JPH11106920A - Container and its production - Google Patents

Container and its production

Info

Publication number
JPH11106920A
JPH11106920A JP9275706A JP27570697A JPH11106920A JP H11106920 A JPH11106920 A JP H11106920A JP 9275706 A JP9275706 A JP 9275706A JP 27570697 A JP27570697 A JP 27570697A JP H11106920 A JPH11106920 A JP H11106920A
Authority
JP
Japan
Prior art keywords
film
container
substrate
gas
lubricity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9275706A
Other languages
Japanese (ja)
Inventor
Takahiro Nakahigashi
孝浩 中東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP9275706A priority Critical patent/JPH11106920A/en
Publication of JPH11106920A publication Critical patent/JPH11106920A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Infusion, Injection, And Reservoir Apparatuses (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a container which has excellent wear resistance and lubricity to other articles and further, has an excellent gas barrier property by forming a carbon film having the wear resistance, the lubricity and the gas barrier property in part or the whole of a container surface. SOLUTION: DLC(diamond-like carbon) films F are formed by a plasma enhanced CVD method on the contact surfaces (both of the inside surface in contact with a piston and the outside surface in contact with another article) S1 of, for example, a syringe cylinder substrate S1. The DLC films having the good lubricity and are hardly wearable by friction with other articles. The films are formable to the extent of not impairing the flexibility intrinsic to the substrate even if the substrate has the flexibility like that of org. materials by adjusting the thickness thereof. The films have adequate hardness and have the good barrier property. Since the transmission of light is made possible by adjusting the thickness thereof, the contents are made visible even if the films are formed on the container surface. Further, the easy execution of deposition, such as formation at a relatively low temp. is made possible.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種の容器、例え
ばガソリン、薬液用タンク等の密閉可能なタンク、飲
料、調味料、化粧品用容器等の密閉可能な容器、一般家
庭において食品等を保存するために用いる開閉可能な密
閉可能容器、牛乳等の飲料のパック、食品長期保存用の
レトルトパック、食品個別包装用パック、点滴用のパッ
ク等の密閉して用いるパック等、さらには、例えば注射
器のシリンダー、バケツ、ペン立て、文房具用トレイ、
台所用容器等の各種容器、並びにそれらの製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to various types of containers, such as gasoline, tanks for chemicals, etc., sealable containers such as beverages, seasonings, cosmetics containers, etc. Openable and closable containers used for packaging, beverage packs such as milk, retort packs for long-term preservation of food, individual packs for food, packs used for sealing such as drip packs, etc., and further, for example, syringes Cylinder, bucket, pen stand, stationery tray,
The present invention relates to various containers such as kitchen containers and a method for producing them.

【0002】[0002]

【従来の技術】例えばガソリン、薬液等を収容するため
のタンク、飲料、調味料、化粧品等を収容するための容
器の材料には、ポリエチレン、ポリスチレン等の樹脂が
多用されている。これら樹脂は、軽量で耐衝撃性が優れ
るという利点がある。また、一般家庭において食品等の
保存用に用いられる開閉可能な容器の材料にも、柔軟性
を有し密閉性を高くできることからこのような樹脂が用
いられている。
2. Description of the Related Art For example, resins such as polyethylene and polystyrene are frequently used as materials for tanks for storing gasoline, chemicals and the like, and containers for storing beverages, seasonings, cosmetics, and the like. These resins are advantageous in that they are lightweight and have excellent impact resistance. In addition, such a resin is used also as a material of an openable and closable container used for preservation of foods and the like in general households because it is flexible and can be highly sealed.

【0003】また、牛乳パック等の飲料のパックには、
ポリエチレンフィルムと紙とを貼り合わせたラミネート
フィルムが多用されている。また、食品の長期保存用の
レトルトパックや個別包装用パック、点滴用のパック等
のパックの材料には、ポリエチレン、ポリプロピレン、
セロハン等の樹脂が用いられている。各樹脂材料はそれ
ぞれ、引っ張り強さ、耐熱性、ガスバリア性等の機械
的、熱的諸性質において長所短所を有するため、2種以
上のフィルムを貼り合わせて各材料の欠点を補ったラミ
ネートフィルムも用いられている。
[0003] In addition, beverage packs such as milk packs include:
Laminated films obtained by laminating a polyethylene film and paper are often used. In addition, materials for packs such as retort packs, individual wrapping packs, and drip packs for long-term storage of foods include polyethylene, polypropylene,
Resins such as cellophane are used. Each resin material has its strengths and weaknesses in mechanical and thermal properties such as tensile strength, heat resistance, gas barrier properties, etc.Therefore, a laminated film that compensates for defects of each material by bonding two or more films together Used.

【0004】また、注射器のシリンダーはガラス製のも
のが用いられていたが、ガラスの破片が薬液に混入し易
い等のことから、ポリエチレン、ポリスチレン等の樹脂
製のものに移り変わってきている。また、バケツや文房
具用容器、台所用容器等の容器の材料にも、軽量で耐衝
撃性に優れるこのような樹脂が用いられている。
[0004] Glass cylinders have been used for syringes. However, since the glass fragments are easily mixed into a chemical solution, the cylinders have been replaced with resin cylinders such as polyethylene and polystyrene. In addition, such a resin that is lightweight and excellent in impact resistance is also used as a material for containers such as buckets, stationery containers, kitchen containers, and the like.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、樹脂製
のタンク、飲料等用の容器、食品保存用容器等の容器
は、比較的軟質であるため、他物品との接触により摩耗
したり傷が付いたりし易い。また、他物品との滑りが悪
いことから一層摩耗が生じ易い。これらの容器では、他
物品との潤滑性を向上させ、これらとの接触による摩耗
や劣化を防止するために、容器の用途によっては安全上
等の点で支障のない範囲で外表面に潤滑剤を塗布した
り、潤滑剤を浸透させたりすることもあるが、このよう
な方法では使用開始時には比較的良好な所望の特性が得
られても、時間とともに表面の潤滑剤が他部分に分散し
たり、吸収されたり、脱落したりして少なくなり、潤滑
性が低下し、表面の摩耗、劣化が生じ易くなる。また、
長時間使用すると、潤滑剤が変質して容器が変色した
り、強度が劣化したりする場合がある。
However, containers such as resin tanks, containers for beverages, and containers for storing food are relatively soft, so that they are worn or scratched by contact with other articles. Easy to do. In addition, abrasion is more likely to occur due to poor sliding with other articles. In these containers, in order to improve lubricity with other articles and to prevent abrasion and deterioration due to contact with them, depending on the use of the container, a lubricant is applied to the outer surface within a range that does not hinder safety. May be applied or a lubricant may be impregnated.However, even if relatively good desired characteristics can be obtained at the start of use in such a method, the lubricant on the surface is dispersed in other parts over time. Or less due to absorption, falling off, lubricity, and surface wear and deterioration. Also,
If used for a long period of time, the quality of the lubricant may change and the container may be discolored or the strength may be deteriorated.

