register (FR Vol.68, No.73 / April 16, 2003 [FRL-2303-8], https://www.epa.gov/opptintr/pfoa/pfoafr.pdf) and EPA Environmental News FOR RELEASE : MONDAY APRIL 14, 2003 EPA INTENSIFIES SCIENTIFIC INVESTIGATION OF A CHEMICAL PROCESSING AID (https://www.epa.gov/opptintr/pfoa/pfoaprs.pdf) and EPA OPPT FACT SHEET April 14, 2003 (http: // www. epa.gov/opptintr/pfoa/pfoafacts.pdf) publishes that telomers can produce PFOA by degradation or metabolism (telomers are synonymous with long chain Rf groups). We also announced that telomers are used in many products such as foam, water- and oil-repellent and antifouling foams, care products, cleaning products, carpets, textiles, paper and leather. Yes.

  Due to such environmental problems, it has become necessary to use an Rf group-containing compound having a short chain Rf group having 1 to 6 carbon atoms as a water- and oil-repellent agent as an alternative to a long-chain Rf group-containing compound. . However, even if the conventional skeleton is directly replaced with the short-chain Rf group, the water / oil repellency of the liquid repellent region is insufficient.

An object related to the first gist of the present invention is to provide a surface treatment agent for pattern formation which gives a sufficiently high water and oil repellency to a liquid repellent region even if it has a short chain Rf group having 6 or less carbon atoms. It is.
The purpose of the second aspect of the present invention is to form a minute liquid-repellent region on a substrate by a non-contact microdroplet discharge method, and the liquid-repellent region is high even without using a long-chain Rf group-containing compound. It is to provide a method for producing a pattern substrate having liquid repellency.

According to a first aspect, the present invention provides a surface treatment agent for photolithography comprising a specific fluorine monomer and / or a specific fluorine polymer.
As the fluorine-based monomer, for example,
An α-substituted acrylate monomer having an Rf group having 1 to 6 carbon atoms (the substituent at the α-position is, for example, F or Cl);
A polymerizable silsesquioxane monomer having an Rf group having 1 to 6 carbon atoms,
A polymerizable monomer having a perfluoropolyether group,
A polymerizable monomer in which a fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group are connected by —SO ₂ (CH ₂ ) _n — (n is 1 to 10, particularly 3 to 6). At least one of these monomers. A macromonomer having a (meth) acryloyl group at the end of a polymer having a repeating unit as a repeating unit is applied.

The present invention provides a surface treatment agent for photolithography comprising at least one fluorine-containing compound selected from the group consisting of the following fluorine-based monomer (A) and fluorine-based polymer (B).
● Fluoromonomer (A)
(A-1) α-substituted acrylate monomer having a fluoroalkyl group having 1 to 6 carbon atoms (α-position substituent: fluorine atom, chlorine atom, bromine atom, iodine atom, CFX ¹ X ² group (provided that X ¹ And X ² is a hydrogen atom, a fluorine atom or a chlorine atom.), A cyano group, a linear or branched fluoroalkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted benzyl group, a substituted or unsubstituted group A phenyl group, or a linear or branched alkyl group having 1 to 20 carbon atoms),
(A-2) a fluorine-containing silsesquioxane monomer containing a fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group,
(A-3) a polymerizable monomer having a perfluoropolyether group,
(A-4) A polymerizable monomer in which a fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group are connected by —SO ₂ (CH ₂ ) _n — (n is 1 to 10, particularly 3 to 6) (A- 5) At least one monomer selected from the group consisting of macromonomers having a (meth) acryloyl group at the end of a polymer having at least one monomer (A-1) to (A-4) as a repeating unit. The monomer may be a mixture of the above two types (for example, a combination of monomer (A-1) and monomer (A-4)).

● Fluoropolymer (B)
The fluorine-based polymer having a repeating unit derived from the repeating unit (B-1) which is the same as the fluorine-based monomer (A), and may be a homopolymer or a copolymer. In the case of a copolymer, any of random, alternating, block, and graft may be used.

  According to the second aspect, the present invention provides an electromagnetic curing composition comprising a fluoromonomer-containing fluorine-based monomer (A), a crosslinking agent (B), and a photocrosslinking catalyst (C) in a non-contact manner. A pattern that forms on the substrate a pattern consisting of at least two regions with different surface free energies by discharging to the substrate with a micro-droplet discharge method and irradiating and curing the fine coating film with electromagnetic waves. A method for manufacturing a substrate is also provided.

  The surface treating agent of the present invention forms a patterned film exhibiting high water and oil repellency on a substrate.

BEST MODE FOR CARRYING OUT THE INVENTION

［式中、Ｘは、フッ素原子、塩素原子、臭素原子、ヨウ素原子、ＣＦＸ¹Ｘ²基（但し、Ｘ¹およびＸ²は、水素原子、フッ素原子、塩素原子、臭素原子またはヨウ素原子である。）、シアノ基、炭素数１〜２１の直鎖状または分岐状のフルオロアルキル基、置換または非置換のベンジル基、置換または非置換のフェニル基、あるいは炭素数１〜２０の直鎖状または分岐状アルキル基
Ｙは、直接結合、酸素原子を有していてもよい炭素数１〜１０の脂肪族基、酸素原子を有していてもよい炭素数６〜１０の芳香族基、環状脂肪族基または芳香脂肪族基、−ＣＨ₂ＣＨ₂Ｎ(Ｒ¹)ＳＯ₂−基（但し、Ｒ¹は炭素数１〜４のアルキル基である。）、−ＣＨ₂ＣＨ(ＯＹ¹)ＣＨ₂−基（但し、Ｙ¹は水素原子またはアセチル基である。）、または、−(CH₂)_nSO₂−基（nは1〜10）である。
Ｒｆは炭素数1〜6の直鎖状または分岐状のフルオロアルキル基、または、繰り返し単位：−Ｃ_３Ｆ_６Ｏ−、−Ｃ_２Ｆ_４Ｏ−および−ＣＦ_２Ｏ−からなる群から選択された少なくとも一種の繰り返し単位の合計数が１〜２００のフルオロエーテル基である。］
で示されるフッ素含有基を有する含フッ素単量体であってよい。Α-substituted acrylate (A-1) having a fluoroalkyl group having 1 to 6 carbon atoms, polymerizable monomer (A-3) having a perfluoropolyether group, fluoroalkyl group and polymerizable group having 1 to 6 carbon atoms Is a polymerizable monomer (A-4) linked by —SO ₂ (CH ₂ ) _n — (n is 1 to 10, particularly 3 to 6),
(A) Formula:

[Wherein X is a fluorine atom, chlorine atom, bromine atom, iodine atom, CFX ¹ X ² group (where X ¹ and X ² are a hydrogen atom, fluorine atom, chlorine atom, bromine atom or iodine atom) ), A cyano group, a linear or branched fluoroalkyl group having 1 to 21 carbon atoms, a substituted or unsubstituted benzyl group, a substituted or unsubstituted phenyl group, or a straight chain having 1 to 20 carbon atoms, or The branched alkyl group Y is a direct bond, an aliphatic group having 1 to 10 carbon atoms which may have an oxygen atom, an aromatic group having 6 to 10 carbon atoms which may have an oxygen atom, or a cyclic aliphatic group. Group or araliphatic group, —CH ₂ CH ₂ N (R ¹ ) SO ₂ — group (where R ¹ is an alkyl group having 1 to 4 carbon atoms), —CH ₂ CH (OY ¹ ) CH ₂ -group (where Y ¹ is a hydrogen atom or an acetyl group) or — (CH ₂ ) _n SO ₂ — group (n is 1 to 10).
Rf is a linear or branched fluoroalkyl group having 1 to 6 carbon atoms or a repeating _{unit: -C 3 F 6 O -,} - selected from C _{2 F} 4 O- and _-CF 2 group consisting of O- The total number of the at least one repeating unit is 1 to 200 fluoroether groups. ]
The fluorine-containing monomer which has a fluorine-containing group shown by these may be sufficient.

In the above formula, between a polymerizable group (eg, a carbon-carbon double bond group) and a fluoroalkyl group (ie, instead of —O—Y—),
-O-Y ^1-
(Here, Y ¹ is a direct bond, an aliphatic group having 1 to 10 carbon atoms which may have an oxygen atom, an aromatic group having 6 to 10 carbon atoms which may have an oxygen atom, or a cyclic group. An aliphatic group or an araliphatic group, —CH ₂ CH ₂ N (R ¹ ) SO ₂ — (CH ₂ CH ₂ ) _a — group (where R ¹ is an alkyl group having 1 to 4 carbon atoms, a is 0 or 1), a —CH ₂ CH (OR ¹¹ ) CH ₂ — group (where R ¹¹ is a hydrogen atom or an acetyl group), or a — (CH ₂ ) _n SO ₂ — group (n is 1 to 10)), or -Y ² -[-(CH ₂ ) _m -Z-] _p- (CH ₂ ) _n-
(Where Y ² is —O— or —NH—; Z is —S— or —SO ₂ —; m is 1 to 10, n is 0 to 10, p is 0 or 1; is there.)
You may have.

Therefore, monomers (A-1), (A-3), and (A-4) are represented by the formula:
_{CH 2 = CX-C (=} O) -B-Rf
[Wherein, B represents —O—Y ¹ — or —Y ² — [— (CH ₂ ) _m —Z—] _p — (CH ₂ ) _n —
(Here, Y ¹ , Y ² , Z, m, n, and p are as defined above.)
X and Rf are as defined above. ]
It may be a compound shown by these.

A polymerizable monomer (A-3) having a perfluoropolyether group, and a fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group are —SO ₂ (CH ₂ ) _n — (n is 1 to 10, especially 3 to In the polymerizable monomer (A-4) linked by 6), examples of X are hydrogen and a methyl group in addition to the above atoms and groups.

  The polymerizable monomer (A-3) and the polymerizable monomer (A-4) are monomers having a polymerizable group. The polymerizable group may be a carbon-carbon group (for example, ethenyl group) bonded by a double bond. The polymerizable monomers (A-2) to (A-4) are acrylates substituted at the α-position (that is, the α-position is not hydrogen or an alkyl group) [in the same manner as the monomer (A-1)] Also good. Alternatively, it may be an acrylate having a hydrogen atom or a methyl group at the α-position.

In the above formula (I), the Rf group has 1 to 6 carbon atoms, for example 1 to 5, preferably 4. In general, the longer the Rf group, the better the liquid repellency, and the shorter the Rf group, the better the compatibility. The number of carbons for which both the liquid repellency and the compatibility are compatible is 4. From the viewpoint of bioaccumulation, 4 is preferable to 6 carbon atoms.
Examples of Rf _{groups, -CF 3, -CF 2 CF 3} , -CF 2 CF 2 CF 3, -CF (CF 3) 2, -CF 2 CF 2 CF 2 CF 3, -CF 2 CF (CF 3) ₂ , -C (CF ₃ ) ₃ ,-(CF ₂ ) ₄ CF ₃ ,-(CF ₂ ) ₂ CF (CF ₃ ) ₂ , -CF ₂ C (CF ₃ ) ₃ , -CF (CF ₃ ) CF ₂ CF ₂ CF ₃ , — (CF ₂ ) ₅ CF ₃ , — (CF ₂ ) ₃ CF (CF ₃ ) _{2 and the} like.

Y is a direct bond, an aliphatic group having 1 to 10 carbon atoms which may have an oxygen atom, an aromatic group having 6 to 10 carbon atoms which may have an oxygen atom, a cyclic aliphatic group or an aromatic group. An aliphatic group, a —CH ₂ CH ₂ N (R ¹ ) SO ₂ — group (where R ¹ is an alkyl group having 1 to 4 carbon atoms), a —CH ₂ CH (OY ¹ ) CH ₂ — group ( However, Y ¹ is a hydrogen atom or an acetyl group), or, -. a group (n is _{1~10) - (CH 2) n} SO 2. The aliphatic group is preferably an alkylene group (particularly having 1 to 4 carbon atoms, such as 1 or 2). The aromatic group and the cycloaliphatic group may be either substituted or unsubstituted. In the —CH ₂ CH ₂ N (R ¹ ) SO ₂ — group and — (CH ₂ ) _n SO ₂ — group, the atom bonded to Rf is either a carbon atom in the methylene group or a sulfur atom in the sulfone group. In general, it may be a sulfur atom in a sulfone group.

  Examples of the fluorine-containing monomer are as follows.

