JPS6359423B2 - - Google Patents
Info
- Publication number
- JPS6359423B2 JPS6359423B2 JP55182161A JP18216180A JPS6359423B2 JP S6359423 B2 JPS6359423 B2 JP S6359423B2 JP 55182161 A JP55182161 A JP 55182161A JP 18216180 A JP18216180 A JP 18216180A JP S6359423 B2 JPS6359423 B2 JP S6359423B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- group
- silanol
- onium salt
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 claims description 40
- 229920001296 polysiloxane Polymers 0.000 claims description 21
- -1 polydimethylsiloxane Polymers 0.000 claims description 20
- 150000003839 salts Chemical class 0.000 claims description 20
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 6
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 6
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical group C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 claims description 4
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 claims description 4
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 claims description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000010409 thin film Substances 0.000 description 12
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- 239000012530 fluid Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- 238000001723 curing Methods 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 150000001768 cations Chemical class 0.000 description 5
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 230000000269 nucleophilic effect Effects 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052752 metalloid Inorganic materials 0.000 description 3
- 150000002738 metalloids Chemical class 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 125000000068 chlorophenyl group Chemical group 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- YEOCHZFPBYUXMC-UHFFFAOYSA-L copper benzoate Chemical compound [Cu+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 YEOCHZFPBYUXMC-UHFFFAOYSA-L 0.000 description 2
- VPUGDVKSAQVFFS-UHFFFAOYSA-N coronene Chemical compound C1=C(C2=C34)C=CC3=CC=C(C=C3)C4=C4C3=CC=C(C=C3)C4=C2C3=C1 VPUGDVKSAQVFFS-UHFFFAOYSA-N 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 description 2
- IOQXYRHSBBCYCM-UHFFFAOYSA-N diphenyl-(2-phenylphenyl)sulfanium Chemical class C1=CC=CC=C1[S+](C=1C(=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 IOQXYRHSBBCYCM-UHFFFAOYSA-N 0.000 description 2
- 238000011067 equilibration Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 239000002655 kraft paper Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 235000019645 odor Nutrition 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- WGBYOWIYAKVOLO-UHFFFAOYSA-N 1,4-bis(phenylsulfanyl)benzene Chemical compound C=1C=C(SC=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 WGBYOWIYAKVOLO-UHFFFAOYSA-N 0.000 description 1
- SWJPEBQEEAHIGZ-UHFFFAOYSA-N 1,4-dibromobenzene Chemical compound BrC1=CC=C(Br)C=C1 SWJPEBQEEAHIGZ-UHFFFAOYSA-N 0.000 description 1
- VSIKJPJINIDELZ-UHFFFAOYSA-N 2,2,4,4,6,6,8,8-octakis-phenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound O1[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si]1(C=1C=CC=CC=1)C1=CC=CC=C1 VSIKJPJINIDELZ-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- NZVLXSFYCZSHRF-UHFFFAOYSA-N 9,10-diethylanthracene Chemical compound C1=CC=C2C(CC)=C(C=CC=C3)C3=C(CC)C2=C1 NZVLXSFYCZSHRF-UHFFFAOYSA-N 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- UJKPHYRXOLRVJJ-MLSVHJFASA-N CC(O)C1=C(C)/C2=C/C3=N/C(=C\C4=C(CCC(O)=O)C(C)=C(N4)/C=C4\N=C(\C=C\1/N\2)C(C)=C4C(C)O)/C(CCC(O)=O)=C3C Chemical compound CC(O)C1=C(C)/C2=C/C3=N/C(=C\C4=C(CCC(O)=O)C(C)=C(N4)/C=C4\N=C(\C=C\1/N\2)C(C)=C4C(C)O)/C(CCC(O)=O)=C3C UJKPHYRXOLRVJJ-MLSVHJFASA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical group O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052781 Neptunium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 239000004651 Radiation Curable Silicone Substances 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- DUMWHCLFZJQIGA-UHFFFAOYSA-N [methoxy(dimethyl)silyl] trimethyl silicate Chemical compound CO[Si](C)(C)O[Si](OC)(OC)OC DUMWHCLFZJQIGA-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- DPKHZNPWBDQZCN-UHFFFAOYSA-N acridine orange free base Chemical compound C1=CC(N(C)C)=CC2=NC3=CC(N(C)C)=CC=C3C=C21 DPKHZNPWBDQZCN-UHFFFAOYSA-N 0.000 description 1
- BGLGAKMTYHWWKW-UHFFFAOYSA-N acridine yellow Chemical compound [H+].[Cl-].CC1=C(N)C=C2N=C(C=C(C(C)=C3)N)C3=CC2=C1 BGLGAKMTYHWWKW-UHFFFAOYSA-N 0.000 description 1
- 229910052768 actinide Inorganic materials 0.000 description 1
