JPH0754111A - Production of substrate for planographic printing plate - Google Patents
Production of substrate for planographic printing plateInfo
- Publication number
- JPH0754111A JPH0754111A JP5219264A JP21926493A JPH0754111A JP H0754111 A JPH0754111 A JP H0754111A JP 5219264 A JP5219264 A JP 5219264A JP 21926493 A JP21926493 A JP 21926493A JP H0754111 A JPH0754111 A JP H0754111A
- Authority
- JP
- Japan
- Prior art keywords
- sheet
- thickness
- aluminum
- rolled
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 title description 2
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 38
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 38
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 238000005097 cold rolling Methods 0.000 claims abstract description 17
- 238000005096 rolling process Methods 0.000 claims abstract description 15
- 238000000137 annealing Methods 0.000 claims abstract description 13
- 238000009749 continuous casting Methods 0.000 claims abstract description 12
- 230000006698 induction Effects 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 38
- 238000007788 roughening Methods 0.000 abstract description 20
- 239000000463 material Substances 0.000 abstract description 9
- 238000002844 melting Methods 0.000 abstract description 6
- 230000008018 melting Effects 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 230000002349 favourable effect Effects 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000005266 casting Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 238000000866 electrolytic etching Methods 0.000 description 3
- 238000004453 electron probe microanalysis Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005098 hot rolling Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Metal Rolling (AREA)
- Continuous Casting (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は平版印刷版用支持体の製
造方法に関する、特に電解粗面化特性の良いかつ機械的
強度のすぐれたアルミニウム支持体の製造方法に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a support for a lithographic printing plate, and more particularly to a method for producing an aluminum support having good electrolytic graining characteristics and excellent mechanical strength.
【0002】[0002]
【従来の技術】印刷版用アルミニウム支持体、とくにオ
フセット印刷版用支持体としてはアルミニウム板(アル
ミニウム合金板を含む)が用いられている。一般にアル
ミニウム板をオフセット印刷版用支持体として使用する
ためには、感光材料との適度な接着性と保水性を有して
いることが必要である。このためにはアルミニウム板の
表面を均一かつ緻密な砂目を有するように粗面化しなけ
ればならない。この粗面化処理は製版後実際にオフセッ
ト印刷を行ったときに版材の印刷性能や耐刷力に著しい
影響をおよぼすので、その良否は版材製造上重要な要素
となっている。2. Description of the Related Art Aluminum plates (including aluminum alloy plates) are used as aluminum supports for printing plates, especially as supports for offset printing plates. Generally, in order to use an aluminum plate as a support for an offset printing plate, it is necessary to have appropriate adhesiveness to a photosensitive material and water retention. For this purpose, the surface of the aluminum plate must be roughened so as to have uniform and fine grain. This roughening treatment has a significant influence on the printing performance and printing durability of the plate material when offset printing is actually carried out after plate making, and therefore its quality is an important factor in the plate material production.
【0003】印刷版用アルミニウム支持体の粗面化法と
しては、交流電解エッチング法が一般的に採用されてお
り、電流としては、普通の正弦波交流電流、矩形波など
の特殊交番波形電流が用いられている。そして、黒鉛等
の適当な電極を対極として交流電流により、アルミニウ
ム板の粗面化処理を行うもので、通常一回の処理で行わ
れているが、そこで得られるピット深さは全体的に浅
く、耐刷性能に劣るものであった。このため、その直径
に比べて深さの深いピットが均一かつ緻密に存在する砂
目を有する印刷版用支持体として好適なアルミニウム板
が得られるように、数々の方法が提案されている。その
方法としては、特殊電解電源波形を使った粗面化方法
(特開昭53−67507号公報)、交流を使った電解
粗面化時の陽極時と陰極時の電気量の比率(特開昭54
−65607号公報)、電源波形(特開昭55−253
81号公報)、単位面積あたりの通電量の組み合わせ
(特開昭56−29699号公報)などが知られてい
る。また、機械的な粗面化と組み合わせ(特開昭55−
142695号公報)なども知られている。An AC electrolytic etching method is generally adopted as a method for roughening the aluminum support for a printing plate, and an ordinary sine wave AC current or a special alternating waveform current such as a rectangular wave is used as a current. It is used. Roughening treatment of the aluminum plate is performed by alternating current using an appropriate electrode such as graphite as a counter electrode, which is usually performed in a single treatment, but the pit depth obtained there is generally shallow. The printing durability was inferior. Therefore, various methods have been proposed in order to obtain an aluminum plate suitable as a printing plate support having a grain in which pits having a depth deeper than its diameter are present uniformly and densely. As the method, a surface roughening method using a special electrolysis power source waveform (Japanese Patent Laid-Open No. 53-67507), a ratio of the amount of electricity at the time of anode and cathode at the time of electrolytic surface roughening using alternating current A54
-65607), power supply waveform (JP-A-55-253)
No. 81), combinations of energization amount per unit area (Japanese Patent Laid-Open No. 56-29699), and the like are known. Also, in combination with mechanical surface roughening (Japanese Patent Laid-Open No. 55-
Japanese Patent No. 142695) is also known.
