JPS5923436Y2 - Photoelectric conversion device - Google Patents

Photoelectric conversion device

Info

Publication number
JPS5923436Y2
JPS5923436Y2 JP9583983U JP9583983U JPS5923436Y2 JP S5923436 Y2 JPS5923436 Y2 JP S5923436Y2 JP 9583983 U JP9583983 U JP 9583983U JP 9583983 U JP9583983 U JP 9583983U JP S5923436 Y2 JPS5923436 Y2 JP S5923436Y2
Authority
JP
Japan
Prior art keywords
light
refractive index
layer
light receiving
transparent substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9583983U
Other languages
Japanese (ja)
Other versions
JPS5950449U (en
Inventor
一三 小宮
Original Assignee
日本電信電話株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電信電話株式会社 filed Critical 日本電信電話株式会社
Priority to JP9583983U priority Critical patent/JPS5923436Y2/en
Publication of JPS5950449U publication Critical patent/JPS5950449U/en
Application granted granted Critical
Publication of JPS5923436Y2 publication Critical patent/JPS5923436Y2/en
Expired legal-status Critical Current

Links

Landscapes

  • Mechanical Optical Scanning Systems (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Facsimile Heads (AREA)

Description

【考案の詳細な説明】 この考案は、ファクシミリ等の読み取り系に用いる原稿
と1:1に対応する大きさの充電変換装置に関するもの
である。
[Detailed Description of the Invention] This invention relates to a charging conversion device whose size corresponds 1:1 to a document used in a reading system of a facsimile machine or the like.

従来、ファクシミリ等の送信原稿の読み取り系について
は、第1図に示すように送信原稿1をけい光灯等の照明
光源2で均一に照明し、その反射光をレンズ3によって
充電変換装置4に結像させて時系列の電気信号を得てい
た。
Conventionally, in a reading system for a transmission document such as a facsimile machine, as shown in FIG. They formed an image to obtain time-series electrical signals.

この場合、充電変換装置4は、MOSあるいはCCD等
のIC技術によって製造された20mm程度のチップサ
イズであるため、送信原稿1としてA 4 (= 20
0 mm x 290mm)を用いると、レンズの縮率
は1/10程度となり、送信原稿1から光電変換装置4
までの距離は相当大きく、そのため装置が大形化する欠
点があった。
In this case, since the charging conversion device 4 has a chip size of about 20 mm manufactured by IC technology such as MOS or CCD, the transmission document 1 is A 4 (= 20 mm).
0 mm x 290 mm), the reduction ratio of the lens is about 1/10, and the distance from the transmission document 1 to the photoelectric conversion device 4 is
The distance to the center is quite long, which has the disadvantage of making the device large.

この欠点を解決するため、送信原稿1と1:1に対応す
る大形の充電変換装置が提案されている。
In order to solve this drawback, a large-sized charging conversion device that corresponds to the transmission original 1 on a 1:1 basis has been proposed.

この光電変換装置は、第2図に示すように、透明基板5
上に受光素子6の列を蒸着あるいはフォトレジスト技術
により形威し、その上部に透明保護層7を設けたもので
ある。
This photoelectric conversion device has a transparent substrate 5 as shown in FIG.
A row of light-receiving elements 6 is formed on the top by vapor deposition or photoresist technology, and a transparent protective layer 7 is provided on top of the array.

透明基板5の下方におかれた照明光源(図示せず)から
の光束8は、透明基板5、受光素子6同志の間隙、透明
保護層7を通って送信原稿1を照明し、その反射光を受
光素子6で捕え光電変換するものであるが、透明保護層
7は送信原稿1との摩擦に対する強度、安定性、あるい
は照明光束を効率よく導入する点からある程度の厚さを
有することが必要である。
A light beam 8 from an illumination light source (not shown) placed below the transparent substrate 5 passes through the transparent substrate 5, the gap between the light-receiving elements 6, and the transparent protective layer 7, and illuminates the transmission original 1, and the reflected light is captured by the light-receiving element 6 and photoelectrically converted. However, the transparent protective layer 7 needs to have a certain thickness from the viewpoint of strength and stability against friction with the transmission document 1, or from the point of view of efficiently introducing the illumination light flux. It is.

このため送信原稿1から受光素子6までの厚さのため十
分に密着させることが不可能で、透明保護層7が一種の
導光路となり、反射光が拡散伝達して隣接する受光素子
6へ到達し、分解能が低下する欠点があった。
For this reason, due to the thickness of the transmission document 1 to the light receiving element 6, it is impossible to achieve sufficient contact, and the transparent protective layer 7 becomes a kind of light guide path, and the reflected light is diffused and transmitted to reach the adjacent light receiving element 6. However, it had the disadvantage of lower resolution.

この考案は上記の欠点を除去するため、受光素子と送信
原稿の中間に厚み方向に屈折率分布が変化する導光層を
設けたものである。
In order to eliminate the above-mentioned drawbacks, this invention provides a light guiding layer whose refractive index distribution changes in the thickness direction between the light receiving element and the transmission document.

