JPH11156869A - Production of surface embossed part - Google Patents
Production of surface embossed partInfo
- Publication number
- JPH11156869A JPH11156869A JP33004697A JP33004697A JPH11156869A JP H11156869 A JPH11156869 A JP H11156869A JP 33004697 A JP33004697 A JP 33004697A JP 33004697 A JP33004697 A JP 33004697A JP H11156869 A JPH11156869 A JP H11156869A
- Authority
- JP
- Japan
- Prior art keywords
- ionizing radiation
- curable resin
- roll
- mold
- radiation curable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は透過型スクリーンに
使用されるフレネルレンズ、プリズムレンズ、レンチキ
ュラーレンズ等のレンズ、各種光学フィルムなど、主に
光学用途に利用される、表面に微細な凹凸パターンを備
える部材の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a fine uneven pattern on the surface, which is mainly used for optical applications, such as a lens such as a Fresnel lens, a prism lens and a lenticular lens used for a transmission screen, and various optical films. The present invention relates to a method for manufacturing a member provided.
【0002】[0002]
【従来の技術】透過型スクリーン用のフレネルレンズ、
プリズムレンズ、レンチキュラーレンズ等のレンズや、
各種光学フィルムなどに、表面に微細なパターンを有す
る光学用途向けのシートあるいはフィルム(以下、これ
らを「シート」と総称する。)が用いられている。この
ようなシートは、通常、プレス法、キャスト法等の方法
により成形されている。しかし、プレス法によりシート
を作製するためには、加熱、加圧、冷却という3つのサ
イクルを要し、成形に比較的長い時間が必要であり、生
産性が低いという課題が存在する。キャスト法によりシ
ートを作製する際にも、金型にモノマーを流し込んで重
合するための時間がかかり生産性が低いという課題が存
在し、また多数の金型が必要になるという課題も存在す
る。2. Description of the Related Art Fresnel lenses for transmission screens,
Lenses such as prism lenses and lenticular lenses,
2. Description of the Related Art Sheets or films for optical applications having a fine pattern on the surface (hereinafter, these are collectively referred to as "sheets") are used for various optical films. Such a sheet is usually formed by a method such as a press method or a cast method. However, in order to produce a sheet by a pressing method, three cycles of heating, pressing, and cooling are required, a relatively long time is required for molding, and there is a problem that productivity is low. Also when producing a sheet by a casting method, there is a problem that it takes a long time for pouring a monomer into a mold and polymerizing it, resulting in low productivity and a problem that a large number of molds are required.
【0003】プレス法およびキャスト法に存在するかか
る課題は、成形型と基材シートとの間に電離放射線硬化
樹脂(2P樹脂)を流し込み、電離放射線を照射するこ
とによって電離放射線硬化樹脂を硬化重合させる2P成
形法により解決が可能である。そして、2P成形法で用
いる成形型を透明なロール状のものとし、シートに塗布
された電離放射線硬化樹脂に透明成形型の内側から電離
放射線を照射することによってシート状の部材を連続的
に製造するロール転写法(特開平9−57868号公報
等を参照)が開発されている。[0003] The problem that exists in the pressing method and the casting method is that an ionizing radiation-curable resin (2P resin) is poured between a mold and a base sheet, and the ionizing radiation is irradiated to cure the ionizing radiation-curable resin. The solution is possible by the 2P molding method. Then, the mold used in the 2P molding method is made into a transparent roll, and the ionizing radiation-curable resin applied to the sheet is irradiated with ionizing radiation from inside the transparent molding die to continuously produce a sheet-like member. (See Japanese Patent Application Laid-Open No. 9-57868).
