JPH07168004A - Formation of antireflection film - Google Patents

Abstract

PURPOSE:To provide an optical device of high visibility and high permeability at low cost by forming an antireflection film of high reliability over the surface of a transparent base using a method that provides a high mass-producing effect. CONSTITUTION:At least one or more of the following processes are employed: (1) activating the surface of a transparent base; (2) forming a coupling compound layer 2 over the surface of the transparent base 1 by reacting the surface with a silicon compound; (3) applying a fluorine-containing organic solution having at least a monomer, oligomer or polymer of a polymeric fluorine-containing organic compound dissolved therein to the surface of the transparent base 1 into a specific thickness between 0.05mum and 1mum, and polymerizing it using either a heating, ultraviolet irradiation or electron beam irradiation method to form a thin film 3 of fluorine-containing high polymer; (4) subsequent to formation of the thin film 3 of fluorine-containing high polymer over the surface of the transparent base 1, accelerating polymerization and crosslinking the fluorine-containing high polymer through electron beam irradiation, thus hardening the thin film 3.

Description

Detailed Description of the Invention

[0001]

The present invention relates to a transparent electrode substrate, a protective plate,
Regarding antireflection of a transparent substrate such as a polarizing plate and an antiglare film, it can be used for improving the visibility of optical devices such as liquid crystal display devices and pen input devices.

[0002]

2. Description of the Related Art Transparent substrates such as transparent electrode substrates, protective plates, polarizing plates, and antiglare films used for liquid crystal display devices and pen input devices have a reflection of about 5% on one side and are visually recognized. It causes the deterioration of the transparency and the transmittance. As the antireflection coating, a method of depositing a low-refractive index material such as magnesium fluoride or a method of depositing a multilayer film having a different refractive index by vapor deposition is known, and it has been put to practical use in spectacle lenses and the like. However, since the vapor deposition method requires an expensive vacuum apparatus having a low throughput, there is a problem that the vapor deposition method becomes very expensive particularly for applications requiring a large area.

Then, a method of forming an antireflection film by dissolving a transparent fluororesin, which is a low-refractive material, in a solvent and applying it, has been proposed (JP-A-3-170901, JP-A-4-170901).
63283, JP-A-4-81756, etc.). Since it is possible to continuously form an antireflection film on a large-area substrate, a significant cost reduction was expected.

[0004]

However, when a transparent fluororesin is actually applied to a transparent substrate, peeling or scratches are caused by its weak adhesion to the substrate and low surface hardness. It is easy to occur and there was a problem in terms of reliability. At a film thickness of 1 μm or more, which exhibits strength as a material, the optical characteristics are affected, the reflectance is increased, coloring is caused by interference color, and the visibility is deteriorated due to uneven color due to unevenness of the film thickness. did.

Therefore, the present invention solves such a problem, and an object of the present invention is to provide an antireflection film on the surface of a transparent substrate, which has a high mass production effect and is reliable enough to withstand practical use. By providing a forming method, an optical device having high visibility and high transmittance can be achieved at low cost.

[0006]

The above object can be achieved by using at least one or more of the following steps.

(1) A step of subjecting the surface of the transparent substrate to a surface activation treatment.

(2) A step of forming a coupling compound layer by reacting a silicon compound on the surface of a transparent substrate.

(3) A fluorine-containing organic solution containing at least a monomer, oligomer or polymer of a polymerizable fluorine-containing organic compound dissolved on the surface of a transparent substrate in an amount of 0.05 μm.
A step of forming a fluorine-containing polymer thin film by coating so as to have a specified film thickness between m and 1 μm, and polymerizing by any method of heating, ultraviolet irradiation, and electron beam irradiation.

(4) A step of forming a fluorine-containing polymer thin film on the surface of a transparent substrate, and then accelerating the polymerization by electron beam irradiation and crosslinking the fluorine-containing polymer to cure the thin film.

[0011]

In order to improve the adhesion between the transparent base material and the fluoropolymer thin film, it is effective to increase the surface energy of the base material. Surface activation treatments such as corona discharge, oxygen plasma or ozone exposure, UV irradiation, acid or alkali cleaning, and surface roughening with abrasives remove dirt adhering to the surface and make highly polar reactive groups transparent at high density. It can be applied to the surface of the flexible substrate. Although it depends on the type of substrate, surface activation treatment method, and storage environment, the surface energy decreases with time. If it is a normal coating material, the adhesion strength maintains the initial properties if the substrate is activated during film formation, but in the case of a fluorine-containing polymer thin film with extremely weak intermolecular interaction, The adhesion strength may decrease over time.

