JPS58134664A - Exposing method for photoreceptor - Google Patents
Exposing method for photoreceptorInfo
- Publication number
- JPS58134664A JPS58134664A JP1704382A JP1704382A JPS58134664A JP S58134664 A JPS58134664 A JP S58134664A JP 1704382 A JP1704382 A JP 1704382A JP 1704382 A JP1704382 A JP 1704382A JP S58134664 A JPS58134664 A JP S58134664A
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- slit
- photoreceptor
- light
- exposing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Or Original Feeding In Electrophotography (AREA)
- Variable Magnification In Projection-Type Copying Machines (AREA)
- Optical Systems Of Projection Type Copiers (AREA)
Abstract
Description
【発明の詳細な説明】 この発明は、感光体露光方法に関する。[Detailed description of the invention] The present invention relates to a photoreceptor exposure method.
出願人は先に、感光体露光方法として、定置された原稿
を、可動部を含む露光光学系でスリット走査し、原稿の
スリット状光像を、定方向へ移動する感光体上へ投影し
、投影位置を、装置空間において、感光体の移動方向と
逆方向へ移動させつつ、感光体をスリット露光する方式
のものを提案した(特願昭56−84182号)。The applicant previously proposed a photoreceptor exposure method in which a stationary original is scanned by a slit using an exposure optical system including a movable part, and a slit-shaped optical image of the original is projected onto a photoreceptor that moves in a specific direction. A method was proposed in which the photoreceptor was exposed to slit light while the projection position was moved in the opposite direction to the moving direction of the photoreceptor in the apparatus space (Japanese Patent Application No. 84182/1982).
本発明に、このような露光方式を改良した感光体露光方
法に係るものであるので、以下にまず、上記露光方式を
簡単に説明する。Since the present invention relates to a photoreceptor exposure method that is an improved exposure method, the above exposure method will first be briefly explained below.
第1図において、符号0は定置された原稿、符号1はレ
ンズ、符号2tri感光体、符号3にランプをそnぞn
示している。感光体2ば、シート状もしくは、ベルト状
で矢印方向、すなわち図面上、左方へ一足の速さで送行
する。In Fig. 1, 0 is a document placed in a fixed position, 1 is a lens, 2tri photoreceptor, and 3 is a lamp.
It shows. The photoreceptor 2 is in the form of a sheet or a belt and is fed in the direction of the arrow, that is, to the left in the drawing, at a speed of one foot.
レンズ1とランプ3に、露光光学系であって、この例で
は、いず几も可動である。すなわち、こ几らば、そnぞ
几、実線にて示す態位と破線で示す態位の間で往復動可
能であり、感光体2をスリット露光する際VCは、実線
で示づ一態位から破線で示す態位へと定速で移動し、露
元が終了すると実線で示す態位へと復帰する。A lens 1 and a lamp 3 constitute an exposure optical system, both of which are movable in this example. That is, the robot can reciprocate between the position shown by the solid line and the position shown by the broken line, and when exposing the photoreceptor 2 to slit exposure, the VC is in the one position shown by the solid line. The robot moves at a constant speed from the position shown by the broken line to the position shown by the broken line, and when the dew point ends, returns to the position shown by the solid line.
感光体2のスリット露光が開始されるとき、ランプ3と
レンズ1とは実線の態位にあり一原稿O側の、スリット
走査開始部A点の画像は、A′点に結像する。このA′
点を露光開始位置という。スリット露光が完了するとき
、ランプ3、レンズlfl破線で示す位置を占め、スリ
ット走査終了位置B点の画像に、B′点に結像する。こ
のB′点を露光終了位置という。この露光方式の特徴ぼ
、スリット露光の開始位置と終了位置とが分離しており
、開始位置A′点が、感光体2の移動方向に関し下流側
に、終了位置B′が上流側にあって、スリット露光中、
原稿0のスリット状光像の投影位置が、開始位置A′か
ら終了位置B′へ同って、すなわち、感光体の移動方向
と逆方向へ等速で移動する点にある。When the slit exposure of the photoreceptor 2 is started, the lamp 3 and the lens 1 are in the position shown by the solid line, and the image at point A at the slit scanning start portion on the side of one document O is focused on point A'. This A'
This point is called the exposure start position. When the slit exposure is completed, the lamp 3 and the lens lfl occupy the position shown by the broken line, and an image is formed at point B' in the image of point B at the slit scanning end position. This point B' is called the exposure end position. The feature of this exposure method is that the start position and end position of slit exposure are separated, and the start position A' is on the downstream side with respect to the moving direction of the photoreceptor 2, and the end position B' is on the upstream side. , during slit exposure,
The projection position of the slit-shaped optical image of document 0 is at the point where it moves from the start position A' to the end position B' at the same speed, that is, in the opposite direction to the moving direction of the photoreceptor.
