JPS5328379A - Electron lens device - Google Patents

Electron lens device

Info

Publication number
JPS5328379A
JPS5328379A JP7413677A JP7413677A JPS5328379A JP S5328379 A JPS5328379 A JP S5328379A JP 7413677 A JP7413677 A JP 7413677A JP 7413677 A JP7413677 A JP 7413677A JP S5328379 A JPS5328379 A JP S5328379A
Authority
JP
Japan
Prior art keywords
lens device
electron lens
lenses
changing
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7413677A
Other languages
Japanese (ja)
Other versions
JPS5334470B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Sakae Miyauchi
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP7413677A priority Critical patent/JPS5328379A/en
Publication of JPS5328379A publication Critical patent/JPS5328379A/en
Publication of JPS5334470B2 publication Critical patent/JPS5334470B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: Arbitrary rotating of electron beam section (image) is made possible without changing the focal lengths of lenses.
COPYRIGHT: (C)1978,JPO&Japio
JP7413677A 1977-06-22 1977-06-22 Electron lens device Granted JPS5328379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7413677A JPS5328379A (en) 1977-06-22 1977-06-22 Electron lens device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7413677A JPS5328379A (en) 1977-06-22 1977-06-22 Electron lens device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3764276A Division JPS52147977A (en) 1976-04-02 1976-04-02 Electronic lens unit

Publications (2)

Publication Number Publication Date
JPS5328379A true JPS5328379A (en) 1978-03-16
JPS5334470B2 JPS5334470B2 (en) 1978-09-20

Family

ID=13538459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7413677A Granted JPS5328379A (en) 1977-06-22 1977-06-22 Electron lens device

Country Status (1)

Country Link
JP (1) JPS5328379A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58156900A (en) * 1982-02-26 1983-09-17 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Electrostatically charged particle beam device
JPS5941831A (en) * 1982-08-31 1984-03-08 Toshiba Corp Method for electron-beam drawing
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam
JPS6211795U (en) * 1985-07-08 1987-01-24
JPS62115715A (en) * 1985-07-22 1987-05-27 Toshiba Mach Co Ltd Electron-beam exposure device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03120816U (en) * 1990-03-20 1991-12-11

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119080A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119080A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58156900A (en) * 1982-02-26 1983-09-17 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Electrostatically charged particle beam device
JPS5941831A (en) * 1982-08-31 1984-03-08 Toshiba Corp Method for electron-beam drawing
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam
JPS6211795U (en) * 1985-07-08 1987-01-24
JPS62115715A (en) * 1985-07-22 1987-05-27 Toshiba Mach Co Ltd Electron-beam exposure device

Also Published As

Publication number Publication date
JPS5334470B2 (en) 1978-09-20

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