JPS5519842A - Thin film growing device under vacuum - Google Patents

Thin film growing device under vacuum

Info

Publication number
JPS5519842A
JPS5519842A JP9252678A JP9252678A JPS5519842A JP S5519842 A JPS5519842 A JP S5519842A JP 9252678 A JP9252678 A JP 9252678A JP 9252678 A JP9252678 A JP 9252678A JP S5519842 A JPS5519842 A JP S5519842A
Authority
JP
Japan
Prior art keywords
chamber
valve
saucer
base plate
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9252678A
Other languages
Japanese (ja)
Other versions
JPS6258137B2 (en
Inventor
Yoshio Komiya
Akihiro Kanamori
Kuniichi Shirai
Keiichiro Uda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI, Agency of Industrial Science and Technology filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP9252678A priority Critical patent/JPS5519842A/en
Publication of JPS5519842A publication Critical patent/JPS5519842A/en
Publication of JPS6258137B2 publication Critical patent/JPS6258137B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PURPOSE: To make possible the exchange of base plate without exposing ultrahigh vacuum chamber to the atmosphere by setting an interlock chamber through gate valves on the outside of an ultrahigh vacuum growing chamber.
CONSTITUTION: An ultrahigh vacuum growing chamber 1 and an interlock chamber 23 which is low vacuum area are isolated by a gate valve 22. Under this condition, a lid 26 is removed, a base plate fixing jig 19 with a base plate is set on a saucer 20, an outlet 25 is sealed with a lid 26, and a chamber 23 is evacuated through a port 26. Next, a valve 22 is opened, the saucer 20 is moved into a growing chamber 1, a shaft 10 of a manipulator 9 is lowered to be connected with a jig 19, and the jig 19 is separated to ascend. Next, the saucer 20 is again moved into the chamber 23, and the valve 22 is closed. During this process, since the growing chamber 1 is not exposed to the atmosphere, the state of vacuum is immediately recovered with the valve 22 closed. Therefore, the time necessary for producing thin film is greatly shortened.
COPYRIGHT: (C)1980,JPO&Japio
JP9252678A 1978-07-31 1978-07-31 Thin film growing device under vacuum Granted JPS5519842A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9252678A JPS5519842A (en) 1978-07-31 1978-07-31 Thin film growing device under vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9252678A JPS5519842A (en) 1978-07-31 1978-07-31 Thin film growing device under vacuum

Publications (2)

Publication Number Publication Date
JPS5519842A true JPS5519842A (en) 1980-02-12
JPS6258137B2 JPS6258137B2 (en) 1987-12-04

Family

ID=14056781

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9252678A Granted JPS5519842A (en) 1978-07-31 1978-07-31 Thin film growing device under vacuum

Country Status (1)

Country Link
JP (1) JPS5519842A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57170519A (en) * 1981-03-27 1982-10-20 Western Electric Co Device and method for coating molecle beam
JPH01169919A (en) * 1987-12-25 1989-07-05 Hitachi Ltd Film forming device
JP4681084B1 (en) * 2010-02-23 2011-05-11 株式会社テオス CVD processing method and CVD apparatus using the method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0417283Y2 (en) * 1988-05-14 1992-04-17

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
REV.SCI.INSTRUM.=1978 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57170519A (en) * 1981-03-27 1982-10-20 Western Electric Co Device and method for coating molecle beam
JPH01169919A (en) * 1987-12-25 1989-07-05 Hitachi Ltd Film forming device
JP4681084B1 (en) * 2010-02-23 2011-05-11 株式会社テオス CVD processing method and CVD apparatus using the method
WO2011104740A1 (en) * 2010-02-23 2011-09-01 株式会社テオス Cvd processing method and cvd device using said method

Also Published As

Publication number Publication date
JPS6258137B2 (en) 1987-12-04

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