今、スリット走査長を図の如くl、露光開始位置A′と
終了位置B′との間の距離をL、露元の倍率をmとする
と、スリット露光時における、ランプ3の速さを汐とす
るとき、レンズlの速さ苑、感光体2の速さ汐Sが
であ几ば、上記の如きスリット露光が行なろnる。Now, if the slit scanning length is l as shown in the figure, the distance between the exposure start position A' and the end position B' is L, and the magnification of the exposure source is m, then the speed of the lamp 3 during slit exposure is If the speed of the lens 1 and the speed S of the photoreceptor 2 are satisfied, slit exposure as described above can be performed.
スリット露光が終了した時点で、形成された潜像の後端
部がB′点にあるから、この後端部が、A′点に進行す
るまでの間に、ランプ3、レンズ1を実線の位置まで復
帰させておけば、上記潜像の後端につづけてただちに新
たなスリット露光を行なうことができ、感光体2に、間
隔をおかずに、次々に潜像を形成することができる。At the end of the slit exposure, the rear end of the formed latent image is at point B', so until the rear end advances to point A', the lamp 3 and lens 1 are moved along the solid line. If the latent image is returned to the position, a new slit exposure can be performed immediately following the rear end of the latent image, and latent images can be formed one after another on the photoreceptor 2 without any interval.
ところで、哀、リット露光を行なう場合、一般に、′1
1゜
迷光をカットしたり、さらには、露光光量を結像部で均
一化するために、スリット状の開口部を有する遮光板で
、露光調整が行なわ几る03−
第1図の如き露光方式の場合、このような露光調整を行
々うとすれは、遮光板4を第2図に示す如く、原稿走査
部に設ける方法か、あるいは、遮光板5を、感光体露光
部に設ける方法が考えらnる。しかし、遮光板4を用い
るにせよ遮光板5を用いるにせよ、こnらを可動とし、
スリット走査あるいにスリット露光に同期して移動式せ
ねばならず、そのための駆動装置が必要となり装置の複
雑化を招来する。By the way, when performing lit exposure, generally '1
In order to cut 1° stray light and furthermore to equalize the amount of exposure light at the imaging section, exposure adjustment is performed using a light-shielding plate with a slit-shaped opening.03- Exposure method as shown in Figure 1 In this case, if you want to perform such exposure adjustment, you can either install a light shielding plate 4 in the document scanning section as shown in FIG. Ran. However, regardless of whether the light shielding plate 4 or the light shielding plate 5 is used, these are movable,
It must be movable in synchronization with slit scanning or slit exposure, and a driving device for that purpose is required, leading to complexity of the device.
そこで、本発明の目的に、このように装置を複雑化する
ことなく、上記露光調整すなわち露光光量の均一化のた
めの露光量調整および迷光の遮光を可能とした感光体露
光方法を提供することである。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a photoreceptor exposure method that enables the above-mentioned exposure adjustment, that is, exposure amount adjustment for uniformizing the exposure light amount and shielding of stray light, without complicating the apparatus. It is.
以下、本発明を説明する。The present invention will be explained below.
本発明の露光方法は、N元号式とじてに上述のもの、す
なわち、足置された原稿を、可動部を含む露光光学系で
スリット走査し、原稿のスリット状光像を、足方向へ移
動する感光体上へ投影し、投影位置を、装置空間におい
て、感光体の移動刃4−
向と逆方向へ移動させて、感光体をスリット露光すると
いう方式である。The exposure method of the present invention is the same as that described above for the N era method. In other words, an original placed on a foot is scanned by a slit using an exposure optical system including a movable part, and a slit-shaped optical image of the original is directed toward the foot. In this method, the image is projected onto a moving photoreceptor, and the projection position is moved in the apparatus space in a direction opposite to the direction of the moving blade 4 of the photoreceptor, thereby exposing the photoreceptor to slits.