Rf−SO₂(CH₂)₃−OCO−CH=CH₂

Rf−SO ₂ (CH ₂ ) ₃ −OCO−CH = CH ₂

CH ₂ = C (−F) −C (= O) −O− (CH ₂ ) ₂ −S−Rf
CH ₂ = C (−F) −C (= O) −O− (CH ₂ ) ₂ −S− (CH ₂ ) ₂ −Rf
CH ₂ = C (−F) −C (= O) −O− (CH ₂ ) ₂ −SO ₂ −Rf
CH ₂ = C (−F) −C (= O) −O− (CH ₂ ) ₂ −SO ₂ − (CH ₂ ) ₂ −Rf
CH ₂ = C (-F) -C (= O) -NH- (CH ₂ ) ₂ -Rf
CH ₂ = C (-Cl) -C (= O) -O- (CH ₂ ) ₂ -S-Rf
CH ₂ = C (−Cl) −C (= O) −O− (CH ₂ ) ₂ −S− (CH ₂ ) ₂ −Rf
CH ₂ = C (-Cl) -C (= O) -O- (CH ₂ ) ₂ -SO ₂ -Rf
CH ₂ = C (-Cl) -C (= O) -O- (CH ₂ ) ₂ -SO _2- (CH ₂ ) ₂ -Rf
CH ₂ = C (-Cl) -C (= O) -NH- (CH ₂ ) ₂ -Rf
CH ₂ = C (-Cl) -C (= O) -O- (CH ₂ ) ₃ -S-Rf
CH ₂ = C (-Cl) -C (= O) -O- (CH ₂ ) ₃ -SO ₂ -Rf
CH ₂ = C (−CH ₃ ) −C (= O) −O− (CH ₂ ) ₂ −Rf
CH ₂ = C (H) −C (= O) −O− (CH ₂ ) ₂ −Rf

[In the formula, Rf is a linear or branched fluoroalkyl group having 1 to 6 carbon atoms, or repeating units: —C ₃ F ₆ O—, —C ₂ F ₄ O— and —CF ₂ O— A total number of at least one repeating unit selected from the group consisting of 1 to 200 is a perfluoropolyether group. ]

The fluorine-containing silsesquioxane monomer (A-2) containing a fluoroalkyl group having 1 to 6 carbon atoms and a polymerizable group includes (i) a fluorine-containing incompletely condensed silsesquioxane and (ii) a polymerizable functional group. It is obtained by reacting with a reactive silane having
The fluorine-containing incompletely condensed silsesquioxane (i) is an incompletely condensed silsesquioxane having a fluoroalkyl group.

Silsesquioxane is also called POSS (Polyhedral Oligomeric Silsesquioxane).
The silanol group of incompletely condensed silsesquioxane (i) has high reactivity, and generally 1 to 3 silanol groups are present in the molecule.

（構造式Ｉ）Specific examples of the incompletely condensed silsesquioxane (i) include, for example, the following (Structural Formula I).

(Structural Formula I)

  The reactive silane (ii) having a polymerizable functional group has a polymerizable functional group and a reactive group. In the reactive silane (ii), examples of the polymerizable functional group are a (meth) acryl group, an alpha-substituted acrylic group, an epoxy group, a vinyl group, and the like. In the reactive silane (ii), examples of the reactive group are a trichlorosilyl group and a trialkoxysilyl group (the alkoxy group has 1 to 5 carbon atoms).

The reactive silane (ii) is, for example, the general formula:
A ¹¹ −A ²¹ −Si (A ³¹ ) ₃
[Wherein A ¹¹ is a polymerizable functional group,
A ²¹ is a direct bond or an alkyl group having 1 to 20 (for example, 1 to 10) carbon atoms,
A ³¹ is a halogen atom (for example, a chlorine atom and a bromine atom) or an alkoxy group (the alkoxy group has 1 to 5 carbon atoms). ]
It is a compound shown by these.

Examples of the fluorine-containing silsesquioxane monomer (a) are as follows.

When the fluorine-based polymer (B) is a copolymer, the unsaturated monomer is used as a copolymerization monomer to be copolymerized with the fluorine-based monomer (B-1) (that is, the same as the fluorine-based monomer (A)). An acid (B-2) and a high softening point monomer (B-3) are mentioned.
The fluorine-based polymer (B) is, for example,
(B1) Homopolymer of fluorine-based monomer (B-1),
(B2) copolymer of fluorine-based monomer (B-1) and unsaturated organic acid (B-2), or (B3) fluorine-based monomer (B-1) and unsaturated organic acid (B-2) and high It may be a copolymer of a softening point monomer (B-3).

  The unsaturated organic acid (B-2) is a monomer having at least one carbon-carbon double bond and at least one acid group [eg, carboxyl group (COOH group)]. Particularly preferred examples of unsaturated organic acids are unsaturated carboxylic acids, such as free unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides. Examples of unsaturated organic acids (B-2) are (meth) acrylic acid, vinyl acetic acid, crotonic acid, itaconic acid, itaconic anhydride, maleic acid, maleic anhydride, fumaric acid, and cinnamic acid. The unsaturated organic acid (B-2) imparts to the fluoropolymer (B) crosslinkability with a crosslinking agent in an electromagnetic wave irradiation region and solubility with an alkali developer in an electromagnetic wave non-irradiation region.

High softening point monomer (B-3)
A monomer having a glass transition point or a melting point of 100 ° C. or higher, particularly 120 ° C. or higher in a homopolymer state,
Or
CH ₂ = C (R ¹ ) COOR ² [R ¹ : H or CH ₃ , R ² : saturated alkyl group having 4 to 20 carbon atoms and a ratio of carbon atoms to hydrogen atoms of 0.58 or more].
Examples of R ² are isobornyl, bornyl, phensil (all of which are C ₁₀ H ₁₇ , carbon atom / hydrogen atom = 0.58), adamantyl (C ₁₀ H ₁₅ , carbon atom / hydrogen atom = 0.66), Examples thereof include bridged hydrocarbon rings such as norbornyl (C ₇ H ₁₂ , carbon atom / hydrogen atom = 0.58). These crosslinked hydrocarbon rings may have a hydroxyl group or an alkyl group.

  Examples of the high softening point monomer (B-3) are methyl methacrylate, phenyl methacrylate, cyclohexyl methacrylate, isobornyl (meth) acrylate, norbornyl (meth) acrylate, and adamantyl (meth) acrylate. Examples of norbornyl (meth) acrylate are 3-methyl-norbornylmethyl (meth) acrylate, norbornylmethyl (meth) acrylate, norbornyl (meth) acrylate, 1,3,3-trimethyl-norbornyl (meth) acrylate , Miltanylmethyl (meth) acrylate, isopinocamphanyl (meth) acrylate, 2-{[5- (1 ′, 1 ′, 1′-trifluoro-2′-trifluoromethyl-2′-hydroxy) propyl] norbornyl } (Meth) acrylate. Examples of adamantyl (meth) acrylate are 2-methyl-2-adamantyl (meth) acrylate, 2-ethyl-2-adamantyl (meth) acrylate, 3-hydroxy-1-adamantyl (meth) acrylate, 1-adamantyl-α -Trifluoromethyl (meth) acrylate.

Glass transition point, melting point, respectively JIS K7121-1987 "Plastics transition temperature measuring method" in defined are extrapolated glass transition ending temperature _{(T eg),} and the melting peak temperature _{(T pm).} When a high softening point monomer (B-3) having a glass transition point or a melting point of 100 ° C. or higher is used in the homopolymer state as the repeating unit of the fluoropolymer (B), the dimensional stability when the substrate is heat-treated is improved. In addition to the excellent effect, there is also an effect of improving the liquid repellency of the fluorine-based monomer (B-1).

が例示される。マクロモノマー中のフッ素系モノマーの重合度nは好ましくは５〜２０、特に好ましくは５〜１０である。When macromonomer (A-5) is copolymerized with unsaturated organic acid monomer (B-2) and high softening point monomer (B-3) as fluorine monomer (B-1), fluorine monomer (B-1) , The effects of the unsaturated organic acid (B-2) and the high softening point monomer (B-3) are enhanced.
As an example of a macromonomer,

Is exemplified. The degree of polymerization n of the fluorinated monomer in the macromonomer is preferably 5 to 20, particularly preferably 5 to 10.

  The fluorine-based polymer (B), which is the binary or ternary copolymer, is particularly preferably a composition comprising a crosslinking agent (C), a photocrosslinking catalyst (D), and a diluent (J). preferable.

In the copolymer, the weight ratio of the fluorine-based monomer (B-1) to the unsaturated organic acid (B-2) may be 60:40 to 98: 2, particularly 80:20 to 95: 5.
In the copolymer, the amount of the high softening point monomer (B-3) may be 0 to 90% by weight, for example 1 to 80% by weight, particularly 10 to 70% by weight, based on the copolymer.
The fluorine-based polymer (B) is, for example,
Fluorine monomer (B-1) 20 to 80% by weight,
Unsaturated organic acid (B-2) 5-30% by weight, and high softening point monomer (B-3) 10-70% by weight
It may consist of

  When the fluorine-based monomer (B-1) is 20 to 80% by weight, the liquid repellency is high and the compatibility with other components constituting the surface treatment agent for photolithography is good. When the unsaturated organic acid monomer (B-2) is 5 to 30% by weight, the crosslinking property with the crosslinking agent in the electromagnetic wave irradiation region is good, and the solubility with the alkaline developer in the electromagnetic wave non-irradiation region is good. Good and liquid repellency is good. When the high softening point monomer (B-3) is 10 to 70% by weight, the effect of dimensional stability is good and the liquid repellency is good.

In addition to the unsaturated organic acid monomer (B-2), a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate (for example, 0.1 to 30% by weight, particularly Copolymerization (in the range of 0.5 to 25% by weight), the crosslinking property of the monomer (B-2) with the crosslinking agent in the electromagnetic wave irradiation region and the solubility with the alkali developer in the electromagnetic wave non-irradiation region are enhanced. There is an effect.
The copolymer of the fluorine-based polymer (B) may be copolymerized with a silane group-containing monomer represented by γ-methacryloxypropyltrimethoxysilane (for example, 0.1 to 30% by weight) as necessary. good. By copolymerizing the silane group-containing monomer, for example, adhesion to the substrate is improved.

Method for Fabricating Pattern Substrate According to the first aspect, in the present invention, a plurality of different surface free energies are obtained by using, for example, the following method using the fluorine-based monomer (A) or the fluorine-based polymer (B). A pattern substrate composed of regions, in other words, a pattern substrate composed of a plurality of patterned liquid repellent regions and lyophilic regions (hereinafter simply referred to as “pattern substrate”) is manufactured.

Method (1): The fluoropolymer (B) is dissolved in the diluent (J). When this fluoropolymer solution is applied onto a substrate to form a uniform liquid-repellent film and irradiated with electromagnetic waves (for example, vacuum ultraviolet light having a wavelength of 172 nm) through a photomask, the electromagnetic energy and the ozone generated by the electromagnetic waves are Due to the oxidizing action, only the irradiated region is photodecomposed and becomes lyophilic, and a pattern substrate is obtained. A photocatalytic technique may be used in combination to promote photolysis of the liquid repellent film.
Method (2): A composition containing a fluorine-based monomer (A), a crosslinking agent (C), and a photocrosslinking catalyst (D) (diluent (J) may be added as necessary) is applied on a substrate. When a film is formed and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured to become a liquid repellent film. A pattern substrate is obtained by removing (developing) the film in the non-irradiated region using a diluent (J) that is insoluble in the irradiated region and dissolves only the non-irradiated region.

Method (3): A fluorine-containing polymer (B) having a crosslinkable functional group (E) and a photocrosslinking catalyst (D) are dissolved in a diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.
Method (4): Fluoropolymer (B) having a crosslinkable functional group (E), a crosslinking agent (C), and a photocrosslinking catalyst (D) are dissolved in a diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.

Method (5): A fluorine-containing polymer (B) having an acidic group (F) and a crosslinkable functional group (E), a crosslinking agent (C), and a photocrosslinking catalyst (D) are dissolved in a diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.
Method (6): Fluoropolymer (B) having acidic group (F), crosslinkable functional group (E) and silicone chain (G), crosslinking agent (C), photocrosslinking catalyst (D) as diluent (J ). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.

Method (7): Dissolve the fluoropolymer (B) having an acidic group (F), the crosslinking agent (C), and the photocrosslinking catalyst (D) in the diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.
Method (8): A fluorine-containing polymer (B) having an acidic group (F) and a silicone chain (G), a crosslinking agent (C), and a photocrosslinking catalyst (D) are dissolved in a diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.

Method (9): The fluorine-based polymer (B) having an acidic group (F) and a crosslinkable functional group (E) and a photocrosslinking catalyst (D) are dissolved in the diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.
Method (10): A fluorine-containing polymer (B) having an acidic group (F), a crosslinkable functional group (E), and a silicone chain (G), and a photocrosslinking catalyst (D) are dissolved in a diluent (J). When this fluorine-based polymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is cured. A pattern substrate is obtained by developing with a solvent that dissolves only the non-irradiated region.

Method (11): A fluorine-containing polymer (B) having an acid dissociation group (H) that is converted into an acidic group by the action of an acid, and a photoacid generator (I) are dissolved in a diluent (J). When this fluoropolymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is dissociated into acid and becomes lyophilic, whereby a pattern substrate is obtained.
Method (12): Dissolve a fluorine-based polymer (B) having an acid-dissociable group (H) and a silicone chain (G), which is converted into an acid group by the action of an acid, and a photoacid generator (I) in a diluent (J). To do. When this fluoropolymer solution is applied onto a substrate to form a liquid repellent film and irradiated with electromagnetic waves through a photomask, only the irradiated region is dissociated into acid and becomes lyophilic, whereby a pattern substrate is obtained.

Method (13): A fluorine-containing polymer (B) having an acid dissociation group (H) that is converted into an acidic group by the action of an acid, and a photoacid generator (I) are dissolved in a diluent (J). When this fluoropolymer solution is applied onto a substrate to form a liquid repellent film and irradiated with an electromagnetic wave through a photomask, only the irradiated region is dissociated into an acid and becomes soluble in an alkaline aqueous solution. A pattern substrate is obtained by developing with an alkaline aqueous solution.
Method (14): Fluoropolymer (B) having acid dissociation group (H) and silicone chain (G) that are converted to acidic groups by the action of acid, and photoacid generator (I) are dissolved in diluent (J). To do. When this fluoropolymer solution is applied onto a substrate to form a liquid repellent film and irradiated with an electromagnetic wave through a photomask, only the irradiated region is dissociated into an acid and becomes soluble in an alkaline aqueous solution. A pattern substrate is obtained by developing with an alkaline aqueous solution.

