JPH10183264A - Method for recovering copper from glass epoxy substrate - Google Patents
Method for recovering copper from glass epoxy substrateInfo
- Publication number
- JPH10183264A JPH10183264A JP33972896A JP33972896A JPH10183264A JP H10183264 A JPH10183264 A JP H10183264A JP 33972896 A JP33972896 A JP 33972896A JP 33972896 A JP33972896 A JP 33972896A JP H10183264 A JPH10183264 A JP H10183264A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- sulfuric acid
- substrate
- glass epoxy
- acid solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 113
- 239000000758 substrate Substances 0.000 title claims abstract description 105
- 239000010949 copper Substances 0.000 title claims abstract description 101
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 101
- 239000004593 Epoxy Substances 0.000 title claims abstract description 56
- 239000011521 glass Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 40
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 219
- 238000001914 filtration Methods 0.000 claims abstract description 19
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000000243 solution Substances 0.000 claims description 50
- 239000007864 aqueous solution Substances 0.000 claims description 37
- 239000011889 copper foil Substances 0.000 claims description 12
- 238000007654 immersion Methods 0.000 claims description 10
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- 239000002699 waste material Substances 0.000 abstract description 16
- 238000004806 packaging method and process Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 238000011084 recovery Methods 0.000 description 14
- 238000011282 treatment Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000012634 fragment Substances 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 239000011345 viscous material Substances 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910000365 copper sulfate Inorganic materials 0.000 description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 238000004064 recycling Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 229920006361 Polyflon Polymers 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 238000009388 chemical precipitation Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229960004643 cupric oxide Drugs 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Manufacture And Refinement Of Metals (AREA)
- Processing Of Solid Wastes (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、廃プリント基板からの
銅の回収方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for recovering copper from waste printed circuit boards.
【0002】[0002]
【従来の技術】近年、廃家電製品の廃棄量の増加が社会
問題になっており、その主な原因として、製品中に含ま
れるプリント基板の難リサイクル性が挙げられる。プリ
ント基板は、金属、プラスチック、ガラスが強固に付着
した複合材料であるため、これらを分別することが非常
に困難である。そのため、廃棄時は、シュレッダー等に
より粉砕してそのまま埋立廃棄するしかなく、廃家電製
品の廃棄量の増加の原因となっている。そこで、廃プリ
ント基板から、金属、プラスチック、ガラスを分離する
技術が確立されれば、廃家電製品の廃棄量の減少に大き
く貢献することになる。また、プリント基板上には、有
価金属である銅が多量に含まれており、これを回収でき
れば、省資源という点で非常に有効である。したがっ
て、廃プリント基板から金属、プラスチック、ガラスを
分離し、さらに銅を回収する方法の確立が求められてい
る。2. Description of the Related Art In recent years, an increase in the amount of discarded home electric appliances has become a social problem. One of the main causes is the difficulty in recycling printed circuit boards contained in products. Since a printed circuit board is a composite material to which metal, plastic, and glass are firmly attached, it is very difficult to separate them. Therefore, at the time of disposal, there is no other choice but to crush it with a shredder or the like and dispose of it in landfill, causing an increase in the amount of discarded home electric appliances. Therefore, if a technology for separating metal, plastic, and glass from a waste printed circuit board is established, it will greatly contribute to the reduction in the amount of waste home appliances. Further, a large amount of copper, which is a valuable metal, is contained on a printed circuit board, and if this can be recovered, it is very effective in saving resources. Therefore, it is required to establish a method of separating metal, plastic, and glass from a waste printed circuit board and recovering copper.
【0003】現在、廃プリント基板からの銅の回収方法
はいくつか提案されている。以下に代表的なものを挙げ
る。「部品実装プリント基板の再資源化技術の開発」
(表面実装技術1996年1月号)に記載された回収方
法は、プリント基板の実装部品を加熱・衝撃によって分
離後、粉砕した廃プリント基板から、比重分離、および
静電分離によって銅を回収する方法である。この方法
は、大がかりな装置が必要であり、回収に要するコスト
が大きいこと、また、回収した銅にガラス粉や樹脂分が
混入する等の問題を有していた。At present, several methods for recovering copper from waste printed circuit boards have been proposed. The following are representative ones. "Development of recycling technology for component mounted printed circuit boards"
The recovery method described in (Surface Mount Technology January 1996) separates the mounted parts of the printed circuit board by heating and impact, and then recovers copper from the crushed waste printed circuit board by specific gravity separation and electrostatic separation. Is the way. This method has a problem that a large-scale apparatus is required, the cost required for recovery is large, and glass powder and resin are mixed in the recovered copper.
【0004】また、「平成7年度 ”金属・プラスチッ
ク分離技術研究会”報告」(資源リサイクルシステムセ
ンター)に記載された回収方法は、実装部品を加熱・衝
撃により分離後、粉砕した廃プリント基板を硫酸水溶液
に浸漬して、基板上から銅を溶解分離させ、硫酸水溶液
中に溶解した銅を電解回収または化学沈澱回収により回
収する方法であるる。この方法では、銅を基板から分離
する際、高価な過酸化水素を硫酸水溶液中に継続的に添
加しなければならず、溶剤にかかるコストが大きいとい
う問題を有していた。また、銅の回収工程において、電
解回収では、設備投資および装置の運転に莫大な費用が
かかるという問題を有している。一方、化学沈澱回収で
は、中和時に硫酸水溶液、および中和剤のアルカリが消
費されるため、消耗品に要するコストが大きいという問
題を有していた。[0004] The recovery method described in the "Report of the 1995" Metals and Plastics Separation Technology Research Group "" (Resource Recycling System Center) uses a method of separating the mounted components by heating and impact, and then grinding the waste printed circuit boards. This is a method in which copper is dissolved and separated from the substrate by immersion in a sulfuric acid aqueous solution, and copper dissolved in the sulfuric acid aqueous solution is recovered by electrolytic recovery or chemical precipitation recovery. In this method, when copper is separated from the substrate, expensive hydrogen peroxide must be continuously added to the aqueous sulfuric acid solution, and there is a problem that the cost for the solvent is large. Further, in the copper recovery process, the electrolytic recovery has a problem that enormous costs are required for capital investment and operation of the apparatus. On the other hand, in the recovery of the chemical precipitate, the sulfuric acid aqueous solution and the alkali of the neutralizing agent are consumed during the neutralization, so that there is a problem that the cost required for consumables is large.