【0004】[0004]
【発明が解決しようとする課題】真空雰囲気下ではなく
定圧下で2P成形を行うと、シート表面に形成される凹
凸部分の表面または内部に気泡が混入してしまい、成形
品(製品)の品質が低下するという課題が生じる。そこ
で、真空雰囲気下で電離放射線硬化樹脂を注入しようと
すると、大規模な設備が必要となり、製造コストの低減
が困難になる。気泡の発生は、減圧下で電離放射線硬化
樹脂を脱泡することにより、ある程度少なくすることが
できる。しかし、電離放射線硬化樹脂層の厚さが大きい
場合には、脱泡の効果が認められるが、当該樹脂層が薄
くなると脱泡による気泡発生抑制の効果はほとんど認め
られなくなる。When 2P molding is performed under a constant pressure instead of a vacuum atmosphere, bubbles are mixed into the surface or inside of the uneven portion formed on the sheet surface, and the quality of the molded product (product) is increased. Is reduced. In order to inject the ionizing radiation curable resin in a vacuum atmosphere, a large-scale facility is required, and it is difficult to reduce the manufacturing cost. The generation of bubbles can be reduced to some extent by defoaming the ionizing radiation-curable resin under reduced pressure. However, when the thickness of the ionizing radiation-curable resin layer is large, the effect of defoaming is recognized, but when the resin layer is thin, the effect of suppressing bubble generation by defoaming is hardly recognized.
【0005】本発明は上記の課題に鑑みてなされたもの
で、ロール状の成形型を用いた2P成形法により表面に
凹凸を有する部品を製造する際の、電離放射線硬化樹脂
層内の気泡発生が低減される表面凹凸部品の製造方法を
提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has been made in consideration of the generation of bubbles in an ionizing radiation-curable resin layer when a component having an uneven surface is manufactured by a 2P molding method using a roll-shaped mold. It is an object of the present invention to provide a method for manufacturing a surface unevenness component in which surface roughness is reduced.
【0006】[0006]
【課題を解決するための手段】上記の課題を解決する本
発明の表面凹凸部品の製造方法は、表面に凹凸パターン
を有するロール状成形型に第1の電離放射線硬化樹脂を
塗布する工程と、あらかじめ上記第1の電離放射線硬化
樹脂よりも高い粘度を有する第2の電離放射線硬化樹脂
が塗布された基材シートを加圧ロールにより上記成形型
に押圧することによって上記第1の電離放射線硬化樹脂
層と上記第2の電離放射線硬化樹脂層とを積層する工程
と、電離放射線を照射して上記2つの電離放射線硬化樹
脂層を硬化する工程と、上記成形型から上記2つの電離
放射線硬化樹脂層とともに基材シートを離型する工程と
からなることを特徴とする。Means for Solving the Problems To solve the above-mentioned problems, a method of manufacturing a surface uneven part according to the present invention comprises the steps of: applying a first ionizing radiation-curable resin to a roll-shaped mold having an uneven pattern on its surface; The first ionizing radiation-curable resin is pressed by pressing a base sheet on which a second ionizing radiation-curable resin having a higher viscosity than the first ionizing radiation-curable resin has been applied to the molding die with a pressure roll. Laminating a layer and the second ionizing radiation-curable resin layer, irradiating ionizing radiation to cure the two ionizing radiation-curable resin layers, and removing the two ionizing radiation-curable resin layers from the mold. And a step of releasing the base material sheet.
【0007】[0007]
【発明の実施の形態】以下、本発明を図面に従って説明
する。本発明による製造工程の概略を図1に示す。図1
において、ロール状成形型(6)には、フレネルレン
ズ、プリズムレンズ、レンチキュラーレンズ等のレンズ
の微細パターンが反転された凹凸パターンや、回折格子
等の光学部品の微細パターンが反転された凹凸パターン
が形成されている。このロール状成形型(6)として
は、アルミニウム、黄銅、銅等の金属や、シリコン樹
脂、ウレタン樹脂、エポキシ樹脂、フッ素樹脂、ポリメ
チルペンタン樹脂等の合成樹脂から作製したものを用い
ることができる。電離放射線硬化樹脂層が形成されて上
記ロール状成形型(6)に押圧される基材シート(7)
としては、アクリル樹脂、ポリカーボネート樹脂、塩化
ビニル樹脂、トリ酢酸セルロース樹脂、ポリエステル樹
脂からなるフィルムあるいはシートを用いることができ
る。基材シート(7)は搬送手段(図示しない)により
一定の速度で搬送される。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. FIG. 1 shows an outline of the manufacturing process according to the present invention. FIG.
