JPH0933923A - Surface light source device and manufacture of substrate used therefor - Google Patents
Surface light source device and manufacture of substrate used thereforInfo
- Publication number
- JPH0933923A JPH0933923A JP7208461A JP20846195A JPH0933923A JP H0933923 A JPH0933923 A JP H0933923A JP 7208461 A JP7208461 A JP 7208461A JP 20846195 A JP20846195 A JP 20846195A JP H0933923 A JPH0933923 A JP H0933923A
- Authority
- JP
- Japan
- Prior art keywords
- light
- source device
- transparent resin
- light source
- scattering pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Light Guides In General And Applications Therefor (AREA)
- Liquid Crystal (AREA)
- Planar Illumination Modules (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、看板や各種表示装
置等の背面照明に用いる薄型の面状光源装置に関するも
のであり、特に液晶表示装置の背面照明手段として好適
に使用されるものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin planar light source device used for back lighting of signboards, various display devices and the like, and is particularly preferably used as back lighting means for liquid crystal display devices. .
【０００２】[0002]
【従来の技術】従来、薄型の面状光源装置としては、サ
イドライト方式（導光板方式）が知られている。サイド
ライト方式の面状光源装置の一例として、その構造は、
図６、図７に示されるように、アクリル等の透光性の高
い材料による略断面矩形状の透明樹脂基板３１の裏面３
２には、白色または乳白色インクにより、一端側から他
端側に行くにつれてその密度が変化するように、通常ス
クリーン印刷方式により印刷された散乱パターン３３が
施されている。さらに、該散乱パターン３３の後方に
は、反射板３４が配置されている。また、透明樹脂基板
３１の表面３５には、拡散板３６が配置されている。2. Description of the Related Art Conventionally, a side light system (light guide plate system) has been known as a thin planar light source device. As an example of a side light type planar light source device, the structure is
As shown in FIGS. 6 and 7, the back surface 3 of the transparent resin substrate 31 made of a highly transparent material such as acrylic and having a substantially rectangular cross section.
2 is provided with a scattering pattern 33 printed by a normal screen printing method with white or milky white ink so that the density thereof changes from one end side to the other end side. Further, a reflecting plate 34 is arranged behind the scattering pattern 33. A diffusion plate 36 is arranged on the surface 35 of the transparent resin substrate 31.
【０００３】透明樹脂基板３１の端面３７には、線状光
源である蛍光管３８が透明樹脂基板３１の端面３７とほ
ぼ当接するように置かれており、その外周面でかつ前記
端部３７を向いた面以外の部分は、銀等を蒸着した反射
フィルム３９で覆われている。蛍光管３８が置かれてい
る以外の透明樹脂基板３１の端面は、反射テープ等の反
射材４０が付加されている。（例えば、特開昭６３−６
２１０５号公開）A fluorescent tube 38, which is a linear light source, is placed on the end surface 37 of the transparent resin substrate 31 so as to be substantially in contact with the end surface 37 of the transparent resin substrate 31. The part other than the facing surface is covered with a reflective film 39 in which silver or the like is vapor-deposited. A reflective material 40 such as a reflective tape is added to the end surface of the transparent resin substrate 31 except where the fluorescent tube 38 is placed. (For example, JP-A-63-6
(No. 2105 released)
【０００４】図８は、このように構成されたサイドライ
ト方式の面状光源装置における光線の挙動を説明するた
めの模式的な断面図である。これを説明すると、蛍光管
３８からの発光光線は、反射フィルム３９により反射さ
れるので、多くが透明樹脂基板３１の端面３７に到達
し、透明樹脂基板３１の内部に進入する。この光線の
内、透明樹脂基板３１の裏面３２に印刷されている散乱
パターン３３に当たる光線４１だけが散乱され反射し、
透明樹脂基板３１の表面に達する散乱された光線４２及
び散乱パターン３３を透過し裏面に抜けて反射板３４に
当たって反射し透明樹脂基板３１の表面３５に向かう光
線４３の２つの光線は、符号４４で示すように、拡散板
３６を透過して表面３５に放射される。FIG. 8 is a schematic cross-sectional view for explaining the behavior of light rays in the side light type planar light source device configured as described above. Explaining this, since the light emitted from the fluorescent tube 38 is reflected by the reflection film 39, most of it reaches the end surface 37 of the transparent resin substrate 31 and enters the inside of the transparent resin substrate 31. Of this light ray, only the light ray 41 that hits the scattering pattern 33 printed on the back surface 32 of the transparent resin substrate 31 is scattered and reflected,
Two light rays, namely, a light ray 43 that reaches the surface of the transparent resin substrate 31 and a light ray 43 that passes through the scattering pattern 33, passes through the back surface, strikes the reflection plate 34, is reflected, and travels to the front surface 35 of the transparent resin substrate 31 are denoted by reference numeral 44. As shown, the light is transmitted through the diffuser plate 36 and radiated to the surface 35.
