JPH08297125A - Method and device for sucking cleaning liquid - Google Patents

Abstract

PURPOSE: To provide a cleaning liquid sucking method and its device suitable for a cleaning device mounted on an enzyme immune reaction measuring device, capable of surely sucking the cleaning liquid stored in a reaction recess, and contributing to the improvement of the reliability of enzyme immune reaction measurement. CONSTITUTION: This cleaning liquid sucking device is provided with a cleaning liquid suction nozzle 6b sucking the cleaning liquid stored in a reaction recess 2A, a micro-plate shifting mechanism positioning the reaction recess 2A below the cleaning liquid suction nozzle 6b, a nozzle height setting means vertically moving the cleaning liquid suction nozzle 6b, and a main controller controlling them. The main controller is provided with the first suction control function arranging the cleaning liquid suction nozzle 6b at the center section of the reaction recess 2A to excite the sucking action and the second suction control function positioning the cleaning liquid suction nozzle 6b at the end edge section of the reaction recess 2A to excite the sucking action.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning liquid suction method and apparatus therefor, and more particularly, to a reaction plate after cleaning a reaction recess of a microplate mounted on an enzyme immunoassay device and reacted with a sample or a reagent. The present invention relates to a cleaning liquid suction method and device for sucking the cleaning liquid accumulated in a recess.

[0002]

2. Description of the Related Art Regarding enzyme immunoreactions in clinical tests, reagent makers have been developing various techniques and various reagents used therefor as techniques for accurately grasping the immunological reactions. .

In the measurement of this enzyme immunoreaction, conventionally, as a pre-process, a sample and a reagent are dispensed, vibration and temperature control for accelerating the reaction, and a next reagent dispensing process are performed. Washing (The reaction part of the reagent to the sample is
Remaining on the wall surface even after washing) is performed repeatedly by changing various reagents.

Conventionally, different instruments are used by different operators for dispensing of specimens and reagents, vibration and temperature control for accelerating reaction, and washing for entering the next reagent dispensing process. It is being appreciated. That is, a sampler and a reagent are dispensed by a dispenser, and vibration, temperature control, and washing are performed by a shaker, respectively.
The temperature controller and the cleaning device are operated separately.

In these series of processes, the reaction measurement sample and reagent are generally treated by being injected into a microplate having a plurality of reaction recesses.

The cleaning apparatus comprises means for discharging the cleaning liquid into the reaction recess of the microplate and means for sucking the discharged cleaning liquid, and cleaning is performed by controlling these means at a predetermined timing. It is supposed to be. The suction of the cleaning liquid is performed by positioning the cleaning liquid suction nozzle at the approximate center of the bottom surface of the reaction recess for the purpose of speeding up the process.

Here, since human power is involved in the movement of the sample or the reagent, the waiting time of each sample is increased in the process of reaction measurement, and sometimes the sample is placed in a wrong place. However, the measurement of enzyme immunoreaction is time-consuming, and at the same time requires a lot of mental work for workers. For this reason, there is a demand for an apparatus capable of collectively advancing from the dispensing of a sample and a reagent to the operation of various reaction promoting means and performing a series of operations quickly and reliably. Further, in response to such a request, as a pretreatment for the enzyme immunoreaction measurement, development of an enzyme immunoreaction measuring device that automatically performs a series of treatments such as dispensing, shaking, temperature control, washing, etc. is in progress.

[0008]

However, particularly in the cleaning device of the above-mentioned conventional examples, when the cleaning liquid suction nozzle is positioned in the reaction recess and suction is performed, the cleaning liquid is applied to the bottom edge of the reaction recess. However, there is an inconvenience that the residual cleaning solution fluctuates the measurement result of the enzyme immunoreaction, and in this respect, there is room for improving the reliability of the measurement result.

[0009]

The object of the present invention is to improve the inconvenience of the conventional example, and in particular, it is suitable for a cleaning device mounted on an enzyme immunoassay measuring device and can reliably aspirate the cleaning liquid accumulated in the reaction recess. It is an object of the present invention to provide a washing liquid suction method and its device that contribute to improving the reliability of enzyme immunoassay measurement.