In the roll-shaped mold (6), an uneven pattern obtained by inverting a fine pattern of a lens such as a Fresnel lens, a prism lens, and a lenticular lens, and an uneven pattern obtained by inverting a fine pattern of an optical component such as a diffraction grating are provided. Is formed. As the roll-shaped mold (6), a mold made of a metal such as aluminum, brass, or copper, or a synthetic resin such as a silicone resin, a urethane resin, an epoxy resin, a fluororesin, or a polymethylpentane resin can be used. . A base sheet (7) on which an ionizing radiation-curable resin layer is formed and pressed against the above-mentioned roll-shaped mold (6)
For example, a film or sheet made of an acrylic resin, a polycarbonate resin, a vinyl chloride resin, a cellulose triacetate resin, or a polyester resin can be used. The base sheet (7) is conveyed at a constant speed by a conveying means (not shown).
【0008】本発明のおいては、図1に示すように、塗
布装置(1)からロール状成形型の凹部に第1の電離放
射線硬化樹脂が注入される。この第1の電離放射線硬化
樹脂としては、注入時の粘度が50〜200cpsの範
囲にあるものが好ましい。また、この電離放射線硬化樹
脂はあらかじめ十分に脱泡しておくと共に、樹脂中のゴ
ミはフィルターで濾過除去しておくことが好ましい。な
お、電離放射線硬化樹脂液の温度が低く、粘度が高い場
合は、加熱して粘度調整をすることが可能である。In the present invention, as shown in FIG. 1, a first ionizing radiation-curable resin is injected from a coating device (1) into a concave portion of a roll-shaped mold. The first ionizing radiation-curable resin preferably has a viscosity at the time of injection in the range of 50 to 200 cps. Preferably, the ionizing radiation-curable resin is sufficiently defoamed in advance, and dust in the resin is removed by filtration with a filter. When the temperature of the ionizing radiation-curable resin liquid is low and the viscosity is high, the viscosity can be adjusted by heating.
【0009】第2の電離放射線硬化樹脂は、塗布装置
(2)から基材シート(7)上に所定の膜厚になるよう
に塗布される。この第2の電離放射線硬化樹脂は注入時
の粘度が第1の電離放射線硬化樹脂の粘度よりも高いも
のである。上記第2の電離放射線硬化樹脂の粘度として
は、加圧ロール(3)による膜厚の制御が可能な200
〜5,000cpsの範囲が好ましい。加圧ロール
(3)は基材シート側に設置され、成形型ロールと同一
速度で回転する。The second ionizing radiation curable resin is applied from a coating device (2) onto a base sheet (7) so as to have a predetermined thickness. The second ionizing radiation-curable resin has a higher viscosity at the time of injection than the first ionizing radiation-curable resin. The viscosity of the second ionizing radiation-curable resin can be controlled by a pressure roll (3).
A range of -5,000 cps is preferred. The pressure roll (3) is installed on the base sheet side and rotates at the same speed as the forming die roll.
