JPS6058238A - Cleaning method utilizing ultraviolet ray - Google Patents

Abstract

PURPOSE:To make it possible to simultaneously and certainly clean both surfaces of an object to be washed, by forming the support jig of the object to be cleaned irradiated with ultraviolet rays from a material pervious to ultraviolet rays. CONSTITUTION:An ultraviolet lamps 4 with mirrors 5 are provided to the upper and lower parts of the irradiation chamber 3 in the irradiation box 2 mounted in an apparatus case 1 to irradiate the center of the chamber 3 and the upper and under surfaces of the box 2 is cooled by fixed cooling water paths 6. A large number of objects to be cleaned, for example, a quartz vibrators 7 are arranged on a support jig 8 made of quartz and supported at the central part of the chamber 3. O2-containing gas is supplied to the chamber 3 through the sucking orifice 9 of the box 2 to exhaust internal gas from an exhaust orifice 10 along with a contaminant. When the lamps 4 are lighted, both upper and lower surfaces of the vibrators 7 are irradiated with ultraviolet rays and nascent oxygen is formed in the vicinity of said vibrators 7 to decompose a contaminant but, because the support jig 8 is pervious to ultraviolet rays, rays from the lamps 4 are not blocked by said support jig 8. Therefore, the surfaces of the vibrators 7 are uniformly irradiated to be uniformly cleaned.

Description

[Detailed description of the invention] The present invention relates to a cleaning method using ultraviolet rays.

Ozone generated by ultraviolet rays is used to decompose and clean pollutants, but this
For example, low-pressure water, a line lighting a silver rung, is emitted to the outside, and as a result, 185 nm ultraviolet light is emitted, as well as a small amount of other wavelengths.

Then, ozone is generated by ultraviolet light with a wavelength of 185 nm, and then this ozone is decomposed by a wavelength of 254 nm to generate oxygen, which is a generating group, and this oxygen, which is a generating group, decomposes organic pollutants and scatters them in the form of scum. It is known.

This ultraviolet cleaning method can be applied to various objects to be cleaned.
One of them is a crystal oscillator. Crystal resonators use their resonant frequencies to determine time standards, and are used in a variety of musical pieces, but if the surface of the crystal resonator becomes contaminated, the resonant frequencies will be distorted. Therefore, the surface must be 7R clean, but high cleanliness can be obtained by cleaning with ultraviolet rays, and the adhesion of the gold film deposited in the subsequent process can be improved.

By the way, in the past, the object to be cleaned was wire mesh, stainless steel, or manual cleaning.
5-1- was also supported by an old holder, which was damaged due to the large size of the L'' lamp. C1 installed on the top of the irradiation chamber
There is no particular problem when cleaning only the upper surface of the object to be cleaned. However, when it is necessary to clean both sides of the object to be cleaned, if the ultraviolet lamp is installed only on the top of the irradiation chamber, it is necessary to clean the negative side and then turn over and clean the other side. However, there are problems in that the operation is complicated, the cleaning time is long, and one side that has been cleaned becomes contaminated again due to contaminants on the other side during the reversing operation. Therefore, it is conceivable to install ultraviolet lamps on both the upper and lower sides of the irradiation chamber or on both the left and right sides of the irradiation chamber and irradiate both sides of the object to be cleaned at the same time, but in this case, if the support is made of a material that does not transmit ultraviolet rays, Regardless of the shape of the support, a certain part of the object to be cleaned is blocked by the support and is not completely irradiated with ultraviolet rays, resulting in incomplete cleaning of that part.

Therefore, an object of the present invention is to provide an ultraviolet cleaning method that can reliably clean both sides of an object to be cleaned, and its configuration is as follows:
This is an ultraviolet cleaning method in which ozone is generated by the light of an ultraviolet lamp, and organic contaminants adhering to the surface of the object to be cleaned are decomposed and cleaned by the generated oxygen generated by the decomposition of this ozone. The method is characterized in that it includes a step of irradiating ultraviolet rays onto an object to be cleaned supported on a support such as a sexual substance.

