JPH10110183A - Grinding agent - Google Patents
Grinding agentInfo
- Publication number
- JPH10110183A JPH10110183A JP26393296A JP26393296A JPH10110183A JP H10110183 A JPH10110183 A JP H10110183A JP 26393296 A JP26393296 A JP 26393296A JP 26393296 A JP26393296 A JP 26393296A JP H10110183 A JPH10110183 A JP H10110183A
- Authority
- JP
- Japan
- Prior art keywords
- grinding
- abrasive
- cloud point
- nonionic surfactant
- agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Lubricants (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、研削盤で硬い加工
物を研削するための研削剤、研削剤組成物および研削加
工方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a grinding agent, a grinding agent composition and a grinding method for grinding a hard workpiece with a grinding machine.
【０００２】[0002]
【従来の技術】金属、セラミック、ガラスまたはシリコ
ンなどの硬い物質を研削加工する際には、砥石と加工物
との接点に研削剤を吹き付けながら行われる。研削剤は
油性と水性のものがあり、油性のものとしては例えば鉱
物油、動植物油、水性のものとしては例えば各種脂肪酸
のアミン塩、非イオン界面活性剤、アルカリ金属塩、ア
ニオン界面活性剤が挙げられ、必要に応じて防錆添加
剤、極圧添加剤、殺菌剤、ｐＨ調整剤などが配合され
る。研削剤は取り扱い易さの利点上、油性よりも水性の
ものが使われることが多い。水性の研削剤は、洗浄性お
よび研削性の性能を備えていることが必要である。2. Description of the Related Art When a hard material such as metal, ceramic, glass or silicon is ground, a grinding agent is sprayed on a contact point between a grindstone and a workpiece. Abrasives include oily and aqueous ones.Examples of oily ones include mineral oil, animal and vegetable oils, and aqueous ones such as amine salts of various fatty acids, nonionic surfactants, alkali metal salts, and anionic surfactants. Rust preventive additives, extreme pressure additives, bactericides, pH adjusters, and the like are added as necessary. Abrasives are often water-based rather than oil-based because of the ease of handling. Aqueous abrasives need to have cleaning and grinding performance.
【０００３】従来の研削剤は希釈用の水中に含まれるＣ
ａ2+やＭｇ2+の硬度成分が多いと、研削剤成分と硬度成
分が結合して研削剤の不活性化や分離が起こって洗浄性
が悪化し、砥石の目詰まりやストレーナー閉塞、工具へ
の汚れの付着を招き、加工速度や加工精度が低下し研削
性が悪化することがあった。特にダイヤモンド砥石に対
して洗浄性と研削性が共に優れたものは殆どなかった。
また従来の研削剤は、バクテリアが繁殖しやすく、循環
使用すると容易に腐敗してしまい工具を汚染、腐食し悪
臭を発生するなど耐腐敗性が低いため、短期間で研削剤
を入れ替えねばならず、それに伴う廃液処理や新液調製
に費用と時間が多くかかり使用コストが高かった。特開
平１−２８７１９０号公報には、研削性の良い研削剤と
してベンゾトリアゾール類またはアミノカルボン酸のキ
レート剤を含有する油剤が、特開平４−２４９５９５号
公報には、バクテリアに対する耐腐敗性の良い研削剤と
して第四級アンモニア塩類とアニオン系界面活性剤を含
有する油剤が開示されている。[0003] Conventional abrasives include C contained in water for dilution.
If the hardness component of a 2+ or Mg 2+ is large, the abrasive component and the hardness component are combined to inactivate or separate the abrasive, thereby deteriorating the cleaning performance, and causing clogging of the grinding wheel, blockage of the strainer, and tooling. In some cases, this may lead to the attachment of dirt to the surface, resulting in a reduction in processing speed and processing accuracy and deterioration in grindability. In particular, there was almost no diamond wheel having both excellent cleaning and grinding properties.
In addition, conventional abrasives have low resistance to decay, such as bacteria proliferating and being easily rotted when used in circulation, contaminating and corroding tools and producing odors. In addition, the cost and time required for waste liquid treatment and preparation of a new liquid are large, and the use cost is high. JP-A-1-287190 discloses an oil containing a chelating agent of benzotriazoles or aminocarboxylic acid as a grinding agent having a good grinding property, and JP-A-4-249595 discloses a rot-proofing agent having good rot resistance against bacteria. An oil agent containing a quaternary ammonium salt and an anionic surfactant as a grinding agent is disclosed.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、これら
の油剤は研削剤に求められる潤滑性、洗浄性、研削性、
耐腐敗性という全ての性能に優れたものではなく潤滑
性、洗浄性、研削性および耐腐敗性を兼ね備えた研削剤
が望まれていた。However, these oils have the lubricity, washability, grindability,
There is a demand for an abrasive having not only all rot resistance but also excellent lubricity, detergency, grindability and rot resistance.