【0004】一方、アルミニウム支持体の製造方法とし
ては、アルミニウムのインゴットを溶解保持してスラブ
(厚さ400〜600mm,幅1000〜2000m
m,長さ2000〜6000mm)を鋳造し、スラブ表
面の不純物組織部分を面削機にかけてて3〜10mmづ
つ切削する面削工程を経た後、スラブ内部の応力の除去
と組織の均一化の為、均熱炉において480〜540
℃,6〜12時間保持する均熱化処理工程を行い、しか
る後に熱間圧延を480〜540℃で行う。熱間圧延で
5〜40mmの厚みに圧延した後、室温で所定の厚みに
冷間圧延を行う。またその後組織の均一化のため焼鈍を
行い圧延組織等を均質化した後、規定の厚みに冷間圧延
を行い、平坦度の良い板にするため矯正する。この様に
して作られたアルミニウム支持体を平版印刷版用支持体
としていた。On the other hand, as a method of manufacturing an aluminum support, an aluminum ingot is melted and held to form a slab (thickness 400 to 600 mm, width 1000 to 2000 m).
m, length 2000 to 6000 mm), and for removing the stress inside the slab and homogenizing the structure after a chamfering step of cutting the impurity structure part of the slab surface with a chamfering machine to cut it by 3 to 10 mm , 480-540 in soaking furnace
A soaking treatment step of maintaining the temperature at 6 ° C for 6 to 12 hours is performed, and then hot rolling is performed at 480 to 540 ° C. After hot rolling to a thickness of 5 to 40 mm, cold rolling is performed to a predetermined thickness at room temperature. Further, after that, annealing is performed to homogenize the structure to homogenize the rolled structure and the like, and then cold rolling is performed to a prescribed thickness to correct the plate so as to have a good flatness. The aluminum support thus prepared was used as a support for a lithographic printing plate.
【0005】しかしながら、電解粗面化処理の場合は特
に対象となるアルミニウム支持体の影響を受けやすく、
アルミニウム支持体を溶解保持→鋳造→面削→均熱とい
う工程を通して製造する場合、加熱,冷却をくり返し、
面削という表面層を削り取る工程があったとしても、表
面層に金属合金成分などのばらつきを生じて平版印刷版
としては得率低下の原因となっていた。However, in the case of electrolytic surface-roughening treatment, it is particularly susceptible to the influence of the aluminum support as a target,
When manufacturing the aluminum support through the process of melting and holding → casting → chamfering → soaking, heating and cooling are repeated,
Even if there is a step of scraping off the surface layer called surface grinding, variations in metal alloy components and the like occur in the surface layer, which causes a reduction in the yield as a lithographic printing plate.
【0006】これに対して、本出願人は先にアルミニウ
ム支持体の材質のバラツキを少くし、電解粗面化処理の
得率を向上させることによって品質の優れた得率のよい
平版印刷版を作れる方法として、アルミニウム溶湯から
双ロールで直接板状に連続鋳造した後、冷間圧延,熱処
理を行ない、さらに矯正を行なったアルミニウム支持体
を粗面化する平版印刷版用支持体の製造方法において、
前記連続鋳造圧延によって4〜30mmの薄板を作り、
冷間圧延によって0.3mm〜3.0mmに厚みを減少
させた後、500℃〜660℃で1〜600秒、260
℃〜300℃で8時間〜12時間の2通りの中間焼鈍を
行ない、仕上げ圧延によって厚み0.1mm〜1.0mmに
減少させることを特徴とする平版印刷版用支持体の製造
方法を提案した(特願平5−91908号明細書)。On the other hand, the applicant of the present invention reduced the variation in the material of the aluminum support and improved the yield of the electrolytic surface roughening treatment to obtain a lithographic printing plate of excellent quality and good yield. As a method for producing, in a method for producing a lithographic printing plate support, which is obtained by continuously casting a molten aluminum melt into a plate directly by twin rolls, then cold rolling and heat treating, and then further roughening the straightened aluminum support. ,
Making a thin plate of 4 to 30 mm by the continuous casting and rolling,
After reducing the thickness to 0.3 mm to 3.0 mm by cold rolling, it is performed at 500 ° C. to 660 ° C. for 1 to 600 seconds, 260
We proposed a method for producing a lithographic printing plate support characterized by performing two types of intermediate annealing at 8 ° C to 300 ° C for 8 hours to 12 hours and reducing the thickness to 0.1 mm to 1.0 mm by finish rolling ( Japanese Patent Application No. 5-91908).