In any of the methods (1) to (14), heat treatment at about 50 to 250 ° C. may be performed before (pre-baking) or after (post-baking) electromagnetic waves. When using a photoacid generator, PEB (Post Exposure Bake) treatment may be performed in the same temperature range.

● Crosslinking agent (C)
The crosslinking agent is a monofunctional or preferably a compound having two or more functional groups, and may be of a type that cures by radical polymerization reaction or a type that cures by cationic polymerization reaction. The former is an unsaturated double bond group acryloyl group or vinyl group is a functional group, the latter is an epoxy group, vinyl ether group, oxetane group is a functional group,
(a) Urethane (meth) acrylate
(b) Epoxy (meth) acrylate
(c) Polyester (meth) acrylate
(d) Polyether (meth) acrylate
(e) Silicone (meth) acrylate
(f) (Meth) acrylate monomer
(g) Epoxy monomer
(h) Vinyl ether monomer
(i) Classified as oxetane monomer. (a) to (f) are types that are cured by radical polymerization reaction, and (g) to (i) are types that are cured by cationic polymerization reaction.

  (a) to (e) are obtained by adding a (meth) acryloyl group to a resin, and are often expressed as oligomers, base resins, prepolymers, and the like.

  (a) Urethane (meth) acrylate has a urethane bond and a (meth) acryloyl group in the molecule, and tris (2-hydroxyethyl) isocyanurate diacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate Representative examples include poly [(meth) acryloyloxyalkyl] isocyanurate.

  (b) Epoxy (meth) acrylate is obtained by adding a (meth) acryloyl group to an epoxy group, and generally uses bisphenol A, bisphenol F, phenol novolac, and an alicyclic compound as starting materials.

  (c) Polyester (meth) acrylate is obtained by adding (meth) acrylate to an ester resin composed of a polyhydric alcohol and a polybasic acid. Polyhydric alcohols include ethylene glycol, 1,4-butanediol, 1,6-hexanediol, diethylene glycol, trimethylolpropane, dipropylene glycol, polyethylene glycol, polypropylene glycol, pentaerythritol, dipentaerythritol, etc. Examples of the acid include phthalic acid, adipic acid, maleic acid, trimellitic acid, itaconic acid, succinic acid, terephthalic acid, and alkenyl succinic acid.

  (d) Polyether (meth) acrylate is obtained by adding (meth) acrylate to a polyether resin of diol, such as polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, polyethylene glycol-polypropylene glycol di ( Examples include (meth) acrylate.

  (e) Silicone (meth) acrylate is obtained by modifying one end or both ends of dimethylpolysiloxane having a molecular weight of 1,000 to 10,000 with a (meth) acryloyl group, and examples thereof include the following.

  (f) The (meth) acrylate monomer is a monofunctional or polyfunctional alkyl (meth) acrylate or a low-viscosity polyether (meth) acrylate having a viscosity of 500 mPas (25 ° C.) or less, such as methyl (meth) acrylate, ethyl ( (Meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, sec-butyl (meth) acrylate, t-butyl (meth) acrylate, n- Pentyl (meth) acrylate, 3-methylbutyl (meth) acrylate, n-hexyl (meth) acrylate, 2-ethyl-n-hexyl (meth) acrylate, n-octyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl ( (Meth) acrylate, benzyl ( (Meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 6 -Hydroxyhexyl (meth) acrylate, 4-hydroxycyclohexyl (meth) acrylate, neopentyl glycol mono (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, (1,1-dimethyl-3-oxobutyl) (Meth) acrylate, 2-acetoacetoxyethyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, neopentyl glycol mono (meth) acrylate 3-chloro-2-hydroxypropyl (meth) acrylate, glycerin mono (meth) acrylate, ethylene glycol diacrylate, propylene glycol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol diacrylate, Examples include 1,10-decanediol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate and the like.

  (g) Epoxy monomers are glycidyl ethers of phenols such as bisphenol A, bisphenol F, resorcinol, phenol novolac, cresol novolac; glycidyl ethers of alcohols such as butanediol, polyethylene glycol, polypropylene glycol; phthalic acid, isophthalic acid And epoxy monomers such as glycidyl esters of carboxylic acids such as tetrahydrophthalic acid, oligomers thereof, and alicyclic epoxides. Among these, bisphenol A glycidyl ether monomer or oligomer can be preferably used. Specifically, Epicoat 828 (molecular weight 380), Epicoat 834 (molecular weight 470), Epicoat 1001 (molecular weight 900), Epicoat 1002 (molecular weight 1,060), Epicoat 1055 (molecular weight 1,350) manufactured by Yuka Shell Co., Ltd., Examples include Epicoat 1007 (molecular weight 2,900).

  (h) Vinyl ether monomers include 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, cyclohexanediol monovinyl ether, cis-1,1,3-trimethyl-5-vinyloxycyclohexane, trans-1,1,3-trimethyl -5-vinyloxycyclohexane, 1-isopropyl-4-methyl-2-vinyloxycyclohexane, 2-vinyloxy-7-oxabicyclo [3.2.1] octane-6-one, 2-methyl-2-vinyloxy Adamantane, 2-ethyl-2-vinyloxyadamantane, 1,3-bis (vinyloxy) adamantane, 1-vinyloxyadamantanol, 3-vinyloxy-1-adamantanol, 1,3,5-tris (vinyloxy) adamantane, 3,5-bis Vinyloxy) -1-adamantanol, 5-vinyloxy-1,3-adamantanediol, 1,3,5,7-tetrakis (vinyloxy) adamantane, 3,5,7-tris (vinyloxy) -1-adamantanol, 5 , 7-bis (vinyloxy) -1,3-adamantanediol, 7-vinyloxy-1,3,5-adamantanetriol, 1,3-dimethyl-5-vinyloxyadamantane, 1,3-dimethyl-5,7- Bis (vinyloxy) adamantane, 3,5-dimethyl-7-vinyloxy-1-adamantanol, 1-carboxy-3-vinyloxyadamantane, 1-amino-3-vinyloxyadamantane, 1-nitro-3-vinyloxyadamantane 1-sulfo-3-vinyloxyadamantane, 1-t-butyl Oxycarbonyl-3-vinyloxyadamantane, 4-oxo-1-vinyloxyadamantane, 1-vinyloxy-3- (1-methyl-1-vinyloxyethyl) adamantane, 1- (vinyloxymethyl) adamantane, 1- ( 1-methyl-1-vinyloxyethyl) adamantane, 1- (1-ethyl-1-vinyloxyethyl) adamantane, 1,3-bis (1-methyl-1-vinyloxyethyl) adamantane, 1- (1- (Norbornan-2-yl) -1-vinyloxyethyl) adamantane, 2,5-bis (vinyloxy) norbornane, 2,3-bis (vinyloxy) norbornane, 5-methoxycarbonyl-2-vinyloxynorbornane, 2- ( 1- (Norbornan-2-yl) -1-vinyloxyethyl) norborna 2- (vinyloxymethyl) norbornane, 2- (1-methyl-1-vinyloxyethyl) norbornane, 2- (1-methyl-1-vinyloxypentyl) norbornane, 3-hydroxy-4-vinyloxytetracyclo [4.4.0.12, 5.17,10] dodecane, 3,4-bis (vinyloxy) tetracyclo [4.4.0.12, 5.17,10] dodecane, 3-hydroxy-8-vinyl Oxytetracyclo [4.4.0.12,5.17,10] dodecane, 3,8-bis (vinyloxy) tetracyclo [4.4.0.12,5.17,10] dodecane, 3-methoxycarbonyl -8-vinyloxytetracyclo [4.4.0.12,5.17,10] dodecane, 3-methoxycarbonyl-9-vinyloxytetracyclo [4. 0.12, 5.17,10] dodecane, 3- (vinyloxymethyl) tetracyclo [4.4.0.12, 5.17,10] dodecane, 3-hydroxymethyl-8-vinyloxytetracyclo [ 4.4.12, 5.17,10] dodecane, 3-hydroxymethyl-9-vinyloxytetracyclo [4.4.0.12, 5.17,10] dodecane, 8-hydroxy-3- (Vinyloxymethyl) tetracyclo [4.4.0.12,5.17,10] dodecane, 9-hydroxy-3- (vinyloxymethyl) tetracyclo [4.4.0.12,5.17,10] Dodecane, 8-vinyloxy-4-oxatricyclo [5.2.1.02,6] decane-3,5-dione, 4-vinyloxy-11-oxapentacyclo [6.5.1.13,6. 02, 7.09,13] pentadecane-10,12-dione, α-vinyloxy-γ, γ-dimethyl-γ-butyrolactone, α, γ, γ-trimethyl-α-vinyloxy-γ-butyrolactone, γ, γ- Dimethyl-β-methoxycarbonyl-α-vinyloxy-γ-butyrolactone, 8-vinyloxy-4-oxatricyclo [5.2.1.02,6] decan-3-one, 9-vinyloxy-4-oxatricyclo [5.2.1.02,6] decan-3-one, 8,9-bis (vinyloxy) -4-oxatricyclo [5.2.1.02,6] decan-3-one, 4- Vinyloxy-2,7-dioxabicyclo [3.3.0] octane-3,6-dione, 5-vinyloxy-3-oxatricyclo [4.2.1.04,8] nonan-2-one, 5-methyl Ru-5-vinyloxy-3-oxatricyclo [4.2.1.04,8] nonan-2-one, 9-methyl-5-vinyloxy-3-oxatricyclo [4.2.1.04 8] Nonan-2-one, 6-vinyloxy-3-oxatricyclo [4.3.1.14,8] undecan-2-one, 6,8-bis (vinyloxy) -3-oxatricyclo [4 3.1.14,8] undecan-2-one, 6-hydroxy-8-vinyloxy-3-oxatricyclo [4.3.1.14,8] undecan-2-one, 8-hydroxy-6 -Vinyloxy-3-oxatricyclo [4.3.1.14,8] undecan-2-one and the corresponding isopropenyl ethers are exemplified.

  (i) Oxetane monomers include 1,4-bis {[(3-ethyl-3-oxetanyl) methoxy] ethyl} benzene (Aron Oxetane OXT-121 manufactured by Toagosei Co., Ltd.), 3-ethyl-3-hydroxymethyloxetane ( Examples include Aron Oxetane OXT-101) manufactured by Toagosei.

  Moreover, when an acid is contained in a fluorine-type polymer, you may use an acid crosslinking agent for a crosslinking agent. The acid crosslinking agent is a plurality of (for example, 2 to 10) reactive groups that crosslink with an acidic group in one molecule (for example, carboxylic acid, hydroxyl group, amino group, isocyanate group, N-methylol group, alkyl etherified N-methylol). Group, an epoxy group, etc.) or a polyvalent metal salt of acetic acid, and examples thereof include amino resins, epoxy compounds, oxazoline compounds, and aluminum acetate.

  Amino resins include compounds in which some or all of the amino groups such as melamine compounds, guanamine compounds, and urea compounds are hydroxymethylated, or some or all of the hydroxyl groups of the hydroxymethylated compounds are methanol, ethanol A compound etherified with n-butyl alcohol, 2-methyl-1-propanol, etc., for example, hexamethoxymethyl methylol melamine, and various amino resins such as alkyl type, methylol type and imino type manufactured by Nippon Cytec Industries It is done.

Epoxy compounds include bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenol / novolak type epoxy resins, cresol / novolac type epoxy resins, trisphenol methane type epoxy resins, brominated epoxy resins and other glycidyl ethers, 3, Alicyclic epoxy resins such as 4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, bis (2,3-epoxycyclopentyl) ether, glycidyl such as diglycidyl hexahydrophthalate, diglycidyl tetrahydrophthalate, diglycidyl phthalate Heterocycles such as esters, tetraglycidyldiaminodiphenylmethane, glycidylamines such as triglycidylparaaminophenol, and triglycidyl isocyanurate And epoxy resins.
As the oxazoline compound, 2-vinyl-2-oxazoline, 2-vinyl-4-methyl-2-oxazoline, 2-vinyl-5-methyl-2-oxazoline, 2-isopropenyl-2-oxazoline, 2-isopropenyl Examples thereof include copolymers of polymerizable monomers such as -4-methyl-2-oxazoline.
When a multi-sensitive thiol such as 1,4-bis (3-mercaptobutyryloxy) butane or pentaerythritol tetrakis (3-mercaptobutyrate) is used in combination with the crosslinking agent of the present invention, the curing rate is improved. The amount of the multi-sensitive thiol may be, for example, 0.1 to 20 parts by weight, for example 1 to 10 parts by weight with respect to 100 parts by weight of the crosslinking agent.

  The crosslinking agent is used in an amount of 1 to 100,000 parts by weight, particularly 10 to 100,000 parts by weight, based on 100 parts by weight of the fluorine monomer when used in combination with the fluorine monomer. Moreover, when using together with a fluorine-type polymer, it is 1-100 weight part with respect to 100 weight part of fluorine-type polymers, Especially 1-20 weight part.