【0006】また、樹脂製のものはガスバリア性が悪
く、すなわち酸素、二酸化炭素、水蒸気、有機溶剤の蒸
気等を通し易いため、内容物の揮発や内容物の酸化、匂
い移り等の内容物の変質が起こり易いという難点があ
る。また、食品のパックでは、紙とのラミネートフィル
ムにする場合、ガスバリア性が悪く、内容物の変質が問
題となる。2種以上の樹脂フィルムどうしのラミネート
フィルムにする場合は、単一の樹脂フィルムからなる場
合よりも所望の特性が得られ易いが、コスト高につく。
またガラス製の容器等に比べると、耐摩耗性、潤滑性、
ガスバリア性は十分なものではない。
In addition, resinous materials have poor gas barrier properties, that is, they easily pass through oxygen, carbon dioxide, water vapor, vapors of organic solvents, etc., so that the contents such as volatilization of the contents, oxidation of the contents, odor transfer, etc. There is a disadvantage that deterioration easily occurs. Further, in the case of a food pack, when a laminated film with paper is used, the gas barrier property is poor, and the deterioration of the contents becomes a problem. When a laminate film of two or more resin films is used, desired properties are more easily obtained than when a single resin film is used, but the cost is high.
Also, compared to glass containers, etc., wear resistance, lubricity,
Gas barrier properties are not sufficient.

【0007】また、樹脂製の注射器用シリンダーは、ガ
ラス製のものに比べて軟質であり且つピストン先端のシ
ール材との潤滑性が悪いことから、ピストンとの摺動に
より摩耗し易く、またピストンを動かし難いという難点
がある。また、樹脂製のバケツや文房具、台所用容器等
の容器も、比較的軟質であるため、他物品との接触によ
り摩耗したり傷が付いたりし易い。また、他物品との滑
りが悪いことから一層摩耗が生じ易い。これらの容器で
も、他物品との潤滑性を向上させ、これらとの接触によ
る摩耗や劣化を防止するために、外表面に潤滑剤を塗布
したり、潤滑剤を浸透させたりすることがあるが、この
ような方法では使用開始時には比較的良好な所望の特性
が得られても、時間とともに潤滑性が低下し、表面の摩
耗、劣化が生じ易くなる。また、長時間使用すると、潤
滑剤が変質して容器が着色したり、強度が劣化したりす
る場合がある。
[0007] A resin syringe cylinder is softer than a glass cylinder and has poor lubricity with a seal material at the tip of the piston, so that it is easily worn by sliding with the piston. Is difficult to move. Also, containers such as resin buckets, stationery, kitchen containers, etc. are relatively soft, and thus are easily worn or scratched by contact with other articles. In addition, abrasion is more likely to occur due to poor sliding with other articles. Even in these containers, in order to improve lubricity with other articles and prevent wear and deterioration due to contact with them, lubricant may be applied to the outer surface or lubricant may be penetrated. In such a method, even when relatively good desired characteristics are obtained at the start of use, lubricity decreases with time, and surface wear and deterioration tend to occur. In addition, if used for a long time, the lubricant may deteriorate and the container may be colored or the strength may be deteriorated.

【0008】そこで本発明は、耐摩耗性及び他物品との
潤滑性に優れ、さらにガスバリア性に優れる容器及びそ
の製造方法を提供することを課題とする。
Accordingly, an object of the present invention is to provide a container excellent in abrasion resistance and lubricity with other articles, and further excellent in gas barrier properties, and a method of manufacturing the same.

【0009】[0009]

【課題を解決するための手段】前記課題を解決するため
に本発明は、表面の一部又は全部に耐摩耗性、潤滑性及
びガスバリア性のある炭素膜が形成されていることを特
徴とする容器を提供する。また本発明は、表面の一部又
は全部に耐摩耗性、潤滑性及びガスバリア性のある炭素
膜を形成する工程を含むことを特徴とする容器の製造方
法を提供する。
In order to solve the above-mentioned problems, the present invention is characterized in that a carbon film having abrasion resistance, lubricity and gas barrier properties is formed on part or all of the surface. Provide a container. Further, the present invention provides a method for producing a container, comprising a step of forming a carbon film having abrasion resistance, lubricity and gas barrier properties on part or all of the surface.

【0010】前記「表面」には、容器の外表面、内表面
のいずれも含まれる。前記容器には大別して密閉型容器
と開放型容器とが含まれる。密閉型容器は物体を収容、
密閉して保管、運搬し、内容物を使うときは開いて用い
ることができる繰り返し開閉可能の密閉型容器と、物体
を収容して保管し、内容物を用いるときは開けるが、そ
のあとは原則として捨てる使い捨て型の密閉容器とに大
別できる。繰り返し開閉型の密閉型容器としては、ガソ
リン、薬液等を収容するためのタンク、飲料、調味料、
化粧料等を収容しておく容器、一般家庭や食堂、レスト
ラン等において、食品、食材等を収容しておく容器等を
挙げることができる。また、使い捨て型の密閉容器とし
ては、牛乳等の飲料を収容しておく飲料パック、食品の
長期保存用のレトルトパック、食品販売にあたっての食
品個別包装用パック、点滴用パック等を挙げることがで
きる。前記開放型容器としては、注射器のシリンダー、
バケツ、各種台所用、厨房用の容器、筆記具立て、文房
具用トレイ等の文房具容器等を挙げることができる。
[0010] The "surface" includes both the outer surface and the inner surface of the container. The containers are roughly classified into a closed container and an open container. Closed container holds objects,
It can be closed and stored, transported, and opened when using the contents.It can be opened and closed repeatedly, and it contains and stores objects and can be opened when using the contents. It can be broadly divided into disposable closed containers that are thrown away. As a closed-type container that can be repeatedly opened and closed, tanks for storing gasoline, chemicals, etc., beverages, seasonings,
Containers for accommodating cosmetics and the like, containers for accommodating foods, foods, and the like in general households, cafeterias, restaurants, and the like can be given. Examples of the disposable closed container include a drink pack for storing a drink such as milk, a retort pack for long-term storage of food, a pack for individual food packaging for selling food, and a drip pack. . As the open container, a syringe cylinder,
Examples include buckets, various kitchen and kitchen containers, writing implement stands, and stationery containers such as trays for stationery.

【0011】本発明に係る容器は、容器基体の表面の一
部又は全部に耐摩耗性、潤滑性を有する炭素膜が形成さ
れているため、その部分は他物品との滑りが良く、それ
により他物品との摩擦、接触により摩耗や傷が生じ難
い。さらに、該炭素膜が摩耗し難いことから良好な潤滑
性が長期にわたり維持される。また、該炭素膜はガスバ
リア性を有しているため、本発明に係る、特に密閉型の
容器では、容器の該炭素膜形成部分では外部から内部へ
或いは内部から外部へガスが透過し難く、内容物の揮発
や変質が抑制される。
In the container according to the present invention, since a carbon film having abrasion resistance and lubricity is formed on a part or the entire surface of the container base, the part has good slippage with other articles, and Wear and scratches are unlikely to occur due to friction and contact with other articles. Further, since the carbon film is hard to be worn, good lubricity is maintained for a long time. In addition, since the carbon film has a gas barrier property, according to the present invention, particularly in a closed container, it is difficult for gas to permeate from outside to inside or from inside to outside in the carbon film forming portion of the container, Volatilization and alteration of the contents are suppressed.