【0007】[0007]
【発明が解決しようとする課題】しかしながら先に提案
した本出願人の製造方法では、昇温速度の遅いバッチ炉
式では再結晶粒が大きく成長してしまい、機械的強度が
著しく低下してしまう問題点があった。However, in the manufacturing method proposed by the applicant of the present invention, recrystallized grains grow large in the batch furnace system in which the temperature rising rate is slow, and the mechanical strength is remarkably lowered. There was a problem.
【0008】本発明の目的は従来の問題点を解消し、電
解粗面化性の良いかつ機械的強度の優れた、外観も優れ
た平版印刷版を作れる平版印刷版用支持体の製造方法を
提供することにある。An object of the present invention is to solve the conventional problems and to provide a method for producing a lithographic printing plate support which is capable of producing a lithographic printing plate having good electrolytic surface-roughening property, excellent mechanical strength and excellent appearance. To provide.
【0009】即ち、本発明の上記目的はアルミニウム溶
湯から双ロールで直接板状に連続鋳造圧延した後、冷間
圧延,熱処理を行ない、さらに矯正を行なったアルミニ
ウム支持体を粗面化する平版印刷版用支持体の製造方法
において、前記連続鋳造圧延によって4mm〜30mm
の薄板を作り、冷間圧延によって0.3mm〜3.0m
mに厚みを減少させた後、誘導加熱方式により500℃
〜660℃で1秒〜600秒の2回の中間焼鈍を行な
い、仕上げ圧延によって厚み0.1mm〜1.0mmに
減少させることを特徴とする平版印刷版用支持用支持体
の製造方法。によって達成される。That is, the above-mentioned object of the present invention is a lithographic printing method in which an aluminum melt is directly cast and rolled into a plate shape by twin rolls, then cold-rolled and heat-treated, and the straightened aluminum support is roughened. In the method for manufacturing a plate support, 4 mm to 30 mm is obtained by the continuous casting and rolling.
0.3mm ~ 3.0m by cold rolling
After reducing the thickness to m, 500 ℃ by induction heating method
A method for producing a support for a lithographic printing plate, which comprises performing intermediate annealing twice at 660 ° C. for 1 second to 600 seconds and reducing the thickness to 0.1 mm to 1.0 mm by finish rolling. Achieved by
【0010】本発明の双ロールを用いてアルミニウム溶
湯から直接板状に連続鋳造圧延して薄板のコイルを形成
させる方法としては、ハンター法,3C法などの薄板連
続鋳技術が実用化されている。又特開昭60−2380
01号公報,特開昭60−240360号公報などには
薄板のコイルを作成する方法が開示されている。先ず連
続鋳造圧延によって4mm〜30mmの薄板をつくる。
次に冷間圧延によってその厚さを0.3mm〜3.0m
mに減少させ、引き続いて熱処理工程として誘導加熱方
式により500℃〜660℃で1秒〜600秒の2回の
中間焼鈍を行い、最後に冷間圧延機に再度かけて0.1
mm〜1.0mmに厚みを減少させ、その後平坦度の良
い板にするために矯正装置にかける。As a method for continuously casting and rolling a sheet of aluminum directly into a plate using the twin rolls of the present invention to form a coil of a thin plate, a thin plate continuous casting technique such as a Hunter method or a 3C method has been put into practical use. . In addition, JP-A-60-2380
No. 01, Japanese Patent Laid-Open No. 60-240360 and the like disclose a method of forming a thin plate coil. First, a thin plate of 4 mm to 30 mm is made by continuous casting and rolling.
Next, the thickness is 0.3 mm to 3.0 m by cold rolling.
m, and subsequently, as a heat treatment step, an intermediate heating is performed twice at 500 ° C. to 660 ° C. for 1 second to 600 seconds by an induction heating method, and finally, a cold rolling mill is reapplied for 0.1 second.