In such a case, it is effective to react a silicon compound on the surface of the transparent substrate to form a coupling compound layer. By reacting a compound having a polar group with high reactivity with a base material such as aminosilane, the surface energy of the base material can be kept high. It is more preferable to subject the transparent base material to a surface activation treatment in advance, because the bond density of the silicon compound is further increased.

Further, rather than dissolving a prepolymerized fluoropolymer in a solvent and coating the solution, a polymerizable fluorine-containing organic compound monomer or oligomer is coated, and the surface of the transparent substrate is heated, irradiated with ultraviolet rays, or irradiated with an electron beam. The adhesion strength becomes stronger when polymerized by a method such as irradiation. When a coating liquid is prepared by adding a fluorine-containing silicon compound that is soluble in a fluorine-containing organic solvent, the adhesive force with the base material is further increased through a chemical bond, so that the adhesive force is further strengthened and the deterioration with time is eliminated. It is more preferable to subject the transparent substrate to surface activation treatment or to form a coupling compound layer in advance, because the bond density becomes higher.

Next, there is a method for increasing the surface hardness of the fluorine-containing polymer thin film, but a transparent fluorine-containing polymer soluble in a solvent and having a pencil hardness of H or higher has not been reported yet. Therefore, the polymerizable fluorine-containing organic compound monomer or oligomer is dissolved in a solvent and applied, and then heated on the surface of the transparent substrate.
Polymerization is performed by a method such as ultraviolet irradiation or electron beam irradiation to form an insoluble transparent fluorine-containing polymer thin film. The film thickness that is normally used to obtain the antireflection effect is (wavelength of light) ÷ 4 ÷
It is obtained by an odd multiple of (the refractive index of the film), and the possibility is between 0.05 μm and 1 μm. However, as the film thickness increases, the wavelength dependence of the reflectance increases, and in consideration of visibility, it is necessary to achieve the surface hardness with a film thickness of about 0.1 μm. With this film thickness, the polymerization does not proceed sufficiently and the strength as a raw material does not appear.

Therefore, it is effective to form a fluorine-containing polymer thin film on the surface of a transparent substrate and then accelerate the polymerization and crosslink the fluorine-containing polymer by electron beam irradiation to cure the thin film. Even with a solvent-soluble fluorine-containing polymer, curing is promoted by crosslinking. Since the electron beam transmissivity sharply decreases with the thickness of the material, when the object is a thin film as in the present invention, the effect is large even if the accelerating voltage is not so high, and it is suitable for mass production. Although a reaction initiator and a reactive functional group are not required, depending on the type of polymer, there are some that crosslink and those that disintegrate by electron beam irradiation.
It is necessary to select the material such that the position becomes a proton.

[0016]

【Example】

(Examples 1 to 7) A transparent acrylic substrate whose surface was hard-coated was prepared. First, the surface activation treatment was performed by irradiating light from a low-pressure mercury lamp. The contact angle with water decreased from 70 degrees to 20 degrees, confirming the effect. Furthermore, next, aminosilane (SH60
20, manufactured by Torre Silicone Co., Ltd.) for 2 minutes, washed with water and dried at 60 ° C. to form a coupling compound layer. A polymerizable monomer, perfluoroalkyl acrylate, and a reaction initiator were dissolved in trifluoromethylbenzene and applied to both surfaces of a pretreated transparent acrylic substrate by a dipping method. The monomer is polymerized by irradiating it with light from a high-pressure mercury lamp to obtain a film thickness of 0.
A fluoropolymer thin film having a thickness of 1 μm and a refractive index of 1.39 was formed. The total line transmittance was changed from 90% to 96%, and the antireflection effect was confirmed. Further, the surface of the acrylic substrate was irradiated with an electron beam at an acceleration voltage of 30 kilovolts in a nitrogen atmosphere to cure the antireflection film. Infrared absorption spectrum analysis confirmed that the amount of residual double bonds was extremely small and that polymerization was proceeding. Further, it had a pencil hardness of 2H, was not dissolved in a fluorine-based solvent, and it was suggested that three-dimensional crosslinking was advanced.