- 150000001255 actinides Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- DZBUGLKDJFMEHC-UHFFFAOYSA-N benzoquinolinylidene Natural products C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004965 chloroalkyl group Chemical group 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010073 coating (rubber) Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 239000010881 fly ash Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical group 0.000 description 1
- 229960003569 hematoporphyrin Drugs 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000003701 inert diluent Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000013008 moisture curing Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N nitrate group Chemical group [N+](=O)([O-])[O-] NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical group OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- JADVWWSKYZXRGX-UHFFFAOYSA-M thioflavine T Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C1=[N+](C)C2=CC=C(C)C=C2S1 JADVWWSKYZXRGX-UHFFFAOYSA-M 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
Description
本発明は放射線硬化性オルガノポリシロキサン
組成物に関する。
本発明以前には、例えばブルナー(Bruner)
の米国特許第3070555号に示されているような室
温加硫型オルガノポリシロキサン組成物は、シラ
ノール終端ポリジオルガノシロキサンとアシルオ
キシシランとの混合物の湿分硬化に基づくもので
あつた。これらの湿分硬化性オルガノポリシロキ
サンが各種の用途に有用であることが確認されて
いるが、硬化時に酢酸が発生し、この結果望まし
くない臭気が出、酢酸と各種基板との望ましくな
い反応が生じる。本出願人に譲渡されたヴイヴエ
ンテイ(Viventi)の米国特許第3816282号は、メ
ルカプトポリシロキサンおよび遊離基発生剤を用
いれば、オルガノポリシロキサンを放射線で硬化
でき、良好な結果が得られることを開示してい
る。フオツクス(Fox)らの米国特許第4101513
号は、a,aおよびa族のオニウム触媒が
紫外線の作用の下で加水分解性シランの縮合に有
用であることを確認している。
本発明は、シラノール終端ポリジオルガノシロ
キサンおよびアルコキシシランの混合物をa,
aまたはa族元素のオニウム塩と組合せて使
用すると、酢酸臭を呈さず紫外線および可視光い
ずれでも硬化し得る放射線硬化性オルガノポリシ
ロキサン組成物が得られることを見出してなした
ものである。前記ヴイヴエンテイの米国特許の組
成物と違つて、本発明の放射線硬化性オルガノポ
リシロキサン組成物はシラノール縮合に基づく。
可視光硬化が望ましい場合には、上述したオニウ
ム塩と組合せて適当な増感有機染料を使用するこ
とができる。
本発明の放射線硬化性オルガノポリシロキサン
組成物は、
(A) 100部の実質的に次式:
R2SiO (1)
の化学結合ジオルガノシロキシ単位よりなるシラ
ノール終端オルガノポリシロキサン、
(B) 2〜200部の次式:
(R1O)a(R2)bSi (2)
のアルコキシシラン、
(C) 0.1〜20部のa、aおよびa族元素の
オニウム塩、および
(D) 0〜20部の有機増感染料
を含有する。ここで、Rは一価の炭化水素基また
は一価のハロゲン化炭化水素基であり、R1は
C(1-12)アルキル基であり、R2はR基およびC(1-8)
グリシジルアルキル基から選択され、aは2〜4
の値を有する整数で、bは0〜2の値を有する整
数で、aとbの和は4に等しい。
式(1)および(2)のRが示す基は、例えば一価アリ
ール基および一価ハロゲン化アリール基、例えば
フエニル、キシリル、クロロフエニル、ナフチ
ル;アラルキル基、例えばベンジル、フエニルエ
チル;脂肪族基および脂環式基、例えばアルキ
ル、アルケニル、シクロアルキル、クロロアルキ
ル、具体的にはメチル、エチル、プロピル、クロ
ロプロピル、ビニル、アリル、トリフルオロプロ
ピル、シクロヘキシルなど、およびシアノエチ
ル、シアノプロピル、シアノブチルなどである。
R1が示す基は、例えばメチル、エチル、プロピ
ルなどである。
本発明を実施する際に使用するオニウム塩は
式:
〔Y〕+〔J〕- (3)
で表わされる。ここでJは非求核的対イオンで、
後で詳述する。Yは式:
〔(R3)c(R4)dD〕 (4)
の芳香族ハロニウム陽イオン、式:
〔(R3)f(R5)g(R6)hE〕 (5)
の芳香族a族陽イオン、および式:
〔(R3)j(R7)k(R8)nG〕 (6)
の芳香族a族陽イオンよりなる群から選択され
る陽イオンである。ここでR3は一価の芳香族基、
R4は二価の芳香族基、R5およびR7はアルキル、
シクロアルキルおよび置換アルキルから選択され
る一価の脂肪族基、R6およびR8は脂肪族基およ
び芳香族基から選択されEまたはGと複素環式ま
たは融合環構造を形成する多価有機基であり、D
はハロゲン基、例えばI,EはN,P,AsSbお
よびBiから選択されるa族元素、GはS,Se
およびTeから選択されるa族元素である。
cは0または2の整数、
dは0または1の整数で、cが0のときdは
1、cが2のときdは0であり、
fは0〜4に等しい整数、
gは0〜2に等しい整数、
hは0〜2に等しい整数で、f+g+hの和は
R3,R5およびR6の原子価の合計が4、即ちEの
結合価より1大きくなるような値を有し、
jは0〜3に等しい整数、
kは0〜2に等しい整数、
mは0または1の整数で、j+k+mの和は
R3、R7およびR8の原子価の合計が3、即ちGの
結合価より1大きくなるような値を有する。
R3が示す基は同一でも異なつてもよく、炭素
原子数6〜20の芳香族炭素環式または複素環式
で、これはC(1-12)アルコキシ、C(1-12)アルキル、
ニトロ、クロロなどから選択される一価の基1〜
4個で置換されていてもよい。R3は好ましくは
フエニル、クロロフエニル、ニトロフエニル、メ
トキシフエニル、ピリジルなどである。R4が示
す基は二価の基、例えば
The present invention relates to radiation curable organopolysiloxane compositions. Prior to the present invention, for example, Bruner
Room temperature vulcanizable organopolysiloxane compositions, such as those shown in US Pat. No. 3,070,555, were based on the moisture curing of mixtures of silanol-terminated polydiorganosiloxanes and acyloxysilanes. Although these moisture-curable organopolysiloxanes have been found to be useful in a variety of applications, acetic acid is evolved during curing, resulting in undesirable odors and undesirable reactions between acetic acid and various substrates. arise. No. 3,816,282 to Viventi, assigned to the present applicant, discloses that organopolysiloxanes can be radiation cured with good results using mercaptopolysiloxanes and free radical generators. ing. US Patent No. 4101513 to Fox et al.
No. 2, No. 1, No. 2, No. 1, No. 1, No. 1, No. 1, No. 1, No. 2, No. 2, No. 1, No. 2, No. 1, No. 1, No. 1, No. 2, No. 1, No. 2, No. 1, No. 2, No. 2, No. 1, No. 1, No. 2, No. 1, No. 2, and No. 2, No. 1, No. 1, No. 1, No. 1, No. 1, No. 1, No. 1, No. 1, No. 1, No. 1, and No. 1, No. 1, 2002, 2003 and 2002, 2003, and 2000, confirm that onium catalysts of groups A, A, and A are useful for the condensation of hydrolyzable silanes. The present invention provides a mixture of a, silanol-terminated polydiorganosiloxane and an alkoxysilane.