【0012】前記容器基体の表面の一部又は全部として
は、炭素膜を形成する目的によっても異なるが、他物品
との接触面や外表面等が考えられる。容器によっては必
要に応じ内表面に膜形成してもよい。本発明における容
器の基体は、少なくとも膜形成面が、樹脂、ゴムから選
ばれた少なくとも1種の有機材料からなるものであるこ
とが考えられる。
A part or all of the surface of the container substrate may be a contact surface with another article, an outer surface, or the like, depending on the purpose of forming the carbon film. Depending on the container, a film may be formed on the inner surface as needed. It is conceivable that at least the film-forming surface of the substrate of the container in the present invention is made of at least one organic material selected from a resin and a rubber.

【0013】この場合、ゴムとしては、天然ゴム、ブチ
ルゴム、エチレンプロピレンゴム、クロロプレンゴム、
塩素化ポリエチレンゴム、エピクロルヒドリンゴム、ア
クリルゴム、ニトリルゴム、ウレタンゴム、シリコンゴ
ム、フッ素ゴム等を例示できる。また、樹脂としては熱
硬化性樹脂、熱可塑性樹脂のいずれでも採用でき、熱硬
化性樹脂としては、フェノール・ホルムアルデヒド樹
脂、尿素樹脂、メラミン・ホルムアルデヒド樹脂、エポ
キシ樹脂、フラン樹脂、キシレン樹脂、不飽和ポリエス
テル樹脂、シリコーン樹脂、ジアリルフタレート樹脂等
を例示できる。
In this case, the rubber includes natural rubber, butyl rubber, ethylene propylene rubber, chloroprene rubber,
Examples thereof include chlorinated polyethylene rubber, epichlorohydrin rubber, acrylic rubber, nitrile rubber, urethane rubber, silicone rubber, and fluoro rubber. In addition, as the resin, any of a thermosetting resin and a thermoplastic resin can be adopted, and as the thermosetting resin, phenol / formaldehyde resin, urea resin, melamine / formaldehyde resin, epoxy resin, furan resin, xylene resin, unsaturated resin Examples thereof include a polyester resin, a silicone resin, and a diallyl phthalate resin.

【0014】熱可塑性樹脂では、ビニル系樹脂(ポリ塩
化ビニル、ポリ2塩化ビニル、ポリビニルブチレート、
ポリビニルアルコール、ポリ酢酸ビニル、ポリビニルホ
ルマール等)、ポリ塩化ビニリデン、塩素化ポリエーテ
ル、ポリエステル系樹脂(ポリスチレン、スチレン・ア
クリロニトリル共重合体等)、ABS、ポリエチレン、
ポリプロピレン、ポリアセタール、アクリル系樹脂(ポ
リメチルメタクリレート、変性アクリル等)、ポリアミ
ド系樹脂(ナイロン6、66、610、11等)、セル
ロース系樹脂(エチルセルロース、酢酸セルロース、プ
ロピルセルロース、酢酸・酪酸セルロース、硝酸セルロ
ース等)、ポリカーボネート、フェノキシ系樹脂、フッ
素系樹脂(3フッ化塩化エチレン、4フッ化エチレン、
4フッ化エチレン・6フッ化プロピレン、フッ化ビニリ
デン等の樹脂)、ポリウレタン等を例示できる。
As the thermoplastic resin, vinyl resins (polyvinyl chloride, polyvinyl dichloride, polyvinyl butyrate,
Polyvinyl alcohol, polyvinyl acetate, polyvinyl formal, etc.), polyvinylidene chloride, chlorinated polyether, polyester resin (polystyrene, styrene / acrylonitrile copolymer, etc.), ABS, polyethylene,
Polypropylene, polyacetal, acrylic resin (polymethyl methacrylate, modified acrylic, etc.), polyamide resin (nylon 6, 66, 610, 11, etc.), cellulose resin (ethyl cellulose, cellulose acetate, propyl cellulose, cellulose acetate / butyrate, nitric acid) Cellulose, etc.), polycarbonate, phenoxy resin, fluorine resin (ethylene trifluoride, ethylene tetrafluoride,
Resins such as ethylene tetrafluoride / hexafluoropropylene and vinylidene fluoride), and polyurethane.

【0015】本発明における炭素膜としては、代表例と
してDLC(Diamond Like Carbon)(ダイヤモンド状炭
素)膜を挙げることができる。DLC膜は、潤滑性良好
であり、また、他物品との摩擦により摩耗し難く、且
つ、その厚さを調整することにより、基体が柔軟性を有
するものである場合にも該基体本来の柔軟性を損なわな
い程度にすることができる、適度な硬度を有する炭素膜
である。また、ガスバリア性が良好である。また、その
厚さを調整することにより光を透過できるため、容器表
面に形成しても内容物が見えるものとすることができ
る。さらに、比較的低温で形成できる等、成膜を容易に
行うことができる。
A typical example of the carbon film in the present invention is a DLC (Diamond Like Carbon) (diamond-like carbon) film. The DLC film has good lubricity, is hard to be worn due to friction with other articles, and can be adjusted to a thickness so that the base material has flexibility. It is a carbon film having an appropriate hardness that can be reduced to the extent that the properties are not impaired. Further, the gas barrier property is good. Further, since light can be transmitted by adjusting the thickness, the contents can be seen even when formed on the surface of the container. Further, the film can be easily formed, for example, the film can be formed at a relatively low temperature.

【0016】いずれにしても前記炭素膜の膜厚は、基体
上に密着性良好に形成でき、さらに基体の保護膜として
十分機能できるとともに、基体が柔軟性を有するもので
ある場合にも該基体本来の柔軟性を損なわない範囲内で
あればよい。また、本発明に係る容器の製造方法におい
て、前記炭素膜形成に先立ち、前処理として、前記各基
体の膜形成面をそれぞれ前処理用ガス、例えばフッ素
(F)含有ガス、水素(H2 )ガス及び酸素(O2 )ガ
スから選ばれた少なくとも1種の前処理用ガスのプラズ
マに曝すことが考えられる。
In any case, the thickness of the carbon film can be formed on the substrate with good adhesion and can sufficiently function as a protective film for the substrate, and even when the substrate is flexible. What is necessary is just to be in the range which does not impair the original flexibility. Further, in the method for manufacturing a container according to the present invention, prior to the formation of the carbon film, as a pre-treatment, a film-forming surface of each of the substrates is pre-treated with a pre-treatment gas, for example, a fluorine (F) -containing gas, hydrogen (H 2 ). Exposure to plasma of at least one pretreatment gas selected from a gas and an oxygen (O 2 ) gas may be considered.

【0017】前記フッ素含有ガスとしては、フッ素(F
2 )ガス、3フッ化窒素(NF3 )ガス、6フッ化硫黄
(SF6 )ガス、4フッ化炭素(CF4 )ガス、4フッ
化ケイ素(SiF4 )ガス、6フッ化2ケイ素(Si2
6 )ガス、3フッ化塩素(ClF3 )ガス、フッ化水
素(HF)ガス等を挙げることができる。前記各基体
を、それぞれ前記前処理用ガスのプラズマに曝すことに
より、基体表面が清浄化され、又はさらに基体表面粗度
が向上する。これらは、炭素膜の密着性向上に寄与し、
高密着性炭素膜を得ることができる。
As the fluorine-containing gas, fluorine (F
2 ) gas, nitrogen trifluoride (NF 3 ) gas, sulfur hexafluoride (SF 6 ) gas, carbon tetrafluoride (CF 4 ) gas, silicon tetrafluoride (SiF 4 ) gas, disilicon hexafluoride ( Si 2
F 6 ) gas, chlorine trifluoride (ClF 3 ) gas, hydrogen fluoride (HF) gas and the like. By exposing each of the substrates to the plasma of the pretreatment gas, the substrate surface is cleaned or the substrate surface roughness is further improved. These contribute to improving the adhesion of the carbon film,
A highly adherent carbon film can be obtained.