【0005】[0005]
【発明が解決しようとする課題】従来提案されている廃
プリント基板からの銅の回収方法は、上記のように、回
収に要するコストが膨大であり、実用性に欠けるという
問題を有していた。本発明は、廃プリント基板、特にガ
ラスエポキシ基板から銅を簡単に、かつ低コストで回収
する方法を提供することを目的とする。The method of recovering copper from a waste printed circuit board which has been conventionally proposed has a problem that the cost required for recovery is enormous and lacks practicality as described above. . An object of the present invention is to provide a method for easily and inexpensively recovering copper from a waste printed circuit board, particularly a glass epoxy board.
【0006】[0006]
【課題を解決するための手段】上記課題を解決するため
に、本発明の第一の方法は、少なくとも銅箔が表面に配
置されているガラスエポキシ基板を、60℃以上130
℃未満に加温した70重量%以上の硫酸を含む硫酸水溶
液に浸漬し、生成した硫化銅を濾過により回収すること
により、ガラスエポキシ基板上の銅を回収するものであ
る。本発明の第二の方法は、少なくとも銅箔が表面に配
置されているガラスエポキシ基板を、40℃以上60℃
未満に加温した70重量%以上の硫酸を含む硫酸水溶液
に浸漬し、その後、前記基板から剥離した銅を回収する
ことにより、ガラスエポキシ基板上の銅を回収するもの
である。上記の方法において、ガラスエポキシ基板を硫
酸水溶液に浸漬するに先立って、銅箔が表面に配置され
ている電極面を削って破片とし、これを硫酸水溶液に浸
漬するのが好ましい。Means for Solving the Problems In order to solve the above problems, a first method of the present invention is to prepare a glass epoxy substrate having at least a copper foil on a surface thereof at a temperature of 60.degree.
The copper on the glass epoxy substrate is collected by immersing in a sulfuric acid aqueous solution containing 70% by weight or more of sulfuric acid heated to a temperature lower than 70 ° C. and collecting the generated copper sulfide by filtration. In the second method of the present invention, a glass epoxy substrate having at least a copper foil disposed on a surface thereof is heated to 40 ° C. or more and 60 ° C.
The copper on the glass epoxy substrate is recovered by immersing it in a sulfuric acid aqueous solution containing 70% by weight or more of sulfuric acid heated to less than 10%, and then recovering the copper separated from the substrate. In the above method, prior to immersing the glass epoxy substrate in the aqueous sulfuric acid solution, it is preferable to scrape the electrode surface on which the copper foil is disposed on the surface into fragments and immerse the fragments into the aqueous sulfuric acid solution.
【0007】[0007]
【発明の実施の形態】濃硫酸は、200℃程度以上の高
温で強力な酸化力を有するため、銅を溶解することが一
般的に知られている。本発明の第一の方法は、硫酸水溶
液中の硫酸濃度および硫酸温度を調節して、硫酸水溶液
の酸化力を上記よりも低くすることにより、銅を溶解さ
せることなく硫化銅に変えて沈澱させ、基板から銅を濾
過分離する方法である。この方法によると、少なくとも
銅箔が表面に配置されている廃プリント基板を、60℃
以上130℃未満に加温した70重量%以上の硫酸水溶
液に浸漬すると、基板上の銅が固体粉末状の酸化第二銅
に酸化され、硫酸水溶液中に剥落して基板から分離す
る。この際、はんだは硫酸水溶液中に溶解して基板から
分離する。次いで、硫酸水溶液の底に沈澱した酸化第二
銅を濾過分離することにより、ガラスエポキシ基板上の
銅を回収する。この方法では、銅を基板から分離する
際、溶剤として安価な硫酸のみを用いるため、溶剤にか
かるコストが低い。また、銅の回収工程においても、銅
を濾過分離により容易に回収できるため、電解回収のよ
うな大がかりな設備が不要であり、また、化学沈澱回収
のような中和時に要する溶剤消費がない。DESCRIPTION OF THE PREFERRED EMBODIMENTS Since concentrated sulfuric acid has a strong oxidizing power at a high temperature of about 200 ° C. or higher, it is generally known to dissolve copper. In the first method of the present invention, by adjusting the sulfuric acid concentration and the sulfuric acid temperature in the aqueous sulfuric acid solution to make the oxidizing power of the aqueous sulfuric acid solution lower than that described above, copper is converted into copper sulfide without dissolving and precipitated. A method of filtering and separating copper from a substrate. According to this method, at least a waste printed board on which a copper foil is disposed
When immersed in an aqueous sulfuric acid solution of 70% by weight or more heated to a temperature of less than 130 ° C., copper on the substrate is oxidized into cupric oxide in the form of solid powder, and falls off in the aqueous sulfuric acid solution to be separated from the substrate. At this time, the solder is dissolved in the aqueous sulfuric acid solution and separated from the substrate. Next, copper on the glass epoxy substrate is recovered by filtering and separating the cupric oxide precipitated at the bottom of the aqueous sulfuric acid solution. In this method, when copper is separated from the substrate, only inexpensive sulfuric acid is used as a solvent, so that the cost for the solvent is low. Also, in the copper recovery step, copper can be easily recovered by filtration and separation, so that large-scale equipment such as electrolytic recovery is not required, and there is no solvent consumption required for neutralization such as chemical precipitation recovery.
