JPS5290436A - Plasm etching method - Google Patents

Plasm etching method

Info

Publication number
JPS5290436A
JPS5290436A JP732676A JP732676A JPS5290436A JP S5290436 A JPS5290436 A JP S5290436A JP 732676 A JP732676 A JP 732676A JP 732676 A JP732676 A JP 732676A JP S5290436 A JPS5290436 A JP S5290436A
Authority
JP
Japan
Prior art keywords
etching method
plasm
plasm etching
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP732676A
Other languages
Japanese (ja)
Inventor
Haruhiko Abe
Kiyuusaku Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP732676A priority Critical patent/JPS5290436A/en
Publication of JPS5290436A publication Critical patent/JPS5290436A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP732676A 1976-01-26 1976-01-26 Plasm etching method Pending JPS5290436A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP732676A JPS5290436A (en) 1976-01-26 1976-01-26 Plasm etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP732676A JPS5290436A (en) 1976-01-26 1976-01-26 Plasm etching method

Publications (1)

Publication Number Publication Date
JPS5290436A true JPS5290436A (en) 1977-07-29

Family

ID=11662831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP732676A Pending JPS5290436A (en) 1976-01-26 1976-01-26 Plasm etching method

Country Status (1)

Country Link
JP (1) JPS5290436A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138159A (en) * 1981-02-20 1982-08-26 Fujitsu Ltd Formation of thin film
JPS60158631A (en) * 1984-01-30 1985-08-20 Comput Basic Mach Technol Res Assoc Etching method of aluminum
JPH0466682A (en) * 1990-07-04 1992-03-03 Agency Of Ind Science & Technol Method for etching aluminum

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID-STATE ELECTRON=1975 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138159A (en) * 1981-02-20 1982-08-26 Fujitsu Ltd Formation of thin film
JPS60158631A (en) * 1984-01-30 1985-08-20 Comput Basic Mach Technol Res Assoc Etching method of aluminum
JPH0426210B2 (en) * 1984-01-30 1992-05-06 Hitachi Ltd
JPH0466682A (en) * 1990-07-04 1992-03-03 Agency Of Ind Science & Technol Method for etching aluminum

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