● Photo-crosslinking catalyst (D)
Examples of the photocrosslinking catalyst include a radical photopolymerization initiator and a photoacid generator. Radical photopolymerization initiators are compounds that generate radicals by light, for example, α-diketones such as benzyl and diacetyl, acyloins such as benzoin, acyloin such as benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether. Thioxanthones such as ethers, thioxanthone, 2,4-diethylthioxanthone, thioxanthone-4-sulfonic acid, benzophenones such as benzophenone, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone Acetophenone, 2- (4-toluenesulfonyloxy) -2-phenylacetophenone, p-dimethylaminoacetophenone, 2,2′-dimethoxy-2-phenylacetophenone, p-methoxyacetopheno Acetophenones such as 2-methyl [4- (methylthio) phenyl] -2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, Quinones such as anthraquinone and 1,4-naphthoquinone, ethyl 2-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate (n-butoxy), isoamyl 4-dimethylaminobenzoate, 4 -Aminobenzoic acids such as 2-ethylhexyl dimethylaminobenzoate, halogen compounds such as phenacyl chloride, trihalomethylphenylsulfone, peroxides such as acylphosphine oxides, and di-t-butyl peroxide. As commercially available products, IRGACURE-184, 261, 369, 500, 651, 907 (above, manufactured by Ciba-Geigy), Darocur-1173, 1116, 2959, 1664, 4043 (above, Merck Japan).

A photoacid generator (PAG) is a material that generates acid by reacting with light. PAG consists of a chromophore that absorbs light and an acid precursor that becomes an acid after decomposition. By irradiating light of a specific wavelength to a PAG with such a structure, the PAG is excited and the acid precursor part Generates acid. PAG is, for example, a salt such as diazonium salt, phosphonium salt, sulfonium salt, iodonium salt, CF ₃ SO _3, p-CH ₃ PhSO _3, p-NO ₂ PhSO ₃ (where ph is a phenyl group), organic halogen compound , Orthoquinone-diazide sulfonyl chloride, or sulfonic acid ester.

The organic halogen compound is a compound that forms hydrohalic acid, and such compounds are disclosed in US Pat. No. 3,515,551, US Pat. No. 3,536,489, US Pat. No. 3,779,778. And those disclosed in West German Patent Publication No. 2,243,621 (the disclosure of which is incorporated herein).
Other compounds that generate an acid upon irradiation with light as described above are disclosed in JP 54-74728, JP 55-24113, JP 55-77742, JP 60-3626, JP JP-A-60-138539, JP-A-56-17345 and JP-A-56-36209 (the disclosures of which are incorporated herein).

  As commercial products of PAG, WPAG-145 [Bis (cyclohexylsulfonyl) diazomethane], WPAG-170 [Bis (t-butylsulfonyl) diazomethane], WPAG-199 [Bis (p-toluenesulfonyl) diazomethane], WPAG- 281 [Triphenylsulfonium trifluoromethanesulfonate], WPAG-336 [Diphenyl-4-methylphenylsulfonium trifluoromethanesulfonate], WPAG-367 [Diphenyl-2,4,6-trimethylphenylsulfonium p-toluenesulfonate], CGI-1397 manufactured by Ciba Specialty Chemicals [(5 -Propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl) acetonitrile], TFE-triazine [2- [2- (Furan-2-yl) ethenyl] -4, manufactured by Sanwa Chemical 6-bis (trichloromethyl) -s-triazine], TME-triazine [2- [2- (5-Methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine] MP-triazine [ 2- (Methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine], di Butoxy triazine [2- [2- (3,4-Dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine], etc. can be used.

  The amount of the photocrosslinking catalyst is 0.1 to 20 parts by weight, particularly 1 to 10 parts by weight, based on 100 parts by weight of the fluorine monomer and the crosslinking agent, or the fluorine polymer, or the fluorine polymer and the crosslinking agent. Part.

  The fluorine-based polymer (B) when used in combination with a photocrosslinking catalyst is a group consisting of a crosslinkable functional group (E), an acidic group (F), and an acid dissociable functional group (H) that is converted into an acidic group by the action of an acid. It preferably has at least one group selected from: The fluorine-based polymer (B) may further have a silicone chain (G).

● Crosslinkable functional group (E)
The crosslinkable functional group imparted to the fluorine-based polymer is an unsaturated double bond group such as an acryloyl group or a vinyl group as a type that is cured by a radical polymerization reaction, and an epoxy group as a type that is cured by a cationic polymerization reaction. An oxetane group is exemplified. Moreover, the reactive group which bridge | crosslinks with an acidic group, for example, carboxylic acid, a hydroxyl group, an amino group, an isocyanate group, N-methylol group, N-methylol group formed into alkyl ether, etc. may be sufficient.

The method for imparting a crosslinkable functional group to the fluoropolymer is as follows:
(1) A method of previously synthesizing a monomer having a crosslinkable functional group and copolymerizing it with a fluorinated monomer. (2) Once a fluorinated polymer having another functional group is synthesized, the functional group is crosslinked. Any method of converting to a functional group may be used.

  The amount of the crosslinkable functional group in the fluoropolymer is generally from 0.1 to 20 mol%, particularly from 1 to 10 mol%, based on the total number of repeating units in the polymer. .

● Acid group (F)
Examples of acidic groups are carboxyl groups, hydroxyl groups (particularly phenolic hydroxyl groups), and sulfonic acid groups.

The method for adding an acidic group to a fluoropolymer is as follows:
(1) A method of previously synthesizing a monomer having an acidic group and copolymerizing it with a fluorinated monomer (2) Once a fluorinated polymer having another functional group is synthesized, the functional group is converted into an acidic group. Any method of conversion may be used.

  In the case of (1), the following are illustrated as a monomer which has an acidic group. Examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, vinyl acetic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, cinnamic acid, and salts thereof. Examples of the monomer having a hydroxyl group include o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2-hydroxyethyl (meth) acrylate, and 2-hydroxypropyl (meth) acrylate. In addition, one or more hydrogen atoms of these benzene rings are one or more hydrogen atoms of an alkyl group such as methyl, ethyl or n-butyl, an alkoxy group such as methoxy, ethoxy or n-butoxy, a halogen atom or an alkyl group. Haloalkyl group substituted with a halogen atom, a nitro group, a cyano group, a compound substituted with an amide group, and the like. Examples of the monomer having a sulfonic acid group include vinyl sulfonic acid, styrene sulfonic acid, (meth) allyl sulfonic acid, 2-hydroxy-3- (meth) allyloxypropane sulfonic acid, (meth) acrylic acid-2-sulfoethyl, ( Meth) acrylic acid-2-sulfopropyl, 2-hydroxy-3- (meth) acryloxypropanesulfonic acid, 2- (meth) acrylamido-2-methylpropanesulfonic acid, and salts thereof. These may be used alone or in combination of two or more.

In the case of (1), a composition distribution occurs in the copolymer due to the difference in reactivity between the fluorine-based monomer and the monomer having an acidic group, which may adversely affect patterning. When this becomes a problem, it is preferable to use a structure in which the vinyl group structure of the fluorine-based monomer is the same as the vinyl group structure of the monomer having an acidic group. For example, when α-Cl acrylate containing an Rf group is used as a fluorine-based monomer, α-Cl acrylic acid is preferably used as a monomer having an acidic group.
The amount of acidic groups in the fluoropolymer is generally from 0.1 to 20 mol%, particularly from 1 to 10 mol%, based on the total number of repeating units in the polymer.

● Silicone chain (G)
The silicone chain (G) is dimethylpolysiloxane having a molecular weight of 1,000 to 10,000.
The method of adding a silicone chain to the fluoropolymer is as follows:
(1) A method of synthesizing a monomer or polymerization initiator having a silicone chain in advance and copolymerizing it with a fluorine monomer (2) Once a fluorine polymer having another functional group is synthesized, the functional group Any of the methods for bonding a silicone chain to may be used. In the case of the method (1), silicone (meth) acrylate described in the crosslinking agent (C) may be used.
The amount of silicone chains in the fluoropolymer is generally 0.1 to 50 mol%, particularly 1 to 10 mol%, based on the total number of repeating units in the polymer.

● Acid-dissociable functional group (H) that is converted into an acidic group by the action of acid
The acid dissociable functional group that is converted into an acidic group by the action of an acid is t-butoxycarbonyl group (t-BOC), isopropoxycarbonyl group, tetrahydropyranyl group, trimethylsilyl group, t-butoxycarbonylmethyl group, or these Examples thereof include phenolic hydroxyl groups protected with an acid dissociable functional group.

The method for imparting an acid-dissociable functional group to a fluoropolymer is as follows:
(1) Method of synthesizing a monomer having an acid-dissociable functional group in advance and copolymerizing it with a fluorine-based monomer (2) Once a fluorine-based polymer having another functional group is synthesized, Any method of converting to an acid-dissociable functional group may be used. In the case of the method (1), t-butyl (meth) acrylate may be used.
The amount of the acid dissociable functional group in the fluoropolymer is generally 0.1 to 50 mol%, particularly 1 to 10 mol%, based on the total number of repeating units in the polymer. It is.

● Photoacid generator (I)
This is the same as the photoacid generator described in the photocrosslinking catalyst (D). When an electromagnetic wave is irradiated on the film of the fluorine-based polymer (B) having an acid-dissociable functional group (H) in the presence of a photoacid generator, an acidic group is generated, and the irradiated region of the film becomes lyophilic. Further, since this acidic group is soluble in an alkaline aqueous solution, the irradiated area of the film can be developed with the alkaline aqueous solution.

● Diluent (J)
If necessary, a solvent (particularly a water-soluble organic solvent, an organic solvent (particularly an oil-soluble organic solvent), water) may be added as a diluent (J) to the surface treatment agent for photolithography of the present invention. The diluent is the same as that used for producing the fluoropolymer. The diluent is inert and dissolves in the fluorinated monomer (A) or the fluorinated polymer (B). Examples of diluents include acetone, methyl ethyl ketone, methyl amyl ketone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether, dipropylene glycol monomethyl ether acetate. Dipropylene glycol, tripropylene glycol, 3-methoxybutyl acetate, dimethylformamide, dimethyl sulfoxide, methyl cellosolve, cellosolve acetate, butyl cellosolve, butyl carbitol, carbitol acetate, ethyl lactate, isopropyl alcohol, methanol, ethanol, etc. are organic Solvents include chloroform, HFC141b, HCHC225, and high Lofluoroether, pentane, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, petroleum ether, tetrahydrofuran, 1,4-dioxane, methyl isobutyl ketone, butyl acetate, 1,1,2,2-tetrachloroethane, 1 1,1,1-trichloroethane, trichloroethylene, perchloroethylene, tetrachlorodifluoroethane, trichlorotrifluoroethane and the like. These solvents may be used alone or in combination of two or more. The diluent is used in the range of 50 to 2000 parts by weight, for example, 50 to 1000 parts by weight with respect to 100 parts by weight of the total of the fluorine-based monomer (A) or the fluorine-based polymer (B).

● Production of fluorinated polymer The fluorinated polymer can be produced as follows. A method in which the monomer and necessary components are dissolved in a solvent, and after substitution with nitrogen, a polymerization catalyst is added and the mixture is stirred in the range of 20 to 120 ° C. for 1 to 20 hours is employed.

  An organic solvent, a water-soluble organic solvent, water, etc. can be used for a solvent, and it is the same as that of a diluent (J). A solvent is used in 50-2000 weight part with respect to a total of 100 weight part of monomers, for example, 50-1000 weight part.

  Chain transfer agents such as mercaptans and alkyl halides may be added to adjust the molecular weight of the fluoropolymer. As mercaptans, n-butyl mercaptan, n-dodecyl mercaptan, t-butyl mercaptan, ethyl thioglycolate, 2-ethylhexyl thioglycolate, 2-mercaptoethanol, isooctyl mercaptoate, thioglycolic acid, 3-mercaptopropionic acid , Methoxybutyl thioglycolate, silicone mercaptan (KF-2001 manufactured by Shin-Etsu Chemical Co., Ltd.), and alkyl halides include chloroform, carbon tetrachloride, carbon tetrabromide and the like. These may be used alone or in combination of two or more.

  The weight average molecular weight of the fluoropolymer may be, for example, 1,000 to 500,000, in particular 2,000 to 100,000, especially 3,000 to 20,000. The weight average molecular weight of the fluoropolymer is determined by GPC (gel permeation chromatography) (in terms of standard polystyrene).

A monomer having a fluoroalkyl group having 8 to 12 carbon atoms and a polymer A monomer having a fluoroalkyl group having 8 to 12 carbon atoms (for example, perfluorooctyl) as necessary for the photolithography surface treatment agent of the present invention. Ethyl acrylate) and a polymer having this monomer as a repeating unit may be blended.

Non-fluorine polymer The surface treatment agent for photolithography of the present invention may be used in combination with a non-fluorine polymer, if necessary. The non-fluorine polymer is, for example, an alkali-soluble resin, such as Japanese Patent No. 2505033, Japanese Patent Laid-Open No. 3-170554, Japanese Patent Laid-Open No. 6-118646, novolak type phenol resin, Japanese Patent Laid-Open No. 7-31463, Japanese Patent Laid-Open No. Polyvinyl phenol resin having a narrow molecular weight distribution, phenol resin partially converted into a cyclic alcohol structure by hydrogenation in JP-A-3-87746 and JP-A-8-44061, JP-A-7-295200, JP-A-8-152717 A resin in which a part of the OH group of polyvinylphenol is protected with an alkyl group, a polyvinylphenol resin having an acid-inactive protective group such as an acyl group described in JP-A-8-339086, JP-A-6-67431, Polyvinylphenol resin copolymerized with styrene of Kaihei 10-10733, special Polyvinylphenol resins copolymerized with (meth) acrylate monomers of JP-A-9-166870, and resins having a carboxy group described in JP-A-8-240911 (the disclosures of these publications are part of this specification). .)