【0008】本発明の第二の方法は、第一の方法よりも
硫酸水溶液の酸化力を低くし、銅を酸化させずに、銅を
基材のガラスクロスと接着しているエポキシ樹脂のみを
酸化させ、エポキシを硫酸水溶液中に溶出させることに
より、基板と銅との接着力を低下させて、基板から銅を
剥離分離する方法である。この方法によると、少なくと
も銅箔が表面に配置されている廃プリント基板を、40
℃以上60℃未満に加温した70重量%以上の硫酸水溶
液に浸漬すると、基板樹脂のエポキシが硫酸中に全て溶
出し、銅をガラスクロスから剥離回収することができ
る。この方法では、銅を基板から分離する際、溶剤とし
て安価な硫酸のみを用いるため、溶剤にかかるコストが
低い。また、銅の回収工程において、銅を剥離により回
収できるため、大がかりな設備が不要であり、中和のた
めの溶剤消費がない。さらに、銅をそのまま回収できる
ために、第一の方法よりも銅のリサイクルが容易であ
り、より好ましい。In the second method of the present invention, the oxidizing power of the aqueous solution of sulfuric acid is made lower than that of the first method, and only the epoxy resin adhering the copper to the glass cloth of the base material without oxidizing the copper is used. This is a method of separating the copper from the substrate by oxidizing and dissolving the epoxy into the aqueous sulfuric acid solution, thereby reducing the adhesive force between the substrate and the copper. According to this method, at least the waste printed circuit board on which the copper foil is disposed on
When immersed in a 70% by weight or more aqueous sulfuric acid solution heated to 70 ° C. or more and less than 60 ° C., all the epoxy of the substrate resin is eluted in the sulfuric acid, and copper can be peeled and collected from the glass cloth. In this method, when copper is separated from the substrate, only inexpensive sulfuric acid is used as a solvent, so that the cost for the solvent is low. Further, since copper can be recovered by peeling in the copper recovery step, a large-scale facility is not required, and there is no consumption of a solvent for neutralization. Further, since copper can be recovered as it is, recycling of copper is easier and more preferable than the first method.
【0009】また、第一および第二の方法において、少
なくとも銅箔が表面に配置されているガラスエポキシ基
板の銅電極部を薄く削った破片を用いることにより、硫
酸水溶液で処理する基板樹脂のエポキシの量を減少させ
る。その結果、硫酸水溶液中に溶出するエポキシの量が
減少し、硫酸水溶液の寿命が伸びるため、第一及び第二
の方法よりも溶剤にかかるコストが低下するので、より
好ましい。Further, in the first and second methods, at least a copper electrode portion of a glass epoxy substrate having a copper foil disposed on a surface thereof is used by using a fragment obtained by thinly shaving the same, whereby epoxy resin of a substrate resin treated with a sulfuric acid aqueous solution is used. Decrease the amount of As a result, the amount of epoxy eluted in the aqueous sulfuric acid solution is reduced, and the life of the aqueous sulfuric acid solution is extended, so that the cost for the solvent is lower than in the first and second methods, which is more preferable.
【0010】なお、本発明に示した条件以外の条件を用
いた場合、以下のような問題が発生する場合があるた
め、本発明のガラスエポキシ基板からの銅の回収方法と
して適当ではない。 1)硫酸濃度について:本発明の第一の方法において、
硫酸水溶液中の硫酸濃度が70重量%未満の場合、基板
の銅が硫化銅に変化せず、基板から銅を沈澱分離できな
いまた、本発明の第二の方法において、硫酸水溶液中の
硫酸濃度が70重量%未満の場合、基板樹脂のエポキシ
が完全に硫酸水溶液中に溶出せず、基板から銅を剥離分
離できない。[0010] When conditions other than those described in the present invention are used, the following problems may occur, so that they are not suitable as a method for recovering copper from a glass epoxy substrate of the present invention. 1) Regarding the sulfuric acid concentration: In the first method of the present invention,
When the concentration of sulfuric acid in the aqueous sulfuric acid solution is less than 70% by weight, the copper on the substrate does not change to copper sulfide and copper cannot be precipitated and separated from the substrate. In the second method of the present invention, the concentration of sulfuric acid in the aqueous sulfuric acid solution is reduced. If the content is less than 70% by weight, the epoxy of the substrate resin is not completely eluted in the aqueous sulfuric acid solution, and copper cannot be separated from the substrate.