以下、この考案について詳細に説明する。This idea will be explained in detail below.

第3図はこの考案の一実施例を示す主走査方向の部分正
断面図であり、その要点は透明保護層の上部に厚み方向
に変化する屈曲率分布をもつ導光層を設けたことである
FIG. 3 is a partial front cross-sectional view in the main scanning direction showing an embodiment of this invention. be.

第3図で、1は送信原稿、5はガラス板等の透明基板、
6はCdS 、 Se等の受光素子、7は透明保護層、
8は照明光束、9は屈折率分布をもつ導光層で、透明な
高屈折率層10と透明または不透明な低屈折率層11と
からなっている。
In Fig. 3, 1 is a transmission original, 5 is a transparent substrate such as a glass plate,
6 is a light receiving element such as CdS or Se, 7 is a transparent protective layer,
8 is an illumination light flux, and 9 is a light guide layer having a refractive index distribution, which is composed of a transparent high refractive index layer 10 and a transparent or opaque low refractive index layer 11.

製造に際しては、透明基板5上に蒸着、ホトレジスト技
術により受光素子6の列を形成し、さらに受光素子6の
列を透明保護層7で被覆し、その上部に導光層9をその
各高屈折率層10が各受光素子6を対向するようにして
形成する。
During manufacturing, a row of light-receiving elements 6 is formed on a transparent substrate 5 by vapor deposition and photoresist technology, the row of light-receiving elements 6 is further covered with a transparent protective layer 7, and a light-guiding layer 9 is placed on top of the transparent protective layer 7. The index layer 10 is formed so that each light receiving element 6 faces each other.

なお、第3図では各受光素子6の電極、配線は省略され
ている。
In addition, in FIG. 3, the electrodes and wiring of each light receiving element 6 are omitted.

第4図は上記実施例の動作説明のための部分拡大断面図
である。
FIG. 4 is a partially enlarged sectional view for explaining the operation of the above embodiment.

以下これによって動作を説明する。The operation will be explained below.

照明光束8は照明光源(図示せず)から発せられる光束
の一部であるが、透明基板5、受光素子6同志間の間隙
、透明保護層7、導光層9を通して送信原稿1を照明す
る。
The illumination light flux 8 is a part of the light flux emitted from an illumination light source (not shown), and illuminates the transmission document 1 through the transparent substrate 5, the gap between the light receiving elements 6, the transparent protective layer 7, and the light guide layer 9. .

照明された送信原稿1からの反射光は送信原稿1から四
方、人力に拡散放射されるが、大部分は直近の受光素子
6に捕獲され、光電変換される。
The reflected light from the illuminated transmission document 1 is diffusely radiated from the transmission document 1 in all directions, but most of it is captured by the nearest light receiving element 6 and photoelectrically converted.

拡散放射される光束のうち反射角の大きい光束は導光層
9の高屈折率層10を伝搬し、隣接する受光素子6へ向
うが、途中にある低屈折率層11で全反射され、本体の
受光素子6に捕獲される。
Of the diffusely emitted light fluxes, the light fluxes with large reflection angles propagate through the high refractive index layer 10 of the light guide layer 9 and head towards the adjacent light receiving element 6, but are totally reflected by the low refractive index layer 11 in the middle, and are reflected by the main body. is captured by the light receiving element 6.

したがって、隣接する受光素子6へ洩れる妨害光が極め
て小さくなり、高分解能が確保される。
Therefore, the interference light leaking to the adjacent light receiving element 6 becomes extremely small, and high resolution is ensured.

上記の場合、導光層9は、例えば、プラスチック材料の
光重合等の手段により1枚のプラスチックシートに一括
して製作することができる。
In the above case, the light guide layer 9 can be manufactured all at once into one plastic sheet by, for example, photopolymerization of a plastic material.

この実施例では、送信原稿1からの反射光が低屈折率層
11で効率的に全反射−されるため、さらに高分解能化
が期待できる。
In this embodiment, the reflected light from the transmission document 1 is efficiently totally reflected by the low refractive index layer 11, so that even higher resolution can be expected.

なお、副走査方向(受光素子の配列方向と直角方向)に
対しても拡散防止用の低屈折率層11が設けられている
が、主走査方向(受光素子の配列方向)はど分解能に対
する寄与は小さいと考えられるので、これは省略するこ
とも可能である。
Note that the low refractive index layer 11 for preventing diffusion is also provided in the sub-scanning direction (direction perpendicular to the direction in which the light-receiving elements are arranged), but the contribution to resolution in the main-scanning direction (the direction in which the light-receiving elements are arranged) is Since is considered to be small, this can be omitted.

また、上記各実施例では、導光層9と透明保護層7を別
構成としたが、導光層9自体が透明保護層7を兼ねても
よく、その場合にはより簡易な構成となる。
Further, in each of the above embodiments, the light guide layer 9 and the transparent protective layer 7 are configured separately, but the light guide layer 9 itself may also serve as the transparent protective layer 7, and in that case, the configuration becomes simpler. .