[0010]

According to a first aspect of the present invention, a cleaning liquid suction nozzle for sucking the cleaning liquid stored in the reaction recess of the microplate is provided, and the cleaning liquid suction nozzle is arranged in the central portion of the reaction recess. A method is adopted in which the cleaning liquid is sucked, and subsequently, the cleaning liquid suction nozzle is moved to the edge portion of the reaction recess to suck the cleaning liquid.

According to the second aspect of the present invention, a cleaning liquid suction nozzle for sucking the cleaning liquid stored in the reaction recess of the microplate is provided, and the cleaning liquid suction nozzle is arranged at the center of the bottom surface of the reaction recess to suck the cleaning liquid. After that, the cleaning liquid suction nozzle is separated from the bottom surface of the reaction concave portion, and subsequently, the cleaning liquid suction nozzle is moved to the edge portion of the reaction concave portion to suck the cleaning liquid. There is.

According to the third aspect of the present invention, a cleaning liquid suction nozzle for sucking the cleaning liquid stored in the reaction recess of the microplate, and a microplate for positioning the reaction recess of the microplate at a predetermined position directly below the cleaning liquid suction nozzle. It is provided with a transfer mechanism, a nozzle height setting means for moving the cleaning liquid suction nozzle up and down in the height direction of the reaction concave portion, and a main control portion for individually controlling the operations of these portions. Then, the main control unit arranges the cleaning liquid suction nozzle in the central portion of the reaction concave portion by the microplate transfer mechanism to urge the suction operation by the cleaning liquid suction nozzle, and the microplate transfer mechanism. The second suction control function is provided to position the suction nozzle at the end edge of the reaction recess and urge the suction operation by the cleaning liquid suction nozzle.

According to another aspect of the present invention, the main controller has a nozzle retreating function for retracting the cleaning liquid suction nozzle from the bottom surface of the reaction recess by the nozzle height setting means before the operation of the microplate transfer mechanism. , Is adopted. These are intended to achieve the above-mentioned object.

[0014]

According to the first or third aspect of the present invention, first, when the cleaning liquid suction nozzle is positioned at the bottom surface of the reaction concave portion or substantially in the center near the bottom surface, the cleaning liquid stored in the reaction concave portion is sucked. As a result, most of the cleaning liquid accumulated in the reaction recess is sucked. However, a small amount of the cleaning liquid remains on the bottom surface of the concave portion or the edge portion near the bottom surface.
Then, in response to a command from the main control unit, the microplate transfer mechanism moves the microplate slightly by a preset distance. As a result, the cleaning liquid suction nozzle is positioned at the bottom surface of the reaction recess or at the edge near the bottom surface. Then, the cleaning liquid suction nozzle sucks the cleaning liquid remaining in the edge portion.

According to the second or fourth aspect of the present invention, first, when the cleaning liquid suction nozzle is positioned at the bottom surface of the reaction recess or substantially in the center near the bottom surface, the cleaning liquid stored in the reaction recess is sucked. As a result, most of the cleaning liquid accumulated in the reaction recess is sucked. However, a small amount of the cleaning liquid remains on the bottom surface of the concave portion or the edge portion near the bottom surface. Next, the main controller urges the nozzle height setting means to retract the cleaning liquid suction nozzle from the bottom surface of the reaction recess. Subsequently, in response to a command from the main control unit, the microplate transfer mechanism moves the microplate slightly by a preset distance. Thereafter, the nozzle height setting means lowers the cleaning liquid suction nozzle to the vicinity of the bottom surface of the reaction recess or to the bottom surface thereof in response to a command from the main control unit, whereby the cleaning liquid suction nozzle is moved to the end of the reaction recess bottom surface or the vicinity of the bottom surface. Located on the edge. Then, the cleaning liquid suction nozzle sucks the cleaning liquid remaining in the edge portion.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the enzyme immunoassay measuring apparatus including the present invention will be described below with reference to FIGS.