The thickness is reduced to mm to 1.0 mm, and then it is subjected to a straightening device to obtain a plate with good flatness.
【0011】図1の工程概念図を用いて本発明に用いる
アルミニウム支持体の製造方法の実施態様について更に
具体的に説明する。図1(A)において1は溶解保持炉
でここでインゴットは溶解保持される。ここから双ロー
ル連続鋳造装置2に送られる。つまりアルミニウム溶湯
から直接4mm〜30mmの薄板の熱間圧延コイルを形
成する、コイラー3によって巻取る。その後、図1
(B)に示すように冷間圧延機4にかけ、厚みを0.3mm
〜3.0mmに減少させ、引続いて図1(C)の熱処理工程
(但し誘導加熱焼鈍装置)5にかけ、500 〜660℃で
1秒〜600秒の2回の中間焼鈍を行い、その後最終圧
延を図1(B) の冷間圧延機4に再度かけて厚みを0.1
mm〜1.0mmに減少させる。その上で図1(D)の
矯正装置6にかける。このようにして得られた板材に粗
面化処理を行なう。図1(C)の熱処理工程に誘導加熱
を2回用いたところに本発明の特徴がある。The embodiment of the method for producing the aluminum support used in the present invention will be described more specifically with reference to the process conceptual diagram of FIG. In FIG. 1A, 1 is a melting and holding furnace, in which the ingot is held by melting. From here, it is sent to the twin roll continuous casting device 2. That is, it is wound by the coiler 3 which directly forms a hot rolled coil of a thin plate of 4 mm to 30 mm from the molten aluminum. Then, Figure 1
As shown in (B), put it on the cold rolling mill 4 and make it 0.3mm thick.
˜3.0 mm, followed by the heat treatment step 5 (induction heating annealing device) 5 of FIG. 1 (C), two intermediate anneals at 500 to 660 ° C. for 1 to 600 seconds, and then final Rolling is applied again to the cold rolling mill 4 shown in FIG. 1 (B) to reduce the thickness to 0.1.
mm to 1.0 mm. Then, it is applied to the correction device 6 shown in FIG. The plate material thus obtained is subjected to surface roughening treatment. The present invention is characterized in that induction heating is used twice in the heat treatment process of FIG.
【0012】それらの製造条件について更に詳しく説明
すると、溶解保持炉1ではアルミニウムの融点以上の温
度に保持させる必要があり、その温度はアルミニウム合
金成分によって適時変化する。一般に800℃以上であ
る。また、アルミニウム溶湯の酸化物発生の抑制、品質
上有害となるアルカリ金属の除却策として、適宜、不活
性ガスパージ、フラックス処理等が行なわれる。The manufacturing conditions thereof will be described in more detail. In the melting and holding furnace 1, it is necessary to hold the temperature above the melting point of aluminum, and the temperature changes timely depending on the aluminum alloy component. Generally, it is 800 ° C or higher. Further, as a measure to suppress the generation of oxides in the molten aluminum and to remove the alkali metal that is harmful to the quality, an inert gas purge, a flux treatment, etc. are appropriately performed.
【0013】引き続き双ロール連続鋳造装置2によって
鋳造される。鋳造方式にはいろいろあるが、現在工業的
に稼働しているのはハンター法、3C法等が殆どであ
る。鋳造温度は方式,合金によって異なるが、700℃
付近が用いられる。ハンター法,3C法を採用した場
合、溶湯を凝固させると共に双ロール間で圧延加工を行
なうことができる。この段階で得られる板材について、
断面の元素分布を、電子プロブ微量分析(以後EPMA
という)にて観察すると、厚み方向,幅方向共に元素分
布が不均一になっており、最終製品においても粗面化が
不均一になるという不具合につながる。そこで冷間圧延
機4によって、連続鋳造された薄板を0.3mm〜3m
mの厚みに減少させるように圧延を行なう。この時点で
表面の元素分布をEPMAで観察すると圧延方向に伸ば
された形で元素分布が不均一になりかつ表面の結晶マク
ロ組織を観察するとやはり圧延方向に引延ばされた結晶
になっておりこれの為に処理後の筋状ムラ、ストリーク
が悪くなる不具合につながる。そこで元素分布が均一に
なるように誘導加熱方式により500〜600℃で1秒
〜600秒1回目の中間焼鈍を行い、結晶粒子サイズを
揃えるために500℃〜660℃で1秒〜600秒の2
回目の中間焼鈍を行なう。その後仕上げ圧延によって厚
みを0.1mm〜1.0mmの薄板を作り矯正装置6に
よって矯正を行う。又、1回目と2回目の誘導加熱方式
による中間焼鈍の間に冷間圧延を行っても良い。Subsequently, it is cast by the twin roll continuous casting device 2. There are various casting methods, but most of them currently operating industrially are the Hunter method and the 3C method. The casting temperature depends on the method and alloy, but 700 ℃
The vicinity is used. When the Hunter method or the 3C method is adopted, the molten metal can be solidified and rolled between twin rolls. About the plate material obtained at this stage,
Electron probe microanalysis (hereinafter EPMA
Observation), the element distribution is non-uniform both in the thickness direction and in the width direction, leading to the problem that the roughening of the final product is not uniform. Therefore, the cold-rolling machine 4 is used to make a continuously cast thin plate 0.3 mm to 3 m.