The present invention was made based on the discovery that when used in combination with an onium salt of an a or a group element, a radiation-curable organopolysiloxane composition that does not exhibit an acetic acid odor and can be cured by both ultraviolet and visible light can be obtained. Unlike the compositions of the Veventay patent, the radiation-curable organopolysiloxane compositions of the present invention are based on silanol condensation.
If visible light curing is desired, a suitable sensitizing organic dye can be used in combination with the onium salts mentioned above. The radiation-curable organopolysiloxane composition of the present invention comprises (A) 100 parts of a silanol-terminated organopolysiloxane consisting essentially of chemically bonded diorganosiloxy units of the formula: R 2 SiO (1); (B) 2 ~200 parts of an alkoxysilane of the following formula: (R 1 O) a (R 2 ) b Si (2), (C) 0.1 to 20 parts of onium salts of elements of groups a, a, and a, and (D) 0 Contains ~20 parts of organic sensitizer. Here, R is a monovalent hydrocarbon group or a monovalent halogenated hydrocarbon group, and R 1 is
C (1-12) alkyl group, R 2 is R group and C (1-8)
selected from glycidyl alkyl groups, a is 2-4
b is an integer having a value of 0 to 2, and the sum of a and b is equal to 4. The groups represented by R in formulas (1) and (2) include, for example, monovalent aryl groups and monovalent halogenated aryl groups, such as phenyl, xylyl, chlorophenyl, naphthyl; aralkyl groups, such as benzyl, phenylethyl; aliphatic groups and aliphatic groups; Cyclic groups such as alkyl, alkenyl, cycloalkyl, chloroalkyl, particularly methyl, ethyl, propyl, chloropropyl, vinyl, allyl, trifluoropropyl, cyclohexyl, and the like, and cyanoethyl, cyanopropyl, cyanobutyl, and the like.
Examples of the group represented by R 1 include methyl, ethyl, and propyl. The onium salt used in the practice of the present invention is represented by the formula: [Y] + [J] - (3). where J is a non-nucleophilic counterion,
More details later. Y is an aromatic halonium cation of the formula: [(R 3 ) c (R 4 ) d D] (4), and the formula: [(R 3 ) f (R 5 ) g (R 6 ) h E] (5) and an aromatic group A cation of the formula: [(R 3 ) j (R 7 ) k (R 8 ) n G] (6) . Here R 3 is a monovalent aromatic group,
R 4 is a divalent aromatic group, R 5 and R 7 are alkyl,
a monovalent aliphatic group selected from cycloalkyl and substituted alkyl; R 6 and R 8 are polyvalent organic groups selected from aliphatic groups and aromatic groups and forming a heterocyclic or fused ring structure with E or G; and D
is a halogen group, for example I, E are group a elements selected from N, P, AsSb and Bi, G is S, Se
and a group a element selected from Te. c is an integer of 0 or 2, d is an integer of 0 or 1, when c is 0, d is 1, when c is 2, d is 0, f is an integer equal to 0 to 4, g is 0 to An integer equal to 2, h is an integer equal to 0 to 2, and the sum of f+g+h is
have a value such that the sum of the valences of R 3 , R 5 and R 6 is 4, that is, 1 greater than the bond valence of E, j is an integer equal to 0 to 3, k is an integer equal to 0 to 2, m is an integer of 0 or 1, and the sum of j+k+m is
The total valence of R 3 , R 7 and R 8 has a value of 3, that is, 1 greater than the bond valence of G. The groups represented by R 3 may be the same or different and are aromatic carbocyclic or heterocyclic groups having 6 to 20 carbon atoms, such as C (1-12) alkoxy, C (1-12) alkyl,
A monovalent group selected from nitro, chloro, etc.
It may be replaced with four. R 3 is preferably phenyl, chlorophenyl, nitrophenyl, methoxyphenyl, pyridyl and the like. The group represented by R 4 is a divalent group, e.g.
【式】【formula】
【式】
(式中のQ′は後述する通り)であり、R5およ
びR7基はC(1-12)アルキル、例えばメチル、エチル
など、置換アルキル、例えば―C2H4OCH3、―
CH2COOC2E5,―CH2COCH3であり、R6および
R8基は次の構造式:[Formula] (Q' in the formula is as described below), and the R 5 and R 7 groups are C (1-12) alkyl, such as methyl, ethyl, substituted alkyl, such as -C 2 H 4 OCH 3 , ―
CH 2 COOC 2 E 5 , ―CH 2 COCH 3 , R 6 and
The R8 group has the following structural formula:
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】の基である。ここでQ′は―O
―,(―CH2)―o,=N−R′および―S―から選択さ
れ、nは1〜4に等しい整数であり、Zは―O
―,―S―およびIt is a group of [Formula]. where Q' is selected from -O-, ( -CH2 ) -o , =N-R' and -S-, n is an integer equal to 1 to 4, and Z is -O
-, -S- and
【式】から選択され、R′は水
素、C(1-8)アルキル、C(6-13)アリールなどから選
択される。
式(3)のJが示す非求核的対イオンはMQd陰イ
オンであり、ここでMは金属または半金属を示
し、Qはハロゲン基を示し、dは整数、例えば4
〜6の整数である。式(3)のJはそのほかに過塩素
酸基、CF3SO3 -、C6H4SO3 -などのような非求核
的対イオンも含み得る。式(3)のJはさらにハロゲ
ン対イオン、例えばCl-,Br-,F-などおよび硝
酸基、燐酸基などともなり得る。
式(3)のJに含まれる非求核的対イオンMQdの
Mが示す金属または半金属は遷移金属、例えば
Sb,Fe,Sn,Bi,Al,Ga,In,Ti,Zr,Sc,
V,Cr,Mn,Cs,希土類元素、例えばランタニ
ド類、具体的にはCd,Pr,Ndなど、アクチニド
類、具体的にはTh、Pa、U、Npなど、および
半金属、例えばB、P、Asなどである。MQdが
示す錯陰イオンは、例えばBF4 -,PF6 -,AsF6 -,
SbF6 -,FeCl4 -,SnCl6 -,SbCl6 -,BiCl5=など
である。
式(3)に含まれ式(4)の陽イオンを有するハロニウ
ム塩は、例えば次の通り。[Formula] and R' is selected from hydrogen, C (1-8) alkyl, C (6-13) aryl, etc. The non-nucleophilic counterion represented by J in formula (3) is the MQ d anion, where M represents a metal or metalloid, Q represents a halogen group, and d is an integer, e.g.