● Pigment Various pigments may be added to the surface treatment agent for photolithography of the present invention as required. Examples of black pigments include carbon black, graphite, titanium black, iron oxide, bismuth sulfide, and perylene black.

● Acid Scavenger The surface treatment agent for photolithography of the present invention may control the diffusion of the acid generated from the acid generator in the film by adding an acid scavenger as necessary. As the acid scavenger, an organic amine, a basic ammonium salt, a basic sulfonium salt, or the like is used, as long as it does not deteriorate sublimation or resist performance. Among these acid scavengers, organic amines are preferable because of excellent image performance. For example, JP-A-63-149640, JP-A-5-249662, JP-A-5-127369, JP-A-5-289322, JP-A-5-249683, JP-A-5-289340, JP-A-5-232706 JP-A-5-257282, JP-A-6-242605, JP-A-6-242606, JP-A-6-266100, JP-A-6-266110, JP-A-6-317902, JP-A-7-120929, JP-A-7-146558, JP-A-7-319163, JP-A-7-508840, JP-A-7-333844, JP-A-7-219217, JP-A-7-92678, JP-A-7-28247, Special Kaihei 8-22120, JP 8-110638, JP 8-123030, JP 9-274312, JP 9-166871, JP 9-292708, JP 9-325496, Special table Basic compounds described in JP-A-7-508840, USP5525453, USP5629134, USP5667938 and the like can be used (the disclosures of which are incorporated herein). The acid scavenger is preferably 1,5-diazabicyclo [4.3.0] -5-nonene, 1,8-diazabicyclo [5.4.0] -7-undecene, 1,4-diazabicyclo [2]. 2.2] octane, 4-dimethylaminopyridine, 1-naphthylamine, piperidine, hexamethylenetetramine, imidazoles, hydroxypyridines, pyridines, 4,4'-diaminodiphenyl ether, pyridinium p-toluenesulfonate, 2, Examples include 4,6-trimethylpyridinium p-toluenesulfonate, tetramethylammonium p-toluenesulfonate, tetrabutylammonium lactate, triethylamine, and tributylamine. Among these, 1,5-diazabicyclo [4.3.0] -5-nonene, 1,8-diazabicyclo [5.4.0] -7-undecene, 1,4-diazabicyclo [2.2.2] Organic amines such as octane, 4-dimethylaminopyridine, 1-naphthylamine, piperidine, hexamethylenetetramine, imidazoles, hydroxypyridines, pyridines, 4,4′-diaminodiphenyl ether, triethylamine, and tributylamine are preferred.

Other Additives Various other additives are used as necessary for the surface treatment agent for photolithography of the present invention. For example, fluorine-based, silicone-based, hydrocarbon-based surfactants for improving the smoothness of the film, silane coupling agents and titanate coupling agents for improving the film adhesion, etc. For example, a thermal polymerization inhibitor, an ultraviolet absorber, an antioxidant, and an antifoaming agent.

Base material The base material used for the substrate of the present invention is silicon, synthetic resin, glass, metal, ceramics, or the like.

  The synthetic resin may be either a thermoplastic resin or a thermosetting resin. For example, polyolefin such as polyethylene, polypropylene, ethylene-propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified Polyolefin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyamide, polyimide, polyamideimide, polycarbonate, poly- (4-methylbenten-1), ionomer, acrylic resin, polymethyl methacrylate, acrylic-styrene copolymer (AS Resin), butadiene-styrene copolymer, polio copolymer (EVOH), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyester such as precyclohexane terephthalate (PCT), poly Ether, polyetherketone (PEK), polyetheretherketone (PEEK), polyetherimide, polyacetal (POM), polyphenylene oxide, modified polyphenylene oxide, polyarylate, aromatic polyester (liquid crystal polymer), polytetrafluoroethylene, polyfluoride Various types of thermoplastic elastomers such as vinylidene chloride, other fluororesins, styrene, polyolefin, polyvinyl chloride, polyurethane, fluororubber, chlorinated polyethylene, epoxy resin, phenol resin, urea resin, melamine resin, Saturated polyesters, silicone resins, polyurethanes, etc., or copolymers, blends, polymer alloys, etc. mainly composed of these, may be mentioned, and one or more of these may be combined (for example, two layers) As a laminate of the upper) it can be used. If a synthetic resin substrate is used, the substrate can be provided with features such as light weight, transparency, low cost, and bending.

Examples of the glass include silicate glass (quartz glass), alkali silicate glass, soda lime glass, potassium lime glass, lead (alkali) glass, barium glass, and borosilicate glass.
Examples of the metal include gold, silver, copper, iron, nickel, aluminum, and platinum.
Ceramics include oxides (eg, aluminum oxide, zinc oxide, titanium oxide, silicon oxide, zirconia, barium titanate), nitrides (eg, silicon nitride, boron nitride), sulfides (eg, cadmium sulfide), carbides (For example, silicon carbide) and the like, and a mixture thereof may be used.

Regardless of which substrate is used, pretreatment such as plasma treatment or UV ozone treatment may be performed. By these pretreatments, lyophilic functional groups (for example, OH groups, COOH groups, NH groups) can be introduced on the substrate surface.
The shape of the pattern surface may be selected appropriately depending on the purpose of the element to be finally produced, and examples thereof include a circle, a square, a triangle, a straight line, and a curve. Mutual patterns may be in contact or separated. For example, in the case of a line and space, the line width and the line interval may be 0.5 to 100 μm, for example, 1 to 20 μm. The line width may be equally spaced or the width may change. The shape of the line may be a straight line or a curve.

  A surface treatment agent (fluorine-containing compound) is uniformly treated on the surfaces of these substrates in a liquid phase or a gas phase. The treatment in the liquid phase can employ a known coating method as long as the film thickness can be controlled. For example, roll coating method, gravure coating method, micro gravure coating method, flow coating method, bar coating method, spray coating method, die coating method, spin coating method, dip coating method, etc. can be adopted. Can be selected in consideration of the controllability and controllability of the film thickness. For example, after the substrate is applied to the fluorine-containing compound solution by spin coating, the solvent is dried from the fluorine-containing compound film by heating at 70 to 150 ° C. for 1 second to 10 minutes (eg, 110 ° C. for 1 minute). Yes. With this simple process, a fluorine-containing compound film is formed on the surface of the substrate. The thickness of the fluorine-containing compound film may generally be 0.5 nm to 1000 μm, for example 10 nm to 200 μm, in particular 50 nm to 100 μm. In the pattern substrate manufacturing methods (1) and (11) to (14), a uniform liquid-repellent surface having a water contact angle of 60 ° or more, particularly 80 ° or more can be obtained without irradiating light. On the other hand, in the pattern substrate manufacturing methods (2) to (10), by irradiating light, a liquid repellent surface having a water contact angle of 60 ° or more, particularly 80 ° or more is formed in the irradiated region.

Next, patterning is performed using a photolithography method so that the contact angle with water in the lyophilic region is 50 ° or less. A plurality of regions having different surface free energies [(1) region having a water contact angle of 60 ° or more, particularly a region having a water contact angle of 80 ° or more, and (2) region having a water contact angle of 50 ° or less, particularly water A pattern substrate composed of a region having a contact angle of 30 ° or less] is prepared. Region (1) and region (2) are adjacent.
In order to pattern the fluorine-containing compound film by photolithography, an electromagnetic wave is irradiated.

Electromagnetic wave The electromagnetic wave irradiated to the film in the present invention is light having a wavelength of 10 to 400 nm, ultraviolet (UV, 200 to 400 nm), vacuum ultraviolet (VUV, 150 to 200 nm), extreme ultraviolet (EUV, 10 to 120 nm) Etc. are exemplified. When VUV is used, a commercially available xenon excimer lamp capable of emitting VUV having a wavelength of 172 nm can be used as the light source. When UV is used, a mercury xenon lamp, mercury lamp, xenon lamp, or xenon excimer lamp can be used as the light source. Further, a 248 nm KrF excimer laser, a 193 nm ArF excimer laser, and a 157 nm F2 excimer laser may be used. Exposure amount 1~10,000mJ / cm ^2, may be a particularly 1~1000mJ / cm ^2.
In addition to light, electromagnetic waves of X-rays having a wavelength of 0.1 to 10 nm, electron beams having a wavelength of 0.001 to 0.01 nm, and laser beams having a wavelength of 10 to 300 nm may be used.

  When photolithography is performed with light or X-rays, the film may be irradiated with light through a photomask, or a semiconductor such as DMD (digital micromirror device) developed by Texas Instruments Incorporated in the United States. It may be used to irradiate light in a pattern without a mask. DMD spreads 480,000 to 1,130,000 micron-sized ultra-fine mirrors, reflects the lamp light to the mirrors, and irradiates the film with light in a pattern.

On the other hand, with an electron beam or a laser beam, a pattern is drawn on a substrate that has been uniformly surface-treated directly without a photomask using a commercially available drawing apparatus. Exposure of the electron beam 10~10,000μC / cm ² in raster drawing, especially 100~1,000μC / cm ^2, a shot draw 100~100,000fC / dot, may in particular 1,000~10,000fC / dot.

● Development In the present invention, the solvent-soluble region may be removed, so-called “development”, using the contrast of solubility in the solvent after irradiation with the electromagnetic wave. As the solvent (developer) used for development, the one used for the production of the fluoropolymer or an alkaline aqueous solution is used. The alkaline aqueous solution is an inorganic alkaline aqueous solution such as sodium carbonate, sodium hydrogen carbonate, sodium hydroxide, potassium hydroxide, sodium silicate, sodium metasilicate, and aqueous ammonia, and primary amines such as ethylamine and n-propylamine; Secondary amines such as diethylamine and di-n-propylamine; tertiary amines such as triethylamine, methyldiethylamine and N-methylpyrrolidone; alcohol amines such as dimethylethanolamine and triethanolamine; tetramethylammonium hydroxy A quaternary ammonium salt such as copper, tetraethylammonium hydroxide and choline; an organic alkaline aqueous solution comprising alkalis of cyclic amines such as pyrrole and piperidine is used. These may be used alone or in combination of two or more. Further, a surfactant may be added.
The developing method may be performed in a range of 10 seconds to 10 minutes by an immersion method, a liquid filling method, or the like.

According to the second aspect, in the present invention, the following pattern substrate manufacturing method can be used.
● Method for Fabricating Pattern Substrate In the present invention, a non-contact microdroplet containing an electromagnetic wave curable composition comprising a fluoromonomer-containing fluoromonomer (A), a crosslinking agent (B), and a photocrosslinking catalyst (C) is used. A film having a micro structure is formed by discharging onto a substrate by a discharge method, and the film is cured by irradiation with electromagnetic waves. Examples of the non-contact minute droplet discharge method include an ink jet method and a micro dispenser method.

  As an ink jet method, a piezo method can be used. The piezo method is also used in inkjet printers because of its excellent droplet controllability and high degree of freedom in ink selection. There are two types of piezo systems: MLP (Multi Layer Piezo) type and MLChip (Multi Layer Ceramic Hyper Integrated Piezo Segments) type. An ink jet method using a thermal method in which a heating element generates heat to generate bubbles and push out ink liquid may be used. The volume per droplet discharged by the inkjet method is 0.1 pL to 1 nL. In the present invention, the properties of an electromagnetic wave curable composition (ink) suitable for the inkjet method at 25 ° C. are a viscosity of 1 to 50 mPa · s, a surface tension of 19 to 30 mN / m, and a boiling point of 100 to 250 ° C.

  As the micro dispenser method, a tubing method or an air compression method can be used. The volume per droplet discharged by the microdispenser method is generally 1 nL to 1 μL.

Heat treatment at about 50 to 250 ° C. may be performed on the liquid repellent film before (pre-baking) or after (post-baking) the electromagnetic wave. When curing is inhibited by oxygen, electromagnetic waves may be irradiated in an atmosphere of an inert gas such as nitrogen or argon.
By this simple process, a liquid repellent film is formed on the surface of the substrate and a pattern substrate composed of a plurality (at least two) regions having different surface free energies, in other words, at least one patterned repellent. A pattern substrate (hereinafter simply referred to as “pattern substrate”) including a liquid region and at least one lyophilic region can be produced.

  The thickness of the liquid repellent film is generally from 1 nm to 1000 μm, for example from 10 nm to 200 μm, in particular from 50 nm to 100 μm. The liquid repellent region exhibits a liquid repellency of, for example, a water contact angle of 70 ° or more, particularly 80 ° or more. The shape of the pattern of the liquid repellent region may be selected appropriately depending on the purpose of the element to be finally produced, and examples thereof include straight lines, curved lines, circles, squares, and triangles. Mutual patterns may be in contact or separated. For example, in the case of a line and space, the width of the line (liquid repellent region) may be 10 to 1000 μm, for example, 100 to 500 μm. The ratio between the line and the space is arbitrary, and is, for example, 1/110 to 10/1. The shape of the line may be a straight line or a curve.

Application of Functional Compound Solution to Patterned Substrate In the present invention, a functional compound solution or dispersion is applied to a patterned substrate. The functional compound solution can be applied by spin coating, dip coating, casting, roll coating, printing, transfer, ink jet [P. Calvert, Chem. Mater., 13, 3299 (2001)]. , Barcode method, capillary method and the like.

