JPS544070A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS544070A JPS544070A JP6891277A JP6891277A JPS544070A JP S544070 A JPS544070 A JP S544070A JP 6891277 A JP6891277 A JP 6891277A JP 6891277 A JP6891277 A JP 6891277A JP S544070 A JPS544070 A JP S544070A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- semiconductor wafer
- photo resist
- agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE: To prevent photo resist from being peeled off, by performing surface treatment to the semiconductor wafer with silane coupling agent and by increasing the adhesiveness of the photo resist agent to the SiO2 film on the semiconductor wafer surface.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6891277A JPS544070A (en) | 1977-06-13 | 1977-06-13 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6891277A JPS544070A (en) | 1977-06-13 | 1977-06-13 | Manufacture for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS544070A true JPS544070A (en) | 1979-01-12 |
Family
ID=13387332
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6891277A Pending JPS544070A (en) | 1977-06-13 | 1977-06-13 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS544070A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6054255A (en) * | 1996-08-01 | 2000-04-25 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method and surface treating agent |
US6258972B1 (en) | 1995-08-03 | 2001-07-10 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method and surface treating agent |
JP2007520064A (en) * | 2004-01-16 | 2007-07-19 | ブルーワー サイエンス アイ エヌ シー. | Spin-on protective coating for wet etching of microelectronic substrates |
-
1977
- 1977-06-13 JP JP6891277A patent/JPS544070A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6258972B1 (en) | 1995-08-03 | 2001-07-10 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method and surface treating agent |
US6054255A (en) * | 1996-08-01 | 2000-04-25 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method and surface treating agent |
JP2007520064A (en) * | 2004-01-16 | 2007-07-19 | ブルーワー サイエンス アイ エヌ シー. | Spin-on protective coating for wet etching of microelectronic substrates |
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