It is an integer of ~6. J in formula (3) may also include non-nucleophilic counterions such as perchlorate groups, CF 3 SO 3 - , C 6 H 4 SO 3 - , and the like. J in formula (3) can also be a halogen counterion, such as Cl − , Br − , F − , etc., and a nitrate group, a phosphate group, etc. The metal or metalloid represented by M in the non-nucleophilic counterion MQ d contained in J in formula (3) is a transition metal, e.g.
Sb, Fe, Sn, Bi, Al, Ga, In, Ti, Zr, Sc,
V, Cr, Mn, Cs, rare earth elements such as lanthanides, specifically Cd, Pr, Nd, etc., actinides, specifically Th, Pa, U, Np, etc., and metalloids such as B, P , As, etc. The complex anions represented by MQ d are, for example, BF 4 - , PF 6 - , AsF 6 - ,
SbF 6 − , FeCl 4 − , SnCl 6 − , SbCl 6 − , BiCl 5 =, etc. Examples of halonium salts included in formula (3) and having a cation of formula (4) are as follows.
【式】【formula】
【式】【formula】
【式】など。
式(3)に含まれ式(5)の陽イオンを有するa族オ
ニウム塩は、例えば次の通り。
など。
式(3)に含まれ式(6)の陽イオンを有するa族オ
ニウム塩は、例えば次の通り。
実質的に式(1)の化学結合単位よりなるシラノー
ル終端オルガノポリシロキサンには、次式:
(式中のRは前記定義の通りであり、qは約5
〜3000に等しい平均値を有する整数である)の線
状ジオルガノポリシロキサンがある。この流体は
好ましくは25℃で測定して約2000〜50000センチ
ポアズの範囲の粘度を有する。これらのシラノー
ル終端流体を製造するには、それより高分子量の
オルガノポリシロキサン、例えばジメチルポリシ
ロキサンを鉱酸または塩基触媒の存在下水で処理
してポリマーの粘度を所望範囲に調整する。式(7)
のシラノール終端ジオルガノポリシロキサンの製
造に用いるかゝる高分子量オルガノポリシロキサ
ンを形成する方法は周知である。例えば、ジオル
ガノハロシラン、具体的にはジメチルジクロロシ
ラン、ジフエニルジクロロシラン、メチルビニル
ジクロロシランなどまたはこれらの混合物を加水
分解することにより低分子量加水分解生成物を製
造することができる。この後平衡化により高分子
量オルガノポリシロキサンを得ることができる。
シクロポリシロキサン、例えばオクタメチルシク
ロテトラシロキサン、オクタフエニルシクロテト
ラシロキサンまたはこれらの混合物の平衡化によ
つても高分子量重合体を得ることができる。好ま
しくは、これらの重合体は、本出願人に譲渡され
たブート(Boot)の米国特許第3153007号に示さ
れているような標準方法により、使用前に平衡化
触媒を除去する。
1200センチポアズ以下の粘度を有するシラノー
ル終端オルガノポリシロキサンは、実質的に式(1)
の化学結合単位よりなるオルガノポリシロキサン
を加圧下スチームで処理することにより形成でき
る。シラノール終端オルガノポリシロキサンを形
成するのに使用できる他の方法はワリツク
(Warrick)の米国特許第2607792号および英国特
許第835790号に詳述されている。
式(2)のアルコキシシランには、例えばメチルト
リメトキシシラン、ジメチルジメトキシシラン、
オルト珪酸メチルエステル、オルト珪酸エチルエ
ステル、n―ブチルトリメトキシシラン、トリメ
チルメトキシシラン、メチルトリエトキシシラ
ン、フエニルトリメトキシシラン、ジフエニルジ
エトキシシラン、および高縮合物、例えばジメチ
ルテトラメトキシジシロキサン、2―グリシジル
トリメトキシシランがある。
本発明を実施するのに使用できる有機染料は、
例えばアクリジンオレンジ、アクリジンイエロ
ー、ホスフインR、ベンゾフラビン、ヘマトポル
フイリン、9,10―ジエチルアントラセン、ミヒ
ラーケトン、セトフラビンT、ペリレン、コロネ
ンなどである。
本発明の実施にあたつては、混合物の諸成分、
例えばシラノール流体、アルコキシシランおよび
オニウム塩を一緒に混合することができる。オニ
ウム塩およびシラノール終端ポリジオルガノシロ
キサン、即ち「シラノール流体」が溶液を形成し
ない場合には、オニウム塩をまず最初混合物の諸
成分に対して不活性な希釈液に溶解することがで
きる。適当な不活性希釈剤はアルコール、例えば
エタノール、酢酸エチル、エーテル、アセトニト
リルなどである。アルコキシシランはオニウム塩
より前にまたはオニウム塩と一緒にシラノール流
体に加えることができる。
可視光硬化が望ましい場合、有機染料を他の成
分に完全なまたはある程度の暗所で添加してオニ
ウム塩の早期活性化を最小限に抑える。
放射線硬化性組成物に種々の充填剤および顔
料、例えばシリカ、タルク、マイカ、二酸化チタ
ン、石こう、酸化鉄、アルミナ、木粉、ガラス繊
維、黒鉛、カーボンブラツク、フライアツシユな
どを混入することができる。充填剤の添加量は広
い範囲で変えることができる。しかし、充填剤の
種類と添加量は混合物の硬化効率に影響を与える
ので、添加量は用途による必要条件および許容し
得る硬化時間に従つて広い範囲で変わり得る。代
表的な混合物は、例えばシラノール流体100部当
り1〜30部の充填剤を含有する。
本発明の組成物は建設用シーラント、コーキン
グ剤などとして用いることができる。本発明の組
成物は無期限に保存することができる。しかし、
混合物に増感有機染料を用いる場合には、硬化性
オルガノポリシロキサン組成物を昼光から遮蔽し
てオニウム塩の活性化を最少限に抑える必要があ
る。
当業者が本発明の実施の仕方を一層よく理解で
きるように、以下に実施例を限定としてでなく、
例示として示す。「部」はすべて重量基準である。
実施例 1
粘度35000センチポアズおよびOH含量0.09%を
有するシラノール終端ポリジメチルシロキサン流
体10部、オルト珪酸エチルエステル1部およびヘ
キサフルオロ砒酸ジ(4―n―ブチルフエニル)
ヨードニウム0.3部の混合物をガラス板上に3ミ
ルの薄膜として塗布し、7インチの距離からGE
H3T7中圧水銀アーク灯を用いて照射した。20秒
の照射時間後、ゴム状薄膜を得た。
上記UV硬化性オルガノポリシロキサンに銅線
を浸漬し、被覆線を上記と同様に紫外線に照射し
た。10秒の照射後に銅線上に接着性弾性シリコー
ンゴム被覆が得られ、これは絶縁被覆として有効
であつた。
実施例 2