FIG. 1 is an enlarged view of a schematic cross section of a transparent acrylic substrate having the antireflection film thus formed. In FIG. 1, 1 is an acrylic substrate, 2 is a coupling compound layer, and 3 is a fluorine-containing polymer thin film. When this acrylic substrate was cut and used as a front protection plate for a pocket LCD TV, a bright and easy-to-see display with little surface reflection was realized.

The adhesion of the antireflection film is determined by cross-cutting test 100.
The scratch resistance was as good as / 100, and scratches were not recognized even when the steel wool of # 0000 was reciprocated 10 times with a load of 1 kg / cm ² . No abnormalities were found in the dropping experiments of alcohol, acid, alkali and detergent.
In order to confirm the reliability, in a high temperature and high humidity test at 50 ° C. and 90% RH for 1000 hours, peeling, cracking, etc. did not occur, and burning did not occur. Also, -20 ℃, 25 ℃,
No abnormality was found in the 60 ° C. thermal shock test. Even in the sunlight exposure test of 20,000 Langley,
No abnormality was found. I tried touching the front protective plate of the LCD TV with my finger, but it was difficult to attach fingerprints, and I was able to easily wipe off the attached fingerprints. Further, even when it was heavily soiled, the initial characteristics could be restored by cleaning with a neutral detergent or a commercially available eyeglass cleaner. We were able to provide a liquid crystal display device suitable for portable use, including outdoor use.

As an example, Table 1 shows an outline of reliability characteristics when some of the steps described above are omitted. The reliability was improved by using even one process. Table 1
In, ○ is a practical level, △ is a conditional practical level,
X indicates the level of impracticality.

[0020]

[Table 1]

(Examples 8 to 13) A glass substrate having ITO transparent electrodes sputtered on one surface was prepared. This glass substrate was exposed to ozone gas to perform surface activation treatment. IT
The contact angle of the O surface with water decreased from 60 degrees to 10 degrees, confirming the effect. Next, it was immersed in a 1% by weight ethanol solution of γ-glycidoxypropyltrimethoxysilane, which is a silicon compound, for 2 minutes and dried at 80 ° C. to form a coupling compound layer. A dip method is used on both sides of a glass substrate with a transparent electrode, in which fluoroalkylsiloxane, which is a polymerizable oligomer, is partially substituted with epoxy groups, dissolved in bis (trifluoromethyl) benzene, and pretreated. Applied. The mixture was heated at 150 ° C. for 2 hours to polymerize the oligomer to form a fluoropolymer thin film having a film thickness of 0.3 μm and a refractive index of 1.38. Full line transmittance of 85% to 96%
And the antireflection effect was confirmed. In a nitrogen atmosphere,
The surface of the glass substrate was irradiated with an electron beam at an acceleration voltage of 30 kilovolts to cure the antireflection film. Infrared absorption spectrum analysis confirmed that the amount of residual epoxy groups was extremely small and polymerization was proceeding. Further, it had a pencil hardness of 3H, did not dissolve in a fluorine-based solvent, and it was suggested that three-dimensional crosslinking proceeded.

When the glass substrate with a transparent electrode on which the antireflection film is formed in this manner is cut and used for a capacitance type touch panel, a touch panel having high transparency and little reflection of external light and easy to recognize can be achieved. It was Even if the fluorine-containing polymer layer was formed, the position could be detected without any problem as a capacitance type touch panel. Moreover, the 2H pencil could not scratch the surface. When combining the liquid crystal display and touch panel,
The brightness on the display surface is 55 from the conventional 50 candela.
Improved over the candela. Almost no in-plane brightness distribution was observed, and a bright and good-looking information input / output device was achieved.

The adhesion of the antireflection film is determined by cross-cutting test 100.
The scratch resistance was as good as / 100, and scratches were not recognized even when the steel wool of # 0000 was reciprocated 10 times with a load of 1 kg / cm ² . No abnormalities were found in the dropping experiments of alcohol, acid, alkali and detergent.
In order to confirm the reliability, in a high temperature and high humidity test at 50 ° C. and 90% RH for 1000 hours, peeling, cracking, etc. did not occur, and burning did not occur. Also, -20 ℃, 25 ℃,
No abnormality was found in the 60 ° C. thermal shock test. Even in the sunlight exposure test of 20,000 Langley,
No abnormality was found. I tried touching the surface of the touch panel with my finger, but it was difficult for fingerprints to attach, and I was able to easily wipe off the attached fingerprints. Further, even when it was heavily soiled, the initial characteristics could be restored by cleaning with a neutral detergent or a commercially available eyeglass cleaner.

