JPH11211895A - X-ray optical device - Google Patents
X-ray optical deviceInfo
- Publication number
- JPH11211895A JPH11211895A JP6612398A JP6612398A JPH11211895A JP H11211895 A JPH11211895 A JP H11211895A JP 6612398 A JP6612398 A JP 6612398A JP 6612398 A JP6612398 A JP 6612398A JP H11211895 A JPH11211895 A JP H11211895A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- mirror
- zone plate
- schwarzschild
- optical device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はX線の集光或はX線
による結像に用いるX線光学装置に関する。[0001] 1. Field of the Invention [0002] The present invention relates to an X-ray optical apparatus used for X-ray focusing or X-ray imaging.
【0002】[0002]
【従来の技術】基板上に重元素と軽元素の薄膜を交互に
重層した多層膜X線反射鏡が実用されている。これは重
元素にW,Mo,Cr,Au等、軽元素にB,C,Al
等を用い、重元素膜と軽元素膜の一組(層対と言う)の
層厚さが1nm以上の物が作られている。X線反射は重
元素膜における散乱X線の相互干渉によるもので,ブラ
ッグの反射である。従って軽重両元素膜の一組の層厚さ
を5.0nmとしたとき、垂直入反射に対するX線波長
は10nmとなり、この波長を中心に大きな反射率を持
ち、層対数は30〜100位で、層対数30位で反射率
は40%程度のものが得られる。また鏡の直径は15c
m位まで作られる。X線用ゾーンプレートは直径は5m
m位のものまで作られている。2. Description of the Related Art A multilayer X-ray reflector in which thin films of heavy elements and light elements are alternately layered on a substrate has been put to practical use. This means that heavy elements such as W, Mo, Cr, Au, etc., and light elements such as B, C, Al
For example, a pair of a heavy element film and a light element film (referred to as a layer pair) having a layer thickness of 1 nm or more is manufactured. X-ray reflection is due to mutual interference of scattered X-rays on the heavy element film, and is Bragg reflection. Therefore, when the thickness of a pair of light and heavy element films is set to 5.0 nm, the X-ray wavelength for perpendicular incident reflection is 10 nm. With a number of layers of about 30 and a reflectivity of about 40%, it can be obtained. The mirror diameter is 15c
Made up to m-th place. X-ray zone plate is 5m in diameter
It is made up to m-th.
【0003】シュワルツシルド型ミラーは大きな凹面主
鏡と小さな凸面副鏡をカセグレン望遠鏡のように対向さ
せたもので、主鏡の中央には凸面副鏡で反射されたX線
束が通る孔が開けられている。X線反射鏡を用いたX線
集光装置にはこの他にウォルター型ミラーを用いたもの
がある。これは双曲面と楕円鏡との組合わせで夫々の焦
点の一方をX線源,他方を集光点とするものである。The Schwarzschild type mirror has a large concave primary mirror and a small convex secondary mirror opposed to each other like a Cassegrain telescope, and a hole through which the X-ray flux reflected by the convex secondary mirror passes is formed at the center of the primary mirror. ing. An X-ray condensing device using an X-ray reflecting mirror includes a device using a Walter-type mirror in addition to the above. This is a combination of a hyperboloid and an elliptical mirror, in which one of the focal points is an X-ray source and the other is a focal point.
【0004】上述した各型のX線光学装置は次のような
得失を有する。シュワルツシルド型ミラーを用いる場合
は、主鏡のX線源に対する立体角は大きく出来るが、主
鏡中央に孔を穿つため、X線束の中心部が利用できない
ことになる。ウォルター型ミラーを用いるものは、ミラ
ーへのX線入反射角が斜め入反射になるのでX線反射率
はシュワルツシルド型より高くなるが、ミラーのX線源
に対する立体角がシュワルツシルド型より小さく全体と
してシュワルツシルド型より効率が低い。ゾーンプレー
トを用いるものは可視光用のものに比し、ゾーン間隔が
小さく、大口径の物が作れないので、X線源に対する立
体角が小さくて、X線利用率が低い。Each type of X-ray optical device described above has the following advantages and disadvantages. When a Schwarzschild type mirror is used, the solid angle of the primary mirror with respect to the X-ray source can be increased, but since a hole is formed in the center of the primary mirror, the central part of the X-ray flux cannot be used. In the case of using a Walter-type mirror, the X-ray reflection angle is higher than that of the Schwarzschild type because the X-ray incidence angle to the mirror is obliquely incident and reflected, but the solid angle of the mirror with respect to the X-ray source is smaller than that of the Schwarzschild type. Overall, lower efficiency than Schwarzschild type. A device using a zone plate has a smaller zone interval and cannot produce a large-diameter object than a device using a visible light, so that a solid angle with respect to an X-ray source is small and an X-ray utilization factor is low.