実施例1の手順を繰返したが、本例ではオルト
珪酸エチルエステルの代りにメチルトリエトキシ
シランを用いた。硬化性シリコーン組成物をガラ
ス板に1ミルの薄報として塗布し、実施例1と同
じ手順で7インチの距離から照射した。10秒の照
射後にゴム状架橋薄膜が得られた。同じ硬化性シ
リコーン組成物をクラフト紙に0.1ミルの薄膜と
して塗布し、上述した通りに硬化した。このクラ
フト紙には耐圧性接着剤被覆紙を恆久的に接着す
ることができなかつた。被覆は汚れが付かず、こ
すり落すことができなかつた。
実施例 3
ヘキサフルオロ砒酸ジ(4―n―ヘプチルフエ
ニル)ヨードニウム0.2g、粘度35000cpを有する
二官能価ヒドロキシル終端ポリジメチルシロキサ
ン流体10g、およびオルト珪酸メチルエステル1
gの溶液をつくつた。この混合物をアルミニウム
板上に1ミルの薄膜として被覆し、3インチの距
離からGEH3T7アーク灯で照射した。15秒の照
射で十分で、不粘着性ゴム状被膜を得た。
実施例 4
粘度47000cpを有するヒドロキシル終端ポリジ
メチルシロキサン流体1部、2―グリシジルトリ
メトキシシラン5部および次式の硫化フエニルト
リフエニルスルホニウム塩0.1部を用して重合性
混合物を製造した。
上記混合物をガラス板上の1ミルの薄膜として
1.0分間照射したところ、透明な硬質薄膜が得ら
れた。照射はGH H3T7中圧水銀アーク灯を用い
て行つた。
上記硫化フエニルトリフエニルスルホニウム塩
は次のようにして製造した。
19.6部の86%水酸化カリウム、33部のチオフエ
ノールおよび約120部のジメチルアセトアミドの
混合物をかきまぜながら温度120℃に加熱して水
を除去した。約6.5部の水を回収したところで、
この混合物に26.3部のp―ジブロモベンゼンを加
え、得られる混合物を加熱還流した。6時間還流
後、反応混合物を放冷し、300部の水を加えた。
褐色の固体が得られ、これを過し、水で数回洗
つた。次に生成物を乾燥した。この製造方法によ
れば34.7部の1,4―ジチオフエノキシベンゼン
が得られた。
7.35部の上記二硫化物、11.75部のヘキサフル
オロ砒酸ジフエニルヨードニウムおよび0.2部の
安息香酸銅の混合物を120℃に3時間加熱した。
得られた反応混合物を約50部のジエチルエーテル
で数回洗い、残つた固体を95%エタノールから再
結晶した。収率45%で非常に明るい褐色の結晶生
成物が得られ、これは融点69〜75゜を有し、元素
分折値は次の通りであつた。
計算値 C51.3 %、H3.50%、S11.43%
実測値 C51.21%、H3.59%、S11.37%
製造方法に基づいて次式:
のトリアリールスルホニウム塩が得られた。
実施例 5
実施例4の反応混合物に0.02部のペリレンを増
感剤として添加した。この混合物をガラス板上に
被覆し、このガラス板に別のガラス板を重ねてガ
ラス―ガラス接合を形成した。GE EBR375W
写真用可視光フラツドランプを用いてガラスを通
して混合物を1.5分間照射したところ、永久的接
着が得られた。
実施例 6
4部のエチルトリメトキシシランに1部の
47000センチポアズのヒドロキシル終端ポリジメ
チルシロキサンおよび0.1部のヘキサフルオロア
ンチモン酸ジドデシルフエニルヨードニウムを加
えた。この溶液をアルミニウム板上に2ミルの薄
膜として被覆し、6インチの距離からGEH3T7
中圧水銀アーク灯で照射した。1分間の連続照射
後に薄膜は透明な硬質薄膜に硬化した。
実施例 7
実施例6の溶液に0.01部のペリレンを加え、上
述と同様にアルミニウム板上に薄膜を被覆した。
GE EBR374W 写真用フラツドランプを用いて
薄膜を可視光で照射した。4インチの距離で上記
ランプを用いることにより、1分間の照射で透明
な硬質薄膜が生成した。
実施例 8
実施例6の手順を繰返したが、本例では光開始
剤を次式:
の塩に代えた。不粘着性硬質被膜を得るのに1.5
分の硬化時間を要した。
上記実施例は本発明の範囲内に包含される多数
の放射線硬化性シリコーン組成物の数例に関する
だけであるが、本発明は式(1)の単位を有するシラ
ノール終端ポリジオルガノシロキサン、式(2)のア
ルコキシシラン、前述した通りの芳香族オニウム
塩および所望に応じて有機増感染料を含有するも
つと広い種類のシリコーン組成物を包含すること
を理解すべきである。[Formula] etc. Examples of group a onium salts included in formula (3) and having a cation of formula (5) are as follows. Such. Examples of group a onium salts included in formula (3) and having a cation of formula (6) are as follows. A silanol-terminated organopolysiloxane consisting essentially of chemical bonding units of formula (1) has the following formula: (R in the formula is as defined above, q is about 5
There are linear diorganopolysiloxanes with average values equal to ~3000). The fluid preferably has a viscosity in the range of about 2000 to 50000 centipoise measured at 25°C. These silanol-terminated fluids are prepared by treating higher molecular weight organopolysiloxanes, such as dimethylpolysiloxane, with water in the presence of mineral acids or basic catalysts to adjust the viscosity of the polymer to the desired range. Formula (7)
Methods for forming such high molecular weight organopolysiloxanes for use in preparing silanol-terminated diorganopolysiloxanes are well known. For example, a low molecular weight hydrolysis product can be produced by hydrolyzing a diorganohalosilane, specifically dimethyldichlorosilane, diphenyldichlorosilane, methylvinyldichlorosilane, etc. or a mixture thereof. After this, a high molecular weight organopolysiloxane can be obtained by equilibration.