【0018】また、容器基体の膜形成面がそれぞれゴ
ム、樹脂等の有機材料からなる場合、フッ素含有ガスプ
ラズマを採用するときは、これによって基体表面がフッ
素終端され、水素ガスプラズマを採用するときはこれに
よって基体表面が水素終端される。フッ素−炭素結合及
び水素−炭素結合は安定であるため、前記のように終端
処理することで膜中の炭素原子が基体表面部分のフッ素
原子又は水素原子と安定に結合を形成する。そしてこれ
らのことから、その後形成する炭素膜と前記基体との密
着性を向上させることができる。
When the film-forming surface of the container substrate is made of an organic material such as rubber or resin, when the fluorine-containing gas plasma is used, the surface of the substrate is terminated with fluorine and the hydrogen gas plasma is used. As a result, the substrate surface is terminated with hydrogen. Since the fluorine-carbon bond and the hydrogen-carbon bond are stable, by performing the termination treatment as described above, the carbon atoms in the film form a stable bond with the fluorine atoms or the hydrogen atoms on the substrate surface portion. From these facts, it is possible to improve the adhesion between the carbon film formed thereafter and the substrate.

【0019】また、酸素ガスプラズマを採用するとき
は、基体表面に付着した有機物等の汚れを特に効率良く
除去でき、これらのことからその後形成する炭素膜と前
記基体との密着性を向上させることができる。本発明方
法において、それぞれ炭素膜形成に先立って行うプラズ
マによる基体の前処理は、同種類のプラズマを用いて或
いは異なる種類のプラズマを用いて複数回行っても構わ
ない。例えば、容器基体の膜形成面がそれぞれゴム、樹
脂等の有機材料からなる場合、該基体を酸素ガスプラズ
マに曝した後、フッ素含有ガスプラズマ又は水素ガスプ
ラズマに曝し、その上に炭素膜を形成するときには、基
体表面がクリーニングされた後、該面がフッ素終端又は
水素終端されて、その後形成する炭素膜と該基体表面と
の密着性は非常に良好なものとなる。
Further, when oxygen gas plasma is employed, dirt such as organic substances adhering to the surface of the substrate can be particularly efficiently removed, and from these facts, the adhesion between the carbon film formed thereafter and the substrate can be improved. Can be. In the method of the present invention, the pretreatment of the substrate with the plasma performed prior to the formation of the carbon film may be performed a plurality of times using the same type of plasma or using different types of plasma. For example, when the film forming surface of the container substrate is made of an organic material such as rubber or resin, the substrate is exposed to oxygen gas plasma, and then exposed to fluorine-containing gas plasma or hydrogen gas plasma to form a carbon film thereon. In this case, after the surface of the substrate is cleaned, the surface is terminated with fluorine or hydrogen, and the adhesion between the carbon film formed thereafter and the surface of the substrate becomes very good.

【0020】また、本発明における炭素膜形成方法とし
ては、少なくともその膜形成面の材質としてゴム、樹脂
等の比較的耐熱性に劣る材料を用いた基体に熱的損傷を
与えない温度範囲で膜形成できる方法として、プラズマ
CVD法、スパッタリング法、イオンプレーティング法
等を挙げることができるが、特にプラズマCVD法を用
いる場合は、被成膜基体のプラズマによる前処理と炭素
膜形成とを同一の装置で行うことができる。
The method of forming a carbon film according to the present invention includes a method of forming a film in a temperature range that does not cause thermal damage to a substrate using at least a material having relatively low heat resistance such as rubber or resin as a material of the film forming surface. As a method that can be formed, a plasma CVD method, a sputtering method, an ion plating method, and the like can be given. In particular, when the plasma CVD method is used, the pretreatment of the substrate to be formed with plasma and the formation of the carbon film are the same. It can be done with the device.

【0021】プラズマCVD法により炭素膜を形成する
場合のプラズマ原料ガスとしては、炭素膜形成に一般に
用いられるメタン(CH4 )、エタン(C2 6 )、プ
ロパン(C3 8 )、ブタン(C4 10)、アセチレン
(C2 2 )、ベンゼン(C 6 6 )、4フッ化炭素
(CF4 )、6フッ化2炭素(C2 6 )等の炭素化合
物ガス、及び必要に応じて、これらの炭素化合物ガスに
キャリアガスとして水素ガス、不活性ガス等を混合した
ものを用いることができる。
A carbon film is formed by a plasma CVD method.
In this case, the plasma source gas is generally used for carbon film formation.
Methane used (CHFour), Ethane (CTwoH6),
Lopin (CThreeH8), Butane (CFourHTen),acetylene
(CTwoHTwo), Benzene (C 6H6) Carbon tetrafluoride
(CFFour), Dicarbon hexafluoride (CTwoF6) Etc.
Gas and, if necessary, these carbon compound gases
Hydrogen gas, inert gas, etc. were mixed as carrier gas
Can be used.

【0022】プラズマCVD法により炭素膜を形成する
場合、成膜圧力を100mTorr程度とし、成膜温度
を100℃以下にするとDLC膜が形成される。成膜温
度を高くするほど形成される膜の硬度が向上し、500
℃以上では非常に耐摩耗性に優れる炭素膜が形成され
る。900℃以上ではダイアモンド膜が形成される。本
発明の容器の製造方法において、該容器が例えば各種パ
ックのようにフィルム等の平面状の材料を組み立てて容
器にするものである場合は、該フィルム等に炭素膜を形
成した後組み立てて容器としてもよく、或いは容器とし
て組み立てた後その外表面等に炭素膜を形成してもよ
い。
When a carbon film is formed by a plasma CVD method, a DLC film is formed when the film forming pressure is set to about 100 mTorr and the film forming temperature is set to 100 ° C. or less. As the film formation temperature is increased, the hardness of the formed film is improved,
Above ° C, a carbon film with very excellent wear resistance is formed. At 900 ° C. or higher, a diamond film is formed. In the method for producing a container according to the present invention, when the container is a container formed by assembling a planar material such as a film such as various packs, the container is assembled after forming a carbon film on the film or the like. Alternatively, after assembling as a container, a carbon film may be formed on its outer surface or the like.

【0023】[0023]

【発明の実施の形態】以下、本発明の実施の形態を図面
を参照して説明する。図1は本発明に係る容器の製造に
用いることができる成膜装置の1例の概略構成を示す図
である。また、図2(A)は本発明に係る容器の1例
(注射器のシリンダー)の断面図であり、図2(B)は
本発明に係る容器の他の例(タンク)の断面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of an example of a film forming apparatus that can be used for manufacturing a container according to the present invention. FIG. 2A is a cross-sectional view of one example of the container (cylinder of a syringe) according to the present invention, and FIG. 2B is a cross-sectional view of another example of the container according to the present invention (tank). .