An embodiment of the present invention will be specifically described below based on the drawings.

FIG. 1 shows a cross-sectional view of a device used in an embodiment of the present invention.A device box 1 has an irradiation box 2 built into it, forming a double structure to prevent generated ozone from leaking outside. ing. The inside of the irradiation box 2 is an irradiation chamber 6;
Two U-shaped 650W high-output low-pressure mercury lamps are disposed above and below as ultraviolet lamps 4, respectively. Mirrors 5 are arranged behind the upper and lower ultraviolet lamps 4, and the light from the ultraviolet lamps 4 enters the irradiation chamber 5 from both the upper and lower sides.
is irradiated towards the center of the Cooling channels 6 are fixed to the upper and lower surfaces of the irradiation box 2 for cooling. The objects to be cleaned 7 are crystal oscillators with a diameter of about 7 mm, and are arranged in large numbers on a support 8 and supported in the center of the irradiation chamber 6.The support 8 is made of quartz glass, and a second As shown in the figure, a hole 8a corresponding to the size of the crystal resonator is drilled, and the crystal resonator is supported by claws 8b at the periphery of the hole. The material of the support 8 is not limited to quartz glass, but may also include sapphire, Teflon,
Any material may be used as long as it has the property of transmitting ultraviolet rays, such as LiF, MgF, etc., and the shape is not limited to that shown in the figure, and may be simply plate-shaped. A suction hole 9 is placed on the side of the irradiation box 2 and supplies gas containing oxygen to the irradiation chamber 5.
Then, the gas inside is discharged into the atmosphere after being processed in an exhaust hole 10 discharging chamber along with decomposed pollutants.

When the ultraviolet lamp 4 is turned on, the upper and lower surfaces of the crystal resonator are irradiated with ultraviolet rays, but since oxygen-containing gas is supplied to the irradiation chamber 6, the oxygen generating group is generated near the upper and lower surfaces. This decomposes the contaminants, but since the support 8 is made of quartz glass covered with an ultraviolet-transparent material, the light from the ultraviolet lamp 4 is not blocked by it and is transmitted onto the surface of the crystal resonator. It is evenly irradiated and cleaned evenly. Therefore, the cleanliness is improved, the resonant frequency becomes more accurate, and the adhesion of the metal film to be vapor-deposited in a subsequent step is also increased.

If the object to be cleaned Z itself is transparent to ultraviolet rays, the sixth
As shown in Figures to Figure 6, 1k1 in horizontal or inclined condition.
They may be supported by supports 8 made of an ultraviolet-transparent material with one space between them, or they may be arranged vertically and supported.

In these cases as well, ultraviolet rays are
Hand + 7-? b hd channel a lk 7 to IIH1
t, f'X can be cleaned uniformly.

As explained above, the ultraviolet cleaning method of the present invention includes the step of irradiating the object to be cleaned supported by a support such as an ultraviolet-transparent material, so that the ultraviolet rays are not blocked by the support. Since the irradiation is uniform, according to the present invention,
It is possible to provide an ultraviolet cleaning method that can reliably clean both sides of an object to be cleaned.

[Brief explanation of the drawing]

Figure 1 is a sectional view of the device used in the embodiment of the present invention, Figure 2 is a perspective view of the main parts of the support, Figure 6 is a front view showing how the object to be cleaned is supported, and Figure 4 is the same. A plan view, FIG. 5 is a front view showing another support mode, and FIG. 6 is a plan view. 1... Equipment box 2... Irradiation box 5... Irradiation chamber 4.
...Ultraviolet lamp 5...Mirror 6...Cooling channel 7...Object to be cleaned (crystal oscillator) 8...Support 9.
...Suction hole 10...Exhaust hole

Claims (1)

[Claims] This is an ultraviolet cleaning method in which ozone is generated using ultraviolet light, and organic contaminants adhering to the surface of the object to be cleaned are decomposed and cleaned by the generated radical oxygen generated by the decomposition of this ozone. An ultraviolet cleaning method comprising the step of irradiating an object to be cleaned supported by a support made of a synthetic substance with ultraviolet rays.