以上説明したように、この考案は送信原稿と受光素子と
の中間に厚み方向に低屈折率層の巾が変化する屈折率分
布をもつ導光層を設けたので、隣接する受光素子へ洩れ
る光束を防ぐことができ、分解能の低下をなくすことが
できる。
As explained above, in this invention, a light guide layer with a refractive index distribution in which the width of the low refractive index layer changes in the thickness direction is provided between the transmission document and the light receiving element, so that the light flux leaks to the adjacent light receiving element. can be prevented, and a decrease in resolution can be eliminated.

さらに、使用するファクシミリ装置を小形化、簡易化で
きる利点を有する。
Furthermore, it has the advantage that the facsimile machine used can be made smaller and simpler.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のファクシミリ等の送信原稿の読み取り系
の斜視図、第2図は従来の充電変換装置の部分断面図、
第3図、第4図はこの考案の一実施例を示す充電変換装
置の部分正断面図およびその拡大図である。 図中、1は送信原稿、5は透明基板、6は受光素子、7
は透明保護膜、8は照明光束、9は導光層、10は高屈
折率層、11は低屈折率層である。
Fig. 1 is a perspective view of a conventional transmission document reading system such as a facsimile machine, and Fig. 2 is a partial sectional view of a conventional charging conversion device.
FIGS. 3 and 4 are a partial front sectional view and an enlarged view of a charging conversion device showing an embodiment of this invention. In the figure, 1 is a transmission original, 5 is a transparent substrate, 6 is a light receiving element, and 7
8 is a transparent protective film, 8 is an illumination light flux, 9 is a light guide layer, 10 is a high refractive index layer, and 11 is a low refractive index layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 透明基板上に形威した受光素子の列の上部にこれらの受
光素子を保護する透明保護層を形成し、この透明保護層
の上部に前記各受光素子を囲むように配置された低屈折
率層とそれ以外の部分を高屈折率層とした屈折率分布を
もつ導光層を設け、透面基板下部に設置した照明光源よ
り透明基板を通して原稿を照明し、反射光を受光素子に
導く光電変換装置において、前記低屈折率層を導光層の
厚み方向に上面から次第に薄くなるようにしたことを特
徴とする充電変換装置。
A transparent protective layer for protecting these light receiving elements is formed on top of the row of light receiving elements formed on a transparent substrate, and a low refractive index layer is arranged on top of this transparent protective layer so as to surround each of the light receiving elements. A light guide layer with a refractive index distribution is provided, and the rest is a high refractive index layer, and the original is illuminated through the transparent substrate from an illumination light source installed at the bottom of the transparent substrate, and the reflected light is guided to the light receiving element for photoelectric conversion. A charge conversion device characterized in that the low refractive index layer becomes gradually thinner from the upper surface in the thickness direction of the light guide layer.
JP9583983U 1983-06-23 1983-06-23 Photoelectric conversion device Expired JPS5923436Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9583983U JPS5923436Y2 (en) 1983-06-23 1983-06-23 Photoelectric conversion device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9583983U JPS5923436Y2 (en) 1983-06-23 1983-06-23 Photoelectric conversion device

Publications (2)

Publication Number Publication Date
JPS5950449U JPS5950449U (en) 1984-04-03
JPS5923436Y2 true JPS5923436Y2 (en) 1984-07-12

Family

ID=30228683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9583983U Expired JPS5923436Y2 (en) 1983-06-23 1983-06-23 Photoelectric conversion device

Country Status (1)

Country Link
JP (1) JPS5923436Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11047732B2 (en) * 2017-07-28 2021-06-29 Pioneer Corporation Electromagnetic wave detection device

Also Published As

Publication number Publication date
JPS5950449U (en) 1984-04-03

Similar Documents

Publication Publication Date Title
JP3093244B2 (en) Photoelectric conversion device with improved illumination system and information processing device equipped with the device
US4446364A (en) Photoelectric converter on a transmissive substrate having light shielding
JP3180043B2 (en) Image input device
JPS5923436Y2 (en) Photoelectric conversion device
JPS5846067B2 (en) Photoelectric conversion device
JPS5846181B2 (en) Close-contact image sensor
US5144458A (en) Total contact type image sensor
JPS6276357A (en) Solid-state image pickup device
JPS5846182B2 (en) Photoelectric conversion device
JPS5814073B2 (en) Photoelectric conversion device
JPH0710088B2 (en) Image reader
JPH0617323Y2 (en) Full contact image sensor
JPH0328109B2 (en)
JPS58173960A (en) Reader of original
JP3018560B2 (en) Image sensor
JPH02105773A (en) Picture reader
JPH03291049A (en) Close contact type image sensor
JPH02131068A (en) Read scanning unit
JPS61135272A (en) Linear image sensor
JPS62209849A (en) Contact type image sensor
JPS62142461A (en) Solid-state image pickup device
JPS63288560A (en) Contact type image sensor
JPS62262563A (en) Contact type image sensor
JPH0441863B2 (en)
JPH0461546A (en) Image sensor