【0010】第1の電離放射線硬化樹脂が塗布されたロ
ール状成形型(6)には第2の電離放射線硬化樹脂を塗
布した基材シート(7)が加圧ロール(3)によって押
圧され、第1の電離放射線硬化樹脂層と第2の電離放射
線硬化樹脂層とが積層される。そして、基材シート
(7)が透明である場合には、上記ロール状成形型
(6)の下方に配設された電離放射線照射装置(5)に
よって基材シート(7)の下側から電離放射線が照射さ
れる。該基材シート(7)側から2つの電離放射線硬化
樹脂層に電離放射線が照射されることによって、2つの
電離放射線硬化樹脂層が硬化される。積層された2つの
電離放射線硬化樹脂はロール状成形型(6)に圧接され
た状態で硬化されるので、ロール成形型の凹凸パターン
が高い精度で電離放射線硬化樹脂に転写される。基材シ
ート(7)は、上記ロール状成形型(6)から上記2つ
の電離放射線硬化樹脂層とともに離型される。A base sheet (7) coated with a second ionizing radiation-curable resin is pressed against a roll-shaped mold (6) coated with a first ionizing radiation-curable resin by a pressure roll (3), A first ionizing radiation curable resin layer and a second ionizing radiation curable resin layer are laminated. When the base sheet (7) is transparent, the base sheet (7) is ionized from below the base sheet (7) by an ionizing radiation irradiation device (5) disposed below the roll-shaped forming die (6). Radiation is applied. By irradiating the two ionizing radiation-curable resin layers with ionizing radiation from the base sheet (7) side, the two ionizing radiation-curable resin layers are cured. Since the two ionized radiation-curable resins laminated are cured while being pressed against the roll-shaped mold (6), the concavo-convex pattern of the roll-mold is transferred to the ionized radiation-curable resin with high accuracy. The substrate sheet (7) is released from the roll-shaped mold (6) together with the two ionizing radiation-curable resin layers.
【0011】また、図2に示すように、該基材シート
(7)が電離放射線に対して透明でない場合や基材シー
トに電離放射線吸収剤が含有されている場合は、電離放
射線に対して透明なロール状成形型(6)を使用し、ロ
ール状成形型(6)内部から電離放射線を照射すれば良
い。なお、図2において、その他の構成は図1のものと
同様であり、その説明を省略する。As shown in FIG. 2, when the substrate sheet (7) is not transparent to ionizing radiation or when the substrate sheet contains an ionizing radiation absorber, A transparent roll-shaped mold (6) may be used, and ionizing radiation may be applied from inside the roll-shaped mold (6). In FIG. 2, other configurations are the same as those in FIG. 1, and the description thereof is omitted.
【0012】[0012]
【実施例】以下、図面を参照して実施例により本発明を
具体的に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.
【0013】[実施例1]図2に示す装置を用い、基材
シート(7)として、易接着処理がされた厚さが75μ
mのポリエチレンテレフタレートフィルム(ダイヤホイ
ルヘキスト製、商標ダイヤホイル)を使用した。第1の
電離放射線硬化樹脂には、東亞合成製アロニックスUV
X−1418(粘度25℃、110cps)、第2の電
離放射線硬化樹脂には、日本化薬製カヤトロンKNR−
902(粘度25℃、2700cps)を使用した。ロ
ール成形型(6)には、ピッチが110μm、溝高さが
5〜150μmのフレネルレンズ形状が反転された微細
凹凸パターンが設けられている。スロットダイ法によ
り、第2の電離放射線硬化樹脂を基材シート上に厚さが
150μmになるようにコーティングした。また、ロー
ル状成形型(6)の凹部に、第1の電離放射線硬化樹脂
を加圧スプレーを用いて気泡が入らないように均一な膜
厚になるように注入した。その後、紫外線硬化用マルチ
メタルランプ(電離放射線照射装置(5))により紫外
線を照射し、2つの電離放射線硬化樹脂層を硬化させ
た。これにより、厚さが80〜180μmの気泡の噛み
込みがないフレネルレンズシートが得られた。Example 1 Using the apparatus shown in FIG. 2, a base sheet (7) having a thickness of 75 .mu.