【０００５】透明樹脂基板３１の裏面３２に施された散
乱パターン３３に当たらない光線４５及び透明樹脂基板
３１の表面３５に当たる光線４６は散乱パターン３３に
到達するまでそのまま内部で全反射を繰り返して進む。
出射光が全画面上で均一な発光強度になるよう光源から
の距離に応じて散乱パターンに密度分布を与えているこ
とにより、比較的高輝度でしかも均一な面状光源が実現
可能となっている。A light ray 45 that does not hit the scattering pattern 33 applied to the back surface 32 of the transparent resin substrate 31 and a light ray 46 that hits the front surface 35 of the transparent resin substrate 31 repeat the total internal reflection until they reach the scattering pattern 33. .
By providing a density distribution in the scattering pattern according to the distance from the light source so that the emitted light has a uniform emission intensity on the entire screen, it is possible to realize a planar light source with comparatively high brightness. There is.
【０００６】[0006]
【発明が解決ようとする課題】ところで、面状光源装置
に使用される透明樹脂基板３１の裏面に印刷される白色
または乳白色インクで印刷された散乱パターン３３は、
上述したように、通常スクリーン印刷方式によって印刷
されている。このスクリーン印刷方式は、印刷工程にお
いて、インクを付加した後の乾燥工程で長い時間を必要
とするため、生産性が極めて低いという欠点があった。
また、使用する溶剤による環境の汚染問題も危惧され
る。By the way, the scattering pattern 33 printed on the back surface of the transparent resin substrate 31 used in the planar light source device is printed with white or milky white ink.
As described above, it is usually printed by the screen printing method. This screen printing method has a drawback that productivity is extremely low because a long time is required in a drying step after adding ink in a printing step.
In addition, there is a fear of environmental pollution caused by the solvent used.
【０００７】そこで、本発明は、散乱パターン製造工程
における生産性の向上と、かつ環境の汚染問題のない新
規の散乱パターンを設置した面状光源装置および面状光
源装置に用いられる基板の製造方法を提供することを目
的とする。In view of the above, the present invention is directed to an improvement in productivity in the step of producing a scattering pattern and a method of manufacturing a planar light source device provided with a novel scattering pattern having no environmental pollution problem and a substrate used in the planar light source device. The purpose is to provide.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
に、請求項１の発明は、透明樹脂基板の少なくとも１つ
以上の端面に１本または複数本の直線状の蛍光管を配置
させて構成するいわゆるサイドライト方式の面状光源装
置の透明樹脂基板の裏面に、前記蛍光管から遠ざかるに
従ってその存在密度が増加するように、微小な凹凸面に
よる光散乱パターンを付与した構成とする面状光源装置
である。In order to achieve the above object, the invention of claim 1 is one in which at least one end face of a transparent resin substrate is provided with one or more linear fluorescent tubes. The surface of the transparent resin substrate of the so-called sidelight type planar light source device, which has a structure in which a light-scattering pattern is provided by minute uneven surfaces so that the existing density increases as the distance from the fluorescent tube increases. It is a light source device.
【０００９】請求項２の発明は、上記光散乱パターンの
凹凸面の算術平均粗さ（Ｒａ）が少なくとも０．１μｍ
以上とする面状光源装置である。According to a second aspect of the present invention, the arithmetic mean roughness (Ra) of the uneven surface of the light scattering pattern is at least 0.1 μm.
The above is the planar light source device.
【００１０】また、請求項３の発明は、微小凹凸面によ
る光散乱パターンの型が形成された型内に液状樹脂を注
入し、その上部に透明樹脂基材を密接させ、該密着させ
た状態で該液状樹脂を重合硬化させるこよにより、透明
樹脂基材と液状樹脂とを一体的に形成する面状光源装置
に用いられる基板の製造方法である。Further, in a third aspect of the present invention, a liquid resin is injected into a mold in which a mold having a light-scattering pattern is formed by a minute uneven surface, and a transparent resin base material is brought into close contact with the upper part of the mold, and the state of close contact Is a method for manufacturing a substrate used in a planar light source device in which a transparent resin substrate and a liquid resin are integrally formed by polymerizing and curing the liquid resin.
