JPS57117569A - Photosetting coating composition - Google Patents

Photosetting coating composition

Info

Publication number
JPS57117569A
JPS57117569A JP402881A JP402881A JPS57117569A JP S57117569 A JPS57117569 A JP S57117569A JP 402881 A JP402881 A JP 402881A JP 402881 A JP402881 A JP 402881A JP S57117569 A JPS57117569 A JP S57117569A
Authority
JP
Japan
Prior art keywords
resin
photosetting
phosphoric ester
organic phosphoric
oligomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP402881A
Other languages
Japanese (ja)
Inventor
Shuji Nishimura
Shizuo Noda
Toshio Sugimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Petrochemical Co Ltd
Original Assignee
Mitsubishi Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Petrochemical Co Ltd filed Critical Mitsubishi Petrochemical Co Ltd
Priority to JP402881A priority Critical patent/JPS57117569A/en
Publication of JPS57117569A publication Critical patent/JPS57117569A/en
Pending legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

PURPOSE: The titled composition that is prepared by adding an organic phosphoric ester having acryloyl groups and a polybutyral resin to a photosetting oligomer or resin, thus showing high weathering and saline resistances.
CONSTITUTION: The objective composition comprises (A) an organic phosphoric ester of formulaIhaving acryloyl group (R1 is H, methyl; R2 is H, 1W10C alkyl; l is 1W10; m,n ≥1 where m+n is 3) such as 2-hydroxyethyl acryloylphosphate, (B) an acrylic oligomer, resin of formula II or III, a photosetting resin other than acrylic resins or a vinyl compound containing a reaction diluent, (C) a polyvinyl butyral (of 200W2,000 polymerization degree, made by modifying PVA with butyraldehyde), (D) a photosensitizer such as benzoin, when necessary, a photosentizing auxiliary agent is added, where A:B:C:D: is preferably (0.5W20): 100:(1W30):0.01W15wt.
COPYRIGHT: (C)1982,JPO&Japio
JP402881A 1981-01-14 1981-01-14 Photosetting coating composition Pending JPS57117569A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP402881A JPS57117569A (en) 1981-01-14 1981-01-14 Photosetting coating composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP402881A JPS57117569A (en) 1981-01-14 1981-01-14 Photosetting coating composition

Publications (1)

Publication Number Publication Date
JPS57117569A true JPS57117569A (en) 1982-07-22

Family

ID=11573500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP402881A Pending JPS57117569A (en) 1981-01-14 1981-01-14 Photosetting coating composition

Country Status (1)

Country Link
JP (1) JPS57117569A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59207913A (en) * 1983-05-09 1984-11-26 ダブリユ・ア−ル・グレイス　アンド　カンパニ− Reactive plastisol dispersion composition
JPS6210103A (en) * 1985-07-05 1987-01-19 Nippon Synthetic Chem Ind Co Ltd:The Curable resin composition
US5069929A (en) * 1984-09-19 1991-12-03 Sumitomo Metal Industries, Ltd. Actinic radiation-curable rust-preventive coating compositions for steel products
JP2008189850A (en) * 2007-02-06 2008-08-21 Fujifilm Corp Ink composition for inkjet recording and method for inkjet recording

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59207913A (en) * 1983-05-09 1984-11-26 ダブリユ・ア−ル・グレイス　アンド　カンパニ− Reactive plastisol dispersion composition
US5069929A (en) * 1984-09-19 1991-12-03 Sumitomo Metal Industries, Ltd. Actinic radiation-curable rust-preventive coating compositions for steel products
JPS6210103A (en) * 1985-07-05 1987-01-19 Nippon Synthetic Chem Ind Co Ltd:The Curable resin composition
JP2008189850A (en) * 2007-02-06 2008-08-21 Fujifilm Corp Ink composition for inkjet recording and method for inkjet recording

Similar Documents

Publication Publication Date Title
JPS5513747A (en) Copolymer for lenses of high refractive index
JPS55142045A (en) Methacrylic resin material having excellent solar radiation absorptivity, and its preparation
JPS56135526A (en) Coating composition and resin molded product prepared therefrom
CA2009458A1 (en) Radiation curable acrylate polyesters
JPS57117569A (en) Photosetting coating composition
JPS5611920A (en) Polymerizable composition
JPS5787409A (en) Photo-setting resin composition
JPS5653119A (en) Curable resin composition
JPS53146733A (en) Coating composition of polyvinyl butyral/vinyl resins
JPS57100171A (en) Adhesive composition
JPS5650941A (en) Covering resin composition
JPS57180618A (en) Photocurable resin composition
JPS5536230A (en) Antifouling coating compound
JPS57165422A (en) Urethane prepolymer
EP0355032A3 (en) An elastic paint composition
GB1535625A (en) Hydantoin diacrylate compounds
JPS5584307A (en) Preparation of curing composition
JPS5575407A (en) Preparation of high molecular organotin compound
JPS5558275A (en) Pressure-sensitive adhesive composition
JPS55116763A (en) Coating composition having excellent weathering characteristic
JPS5534250A (en) Adhesive composition
JPS57170963A (en) Photosetting coating composition
JPS562313A (en) Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same
IE40442B1 (en) Olefinically-unsaturated organic polymers
JPS56155214A (en) Thermosetting resin composition