JPS53102669A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS53102669A JPS53102669A JP1680177A JP1680177A JPS53102669A JP S53102669 A JPS53102669 A JP S53102669A JP 1680177 A JP1680177 A JP 1680177A JP 1680177 A JP1680177 A JP 1680177A JP S53102669 A JPS53102669 A JP S53102669A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- volatge
- breakdown
- increase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Thyristors (AREA)
Abstract
PURPOSE: To increase the breakdown volatge of pn junction formed, by injecting ion with tilted ion beam.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1680177A JPS53102669A (en) | 1977-02-18 | 1977-02-18 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1680177A JPS53102669A (en) | 1977-02-18 | 1977-02-18 | Manufacture for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53102669A true JPS53102669A (en) | 1978-09-07 |
Family
ID=11926248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1680177A Pending JPS53102669A (en) | 1977-02-18 | 1977-02-18 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53102669A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5155369A (en) * | 1990-09-28 | 1992-10-13 | Applied Materials, Inc. | Multiple angle implants for shallow implant |
US5371023A (en) * | 1991-06-11 | 1994-12-06 | Hitachi, Ltd. | Gate circuit, semiconductor integrated circuit device and method of fabrication thereof, semiconductor memory and microprocessor |
-
1977
- 1977-02-18 JP JP1680177A patent/JPS53102669A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5155369A (en) * | 1990-09-28 | 1992-10-13 | Applied Materials, Inc. | Multiple angle implants for shallow implant |
US5371023A (en) * | 1991-06-11 | 1994-12-06 | Hitachi, Ltd. | Gate circuit, semiconductor integrated circuit device and method of fabrication thereof, semiconductor memory and microprocessor |
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