【0011】2)硫酸浸漬温度について:本発明の第一
の方法において、硫酸水溶液への浸漬温度が60℃未満
の場合、基板の銅が硫化銅に変化せず、基板から銅を沈
澱分離できない。一方、浸漬温度が130℃以上の場
合、銅が硫酸銅となって硫酸水溶液中に溶解するので、
銅を濾過回収することができない。本発明の第二の方法
において、硫酸水溶液への浸漬温度が40℃未満の場
合、基板樹脂のエポキシが十分に溶出せず、ガラスクロ
スから銅を完全に剥離できないの。また、浸漬温度が6
0℃以上130℃未満の場合、基板上の銅が硫化銅に変
化するため、不適当である。さらに、浸漬温度が130
℃以上の場合、銅が硫酸銅となって硫酸水溶液中に溶解
し、銅を濾過回収することができないため。2) Regarding the sulfuric acid immersion temperature: In the first method of the present invention, when the immersion temperature in the sulfuric acid aqueous solution is lower than 60 ° C., the copper on the substrate does not change into copper sulfide, and the copper cannot be precipitated and separated from the substrate. . On the other hand, when the immersion temperature is 130 ° C. or higher, copper becomes copper sulfate and dissolves in the sulfuric acid aqueous solution.
Copper cannot be recovered by filtration. In the second method of the present invention, when the immersion temperature in the aqueous sulfuric acid solution is less than 40 ° C., the epoxy of the substrate resin does not sufficiently elute, and copper cannot be completely removed from the glass cloth. When the immersion temperature is 6
When the temperature is 0 ° C. or higher and lower than 130 ° C., the copper on the substrate is changed to copper sulfide, which is not suitable. Further, when the immersion temperature is 130
If the temperature is higher than ℃, copper is converted to copper sulfate and dissolved in the aqueous solution of sulfuric acid, so that copper cannot be recovered by filtration.
【0012】本発明の対象とするガラスエポキシ基板
は、基板の表面部に少なくとも銅箔を有したガラスエポ
キシ基板であればよく、はんだ付けの有無、または部品
実装の有無は問題にしない。また、銅箔上にレジストが
ある場合、銅の分離回収の妨げとなることが予想される
が、レジストは硫酸浸漬中に溶解分離するため、あらか
じめレジストを除去する必要はない。したがって、本発
明は、使用後の電化製品中の廃プリント基板はもちろん
のこと、製造過程において不良となった、未実装基板や
実装済み基板等をそのまま適用できる。ただし、部品実
装基板の場合、硫酸浸漬中に部品が分離し、部品中の化
学物質が硫酸水溶液に混入する等の問題が発生する場合
があるため、実装部品の分離は硫酸浸漬前に行うことが
望ましい。そこで、以下の実施例では、表面部に銅箔を
有し、その上に部品実装が施されているガラスエポキシ
基板を、220℃に加熱し振動させることにより、実装
部品を分離したガラスエポキシ基板を処理に用いた。The glass epoxy substrate which is the object of the present invention may be a glass epoxy substrate having at least a copper foil on the surface of the substrate, and it does not matter whether soldering or component mounting is performed. In addition, when a resist is present on the copper foil, it is expected that it will hinder the separation and recovery of copper. However, since the resist is dissolved and separated during sulfuric acid immersion, it is not necessary to remove the resist in advance. Therefore, the present invention can be applied not only to a waste printed board in an electric appliance after use but also to an unmounted board or a mounted board which has become defective in a manufacturing process. However, in the case of component-mounted boards, components may separate during sulfuric acid immersion, causing problems such as mixing of chemical substances in the components into the sulfuric acid aqueous solution. Is desirable. Therefore, in the following embodiment, a glass epoxy substrate having a copper foil on a surface portion, on which a component is mounted, is heated to 220 ° C. and vibrated to separate the mounted component. Was used for processing.
【0013】[0013]
【実施例】以下に本発明の詳細な実施例および比較例を
示す。 《実施例1》実装部品を分離したガラスエポキシ基板
を、96重量%の硫酸水溶液中に100℃で3時間浸漬
した。その結果、基板上の銅は全て黒色の硫化銅に変化
して基板から分離し、硫酸水溶液中に沈澱した。一方、
硫酸水溶液は、基板樹脂のエポキシが多量に硫酸水溶液
中に溶出したため、硫酸水溶液は黒色の粘性物質とな
り、一部沈澱となった。沈澱をフッ素系の濾紙(ポリフ
ロンフィルターPF060:保留粒子径6μm、アドバ
ンティック東洋(株)製)を用いて濾過することによ
り、硫化銅沈澱を回収することができた。しかし、この
硫化銅沈澱にはエポキシが一部混入していたため、エポ
キシを分解させるために、200℃で30分熱処理を行
って純粋な硫化銅を得た。なお、上記濾過操作により、
エポキシの沈澱が除去され、硫酸水溶液は、黒色ではあ
るものの粘性が低くなり、再利用が可能となった。EXAMPLES Detailed examples and comparative examples of the present invention will be described below. Example 1 A glass epoxy substrate from which mounted components were separated was immersed in a 96% by weight aqueous sulfuric acid solution at 100 ° C. for 3 hours. As a result, all the copper on the substrate was changed to black copper sulfide, separated from the substrate, and precipitated in a sulfuric acid aqueous solution. on the other hand,
In the aqueous sulfuric acid solution, a large amount of the epoxy resin of the substrate was eluted into the aqueous sulfuric acid solution, so that the aqueous sulfuric acid solution became a black viscous substance and partially precipitated. The precipitate was filtered using a fluorine-based filter paper (Polyflon filter PF060: retained particle diameter: 6 μm, manufactured by Advantic Toyo) to recover the copper sulfide precipitate. However, since epoxy was partially mixed in the copper sulfide precipitate, a heat treatment was performed at 200 ° C. for 30 minutes to decompose the epoxy to obtain pure copper sulfide. In addition, by the above-mentioned filtration operation,
The sediment of the epoxy was removed, and the sulfuric acid aqueous solution was black, but had low viscosity, and could be reused.