【0024】図1の装置は、排気装置11が付設された
真空チャンバ1を有し、チャンバ1内には電極2及びこ
れに対向する位置に電極3が設置されている。電極3は
接地され、電極2にはマッチングボックス22を介して
高周波電源23が接続されている。また、電極2にはそ
の上に支持される被成膜基体を成膜温度に加熱するため
のヒータ21が付設されている。また、チャンバ1には
ガス供給部4が付設されて、内部にプラズマ原料ガスを
導入できるようになっている。ガス供給部4には、マス
フローコントローラ411、412・・・及び弁42
1、422・・・を介して接続された1又は2以上のプ
ラズマ原料ガスのガス源431、432・・・が含まれ
る。
The apparatus shown in FIG. 1 has a vacuum chamber 1 provided with an exhaust device 11, in which an electrode 2 and an electrode 3 are provided at a position facing the electrode. The electrode 3 is grounded, and a high frequency power supply 23 is connected to the electrode 2 via a matching box 22. Further, the electrode 2 is provided with a heater 21 for heating the substrate on which the film is to be formed to a film forming temperature. Further, the chamber 1 is provided with a gas supply unit 4 so that a plasma source gas can be introduced therein. The gas supply unit 4 includes mass flow controllers 411, 412,.
., 432... Connected via 1, 422,.

【0025】この装置を用いて本発明に係る開放型の容
器(ここでは注射器シリンダー)を製造するにあたって
は、シリンダー基体S1を電極2上に配置し、排気装置
11の運転にてチャンバ1内部を所定の真空度にする。
次いで、ガス供給部4からチャンバ1内にフッ素含有ガ
ス、水素ガス及び酸素ガスのうち1種以上のガスを前処
理用ガスとして導入するとともに高周波電源23からマ
ッチングボックス22を介して電極2に高周波電力を供
給し、これにより前記導入した前処理用ガスをプラズマ
化し、該プラズマの下で基体S1の他物品との接触面
(ここでは内表面及び外表面の双方の面)S1´の処理
を行う。なお、この表面処理(前処理)は行うことが望
ましいが、必ずしも要しない。また、シリンダー基体は
ここではその内周面にも膜形成できる程度の大きさの開
口部を有するものである。
In manufacturing an open container (in this case, a syringe cylinder) according to the present invention using this apparatus, the cylinder base S1 is arranged on the electrode 2 and the inside of the chamber 1 is operated by operating the exhaust device 11. A predetermined degree of vacuum is set.
Next, one or more of a fluorine-containing gas, a hydrogen gas, and an oxygen gas are introduced into the chamber 1 from the gas supply unit 4 as a pretreatment gas, and high-frequency power is supplied from the high-frequency power source 23 to the electrode 2 via the matching box 22. An electric power is supplied, thereby converting the introduced pretreatment gas into plasma, and processing the contact surface (here, both the inner surface and the outer surface) S1 ′ of the substrate S1 with another article under the plasma. Do. Note that this surface treatment (pretreatment) is desirably performed, but is not necessarily required. Here, the cylinder base has an opening large enough to form a film also on its inner peripheral surface.

【0026】次いで、必要に応じてチャンバ1内を再び
真空引きした後、ガス供給部4からチャンバ1内に成膜
用原料ガスとして炭素化合物ガスを導入するとともに高
周波電源23から電極2に高周波電力を供給し、これに
より前記導入した炭素化合物ガスをプラズマ化し、該プ
ラズマの下で基体S1の他物品との接触面(ここでは内
表面及び外表面の双方の面)S1´に炭素膜を形成す
る。なお、基体表面処理及び膜形成を行う間、図示しな
い回転手段にて基体S1をその軸の回りに回転させ、基
体S1の内表面及び外表面全体に略均一に表面処理及び
膜形成が行われるようにする。
Next, if necessary, the inside of the chamber 1 is evacuated again, and then a carbon compound gas is introduced from the gas supply unit 4 into the chamber 1 as a raw material gas for film formation. Is supplied, whereby the introduced carbon compound gas is turned into plasma, and a carbon film is formed on the contact surface (here, both the inner surface and the outer surface) S1 'of the substrate S1 with another article under the plasma. I do. During the substrate surface treatment and the film formation, the substrate S1 is rotated around its axis by rotating means (not shown), and the surface treatment and the film formation are performed substantially uniformly on the entire inner surface and outer surface of the substrate S1. To do.

【0027】このようにして、図2(A)に示すよう
に、シリンダー基体S1の他物品との接触面(ピストン
と接触する内表面及びそれ以外の他物品と接触する外表
面の双方の面)S1´に炭素膜Fが形成された炭素膜被
覆シリンダーが得られる。また、この装置を用いて本発
明に係る密閉型の容器(ここではタンク 図2(B)参
照)を製造するにあたっても、前記シリンダーの製造と
同様にして、タンク基体S2の外表面S2´に前記表面
処理及び膜形成を行う。但し、基体S2の外表面S2′
に略均一に表面処理及び膜形成を行うために、基体S2
を回転させるのに代えて、一つの基体につき2回表面処
理を行った後2回成膜を行い、2回めの表面処理及び膜
形成は1回めにプラズマに曝され難かった面が十分にプ
ラズマに曝されるように基体の向きを変えて行うように
する。またこの場合も、表面処理(前処理)は行うこと
が望ましいが、必ずしも要しない。
In this manner, as shown in FIG. 2A, the contact surface of the cylinder base S1 with another article (both the inner surface in contact with the piston and the outer surface in contact with other articles other than the piston). 3.) A carbon film-coated cylinder having a carbon film F formed on S1 'is obtained. Further, in manufacturing the closed container (in this case, the tank shown in FIG. 2B) according to the present invention using this apparatus, the outer surface S2 ′ of the tank body S2 is formed in the same manner as in the manufacture of the cylinder. The surface treatment and film formation are performed. However, the outer surface S2 'of the base S2
In order to perform surface treatment and film formation substantially uniformly on the substrate S2,
Instead of rotating the substrate, the substrate is subjected to the surface treatment twice, and then the film is formed twice. The second surface treatment and the film formation are performed on the surface which was difficult to be exposed to the plasma in the first time. The orientation of the substrate is changed so that the substrate is exposed to the plasma. Also in this case, it is desirable to perform a surface treatment (pretreatment), but it is not always necessary.

【0028】このようにして、図2(B)に示すよう
に、タンク基体S2の外表面S2´に炭素膜Fが形成さ
れた炭素膜被覆タンクが得られる。また、本発明方法を
実施するにあたり、図1の装置に代えて図3に示す成膜
装置を用いることができ、この場合、基体が立体構造物
であるときにも該基体の表面に効率良く膜形成すること
ができる。
In this manner, as shown in FIG. 2B, a carbon film-coated tank having the carbon film F formed on the outer surface S2 'of the tank substrate S2 is obtained. In carrying out the method of the present invention, the film forming apparatus shown in FIG. 3 can be used instead of the apparatus shown in FIG. 1. In this case, even when the substrate is a three-dimensional structure, the surface of the substrate can be efficiently placed on the substrate. A film can be formed.