【００１１】請求項４の発明は、上記光散乱パターンを
製造時、液状樹脂を紫外線を照射することにより重合硬
化させることにより、透明樹脂基材と液状樹脂とを一体
的に形成する面状光源装置に用いられる基板の製造方法
である。According to a fourth aspect of the present invention, at the time of manufacturing the light-scattering pattern, the liquid resin is polymerized and cured by irradiating with ultraviolet rays to thereby integrally form a transparent resin substrate and the liquid resin. It is a method of manufacturing a substrate used in an apparatus.
【００１２】請求項５の発明は、透明樹脂基板に光散乱
パターンを形成させるための微小凹凸面を押し当てて熱
加圧成形をすることにより微小凹凸面による光散乱パタ
ーンを一体的に形成できる面状光源装置に用いられる基
板の製造方法である。According to the fifth aspect of the present invention, the light scattering pattern can be integrally formed by the minute concavo-convex surface by pressing the minute concavo-convex surface for forming the light scattering pattern on the transparent resin substrate and performing thermocompression molding. It is a manufacturing method of a substrate used for a planar light source device.
【００１３】請求項６の発明は、微小凹凸面による光散
乱パターンが形成された型または、光散乱パターンを形
成させるための微小凹凸面を製造する工程において、金
属板の不要部分をマスキングした後、サンドブラスト法
により形成することを特徴とした面状光源装置に用いら
れる基板の製造方法である。According to a sixth aspect of the present invention, in a step of manufacturing a mold in which a light scattering pattern is formed by a minute uneven surface or a minute uneven surface for forming the light scattering pattern, after unnecessary portions of the metal plate are masked. A method for manufacturing a substrate used in a planar light source device, characterized by being formed by a sandblast method.
【００１４】請求項７の発明は、微小凹凸面による光散
乱パターンが形成された型または光散乱パターンを形成
させるための微小凹凸面を製造する工程において、金属
板の不要部分をマスキングする時に、ドライフィルムレ
ジストを使用することを特徴とした面状光源装置に用い
られる基板の製造方法である。According to a seventh aspect of the present invention, in a step of manufacturing a mold having a light scattering pattern formed by a fine uneven surface or a fine uneven surface for forming a light scattering pattern, when an unnecessary portion of the metal plate is masked, A method of manufacturing a substrate used in a planar light source device, characterized by using a dry film resist.
【００１５】[0015]
【発明の実施の形態】本発明の面状光源装置の構造を図
１、図２および図３に基づいて説明する。図１におい
て、図面上方が本発明の面状光源装置の表面であり、下
方が裏面となる。略断面矩形状の透明樹脂基板１は、透
光性の高いアクリル等よりなる透明樹脂基材２と、面状
光源装置裏面側に形成される微小凹凸面による光散乱パ
ターン３が一体化されてなる。光散乱パターン３は、蛍
光管７から遠ざかるに従ってその存在密度が増加するよ
うに、微小な凹凸面からなる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of the planar light source device of the present invention will be described with reference to FIGS. 1, 2 and 3. In FIG. 1, the upper side of the drawing is the front surface of the planar light source device of the present invention, and the lower side is the back surface. The transparent resin substrate 1 having a substantially rectangular cross-section has a transparent resin substrate 2 made of acrylic or the like having high light transmissivity and a light scattering pattern 3 formed by a minute uneven surface formed on the back side of the planar light source device. Become. The light-scattering pattern 3 is composed of minute uneven surfaces so that the existing density thereof increases as the distance from the fluorescent tube 7 increases.
【００１６】さらに、該光散乱パターン３の後方には、
反射板４が装置裏面を覆うように配置されている。また
透明樹脂基板１の表面の画面全体は、拡散板５で覆われ
ている。一方、透明樹脂基板１の一端面６に近接するよ
うに、蛍光管７が置かれており、透明樹脂基板１が配置
されている以外の蛍光管７の外周は銀を蒸着した反射フ
ィルム８で覆われている。他端面は、反射フィルム等の
反射材９が付加されている。Further, behind the light scattering pattern 3,
The reflector 4 is arranged so as to cover the back surface of the device. The entire screen on the surface of the transparent resin substrate 1 is covered with the diffusion plate 5. On the other hand, the fluorescent tube 7 is placed so as to be close to the one end face 6 of the transparent resin substrate 1, and the outer periphery of the fluorescent tube 7 other than the transparent resin substrate 1 is provided with a reflective film 8 vapor-deposited with silver. Is covered. A reflecting material 9 such as a reflecting film is added to the other end surface.