【０００５】本発明は前記の課題を解決するためなされ
たもので、潤滑性、安定性、洗浄性、研削性、耐腐敗性
に優れ、長期に渡って循環使用しても潤滑性、洗浄性等
の性能低下が少なく、希釈する水質の影響を殆ど受けな
い研削剤、研削剤組成物および研削加工方法を提供する
ことを目的とする。The present invention has been made to solve the above-mentioned problems, and has excellent lubricating properties, stability, cleaning properties, grindability, and rot resistance. It is an object of the present invention to provide a grinding agent, a grinding agent composition, and a grinding method which are hardly affected by the quality of water to be diluted, and have little performance deterioration.
【０００６】[0006]
【課題を解決するための手段】前記の目的を達成するた
めになされた本発明の研削剤は、非イオン界面活性剤を
水に溶解した研削剤において、該研削剤の曇点が該研削
剤を使用する温度以下である。SUMMARY OF THE INVENTION In order to achieve the above-mentioned object, the present invention provides an abrasive in which a nonionic surfactant is dissolved in water. Is lower than the temperature used.
【０００７】前記研削剤の曇点は、１０〜６０℃である
ことが好ましい。研削剤の曇点が１０℃未満だと不安定
で分離しやすく、６０℃超だと潤滑性が悪く使用できな
い。[0007] The cloud point of the abrasive is preferably 10 to 60 ° C. If the cloud point of the abrasive is less than 10 ° C., it is unstable and easy to separate, and if it exceeds 60 ° C., lubricity is poor and it cannot be used.
【０００８】前記研削剤は、亜硝酸ナトリウム、モリブ
デン酸ナトリウムの無機防錆剤、安息香酸、パラターシ
ャリ安息香酸、オクチル酸を例とする芳香族、脂肪族有
機酸のカリウム、ナトリウム塩またはベンゾトリアゾー
ルの有機系防錆剤、モノエタノールアミン、ジエタノー
ルアミン、トリエタノールアミンのアルカノールアミン
類のアルカリ調整剤を含有していても良い。The above-mentioned abrasives include sodium nitrite, sodium molybdate inorganic rust inhibitor, potassium, sodium salts of aromatic and aliphatic organic acids such as benzoic acid, paratertiary benzoic acid and octylic acid, and benzotriazole. It may contain an organic rust inhibitor, an alkali adjuster of alkanolamines such as monoethanolamine, diethanolamine and triethanolamine.
【０００９】前記の目的を達成するためになされた本発
明の研削剤組成物は、前記研削剤を調製するための研削
剤組成物において、該非イオン界面活性剤が、３０〜８
０℃の曇点を持つポリオキシプロピレンポリオキシエチ
レンブロック重合体界面活性剤の少なくとも一種類と、
１０〜３０℃の曇点を持つ直鎖型非イオン界面活性剤と
からなる。In order to achieve the above object, the present invention provides a grinding composition for preparing the above-mentioned grinding agent, wherein the nonionic surfactant is 30 to 8%.
At least one polyoxypropylene polyoxyethylene block polymer surfactant having a cloud point of 0 ° C.,
A linear nonionic surfactant having a cloud point of 10 to 30C.
【００１０】前記ポリオキシプロピレンポリオキシエチ
レンブロック重合体界面活性剤の分子量が２０００〜１
００００であることが好ましい。前記直鎖型非イオン界
面活性剤が、炭素数１２〜２２の直鎖アルキル基を有す
る非イオン界面活性剤の少なくとも一種類からなるとさ
らに好ましい。The polyoxypropylene polyoxyethylene block polymer surfactant has a molecular weight of 2,000 to 1,
0000 is preferred. More preferably, the linear nonionic surfactant comprises at least one kind of nonionic surfactant having a linear alkyl group having 12 to 22 carbon atoms.