【0014】《比較例1》実装部品を分離したガラスエ
ポキシ基板を、60重量%の硫酸水溶液中に100℃で
3時間浸漬した。その結果、基板上の銅は硫化銅に変化
せず、基板から分離しなかった。なお、基板樹脂のエポ
キシが多量に硫酸水溶液中に溶出したため、硫酸水溶液
は黒色の粘性物質となり、一部沈澱となった。このよう
に、硫酸水溶液中の硫酸濃度が70重量%未満の場合、
銅が酸化されないために、基板から銅を分離できない。
なお、処理後の硫酸水溶液を、フッ素系の濾紙(ポリフ
ロンフィルターPF060:保留粒子径6μm、アドバ
ンティック東洋(株)製)を用いて濾過することによ
り、エポキシの沈澱は除去され、硫酸水溶液は、黒色で
はあるものの、粘性が低くなり、再利用が可能となっ
た。Comparative Example 1 A glass epoxy substrate from which mounted components were separated was immersed in a 60% by weight aqueous sulfuric acid solution at 100 ° C. for 3 hours. As a result, the copper on the substrate did not change to copper sulfide and did not separate from the substrate. Since a large amount of the epoxy of the substrate resin was eluted in the aqueous sulfuric acid solution, the aqueous sulfuric acid solution became a black viscous substance and partially precipitated. Thus, when the sulfuric acid concentration in the aqueous sulfuric acid solution is less than 70% by weight,
Since the copper is not oxidized, the copper cannot be separated from the substrate.
The precipitated sulfuric acid solution was removed by filtering the aqueous sulfuric acid solution after the treatment using a fluorinated filter paper (Polyflon filter PF060: retaining particle diameter: 6 μm, manufactured by Advantic Toyo Co., Ltd.). Although it was black, its viscosity was low, and it could be reused.
【0015】《比較例2》実装部品を分離したガラスエ
ポキシ基板を、96重量%の硫酸水溶液中に30℃で3
時間浸漬した。その結果、基板上の銅は変化せず、基板
から分離しなかった。なお、基板樹脂のエポキシが多量
に硫酸水溶液中に溶出したため、硫酸水溶液は黒色の粘
性物質となった。このように、硫酸水溶液の温度が60
℃未満の場合、銅が酸化されないために、基板から銅を
分離できない。Comparative Example 2 A glass epoxy substrate from which mounted components were separated was placed in a 96% by weight sulfuric acid aqueous solution at 30 ° C. for 3 hours.
Soaked for hours. As a result, the copper on the substrate did not change and did not separate from the substrate. Since a large amount of the epoxy of the substrate resin was eluted in the aqueous sulfuric acid solution, the aqueous sulfuric acid solution became a black viscous substance. Thus, the temperature of the aqueous sulfuric acid solution is 60
If the temperature is lower than ° C, copper cannot be separated from the substrate because copper is not oxidized.
【0016】《比較例3》実装部品を分離したガラスエ
ポキシ基板を、60重量%の硫酸水溶液中に130℃で
3時間浸漬した。その結果、基板上の銅は硫酸銅となっ
て硫酸水溶液中に溶解し、基板から分離した。一方、硫
酸水溶液は、基板樹脂のエポキシが多量に硫酸水溶液中
に溶出したため、黒色の粘性物質となった。このよう
に、硫酸水溶液の温度が130℃以上の場合、銅が硫酸
水溶液中に溶解するため、銅の濾過回収ができない。Comparative Example 3 A glass epoxy substrate from which mounted components were separated was immersed in a 60% by weight aqueous sulfuric acid solution at 130 ° C. for 3 hours. As a result, the copper on the substrate turned into copper sulfate, dissolved in the aqueous sulfuric acid solution, and separated from the substrate. On the other hand, the sulfuric acid aqueous solution became a black viscous substance because a large amount of the epoxy of the substrate resin was eluted into the sulfuric acid aqueous solution. As described above, when the temperature of the aqueous sulfuric acid solution is 130 ° C. or higher, copper is dissolved in the aqueous sulfuric acid solution, so that the copper cannot be recovered by filtration.
【0017】《実施例2》実装部品を分離したガラスエ
ポキシ基板を、96重量%の硫酸水溶液中に60℃で2
0時間浸漬した。その結果、基板上の銅は他の化合物に
変化せず、端が浮き上がった状態になった。一方、硫酸
水溶液は、基板樹脂のエポキシが全て溶出したため、黒
色の粘性物質となった。次に、銅の端をピンセットで摘
み、引き剥すことにより、基板から銅を剥離回収するこ
とができた。なお、処理後の硫酸水溶液を、フッ素系の
濾紙(ポリフロンフィルターPF060:保留粒子径6
μm、アドバンティック東洋(株)製)を用いて濾過す
ることにより、エポキシの沈澱は除去され、硫酸水溶液
は、黒色ではあるものの、粘性が低くなり、再利用が可
能となった。<< Embodiment 2 >> A glass epoxy substrate from which mounted components were separated was placed in a 96% by weight sulfuric acid aqueous solution at 60 ° C. for 2 hours.
Dipped for 0 hours. As a result, the copper on the substrate did not change to another compound, and the end was in a state of rising. On the other hand, the sulfuric acid aqueous solution became a black viscous substance because all of the epoxy of the substrate resin was eluted. Next, the end of the copper was pinched with tweezers and peeled off, whereby copper could be peeled and collected from the substrate. The treated sulfuric acid aqueous solution was washed with a fluorine-based filter paper (Polyflon filter PF060: retaining particle size 6).