Rolling is performed so as to reduce the thickness to m. At this point, when the element distribution on the surface is observed by EPMA, the element distribution becomes nonuniform in the form stretched in the rolling direction, and when the crystal macrostructure on the surface is observed, the crystal is also elongated in the rolling direction. This leads to a problem that streaky unevenness and streak are deteriorated after the treatment. Therefore, the first intermediate annealing is performed at 500 to 600 ° C. for 1 second to 600 seconds by the induction heating method so that the element distribution becomes uniform, and 500 ° C. to 660 ° C. for 1 second to 600 seconds in order to make the crystal grain sizes uniform. Two
Perform the second intermediate annealing. After that, a thin plate having a thickness of 0.1 mm to 1.0 mm is produced by finish rolling, and is straightened by the straightening device 6. Further, cold rolling may be performed between the first and second intermediate annealings by the induction heating method.
【0014】本発明における平版印刷版用支持体の粗面
化の方法は機械的粗面化,化学的粗面化,電気化学的粗
面化及びそれらの組合わせ等各種用いられる。機械的な
砂目立て法としては、例えばボールグレイン,ワイヤー
グレイン,ブラシグレイン,液体ホーニング法などがあ
る。また電気化学的砂目立て方法としては、交流電解エ
ッチング法が一般的に採用されており、電流としては、
普通の正弦波交流電流あるいは矩形波など、特殊交番波
形電流が用いられている。またこの電気化学的砂目立て
の前処理として、苛性ソーダなどでエッチング処理をし
ても良い。Various methods such as mechanical surface roughening, chemical surface roughening, electrochemical surface roughening, and combinations thereof can be used as the method of surface roughening the lithographic printing plate support of the present invention. Mechanical graining methods include, for example, ball grain, wire grain, brush grain, and liquid honing method. Further, as an electrochemical graining method, an alternating current electrolytic etching method is generally adopted, and as an electric current,
Special alternating waveform currents such as ordinary sine wave alternating current or rectangular wave are used. Further, as a pretreatment for this electrochemical graining, etching treatment with caustic soda may be performed.
【0015】また電気化学的粗面化を行う場合、塩酸ま
たは硝酸主体の水溶液で交番電流によって粗面化される
のが良い。以下詳細に説明する。先ず、アルミニウム支
持体は、まずアルカリエッチングされる。好ましいアル
カリ剤は、苛性ソーダ,苛性カリ,メタ珪酸ソーダ、炭
酸ソーダ,アルミン酸ソーダ,グルコン酸ソーダ等であ
る。濃度0.01〜20%,温度は20〜90℃,時間
は5sec〜5min間の範囲から選択されるのが適当
であり、好ましいエッチング量としては0.1〜5g/
m2 である。特に不純物の多い支持体の場合、0.01
〜1g/m2 が適当である。(特開平1−237197
号公報)。引き続き、アルカリエッチングしたアルミニ
ウム板の表面にアルカリに不溶な物質(スマット)が残
存するので、必要に応じてデスマット処理を行っても良
い。In the case of performing electrochemical surface roughening, it is preferable that the surface is roughened by an alternating current with an aqueous solution mainly containing hydrochloric acid or nitric acid. The details will be described below. First, the aluminum support is first alkali etched. Preferred alkaline agents are caustic soda, caustic potash, sodium metasilicate, sodium carbonate, sodium aluminate, sodium gluconate and the like. It is suitable that the concentration is 0.01 to 20%, the temperature is 20 to 90 ° C., and the time is 5 sec to 5 min. The preferable etching amount is 0.1 to 5 g /
m 2 . Particularly in the case of a support containing a large amount of impurities, 0.01
-1 g / m 2 is suitable. (JP-A-1-237197
Issue). Subsequently, an alkali-insoluble substance (smut) remains on the surface of the alkali-etched aluminum plate, and therefore a desmut treatment may be performed if necessary.