【0005】[0005]
【発明が解決しようとする課題】シュワルツシルド型ミ
ラーを用いたX線光学装置がX線束の中心部を利用でき
ない点を改善して、全体として効率の高いX線光学装置
を得ようとするものである。An X-ray optical device using a Schwarzschild type mirror is intended to improve the point that the center of the X-ray flux cannot be used, and to obtain an X-ray optical device with high efficiency as a whole. It is.
【0006】[0006]
【課題を解決するための手段】X線用シュワルツシルド
型ミラーの凹面主鏡に対向している凸面副鏡の中央部に
孔をあけて、ここにX線用ゾーンプレートを設け、この
ゾーンプレートのX線源位置と、集光点が上記シュワル
ツシルド型ミラーのX線源位置と集光点とに一致するよ
うにした。An X-ray zone plate is provided in a central portion of a convex sub-mirror of a Schwarzschild type mirror for X-ray, which is opposed to a concave main mirror. The X-ray source position and the converging point are set to coincide with the X-ray source position and the converging point of the Schwarzschild mirror.
【0007】[0007]
【発明の実施の形態】図1に本発明の一つの実施形態を
示す。図で1はシュワルツシルド型X線用ミラーの主鏡
で中央にX線束の通る孔1Hが開けてある。2はシュワ
ルツシルド型X線ミラーの副鏡で、その中央部はX線束
が通るよう孔2Hが開けてあり、そこにX線用フレネル
ゾーンプレート3が取付けてある。SがX線源でFがX
線の集光点である。この点SとFはシュワルツシルド型
ミラー1,2の組合わせの線源とその像点であると共
に、ゾーンプレート3の線源とその像点でもある。シュ
ワルツシルド型ミラー1,2は石英基板で、反射膜は重
元素にCoを用い、軽元素にBを用いて、X線反射膜の
一層対の厚さdを5.0nmにすると、垂直入反射に近
い範囲で波長10nmの軟X線に対して高い反射率が得
られる。図でSはX線源、FはX線集光点で、ゾーンプ
レート3は線源Sと集光点F間に配置されている。この
配置は拡大投影光学系になっているが、図のF点をX線
源とし、S点を集光点とする配置にして縮小投影光学系
も構成可能である。FIG. 1 shows one embodiment of the present invention. In the figure, reference numeral 1 denotes a primary mirror of a Schwarzschild X-ray mirror, and a hole 1H through which an X-ray flux passes is formed at the center. Reference numeral 2 denotes a secondary mirror of the Schwarzschild type X-ray mirror, which has a hole 2H in the center thereof so that an X-ray flux passes therethrough, and an X-ray Fresnel zone plate 3 is mounted thereon. S is an X-ray source and F is X
This is the focal point of the line. These points S and F are the source of the combination of the Schwarzschild mirrors 1 and 2 and their image points, as well as the source of the zone plate 3 and their image points. When the Schwarzschild mirrors 1 and 2 are quartz substrates, the reflection film is made of Co as a heavy element and B is used as a light element, and the thickness d of one pair of X-ray reflection films is set to 5.0 nm, the vertical incidence is reduced. High reflectivity is obtained for soft X-rays having a wavelength of 10 nm in a range close to reflection. In the figure, S is an X-ray source, F is an X-ray focusing point, and the zone plate 3 is arranged between the source S and the focusing point F. Although this arrangement is an enlarged projection optical system, a reduced projection optical system can also be configured by disposing the point F in the figure as an X-ray source and the point S as a converging point.
【0008】図1の例ではゾーンプレート3は副鏡2の
背面(X線源側)に密着させてあるが、主鏡1,副鏡
2,ゾーンプレート3の位置関係はこのような配置に限
られない。ゾーンプレートと副鏡とは離れていても良
い。ゾーンプレートは線源と集光点との位置関係が普通
のレンズと同じであるからゾーンプレート3とX線源
S,集光点Fとの間隔は任意に設定できる。副鏡におい
てはX線の入反射角は主鏡より小さくなるから、反射膜
の層対厚さは主鏡より小さくしておくのが望ましい。
い。図1の例ではX線源から主鏡1の中心まで60c
m、主鏡1によるX線源像S′の位置はX線源から20
cm、主鏡直径5cm、副鏡直径1.5cm、ゾーンプ
レート3の半径2.0mmである。この構成で主鏡1の
有効範囲は半径1.5cmから2.25cmの間、これ
に対応して副鏡2は有効内径1cm、有効外径0.5c
mである。In the example shown in FIG. 1, the zone plate 3 is brought into close contact with the back surface (the X-ray source side) of the sub-mirror 2, but the positional relationship between the primary mirror 1, the sub-mirror 2, and the zone plate 3 is such an arrangement. Not limited. The zone plate and the secondary mirror may be separated. Since the positional relationship between the source and the focal point of the zone plate is the same as that of an ordinary lens, the intervals between the zone plate 3 and the X-ray source S and the focal point F can be set arbitrarily. Since the angle of incidence and reflection of X-rays is smaller in the secondary mirror than in the primary mirror, it is desirable that the layer-to-thickness of the reflective film be smaller than that of the primary mirror.