本発明の特徴に、主として、遮光部材を配備する位置の
選択にある。The main feature of the present invention lies in the selection of the position where the light shielding member is placed.
すなわち、露光調整を行うべく、スリット状の開口部を
有する遮光部材に、スリット露光中を連通じて、露光光
束によって不変的に占めら几る位置の近傍に設けらnる
。That is, in order to adjust the exposure, a light shielding member having a slit-shaped opening is provided in communication with the slit during exposure and in the vicinity of a position that is permanently occupied by the exposure light flux.
以下、具体的な実施例に即して説明する。Hereinafter, description will be given based on specific examples.
第3図に、第1図に示す露光態様に対して、本発明を適
用した例を示している。FIG. 3 shows an example in which the present invention is applied to the exposure mode shown in FIG. 1.
露光の際のスリット走査開始位置A点からの露光光束と
、スリット走査終了位置B点からの露光光束とが交叉す
る位置、すなわち第3図のP点は。The position where the exposure light beam from the slit scan start position point A and the exposure light beam from the slit scan end position B point intersect during exposure, ie, point P in FIG.
うたがいもなく、スリット露光中を通じて、露光光束に
より不変的に占めらnる位置である。This is the position that is unchangeably occupied by the exposure light flux throughout the slit exposure.
このP点の近傍に遮光部材6を配備して、迷光のカット
等、露光調整を行なえば、定位置で、容易に露光調整を
行い、適正な感光体露光を行なうことができる。By disposing a light shielding member 6 near this point P to perform exposure adjustment such as cutting off stray light, it is possible to easily perform exposure adjustment at a fixed position and properly expose the photoreceptor.
第4図に、別の露光態様に本発明を適用した例を示して
いる。FIG. 4 shows an example in which the present invention is applied to another exposure mode.
繁雑を避けるべく、混同のお−F:れのないものについ
てに、第1図におけると同一の符号を用いである。この
露光態様でにレンズ1%ラー7.8.9。In order to avoid confusion, the same reference numerals as in FIG. 1 are used for the confusion. In this exposure mode, the lens has a 1% color of 7.8.9.
10が図示されないランプとともに露光光学系を構成し
ており、上記ランプ、ミラー7.8,9.10fi、露
光光学系の可動部をなしている。10 constitutes an exposure optical system together with a lamp (not shown), and the lamp, mirrors 7.8, 9.10fi, and movable parts of the exposure optical system are constituted.
感光体2のスリット露″X、は−ミラー7.8,9.1
0を実線で示す態位から、破線で示す態位へと定速で移
動させて行なわ几る。ランプ(図示されず)の移動はミ
ラー7と一体的に行なわnる。The slit exposure of the photoreceptor 2 is ``X'', which is the mirror 7.8, 9.1.
This is done by moving at a constant speed from the position shown by the solid line to the position shown by the broken line. The lamp (not shown) is moved integrally with the mirror 7.
この露光態位において、ミラー8と9との、実線で示す
位置の間は、露光中を通じて、露光光束により不変的に
占めら几る位置である。そこで、このような位置の近傍
に、遮光部材6を設けることにより、定位置で露光調整
を□行なうことがでさるQ
もっとも、露光光束によって不変的に占めらnる位置は
、露光の倍率が変化す扛ば、そnとともに変わるもので
ある。従って、露光倍率の切換が可能である場合は、倍
率の切換に応じて、遮光部材6の位置を変えることに、
いうまでもない。In this exposure position, the position between the mirrors 8 and 9 shown by the solid line is a position that is unchangeably occupied by the exposure light flux throughout the exposure. Therefore, by providing a light shielding member 6 near such a position, it is possible to adjust the exposure at a fixed position. If something changes, it will change with time. Therefore, when switching the exposure magnification is possible, changing the position of the light shielding member 6 according to the switching of the magnification,
Needless to say.
