JPS6454207A - Optical measuring apparatus of film thickness - Google Patents

Optical measuring apparatus of film thickness

Info

Publication number
JPS6454207A
JPS6454207A JP21218687A JP21218687A JPS6454207A JP S6454207 A JPS6454207 A JP S6454207A JP 21218687 A JP21218687 A JP 21218687A JP 21218687 A JP21218687 A JP 21218687A JP S6454207 A JPS6454207 A JP S6454207A
Authority
JP
Japan
Prior art keywords
luminous flux
detector
light quantity
film thickness
adjusted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21218687A
Other languages
Japanese (ja)
Inventor
Shinji Uchida
Takaaki Tomita
Yoshinao Taketomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP21218687A priority Critical patent/JPS6454207A/en
Publication of JPS6454207A publication Critical patent/JPS6454207A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To make it possible to easily obtain positional information of a luminous flux even without removing a light quantity detector, by providing a position detector of the luminous flux separately from the light quantity detector. CONSTITUTION:The configuration of a luminous flux X2 in a position detector 9 is based on that when a luminous flux X1 is adjusted by a first mirror 5, and adjusting screw 12 and a second mirror 6 to be incident in the central position of a light quantity detector 4. Therefore, only if the position of the luminous flux is adjusted after removing the light quantity detector 4 from a light shield member 1, the position of the luminous flux can be detected, with the position detector 9 mounted. As described above, the position of the luminous flux is detected by the position detector 9, and both the noises and the light quantity level at that time can be adjusted and confirmed simultaneously by the light quantity detector 4.
JP21218687A 1987-08-25 1987-08-25 Optical measuring apparatus of film thickness Pending JPS6454207A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21218687A JPS6454207A (en) 1987-08-25 1987-08-25 Optical measuring apparatus of film thickness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21218687A JPS6454207A (en) 1987-08-25 1987-08-25 Optical measuring apparatus of film thickness

Publications (1)

Publication Number Publication Date
JPS6454207A true JPS6454207A (en) 1989-03-01

Family

ID=16618348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21218687A Pending JPS6454207A (en) 1987-08-25 1987-08-25 Optical measuring apparatus of film thickness

Country Status (1)

Country Link
JP (1) JPS6454207A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0652415A1 (en) * 1993-11-09 1995-05-10 Nova Measuring Instruments Limited A device for measuring the thickness of thin films
US5764365A (en) * 1993-11-09 1998-06-09 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
US6038029A (en) * 1998-03-05 2000-03-14 Nova Measuring Instruments, Ltd. Method and apparatus for alignment of a wafer
US6212961B1 (en) 1999-02-11 2001-04-10 Nova Measuring Instruments Ltd. Buffer system for a wafer handling system
USRE38153E1 (en) * 1993-11-09 2003-06-24 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
US7030957B2 (en) 1998-07-14 2006-04-18 Nova Measuring Instruments Ltd. Monitoring apparatus and method particularly useful in photolithographically processing substrates
JP2008293800A (en) * 2007-05-24 2008-12-04 Toshiba Lighting & Technology Corp Dimmer unit and luminaire with the same

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE40225E1 (en) 1993-11-09 2008-04-08 Nova Measuring Instruments Ltd. Two-dimensional beam deflector
US5764365A (en) * 1993-11-09 1998-06-09 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
USRE41906E1 (en) 1993-11-09 2010-11-02 Nova Measuring Instruments, Ltd. Two dimensional beam deflector
USRE38153E1 (en) * 1993-11-09 2003-06-24 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
EP0652415A1 (en) * 1993-11-09 1995-05-10 Nova Measuring Instruments Limited A device for measuring the thickness of thin films
US6038029A (en) * 1998-03-05 2000-03-14 Nova Measuring Instruments, Ltd. Method and apparatus for alignment of a wafer
US7525634B2 (en) 1998-07-14 2009-04-28 Nova Measuring Instruments Ltd. Monitoring apparatus and method particularly useful in photolithographically
US7289190B2 (en) 1998-07-14 2007-10-30 Nova Measuring Instruments Ltd. Monitoring apparatus and method particularly useful in photolithographically
US7030957B2 (en) 1998-07-14 2006-04-18 Nova Measuring Instruments Ltd. Monitoring apparatus and method particularly useful in photolithographically processing substrates
US7821614B2 (en) 1998-07-14 2010-10-26 Nova Measuring Instruments Ltd. Monitoring apparatus and method particularly useful in photolithographically processing substrates
US8482715B2 (en) 1998-07-14 2013-07-09 Nova Measuring Instruments Ltd. Monitoring apparatus and method particularly useful in photolithographically processing substrates
US8780320B2 (en) 1998-07-14 2014-07-15 Nova Measuring Instuments Ltd. Monitoring apparatus and method particularly useful in photolithographically processing substrates
US6212961B1 (en) 1999-02-11 2001-04-10 Nova Measuring Instruments Ltd. Buffer system for a wafer handling system
JP2008293800A (en) * 2007-05-24 2008-12-04 Toshiba Lighting & Technology Corp Dimmer unit and luminaire with the same

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