JPS6483663A - Liquid raw material evaporating device - Google Patents

Liquid raw material evaporating device

Info

Publication number
JPS6483663A
JPS6483663A JP24010487A JP24010487A JPS6483663A JP S6483663 A JPS6483663 A JP S6483663A JP 24010487 A JP24010487 A JP 24010487A JP 24010487 A JP24010487 A JP 24010487A JP S6483663 A JPS6483663 A JP S6483663A
Authority
JP
Japan
Prior art keywords
raw material
temp
liquid raw
heaters
material evaporating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24010487A
Other languages
Japanese (ja)
Inventor
Masatoshi Mikami
Kunihiro Matsubara
Shigeo Iino
Masayuki Sakamoto
Mitsuzo Shimomura
Hiroshi Mihira
Kazuhiro Oya
Koji Hatta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
S Tec Inc
Original Assignee
Furukawa Electric Co Ltd
S Tec Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd, S Tec Inc filed Critical Furukawa Electric Co Ltd
Priority to JP24010487A priority Critical patent/JPS6483663A/en
Publication of JPS6483663A publication Critical patent/JPS6483663A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0082—Regulation; Control
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/87—Controlling the temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To stably evaporate a liquid raw material over a long period of time by disposing sensors connected to a temp. control apparatus at an arbitrary part from the gaseous phase part of a raw material evaporating vessel provided with plural heaters to a flow rate controller of a piping system. CONSTITUTION:The liquid raw material 30 is housed in the lower liquid phase part 3 in the raw material evaporating vessel 1 provided with the plural heaters 2a-2c and is heated to evaporate. The raw material vapor of the upper gaseous phase part 4 obtd. in such a manner is fed through the piping system 5 disposed with the flow rate controller to a reaction system 15. The temp. sensor 18 and pressure sensor 19 are respectively disposed to the gaseous phase part 4 and piping system 5 of the above-mentioned liquid raw material evaporating device and are connected to the temp. control apparatus 17 to control the above- mentioned heaters 2a.... Of the plural heaters, the heaters 2a, 2b in the rear face part and front face part of the above-mentioned vessel 1 are preferably of a constant temp. heating type and the heater 2c in the cylindrical part is preferably of a temp. control type. The liquid raw material evaporating device having high reliability is thereby obtd.
JP24010487A 1987-09-25 1987-09-25 Liquid raw material evaporating device Pending JPS6483663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24010487A JPS6483663A (en) 1987-09-25 1987-09-25 Liquid raw material evaporating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24010487A JPS6483663A (en) 1987-09-25 1987-09-25 Liquid raw material evaporating device

Publications (1)

Publication Number Publication Date
JPS6483663A true JPS6483663A (en) 1989-03-29

Family

ID=17054550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24010487A Pending JPS6483663A (en) 1987-09-25 1987-09-25 Liquid raw material evaporating device

Country Status (1)

Country Link
JP (1) JPS6483663A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0494701A (en) * 1990-08-10 1992-03-26 Furukawa Electric Co Ltd:The Apparatus for feeding evaporated gas
JPH07166354A (en) * 1993-07-20 1995-06-27 Santa Barbara Res Center Liquid deposit source gas releasing system
US6698240B1 (en) 1999-06-03 2004-03-02 Shin-Etsu Chemical Co., Ltd. Apparatus for manufacturing glass base material and a method for manufacturing glass base material
JP2011088080A (en) * 2009-10-23 2011-05-06 Tomotaka Marui Microbubble-containing composition and microbubble generator
JP2012000537A (en) * 2010-06-14 2012-01-05 Shibata Kagaku Kk Gas generation apparatus
WO2013161183A1 (en) * 2012-04-26 2013-10-31 昭和電工株式会社 Evaporative gas generating device and method for producing evaporative gas, and hydrogen bromide production device and method for producing hydrogen bromide
WO2018190074A1 (en) * 2017-04-13 2018-10-18 株式会社堀場エステック Vaporization device and vaporization system
JP2019171341A (en) * 2018-03-29 2019-10-10 古河電気工業株式会社 Vaporizer

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0494701A (en) * 1990-08-10 1992-03-26 Furukawa Electric Co Ltd:The Apparatus for feeding evaporated gas
JPH07166354A (en) * 1993-07-20 1995-06-27 Santa Barbara Res Center Liquid deposit source gas releasing system
US6698240B1 (en) 1999-06-03 2004-03-02 Shin-Etsu Chemical Co., Ltd. Apparatus for manufacturing glass base material and a method for manufacturing glass base material
KR100632879B1 (en) * 1999-06-03 2006-10-16 신에쓰 가가꾸 고교 가부시끼가이샤 An apparatus for manufacturing glass base material and a method for manufacturing glass base material
JP2011088080A (en) * 2009-10-23 2011-05-06 Tomotaka Marui Microbubble-containing composition and microbubble generator
JP2012000537A (en) * 2010-06-14 2012-01-05 Shibata Kagaku Kk Gas generation apparatus
TWI510294B (en) * 2012-04-26 2015-12-01 Showa Denko Kk Evaporation gas generating device and method for producing vaporized gas and production method of hydrogen bromide and method for producing hydrogen bromide
CN104245110A (en) * 2012-04-26 2014-12-24 昭和电工株式会社 Evaporative gas generating device and method for producing evaporative gas, and hydrogen bromide production device and method for producing hydrogen bromide
WO2013161183A1 (en) * 2012-04-26 2013-10-31 昭和電工株式会社 Evaporative gas generating device and method for producing evaporative gas, and hydrogen bromide production device and method for producing hydrogen bromide
JPWO2013161183A1 (en) * 2012-04-26 2015-12-21 昭和電工株式会社 Evaporative gas generator, evaporative gas production method, hydrogen bromide production apparatus, and hydrogen bromide production method
CN104245110B (en) * 2012-04-26 2016-04-13 昭和电工株式会社 Boil-off gas generation device and boil-off gas manufacture method and hydrogen bromide manufacturing installation and hydrogen bromide manufacture method
US9835325B2 (en) 2012-04-26 2017-12-05 Showa Denko K.K. Evaporative gas generating device, method for producing evaporative gas, hydrogen bromide production device, and method for producing hydrogen bromide
WO2018190074A1 (en) * 2017-04-13 2018-10-18 株式会社堀場エステック Vaporization device and vaporization system
CN110337326A (en) * 2017-04-13 2019-10-15 株式会社堀场Stec Gasification installation and gasification system
JPWO2018190074A1 (en) * 2017-04-13 2020-02-27 株式会社堀場エステック Vaporization device and vaporization system
JP2019171341A (en) * 2018-03-29 2019-10-10 古河電気工業株式会社 Vaporizer

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