As an example, Table 2 shows an outline of the reliability characteristics when some of the steps described above are omitted. The reliability was improved by using even one process.

[0025]

[Table 2]

(Examples 14 to 16) Polarizing plates having an antiglare layer of 15% Haze in which silica particles were dispersed in an acrylic resin were prepared. First, a polarizing plate was passed between electrodes that were being corona-discharged by applying a voltage of 20 kilovolts to perform surface activation treatment. The contact angle with water decreased from 80 degrees to 15 degrees, confirming the effect. "Teflon AF1600", a fluorinated polymer soluble in Fluorinert FC-40 (Sumitomo 3M Limited), which is a fluorinated organic solvent
(DuPont) with a concentration of 1.5% by weight, bis- (2- (perfluoroheptyl)) which is a fluorine-containing silicon compound.
A solution prepared by dissolving 0.05% by weight of ethyl) -butyl-aminosilane was applied to the pretreated polarizing plate surface by a roll coating method. By heating at 60 ° C. for 2 hours, a fluoropolymer thin film having a film thickness of 0.7 μm and a refractive index of 1.31 was formed. The average reflectance of the surface was changed from 4.5% to 1.3%, and the antireflection effect was confirmed. Further, the haze was 15% of Haze and the antiglare effect was maintained. Further, the surface of the polarizing plate was irradiated with an electron beam at an accelerating voltage of 20 kilovolts in a nitrogen atmosphere to cure the antireflection film. H in pencil hardness
Yes, it was not dissolved in a fluorine-based solvent, suggesting that three-dimensional crosslinking is progressing.

When the polarizing plate having the antireflection film thus formed was cut and used for a liquid crystal display of a personal computer terminal, a bright and easy-to-see display free of external light was realized.

The adhesion of the antireflection film is determined by cross-cutting test 100.
The scratch resistance was as good as / 100, and scratches were not recognized even when the steel wool of # 0000 was reciprocated 10 times with a load of 200 g / cm ² . No abnormalities were found in the dropping experiments of alcohol, acid, alkali and detergent. 100 at 50 ° C, 90% RH to confirm reliability
In the 0-hour high-temperature high-humidity test, peeling, cracking, and the like did not occur, and burning did not occur. Also, -20 ℃, 25
No abnormality was found in the thermal shock tests at 60 ° C and 60 ° C. No abnormality was observed in the 20,000 Langley sun exposure test. I tried touching the polarizing plate on the display surface with my finger, but it was difficult for fingerprints to attach, and the attached fingerprints could be easily wiped off. Further, even when it was heavily soiled, the initial characteristics could be restored by cleaning with a neutral detergent or a commercially available eyeglass cleaner.

As an example, Table 3 shows an outline of reliability characteristics when some of the steps described above are omitted. The reliability was improved by using even one process.

[0030]

[Table 3]

Examples 17 to 19 Antiglare films having an antiglare layer of 5% Haze in which silica particles were dispersed in an acrylic resin were prepared. First, alumina polishing powder was sprayed on the surface, washed with a 5 wt% potassium hydroxide aqueous solution, and surface activated. The contact angle with water is 8
The effect was confirmed by decreasing from 0 degree to 25 degrees. Furthermore, next, aminosilane which is a silicon compound (Sila Ace S3
30% (manufactured by Chisso Corporation) was immersed in a 1% by weight ethanol solution for 2 minutes, washed with water and dried at 60 ° C. to form a coupling compound layer. Fluoroalkyl acrylate, which is a polymerizable monomer, was dissolved in trifluoromethylbenzene and applied to the pretreated antiglare film surface by a roll coating method. In a nitrogen atmosphere, the surface of the polarizing plate is irradiated with an electron beam at an acceleration voltage of 30 kilovolts to give a film thickness of 0.1 μm.
A fluorine-containing polymer thin film having m and a refractive index of 1.38 was formed.
The average reflectance of the surface was changed from 4.5% to 1.5%, and the antireflection effect was confirmed. The haze was 5% Haze and the antiglare effect was maintained. The antireflection film had a pencil hardness of 2H, was not dissolved in a fluorine-based solvent, and it was suggested that three-dimensional cross-linking proceeded.