The precipitate was removed by filtration using a μm filter (manufactured by Advantic Toyo Co., Ltd.), and although the sulfuric acid aqueous solution was black, its viscosity was low, and it could be reused.
【0018】《比較例4》実装部品を分離したガラスエ
ポキシ基板を、60重量%の硫酸水溶液中に60℃で2
0時間浸漬した。その結果、基板上の銅は他の化合物に
変化しなかった。しかし、基板樹脂のエポキシがほとん
ど溶出せず、基板に残存していたため、基板と銅との接
着力が強く、銅が浮き上がらなかったので、基板から銅
をピンセットで引き剥すことはできなかった。このよう
に、硫酸水溶液中の硫酸濃度が70重量%未満の場合、
基板樹脂のエポキシが完全に硫酸水溶液中に溶出せず、
基板から銅を剥離回収できない。Comparative Example 4 A glass epoxy substrate from which mounted components were separated was placed in a 60% by weight sulfuric acid aqueous solution at 60 ° C. for 2 hours.
Dipped for 0 hours. As a result, the copper on the substrate did not change to another compound. However, since the epoxy of the substrate resin hardly eluted and remained on the substrate, the adhesive force between the substrate and copper was strong and the copper did not float, so that the copper could not be peeled off the substrate with tweezers. Thus, when the sulfuric acid concentration in the aqueous sulfuric acid solution is less than 70% by weight,
The epoxy of the substrate resin is not completely eluted in the aqueous sulfuric acid solution,
Copper cannot be peeled off from the substrate.
【0019】《比較例5》実装部品を分離したガラスエ
ポキシ基板を、96重量%の硫酸水溶液中に30℃で2
0時間浸漬した。その結果、基板上の銅は他の化合物に
変化しなかった。しかし、基板樹脂のエポキシがほとん
ど溶出せず、基板に残存していたため、基板と銅との接
着力が強く、銅が浮き上がらなかったので、基板から銅
をピンセットで引き剥すことはできなかった。このよう
に、硫酸水溶液の温度が40℃未満の場合、基板樹脂の
エポキシが完全に硫酸水溶液中に溶出しないため、基板
から銅を剥離回収できない。Comparative Example 5 A glass epoxy substrate from which mounted components were separated was placed in a 96% by weight aqueous sulfuric acid solution at 30 ° C. for 2 hours.
Dipped for 0 hours. As a result, the copper on the substrate did not change to another compound. However, since the epoxy of the substrate resin hardly eluted and remained on the substrate, the adhesive force between the substrate and copper was strong and the copper did not float, so that the copper could not be peeled off the substrate with tweezers. As described above, when the temperature of the sulfuric acid aqueous solution is lower than 40 ° C., the epoxy of the substrate resin is not completely eluted in the sulfuric acid aqueous solution, so that copper cannot be peeled and collected from the substrate.
【0020】《比較例6》実装部品を分離したガラスエ
ポキシ基板を、96重量%の硫酸水溶液中に70℃で2
0時間浸漬した。その結果、基板樹脂のエポキシが完全
に硫酸水溶液中に溶出した。しかし、基板上の銅は硫化
銅に変化し、硫酸水溶液の底に沈澱したため、銅を剥離
回収することができなかった。このように、硫酸水溶液
の温度が60℃以上130℃未満の場合、基板の銅が硫
化銅に変化するため、基板から銅を剥離回収することが
できない。Comparative Example 6 A glass epoxy substrate from which mounted components were separated was placed in a 96% by weight sulfuric acid aqueous solution at 70 ° C. for 2 hours.
Dipped for 0 hours. As a result, the epoxy of the substrate resin was completely eluted in the aqueous sulfuric acid solution. However, the copper on the substrate changed to copper sulfide and precipitated at the bottom of the aqueous sulfuric acid solution, so that the copper could not be separated and recovered. As described above, when the temperature of the aqueous sulfuric acid solution is 60 ° C. or higher and lower than 130 ° C., the copper on the substrate is changed to copper sulfide, and thus the copper cannot be peeled and collected from the substrate.
【0021】《比較例7》実装部品を分離したガラスエ
ポキシ基板を、96重量%の硫酸水溶液中に140℃で
20時間浸漬した。その結果、基板樹脂のエポキシが完
全に硫酸水溶液中に溶出した。しかし、基板上の銅が硫
酸銅となって硫酸水溶液中に溶解したため、銅を剥離回
収することができなかった。このように、硫酸水溶液の
温度が130℃以上の場合、基板の銅が硫酸水溶液に溶
解するため、基板から銅を剥離回収することができな
い。Comparative Example 7 A glass epoxy substrate from which mounted components were separated was immersed in a 96% by weight aqueous sulfuric acid solution at 140 ° C. for 20 hours. As a result, the epoxy of the substrate resin was completely eluted in the aqueous sulfuric acid solution. However, since the copper on the substrate became copper sulfate and was dissolved in the aqueous sulfuric acid solution, the copper could not be peeled and collected. As described above, when the temperature of the sulfuric acid aqueous solution is 130 ° C. or higher, the copper on the substrate is dissolved in the aqueous sulfuric acid solution, so that copper cannot be peeled and collected from the substrate.