m of polyethylene terephthalate film (trade name: Diafoil, manufactured by Diafoil Hoechst). The first ionizing radiation curable resin is Alonix UV manufactured by Toagosei
X-1418 (viscosity 25 ° C., 110 cps), and the second ionizing radiation-curable resin is Nippon Kayaku Kayatron KNR-
902 (viscosity 25 ° C., 2700 cps) was used. The roll forming die (6) is provided with a fine concavo-convex pattern having a pitch of 110 μm and a groove height of 5 to 150 μm in which the Fresnel lens shape is inverted. A second ionizing radiation curable resin was coated on the base sheet so as to have a thickness of 150 μm by a slot die method. Further, the first ionizing radiation curable resin was injected into the concave portion of the roll-shaped molding die (6) by using a pressure spray so as to have a uniform film thickness so as to prevent bubbles from entering. Thereafter, ultraviolet rays were irradiated by a multi-metal lamp for ultraviolet curing (ionizing radiation irradiating device (5)) to cure the two ionizing radiation curing resin layers. As a result, a Fresnel lens sheet having a thickness of 80 to 180 μm and free of bubbles was obtained.
【0014】[実施例2]図2に示す装置を用い、基材
シート(7)として、厚さ80μmのトリ酢酸セルロー
スフィルム(富士写真フィルム製、商標TACフィル
ム、UV吸収剤添加)を使用した。第1の電離放射線硬
化樹脂には、東亞合成製アロニックスUVX−1418
(粘度25℃、110cps)、第2の電離放射線硬化
樹脂には、東亞合成製アロニックスUVX−840(粘
度25℃、560cps)を使用した。第2の電離放射
線硬化樹脂としてロール成形型(6)には、ピッチが1
00μm、溝高さが10μmの回折格子形状が反転され
た微細凹凸パターンが設けられている。スロットダイ法
により、第2電離放射線硬化樹脂を基材シート上に厚さ
が50μmになるようにコーティングした。また、ロー
ル状成形型(6)の凹部に、第1の電離放射線硬化樹脂
を加圧スプレーを用いて気泡が入らないように均一な膜
厚になるように注入した。その後、紫外線硬化用マルチ
メタルランプ(電離放射線照射装置(5))により紫外
線を照射し、2つの電離放射線硬化樹脂層を硬化させ
た。これにより、厚さが100μmの気泡の噛み込みが
ないシート状回折格子が得られた。Example 2 Using the apparatus shown in FIG. 2, a 80 μm-thick cellulose triacetate film (manufactured by Fuji Photo Film, trade name TAC film, added with a UV absorber) was used as a base sheet (7). . The first ionizing radiation curable resin includes Aronix UVX-1418 manufactured by Toagosei Co., Ltd.
(Viscosity 25 ° C., 110 cps), and Alonix UVX-840 (viscosity 25 ° C., 560 cps) manufactured by Toagosei Co., Ltd. was used as the second ionizing radiation curable resin. As the second ionizing radiation-curable resin, the roll mold (6) has a pitch of 1
There is provided a fine concave / convex pattern in which the shape of the diffraction grating is inverted by 00 μm and the groove height is 10 μm. The substrate sheet was coated with a second ionizing radiation curable resin to a thickness of 50 μm by a slot die method. Further, the first ionizing radiation curable resin was injected into the concave portion of the roll-shaped molding die (6) by using a pressure spray so as to have a uniform film thickness so as to prevent bubbles from entering. Thereafter, ultraviolet rays were irradiated by a multi-metal lamp for ultraviolet curing (ionizing radiation irradiating device (5)) to cure the two ionizing radiation curing resin layers. As a result, a sheet-like diffraction grating having a thickness of 100 μm and free of bubbles was obtained.
【0015】[0015]
【発明の効果】ロール状の成形型を用いた2P成形法に
より表面に凹凸を有する部品を製造する方法の本発明に
よれば、電離放射線硬化樹脂層内の気泡の発生が低減さ
れる。According to the present invention of the method of manufacturing a component having a surface having irregularities by a 2P molding method using a roll-shaped mold, generation of bubbles in the ionizing radiation-curable resin layer is reduced.
【図1】本発明で使用される連続ロール成形装置の一例
の概略図である。FIG. 1 is a schematic view of an example of a continuous roll forming apparatus used in the present invention.
【図2】本発明で使用される連続ロール成形装置の他の
一例の概略図である。FIG. 2 is a schematic view of another example of the continuous roll forming apparatus used in the present invention.