【００１７】下記に示される表１は、試作品の面状光源
装置内の光散乱パターンの表面の凹凸形状の算術平均粗
さ（Ｒａ）とその際の光拡散性を示す曇価の関係を示す
ものである。表１より、算術平均粗さ（Ｒａ）が０．１
μｍ以下では、光拡散性がほとんど得られないことか
ら、従来例の白色または乳白色インクで印刷された散乱
パターンと同程度の光拡散性を得るためには、本発明の
面状光源装置に設置される光散乱パターン表面の凹凸形
状の算術平均粗さ（Ｒａ）は、少なくとも０．１μｍ以
上が必要である。Table 1 shown below shows the relationship between the arithmetic mean roughness (Ra) of the unevenness of the surface of the light scattering pattern in the surface light source device of the prototype and the haze value indicating the light diffusing property at that time. It is shown. From Table 1, the arithmetic average roughness (Ra) is 0.1.
When the thickness is less than μm, almost no light diffusivity is obtained. Therefore, in order to obtain a light diffusivity similar to that of the scattering pattern printed by the conventional white or milky white ink, the surface light source device of the present invention is installed. The arithmetic mean roughness (Ra) of the irregularities on the surface of the light scattering pattern is required to be at least 0.1 μm or more.
【００１８】[0018]
【表１】 [Table 1]
【００１９】ゆえに、従来の白色または乳白色インクで
印刷された散乱パターンを備えた面状光源装置と同様に
高輝度な発光強度を有するために光散乱パターンの表面
の凹凸形状の算術的粗さ（Ｒａ）が０．１μｍ以上の光
散乱パターンを備えた面状光源装置が用いられる。Therefore, the surface roughness of the light-scattering pattern has an arithmetical roughness (in order to have a high-intensity emission intensity as in the conventional planar light source device having a scattering pattern printed with white or milky white ink). A planar light source device having a light scattering pattern having Ra of 0.1 μm or more is used.
【００２０】次に、本発明における面状光源装置の作用
を説明する。蛍光管７からの発光光線は、反射フィルム
８で覆われる透明樹脂基板１の端面６以外の蛍光管７の
外周面では反射され、発光された光線の多くが、端面６
に到達し透明樹脂基板１内に進入する。光散乱パターン
３に達した発光光線は、表面側に拡散され、透明樹脂基
板１の表面へ向かい進入角度の大きい光線は、拡散板６
を透過して表面に放射され、それ以外は、裏面方向に反
射する。Next, the operation of the surface light source device according to the present invention will be described. Light emitted from the fluorescent tube 7 is reflected by the outer peripheral surface of the fluorescent tube 7 other than the end surface 6 of the transparent resin substrate 1 covered with the reflective film 8, and most of the emitted light is reflected by the end surface 6.
And reaches the inside of the transparent resin substrate 1. The emitted light rays reaching the light scattering pattern 3 are diffused to the front surface side, and the light rays having a large entrance angle toward the surface of the transparent resin substrate 1 are diffused.
Is radiated to the front surface and is reflected to the back surface.
【００２１】光散乱パターン３を透過した発光光線は、
後方の反射板４により、やはり表面方向に反射する。ま
た、光散乱パターン３に達しない発光光線も、反射板４
および拡散板５に当たり反射を繰り返すうちに、透明樹
脂基板１の表面への進入角度が変化するので、表面に放
射される。なお、光散乱パターン３に形成された微小凹
凸形状は、図１において右側にいくほど密度が大きくな
るので、光は右側に行くほど散乱され表面に放射される
ため、光源の位置に左右されることなく全画面上で均一
に発光される。The emitted light which has passed through the light scattering pattern 3 is
The reflection plate 4 on the rear side also reflects in the surface direction. In addition, the emitted light rays that do not reach the light scattering pattern 3 are also reflected by the reflection plate 4.