【0022】《実施例3》本実施例を、図1を用いて説
明する。実装部品を分離したガラスエポキシ基板1の銅
電極2を含む面を、電動カンナを用いて、厚さ0.3m
m程度にスライスした。こうして銅電極2を含む破片1
aを得た。この破片1aを容器5中の96重量%の硫酸
水溶液4に100℃で3時間浸漬した。その結果、基板
上の銅は全て黒色の硫化銅となって、基板から分離し、
硫酸水溶液中に沈澱した。この沈澱3をフッ素系の濾紙
を用いて濾過することにより回収することができた。基
板樹脂の溶出量が実施例1よりも少なく、硫酸水溶液は
褐色になっただけで低粘性物質であったため、再利用が
可能となった。このように、本実施例では、硫酸処理に
用いるエポキシ量が実施例1よりも少なく、処理後の硫
酸水溶液を濾過することなく再利用できるため、実施例
1よりも有効である。ただし、処理回数が増えるにつ
れ、硫酸水溶液は粘性を帯び、沈澱を生じ始めるため、
一定回数処理を行った後は濾過を行う必要がある。<< Embodiment 3 >> This embodiment will be described with reference to FIG. The surface including the copper electrode 2 of the glass epoxy substrate 1 from which the mounted components are separated is 0.3 m thick using an electric plane.
m. Thus, the fragment 1 including the copper electrode 2
a was obtained. This fragment 1a was immersed in a 96% by weight aqueous sulfuric acid solution 4 in a container 5 at 100 ° C. for 3 hours. As a result, all the copper on the substrate becomes black copper sulfide, separated from the substrate,
Precipitated in aqueous sulfuric acid. This precipitate 3 could be recovered by filtration using a fluorine-based filter paper. The amount of the substrate resin eluted was smaller than that of Example 1, and the sulfuric acid aqueous solution was a low-viscosity substance just turned brown, so that it could be reused. As described above, in the present embodiment, the amount of epoxy used for the sulfuric acid treatment is smaller than that in the first embodiment, and the sulfuric acid aqueous solution after the treatment can be reused without being filtered. However, as the number of treatments increases, the aqueous sulfuric acid solution becomes viscous and starts to precipitate,
After a certain number of treatments, it is necessary to perform filtration.
【0023】《実施例4》実装部品を分離したガラスエ
ポキシ基板の銅電極を含む面を、電動カンナを用いて、
厚さ0.3mm程度にスライスした。得られた破片を、
96重量%の硫酸水溶液中に60℃で20時間浸漬し
た。その結果、基板上の銅は他の化合物に変化せず、端
が浮き上がった状態になったため、端をピンセットで摘
み、引き剥がすことにより、基板から銅を剥離回収する
ことができた。一方、硫酸水溶液は、基板樹脂のエポキ
シが全て硫酸水溶液中に溶出したが、実施例2よりもエ
ポキシ溶出量が少ないため、褐色の低粘性物質になった
だけで、再利用が可能であった。このように、本実施例
では、硫酸処理に用いるエポキシ量が実施例2よりも少
なく、処理後の硫酸水溶液を濾過することなく再利用で
きるため、実施例2よりも有効である。ただし、処理回
数が増えるにつれ、硫酸水溶液は粘性を帯び、沈澱を生
じ始めるため、一定回数処理毎に濾過を行う必要があ
る。<< Embodiment 4 >> The surface including the copper electrode of the glass epoxy substrate from which the mounted components were separated was
The slice was sliced to a thickness of about 0.3 mm. The obtained fragments are
It was immersed in a 96% by weight aqueous sulfuric acid solution at 60 ° C. for 20 hours. As a result, the copper on the substrate was not changed to another compound, and the end was in a raised state. Therefore, the end could be picked up with tweezers and peeled off, so that the copper could be separated and collected from the substrate. On the other hand, in the sulfuric acid aqueous solution, all of the epoxy of the substrate resin was eluted in the sulfuric acid aqueous solution. However, since the amount of the epoxy eluted was smaller than that in Example 2, it became a brown low-viscosity substance and could be reused. . As described above, in the present embodiment, the amount of epoxy used for the sulfuric acid treatment is smaller than in the second embodiment, and the sulfuric acid aqueous solution after the treatment can be reused without being filtered. However, as the number of treatments increases, the aqueous sulfuric acid solution becomes viscous and starts to precipitate, so that it is necessary to perform filtration every certain number of treatments.
【0024】以上、実施例1〜実施例4に示したよう
に、本発明のガラスエポキシ樹脂基板からの銅の回収方
法を用いることにより、廃プリント基板から銅を分離・
回収することができる。なかでも、実施例3および実施
例4に示した方法では、エポキシの溶出量が少ないた
め、処理後の硫酸水溶液の濾過頻度が少なく、処理コス
トが低くなるため、本発明のガラスエポキシ基板からの
銅の回収方法としてより好ましい。実施例3と実施例4
のどちらを選ぶかは、硫酸温度および処理時間のどちら
を重視するかを考慮して決定すればよい。なお、実施例
1〜4で述べたように、硫酸水溶液は、濾過により再利
用が可能であるが、ある程度の処理回数を超えると、硫
酸水溶液が劣化して、濾過によっても再利用できなくな
るため、廃棄を行う必要がある。その際、硫酸水溶液中
には、基板上のはんだが溶解しており、有害な鉛が含ま
れるため、水酸化ナトリウム、水酸化カリウム等の中和
剤を用いて中和処理を行い、はんだを沈澱させて、濾過
により回収する必要がある。As described above, as shown in Examples 1 to 4, by using the method for recovering copper from a glass epoxy resin substrate of the present invention, copper can be separated from a waste printed circuit board.