1 and 2 show the configuration of the entire apparatus in this embodiment. The embodiment shown in FIGS. 1 and 2 has a reagent / sample tray 1 in which the arrangement positions of one or more reagents and samples are specified in advance, and a plurality of reaction recesses provided alongside the reagent / sample tray 1. A microplate guide mechanism 3 that guides the microplate 2 equipped with 2A to the immune reaction measurement site 100, and a microplate transfer mechanism that is attached to the microplate guide mechanism 3 and that applies a predetermined traveling force to the microplate 2 The belt conveyor mechanism 4 is provided. In this belt conveyor mechanism 4, a stepped belt is used.

As shown in FIG. 5, the reagent / sample tray 1 includes a reagent stocker area 13 that detachably accommodates one or more reagent stockers 11 and 12 equipped with a plurality of different reagents depending on the inspection method, and a plurality of reagent stocker areas 13. And a sample stocker area 15 for storing the sample stocker 14 having a plurality of sample storage sections 14A for individually storing the respective samples.

FIGS. 3 to 4 show a microplate 2 made of transparent plastic having a plurality of reaction recesses 2A. Two microplates 2 are prepared in the present embodiment, one microplate 2 is placed on the microplate guide mechanism 3 to inject the reagent and the specimen individually, and the other microplate 2 is the reagent / sample. It is arranged in advance on the sample tray 1 for diluting the liquid.

Along with the microplate guide mechanism 3 described above, an immune reaction measurement site 100 and a vibrating mechanism 5 for vibrating the microplate 2 into which the reagent and the sample have been injected,
A microplate cleaning mechanism 6 for individually cleaning each reaction recess 2A of the microplate 2 after completion of the immune reaction is provided.

Further, a reagent / sample dispensing mechanism 8 having a dispensing nozzle portion for sucking a predetermined amount of a sample or a reagent connects the microplate guiding mechanism 3 and the reagent / sample tray 1 above the microplate guiding mechanism 3. It is arranged in a straddle state. The reagent / sample dispensing mechanism 8 has a function of transporting and injecting the sample or the reagent sucked by the dispensing nozzle portion to the predetermined concave portion 2A of the one microplate 2 described above.

At one end of the microplate guide mechanism 3 (upper side in FIG. 1), there is a thermostat device 9 for maintaining the microplate 2 into which the reagent and the sample are injected at a predetermined reaction temperature for a certain time. It is arranged. Reference numeral 10 indicates a main body case.

The above structure will be described in more detail below.

As shown in FIGS. 1 and 6, the microplate guide mechanism 3 in this embodiment is arranged in parallel with the moving direction of the reagent / sample tray 1 described above, and has a U-shaped cross-section with an open upper side ( (See FIG. 9) is used.

In this microplate guide mechanism 3,
A pair of belt conveyor mechanisms 4 and 4 as a microplate transfer mechanism for urging a predetermined traveling force to the above-mentioned microplate 2 along the left and right side wall surfaces thereof are provided. Between the pulleys of each belt conveyor mechanism 4,
Belt support members 4A and 4A are provided, respectively, which effectively prevent the height position of the microplate 2 from changing during its traveling process. A transfer motor 84 that rotationally drives the pulley is attached to the pulley of the belt conveyor mechanism 4. Since the stepping motor is used as the transfer motor 84 for driving the pulley, it is possible to accurately transfer and position the microplate 2 at a predetermined position in the guide direction, and thereby the reaction recess 2A of the microplate 2 is washed. It can be positioned at a predetermined position directly below the suction nozzle 6b.

The microplate 2 is actually placed on the above-mentioned pair of belt conveyor mechanisms 4 via the microplate holder 24. Further, the belt of each belt conveyor mechanism 4 is provided with plate holder locking projections (not shown) for locking the microplate holders 24 at a plurality of positions thereof, whereby the microplate holders 24 are engaged. The belt conveyor mechanism 4 is integrated and driven integrally with the belt conveyor mechanism 4.