While the light is struck by the diffuser plate 5 and is repeatedly reflected, the angle of approach to the surface of the transparent resin substrate 1 changes, and the light is emitted to the surface. In addition, since the density of the fine unevenness formed on the light scattering pattern 3 increases toward the right side in FIG. 1, the light is scattered toward the right side and is emitted to the surface. Therefore, it depends on the position of the light source. The light is emitted uniformly on the entire screen without any light.
【００２２】図３に基づいて、透明樹脂基材２と光散乱
パターン３が一体化に形成された図２に示す透明樹脂基
板１の製造方法を説明する。本実施例１においては、屈
折率１．４９の紫外線吸収材の混入されていない透明ア
クリル樹脂板を基材（透明樹脂基材２）と、屈折率１．
５の紫外線硬化型の液状樹脂（透明液状樹脂３ａ）とを
用いて面状光源装置に用いられる基板を製造する。微小
凹凸面による光散乱パターン形成用の型は黄銅板に、あ
らかじめドライフィルムレジストにより、パターン形成
を行い、ＳｉＣビーズによりサンドブラストを実施し作
製したものをマスターとし、これをシリコンゴムで転写
し複製したものを型１０とした。A method of manufacturing the transparent resin substrate 1 shown in FIG. 2 in which the transparent resin substrate 2 and the light scattering pattern 3 are integrally formed will be described with reference to FIG. In Example 1, a transparent acrylic resin plate having a refractive index of 1.49 and no ultraviolet absorber mixed therein was used as a base material (transparent resin base material 2) and a refractive index of 1.
A substrate used in the planar light source device is manufactured using the ultraviolet curable liquid resin (transparent liquid resin 3a) of No. 5. The mold for forming the light-scattering pattern by the minute uneven surface was formed by performing pattern formation on a brass plate in advance with a dry film resist and performing sandblasting with SiC beads, and using this as a master, this was transferred with silicon rubber and duplicated. The thing was set as the mold 10.
【００２３】上述の方法により作製された型１０内に、
図３（ａ）に示すように、透明液状樹脂３ａを注入す
る。しかる後、図３（ｂ）に示す透明樹脂基材２を透明
液状樹脂層の上にかぶせると、図３（ｃ）のようになっ
ている。次に、図３（ｃ）において上方から紫外線を照
射して、透明樹脂基材２を密接させた状態で透明液状樹
脂３ａを重合硬化させる。この後、型１０を剥離するこ
とにより、図２に示すような透明樹脂基材２と微小凹凸
面による光散乱パターン３が別材料により一体化された
透明樹脂基板１が製造できる。In the mold 10 produced by the above method,
As shown in FIG. 3A, the transparent liquid resin 3a is injected. Then, when the transparent resin base material 2 shown in FIG. 3 (b) is put on the transparent liquid resin layer, the result is as shown in FIG. 3 (c). Next, in FIG. 3 (c), ultraviolet rays are irradiated from above to polymerize and cure the transparent liquid resin 3a in a state where the transparent resin substrate 2 is in close contact. After that, the mold 10 is peeled off to manufacture the transparent resin substrate 1 in which the transparent resin base material 2 and the light scattering pattern 3 formed by the minute uneven surface as shown in FIG. 2 are integrated by another material.
【００２４】次に図４、図５に基づいて、面状光源装置
に用いられる光散乱パターンを有する透明樹脂基板の別
の製造方法を示す。図４は、本実施例の略断面矩形状の
透明樹脂基板２１の断面図である。透明樹脂基板２１
は、透明樹脂基材２２からなり、その一面には、微小凹
凸形状からなる光散乱パターン２３が形成されている。
透明樹脂基板となるのは、屈折率１．４９の透明アクリ
ル樹脂板（透明樹脂基材２２）を用いる。微小凹凸面に
よる光散乱パターン形成用の型は、前掲の実施例で使用
したものと同一の黄銅板を使用して作成し、凹凸面２４
とした。Next, another method for manufacturing a transparent resin substrate having a light scattering pattern used in a planar light source device will be described with reference to FIGS. 4 and 5. FIG. 4 is a cross-sectional view of the transparent resin substrate 21 having a substantially rectangular cross section according to this embodiment. Transparent resin substrate 21
Is made of a transparent resin base material 22, and a light-scattering pattern 23 having a minute concavo-convex shape is formed on one surface thereof.
