JPS572309A - Methyl methacrylate polymer - Google Patents

Methyl methacrylate polymer

Info

Publication number
JPS572309A
JPS572309A JP7582780A JP7582780A JPS572309A JP S572309 A JPS572309 A JP S572309A JP 7582780 A JP7582780 A JP 7582780A JP 7582780 A JP7582780 A JP 7582780A JP S572309 A JPS572309 A JP S572309A
Authority
JP
Japan
Prior art keywords
methyl methacrylate
comonomer
polymer
transfer agent
chain transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7582780A
Other languages
Japanese (ja)
Inventor
Teruhiko Sugimori
Takayuki Tajiri
Tomihiko Kawamura
Masaya Sueki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP7582780A priority Critical patent/JPS572309A/en
Publication of JPS572309A publication Critical patent/JPS572309A/en
Pending legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: The titled polymer of high purity, obtained by polymerizing methyl methacrylate without using a chain transfer agent, and suitable for a resist resin having improved resolving power.
CONSTITUTION: A monomer (mixture) consisting of methyl methacrylate and a comonomer, e.g. acrylic acid, at a weight ratio betwen the methyl methacrylate and the comonomer of 100W70/0W30 is polymerized in a polar solvent, e.g. dimethylformamide, without using a chain transfer agent to give a polymer having a weight- average molecular weight of 300,000W800,000, a dispersity ≤4 and preferably a decomposition ratio by the X-ray irradiation ≥0.0001.
COPYRIGHT: (C)1982,JPO&Japio
JP7582780A 1980-06-05 1980-06-05 Methyl methacrylate polymer Pending JPS572309A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7582780A JPS572309A (en) 1980-06-05 1980-06-05 Methyl methacrylate polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7582780A JPS572309A (en) 1980-06-05 1980-06-05 Methyl methacrylate polymer

Publications (1)

Publication Number Publication Date
JPS572309A true JPS572309A (en) 1982-01-07

Family

ID=13587403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7582780A Pending JPS572309A (en) 1980-06-05 1980-06-05 Methyl methacrylate polymer

Country Status (1)

Country Link
JP (1) JPS572309A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5955122A (en) * 1982-09-22 1984-03-30 山陽国策パルプ株式会社 Promotion of propagation of mushroom mycelium and generationof fruit body
JPS62241905A (en) * 1986-04-14 1987-10-22 Kyowa Gas Chem Ind Co Ltd Novel production process for methacrylic polymer
JP2014136706A (en) * 2013-01-15 2014-07-28 Hitachi Chemical Co Ltd Resin composition, production method of resin composition, resist composition containing resin composition, and pattern forming method using resist composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5955122A (en) * 1982-09-22 1984-03-30 山陽国策パルプ株式会社 Promotion of propagation of mushroom mycelium and generationof fruit body
JPS62241905A (en) * 1986-04-14 1987-10-22 Kyowa Gas Chem Ind Co Ltd Novel production process for methacrylic polymer
JP2014136706A (en) * 2013-01-15 2014-07-28 Hitachi Chemical Co Ltd Resin composition, production method of resin composition, resist composition containing resin composition, and pattern forming method using resist composition

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