【0029】図3の装置は、誘導結合型のプラズマCV
D装置であり、真空容器1´を有しており、容器1´の
外周には誘導コイル電極5が巻回して設けられ、該電極
5両端にはマッチングボックス51及び高周波電源52
が接続されている。また、真空容器1´の外側には、被
成膜基体を成膜温度に加熱するためのヒータ21´が設
けられている。
The apparatus shown in FIG. 3 is an inductively coupled plasma CV.
D device, which has a vacuum container 1 ′, and an induction coil electrode 5 is wound around the outer periphery of the container 1 ′, and a matching box 51 and a high-frequency power supply 52 are provided at both ends of the electrode 5.
Is connected. A heater 21 ′ for heating the substrate on which the film is to be formed to a film forming temperature is provided outside the vacuum vessel 1 ′.

【0030】また、真空容器1´には排気装置11´を
接続してあるとともに、成膜用原料ガスのガス供給部4
´を接続してある。ガス供給部4´には、マスフローコ
ントローラ411´、412´・・・・及び弁421
´、422´・・・・を介して接続された1又は2以上
のプラズマ原料ガスを供給するガス源431´、432
´・・・・が含まれている。
An evacuation device 11 ′ is connected to the vacuum vessel 1 ′, and a gas supply unit 4 for a source gas for film formation is provided.
'Is connected. The gas supply unit 4 ′ includes mass flow controllers 411 ′, 412 ′,.
, 432 ',... Connected to each other through one or more plasma source gases 431', 432
It is included.

【0031】この装置を用いて本発明に係る容器を製造
するにあたっては、図1の装置を用いたシリンダー基体
S1及びタンク基体S2の表面処理及び炭素膜形成と同
様にし、但し、原料ガスのプラズマ化を誘導コイル電極
5への高周波電力の供給により行う。この場合も、表面
処理(前処理)は行うことが望ましいが、必ずしも要し
ない。
The production of the container according to the present invention using this apparatus is performed in the same manner as the surface treatment of the cylinder base S1 and the tank base S2 and the formation of the carbon film using the apparatus shown in FIG. The conversion is performed by supplying high frequency power to the induction coil electrode 5. Also in this case, surface treatment (pretreatment) is desirably performed, but is not necessarily required.

【0032】次に、図1の装置を用いて、注射器シリン
ダー及びタンクの表面にDLC膜を形成した実施例を説
明する。 実施例1 前述した、図1の装置を用いたシリンダーの製造におい
て、前処理用ガスプラズマによる基体の前処理を行わ
ず、該基体の内表面及び外表面に直接DLC膜を形成し
た。
Next, an embodiment in which a DLC film is formed on the surfaces of a syringe cylinder and a tank using the apparatus shown in FIG. 1 will be described. Example 1 In the above-described production of a cylinder using the apparatus shown in FIG. 1, a DLC film was formed directly on the inner surface and the outer surface of the substrate without performing the pretreatment of the substrate with the pretreatment gas plasma.

【0033】 シリンダー基体材質 ポリカーボネイト サイズ 外径30mm(内径26mm)×100mm 高周波電極2サイズ 直径280mm 成膜条件 成膜用原料ガス メタン(CH4 ) 50sccm 高周波電力 周波数13.56MHz、150W 成膜圧力 0.1Torr 成膜時間 60min 成膜温度 25℃ 実施例2 前記実施例1において、成膜に先立ち、基体に次の条件
で水素ガスプラズマによる前処理を施した。成膜条件は
前記実施例1と同様とした。
Cylinder Substrate Material Polycarbonate Size Outer Diameter 30 mm (Inner Diameter 26 mm) × 100 mm High Frequency Electrode 2 Size Diameter 280 mm Deposition Conditions Deposition Material Gas Methane (CH 4 ) 50 sccm High Frequency Power Frequency 13.56 MHz, 150 W Deposition Pressure 0. 1 Torr Film forming time 60 min Film forming temperature 25 ° C. Example 2 Prior to the film forming, the substrate was subjected to a pretreatment with hydrogen gas plasma under the following conditions before film formation. The film forming conditions were the same as in Example 1.

【0034】 前処理条件 前処理用ガス 水素(H2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理圧力 0.1Torr 処理時間 5min 実施例3 前記実施例1において、成膜に先立ち、基体に次の条件
でフッ素化合物ガスプラズマによる前処理を施した。成
膜条件は前記実施例1と同様とした。
Pretreatment Conditions Pretreatment Gas Hydrogen (H 2 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Processing Pressure 0.1 Torr Processing Time 5 min Example 3 In Example 1, prior to film formation, Pretreatment with a fluorine compound gas plasma was performed under the conditions. The film forming conditions were the same as in Example 1.

【0035】 前処理条件 前処理用ガス 6フッ化硫黄(SF6 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理圧力 0.1Torr 処理時間 5min 実施例4 前記実施例1において、成膜に先立ち、基体に次の条件
で酸素ガスプラズマによる第1の前処理を施し、さらに
水素ガスプラズマによる第2の前処理を施した。成膜条
件は前記実施例1と同様とした。
Pretreatment Conditions Pretreatment Gas Sulfur Hexafluoride (SF 6 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Processing Pressure 0.1 Torr Processing Time 5 min Example 4 In Example 1, prior to film formation, Was subjected to a first pretreatment with oxygen gas plasma under the following conditions, and further subjected to a second pretreatment with hydrogen gas plasma. The film forming conditions were the same as in Example 1.

【0036】 第1前処理条件 前処理用ガス 酸素(O2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理圧力 0.1Torr 処理時間 5min 第2前処理条件 前処理用ガス 水素(H2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理圧力 0.1Torr 処理時間 5min 実施例5 前記実施例1において、成膜に先立ち、基体に次の条件
で酸素ガスプラズマによる第1の前処理を施し、さらに
フッ素化合物ガスプラズマによる第2の前処理を施し
た。成膜条件は前記実施例1と同様とした。
First Pretreatment Condition Pretreatment Gas Oxygen (O 2 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Treatment Pressure 0.1 Torr Treatment Time 5 min Second Pretreatment Condition Pretreatment Gas Hydrogen (H 2 ) 100 sccm High Frequency Power frequency 13.56 MHz, 300 W Processing pressure 0.1 Torr Processing time 5 min Example 5 In Example 1, prior to film formation, the substrate was subjected to the first pretreatment with oxygen gas plasma under the following conditions, and further a fluorine compound A second pretreatment with gas plasma was performed. The film forming conditions were the same as in Example 1.

【0037】 第1前処理条件 前処理用ガス 酸素(O2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理圧力 0.1Torr 処理時間 5min 第2前処理条件 前処理用ガス 6フッ化硫黄(SF6 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理圧力 0.1Torr 処理時間 5min 実施例6 前述した、図1の装置を用いたタンクの製造において、
前処理用ガスプラズマによる基体の前処理を行わず、該
基体の外表面に直接DLC膜を形成した。
First Pretreatment Condition Pretreatment Gas Oxygen (O 2 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Treatment Pressure 0.1 Torr Treatment Time 5 min Second Pretreatment Condition Pretreatment Gas Sulfur Hexafluoride (SF 6 100 sccm High frequency power Frequency 13.56 MHz, 300 W Processing pressure 0.1 Torr Processing time 5 min Example 6 In the manufacture of the tank using the apparatus of FIG.
The DLC film was formed directly on the outer surface of the substrate without performing the pretreatment of the substrate with the pretreatment gas plasma.