A transparent acrylic resin plate (transparent resin base material 22) having a refractive index of 1.49 is used as the transparent resin substrate. The mold for forming the light-scattering pattern by the minute uneven surface is made by using the same brass plate as that used in the above-mentioned embodiment, and the uneven surface 24
And
【００２５】図４に示す透明樹脂基板２１の製造方法
は、図５（ａ）に示す微小凹凸面による光散乱パターン
２３を形成させるための凹凸面２４を、温度１８０度、
圧力５０ｋｇ／ｍ2 で、図５（ｂ）に示す透明樹脂基材
２２に押し当てて、熱加圧熱成形することにより、透明
樹脂基材２２に凹面が形成され、透明樹脂基材２２と光
散乱パターン２３が一体的に形成した透明樹脂基板２１
が製造できる。In the method of manufacturing the transparent resin substrate 21 shown in FIG. 4, the uneven surface 24 for forming the light scattering pattern 23 by the minute uneven surface shown in FIG.
A pressure is applied to the transparent resin base material 22 shown in FIG. 5B at a pressure of 50 kg / m 2 and thermocompression molding is performed to form a concave surface on the transparent resin base material 22. Transparent resin substrate 21 integrally formed with a light scattering pattern 23
Can be manufactured.
【００２６】上記２つの実施例において、それぞれの方
法で作成した透明樹脂基板を用いて、図１に示す構成の
面状光源装置の評価を行った。その結果、発光面上での
明るさ及びその均一性共に従来の白色または乳白色イン
クで印刷した散乱パターンを有する面状光源装置とほと
んど同一の結果を得ることができた。In the above two examples, the planar light source device having the structure shown in FIG. 1 was evaluated using the transparent resin substrates prepared by the respective methods. As a result, almost the same result as the surface light source device having the scattering pattern printed by the conventional white or milky white ink can be obtained in terms of the brightness on the light emitting surface and the uniformity thereof.
【００２７】また、本発明に係る微小凹凸面による光散
乱パターンの製造方法については、上記の実施例に限定
されるものではなく、射出成形法、ローラ成形法その他
の方法によって製造してもよい。The method for producing the light-scattering pattern by the minute uneven surface according to the present invention is not limited to the above-mentioned embodiment, and it may be produced by an injection molding method, a roller molding method or the like. .
【００２８】なお、本発明を実施するに際して用いる透
明樹脂基材は、その透明性からアクリル樹脂がもっとも
適しているが、特にこれに限定されるものではなく、ポ
リカーボメイト、ポリスチレン、ＡＳ樹脂等の各種熱可
塑性の透明樹脂等が使用可能であり、また、ＣＲ−３９
等の熱硬化性樹脂や各種ガラス材料等の無機材料等も透
明であれば場合によっては適用可能である。Acrylic resin is most suitable for the transparent resin substrate used in the practice of the present invention because of its transparency, but it is not particularly limited to this, and polycarbonate resin, polystyrene, AS resin and the like can be used. Various thermoplastic transparent resins can be used, and CR-39
Thermosetting resins such as and inorganic materials such as various glass materials may be applied depending on the case as long as they are transparent.
【００２９】[0029]
【発明の効果】以上詳述した通り、本発明の面状光源装
置内に形成される光散乱パターンを従来の白色または乳
白色インクで印刷するのではなく、微小凹凸面による光
散乱パターンとした。従って、光散乱パターン形成工程
において、低い生産効率の原因であったインクを乾燥さ
せるための時間が省略できる。また本発明では、透明樹
脂基板と光散乱パターンを一体的に形成できるので、２
者を密着させる工程を新たに行わなくてもよいため、短
い工程による高い生産性を得る。また、インクを使用し
ないことから、溶剤による環境汚染の問題もなくなる。As described above in detail, the light-scattering pattern formed in the planar light source device of the present invention is not printed by the conventional white or milky white ink, but the light-scattering pattern by the fine uneven surface. Therefore, in the light-scattering pattern forming step, the time for drying the ink, which is a cause of low production efficiency, can be omitted. Further, in the present invention, since the transparent resin substrate and the light scattering pattern can be integrally formed,
Since it is not necessary to newly perform the step of bringing the person into close contact with each other, high productivity can be obtained by the short step. Further, since no ink is used, there is no problem of environmental pollution due to the solvent.