As shown in FIGS. 7 and 8, the microplate holder 24 is a frame-shaped microplate holding plate 24A for directly supporting the above-mentioned microplate 2 on the periphery thereof.
And a holding body base portion 24C that supports the microplate holding plate 24A at four locations around the supporting member 24B made of an elastic member having a narrow central portion.

Next, the microplate cleaning mechanism 6 shown in FIGS. 9 to 10 has the reaction recesses 2 of the microplate 2.
It is operated when the immune reaction of the sample and the reagent injected into A is completed, and each reaction recess 2A is individually washed. The number of cleaning nozzles 6a and 6 (12 nozzles for 6 pairs in this embodiment)
b. In the cleaning nozzles 6a and 6b, one of the shorter cleaning nozzles constitutes the cleaning liquid discharge nozzle 6a,
The other longer cleaning nozzle constitutes the cleaning liquid suction nozzle 6b.

As shown in FIGS. 11 (a) to 11 (c), the cleaning liquid suction nozzle 6b includes a nozzle body 6ba having a thin cylindrical shape, and the reaction recess 2 of the nozzle body 6ba.
It has a suction port 6bb provided at the end on the A side.
Suction port 6b of the cylindrical side surface forming the nozzle body 6ba
A fine notch 6bc is formed in a part of the end portion side having b. In this embodiment, the notch 6bc is formed in a half moon shape.

The cleaning mechanism 6 drives and controls the discharge and suction operations of the cleaning liquid by the 6 sets of 12 cleaning nozzles 6a and 6b individually for each reaction recess 2A, and also controls the 12 cleaning nozzles 6a and 6b. 9 to 10 for the nozzle operation control mechanism 33 for hanging and supporting the microplate 2.
Cleaning nozzle support member 34 that supports the nozzle operation control mechanism 33 that is arranged so as to project, and the cleaning nozzle support member 34
And a gear mechanism 37 that operates against the tension spring 36 to set the cleaning nozzles 6a and 6b to the optimum cleaning position (height position).
And a cleaning position setting motor 38 as a nozzle height setting means for urging the operation of the gear mechanism 37 to move the cleaning nozzles 6a and 6b up and down. Reference numeral 35A,
35B shows a pair of guide pieces for guiding the vertical movement of the cleaning nozzle support member 34.

The gear mechanism 37 includes the cleaning nozzle support member 3
4 and a pinion 37B that meshes with the rack 37A and is driven by the cleaning position setting motor 38 described above.

Further, a position sensor (post-collision sensor) 39 is provided at the lower end of the cleaning nozzle support member 34 in FIG. The rear-end collision sensor 39 is composed of an optical sensor and detects when a predetermined shield plate is inserted in the slit 39C provided between the light emitting portion 39A and the light receiving portion 39B in the vertical direction and outputs a predetermined signal. To do.

The rear-end collision sensor 39 is for capturing the moment when the cleaning nozzle support member 34 descends and the cleaning nozzles 6a, 6b come into contact with the bottom surface of the reaction recess 2A of the microplate 2 described above. The shield plate 34A held by the rack 37A descends as the cleaning nozzle support member 34 descends, and is inserted into the slit 39C.

On the other hand, in order to interlock the operation of the rear impact sensor 39 and the lowering operation of the cleaning nozzles 6a and 6b, the rack 37A described above is guided by the guide member 34B to move up and down the cleaning nozzle support member 34. It is equipped so that it can move in the same direction. At the same time, this rack 37A
Is always pulled upward in FIG. 10 by the tension spring 34C. Here, the tension force of the tension spring 34C is set to be somewhat stronger than the tension force of the tension spring 36 for the cleaning nozzle strut member 34 described above.

Therefore, when the cleaning nozzles 6a and 6b are inserted into the reaction recesses 2A, first, the rack 37A of the gear mechanism 37 is driven to descend, and at the same time, the cleaning nozzle support member 34 is moved via the tension spring 34C. It is driven downward against the above-mentioned tension spring 36.