High molecular weight polymers can also be obtained by equilibration of cyclopolysiloxanes such as octamethylcyclotetrasiloxane, octaphenylcyclotetrasiloxane or mixtures thereof. Preferably, these polymers are stripped of equilibrated catalyst prior to use by standard methods such as those set forth in commonly assigned US Pat. No. 3,153,007 to Boot. A silanol-terminated organopolysiloxane having a viscosity of 1200 centipoise or less is substantially of the formula (1)
It can be formed by treating an organopolysiloxane consisting of chemically bonded units with steam under pressure. Other methods that can be used to form silanol-terminated organopolysiloxanes are detailed in Warrick, US Pat. No. 2,607,792 and British Patent No. 835,790. Examples of the alkoxysilane of formula (2) include methyltrimethoxysilane, dimethyldimethoxysilane,
Orthosilicate methyl ester, orthosilicate ethyl ester, n-butyltrimethoxysilane, trimethylmethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, diphenyldiethoxysilane, and high condensates such as dimethyltetramethoxydisiloxane, There is 2-glycidyltrimethoxysilane. Organic dyes that can be used in the practice of this invention include:
Examples include acridine orange, acridine yellow, phosphine R, benzoflavin, hematoporphyrin, 9,10-diethylanthracene, Michler's ketone, setoflavin T, perylene, and coronene. In practicing the present invention, the components of the mixture,
For example, a silanol fluid, an alkoxysilane, and an onium salt can be mixed together. If the onium salt and the silanol-terminated polydiorganosiloxane, or "silanol fluid," do not form a solution, the onium salt can first be dissolved in a diluent that is inert to the components of the mixture. Suitable inert diluents are alcohols such as ethanol, ethyl acetate, ether, acetonitrile and the like. The alkoxysilane can be added to the silanol fluid before or with the onium salt. If visible light curing is desired, the organic dye is added to the other ingredients in complete or partial darkness to minimize premature activation of the onium salt. Various fillers and pigments can be incorporated into the radiation curable compositions, such as silica, talc, mica, titanium dioxide, gypsum, iron oxide, alumina, wood flour, glass fibers, graphite, carbon black, fly ash, and the like. The amount of filler added can vary within wide limits. However, since the type and amount of filler added affects the curing efficiency of the mixture, the amount added can vary within a wide range according to application requirements and acceptable curing times. Typical mixtures contain, for example, 1 to 30 parts of filler per 100 parts of silanol fluid. The composition of the present invention can be used as a construction sealant, caulking agent, and the like. Compositions of the invention can be stored indefinitely. but,
If a sensitizing organic dye is used in the mixture, it is necessary to shield the curable organopolysiloxane composition from daylight to minimize activation of the onium salt. In order that those skilled in the art may better understand how to carry out the invention, the following examples are provided, but not as a limitation.
Shown as an example. All parts are by weight. Example 1 10 parts of a silanol-terminated polydimethylsiloxane fluid having a viscosity of 35000 centipoise and an OH content of 0.09%, 1 part of orthosilicate ethyl ester, and di(4-n-butylphenyl hexafluoroarsenate).
A mixture of 0.3 parts of iodonium was applied as a 3 mil thin film on a glass plate and GE was applied from a distance of 7 inches.
Irradiation was performed using a H3T7 medium pressure mercury arc lamp. After an irradiation time of 20 seconds, a rubbery thin film was obtained. A copper wire was immersed in the UV-curable organopolysiloxane, and the covered wire was irradiated with ultraviolet light in the same manner as above. After 10 seconds of irradiation, an adhesive elastic silicone rubber coating was obtained on the copper wire, which was effective as an insulating coating. Example 2 The procedure of Example 1 was repeated, but in this example methyltriethoxysilane was used instead of orthosilicate ethyl ester. The curable silicone composition was applied to a glass plate as a 1 mil thin film and irradiated using the same procedure as in Example 1 from a distance of 7 inches. A rubbery crosslinked thin film was obtained after 10 seconds of irradiation. The same curable silicone composition was applied as a 0.1 mil thin film to Kraft paper and cured as described above. It was not possible to permanently adhere pressure-resistant adhesive coated paper to this kraft paper. The coating did not stain and could not be rubbed off. Example 3 0.2 g of di(4-n-heptylphenyl)iodonium hexafluoroarsenate, 10 g of difunctional hydroxyl-terminated polydimethylsiloxane fluid having a viscosity of 35000 cp, and orthosilicate methyl ester 1
A solution of g was prepared. This mixture was coated as a 1 mil thin film on an aluminum plate and illuminated with a GEH3T7 arc lamp from a 3 inch distance. A 15 second irradiation was sufficient to obtain a tack-free, rubbery coating. Example 4 A polymerizable mixture was prepared using 1 part of a hydroxyl-terminated polydimethylsiloxane fluid having a viscosity of 47,000 cp, 5 parts of 2-glycidyltrimethoxysilane, and 0.1 part of a sulfurized phenyltriphenylsulfonium salt of the formula: The above mixture was applied as a 1 mil thin film on a glass plate.
After irradiation for 1.0 minutes, a transparent hard thin film was obtained. Irradiation was performed using a GH H3T7 medium pressure mercury arc lamp. The above sulfurized phenyltriphenylsulfonium salt was produced as follows. A mixture of 19.6 parts of 86% potassium hydroxide, 33 parts of thiophenol and about 120 parts of dimethylacetamide was heated to a temperature of 120° C. with stirring to remove water. After collecting about 6.5 parts of water,
26.3 parts of p-dibromobenzene was added to this mixture, and the resulting mixture was heated to reflux. After refluxing for 6 hours, the reaction mixture was allowed to cool and 300 parts of water were added.