【0038】 タンク基体材質 ポリプロピレン サイズ 300mm×400mm×高さ200mm 高周波電極2サイズ 600mm平方 成膜条件 成膜用原料ガス メタン(CH4 ) 50sccm 高周波電力 周波数13.56MHz、150W 成膜圧力 0.1Torr 成膜時間 60min 成膜温度 25℃ 次に、前記実施例1により得られたDLC膜被覆シリン
ダー、潤滑剤を浸透させたシリンダー基体(比較例
1)、前記実施例6により得られたDLC膜被覆タンク
及び潤滑剤を浸透させたタンク基体(比較例2)につい
て、アルミニウム材との摩擦係数を評価した。摩擦係数
は、物品表面に先端曲率R18mmのアルミニウムから
なるピン状物品の先端部を当接させ、且つ、該ピン状物
品に10gの荷重をかけた状態でこのピンを20mm/
secの速度で移動させたときの値を測定した。結果を
次表に示す。
Tank base material Polypropylene Size 300 mm × 400 mm × Height 200 mm High-frequency electrode 2 size 600 mm square Deposition conditions Deposition material gas Methane (CH 4 ) 50 sccm High-frequency power Frequency 13.56 MHz, 150 W Deposition pressure 0.1 Torr Next, a DLC film-coated cylinder obtained in Example 1 above, a cylinder substrate impregnated with a lubricant (Comparative Example 1), and a DLC film-coated tank obtained in Example 6 The coefficient of friction with the aluminum material was evaluated for the tank substrate (Comparative Example 2) impregnated with the lubricant. The coefficient of friction was determined by contacting the tip of a pin-shaped article made of aluminum with a tip curvature R of 18 mm against the article surface, and applying a load of 10 g to the pin-shaped article.
The value at the time of moving at a speed of sec was measured. The results are shown in the following table.

【0039】 摩擦係数 1回摩擦後 1000回摩擦後 実施例1 2.64 2.66 比較例1 3.50 10.4 実施例6 1.22 1.35 比較例2 3.40 6.8 このように、基体に潤滑剤を浸透させた比較例1及び2
では摩擦開始直後は摩擦係数が比較的小さかったが、1
000回摩擦後には摩擦係数が増大した。一方、本発明
実施例1及び6では、1000回摩擦後にも摩擦係数の
増大は見られず、良好な潤滑性が維持された。
Coefficient of friction After 1 rub After 1000 rubs Example 1 2.64 2.66 Comparative Example 1 3.50 10.4 Example 6 1.22 1.35 Comparative Example 2 3.40 6.8 Comparative Examples 1 and 2 in which a lubricant was impregnated into a substrate
Although the friction coefficient was relatively small immediately after the start of friction,
After 000 rubs, the coefficient of friction increased. On the other hand, in Examples 1 and 6 of the present invention, no increase in the friction coefficient was observed even after 1000 times of friction, and good lubricity was maintained.

【0040】また、前記実施例1により得られたDLC
膜被覆シリンダー、膜形成していない未処理のシリンダ
ー基体(比較例3)、前記実施例6により得られたDL
C膜被覆タンク及び膜形成していない未処理のタンク基
体(比較例4)について、ヌープ硬度を測定した。ヌー
プ硬度は、実施例1及び6では2gヌープ硬度を測定
し、比較例3及び4では0.5gヌープ硬度を測定し
た。結果を次表に示す。
The DLC obtained in Example 1 was used.
Film-coated cylinder, untreated cylinder substrate with no film formed (Comparative Example 3), DL obtained in Example 6 above
The Knoop hardness was measured for the C film-coated tank and the untreated tank substrate on which no film was formed (Comparative Example 4). As for the Knoop hardness, in Examples 1 and 6, 2 g Knoop hardness was measured, and in Comparative Examples 3 and 4, 0.5 g Knoop hardness was measured. The results are shown in the following table.

【0041】 このように、DLC膜を形成した本発明実施例1のシリ
ンダー及び実施例6のタンクでは、それぞれDLC膜を
被覆していない比較例3のシリンダー基体及び実施例4
のタンク基体より硬度が高いことが分かる。
[0041] Thus, in the cylinder of Example 1 of the present invention and the tank of Example 6 in which the DLC film was formed, the cylinder substrate of Comparative Example 3 and the Example 4 which were not coated with the DLC film, respectively.
It can be seen that the hardness is higher than that of the tank substrate.

【0042】また、前記実施例1〜4によりそれぞれ得
られたDLC膜被覆シリンダーについて膜の密着性を評
価した。膜密着性は、基体上に形成された膜を1mm平
方の正方形状に区切り、そのうちの100についてテー
プを貼った後剥がしてどの程度膜が剥離するかを調べる
JISテープ剥離試験法(メッシュ法)により評価し
た。結果を次表に示す。
The adhesion of the DLC film-coated cylinders obtained in Examples 1 to 4 was evaluated. The film adhesion was measured by dividing the film formed on the substrate into squares of 1 mm square, JIS tape peeling test method (mesh method) for examining how much of the film was peeled after applying a tape to 100 of them. Was evaluated. The results are shown in the following table.

【0043】 このように、DLC膜形成に先立ち基体表面にプラズマ
による前処理を施した実施例2〜4の方が、前処理を施
さない実施例1より膜密着性は高かった。
[0043] As described above, in Examples 2 to 4 in which the pretreatment with the plasma was performed on the substrate surface prior to the formation of the DLC film, the film adhesion was higher than in Example 1 in which the pretreatment was not performed.

【0044】また、前記実施例1において用いたシリン
ダー基体と同じ厚さのポリカーボネイト試験片(板状)
に前記実施例1と同様の条件でDLC膜を形成したDL
C膜被覆試験片及び未処理の試験片について、透湿度
(水蒸気透過率)及び酸素透過率をそれぞれ測定した。
透湿度は、Mocon社製ガス透過率測定装置を用い、
25℃の温度下で、試験片の一方の空間の相対湿度を1
00%とし、試験片の他方の空間の相対湿度をほぼ0%
として、水蒸気の透過速度を測定することで評価した。
また、酸素透過率は、同様にMocon社製ガス透過率
測定装置を用い、25℃の温度下で、試験片の一方の空
間の酸素濃度を100%とし、試験片の他方の空間の酸
素濃度を0%として、酸素の透過速度を測定することで
評価した。結果を次表に示す。
Further, a polycarbonate test piece (plate shape) having the same thickness as the cylinder substrate used in Example 1 was used.
In which a DLC film was formed under the same conditions as in Example 1
The moisture permeability (water vapor transmission rate) and the oxygen transmission rate of the C film-coated test piece and the untreated test piece were measured, respectively.
The moisture permeability was measured using a gas permeability measuring device manufactured by Mocon.
At a temperature of 25 ° C., the relative humidity of one space of the test piece is 1
00%, and the relative humidity of the other space of the test piece is almost 0%.
Was evaluated by measuring the permeation rate of water vapor.
Similarly, the oxygen permeability was measured using a gas permeability measuring device manufactured by Mocon, at a temperature of 25 ° C., the oxygen concentration in one space of the test piece was set to 100%, and the oxygen concentration in the other space of the test piece was measured. Was set to 0%, and the oxygen permeation rate was measured to evaluate. The results are shown in the following table.