A functional compound layer is formed on the patterned fluorine-containing compound film.
The functional compound layer can be formed by applying a solution obtained by dissolving the functional compound in a solvent on the pattern surface and removing the solvent. When the functional compound solution is applied to a plurality of regions having different surface free energies, the functional compound solution avoids a region having a water contact angle of 60 ° or more, particularly 80 ° or more, and particularly has a water contact angle of 50 ° or less, particularly It adheres only to the region of 30 ° or less. Thus, a layer of functional compound is formed on the lyophilic region patterned on the substrate.

Examples of functional compounds are semiconductor compounds, conductive compounds, dyes or pigments for forming display pixels, photochromic compounds, thermochromic compounds, lens materials, life science drugs, and the like.
The semiconductor compound is preferably an organic compound, and examples thereof include a pentacene derivative, a polythiophene derivative, a phthalocyanine derivative, a polyfluorene derivative, poly p-phenylene vinylene, and a layered herbskite compound.
The conductive compound has a conductivity of 10 ² S / cm 2 or more at room temperature. For example, in an organic system, polyacetylene derivatives, polythiophene derivatives, polypyrrole, poly p-phenylene vinylene, polyaniline, and the like can be given. Conductivity may be improved by doping these compounds. In the metal system, a material in which nanoparticles such as gold, silver and copper are dispersed in a liquid can be used.

The photochromic compound is preferably an organic compound, and examples thereof include azobenzene derivatives, spiropyran derivatives, fulgide derivatives, and diarylethene derivatives.
A thermochromic compound is a general term for compounds whose color changes reversibly with changes in temperature. For example, salicylideneanilines, polythiophene derivatives, tetrahalogeno complexes, ethylenediamine derivative complexes, dinitrodiammine copper complexes, Examples include 1,4-diazacyclooctane (daco) complex, hexamethylenetetramine (hmta) complex, and saltylaldehyde (salen) complex.
The thickness of the functional compound layer may be 0.1 nm to 100 μm, for example 1 nm to 1 μm.

Examples of the solvent that dissolves the functional compound are an organic solvent (particularly an oil-soluble organic solvent), a water-soluble organic solvent, and water. When the functional compound is sparingly soluble in water, it must be dissolved in an organic solvent (particularly an oil-soluble organic solvent) or a water-soluble organic solvent.
In the present invention, the solvent for dissolving the functional compound is preferably an organic solvent having a surface tension of 40 mN / m or less, for example, 30 mN / m or less. When the surface tension is 40 mN / m or less, the solution can easily spread out along the pattern shape.

Examples of the organic solvent include alcohols, esters, ketones, ethers, hydrocarbons (eg, aliphatic hydrocarbons and aromatic hydrocarbons), and the organic solvent may or may not be fluorinated. . Specific examples of the organic solvent include perfluorodecalin, hydrofluoroether, HCFC225, chloroform, 1,1,2,2-tetrachloroethane, tetrachloroethylene, chlorobenzene, butyl acetate, hexane, isopentane, toluene, xylene, tetrahydrofuran and the like. . Specific examples of the water-soluble organic solvent include acetone, methyl ethyl ketone, methyl amyl ketone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether, dipropylene glycol monomethyl ether acetate, dipropylene Examples include propylene glycol, tripropylene glycol, dimethylformamide, dimethyl sulfoxide, methyl cellosolve, cellosolve acetate, butyl cellosolve, butyl carbitol, carbitol acetate, ethyl lactate, isopropyl alcohol, methanol, and ethanol.
When water is used, the surface tension may be lowered by adding a surfactant, the above water-soluble organic solvent, or the like.

The concentration of the functional compound in the functional compound solution may be 0.1 to 20% by weight, for example 1 to 10% by weight.
The solvent can be removed by evaporation or the like. The removal of the solvent can be performed by heating the substrate (for example, 60 to 200 ° C.). The solvent removal may be performed under reduced pressure (for example, 0.01 to 100 Pa).

  The substrate of the present invention can be used for a wide range of devices such as electronic, optical, medical and chemical analyses. For example, the electronic device can be used for an integrated circuit such as a transistor, a memory, a light emitting diode (EL), a laser, or a solar cell. From these devices, flexible displays, wireless tags, wearable computers and the like are manufactured. Optical devices include display pixels, optical memories, light modulation elements, optical shutters, second harmonic (SHG) elements, polarizing elements, photonic crystals, lens arrays, and medical devices include DNA arrays, It can be used for biochips such as protein arrays. The chemical analysis device can be used for a microchemical chip such as a microchemical plant or a microchemical analysis system.

The surface treatment agent for photolithography of the present invention is extremely useful for making a black matrix liquid repellent, which is necessary when a color filter for display is produced by an inkjet method. The inkjet method is expected as a technology for manufacturing color filters at a low cost, but the inkjet technology alone has sufficient landing accuracy to accurately print red, green, and blue ink in the black matrix (pixel part). being insufficient. For this reason, it is necessary to make the upper part of the black matrix liquid repellent and draw ink droplets that have been accidentally removed back into the pixels. Further, when red, green, and blue inks are injected to an amount exceeding the height of the black matrix in order to increase the pixel film thickness, it is essential to make the upper portion of the black matrix liquid repellent. The former liquid repellency is indicated by the drop angle of the ink solution, and the latter liquid repellency is indicated by the static contact angle.
Conventionally, in order to make the black matrix liquid-repellent, fluorine gas such as CF ₄ , SF ₆ , and CHF ₃ has been adsorbed to the black matrix by an atmospheric pressure plasma method (Japanese Patent Laid-Open No. 2000-353594). However, this method has a problem that a uniform liquid repellent region cannot be formed due to defects derived from plasma, and not only the upper portion of the black matrix but also the side surfaces are made liquid repellent. In order to remedy these drawbacks, a fluoropolymer type photosensitive liquid repellent was devised.
For example,
JP-A-11-281815
JP2004-151618
JP2005-315984
Can be referred to.
However, the fluorine-based polymers disclosed in these documents cannot achieve both liquid repellency and compatibility with other materials forming the photosensitive composition. On the other hand, the surface treatment agent for photolithography of the present invention has both extremely high liquid repellency and compatibility.

Hereinafter, two methods for making a black matrix liquid repellent using the surface treatment agent for photolithography of the present invention will be described.
The first method is to form a lyophobic black matrix on a lyophilic transparent substrate by photolithography using a dispersion of a black pigment in the photolithography surface treatment agent of the present invention. Is the method. As an example of the surface treatment agent for photolithography at this time, for example,
Fluoropolymer (B) having crosslinkable functional group (E) and acidic group (F)
5-10% by weight
Cross-linking agent (C) 1-5% by weight
Photocrosslinking catalyst (D) 1-5% by weight
20 wt% carbon black dispersion 10-20 wt%
Solvent balance (100% by weight in total)
Is mentioned.

In the second method, the surface treatment agent for photolithography of the present invention is uniformly applied on the photosensitive resin black layer uniformly formed on the lyophilic transparent substrate, and then the lyophilic solution is obtained by photolithography. This is a method of forming a lyophobic black matrix on a transparent transparent substrate. As an example of the surface treatment agent for photolithography at this time, for example,
Fluoropolymer (B) having acidic group (F) 5-10% by weight
Cross-linking agent (C) 1-5% by weight
Photocrosslinking catalyst (D) 1-5% by weight
Solvent balance (100% by weight in total)
Is mentioned.

  Color filter is extremely low cost by applying red, black and yellow pigment dispersions for color filters by inkjet method on transparent substrate with black matrix repellent with any of these, and removing solvent Can be manufactured.

  EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these.

The static contact angle and sliding angle were measured by the following methods.
Measurement of static contact angle and sliding angle Static contact angle is obtained by dropping 2 μL of water or n-hexadecane from a microsyringe onto a horizontally placed substrate, and taking a still image 1 second after dropping with a video microscope. Was determined by
The sliding angle was determined by the following method. From a microsyringe, 20 μL of water and 5 μL of n-hexadecane and propylene glycol monomethyl ether acetate (PGMEA) are dropped from a microsyringe onto a horizontally placed substrate, the substrate is tilted at a rate of 2 ° per second, and the droplet falls. Until it started, it was recorded as a video with a video microscope. The animation was reproduced, and the angle at which the droplet started to fall was defined as the fall angle.

Production Example 1
In a four-necked flask equipped with a reflux condenser, a nitrogen inlet tube, a thermometer, and a stirrer, fluorine-based monomer CH ₂ ═C (F) COOCH ₂ CH ₂ C ₄ F ₉ (abbreviation α-F) 100 g, HCFC225 400 g The mixture was heated to 50 ° C. and stirred for 30 minutes under a nitrogen stream. To this, 0.5 g of 2,2′-azobisisobutyronitrile was added and polymerized for 18 hours. Analysis of the residual monomer in the reaction solution by gas chromatography confirmed that the polymerization rate was 95% or more. The obtained reaction solution was precipitated with methanol and vacuum-dried to isolate the fluoropolymer. When the molecular weight of the obtained fluoropolymer was measured by GPC, the weight average molecular weight was 21,000 (polystyrene conversion).

Production Examples 2, 3 and Comparative Production Example 1
The fluorine-based monomer of Production Example 1 is CH ₂ ═C (Cl) COOCH ₂ CH ₂ C ₄ F ₉ (abbreviation α-Cl), CH ₂ ═C (H) COO (CH ₂ ) ₃ SO ₂ C _{4, respectively.} Products in which F ₉ (abbreviated as SO2Pr) and CH ₂ = CHCOOCH ₂ CH ₂ C ₄ F ₉ (abbreviated as α-H) were used as Production Examples 2 and 3 and Comparative Production Example 1. The weight average molecular weights were 16,000, 9,000, and 15,000, respectively.

Examples 1-3, Comparative Example 1
The silicon wafer of the substrate was washed with acetone and then irradiated with vacuum ultraviolet light to make the surface superhydrophilic. A 1 wt% solution prepared by diluting the fluoropolymers of Production Examples 1 to 3 and Comparative Production Example 1 with HCFC225 was spin-coated on this substrate at 2000 rpm for 1 minute to obtain a film thickness (excluding the solvent). A film having a thickness of 100 nm was prepared. The static contact angle and sliding angle of this film were measured. The results are shown in Table 1. The glass transition points shown are those measured for bulk polymers. The static contact angle is almost the same between the example and the comparative example, but the falling angle is much smaller in the example than in the comparative example, and the liquid easily rolls.

A photomask of line / space = 10 μm / 10 μm is adhered to these films and irradiated with vacuum ultraviolet light for 10 minutes to make the irradiated region lyophilic, and a pattern substrate comprising a lyophobic region and a lyophilic region is produced. did.
A 1% by weight toluene solution of poly (9,9-dioctylfluorene) [ADS129BE manufactured by American Dye Source Co.] was applied to these pattern substrates by an ink jet method. Inkjet was performed by an on-demand method with a nozzle diameter of 50 μm. When the toluene-dried thin film was observed with an optical microscope, in Examples 1 to 3, a polymer thin film that was clearly split along the lyophilic region having a line width of 10 μm was formed. On the other hand, in Comparative Example 1, it was split only indefinitely.

Examples 4 and 5 and Comparative Example 2
The same substrate as in Example 1 was used. In Example 4, 45% by weight of bisphenol A-dihydroxyethyl ether diacrylate (crosslinking agent), 25% by weight of α-F (fluorine monomer), dimethylpolysiloxane having a molecular weight of 5,000 modified at both ends with methacryloyl groups. Mix and dissolve so that siloxane (crosslinking agent) is 25% by weight and 2-hydroxy-2-methyl-1-phenylpropane (photopolymerization initiator) is 5% by weight, and this solution is formed on the substrate using a doctor blade. It was applied so that the thickness (film thickness excluding the solvent) was 100 μm. In Example 5 and Comparative Example 2, α-F was replaced with α-Cl and α-H, respectively.

Under a nitrogen atmosphere, the processing substrate was irradiated with ultraviolet rays having a wavelength of 365 nm under a condition of an integrated illuminance of 1000 mJ / cm ² through a photomask of line / space = 10 μm / 10 μm. By this operation, the irradiated region is cross-linked and becomes insoluble in the solvent. Next, a patterned substrate composed of a liquid repellent region and a lyophilic region was prepared by dissolving and removing the fluoropolymer in the unirradiated region by immersing the substrate in methanol.
A 1% by weight toluene solution of poly (9,9-dioctylfluorene) was applied to these patterned substrates by an inkjet method. When the toluene-dried thin film was observed with an optical microscope, in Examples 4 and 5, a polymer thin film that was clearly split along the lyophilic region having a line width of 10 μm was formed. On the other hand, in the comparative example 2, it split only indefinitely.

Production Example 4
In a four-necked flask equipped with a reflux condenser, a nitrogen inlet tube, a thermometer, and a stirrer, 50 g of α-Cl, 50 g of methacrylic acid, and 400 g of isopropyl alcohol are placed, heated to 70 ° C., and stirred for 30 minutes under a nitrogen stream. did. To this, 1 g of 2,2′-azobisisobutyronitrile was added and polymerized for 18 hours. Analysis of the residual monomer in the reaction solution by gas chromatography confirmed that the polymerization rate was 95% or more. The obtained reaction solution was precipitated with hexane and vacuum-dried to isolate the fluoropolymer. When the molecular weight of the obtained fluoropolymer was measured by GPC, the weight average molecular weight was 35,000 (polystyrene conversion).

Comparative production example 2
A product obtained by replacing the fluorine-based monomer in Production Example 4 with α-H was designated as Comparative Production Example 2. The weight average molecular weight was 32,000.