【0016】前処理は上記の通りであるが、引き続き、
本発明として塩酸,または硝酸を主体とする電解液中で
交流電解エッチングされる。交流電解電流の周波数とし
ては、0.1〜100Hz,より好ましくは0.1〜
1.0又は10〜60Hzである。液濃度としては、3
〜150g/l,より好ましくは5〜50g/l,浴内
のアルミニウムの溶解量としては50g/l以下が適当
であり、より好ましくは2〜20g/lである。必要に
よって添加物を入れても良いが、大量生産をする場合
は、液濃度制御などが難しくなる。また、電流密度は、
5〜100A/dm2 が適当であるが、10〜80A/
dm2 がより好ましい。また、電源波形としては、求め
る品質,使用されるアルミニウム支持体の成分によって
適時選択されるが、特公昭56−19280号,特公昭
55−19191号各公報に記載の特殊交番波形を用い
るのがより好ましい。この様な波形,液条件は,電気量
と共に求める品質,使用されるアルミニウム支持体の成
分などによって適時選択される。The pretreatment is as described above, but
In the present invention, AC electrolytic etching is performed in an electrolytic solution containing hydrochloric acid or nitric acid as a main component. The frequency of the alternating electrolysis current is 0.1 to 100 Hz, more preferably 0.1 to 100 Hz.
It is 1.0 or 10 to 60 Hz. The liquid concentration is 3
˜150 g / l, more preferably 5 to 50 g / l, and the amount of aluminum dissolved in the bath is preferably 50 g / l or less, and more preferably 2 to 20 g / l. If necessary, additives may be added, but in the case of mass production, it becomes difficult to control the liquid concentration. The current density is
5 to 100 A / dm 2 is suitable, but 10 to 80 A /
dm 2 is more preferred. Further, the power source waveform is appropriately selected depending on the desired quality and the components of the aluminum support to be used, but it is preferable to use the special alternating waveform described in Japanese Patent Publication Nos. 56-19280 and 55-19191. More preferable. Such waveforms and liquid conditions are appropriately selected depending on the quality required along with the quantity of electricity and the components of the aluminum support used.
【0017】電解粗面化されたアルミニウムは、次にス
マット処理の一部としてアルカリ溶液に浸漬しスマット
を溶解する。アルカリ剤としては、苛性ソーダなど各種
あるが、PH10以上,温度25〜60℃、浸漬時間1
〜10secの極めて短時間で行うことが好ましい。次
に硫酸主体の液に浸漬する。硫酸の液条件としては、従
来より一段と低い濃度50〜400g/l,温度25〜
65℃が好ましい。硫酸の濃度を400g/l以上,又
は温度を65℃以上にすると処理槽などの腐食が大きく
なる。しかも、マンガンが0.3%以上あるアルミニウ
ム合金では、電気化学的に粗面化された砂目が崩れてし
まう。また、アルミニウム素地の溶解量が0.2g/m
2 以上エッチングされると、耐刷力が低下して来るの
で、0.2g/m2 以下にすることが好ましい。The electrolytically grained aluminum is then immersed in an alkaline solution to dissolve the smut as part of the smut treatment. There are various alkaline agents such as caustic soda, but pH 10 or higher, temperature 25 to 60 ° C, immersion time 1
It is preferable to carry out in an extremely short time of 10 seconds. Next, it is dipped in a liquid containing mainly sulfuric acid. As the liquid condition of sulfuric acid, the concentration is 50-400 g / l, the temperature is 25-
65 ° C is preferred. If the concentration of sulfuric acid is 400 g / l or more, or if the temperature is 65 ° C. or more, corrosion of the processing tank and the like becomes large. Moreover, in an aluminum alloy containing 0.3% or more of manganese, the grain roughened electrochemically is broken. In addition, the dissolution amount of the aluminum substrate is 0.2 g / m
If it is etched by 2 or more, the printing durability will decrease, so it is preferably 0.2 g / m 2 or less.