【0045】 透 湿 度 酸素透過率 (cc/m2/day) (cc/m2/day) DLC膜被覆試験片 0.9 1.2 未処理の試験片 12.5 14.0 このように、DLC膜を被覆した試験片ではDLC膜を
被覆していない試験片より、水蒸気及び酸素のいずれの
透過も抑制されていることが分かる。なお、ここでは、
ポリカーボネイトからなるシリンダーのガス透過性(ガ
スバリア性)を評価したが、タンク等の密閉型の容器に
ついても同様に、DLC膜を形成することによりガスバ
リア性が向上する。
Moisture permeability Oxygen permeability (cc / m 2 / day) (cc / m 2 / day) DLC film coated test piece 0.9 1.2 Untreated test piece 12.5 14.0 It can be seen that in the test piece coated with the DLC film, permeation of both water vapor and oxygen was suppressed as compared with the test piece not coated with the DLC film. Here,
The gas permeability (gas barrier property) of the cylinder made of polycarbonate was evaluated. Similarly, the gas barrier property of a closed container such as a tank is improved by forming a DLC film.

【0046】以上のことから、表面の一部又は全部に炭
素膜(特にDLC膜)を形成した本発明の容器は、その
部分の潤滑性、耐摩耗性及びガスバリア性に優れること
が分かる。なお、潤滑性については、該容器の他物品と
の潤滑性が悪いと他物品との接触、摩擦により摩耗、劣
化し易いことが問題となるところ、アルミニウムのよう
な比較的硬質の物品との潤滑性に優れる本発明の炭素膜
被覆容器は実用上十分な潤滑性を備えていると言える。
From the above, it can be seen that the container of the present invention in which a carbon film (particularly a DLC film) is formed on part or all of the surface is excellent in lubricity, abrasion resistance and gas barrier properties in that part. As for lubricity, if the lubricating property of the container is poor with other articles, contact and friction with other articles is likely to cause wear and deterioration. It can be said that the carbon film-coated container of the present invention having excellent lubricity has practically sufficient lubricity.

【0047】また、前処理を施した後形成した炭素膜は
密着性が優れることが分かる。
It can also be seen that the carbon film formed after the pre-treatment has excellent adhesion.

【0048】[0048]

【発明の効果】以上のように本発明によると、耐摩耗性
及び他物品との潤滑性に優れ、さらにガスバリア性に優
れる容器及びその製造方法を提供することができる。
As described above, according to the present invention, it is possible to provide a container excellent in abrasion resistance and lubricity with other articles, and further excellent in gas barrier properties, and a method for producing the same.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る容器の製造に用いることができる
成膜装置の1例の概略構成を示す図である。
FIG. 1 is a diagram showing a schematic configuration of an example of a film forming apparatus that can be used for manufacturing a container according to the present invention.

【図2】図(A)は本発明に係る容器の1例の断面図で
あり、図(B)は本発明に係る容器の他の例の断面図で
ある。
FIG. 2 (A) is a cross-sectional view of one example of the container according to the present invention, and FIG. 2 (B) is a cross-sectional view of another example of the container according to the present invention.

【図3】本発明に係る容器の製造に用いることができる
成膜装置の他の例の概略構成を示す図である。
FIG. 3 is a diagram showing a schematic configuration of another example of a film forming apparatus that can be used for manufacturing a container according to the present invention.

【符号の説明】[Explanation of symbols]

1、1´ 真空チャンバ 11、11´ 排気装置 2 高周波電極 21、21´ ヒータ 22、51 マッチングボックス 23、52 高周波電源 3 接地電極 4、4´ プラズマ原料ガス供給部 5 誘導コイル電極 S1 容器(シリンダー)基体 S1′ 基体S1の他物品との接触面 S2 容器(タンク)基体 S2′ 基体S2の外表面 F 炭素膜 DESCRIPTION OF SYMBOLS 1, 1 'Vacuum chamber 11, 11' Exhaust device 2 High frequency electrode 21, 21 'Heater 22, 51 Matching box 23, 52 High frequency power supply 3 Ground electrode 4, 4' Plasma raw material gas supply part 5 Induction coil electrode S1 Container (cylinder) ) Base S1 'Contact surface of base S1 with other articles S2 Container (tank) base S2' Outer surface of base S2 F Carbon film

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 表面の一部又は全部に耐摩耗性、潤滑性
及びガスバリア性のある炭素膜が形成されていることを
特徴とする容器。
1. A container characterized in that a carbon film having abrasion resistance, lubricity and gas barrier properties is formed on part or all of the surface.
【請求項2】 前記炭素膜がDLC膜である請求項1記
載の容器。
2. The container according to claim 1, wherein said carbon film is a DLC film.
【請求項3】 前記容器の基体の膜形成面が有機材料か
らなるものである請求項1又は2記載の容器。
3. The container according to claim 1, wherein the film forming surface of the substrate of the container is made of an organic material.
【請求項4】 表面の一部又は全部に耐摩耗性、潤滑性
及びガスバリア性のある炭素膜を形成する工程を含むこ
とを特徴とする容器の製造方法。
4. A method for producing a container, comprising a step of forming a carbon film having abrasion resistance, lubricity and gas barrier properties on part or all of the surface.
【請求項5】 前記炭素膜形成に先立ち、前処理とし
て、前記容器の基体の膜形成面をフッ素(F)含有ガ
ス、水素(H2 )ガス及び酸素(O2 )ガスから選ばれ
た少なくとも1種のガスのプラズマに曝す請求項4記載
の容器の製造方法。
5. Prior to the formation of the carbon film, as a pre-treatment, a film-forming surface of the substrate of the container is at least one selected from a fluorine (F) -containing gas, a hydrogen (H 2 ) gas and an oxygen (O 2 ) gas. The method for producing a container according to claim 4, wherein the container is exposed to a plasma of one kind of gas.
【請求項6】 前記炭素膜をプラズマCVD法により形
成する請求項4又は5記載の容器の製造方法。
6. The method according to claim 4, wherein the carbon film is formed by a plasma CVD method.
【請求項7】 前記炭素膜をDLC膜とする請求項4、
5又は6記載の容器の製造方法。
7. The method according to claim 4, wherein the carbon film is a DLC film.
7. The method for producing a container according to 5 or 6.
【請求項8】 前記容器の基体の膜形成面が有機材料か
らなるものである請求項4から7のいずれかに記載の容
器の製造方法。
8. The method for manufacturing a container according to claim 4, wherein the film-forming surface of the substrate of the container is made of an organic material.
JP9275706A 1997-10-08 1997-10-08 Container and its production Pending JPH11106920A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9275706A JPH11106920A (en) 1997-10-08 1997-10-08 Container and its production

Publications (1)

Publication Number Publication Date
JPH11106920A true JPH11106920A (en) 1999-04-20

Family

ID=17559241

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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