Example 6 and Comparative Example 3
84% of the fluoropolymer of Production Example 4 or Comparative Production Example 2, 1% by weight of the acid generator WPAG-199 (Wako Pure Chemical Industries), 5% by weight of the acid crosslinking agent Cymel 303 (Nippon Cytec Industries), propylene glycol monomethyl ether 84 A 5% by weight solution was spin-coated on the same substrate as in Example 1 to form a film having a film thickness (film thickness excluding the solvent) of 5 μm on the substrate. After heating at 110 ° C. for 3 minutes, the film was irradiated with ultraviolet rays of 365 nm through a photomask of line / space = 10 μm / 10 μm under the condition of an integrated illuminance of 100 mJ / cm ² and further heated at 110 ° C. for 3 minutes. By this operation, the irradiated region is cross-linked and becomes insoluble in the solvent. Next, development was performed by immersing in a 2.38 wt% tetramethylammonium hydroxide aqueous solution for 1 minute, followed by washing with water to prepare a pattern substrate composed of a liquid repellent region and a lyophilic region.
A 1% by weight toluene solution of poly (9,9-dioctylfluorene) was applied to these patterned substrates by an inkjet method. When the thin film after drying with toluene was observed with an optical microscope, in Example 6, a polymer thin film that was clearly split along the lyophilic region having a line width of 10 μm was formed. On the other hand, in the comparative example 3, it split only unclearly.

Production Example 5
In a four-necked flask equipped with a reflux condenser, a nitrogen inlet tube, a thermometer, and a stirrer, 50 g of α-Cl, 50 g of t-butyl methacrylate and 400 g of butyl acetate were placed, heated to 70 ° C., and then under a nitrogen stream for 30 minutes Stir with. To this, 1 g of 2,2′-azobisisobutyronitrile was added and polymerized for 18 hours. Analysis of the residual monomer in the reaction solution by gas chromatography confirmed that the polymerization rate was 95% or more. The obtained reaction solution was precipitated with hexane and vacuum-dried to isolate the fluoropolymer. When the molecular weight of the obtained fluoropolymer was measured by GPC, the weight average molecular weight was 36,000 (polystyrene conversion).

Comparative production example 3
A product obtained by replacing the fluorine-based monomer in Production Example 5 with α-H was designated as Comparative Production Example 3. The weight average molecular weight was 33,000.

Example 7, Comparative Example 4
A solution of 10% by weight of the fluoropolymer of Production Example 5 or Comparative Production Example 3, 1% by weight of the photoacid generator WPAG-199 (Wako Pure Chemical Industries), and 89% by weight of butyl acetate was spun onto the same substrate as in Example 1. A film having a film thickness (film thickness excluding the solvent) of 3 μm was prepared on the substrate. After heating at 110 ° C. for 3 minutes, this film was irradiated with ultraviolet rays of 365 nm through a photomask of line / space = 10 μm / 10 μm under the condition of integrated illuminance of 100 mJ / cm ² and further subjected to PEB treatment at 110 ° C. for 3 minutes. Heated. By this operation, the t-butyl group of t-butyl methacrylate in the irradiated region is eliminated by the action of a strong acid generated from the acid generator, and becomes a carboxylic acid. Next, after developing by immersing in a 2.38 wt% tetramethylammonium hydroxide solution for 1 minute, washing with water, drying, and heat treatment at 200 ° C. for 30 minutes, a pattern substrate composed of a liquid repellent region and a lyophilic region is obtained. Produced.
A 1% by weight toluene solution of poly (9,9-dioctylfluorene) was applied to these patterned substrates by an inkjet method. When the thin film after drying with toluene was observed with an optical microscope, in Example 7, a polymer thin film clearly divided along the lyophilic region having a line width of 10 μm was formed. On the other hand, in Comparative Example 4, the fragmentation was unclear only.

Production Example 6
In a four-necked flask equipped with a reflux condenser, a nitrogen inlet tube, a thermometer, and a stirrer, 50 g of fluoroacrylate CH ₂ ═C (Cl) COOCH ₂ CH ₂ C ₄ F ₉ (abbreviation α-Cl), 20 g of methacrylic acid Then, 30 g of 2-ethyl-2-adamantyl methacrylate (abbreviation AdEMA), 5 g of lauryl mercaptan, and 300 g of propylene glycol monomethyl ether acetate were added, heated to 70 ° C., and stirred for 30 minutes in a nitrogen stream. To this, 1 g of 2,2′-azobisisobutyronitrile was added and polymerized for 18 hours. Analysis of the residual monomer in the reaction solution by gas chromatography confirmed that the polymerization rate was 95% or more. The obtained reaction solution was precipitated with hexane and vacuum-dried to isolate the fluoropolymer. When the molecular weight of the obtained fluoropolymer was measured by GPC, the weight average molecular weight was 11,000 (polystyrene conversion). The glass transition point measured by DSC was 135 ° C. DSC temperature range and rate of temperature increase are 1st RUN: -50-200 ° C (10 ° C / min), 2nd RUN: -50-200 ° C (10 ° C / min), and the glass transition point is 2nd RUN. The extrapolated glass transition end temperature was used.

Production Examples 7 and 8, Comparative Production Example 3
The fluoroacrylates of Production Example 6 were respectively CH ₂ ═C (H) COO (CH ₂ ) ₃ SO ₂ C ₄ F ₉ (abbreviated SO2Pr) and CH ₂ ═C (CH ₃ ) COOCH ₂ CH ₂ C ₄ F _9. Production Examples 7 and 8 and Comparative Production Example 3 were replaced with (abbreviation α-CH3), CH ₂ = CHCOOCH ₂ CH ₂ C ₄ F ₉ (abbreviation α-H). The weight average molecular weights were 9,000, 12,000 and 10,000, respectively. The glass transition points were 115 °, 87 °, and 71 °, respectively.

Examples 8 to 10, Comparative Example 5
Production Example 6 (corresponding to Example 8), Production Example 7 (corresponding to Example 9), Production Example 8 (corresponding to Example 10), Production Comparative Example 3 (corresponding to Comparative Example 5) 10 wt. %, Acid crosslinking agent Cymel 300 [hexamethoxymethylmelamine] (made by Nippon Cytec Industries, Inc.) 4% by weight, acid generator CGI-1397 [(5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2 -Methylphenyl) acetonitrile] (manufactured by Ciba Specialty Chemicals) 0.5 wt% solution of propylene glycol monomethyl ether acetate 85.5 wt% on a glass substrate superhydrophilicized in the same manner as in Example 1. A film having a film thickness (film thickness excluding the solvent) of 3 μm was formed on the substrate by spin coating. After heating at 110 ° C. for 3 minutes, the film was irradiated with 365 nm UV light from a Canon mask aligner PLA-501 through a photomask of line / space = 10 μm / 10 μm under the condition of an integrated illuminance of 30 mJ / cm ^2. It heated at 110 degreeC for 3 minute (s) as a PEB process. By this operation, the irradiated region is cross-linked and becomes insoluble in the solvent. Next, after developing by immersing in a 15% aqueous solution of alkaline developer P3 disperse M (Henkel Japan) for 1 minute, washing with water, drying and heating at 200 ° C. for 1 hour, the lyophobic region and the lyophilic region The pattern board | substrate which consists of was produced. When the pattern was observed with a field effect scanning electron microscope (FE-SEM), in Examples 8 to 10, a clear line pattern having a line width of 10 μm was formed. On the other hand, in Comparative Example 5, disorder was observed in the line shape.

  A colorant for a liquid crystal display color filter was applied to these pattern substrates by an inkjet method. The ink jet apparatus used was a Litrex 70 (manufactured by Litrex), and was ejected onto the pattern substrate with a capacity of 15 pL per drop and a dot density of 80 μm. When a uniformly hydrophilic substrate was used, it was observed with an optical microscope that a thin film having a diameter of about 200 μm was formed after drying the solvent. On the other hand, when the pattern substrate was used, in Examples 8 to 10, a color thin film that was clearly divided along the lyophilic region having a line width of 10 μm was formed. On the other hand, in Comparative Example 5, there was a portion where a thin film was formed not only in the lyophilic region but also in the lyophobic region, and the color thin film was not completely split.

  The falling angle of a uniform liquid-repellent region prepared by irradiating the entire surface with ultraviolet rays on a film on which the electromagnetic wave curable composition was spin-coated without passing through a photomask was measured. In Examples 8 to 10 and Comparative Example 5, the falling angles for n-hexadecane are 15 °, 17 °, 20 °, 55 °, and the falling angles for PGMEA are 17 °, 20 °, 21 °, and 62 °, respectively. In the liquid repellent area of the example, the liquid was very easy to fall. In the tumbling angle, a force of mg · sin α [where m: mass of the droplet, g: acceleration of gravity, α: tumbling angle] is applied to the droplet in the slope direction. That is, the falling angle indicates the minimum force for moving the droplet in the liquid repellent region. It is presumed that the reason why the color filter colorants had good splitting properties in Examples 8 to 10 was that the droplets easily moved in the liquid repellent region.

Production Examples 9 to 20, Comparative Production Example 4
The cases where the fluoroacrylate and the high softening point monomer in Production Example 6 were replaced with those shown in Table 2 were designated Production Examples 9 to 20 and Comparative Production Example 4. The relationship between compound names and abbreviations is as follows. CH ₂ = CHCOOCH ₂ CH ₂ C ₈ F ₁₇ (abbreviation C8 α-H), 2-methyl-2-adamantyl methacrylate (abbreviation AdMMA), methyl methacrylate (abbreviation MMA), isobornyl methacrylate (abbreviation iBMA), phenyl methacrylate (Abbreviation PhMA), norbornylmethyl methacrylate (abbreviation NBMA), cyclohexyl methacrylate (abbreviation CHMA). The weight average molecular weights were all in the range of 5,000 to 12,000. Table 2 shows the glass transition point.

Examples 11 to 22, Comparative Example 6
Examples 11 to 22 and Comparative Example 6 were obtained by replacing the fluoropolymer of Production Example 8 (Production Example 6) with Production Examples 7 to 20 and Comparative Production Example 4. When the pattern was observed by FE-SEM, in Examples 11 to 22, a clear line pattern having a line width of 10 μm was formed. On the other hand, in Comparative Example 6, disorder was observed in the line shape. A color filter colorant was applied to these patterned substrates by an inkjet method. When the thin film after drying the solvent was observed with an optical microscope, in Examples 11 to 22, a color thin film clearly divided along the lyophilic region having a line width of 10 μm was formed. On the other hand, in Comparative Example 6, there was a portion where a thin film was formed not only in the lyophilic region but also in the lyophobic region.
On the other hand, Table 2 shows the results of measuring the static contact angle and the falling angle of a uniform liquid-repellent region prepared by irradiating the entire surface with ultraviolet rays on a film coated with the above electromagnetic wave curable composition without using a photomask. Show.

Example 23
8% by weight of the fluoropolymer of Production Example 7, 4% by weight of pentaerythritol tetraacrylate, 2-methyl-1- [4- (methylthio) phenyl] -2-montforinopropanone-1 (Ciba Specialty Chemicals) Irgacure 907 manufactured by Co., Ltd. A 1% by weight solution of 82% by weight of propylene glycol monomethyl ether acetate was spin-coated on a superhydrophilic glass substrate in the same manner as in Example 1, and a film thickness (solvent was added on the substrate). Excluding film thickness) A 2 μm film was prepared. Subsequently, a pattern substrate including a liquid repellent region and a lyophilic region was produced in the same manner as in Example 8. When the pattern was observed with FE-SEM, a clear line pattern having a line width of 10 μm was formed.

  As a result of applying the color filter colorant to these pattern substrates by the ink jet method in the same manner as in Example 8, a color thin film that was clearly split along the lyophilic region having a line width of 10 μm was formed.

に置き換えたグラフト共重合体を製造例２１とした。重量平均分子量は１３，０００、ガラス転移点１２５℃であった。Production Example 21
The fluoroacrylate of Production Example 14

The graft copolymer replaced with was designated as Production Example 21. The weight average molecular weight was 13,000 and the glass transition point was 125 ° C.

Example 24
A case where the fluoropolymer (random copolymer) of Example 16 was replaced with the graft copolymer of Production Example 21 is referred to as Example 24. When the pattern was observed with FE-SEM, a clear line pattern having a line width of 10 μm was formed. As a result of applying the color filter colorant to these pattern substrates by the ink jet method in the same manner as in Example 8, a color thin film that was clearly split along the lyophilic region having a line width of 10 μm was formed.
As a result of measuring the falling angle of the uniform liquid repellent region prepared by irradiating the entire surface with ultraviolet rays without passing through a photomask on the film coated with the above electromagnetic wave curable composition, the falling angle with respect to n-hexadecane was 10 °. The sliding angle with respect to PGMEA was 14 °, and the performance was further improved as compared with Example 16 using a random copolymer.

Measuring method of contact angle in liquid repellent area-
Since the liquid repellent region of the present invention has a very small area, the contact angle cannot be measured as it is. Therefore, in order to measure the contact angle, a large-area liquid repellent region was prepared by the following method. The electromagnetic wave curable composition of the present invention is uniformly applied to a 3 cm × 3 cm substrate by a spin coating method (2000 rpm, 30 seconds), and irradiated with ultraviolet rays having an integrated illuminance of 1000 mJ / cm ² in a nitrogen atmosphere. Cured. The contact angle was measured with a fully automatic contact angle meter by dropping 2 μL of water or n-hexadecane from a microsyringe onto a horizontally placed substrate.