A brown solid was obtained which was filtered and washed several times with water. The product was then dried. According to this production method, 34.7 parts of 1,4-dithiophenoxybenzene was obtained. A mixture of 7.35 parts of the above disulfide, 11.75 parts of diphenyliodonium hexafluoroarsenate and 0.2 parts of copper benzoate was heated to 120 DEG C. for 3 hours.
The resulting reaction mixture was washed several times with about 50 parts of diethyl ether, and the remaining solid was recrystallized from 95% ethanol. A very light brown crystalline product was obtained with a yield of 45%, which had a melting point of 69-75° and the elemental analysis values were as follows: Calculated values C51.3%, H3.50%, S11.43% Actual values C51.21%, H3.59%, S11.37% Based on the manufacturing method, the following formula: A triarylsulfonium salt of was obtained. Example 5 To the reaction mixture of Example 4, 0.02 part of perylene was added as a sensitizer. This mixture was coated onto a glass plate, which was then stacked with another glass plate to form a glass-to-glass bond. GE EBR375W
A permanent bond was obtained by irradiating the mixture through the glass for 1.5 minutes using a photographic visible light flood lamp. Example 6 4 parts ethyltrimethoxysilane to 1 part
47,000 centipoise of hydroxyl terminated polydimethylsiloxane and 0.1 part of didodecylphenyliodonium hexafluoroantimonate were added. This solution was coated as a 2 mil thin film on an aluminum plate and the GEH3T7 was coated from a 6 inch distance.
Irradiation was performed using a medium pressure mercury arc lamp. After continuous irradiation for 1 minute, the thin film was cured into a transparent hard film. Example 7 0.01 part of perylene was added to the solution of Example 6, and a thin film was coated on an aluminum plate in the same manner as described above.
The thin film was irradiated with visible light using a GE EBR374W photographic flat lamp. Using the above lamp at a distance of 4 inches, a clear hard film was produced after 1 minute of irradiation. Example 8 The procedure of Example 6 was repeated, but in this example the photoinitiator was of the following formula: I replaced it with salt. 1.5 to obtain a non-stick hard coating
It took several minutes of curing time. Although the above examples relate only to a few of the many radiation-curable silicone compositions encompassed within the scope of the present invention, the present invention includes silanol-terminated polydiorganosiloxanes having units of formula (1), It is to be understood that a wide variety of silicone compositions are encompassed which contain alkoxysilanes, aromatic onium salts as described above, and optionally organic sensitizers.
Claims (1)
の粘度を有し実質的に次式: R2SiO (式中のRは一価の炭化水素基および一価の
ハロゲン化炭化水素基から選択される)のジオ
ルガノシロキシ単位よりなるシラノール終端オ
ルガノポリシロキサン100部、 (B) 次式: (R1O)a(R2)bSi (式中のR1はC(1-12)アルキル基から選択さ
れ、R2は前記R基およびC(1-8)グリシジルアル
キル基から選択され、aは1〜4に等しい整数
で、bは0〜2に等しい整数で、a+bの和は
4に等しい)のアルコキシシラン2〜200部、 (C) a,aまたはa族元素のオニウム塩
0.1〜20部、および (D) 有機増感染料0〜20部 を含有する、湿分の不存在下において放射線下に
硬化しうるオルガノポリシロキサン組成物。 2 前記シラノール終端ポリジオルガノシロキサ
ンがシラノール終端ポリジメチルシロキサンがシ
ラノール終端ポリジメチルシロキサンである特許
請求の範囲第1項記載の組成物。 3 前記アルコキシシランがオルト珪酸エチルエ
ステルである特許請求の範囲第1項記載の組成
物。 4 前記オニウム塩がヘキサフルオロ砒酸ジ(4
―n―ブチルフエニル)ヨードニウムである特許
請求の範囲第1項記載の組成物。 5 前記オニウム塩が である特許請求の範囲第1項記載の組成物。 6 前記オニウム塩が である特許請求の範囲第1項記載の組成物。 7 前記オニウム塩が である特許請求の範囲第1項記載の組成物。 8 前記染料がペリレンである特許請求の範囲第
1項記載の組成物。 9 前記染料がミヒラーケトンである特許請求の
範囲第1項記載の組成物。[Scope of Claims] 1 (A) has a viscosity in the range of 2,000 to 50,000 centipoise at 25°C and is substantially of the following formula: R 2 SiO (wherein R is a monovalent hydrocarbon group and a monovalent halogen); ( B ) 100 parts of a silanol - terminated organopolysiloxane consisting of diorganosiloxy units selected from hydrogenated hydrocarbon groups; (1-12) alkyl group, R 2 is selected from the above R group and C (1-8) glycidyl alkyl group, a is an integer equal to 1 to 4, and b is an integer equal to 0 to 2. , the sum of a+b equals 4), (C) an onium salt of a, a or group a element;
and (D) 0 to 20 parts of an organic sensitizer. 2. The composition of claim 1, wherein the silanol-terminated polydiorganosiloxane is a silanol-terminated polydimethylsiloxane. 3. The composition according to claim 1, wherein the alkoxysilane is orthosilicate ethyl ester. 4 The onium salt is hexafluoroarsenic acid di(4
-n-butylphenyl) iodonium. 5 The onium salt is The composition according to claim 1. 6 The onium salt is The composition according to claim 1. 7 The onium salt is The composition according to claim 1. 8. The composition of claim 1, wherein the dye is perylene. 9. The composition of claim 1, wherein the dye is Michler's ketone.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10739979A | 1979-12-26 | 1979-12-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56106958A JPS56106958A (en) | 1981-08-25 |
JPS6359423B2 true JPS6359423B2 (en) | 1988-11-18 |
Family
ID=22316460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18216180A Granted JPS56106958A (en) | 1979-12-26 | 1980-12-24 | Polysiloxane composition |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS56106958A (en) |
AU (1) | AU6583880A (en) |
DE (1) | DE3048636A1 (en) |
FR (1) | FR2472592B1 (en) |
GB (1) | GB2066278B (en) |