When the antiglare film having the antireflection film thus formed is cut and attached to the surface of the pocket liquid crystal television with an adhesive, a bright and easy-to-see display free of external light reflection can be realized. It was

The adhesion of the antireflection film is determined by cross-cutting test 100.
The scratch resistance was as good as / 100, and scratches were not recognized even when the steel wool of # 0000 was reciprocated 10 times with a load of 1 kg / cm ² . No abnormalities were found in the dropping experiments of alcohol, acid, alkali and detergent.
In order to confirm the reliability, in a high temperature and high humidity test at 50 ° C. and 90% RH for 1000 hours, peeling, cracking, etc. did not occur, and burning did not occur. Also, -20 ℃, 25 ℃,
No abnormality was found in the 60 ° C. thermal shock test. Even in the sunlight exposure test of 20,000 Langley,
No abnormality was found. I tried touching the polarizing plate on the display surface with my finger, but it was difficult for fingerprints to attach, and the attached fingerprints could be easily wiped off. Also, even if it is heavily soiled,
By cleaning with a neutral detergent or a commercially available eyeglass cleaner, the initial characteristics could be restored. We were able to provide a liquid crystal display device suitable for portable use, including outdoor use.

As an example, Table 4 shows an outline of reliability characteristics when some of the steps described above are omitted. The reliability was improved by using even one process.

[0035]

[Table 4]

As described above with reference to the examples, there are various known substances such as polymerizable fluorine-containing organic compounds and silicon compounds, and the materials used in the method for forming an antireflection film of the present invention are not limited. Not something.

[0037]

As described above, according to the present invention, it is possible to provide a method for forming an antireflection film on the surface of a transparent substrate, which has a high mass production effect and is reliable enough to withstand practical use. The optical device with high visibility and high transmittance could be achieved at low cost.

A liquid crystal display device and a pen input device using a transparent base material such as a transparent electrode substrate, a protective plate, a polarizing plate and an antiglare film which are antireflection by the method of the present invention are completely conventional in terms of component structure. Therefore, a large improvement in visibility can be immediately obtained by the introduction of the present invention.

[Brief description of drawings]

FIG. 1 is an enlarged view of a schematic cross section of an acrylic substrate in Example 1 of the present invention.

[Explanation of symbols]

 1 Acrylic substrate 2 Coupling compound layer 3 Fluorine-containing polymer thin film

Claims (17)