【００１１】前記ポリオキシプロピレンポリオキシエチ
レンブロック重合体界面活性剤の曇点が３０℃未満、８
０℃超であると潤滑性が悪く、前記直鎖型非イオン界面
活性剤の曇点が１０℃未満であると研削剤が不安定で分
離しやすく洗浄性も悪くなり、３０℃超であると潤滑性
が悪く使用できない。前記ポリオキシプロピレンポリオ
キシエチレンブロック重合体界面活性剤の分子量が２０
００未満、１００００超であると研削剤の潤滑性が悪
く、前記直鎖型非イオン界面活性剤の炭素数が１２未満
または２２超であると潤滑性および洗浄性が悪く使用で
きない。The polyoxypropylene polyoxyethylene block polymer surfactant has a cloud point of less than 30 ° C.
If the temperature is higher than 0 ° C, the lubricating property is poor. If the cloud point of the linear nonionic surfactant is lower than 10 ° C, the abrasive is unstable and easily separated, and the cleaning property is deteriorated. Poor lubricity and cannot be used. The polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 20
If it is less than 00 and more than 10,000, the abrasive has poor lubricity, and if the linear nonionic surfactant has less than 12 or more than 22 carbon atoms, it has poor lubricity and detergency and cannot be used.
【００１２】前記の目的を達成するためになされた本発
明の研削加工方法は、非イオン界面活性剤を水に溶解し
た研削剤を、その曇点以上の温度に管理しながら、加工
位置に循環供給する。In order to achieve the above object, a grinding method according to the present invention circulates a grinding agent in which a nonionic surfactant is dissolved in water to a processing position while controlling the temperature at a temperature higher than its cloud point. Supply.
【００１３】前記非イオン界面活性剤は、３０〜８０℃
の曇点を持つポリオキシプロピレンポリオキシエチレン
ブロック重合体界面活性剤の少なくとも一種類と、１０
〜３０℃の曇点を持つ直鎖型非イオン界面活性剤とから
なることが好ましい。The nonionic surfactant is at 30 to 80 ° C.
At least one polyoxypropylene polyoxyethylene block polymer surfactant having a cloud point of
It preferably comprises a linear nonionic surfactant having a cloud point of ３０30 ° C.
【００１４】[0014]
【発明の効果】本発明の研削剤は、低い曇点を有する非
イオン界面活性剤と高い曇点を有するポリオキシプロピ
レンポリオキシエチレンブロック重合体界面活性剤を併
用し、研削剤の曇点以上で使用するため、作用機構は不
明だが潤滑性、安定性、洗浄性、研削性が非常に良好で
ある。しかもこの研削剤は非イオン界面活性剤のみから
なるため、これらの効果が希釈する水質に影響されるこ
とがなく、バクテリアの影響も殆ど受けず耐腐敗性が良
い。The abrasive of the present invention is obtained by using a nonionic surfactant having a low cloud point and a polyoxypropylene polyoxyethylene block polymer surfactant having a high cloud point in combination with the cloud point of the abrasive. The mechanism of action is unknown, but the lubrication, stability, cleaning and grinding properties are very good. In addition, since this abrasive is composed of only a nonionic surfactant, these effects are not affected by the quality of the water to be diluted, and are not easily affected by bacteria and have good rot resistance.
【００１５】[0015]
【実施例】以下、本発明の実施例を詳細に説明する。Embodiments of the present invention will be described below in detail.
【００１６】実施例１〜５は本発明を適用する研削剤の
例であり、比較例１〜７は本発明を適用外および市販品
の研削剤の例である。Examples 1 to 5 are examples of abrasives to which the present invention is applied, and Comparative Examples 1 to 7 are examples of commercially available abrasives to which the present invention is not applied.
【００１７】実施例１ 分子量２９００、曇点５８℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤３０重量％
と、曇点が２０℃となるようにモノオレイルソルビタン
エステルにエチレンオキサイドを付加重合させた直鎖型
非イオン界面活性剤１５重量％とを、水５５重量％に溶
解し研削剤を調製した。研削剤の曇点は４６℃であっ
た。Example 1 30% by weight of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 2900 and a cloud point of 58 ° C.
And 15% by weight of a linear nonionic surfactant obtained by adding ethylene oxide to monooleyl sorbitan ester so that the cloud point becomes 20 ° C., was dissolved in 55% by weight of water to prepare an abrasive. The cloud point of the abrasive was 46 ° C.