Example 25
CH ₂ = C (Cl) COO—CH ₂ CH ₂ C ₄ F ₉ [abbreviated as Rf (C4) α-Cl acrylate] 90 wt%, 1,6-hexanediol diacrylate (abbreviated as HX-2A) 10% by weight of the mixture was dissolved and 2-methyl-1- [4- (methylthio) phenyl] -2-montforinopropanone-1 (commercially available from Ciba Specialty Chemicals Co., Ltd.) was dissolved. Irgacure 907) was added and dissolved. The contact angle of this electromagnetic wave curable composition is shown in Table 1. Both water and n-hexadecane droplets showed high liquid repellency.
The electromagnetic wave curable composition of Example 25 was discharged from an ink jet apparatus having a nozzle diameter of 50 μm, and a liquid / repellent region of line / space = 100 μm / 100 μm was drawn on the silicon wafer of the substrate. The silicon wafer was washed with acetone and then irradiated with vacuum ultraviolet light to make the surface superhydrophilic. The film of the electromagnetic wave curable composition was cured by irradiating the substrate with ultraviolet rays having an integrated illuminance of 1000 mJ / cm ² in a nitrogen atmosphere.
A 1% by weight toluene solution of poly (9,9-dioctylfluorene) [abbreviated as F8] was applied to this pattern substrate by a spin coating method (2000 rpm, 30 seconds). When the toluene-dried thin film was observed with an optical microscope, a polymer thin film that was clearly split along the lyophilic region having a line width of 100 μm was formed.

Examples 26 and 27
In the case of using trimethylolpropane triacrylate (abbreviated as TMP-3A) instead of HX-2A in Example 25, in the case of using Example 26, pentaerythritol tetraacrylate (abbreviated as PEN-4A) Example 27 was adopted. In all cases, the liquid repellency was high, and the splitting property of the F8 thin film with respect to the pattern substrate was also good.

Example 28
Instead of Rf (C4) α-Cl acrylate of Example 25, CH ₂ = C (H) COO—CH ₂ CH ₂ C ₆ F ₁₃ [abbreviated as Rf (C6) acrylate] was used, and Irgacure 907 was 1 Example 28 was designated as weight%. In this system, when 2% by weight or more of Irgacure 907 was blended, the electromagnetic wave curable composition was not uniformly dissolved. This electromagnetic wave curable composition showed high liquid repellency, and the F8 thin film had good splitting properties with respect to the pattern substrate.

Comparative Examples 7 and 8
The case where TMP-3A was used instead of HX-2A of Example 28 was designated as Comparative Example 7, and the case where PEN-4A was used was designated as Comparative Example 8. In this system, when TMP-3A and PEN-4A were blended, the electromagnetic wave curable composition was not uniformly dissolved.

Comparative Examples 9-11
In the case of using lauryl acrylate instead of Rf (C4) α-Cl acrylate of Example 25 and HX-2A, TMP-3A, and PEN-4A as the polyfunctional acrylate, did. This electromagnetic wave curable composition had almost no liquid repellency with respect to n-hexadecane, and the F8 thin film had poor splitting properties with respect to the pattern substrate.

Claims (39)

Surface treatment agent for photolithography comprising at least one fluorine-containing compound selected from the group consisting of the following fluorine-based monomer (A) and fluorine-based polymer (B):
(A)
(A-1) α-substituted acrylate monomer having a fluoroalkyl group having 1 to 6 carbon atoms [substituent at α-position: fluorine atom, chlorine atom, bromine atom, iodine atom, CFX ¹ X ² group (provided that X ¹ And X ² is a hydrogen atom, a fluorine atom or a chlorine atom), a cyano group, a linear or branched fluoroalkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted benzyl group, a substituted or unsubstituted phenyl group Or a linear or branched alkyl group having 1 to 20 carbon atoms],
(A-2) Fluorine-containing silsesquioxane monomer containing a C1-C6 fluoroalkyl group and a polymerizable group (A-3) Polymerizable monomer having a perfluoropolyether group (A-4) Carbon number A polymerizable monomer in which a fluoroalkyl group of 1 to 6 and a polymerizable group are linked by —SO ₂ (CH ₂ ) _n — (n is 1 to 10) (A-5) Monomers (A-1) to (A— 4) at least one fluorine-based monomer selected from the group consisting of macromonomers having a (meth) acryloyl group at the end of the polymer having at least one type as a repeating unit; and (B) the fluorine-based monomer (A); A fluorine-based polymer having a repeating unit derived from the same fluorine-based monomer (B-1).   The surface treatment agent for photolithography according to claim 1, wherein the surface treatment agent contains a fluorine-based monomer (A), a crosslinking agent (C), and a photocrosslinking catalyst (D).   The surface for photolithography according to claim 1, wherein the surface treatment agent comprises a fluorine-based polymer (B) and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has a crosslinkable functional group (E). Processing agent.   The surface treating agent contains a fluorine-based polymer (B), a crosslinking agent (C), and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has a crosslinkable functional group (E). The surface treating agent for photolithography as described in 2.   The surface treatment agent contains a fluorine-based polymer (B), a crosslinking agent (C), and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has a crosslinkable functional group (E) and an acidic group (F The surface treating agent for photolithography according to claim 1, comprising:   The surface treatment agent contains a fluorine-based polymer (B), a crosslinking agent (C), and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has a crosslinkable functional group (E) and an acidic group (F ) And a silicone chain (G), the surface treatment agent for photolithography according to claim 1.   The surface treatment agent comprises a fluorine-based polymer (B), a crosslinking agent (C), and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has an acidic group (F). Surface treatment agent for photolithography.   The surface treatment agent contains a fluorine-based polymer (B), a crosslinking agent (C), and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has an acidic group (F) and a silicone chain (G). The surface treating agent for photolithography according to claim 1.   The surface treating agent contains a fluorine-based polymer (B) and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has a crosslinkable functional group (E) and an acidic group (F). The surface treating agent for photolithography as described in 2.   The surface treatment agent contains a fluorine-based polymer (B) and a photocrosslinking catalyst (D), and the fluorine-based polymer (B) has a crosslinkable functional group (E), an acidic group (F), and a silicone chain (G The surface treating agent for photolithography according to claim 1, comprising:   The surface treating agent for photolithography according to any one of claims 2, 4 to 8, wherein the crosslinking agent (C) has any one of a radical polymerizable functional group, a cationic polymerizable functional group, and a functional group capable of crosslinking with an acid.   The surface treatment agent for photolithography according to any one of claims 2, 4 to 8, wherein the crosslinking agent (C) is silicone (meth) acrylate.   The surface treatment for photolithography according to any one of claims 3 to 6, 9, and 10, wherein the crosslinkable functional group (E) is any one of a radical polymerizable group, a cationic polymerizable group, and a functional group capable of crosslinking with an acid. Agent.   The surface treatment agent contains a fluorine-based polymer (B) and a photoacid generator (I), and the fluorine-based polymer (B) is converted to an acid group by the action of an acid, an acid dissociable functional group (H The surface treating agent for photolithography according to claim 1, comprising:   The surface treatment agent contains a fluorine-based polymer (B) and a photoacid generator (I), and the fluorine-based polymer (B) is converted to an acid group by the action of an acid, an acid dissociable functional group (H ) And a silicone chain (G), the surface treatment agent for photolithography according to claim 1.   The fluorine polymer (B) is a copolymer having a repeating unit derived from a fluorine monomer (B-1) and a repeating unit derived from an unsaturated organic acid (B-2). A surface treatment agent for photolithography according to claim 1.   The surface treatment for photolithography according to claim 16, wherein in the fluoropolymer (B), the weight ratio of the fluoromonomer (B-1) to the unsaturated organic acid (B-2) is 60:40 to 98: 2. Agent.   The surface treatment agent for photolithography according to claim 16, wherein the fluorine-based polymer (B) further has a repeating unit derived from a high softening point monomer (B-3). Fluorine polymer (B)
Fluorine monomer (B-1) 20 to 80% by weight,
5 to 30% by weight of unsaturated organic acid (B-2),
High softening point monomer (B-3) 10 to 70% by weight
The surface treating agent for photolithography according to claim 18, comprising:   The unsaturated organic acid (B-2) is selected from the group consisting of (meth) acrylic acid, vinyl acetic acid, crotonic acid, itaconic acid, itaconic anhydride, maleic acid, maleic anhydride, fumaric acid, and cinnamic acid The surface treatment agent for photolithography according to claim 16, which is at least one kind.   The high softening point monomer (B-3) is at least one selected from the group consisting of methyl methacrylate, phenyl methacrylate, cyclohexyl methacrylate, isobornyl (meth) acrylate, norbornyl (meth) acrylate, and adamantyl (meth) acrylate. The surface treating agent for photolithography according to claim 18. In the α-substituted acrylate (A-1) having a C 1-6 fluoroalkyl group, the α-position substituent is a fluorine atom, chlorine atom, bromine atom, iodine atom, CFX ¹ X ² group (provided that X ¹ and X ² are a hydrogen atom, a fluorine atom or a chlorine atom), a cyano group, a linear or branched fluoroalkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted benzyl group, a substituted or unsubstituted phenyl The surface treatment agent for photolithography according to any one of claims 1 to 21, which is selected from the group consisting of groups. The surface treatment agent for photolithography according to claim 1, wherein n in —SO ₂ (CH ₂ ) _n — in the fluorine-based monomer (A-4) is 3 to 6.   23. The photo according to any one of claims 1 to 22, wherein in the fluoromonomer (A-1), (A-2), (A-4) and (A-5), the fluoroalkyl group has 4 carbon atoms. Surface treatment agent for lithography.   A pattern composed of a plurality of regions having different surface free energies is formed on a substrate by photolithography using the surface treatment agent for photolithography according to any one of claims 1 to 24. A method for manufacturing a pattern substrate. Electromagnetic waves used in photolithography are
Light with a wavelength of 10-400 nm,
X-rays with a wavelength of 0.1 to 10 nm,
The method according to claim 25, which is either an electron beam having a wavelength of 0.001 to 0.01 nm or a laser beam having a wavelength of 10 to 300 nm.   A patterned substrate manufactured by the method of claim 25 or 26.   A method for producing a device, comprising applying a solution or dispersion of a functional compound on the patterned substrate according to claim 27 and removing the solvent.   29. A device for electronic, optical, medical or analytical chemistry use made by the process of claim 28.   30. The device of claim 29, wherein the device is an integrated circuit, a display pixel, a lens array, a biochip or a microchemical chip.   A black matrix that has been made liquid-repellent on a lyophilic transparent substrate by photolithography using a dispersion of a black pigment in the surface treatment agent for photolithography according to any one of claims 1 to 24. A method for producing a color filter for display, comprising: forming a color filter for display.   After the surface treatment agent for photolithography according to any one of claims 1 to 24 is further uniformly coated on the photosensitive resin black layer uniformly formed on the lyophilic transparent substrate, the photolithography method is used. A method for producing a color filter for display, comprising forming a lyophobic black matrix on a lyophilic transparent substrate.   The color filter for display according to claim 31 or 32, wherein a dispersion liquid in which red, black, and yellow pigments are dispersed is applied to a transparent substrate having a liquid repellent black matrix, and the solvent is removed. Manufacturing method.   A color filter for display manufactured by the manufacturing method according to claim 33. (A) a fluoromonomer containing a fluoroalkyl group,
An electromagnetic wave curable composition comprising (B) a crosslinking agent and (C) a photocrosslinking catalyst is discharged onto a substrate by a non-contact microdroplet discharge method, and a coating film of the electromagnetic wave curable composition is formed on the substrate. A pattern substrate manufacturing method is characterized in that a pattern composed of at least two regions having different surface free energies is formed on a substrate by forming a film and irradiating the coating film with an electromagnetic wave to cure. The fluorine-based monomer (A) of the electromagnetic wave curable composition is (A-1) α-substituted acrylate monomer having a fluoroalkyl group having 1 to 6 carbon atoms [substituent at α-position: fluorine atom, chlorine atom, bromine atom, iodine. Atom, CFX ¹ X ² group (where X ¹ and X ² are hydrogen atom, fluorine atom or chlorine atom), cyano group, linear or branched fluoroalkyl group having 1 to 20 carbon atoms, substituted or non-substituted A substituted benzyl group, a substituted or unsubstituted phenyl group, or a linear or branched alkyl group having 1 to 20 carbon atoms],
(A-2) Fluorine-containing silsesquioxane monomer containing a C1-C6 fluoroalkyl group and a polymerizable group (A-3) Polymerizable monomer having a perfluoropolyether group (A-4) Carbon number A polymerizable monomer in which a fluoroalkyl group of 1 to 6 and a polymerizable group are linked by —SO ₂ (CH ₂ ) _n — (n is 1 to 10) (A-5) Monomers (A-1) to (A— 36. The method according to claim 35, wherein the polymer is at least one fluorine-based monomer selected from the group consisting of macromonomers having a (meth) acryloyl group at the terminal of a polymer having at least one of 4) as a repeating unit.   The method according to claim 36 or 36, wherein the crosslinking agent (B) has a radical polymerizable functional group or a cationic polymerizable functional group.   36. The method according to claim 35, wherein the non-contact microdroplet discharge method is an ink jet method or a micro dispenser method. 36. The method of claim 35, wherein a liquid repellent film is formed on the substrate to obtain a patterned at least one liquid repellent area and at least one lyophilic area.