[Claims] 1. A method for forming an antireflection film, which comprises subjecting a surface of a transparent substrate to a surface activation treatment and then forming a fluorine-containing polymer thin film. 2. The surface activation treatment of the surface of the transparent substrate is any one or a plurality of treatments such as corona discharge, oxygen plasma or ozone exposure, ultraviolet irradiation, acid or alkali cleaning, and surface roughening with an abrasive. The method for forming an antireflection film according to claim 1, wherein the antireflection film is formed. 3. A method of forming an antireflection film, which comprises reacting a silicon compound on the surface of a transparent substrate to form a coupling compound layer and then forming a fluorine-containing polymer thin film. 4. A fluorine-containing organic solution in which at least a monomer, oligomer or polymer of a polymerizable fluorine-containing organic compound is dissolved so that the surface of a transparent substrate has a specified film thickness of 0.05 μm to 1 μm. Apply to, heat,
A method for forming an antireflection film, comprising forming a fluorine-containing polymer thin film by polymerizing by either ultraviolet irradiation or electron beam irradiation. 5. A monomer of a polymerizable fluorine-containing organic compound,
The method for forming an antireflection film according to claim 4, wherein the oligomer or the polymer is dissolved in a fluorine-containing organic solvent, and a reaction initiator or a fluorine-containing silicon compound is further added to prepare a coating solution. 6. An antireflection coating characterized in that after a fluoropolymer thin film is formed on the surface of a transparent substrate, electron beam irradiation accelerates polymerization and crosslinks the fluoropolymer to cure the thin film. Method of forming a film. 7. A surface activation treatment is performed on the surface of a transparent substrate, and a silicon compound is further reacted on the surface of the transparent substrate to form a coupling compound layer, and then a fluorine-containing polymer thin film is formed. A method for forming an antireflection film, comprising: 8. A surface-activating treatment is applied to the surface of a transparent substrate, and a fluorine-containing organic solution in which at least a monomer, oligomer or polymer of a polymerizable fluorine-containing organic compound is dissolved is applied to the surface of the transparent substrate. 0.05 μm to 1
A method for forming an antireflection film, which comprises applying a film having a specified thickness of between μm and polymerizing it by any one of heating, ultraviolet irradiation, and electron beam irradiation to form a fluorine-containing polymer thin film. 9. A surface activation treatment is applied to the surface of a transparent substrate, and then a fluorine-containing polymer thin film is formed on the surface of the transparent substrate, and further electron beam irradiation accelerates the polymerization and increases the fluorine content. A method for forming an antireflection film, which comprises cross-linking molecules to cure a thin film. 10. A fluorine-containing organic solution in which a monomer, oligomer or polymer of at least a polymerizable fluorine-containing organic compound is dissolved to form a coupling compound layer by reacting a silicon compound on the surface of a transparent substrate, To form a fluorine-containing polymer thin film by coating on the surface of a transparent substrate to a specified film thickness between 0.05 μm and 1 μm, and polymerizing it by any method of heating, ultraviolet irradiation, or electron beam irradiation. A method for forming an antireflection film, comprising: 11. A transparent compound is reacted with a silicon compound to form a coupling compound layer, and then a fluorine-containing polymer thin film is formed on the surface of the transparent substrate, and further polymerized by electron beam irradiation. A method for forming an antireflection film, which comprises curing the thin film by accelerating the heat treatment and crosslinking the fluorine-containing polymer. 12. A fluorine-containing organic solution in which at least a monomer, oligomer or polymer of a polymerizable fluorine-containing organic compound is dissolved is 0.05 μm on the surface of a transparent substrate.
To 1 μm to a specified thickness, and polymerized by heating, ultraviolet irradiation, or electron beam irradiation to form a fluorine-containing polymer thin film. A method for forming an antireflection film, which comprises crosslinking a fluoropolymer to cure a thin film. 13. A surface activation treatment is performed on the surface of a transparent substrate, and a silicon compound is further reacted on the surface of the transparent substrate to form a coupling compound layer, and then at least a polymerizable fluorine-containing organic compound is formed. Monomer, oligomer,
Alternatively, a fluorine-containing organic solution in which a polymer is dissolved is applied on the surface of the transparent substrate so as to have a specified film thickness of 0.05 μm to 1 μm, and heating, ultraviolet irradiation, or electron beam irradiation is performed. A method for forming an antireflection film, comprising forming a fluorine-containing polymer thin film by polymerizing with. 14. The surface of the transparent base material is subjected to a surface activation treatment, and a silicon compound is further reacted with the surface of the transparent base material to form a coupling compound layer, and then the surface of the transparent base material. A method for forming an antireflection film, comprising: forming a fluorine-containing polymer thin film on the substrate, further accelerating the polymerization and crosslinking the fluorine-containing polymer by electron beam irradiation, and curing the thin film. 15. A fluorine-containing organic solution in which a monomer, an oligomer, or a polymer of at least a polymerizable fluorine-containing organic compound is dissolved to form a coupling compound layer by reacting a silicon compound on the surface of a transparent substrate, A fluorine-containing polymer thin film is formed by coating on the surface of a transparent substrate so as to have a specified film thickness between 0.05 μm and 1 μm, and polymerizing by any method of heating, ultraviolet irradiation, and electron beam irradiation. Furthermore, a method for forming an antireflection film, which comprises accelerating the polymerization and crosslinking the fluorinated polymer by electron beam irradiation to cure the thin film. 16. A fluorine-containing organic solution in which at least a monomer, an oligomer, or a polymer of a polymerizable fluorine-containing organic compound is dissolved to form a coupling compound layer by reacting a silicon compound on the surface of a transparent substrate is transparent. To a prescribed thickness between 0.05 μm and 1 μm on the surface of a flexible substrate, and polymerized by any method of heating, ultraviolet irradiation, or electron beam irradiation to form a fluorine-containing polymer thin film,
Furthermore, a method for forming an antireflection film, which comprises accelerating the polymerization and crosslinking the fluorinated polymer by electron beam irradiation to cure the thin film. 17. A surface activation treatment is performed on the surface of a transparent substrate, and a silicon compound is further reacted on the surface of the transparent substrate to form a coupling compound layer, and then at least a polymerizable fluorine-containing organic compound is obtained. Monomer, oligomer,
Alternatively, a fluorine-containing organic solution in which a polymer is dissolved is applied on the surface of a transparent substrate so as to have a specified film thickness between 0.05 μm and 1 μm, and then heated, irradiated with ultraviolet rays, or irradiated with an electron beam. A method for forming an antireflection film, comprising polymerizing to form a fluorine-containing polymer thin film, and further accelerating polymerization and crosslinking of the fluorine-containing polymer by electron beam irradiation to cure the thin film.