【００１８】実施例２ 分子量４５００、曇点７６℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤２０重量％
と、曇点が２５℃となるように硬化ひまし油にエチレン
オキサイドを付加重合させた直鎖型非イオン界面活性剤
２０重量％とを、水６０重量％に溶解し研削剤を調製し
た。研削剤の曇点は５１℃であった。Example 2 20% by weight of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 4,500 and a cloud point of 76 ° C.
And 20% by weight of a linear nonionic surfactant obtained by addition-polymerizing ethylene oxide to hardened castor oil so that the cloud point becomes 25 ° C., was dissolved in 60% by weight of water to prepare an abrasive. The cloud point of the abrasive was 51 ° C.
【００１９】実施例３ 分子量８０００、曇点７０℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤６重量％
と、曇点が２０℃となるようにラウリルアルコールにエ
チレンオキサイドを付加重合させた直鎖型非イオン界面
活性剤２０重量％と、曇点が１２℃となるようにステア
リルアルコールにエチレンオキサイドを付加重合させた
直鎖型非イオン界面活性剤９重量％とを、水６５重量％
に溶解し研削剤を調製した。研削剤の曇点は２６℃であ
った。Example 3 6% by weight of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 8000 and a cloud point of 70 ° C.
And 20% by weight of a linear nonionic surfactant obtained by addition polymerization of ethylene oxide to lauryl alcohol so that the cloud point is 20 ° C., and ethylene oxide to stearyl alcohol so that the cloud point is 12 ° C. 9% by weight of the polymerized linear nonionic surfactant and 65% by weight of water
To prepare an abrasive. The cloud point of the abrasive was 26 ° C.
【００２０】実施例４ 分子量２５００、曇点４０℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤１５重量％
と、曇点が３０℃となるようにオレイルアルコールにエ
チレンオキサイドを付加重合させた直鎖型非イオン界面
活性剤１５重量％とを、水７０重量％に溶解し研削剤を
調製した。研削剤の曇点は３５℃であった。Example 4 15% by weight of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 2500 and a cloud point of 40 ° C.
And 15% by weight of a linear nonionic surfactant obtained by addition-polymerizing ethylene oxide to oleyl alcohol so that the cloud point is 30 ° C., was dissolved in 70% by weight of water to prepare an abrasive. The cloud point of the abrasive was 35 ° C.
【００２１】実施例５ 分子量５０００、曇点６０℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤２０重量％
と、曇点が１０℃となるようにベへニルアルコールにエ
チレンオキサイドを付加重合させた直鎖型非イオン界面
活性剤１０重量％とを、水７０重量％に溶解し研削剤を
調製した。研削剤の曇点は４３℃であった。Example 5 Polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 5000 and a cloud point of 60 ° C. 20% by weight
And 10% by weight of a linear nonionic surfactant obtained by addition polymerization of ethylene oxide to behenyl alcohol so that the cloud point is 10 ° C., was dissolved in 70% by weight of water to prepare an abrasive. The cloud point of the abrasive was 43 ° C.
【００２２】比較例１ 分子量４９００、曇点６７℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤３０重量％
を、水７０重量％に溶解し、直鎖型非イオン界面活性剤
を混合していない研削剤を調製した。Comparative Example 1 30 wt% of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 4900 and a cloud point of 67 ° C.
Was dissolved in 70% by weight of water to prepare an abrasive in which no linear nonionic surfactant was mixed.
【００２３】比較例２ 曇点が５００℃となるようにオレイルアルコールにエチ
レンオキサイドを付加重合させた直鎖型非イオン界面活
性剤３０重量％を、水７０重量％に溶解し、ポリオキシ
プロピレンポリオキシエチレンブロック重合体界面活性
剤を含有していない研削剤を調製した。COMPARATIVE EXAMPLE 2 30% by weight of a linear nonionic surfactant obtained by addition-polymerizing ethylene oxide to oleyl alcohol so as to have a cloud point of 500 ° C. was dissolved in 70% by weight of water. An abrasive containing no oxyethylene block polymer surfactant was prepared.
【００２４】比較例３ 分子量１８５０、曇点４２℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤３０重量％
と、曇点が２５℃となるようにラウリルソルビタンエス
テルにエチレンオキサイドを付加重合させた直鎖型非イ
オン界面活性剤１０重量％とを、水６０重量％に溶解し
研削剤を調製した。研削剤の曇点は３８℃であった。Comparative Example 3 30% by weight of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 1850 and a cloud point of 42 ° C.