When the longer cleaning liquid suction nozzle 6b comes into contact with the reaction recess 2A, the lowering operation of the entire cleaning nozzle support member 34 is stopped, so that only the rack 37A resists the tension spring 34B. It is descent driven.
At the same time, the shield plate 34A mounted on the rack 37A descends and is inserted into the slit 39C of the rear impact sensor 39 described above, and the optical path of the rear impact sensor 39 is blocked. When the rear impact sensor 39 detects the shield plate 34A, the signal is sent to a main controller 80 described later, and at the same time, the main controller 80 controls the cleaning position setting motor 38 to stop driving. It has become.

Then, the cleaning position setting motor 38 is controlled by the main controller 80 to operate in the forward or reverse direction.
The vertical movement of the cleaning nozzle support member 34 is controlled according to the movement stopping operation of the microplate 2, and during that time, the reaction recesses 2A of the microplate 2 are sequentially and effectively cleaned.

Further, the cleaning liquid can be continuously discharged and sucked from the cleaning nozzles 6a and 6b, so that the reagent remaining in the reaction recesses 2A except for the reacted film remains. The components are diluted and effectively discharged. As a result, it is not necessary to move the microplate 2 to a washing device at another place for washing, and therefore, it is possible to quickly shift to the next reagent reaction step, and immunity to a plurality of reagents in this respect can be achieved. The result of the reaction can be obtained efficiently and quickly.

In the present embodiment, the operation of each of the above units is individually controlled by the main control unit 80. Main controller 80
Is configured by a microcomputer, and sequentially executes a program for motion control prepared in advance, thereby energizing each unit with an organic motion. Here, for example, the program may be supplied by a floppy disk device.

The main control unit 80 controls the respective parts of the apparatus, in particular, by positioning the cleaning liquid suction nozzle 6b by the microplate transfer mechanism 4 in the approximate center of the bottom surface of the reaction recess 2A and the cleaning liquid suction operation by the cleaning liquid suction nozzle 6b. The first suction control function for urging the cleaning liquid suction nozzle 6b by the microplate transfer mechanism 4 and the reaction recess 2A.
And a second suction control function for urging the cleaning liquid suction operation by the cleaning liquid suction nozzle 6b positioned at the bottom edge portion of the. Further, the main control unit 80 of the present embodiment has a nozzle retreating function for retreating the cleaning liquid suction nozzle to above the reaction recess by the nozzle height setting means before the operation of the microplate transfer mechanism 4.

Specifically, as shown in FIG. 12, the main controller 80 comprises a nozzle operation control mechanism 33 which constitutes the cleaning mechanism 6.
Each function is realized by issuing a command to the cleaning position setting motor 38 and the stepping motor 84 that drives the belt conveyor mechanism 4 at preset timings.

In the present embodiment, the main controller 8 described above is used.
0, the microplate transfer mechanism 4, the cleaning mechanism 6 including the cleaning liquid suction nozzle 6b and the nozzle height setting means 38
Function as a cleaning liquid suction device in cooperation with each other.

Next, an example of the operation in the case of performing the immune reaction measurement according to the above embodiment will be described.

First, the microplate 2 in which a predetermined reagent is applied in advance to each reaction recess 2A is placed on the belt conveyor mechanism 4. Next, the belt conveyor mechanism 4
Is operated to transport the microplate 2 to a position where the reagent / sample dispensing mechanism 8 can dispense reagents and samples.

At this position, the reagent / sample dispensing mechanism 8 is operated to dispense the sample in the sample stocker 14 into each reaction recess 2A of the microplate 2. In the meantime, the reagent / sample dispensing mechanism 8 transfers the dispensing nozzle part 7 to the sample stocker 14 part and controls the descending to suck a predetermined sample, and then ascends again to be transferred to the microplate 2 side. Further, the microplate 2 side is controlled to be lowered to complete the sample dispensing operation.