1:第1の電離放射線硬化樹脂層 2:第2の電離放射線硬化樹脂層 3:加圧ロール 4:成形型の凹部 5:電離放射線照射装置 6:ロール状成形型 7:基材シート 1: first ionizing radiation curable resin layer 2: second ionizing radiation curable resin layer 3: pressure roll 4: concave portion of molding die 5: ionizing radiation irradiation device 6: roll molding die 7: base sheet
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI G02B 3/08 G02B 3/08 5/00 5/00 Z ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI G02B 3/08 G02B 3/08 5/00 5/00 Z
Claims (1)
形型に第1の電離放射線硬化樹脂を塗布する工程と、あ
らかじめ上記第1の電離放射線硬化樹脂よりも高い粘度
を有する第2の電離放射線硬化樹脂が塗布された基材シ
ートを加圧ロールにより上記成形型に押圧することによ
って上記第1の電離放射線硬化樹脂層と上記第2の電離
放射線硬化樹脂層とを積層する工程と、電離放射線を照
射して上記2つの電離放射線硬化樹脂層を硬化する工程
と、上記成形型から上記2つの電離放射線硬化樹脂層と
ともに基材シートを離型する工程とからなる表面凹凸部
品の製造方法。1. A step of applying a first ionizing radiation-curable resin to a roll-shaped mold having an uneven pattern on its surface, and a second ionizing radiation-curing having a viscosity higher than that of the first ionizing radiation-curable resin in advance. Laminating the first ionizing radiation-curable resin layer and the second ionizing radiation-curable resin layer by pressing the resin-coated base sheet against the mold with a pressure roll; A method of manufacturing a surface unevenness component, comprising: a step of irradiating the two ionizing radiation-curable resin layers by irradiation, and a step of releasing a base sheet together with the two ionizing radiation-curable resin layers from the mold.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33004697A JPH11156869A (en) | 1997-12-01 | 1997-12-01 | Production of surface embossed part |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33004697A JPH11156869A (en) | 1997-12-01 | 1997-12-01 | Production of surface embossed part |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11156869A true JPH11156869A (en) | 1999-06-15 |
Family
ID=18228179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33004697A Pending JPH11156869A (en) | 1997-12-01 | 1997-12-01 | Production of surface embossed part |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11156869A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007001214A (en) * | 2005-06-24 | 2007-01-11 | Seiko Epson Corp | Manufacturing method of lens substrate, lens substrate, transmission type screen, and rear type projector |
JP2007106025A (en) * | 2005-10-14 | 2007-04-26 | Fujifilm Corp | Method and apparatus for manufacturing embossed sheet |
WO2009151171A1 (en) * | 2008-06-13 | 2009-12-17 | Miraenanotech Co., Ltd. | Apparatus and method for manufacturing an optical sheet |
KR100964985B1 (en) * | 2006-12-14 | 2010-06-21 | 미래나노텍(주) | Apparatus and method for manufacturing an optical sheet |
JP2012081619A (en) * | 2010-10-08 | 2012-04-26 | Kuraray Co Ltd | Method of manufacturing member having unevenly patterned surface |
WO2013100703A1 (en) * | 2011-12-30 | 2013-07-04 | 미래나노텍 주식회사 | Forming mold filling assembly and fine pattern forming apparatus including same |
WO2014156452A1 (en) * | 2013-03-28 | 2014-10-02 | 三菱レイヨン株式会社 | Optical film production method, optical film, surface light-emitting body and optical film production device |
WO2014189035A1 (en) * | 2013-05-23 | 2014-11-27 | 三菱レイヨン株式会社 | Optical film, method for producing optical film, and surface light-emitting body |
US9329311B2 (en) | 2011-05-25 | 2016-05-03 | 3M Innovative Properties Company | Light control film |
JP2016093962A (en) * | 2014-11-17 | 2016-05-26 | 三菱レイヨン株式会社 | Production method of optical film, optical film, and surface light-emitting body |