And 10% by weight of a linear nonionic surfactant obtained by adding ethylene oxide to lauryl sorbitan ester so that the cloud point becomes 25 ° C., was dissolved in 60% by weight of water to prepare an abrasive. The cloud point of the abrasive was 38 ° C.
【００２５】比較例４ 分子量２９００、曇点５８℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤１０重量％
と、曇点が７５℃となるようにラウリルアルコールにエ
チレンオキサイドを付加重合させた直鎖型非イオン界面
活性剤２０重量％とを、水７０重量％に溶解し研削剤を
調製した。研削剤の曇点は７１℃であった。Comparative Example 4 10 wt% of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 2900 and a cloud point of 58 ° C.
And 20% by weight of a linear nonionic surfactant obtained by addition-polymerizing ethylene oxide to lauryl alcohol so that the cloud point is 75 ° C., was dissolved in 70% by weight of water to prepare an abrasive. The cloud point of the abrasive was 71 ° C.
【００２６】比較例５ 分子量５０００、曇点２２℃のポリオキシプロピレンポ
リオキシエチレンブロック重合体界面活性剤５重量％
と、曇点が２５℃となるように硬化ひまし油にエチレン
オキサイドを付加重合させた直鎖型非イオン界面活性剤
２５重量％とを、水７０重量％に溶解し研削剤を調製し
た。研削剤の曇点は２５℃であった。Comparative Example 5 5% by weight of a polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 5,000 and a cloud point of 22 ° C.
And 25% by weight of a linear nonionic surfactant obtained by addition-polymerizing ethylene oxide to hardened castor oil so that the cloud point becomes 25 ° C., was dissolved in 70% by weight of water to prepare an abrasive. The cloud point of the abrasive was 25 ° C.
【００２７】さらに、比較例６を市販品（JIS-K-2241、
Ｗ−１種、エマルジョン型）の研削剤、比較例７を市販
品（JIS-K-2241、Ｗ−２種、ソリュブル型）の研削剤と
した。Further, Comparative Example 6 was prepared as a commercial product (JIS-K-2241,
Comparative Example 7 was used as a commercially available (JIS-K-2241, W-2 type, soluble type) abrasive.
【００２８】研削試験 実施例１〜５および比較例１〜７の研削剤を、無色透明
でｐＨ７．５、比電導度 ２６３μS/cm、アルカリ度 ５
０CaCO3mg/リットル、硬度 ６３CaCO3mg/リットル、塩素イオン
濃度 １６mg/リットル、硫酸イオン濃度 ２１mg/リットルの水質
の水で希釈して２重量％水溶液の試験液とした。次に得
られた試験液で、ＰＳＧ−５ＢＶ型平面研削盤（岡本工
作機械製作所製）を使用し、砥石がＡ−６０Ｌ−Ｖ、研
削方式がトラバースカット、砥石送り速度１９００ｍ／
分、切込量０．０１ｍｍ／ｒｅｖ、加工物送り速度１０
ｍｍ／ｒｅｖ、試験液吐出量７リットル／分、温度５５℃の
条件下で、鋼材ＳＫＤ−１１（JIS-G-4404、200×200×
50mm）を研削し、研削比(研削量／砥石磨耗量)、研削面
粗さの最大値を測定し、洗浄性(砥石目詰まり)を評価し
た。その結果を表１に示す。尚、洗浄性は、◎：砥石目
詰まり無し、○：目詰まり殆ど無し、△：目詰まり小〜
中、×△：目詰まり中、×：目詰まり大である。Grinding Test The abrasives of Examples 1 to 5 and Comparative Examples 1 to 7 were colorless and transparent, pH 7.5, specific conductivity 263 μS / cm, alkalinity 5
It was diluted with water of a water quality of 0 CaCO 3 mg / l, hardness 63 CaCO 3 mg / l, chloride ion concentration 16 mg / l, and sulfate ion concentration 21 mg / l to prepare a test solution of a 2% by weight aqueous solution. Next, a PSG-5BV type surface grinder (manufactured by Okamoto Machine Tool Works) was used for the obtained test liquid, the grinding wheel was A-60L-V, the grinding method was traverse cut, and the grinding wheel feed speed was 1900 m /
Min, depth of cut 0.01 mm / rev, workpiece feed rate 10
mm / rev, a test solution discharge rate of 7 liters / minute, and a temperature of 55 ° C., steel SKD-11 (JIS-G-4404, 200 × 200 ×
50 mm), the grinding ratio (amount of grinding / abrasion of the grinding wheel) and the maximum value of the grinding surface roughness were measured, and the cleaning property (clogging of the grinding wheel) was evaluated. Table 1 shows the results. The cleaning properties are as follows: ：: no clogging of the grinding wheel, ○: almost no clogging, Δ: small clogging ~
Medium, x: medium clogging, x: large clogging.