When the dispensing operation is completed, the belt conveyor mechanism 4 transfers the microplate 2 to the vibrating mechanism 5. Then, the vibrating mechanism 5 is operated to vibrate the microplate 2 for a predetermined time to promote the reaction, and thereafter the microplate 2 is carried into the constant temperature bath 9 to adjust the temperature to further promote the reaction. . When the reaction accelerating process in the constant temperature bath 9 is completed, the belt conveyor mechanism 4 is operated again to convey the microplate 2 to the position of the microplate cleaning mechanism 6, and the cleaning mechanism 6 described above operates for each reaction. The inside of the recess 2A is cleaned.

The cleaning process is performed in the following procedure according to a command from the main controller 80. Hereinafter, description will be given with reference to FIGS. 14 to 15.

First, the cleaning liquid discharge nozzle 6a and the cleaning liquid suction nozzle 6b are operated by the operation of the belt conveyor mechanism 4.
The microplate 2 is transferred so that (hereinafter, a cleaning nozzle) comes to approximately the center of the reaction recess 2A (step G).
20). Next, the cleaning position setting motor 38 is driven, and the cleaning liquid discharge nozzle 6a and the cleaning liquid suction nozzle 6b descend. At this time, as shown in FIG. 13A, an operation of sucking unnecessary reagent solution by the cleaning solution suction nozzle 6b is performed (step G22). Then, the cleaning liquid suction nozzle 6
When b comes into contact with the bottom surface of the reaction recess 2A and the rear impact sensor 39 of the cleaning mechanism 6 detects this, the nozzle lowering operation is stopped, and the suction operation is stopped after a predetermined time has elapsed (step G26). At this stage, the liquid remains on the bottom edge of the reaction recess 2A (FIG. 13B).

When the first stage of the suction operation is completed in this way, the cleaning position setting motor 38 is driven next, the cleaning nozzles 6a and 6b are raised by a few step angles of the motor, and from the bottom of the reaction recess 2A. It is evacuated (step G28).
Then, the stepping motor 8 of the belt conveyor mechanism 4
4 is driven, the microplate 2A moves, and the bottom edge of the reaction recess 2A is positioned directly below the cleaning liquid suction nozzle 6b (step G30). Then, the cleaning position setting motor 38 is operated, and the cleaning nozzles 6a and 6b are gradually lowered toward the bottom edge of the reaction recess 2A. At this time, as shown in FIG. 13C, the residual liquid is sucked by the cleaning liquid suction nozzle 6b (step S32).
Then, when the cleaning liquid suction nozzle 6b comes into contact with the bottom surface of the reaction recess 2A and the rear impact sensor 39 of the cleaning mechanism 6 detects this, the suction operation and the nozzle lowering operation are stopped as described above.

Next, the cleaning position setting motor 38 is driven, and the cleaning nozzles 6a and 6b are moved to above the reaction recess 2A (step G33). Here, when the cleaning liquid is continuously discharged, the nozzle operation control mechanism 33 is driven and the cleaning liquid is discharged from the cleaning liquid discharge nozzle 6a (step G40). Whether or not the cleaning liquid is discharged depends on a program preset in the main control unit 80 according to the sample or the reagent used in the reaction recess 2A. When the cleaning liquid is not discharged, the cleaning nozzle 6a,
6b is returned to the origin position, and the cleaning operation ends (step G36).

On the other hand, when the cleaning liquid is discharged, the cleaning liquid suction nozzle 6b sucks the cleaning liquid near the surface of the recess so that the cleaning liquid does not spill from the reaction recess 2A simultaneously with the discharging operation (step G42). . Then, hereinafter, the same operation as in the case of sucking the reagent solution is urged,
2 at the bottom center and the bottom edge of the reaction recess 2A.
The cleaning liquid suction operation of the stage is performed.

When the washing by the microplate washing mechanism 6 is completed, the enzyme labeled antibody reagent is selected and dispensed from the reagent stocker 11 (or 12) described above into each reaction recess 2A of the microplate 2. . After this enzyme-labeled antibody reagent is dispensed, the microplate 2 is again carried into the constant temperature bath 9, where the temperature is adjusted to promote the reaction. After the completion of the reaction in the constant temperature bath 9, the reaction recesses 2A of the microplate 2 are again cleaned by the microplate cleaning mechanism 6.

