JPS54108701A - Photomask - Google Patents

Photomask

Info

Publication number
JPS54108701A
JPS54108701A JP1428178A JP1428178A JPS54108701A JP S54108701 A JPS54108701 A JP S54108701A JP 1428178 A JP1428178 A JP 1428178A JP 1428178 A JP1428178 A JP 1428178A JP S54108701 A JPS54108701 A JP S54108701A
Authority
JP
Japan
Prior art keywords
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1428178A
Other languages
Japanese (ja)
Inventor
Yoshiaki Shirato
Akira Niimi
Toshitami Hara
Masahisa Fukui
Yoshiki Hajimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP1428178A priority Critical patent/JPS54108701A/en
Publication of JPS54108701A publication Critical patent/JPS54108701A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1428178A 1978-02-10 1978-02-10 Photomask Pending JPS54108701A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1428178A JPS54108701A (en) 1978-02-10 1978-02-10 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1428178A JPS54108701A (en) 1978-02-10 1978-02-10 Photomask

Publications (1)

Publication Number Publication Date
JPS54108701A true JPS54108701A (en) 1979-08-25

Family

ID=11856697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1428178A Pending JPS54108701A (en) 1978-02-10 1978-02-10 Photomask

Country Status (1)

Country Link
JP (1) JPS54108701A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61272746A (en) * 1985-05-28 1986-12-03 Asahi Glass Co Ltd Photomask blank and photomask
WO2007069417A1 (en) * 2005-12-12 2007-06-21 Asahi Glass Company, Limited Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61272746A (en) * 1985-05-28 1986-12-03 Asahi Glass Co Ltd Photomask blank and photomask
JPS6363896B2 (en) * 1985-05-28 1988-12-08
WO2007069417A1 (en) * 2005-12-12 2007-06-21 Asahi Glass Company, Limited Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank
US7736821B2 (en) 2005-12-12 2010-06-15 Asahi Glass Company, Limited Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank

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