【００２９】[0029]
【表１】 [Table 1]
【００３０】同表に示したように、実施例１〜５の研削
剤は、比較例１〜７に比べ研削比が高く、研削面粗さが
小さく研削性が良好で、砥石目詰まりが全く無いか殆ど
無く洗浄性も良好であった。As shown in the table, the abrasives of Examples 1 to 5 have higher grinding ratios, smaller ground surface roughness, better grindability, and no grinding wheel clogging as compared with Comparative Examples 1 to 7. There was no or almost no washability.
【００３１】耐腐食性試験 実施例１〜５および比較例６〜７の研削剤の２重量％水
溶液１００ｍｌに、それぞれ鋳鉄切粉１gおよびブトウ
糖１ｇを加え試験液を作製して恒温槽内で３０℃に保
ち、この試験液に４日毎に１０6個／ｍｌのバクテリア
を含む腐敗液から１重量％接種して加え、１０日毎にバ
クテリア数を測定した。その結果を表２に示す。Corrosion resistance test 1 g of cast iron chips and 1 g of glucose were added to 100 ml of a 2% by weight aqueous solution of the abrasives of Examples 1 to 5 and Comparative Examples 6 to 7 to prepare test solutions, and the test solutions were prepared in a thermostat. The test solution was maintained at 30 ° C., and 1% by weight was inoculated to the test solution every 4 days from a spoilage solution containing 10 6 bacteria / ml, and the number of bacteria was measured every 10 days. Table 2 shows the results.
【００３２】[0032]
【表２】 [Table 2]
【００３３】同表に示したように、実施例１〜５の研削
剤は、市販品の比較例６〜７に比べバクテリアの数は大
幅に少なく耐腐敗性が良好であった。また４０日後の鋳
鉄切粉の発錆の有無を観察したところ、実施例１〜５の
試験液中の鋳鉄切粉の発錆は認められず、切粉は容器内
で流動性があったのに対して、市販品の比較例６〜７は
切粉の底部が発錆固着し、流動性が無くなった状態であ
った。As shown in the table, the abrasives of Examples 1 to 5 had significantly fewer bacteria than those of Comparative Examples 6 and 7, which were commercially available, and had good rot resistance. When the presence or absence of rust of the cast iron chips after 40 days was observed, no rust of the cast iron chips in the test liquids of Examples 1 to 5 was observed, and the chips had fluidity in the container. On the other hand, the comparative examples 6 and 7 of the commercially available products were in a state in which the bottom of the chips was rusted and fixed, and the fluidity was lost.
Claims (7)
剤において、該研削剤の曇点が該研削剤を使用する温度
以下であることを特徴とする研削剤。1. An abrasive in which a nonionic surfactant is dissolved in water, wherein the cloud point of the abrasive is lower than the temperature at which the abrasive is used.
ことを特徴とする請求項１に記載の研削剤。2. The abrasive according to claim 1, wherein the abrasive has a cloud point of 10 to 60 ° C.
の研削剤組成物において、該非イオン界面活性剤が、３
０〜８０℃の曇点を持つポリオキシプロピレンポリオキ
シエチレンブロック重合体界面活性剤の少なくとも一種
類と、１０〜３０℃の曇点を持つ直鎖型非イオン界面活
性剤とからなることを特徴とする研削剤組成物。3. The abrasive composition for preparing an abrasive according to claim 1, wherein the nonionic surfactant is 3% by weight.
It is characterized by comprising at least one kind of polyoxypropylene polyoxyethylene block polymer surfactant having a cloud point of 0 to 80 ° C and a linear nonionic surfactant having a cloud point of 10 to 30 ° C. Abrasive composition.
チレンブロック重合体界面活性剤の分子量が２０００〜
１００００であることを特徴とする請求項３に記載の研
削剤組成物。4. The polyoxypropylene polyoxyethylene block polymer surfactant having a molecular weight of 2,000 to 2,000.
The abrasive composition according to claim 3, wherein the composition is 10,000.