【0018】陽極酸化皮膜は、0.1〜10g/m2 、
より好ましくは0.3〜5g/m2を表面に形成するの
が良い。陽極酸化の処理条件は、使用される電解液によ
って種々変化するので一概には決定されていないが、一
般的には電解液の濃度が1〜80重量%、液温度5〜7
0℃、電流密度0.5〜60A/dm2 、電圧1 〜100
V、電解時間1秒〜5分の範囲が適当である。この様に
して得られた陽極酸化皮膜を持つ砂目のアルミニウム板
はそれ自身安定で親水性に優れたものであるから、直ち
に感光性塗膜を上に設ける事も出来るが、必要により更
に表面処理を施す事が出来る。The anodic oxide film has a thickness of 0.1 to 10 g / m 2 ,
More preferably, 0.3 to 5 g / m 2 is formed on the surface. The treatment conditions for anodization are not generally determined because they vary depending on the electrolytic solution used, but generally the concentration of the electrolytic solution is 1 to 80% by weight, and the solution temperature is 5 to 7%.
0 ° C., current density 0.5-60 A / dm 2 , voltage 1-100
V and an electrolysis time of 1 second to 5 minutes are suitable. The thus-obtained aluminum plate having an anodized film is itself stable and excellent in hydrophilicity, so that a photosensitive coating film can be immediately provided on the aluminum plate, but if necessary, the surface can be further improved. Can be processed.
【0019】例えば、先に記載したアルカリ金属珪酸塩
によるシリケート層あるいは、親水性高分子化合物より
なる下塗り層を設けることができる。下塗り層の塗布量
は5〜 150mg/m2 が好ましい。For example, it is possible to provide a silicate layer made of the alkali metal silicate described above or an undercoat layer made of a hydrophilic polymer compound. The coating amount of the undercoat layer is preferably 5 to 150 mg / m 2 .
【0020】次に、このように処理したアルミニウム支
持体上に感光性塗膜を設け、画像露光、現像して製版し
た後に、印刷機にセットし、印刷を開始する。Next, a photosensitive coating film is provided on the thus treated aluminum support, imagewise exposed and developed to form a plate, which is then set in a printing machine to start printing.
【0021】[0021]
(実施例−1,比較例−1)図1(A)に示したような
連続鋳造装置にて、7.3mmの板厚のアルミニウム板
材を形成させ、0.5mm板厚まで冷間圧延して、その
後実施例−1としては誘導加熱方式による中間焼鈍を5
00℃で2回行い、比較例としては500℃で10分間
バッチ方式により2回中間焼鈍を行なった後、両方共に
更に0.24mm迄冷間圧延してテスト材を形成した。
両テスト材の引張り強度は実施例−1が17.6kg/
mm2 を示したのに対し比較例は14.9kg/mm2
であった。(Example-1 and Comparative Example-1) An aluminum plate having a plate thickness of 7.3 mm was formed by a continuous casting apparatus as shown in FIG. 1 (A), and cold-rolled to a plate thickness of 0.5 mm. Then, as Example-1, the intermediate annealing by the induction heating method is performed 5
It was performed twice at 00 ° C., and as a comparative example, intermediate annealing was performed twice at 500 ° C. for 10 minutes by a batch method, and then both were further cold rolled to 0.24 mm to form a test material.
The tensile strength of both test materials was 17.6 kg / in Example-1.
mm 2 was shown, whereas the comparative example was 14.9 kg / mm 2.
Met.
【0022】[0022]
【発明の効果】本発明の平版印刷版用支持体の製造方法
の誘導加熱方式による2回の中間焼鈍により、電解粗面
化特性の良い、かつ機械的強度のすぐれた平版印刷版用
アルミニウム支持体を得ることが出来た。Industrial Applicability The aluminum support for lithographic printing plates, which has excellent electrolytic surface roughening characteristics and excellent mechanical strength, is obtained by two intermediate annealings by the induction heating method in the method for producing a lithographic printing plate support of the present invention. I got a body.
【図1】本発明の平版印刷版用支持体の製造方法の一部
工程である、双ロール連続鋳造工程の一実施態様の側面
図(A),冷間圧延工程の一実施態様の側面図(B)、
熱処理工程の一実施態様の側面図(C)、矯正工程の一
実施態様の側面図(D)FIG. 1A is a side view of an embodiment of a twin roll continuous casting step, which is a partial step of the method for producing a lithographic printing plate support of the present invention, and a side view of an embodiment of a cold rolling step. (B),
Side view (C) of one embodiment of the heat treatment step, side view (D) of one embodiment of the straightening step
【図2】従来の昇温速度の遅い熱処理工程の一実施態様
の側面図FIG. 2 is a side view of an embodiment of a conventional heat treatment process with a slow temperature rising rate.
