JPS56161641A - Exposure apparatus to electron beam - Google Patents

Exposure apparatus to electron beam

Info

Publication number
JPS56161641A
JPS56161641A JP6481880A JP6481880A JPS56161641A JP S56161641 A JPS56161641 A JP S56161641A JP 6481880 A JP6481880 A JP 6481880A JP 6481880 A JP6481880 A JP 6481880A JP S56161641 A JPS56161641 A JP S56161641A
Authority
JP
Japan
Prior art keywords
sample current
value
blanking
deltai
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6481880A
Other languages
Japanese (ja)
Other versions
JPH027173B2 (en
Inventor
Akio Ito
Seigo Igaki
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6481880A priority Critical patent/JPS56161641A/en
Publication of JPS56161641A publication Critical patent/JPS56161641A/en
Publication of JPH027173B2 publication Critical patent/JPH027173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten the adjustment period and prevent the beam shift at the blanking by automatically controlling the exciting currents of lens so as to make a sample current at a specified value, in a device provided with a lens system, a current detector and a blanking deflector. CONSTITUTION:A controlling device 14 controls the exciting currents C1, C2 in the electronic lenses 3, 4 to make the sample current at the prescribed value I. If the adjustment of the sample current is required, the value of I is set in a setter 13, the electron beams are flowed to detect the currents actually flowing with a Faraday cage 11 and the difference DELTAI from the I is calculated by a compartor 15. Power sources 6, 7 are controlled by a circuit 16 so as to turn the DELTAI to O. Since the I is a function of the C1 and C2, the relation of the I(C1, C2) and a shift amount S at the blanking is measured in advance to be stored in a memory 17, and the combination of C1, C2 making the S minimum when the I being set up is adapted to be indicated in the circuit 16, thereby enabling the sample current value to readily to adjust and a turbulence of a pattern by the beam shift to be prevented.
JP6481880A 1980-05-16 1980-05-16 Exposure apparatus to electron beam Granted JPS56161641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6481880A JPS56161641A (en) 1980-05-16 1980-05-16 Exposure apparatus to electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6481880A JPS56161641A (en) 1980-05-16 1980-05-16 Exposure apparatus to electron beam

Publications (2)

Publication Number Publication Date
JPS56161641A true JPS56161641A (en) 1981-12-12
JPH027173B2 JPH027173B2 (en) 1990-02-15

Family

ID=13269203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6481880A Granted JPS56161641A (en) 1980-05-16 1980-05-16 Exposure apparatus to electron beam

Country Status (1)

Country Link
JP (1) JPS56161641A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58145122A (en) * 1982-02-23 1983-08-29 Jeol Ltd Electron beam exposure device
JPS6124231A (en) * 1984-07-13 1986-02-01 Hitachi Ltd Electron beam patterning device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632655A (en) * 1979-08-24 1981-04-02 Toshiba Corp Electron beam device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632655A (en) * 1979-08-24 1981-04-02 Toshiba Corp Electron beam device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58145122A (en) * 1982-02-23 1983-08-29 Jeol Ltd Electron beam exposure device
JPS6124231A (en) * 1984-07-13 1986-02-01 Hitachi Ltd Electron beam patterning device

Also Published As

Publication number Publication date
JPH027173B2 (en) 1990-02-15

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