No. In the example of FIG. 1, the distance from the X-ray source to the center of the primary mirror 1 is 60c.
m, the position of the X-ray source image S 'by the primary mirror 1 is 20
cm, the primary mirror diameter is 5 cm, the secondary mirror diameter is 1.5 cm, and the radius of the zone plate 3 is 2.0 mm. In this configuration, the effective range of the primary mirror 1 is between a radius of 1.5 cm and 2.25 cm, and accordingly, the secondary mirror 2 has an effective inner diameter of 1 cm and an effective outer diameter of 0.5 c.
m.
【0009】[0009]
【発明の効果】本発明X線光学装置は上述したような構
成で、シュワルツシルド型ミラーでは利用されなかった
X線束の中心部がX線用ゾーンプレートの併用によって
利用されるようになり、逆にゾーンプレートを中心に考
えると、ゾーンプレートはX線束の中の狭い立体角内の
X線しか利用できなかったのが、シュワルツシルド型ミ
ラーの併用によって利用できるX線束の立体角が拡大さ
れたことになり、何れにしても従来より明るいX線光学
装置が得られる。According to the X-ray optical apparatus of the present invention, the central portion of the X-ray flux which has not been used in the Schwarzschild mirror is used by the combined use of the X-ray zone plate. Considering mainly the zone plate, the zone plate could only use X-rays within a narrow solid angle in the X-ray flux, but the solid angle of the X-ray flux that can be used with the Schwarzschild type mirror was expanded. In any case, an X-ray optical device brighter than the conventional one can be obtained.
【図1】 本発明の一実施形態を示す図。FIG. 1 is a diagram showing an embodiment of the present invention.
1 シュワルツシルド型ミラーの主鏡 2 同じく副鏡 3 ゾーンプレート S X線源 F X線集光点 Reference Signs List 1 Primary mirror of Schwarzschild mirror 2 Secondary mirror 3 Zone plate S X-ray source F X-ray focusing point
Claims (1)
シュワルツシルド型X線用ミラーの光軸上に上記ミラー
のX線源とX線集光点を一致させてX線用フレネルゾー
ンプレートを配置すると共に、上記副鏡の中央にX線束
の通る孔を設けたことを特徴とするX線光学装置。The X-ray source and the X-ray focal point of the mirror are aligned on the optical axis of a Schwarzschild type X-ray mirror composed of a primary mirror and a secondary mirror having a multilayer film for X-ray reflection formed on the surface, and an X-ray Fresnel An X-ray optical apparatus comprising a zone plate and a hole through which an X-ray flux passes in the center of the secondary mirror.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6612398A JPH11211895A (en) | 1998-01-28 | 1998-01-28 | X-ray optical device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6612398A JPH11211895A (en) | 1998-01-28 | 1998-01-28 | X-ray optical device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11211895A true JPH11211895A (en) | 1999-08-06 |
Family
ID=13306795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6612398A Pending JPH11211895A (en) | 1998-01-28 | 1998-01-28 | X-ray optical device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11211895A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003056377A1 (en) * | 2001-12-27 | 2003-07-10 | Riken | Broadband telescope |
WO2019120472A1 (en) * | 2017-12-18 | 2019-06-27 | Universität Stuttgart | Interferometer with a schwarzschild objective, in particular for spectral interferometry |
-
1998
- 1998-01-28 JP JP6612398A patent/JPH11211895A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003056377A1 (en) * | 2001-12-27 | 2003-07-10 | Riken | Broadband telescope |
US7450299B2 (en) | 2001-12-27 | 2008-11-11 | Riken | Broadband telescope |
WO2019120472A1 (en) * | 2017-12-18 | 2019-06-27 | Universität Stuttgart | Interferometer with a schwarzschild objective, in particular for spectral interferometry |
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