【００３０】光散乱パターンを形成する型または凹凸面
を製造する際には、金属板の不要部分のマスキングにド
ライフィルムレジストを使用すると、光散乱パターンを
容易に金属板上に複写でき、剥離も簡単にできる。ま
た、マスキングした後、サンドブラスト法により金属板
を削ると、同時に微小な凹凸面が金属板上に形成される
ので、１作業で２つの工程を行うことができ、製造が容
易となる。When a mold or an uneven surface for forming a light-scattering pattern is manufactured, if a dry film resist is used for masking an unnecessary portion of the metal plate, the light-scattering pattern can be easily copied on the metal plate and peeled off. Easy to do. Further, when the metal plate is shaved by the sandblast method after masking, a minute uneven surface is simultaneously formed on the metal plate, so that two steps can be performed in one operation, which facilitates manufacturing.
【図１】本発明の面状光源装置の構造を示す断面図であ
る。FIG. 1 is a cross-sectional view showing the structure of a planar light source device of the present invention.
【図２】本発明の面状光源装置を構成する別材料よりな
る透明樹脂基板の断面図である。FIG. 2 is a cross-sectional view of a transparent resin substrate made of another material which constitutes the planar light source device of the present invention.
【図３】図３の透明樹脂基板の製造方法を説明する図で
ある。FIG. 3 is a diagram illustrating a method of manufacturing the transparent resin substrate of FIG.
【図４】本発明の面状光源装置を構成する同一材料より
なる透明樹脂基板の断面図である。FIG. 4 is a cross-sectional view of a transparent resin substrate made of the same material that constitutes the planar light source device of the present invention.
【図５】図４の透明樹脂基板の製造方法を説明する図で
ある。FIG. 5 is a diagram illustrating a method of manufacturing the transparent resin substrate of FIG.
【図６】従来の面状光源装置を裏面より見た斜視図であ
る。FIG. 6 is a perspective view of a conventional planar light source device as viewed from the back side.
【図７】従来の面状光源装置の構造を示す断面図であ
る。FIG. 7 is a cross-sectional view showing a structure of a conventional planar light source device.
【図８】面状光源装置における光線の挙動を説明するた
めの模式的な断面図である。FIG. 8 is a schematic cross-sectional view for explaining the behavior of light rays in the planar light source device.
１ 透明樹脂基板 ２ 透明樹脂基材 ３ 光散乱パターン 1 transparent resin substrate 2 transparent resin substrate 3 light scattering pattern
Claims (7)
面に１本または複数本の直線状の蛍光管を配置させて構
成するいわゆるサイドライト方式の面状光源装置におい
て、該透明樹脂基板の裏面に、該蛍光管から遠ざかるに
従ってその存在密度が増加するように、微小な凹凸面に
よる光散乱パターンを付与したことを特徴とする面状光
源装置。1. A so-called sidelight type planar light source device comprising one or a plurality of linear fluorescent tubes arranged on at least one or more end faces of a transparent resin substrate, the back surface of the transparent resin substrate. 1. A planar light source device, characterized in that a light scattering pattern is provided by minute uneven surfaces so that the existing density increases with distance from the fluorescent tube.
は、少なくとも算術平均粗さ（Ｒａ）が０．１μｍ以上
であることを特徴とした請求項１記載の面状光源装置。2. The surface light source device according to claim 1, wherein the light scattering pattern by the minute uneven surface has at least an arithmetic mean roughness (Ra) of 0.1 μm or more.
形成された型内に液状樹脂を注入し、その上部に透明樹
脂基材を密接させ、該密着させた状態で該液状樹脂を重
合硬化させることにより、透明樹脂基材と硬化した樹脂
とを一体的に形成することを特徴とする請求項１記載の
面状光源装置に用いられる基板の製造方法。3. A liquid resin is injected into a mold in which a mold having a light-scattering pattern with minute irregularities is formed, a transparent resin base material is brought into close contact with the upper portion thereof, and the liquid resin is polymerized and cured in the close contact state. The method for manufacturing a substrate used in the planar light source device according to claim 1, wherein the transparent resin substrate and the cured resin are integrally formed by performing the above.
重合硬化させることを特徴とする請求項３記載の面状光
源装置に用いられる基板の製造方法。4. The method for manufacturing a substrate used in a planar light source device according to claim 3, wherein the liquid resin is polymerized and cured by irradiating it with ultraviolet rays.
せるための微小凹凸面を押し当てて熱加圧成形すること
により微小凹凸面による光散乱パターンを一体的に形成
することを特徴とする請求項１記載の面状光源装置に用
いられる基板の製造方法。5. The light-scattering pattern formed by the minute concavo-convex surface is integrally formed by pressing the minute concavo-convex surface for forming the light-scattering pattern on the transparent resin substrate and performing thermocompression molding. Item 2. A method of manufacturing a substrate used in the planar light source device according to item 1.