1 溶解保持炉 2 双ロール連続鋳造装置 3 コイラー 4 冷間圧延機 5 誘導加熱焼鈍装置(昇温速度が速い熱処理工程) 6 矯正装置 7 昇温速度の遅い熱処理工程 DESCRIPTION OF SYMBOLS 1 Melt-holding furnace 2 Twin roll continuous casting device 3 Coiler 4 Cold rolling mill 5 Induction heating annealing device (heat treatment process with fast heating rate) 6 Straightening device 7 Heat treatment process with slow heating rate
Claims (1)
状に連続鋳造圧延した後、冷間圧延,熱処理を行ない、
さらに矯正を行なったアルミニウム支持体を粗面化する
平版印刷版用支持体の製造方法において、前記連続鋳造
圧延によって4〜30mmの薄板を作り、冷間圧延によ
って0.3mm〜3.0mmに厚みを減小させた後、誘
導加熱方式により500℃〜660℃で1秒〜600秒
の2回の中間焼鈍を行ない、仕上げ圧延によって厚み
0.1mm〜1.0mmに減少させることを特徴とする
平版印刷版用支持用支持体の製造方法。1. A continuous casting and rolling process from an aluminum melt to a plate shape directly with twin rolls, followed by cold rolling and heat treatment,
In the method for producing a support for a lithographic printing plate, which further roughens an aluminum support that has been straightened, a thin plate of 4 to 30 mm is made by the continuous casting rolling, and a thickness of 0.3 mm to 3.0 mm is obtained by cold rolling. Is reduced, the intermediate annealing is performed twice at 500 ° C. to 660 ° C. for 1 second to 600 seconds by an induction heating method, and the thickness is reduced to 0.1 mm to 1.0 mm by finish rolling. A method for producing a support for a lithographic printing plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5219264A JPH0754111A (en) | 1993-08-12 | 1993-08-12 | Production of substrate for planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5219264A JPH0754111A (en) | 1993-08-12 | 1993-08-12 | Production of substrate for planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0754111A true JPH0754111A (en) | 1995-02-28 |
Family
ID=16732807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5219264A Pending JPH0754111A (en) | 1993-08-12 | 1993-08-12 | Production of substrate for planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0754111A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006007919A1 (en) * | 2004-07-15 | 2006-01-26 | Sms Demag Ag | Rolling mill for rolling metal products |
EP1625944A1 (en) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
EP2100677A1 (en) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support |
EP2110261A2 (en) | 2008-04-18 | 2009-10-21 | FUJIFILM Corporation | Aluminum alloy plate for lithographic printing plate, ligthographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
WO2010038812A1 (en) | 2008-09-30 | 2010-04-08 | 富士フイルム株式会社 | Electrolytic treatment method and electrolytic treatment device |
WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
EP2434592A2 (en) | 2010-09-24 | 2012-03-28 | Fujifilm Corporation | Anisotropically conductive member |
-
1993
- 1993-08-12 JP JP5219264A patent/JPH0754111A/en active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4805263B2 (en) * | 2004-07-15 | 2011-11-02 | エス・エム・エス・ジーマーク・アクチエンゲゼルシャフト | Rolling equipment for rolling metal products |
JP2008505766A (en) * | 2004-07-15 | 2008-02-28 | エス・エム・エス・デマーク・アクチエンゲゼルシャフト | Rolling equipment for rolling metal products |
CN100431725C (en) * | 2004-07-15 | 2008-11-12 | Sms迪马格股份公司 | Rolling mill for rolling metal products |
WO2006007919A1 (en) * | 2004-07-15 | 2006-01-26 | Sms Demag Ag | Rolling mill for rolling metal products |
US8230711B2 (en) | 2004-07-15 | 2012-07-31 | Sms Siemag Aktiengesellschaft | Rolling mill for rolling metallic material |
EP1625944A1 (en) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
EP2100677A1 (en) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support |
EP2110261A2 (en) | 2008-04-18 | 2009-10-21 | FUJIFILM Corporation | Aluminum alloy plate for lithographic printing plate, ligthographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
WO2010038812A1 (en) | 2008-09-30 | 2010-04-08 | 富士フイルム株式会社 | Electrolytic treatment method and electrolytic treatment device |
WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
EP2434592A2 (en) | 2010-09-24 | 2012-03-28 | Fujifilm Corporation | Anisotropically conductive member |
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