When the steps of dispensing the enzyme-labeled antibody reagent, the reaction, and the washing are completed, then the chromogenic reagent is selected from the reagent stocker 11 (or 12), and the reaction recesses of the microplate 2 are selected. Dispensed in 2A. After this dispensing,
The microplate 2 is again carried into the constant temperature bath 9 and its temperature is adjusted to promote the reaction. After the completion of the reaction in the constant temperature bath 9, the reaction recesses 2A of the microplate 2 are again cleaned by the microplate cleaning mechanism 6.

When the steps of dispensing and reacting the color-developing reagent are completed, the stop solution reagent is then added to the reagent stocker 11
(Or 12) and is dispensed into each reaction recess 2A of the microplate 2. After the stop solution reagent is dispensed, the microplate 2 is placed at the immunoreaction measurement site 10
It is conveyed to 0, the above-mentioned immune reaction measurement is carried out, a predetermined analysis is performed based on the measurement result at this immune reaction measurement point 100, and the result is determined.

As described above, according to the above-described embodiment, in the measurement of the enzyme immunoreaction, the steps of dispensing, reaction, and washing are often repeated, so that automation, which has been considered difficult, can be performed. Therefore, there is an advantage that the enzyme immunoassay can be measured quickly and with high accuracy, and various items different for each reagent manufacturer can be tested by one device.

Further, in sucking the test liquid or the cleaning liquid in the reaction recess 2A provided in the microplate 2, first, the cleaning liquid is sucked in the substantially central portion of the reaction recess 2A, and then,
Since the two-stage suction operation of sucking the residual liquid at the edge portion is adopted, the unnecessary cleaning liquid and the like can be surely sucked completely and the reliability of the enzyme immunoassay measurement can be improved. In addition to this, since the suction is performed only in the central portion at the beginning, there is an advantage that quick suction can be performed as compared with the case where suction is always performed at the edge portion.

Furthermore, since the cleaning liquid suction nozzle 6b is retracted from the reaction recess 2A when the microplate 2 is moved, it is possible to avoid a situation where the tip of the nozzle and the side surface of the reaction recess 2A collide accidentally. As a result, it is possible to effectively prevent damage to the nozzle and damage to the reacted sample formed in the reaction recess 2A.

In addition to these, in the second stage of the cleaning liquid suction operation, the notch 6bc of the cleaning liquid suction nozzle 6b is located near the side surface of the reaction recess and the nozzle main body 6ba.
By disposing, it is possible to bring the suction port 6ba closer to the end of the bottom surface of the recess as compared with the conventional example.
The cleaning liquid remaining around the bottom surface can be more effectively sucked, and the speed and reliability of suction can be improved.

Here, among the cleaning operations in this embodiment, particularly in the suction operation, the nozzle may be positioned on the bottom surface of the reaction recess 2A and then the suction may be controlled continuously. Further, depending on the sample after the reaction, suction in the contact state may not be preferable, so it is controlled to perform suction near the bottom surface without contacting the bottom surface of the recess according to the sample after the reaction. May be.

[0060]

Since the present invention is constructed and functions as described above, according to the present invention, in the invention according to claim 1 or 3, the cleaning liquid is first sucked in the substantially central portion of the reaction recess, and then, Since the two-stage suction operation of sucking the residual liquid at the edge portion is adopted, the unnecessary cleaning liquid can be surely sucked completely and the reliability of the enzyme immunoassay measurement can be improved. In addition to this, since the suction is performed only in the central portion at the beginning, there is an advantage that quick suction can be performed as compared with the case where suction is always performed at the edge portion.

According to the second or fourth aspect of the invention, the cleaning liquid suction nozzle is retracted from the reaction recess when the microplate is moved, so that the tip of the nozzle and the side surface of the reaction recess may accidentally collide. Therefore, it is possible to effectively prevent damage to the nozzle and damage to the reacted sample formed in the reaction recess.
It is possible to provide a cleaning liquid suction device and a suction method that are not excellent in the past.

[Brief description of drawings]

FIG. 1 is a partially omitted plan view showing an embodiment of the present invention.