形成された型または光散乱パターンを形成させるための
微小凹凸面は、金属板の不要部分をマスキングした後、
サンドブラスト法により形成することを特徴とした、請
求項３または５記載の面状光源装置に用いられる基板の
製造方法。6. A mold having a light-scattering pattern formed by a fine uneven surface or a fine uneven surface for forming a light-scattering pattern is formed by masking an unnecessary portion of a metal plate,
The method for manufacturing a substrate used in the planar light source device according to claim 3, wherein the substrate is formed by a sandblast method.
使用したことを特徴とする請求項６記載の面状光源装置
に用いられる基板の製造方法。7. The method of manufacturing a substrate used in a planar light source device according to claim 6, wherein a dry film resist is used for the masking.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20846195A JP3376508B2 (en) | 1995-07-24 | 1995-07-24 | Method for manufacturing substrate used in planar light source device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20846195A JP3376508B2 (en) | 1995-07-24 | 1995-07-24 | Method for manufacturing substrate used in planar light source device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0933923A true JPH0933923A (en) | 1997-02-07 |
| JP3376508B2 JP3376508B2 (en) | 2003-02-10 |
Family
ID=16556576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20846195A Expired - Fee Related JP3376508B2 (en) | 1995-07-24 | 1995-07-24 | Method for manufacturing substrate used in planar light source device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3376508B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6286970B1 (en) | 1998-06-29 | 2001-09-11 | Minebea Co., Ltd. | Spread illuminating apparatus |
| US6431716B1 (en) | 1999-07-26 | 2002-08-13 | Minebea Co., Ltd. | Spread illuminating apparatus |
| US6499865B1 (en) | 1998-10-06 | 2002-12-31 | Minolta Co., Ltd. | Surface light source device and film scanning apparatus |
| JP2006039043A (en) * | 2004-07-23 | 2006-02-09 | Olympus Corp | Illumination optical system, illuminating device using the illumination optical system, and observation system using the illumination optical system or the illuminating device using the illumination optical system |
| JP2017200514A (en) * | 2016-05-02 | 2017-11-09 | 国立大学法人名古屋大学 | Treatment device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009043565A (en) * | 2007-08-08 | 2009-02-26 | Citizen Electronics Co Ltd | Light guide plate, planar light unit, and display device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63309918A (en) * | 1988-04-25 | 1988-12-19 | Tatsuji Mizobe | Back light device |
| JPH035725A (en) * | 1989-06-02 | 1991-01-11 | Mitsubishi Petrochem Co Ltd | Backlighting device |
| JPH0545652A (en) * | 1990-12-28 | 1993-02-26 | Mitsubishi Rayon Co Ltd | Panel light source device and production thereof |
| JPH06186562A (en) * | 1992-10-23 | 1994-07-08 | Sawaki:Kk | Light transmission plate for surface light source |
-
1995
- 1995-07-24 JP JP20846195A patent/JP3376508B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63309918A (en) * | 1988-04-25 | 1988-12-19 | Tatsuji Mizobe | Back light device |
| JPH035725A (en) * | 1989-06-02 | 1991-01-11 | Mitsubishi Petrochem Co Ltd | Backlighting device |
| JPH0545652A (en) * | 1990-12-28 | 1993-02-26 | Mitsubishi Rayon Co Ltd | Panel light source device and production thereof |
| JPH06186562A (en) * | 1992-10-23 | 1994-07-08 | Sawaki:Kk | Light transmission plate for surface light source |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6286970B1 (en) | 1998-06-29 | 2001-09-11 | Minebea Co., Ltd. | Spread illuminating apparatus |
| US6499865B1 (en) | 1998-10-06 | 2002-12-31 | Minolta Co., Ltd. | Surface light source device and film scanning apparatus |
| US6431716B1 (en) | 1999-07-26 | 2002-08-13 | Minebea Co., Ltd. | Spread illuminating apparatus |
| JP2006039043A (en) * | 2004-07-23 | 2006-02-09 | Olympus Corp | Illumination optical system, illuminating device using the illumination optical system, and observation system using the illumination optical system or the illuminating device using the illumination optical system |
| JP2017200514A (en) * | 2016-05-02 | 2017-11-09 | 国立大学法人名古屋大学 | Treatment device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3376508B2 (en) | 2003-02-10 |
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