Can be recovered. In particular, in the methods shown in Example 3 and Example 4, since the amount of eluted epoxy is small, the frequency of filtration of the sulfuric acid aqueous solution after the treatment is low, and the treatment cost is low. It is more preferable as a method for recovering copper. Example 3 and Example 4
Which should be selected may be determined in consideration of which one of the sulfuric acid temperature and the processing time is more important. As described in Examples 1 to 4, the sulfuric acid aqueous solution can be reused by filtration. However, if the number of treatments exceeds a certain number of times, the sulfuric acid aqueous solution is deteriorated and cannot be reused by filtration. Need to be disposed of. At this time, since the solder on the substrate is dissolved in the sulfuric acid aqueous solution and contains harmful lead, the solder is neutralized using a neutralizing agent such as sodium hydroxide or potassium hydroxide to remove the solder. It must settle and be collected by filtration.
【0025】[0025]
【発明の効果】以上のように、本発明は、大がかりな設
備や高価な溶剤等の消耗品を必要とすることなく、廃プ
リント基板から銅を容易に、かつ低コストで回収できる
方法を提供するもので、省資源および廃棄物量の削減に
大きく貢献するものである。As described above, the present invention provides a method for easily and inexpensively recovering copper from waste printed circuit boards without requiring large-scale equipment and expensive consumables such as solvents. It greatly contributes to resource saving and waste reduction.
【図1】本発明の実施例における基板の処理工程を示す
図である。FIG. 1 is a view showing a processing step of a substrate in an embodiment of the present invention.
1 ガラスエポキシ基板 1a 銅電極を含む破片 2 銅電極 3 硫化銅の沈澱 4 硫酸水溶液 5 処理容器 DESCRIPTION OF SYMBOLS 1 Glass epoxy board 1a Fragment containing copper electrode 2 Copper electrode 3 Precipitation of copper sulfide 4 Sulfuric acid aqueous solution 5 Processing vessel
Claims (3)
るガラスエポキシ基板を、70重量%以上の濃度の硫酸
水溶液に60℃以上130℃未満の温度で浸漬し、前記
基板上の銅を硫化銅に変化させて分離する工程、および
前記硫酸水溶液中に沈澱した硫化銅を濾過により回収す
る工程を有することを特徴とするガラスエポキシ基板か
らの銅の回収方法。1. A glass epoxy substrate having at least a copper foil disposed on a surface thereof is immersed in a sulfuric acid aqueous solution having a concentration of 70% by weight or more at a temperature of 60 ° C. or more and less than 130 ° C. to sulphide copper on the substrate. A method for recovering copper from a glass epoxy substrate, comprising: a step of converting into copper and separating; and a step of recovering copper sulfide precipitated in the aqueous sulfuric acid solution by filtration.
るガラスエポキシ基板を、70重量%以上の濃度の硫酸
水溶液に40℃以上60℃未満の温度で浸漬する工程、
および浸漬後の前記基板から銅を剥離により回収する工
程を有することを特徴とするガラスエポキシ基板からの
銅の回収方法。2. a step of immersing a glass epoxy substrate having at least a copper foil disposed on a surface thereof in a sulfuric acid aqueous solution having a concentration of 70% by weight or more at a temperature of 40 ° C. or more and less than 60 ° C.
And recovering copper from the glass epoxy substrate by peeling copper from the substrate after immersion.
液に浸漬するに先立って、銅箔が表面に配置されている
電極面を削って破片とする工程を有する請求項1または
請求項2記載のガラスエポキシ基板からの銅の回収方
法。3. The glass according to claim 1, further comprising, prior to immersing the glass epoxy substrate in the aqueous sulfuric acid solution, shaving the electrode surface on which a copper foil is disposed on the surface into pieces. A method for recovering copper from epoxy substrates.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33972896A JPH10183264A (en) | 1996-12-19 | 1996-12-19 | Method for recovering copper from glass epoxy substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33972896A JPH10183264A (en) | 1996-12-19 | 1996-12-19 | Method for recovering copper from glass epoxy substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10183264A true JPH10183264A (en) | 1998-07-14 |
Family
ID=18330252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33972896A Pending JPH10183264A (en) | 1996-12-19 | 1996-12-19 | Method for recovering copper from glass epoxy substrate |
Country Status (1)
Country | Link |
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JP (1) | JPH10183264A (en) |
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CN103667704A (en) * | 2012-09-17 | 2014-03-26 | 中国科学院化学研究所 | Method for separating metal and nonmetal of waste printed circuit board base plate |
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US9221114B2 (en) | 2011-12-15 | 2015-12-29 | Advanced Technology Materials, Inc. | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment |
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1996
- 1996-12-19 JP JP33972896A patent/JPH10183264A/en active Pending
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US9215813B2 (en) | 2010-04-15 | 2015-12-15 | Advanced Technology Materials, Inc. | Method for recycling of obsolete printed circuit boards |
US10034387B2 (en) | 2010-04-15 | 2018-07-24 | Entegris, Inc. | Method for recycling of obsolete printed circuit boards |
US9221114B2 (en) | 2011-12-15 | 2015-12-29 | Advanced Technology Materials, Inc. | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment |
US9649712B2 (en) | 2011-12-15 | 2017-05-16 | Entegris, Inc. | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment |
US9731368B2 (en) | 2011-12-15 | 2017-08-15 | Entegris, Inc. | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment |
WO2013187330A1 (en) * | 2012-06-11 | 2013-12-19 | 大電株式会社 | Fatigue testing method for conductive material |
CN103667704A (en) * | 2012-09-17 | 2014-03-26 | 中国科学院化学研究所 | Method for separating metal and nonmetal of waste printed circuit board base plate |
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