FIG. 2 is a schematic perspective view showing a positional relationship between the respective constituent members disclosed in FIG.

FIG. 3 is a plan view showing the configuration of the microplate disclosed in FIG.

FIG. 4 is a vertical cross-sectional view of the microplate shown in FIG.

5 is a detailed explanatory view showing the reagent / sample tray portion disclosed in FIG. 1. FIG.

6 is a partially omitted plan view showing the relationship with the belt conveyor mechanism, the vibration mechanism, and the microplate positioning mechanism disclosed in FIG. 1. FIG.

FIG. 7 is an explanatory diagram showing a main part of the vibration mechanism disclosed in FIG. 6;

FIG. 8 is an explanatory diagram showing a main part of the microplate positioning mechanism disclosed in FIG. 6;

FIG. 9 is a partially omitted front view showing an example of the cleaning mechanism disclosed in FIG.

FIG. 10 is a right side view with a part of FIG. 9 omitted.

11 is an enlarged view of the cleaning liquid suction nozzle disclosed in FIG. 9 with a part thereof omitted, FIG. 11 (a) showing a left side view,
11B shows a front view and FIG. 11C shows a perspective view of a main part.

FIG. 12 is a block diagram showing a control system of a portion related to a cleaning process in the embodiment shown in FIG.

13A and 13B are views for explaining a part of the cleaning operation by the cleaning mechanism shown in FIG. 9, where FIG. 13A shows the first stage of the cleaning liquid suction operation, and FIG. 13B shows the end of the first stage. FIG. 13C shows the state at the end of the second stage.

FIG. 14 is a flowchart for explaining the former stage of the cleaning operation in the embodiment shown in FIG.

FIG. 15 is a flowchart illustrating the latter stage of the cleaning operation in the embodiment shown in FIG.

[Explanation of symbols]

 2 Micro Plate 2A Recess for Reaction 4 Micro Plate Transfer Mechanism 6b Cleaning Liquid Suction Nozzle 38 Nozzle Height Setting Means 80 Main Controller

Claims (4)

[Claims] 1. A cleaning liquid suction nozzle for sucking the cleaning liquid stored in the reaction recess of the microplate is provided, and the cleaning liquid suction nozzle is arranged in the center of the reaction recess to suck the cleaning liquid. A method for sucking a cleaning liquid, characterized in that the cleaning liquid suction nozzle is moved to an edge portion of the reaction recess to suck the cleaning liquid. 2. A cleaning liquid suction nozzle for sucking the cleaning liquid stored in the reaction recess of the microplate, wherein the cleaning liquid suction nozzle is arranged at the center of the bottom surface of the reaction recess to suck the cleaning liquid, and then the cleaning liquid is sucked. A cleaning liquid suction method characterized in that the cleaning liquid suction nozzle is detached from the bottom surface of the reaction recess, and subsequently, the cleaning liquid suction nozzle is moved to the edge of the reaction recess to suck the cleaning liquid. 3. A cleaning liquid suction nozzle for sucking the cleaning liquid stored in the reaction recess of the microplate, and a microplate transfer mechanism for positioning the reaction recess of the microplate at a predetermined position immediately below the cleaning liquid suction nozzle.
A nozzle height setting means for moving the cleaning liquid suction nozzle up and down in the height direction of the reaction concave portion, and a main controller for individually controlling the operation of each of these parts are provided, and the main controller transfers the microplate. A first mechanism for arranging the cleaning liquid suction nozzle in the central portion of the reaction recess to urge the suction operation by the cleaning liquid suction nozzle.
And a second suction control function for positioning the cleaning liquid suction nozzle at the edge portion of the reaction recess by the microplate transfer mechanism and energizing the suction operation by the cleaning liquid suction nozzle. Cleaning liquid suction device. 4. The main controller has a nozzle retracting function for retracting the cleaning liquid suction nozzle from the bottom surface of the reaction recess by the nozzle height setting means before the operation of the microplate transfer mechanism. The cleaning liquid suction device according to claim 3.