数１２〜２２の直鎖アルキル基を有する非イオン界面活
性剤の少なくとも一種類からなることを特徴とする請求
項３に記載の研削剤組成物。5. The non-ionic surfactant according to claim 3, wherein the non-linear surfactant comprises at least one non-ionic surfactant having a linear alkyl group having 12 to 22 carbon atoms. Abrasive composition.
剤を、その曇点以上の温度に管理しながら、加工位置に
循環供給することを特徴とする研削加工方法。6. A grinding method comprising circulating and supplying a grinding agent in which a nonionic surfactant is dissolved in water to a processing position while controlling the temperature at or above its cloud point.
℃の曇点を持つポリオキシプロピレンポリオキシエチレ
ンブロック重合体界面活性剤の少なくとも一種類と、１
０〜３０℃の曇点を持つ直鎖型非イオン界面活性剤とか
らなることを特徴とする請求項６に記載の研削加工方
法。7. The method according to claim 7, wherein the nonionic surfactant is 30 to 80.
At least one of a polyoxypropylene polyoxyethylene block polymer surfactant having a cloud point of
The grinding method according to claim 6, comprising a linear nonionic surfactant having a cloud point of 0 to 30C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26393296A JP3981168B2 (en) | 1996-10-04 | 1996-10-04 | Abrasive |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26393296A JP3981168B2 (en) | 1996-10-04 | 1996-10-04 | Abrasive |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10110183A true JPH10110183A (en) | 1998-04-28 |
| JP3981168B2 JP3981168B2 (en) | 2007-09-26 |
Family
ID=17396273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26393296A Expired - Lifetime JP3981168B2 (en) | 1996-10-04 | 1996-10-04 | Abrasive |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3981168B2 (en) |
Cited By (8)
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|---|---|---|---|---|
| JP2009541173A (en) * | 2006-06-23 | 2009-11-26 | イーコラブ インコーポレイティド | Aqueous composition useful for filling and transporting beverage bottles having hardness ions and improved compatibility with PET |
| WO2010113678A1 (en) * | 2009-03-31 | 2010-10-07 | 出光興産株式会社 | Working fluid for brittle material and working fluid for hard material |
| WO2012001884A1 (en) * | 2010-06-30 | 2012-01-05 | コニカミノルタオプト株式会社 | Method for manufacturing glass substrate for information recording media |
| WO2018216756A1 (en) * | 2017-05-25 | 2018-11-29 | 三菱瓦斯化学株式会社 | Cutting work assisting lubricating material, cutting work assisting lubricating sheet, and cutting method |
| US11325199B2 (en) | 2016-02-17 | 2022-05-10 | Mitsubishi Gas Chemical Company, Inc. | Cutting work method and method for producing cut product |
| US11383307B2 (en) | 2015-09-02 | 2022-07-12 | Mitsubishi Gas Chemical Company, Inc. | Entry sheet for drilling and method for drilling processing using same |
| WO2022210926A1 (en) * | 2021-03-31 | 2022-10-06 | 出光興産株式会社 | Processing fluid, processing fluid composition, and brittle material processing fluid composition |
| US11819930B2 (en) | 2016-11-14 | 2023-11-21 | Mitsubishi Gas Chemical Company, Inc. | Material for built-up edge formation and built-up edge formation method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009541173A (en) * | 2006-06-23 | 2009-11-26 | イーコラブ インコーポレイティド | Aqueous composition useful for filling and transporting beverage bottles having hardness ions and improved compatibility with PET |
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| JP5639996B2 (en) * | 2009-03-31 | 2014-12-10 | 出光興産株式会社 | Processing fluid for brittle materials and processing fluid for hard materials |
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| WO2018216756A1 (en) * | 2017-05-25 | 2018-11-29 | 三菱瓦斯化学株式会社 | Cutting work assisting lubricating material, cutting work assisting lubricating sheet, and cutting method |
| JPWO2018216756A1 (en) * | 2017-05-25 | 2020-03-26 | 三菱瓦斯化学株式会社 | Cutting auxiliary lubricating material, cutting auxiliary lubricating sheet, and cutting method |
| US11225625B2 (en) | 2017-05-25 | 2022-01-18 | Mitsubishi Gas Chemical Company, Inc. | Lubricant material for assisting machining process, lubricant sheet for assisting machining process, and machining method |
| WO2022210926A1 (en) * | 2021-03-31 | 2022-10-06 | 出光興産株式会社 | Processing fluid, processing fluid composition, and brittle material processing fluid composition |
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