JPS54146990A - Production of elastic surface wave device - Google Patents

Production of elastic surface wave device

Info

Publication number
JPS54146990A
JPS54146990A JP5451278A JP5451278A JPS54146990A JP S54146990 A JPS54146990 A JP S54146990A JP 5451278 A JP5451278 A JP 5451278A JP 5451278 A JP5451278 A JP 5451278A JP S54146990 A JPS54146990 A JP S54146990A
Authority
JP
Japan
Prior art keywords
production
substrate
photo resistor
photo
piezo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5451278A
Other languages
Japanese (ja)
Other versions
JPS5910085B2 (en
Inventor
Masaharu Ishigaki
Hideo Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP53054512A priority Critical patent/JPS5910085B2/en
Publication of JPS54146990A publication Critical patent/JPS54146990A/en
Publication of JPS5910085B2 publication Critical patent/JPS5910085B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To improve the quality of the production process dependent upon automatization by adding a process where a metallic film is formed on the surface, the reverse face and the side face of a piezo-electric substrate and eliminating completely the surface charge of the wafer and improving yield in photo resistor pattern formation. CONSTITUTION:Metallic thin film 4 of a prescribed thickness is formed on the surface, the reverse face and the side face of piezo-electric substrate 1, and next, a photo resistor is applied to the surface of substrate 1 where an electrode should be formed, and photo resistor film 5 having a desired shape is formed by the photo lithography technique. Further, a phosphoric acid-system etching liquid is used to remove a needless metal on the surface, thereby forming desired IDT electrode 6. By this production process, the charge on the surface of substrate 1 is eliminated completely, and the photo resistor pattern is formed easily, so that yield in production can be improved, and the quality of products in automatic production can be improved.
JP53054512A 1978-05-10 1978-05-10 Manufacturing method of surface acoustic wave device Expired JPS5910085B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53054512A JPS5910085B2 (en) 1978-05-10 1978-05-10 Manufacturing method of surface acoustic wave device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53054512A JPS5910085B2 (en) 1978-05-10 1978-05-10 Manufacturing method of surface acoustic wave device

Publications (2)

Publication Number Publication Date
JPS54146990A true JPS54146990A (en) 1979-11-16
JPS5910085B2 JPS5910085B2 (en) 1984-03-07

Family

ID=12972686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53054512A Expired JPS5910085B2 (en) 1978-05-10 1978-05-10 Manufacturing method of surface acoustic wave device

Country Status (1)

Country Link
JP (1) JPS5910085B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61206316U (en) * 1985-06-14 1986-12-26
JPH02260907A (en) * 1989-03-31 1990-10-23 Hoya Corp Manufacture of surface acoustic wave device
JPH0653768A (en) * 1980-11-17 1994-02-25 British Technol Group Ltd Manufacture of sound-wave device
WO2002031974A1 (en) * 2000-10-12 2002-04-18 Fujitsu Limited Surface acoustic wave device and method of producing the same
US7389570B2 (en) * 2004-06-28 2008-06-24 Kyocera Corporation Surface acoustic wave device manufacturing method, surface acoustic wave device, and communications equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057559A (en) * 1973-09-20 1975-05-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057559A (en) * 1973-09-20 1975-05-20

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653768A (en) * 1980-11-17 1994-02-25 British Technol Group Ltd Manufacture of sound-wave device
JPH0856133A (en) * 1980-11-17 1996-02-27 British Technol Group Ltd Manufacture of surface elastic wave device
JPS61206316U (en) * 1985-06-14 1986-12-26
JPH02260907A (en) * 1989-03-31 1990-10-23 Hoya Corp Manufacture of surface acoustic wave device
WO2002031974A1 (en) * 2000-10-12 2002-04-18 Fujitsu Limited Surface acoustic wave device and method of producing the same
US7389570B2 (en) * 2004-06-28 2008-06-24 Kyocera Corporation Surface acoustic wave device manufacturing method, surface acoustic wave device, and communications equipment

Also Published As

Publication number Publication date
JPS5910085B2 (en) 1984-03-07

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