−4に、レンズ1には、コサイン4乗則があるから、ス
リット露光の場合、原稿側を、スリット状に照明すると
き、スリット長手方向に均一に照明しても、露光部にお
ける照度に、スリット長手刀向(第3図、第4図で図面
に直交する方向)で均一とならず、上記長手方向両端部
側で照度が、中央部に比して低くなってしまう。このよ
うな場合に、感光体の露光量を、スリット長手方向で均
一化するには、第4図の如き露光態様の場合なら、第5
図に示す如く、遮光部材6の形状を長手方向両端部で開
口部6Aの幅が犬きくなっているようにして一迷光のカ
ットと露光調整とを行なえば良い。-4, since the lens 1 has a cosine fourth power law, in the case of slit exposure, when illuminating the document side in a slit shape, even if the illumination is uniform in the longitudinal direction of the slit, the illuminance at the exposed part will vary. The illuminance is not uniform in the longitudinal direction of the slit (the direction perpendicular to the drawings in FIGS. 3 and 4), and the illuminance is lower at both ends in the longitudinal direction than at the center. In such a case, in order to make the exposure amount of the photoreceptor uniform in the longitudinal direction of the slit, if the exposure mode is as shown in FIG.
As shown in the figure, the shape of the light shielding member 6 may be such that the width of the opening 6A is widened at both ends in the longitudinal direction to cut off stray light and adjust exposure.
さらに、調整を細かく行なうのであ九ば、第6)
如き一対の遮光板61.62を遮光部材として第7図″
11
の如く配備し、ワイヤー等により、そ几ぞ几を連系的に
、またに独立的に左右方向へ移動させて、スリットの開
口部の大きさを調整するようにすれ7−
ばより。Furthermore, since the adjustments are made in detail, a pair of light shielding plates 61 and 62 as shown in Figure 6) are used as light shielding members in Figure 7''.
11, and the size of the opening of the slit can be adjusted by moving the slits in the left and right directions either interconnected or independently using wires or the like.
第1図の如き露光態様の場合は、第8図に示すように、
レンズ1へ入射する光束の角度θが一露光中に連続的に
変化する。この角度θの変化も、露光量の不均一を、感
光体2の進行方向にもたらしうる。In the case of the exposure mode as shown in Fig. 1, as shown in Fig. 8,
The angle θ of the light beam incident on the lens 1 changes continuously during one exposure. This change in angle θ can also cause non-uniform exposure in the direction in which the photoreceptor 2 travels.
そこで、このような露光計の不均一を除去すΣ1Kに、
例えば第9図の如く、一対の遮光板61’、62’のそ
nぞnを軸63、64に装備して軸63.64のまわり
に揺動可能とした遮光部材6″を用い、こnf:第10
図に示す如く用い、露光光束のレンズ1への入射角θ(
第8図)の変化に応じて、遮光部材61′。Therefore, Σ1K is used to remove such non-uniformity of the exposure meter.
For example, as shown in FIG. 9, a light shielding member 6'' is used in which a pair of light shielding plates 61' and 62' are mounted on shafts 63 and 64 so that they can swing around the shafts 63 and 64. nf: 10th
As shown in the figure, the incident angle θ(
According to the change in FIG. 8), the light shielding member 61'.
62′を揺動的に変位させて、開口部の大きさを変化さ
せることにより、露光調整を行なうようにすnばよい。Exposure adjustment may be performed by oscillatingly displacing 62' and changing the size of the opening.