WO2017126200A1 (en) * | 2016-01-18 | 2017-07-27 | 東レ株式会社 | Method and apparatus for manufacturing surface structure film |
US11969755B2 (en) | 2019-06-03 | 2024-04-30 | Basf Coatings Gmbh | Method for applying embossed structures to coating media while pre-treating the embossing tool used therefor |
-
1997
- 1997-12-01 JP JP33004697A patent/JPH11156869A/en active Pending
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007001214A (en) * | 2005-06-24 | 2007-01-11 | Seiko Epson Corp | Manufacturing method of lens substrate, lens substrate, transmission type screen, and rear type projector |
JP4654792B2 (en) * | 2005-06-24 | 2011-03-23 | セイコーエプソン株式会社 | Lens substrate manufacturing method, lens substrate, transmissive screen, and rear projector |
JP2007106025A (en) * | 2005-10-14 | 2007-04-26 | Fujifilm Corp | Method and apparatus for manufacturing embossed sheet |
KR100964985B1 (en) * | 2006-12-14 | 2010-06-21 | 미래나노텍(주) | Apparatus and method for manufacturing an optical sheet |
WO2009151171A1 (en) * | 2008-06-13 | 2009-12-17 | Miraenanotech Co., Ltd. | Apparatus and method for manufacturing an optical sheet |
JP2012081619A (en) * | 2010-10-08 | 2012-04-26 | Kuraray Co Ltd | Method of manufacturing member having unevenly patterned surface |
US9329311B2 (en) | 2011-05-25 | 2016-05-03 | 3M Innovative Properties Company | Light control film |
WO2013100703A1 (en) * | 2011-12-30 | 2013-07-04 | 미래나노텍 주식회사 | Forming mold filling assembly and fine pattern forming apparatus including same |
JPWO2014156452A1 (en) * | 2013-03-28 | 2017-02-16 | 三菱レイヨン株式会社 | Optical film manufacturing method, optical film, surface light emitter, and optical film manufacturing apparatus |
US10174905B2 (en) | 2013-03-28 | 2019-01-08 | Mitsubishi Chemical Corporation | Optical film production method, optical film, surface light-emitting body and optical film production device |
WO2014156452A1 (en) * | 2013-03-28 | 2014-10-02 | 三菱レイヨン株式会社 | Optical film production method, optical film, surface light-emitting body and optical film production device |
JPWO2014189035A1 (en) * | 2013-05-23 | 2017-02-23 | 三菱レイヨン株式会社 | Optical film, method for producing optical film, and surface light emitter |
CN105408775A (en) * | 2013-05-23 | 2016-03-16 | 三菱丽阳株式会社 | Optical film, method for producing optical film, and surface light-emitting body |
JP2018088017A (en) * | 2013-05-23 | 2018-06-07 | 三菱ケミカル株式会社 | Optical film, method for forming optical film, and surface-emitting body |
WO2014189035A1 (en) * | 2013-05-23 | 2014-11-27 | 三菱レイヨン株式会社 | Optical film, method for producing optical film, and surface light-emitting body |
JP2016093962A (en) * | 2014-11-17 | 2016-05-26 | 三菱レイヨン株式会社 | Production method of optical film, optical film, and surface light-emitting body |
WO2017126200A1 (en) * | 2016-01-18 | 2017-07-27 | 東レ株式会社 | Method and apparatus for manufacturing surface structure film |
KR20180104591A (en) * | 2016-01-18 | 2018-09-21 | 도레이 카부시키가이샤 | Method and apparatus for manufacturing surface structure film |
TWI700173B (en) * | 2016-01-18 | 2020-08-01 | 日商東麗股份有限公司 | Manufacturing method and manufacturing device of surface structure film |
US11969755B2 (en) | 2019-06-03 | 2024-04-30 | Basf Coatings Gmbh | Method for applying embossed structures to coating media while pre-treating the embossing tool used therefor |
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