ZA (1) | ZA807425B (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0047299A4 (en) * | 1980-03-11 | 1982-07-20 | Gen Electric | Ultraviolet light, cationic curable hard coating compositions of polysiloxanes. |
JPS6037549A (en) * | 1983-08-10 | 1985-02-26 | Fuji Photo Film Co Ltd | Photosolubilizable composition |
JPS60186570A (en) * | 1984-03-07 | 1985-09-24 | Nippon Soda Co Ltd | Composition for coating |
US4689289A (en) * | 1986-04-30 | 1987-08-25 | General Electric Company | Block polymer compositions |
DE3629762A1 (en) * | 1986-09-02 | 1988-03-03 | Wacker Chemie Gmbh | PIGMENTED MASSES CROSSLINKABLE TO ORGANOPOLYSILOXANELASTOMERS |
NL8800748A (en) * | 1988-03-25 | 1989-10-16 | Stamicarbon | COMPOSITION CONTAINING ULTRAVIOLET LIGHT-CURABLE UNSATURATED MONOMERS AND / OR OLIGOMERS, A PHOTO INITIATOR AND COLLOIDAL SILICA WITH AN ORGANOSILANE COMPOUND AND THE USE OF THIS COMPOSITION IN COATINGS. |
DE4024661C1 (en) * | 1990-08-03 | 1992-04-02 | Th. Goldschmidt Ag, 4300 Essen, De | Tris:tri:fluoromethane:sulphonated complexes - prepd. by mixing boron tri:fluoro:methanesulphonate with onium salt in organic solvent |
KR960003291B1 (en) * | 1991-12-30 | 1996-03-08 | 주식회사엘지화학 | Photo cure silicon coating composition |
DE69815073T3 (en) * | 1997-03-14 | 2008-07-03 | Minnesota Mining And Manufacturing Co., St. Paul | ON-REQUEST HARDENING OF MOISTURE-REPRODUCTIVE COMPOSITIONS WITH REACTIVE FUNCTIONAL SILANE GROUPS |
JP5590374B2 (en) * | 2009-09-15 | 2014-09-17 | 三菱レイヨン株式会社 | Active energy ray-curable composition, cured film forming method and laminate |
CN110770289B (en) * | 2017-06-29 | 2022-09-02 | 陶氏环球技术有限责任公司 | Polyolefin compositions |
EP3597694B1 (en) * | 2018-07-17 | 2023-10-11 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix |
CN109486004B (en) * | 2018-11-06 | 2021-06-29 | 万华化学(宁波)有限公司 | High-dielectric polypropylene three-phase composite material and preparation method and application thereof |
WO2021064534A2 (en) | 2019-10-03 | 2021-04-08 | 3M Innovative Properties Company | Silicone elastomers by free radical mediated cure |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5397098A (en) * | 1977-02-02 | 1978-08-24 | Minnesota Mining & Mfg | Storageestable anhydrous polymer compound and condensation of hydrolyzable silane |
JPS5494599A (en) * | 1977-12-16 | 1979-07-26 | Gen Electric | Thermosetting resin composition |
-
1980
- 1980-11-27 ZA ZA00807425A patent/ZA807425B/en unknown
- 1980-12-04 GB GB8038899A patent/GB2066278B/en not_active Expired
- 1980-12-23 DE DE19803048636 patent/DE3048636A1/en active Granted
- 1980-12-24 AU AU65838/80A patent/AU6583880A/en not_active Abandoned
- 1980-12-24 JP JP18216180A patent/JPS56106958A/en active Granted
- 1980-12-24 FR FR8027500A patent/FR2472592B1/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5397098A (en) * | 1977-02-02 | 1978-08-24 | Minnesota Mining & Mfg | Storageestable anhydrous polymer compound and condensation of hydrolyzable silane |
JPS5494599A (en) * | 1977-12-16 | 1979-07-26 | Gen Electric | Thermosetting resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS56106958A (en) | 1981-08-25 |
AU6583880A (en) | 1981-07-02 |
DE3048636C2 (en) | 1989-04-20 |
FR2472592B1 (en) | 1985-11-22 |
FR2472592A1 (en) | 1981-07-03 |
GB2066278A (en) | 1981-07-08 |
ZA807425B (en) | 1982-02-24 |
DE3048636A1 (en) | 1981-09-17 |
GB2066278B (en) | 1984-10-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5629095A (en) | Radiation curable compositions containing vinyl ether functional polysiloxanes and methods for the preparation | |
JP3499032B2 (en) | Radiation curable composition, curing method and pattern forming method | |
EP0542484B1 (en) | Organosilicon compounds and compositions containing them | |
US5331020A (en) | Organosilicon compounds and compositions containing them | |
US4943613A (en) | Photocurable organopolysiloxane composition | |
JPS6359423B2 (en) | ||
US5824761A (en) | Radiation curable compositions containing vinyl ether functionality and methods for their preparation | |
US4735971A (en) | Room temperature-curable organopolysiloxane composition | |
EP0332400B1 (en) | Photocurable organopolysiloxane composition | |
JPH0236134B2 (en) | ||
JPS5825380B2 (en) | Polysiloxane mixtures that can be crosslinked under atmospheric pressure conditions | |
JPS62141065A (en) | Curable organopolysiloxane composition | |
EP0246651A2 (en) | Curable organopolysiloxane compositions | |
US4223122A (en) | Moisture curable organopolysiloxanes | |
US5049611A (en) | Silacyclobutane functional polymers and their production | |
JPH0617435B2 (en) | UV curable organopolysiloxane composition | |
JPH04311765A (en) | Curable organopolysiloxane composition | |
US4337348A (en) | Benzoin group-containing cyclic organopolysiloxanes and a method for the preparation thereof | |
JP2739222B2 (en) | Organopolysiloxane for curing high energy rays and method for producing the same | |
US4176112A (en) | Moisture curable alkoxy organopolysiloxanes | |
US4176111A (en) | Moisture curable organopolysiloxanes | |
EP0542485B1 (en) | Radiation curable compositions | |
JPS6224017B2 (en) | ||
JPH07224133A (en) | Ultraviolet curing silicone resin composition | |
JP3541075B2 (en) | Method for producing polymethylsiloxane resin |