第1図、第2図に、本発明により改良さるべき感光体露
光方式を説明するための図、第3図に、本発明の1実施
例を示す正面図的説明図、第4図は、本発明の別実施例
を示す正面図的説明図、第8−
5図乃至第1O図は露光量調整を説明するための図、0
・・・足置された原稿、l・・・レンズ、2・・・感光
体6.6/、6//・・・遮光部材、61、62、61
’、62’・・・遮光板、7,8゜9.10・・・ミラ
ー01 and 2 are diagrams for explaining the photoreceptor exposure method to be improved by the present invention, FIG. 3 is a front view explanatory diagram showing one embodiment of the present invention, and FIG. Front view explanatory diagrams showing another embodiment of the present invention, FIGS. 8-5 to 1O are diagrams for explaining exposure amount adjustment,
...Original placed on foot, l...Lens, 2...Photoreceptor 6.6/, 6//...Light blocking member, 61, 62, 61
', 62'... Light shielding plate, 7, 8° 9.10... Mirror 0
Claims (1)
ット走査し、上記原稿のスリット状光像を、定方向へ移
動する感光体上へ投影し、投影位置を、装置空間におい
て、感光体の移動方向と逆方向へ移動させつつ、感光体
をスリット露光する方法において、 スリット露光中を通じて、露九元束によって不変的に占
めらnる位置の近傍に、スリット状の開口部を有する遮
光部材を設け、 この遮光部材によって、感光体の露元量の調整及び迷光
の遮光を行なうことを特徴とする、感光体露光方法。 2、特許請求の範囲第1項において・ 遮光部材の位置が可変であって、露光倍率の切換に応じ
て、その位置を変位させることを特徴とする、感光体露
光方法。 3、特許請求の範囲第1項または第2項において、遮光
部材における開口部の大きさが可変であることを特徴と
する、感光体露光方法。[Claims] 1. A fixed original is scanned by a slit using an exposure element system including a movable part, and a slit-shaped optical image of the original is projected onto a photoreceptor that moves in a fixed direction. In a method of exposing a photoconductor to slit exposure while moving the position in the device space in the opposite direction to the direction of movement of the photoconductor, the method of exposing the photoconductor to a slit in the vicinity of the position invariably occupied by the nine-element bundle of exposure throughout the slit exposure. A method for exposing a photoreceptor, comprising: providing a light-shielding member having a slit-shaped opening; and adjusting the exposure amount of the photoreceptor and blocking stray light with the light-shielding member. 2. In claim 1: A method for exposing a photoconductor, characterized in that the position of the light shielding member is variable, and the position is displaced in accordance with switching of exposure magnification. 3. A method for exposing a photoreceptor according to claim 1 or 2, characterized in that the size of the opening in the light shielding member is variable.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1704382A JPS58134664A (en) | 1982-02-05 | 1982-02-05 | Exposing method for photoreceptor |
DE19833303283 DE3303283A1 (en) | 1982-02-01 | 1983-02-01 | Photoexposure system |
US06/763,760 US4717939A (en) | 1982-02-01 | 1985-08-07 | Slit-scanning type image exposing system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1704382A JPS58134664A (en) | 1982-02-05 | 1982-02-05 | Exposing method for photoreceptor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58134664A true JPS58134664A (en) | 1983-08-10 |
Family
ID=11932962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1704382A Pending JPS58134664A (en) | 1982-02-01 | 1982-02-05 | Exposing method for photoreceptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58134664A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6055325A (en) * | 1983-09-06 | 1985-03-30 | Ricoh Co Ltd | Correcting device of uneven illuminance in variable magnification copying machine |
JPS61144U (en) * | 1984-06-06 | 1986-01-06 | コニカ株式会社 | Copy machine variable magnification exposure device |
JPS61109042A (en) * | 1984-11-01 | 1986-05-27 | Mita Ind Co Ltd | Correcting mechanism for exposure quantity of copying machine |
US5049936A (en) * | 1990-01-02 | 1991-09-17 | Eastman Kodak Company | Electrophotographic copier/duplicator having dual imaging apparatus |
-
1982
- 1982-02-05 JP JP1704382A patent/JPS58134664A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6055325A (en) * | 1983-09-06 | 1985-03-30 | Ricoh Co Ltd | Correcting device of uneven illuminance in variable magnification copying machine |
JPS61144U (en) * | 1984-06-06 | 1986-01-06 | コニカ株式会社 | Copy machine variable magnification exposure device |
JPH0410602Y2 (en) * | 1984-06-06 | 1992-03-16 | ||
JPS61109042A (en) * | 1984-11-01 | 1986-05-27 | Mita Ind Co Ltd | Correcting mechanism for exposure quantity of copying machine |
US5049936A (en) * | 1990-01-02 | 1991-09-17 | Eastman Kodak Company | Electrophotographic copier/duplicator having dual imaging apparatus |
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