JPH05198545A - Cleaning treatment device for cassette and wafer - Google Patents
Cleaning treatment device for cassette and waferInfo
- Publication number
- JPH05198545A JPH05198545A JP2991292A JP2991292A JPH05198545A JP H05198545 A JPH05198545 A JP H05198545A JP 2991292 A JP2991292 A JP 2991292A JP 2991292 A JP2991292 A JP 2991292A JP H05198545 A JPH05198545 A JP H05198545A
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- cleaning
- wafer
- tank
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体ウエ−ハ等のウ
エ−ハを収納するカセット及び該ウエ−ハを洗浄するウ
エ−ハの洗浄処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cassette for storing a wafer such as a semiconductor wafer and a wafer cleaning apparatus for cleaning the wafer.
【０００２】[0002]
【従来の技術】半導体ウエ−ハ等のウエ−ハは、通常カ
セット（キャリア）に収納されて各工程へ搬送され、洗
浄等の各種の処理を受ける。ウエ−ハを各工程に運んだ
カセットは回収され、洗浄して保管される。そして、必
要時に、保管場所から取出され、各工程に運んで再使用
される。2. Description of the Related Art Wafers such as semiconductor wafers are usually stored in cassettes (carriers) and transported to various processes, and undergo various processes such as cleaning. The cassette that carries the wafer to each process is collected, washed, and stored. Then, when necessary, it is taken out from the storage place, transported to each process and reused.
【０００３】上記カセットの洗浄としては、一般には有
機溶剤等の洗浄液槽に浸漬したり、カセット内にブラシ
を挿入して洗浄しているが、カセットはウエ−ハを収納
するために複数の溝等を具備しているので、細部まで完
全に洗浄することはむずかしい。Generally, the cassette is cleaned by immersing it in a cleaning liquid tank such as an organic solvent or inserting a brush into the cassette for cleaning. However, the cassette has a plurality of grooves for accommodating a wafer. It is difficult to completely clean the details as it is equipped with.
【０００４】その上、従来のような方法では、カセット
を回収する手段や洗浄して保管する場所等が必要であ
り、またカセットの数も多数入用である。さらに、保管
場所から各工程へ移送する手段も必要であり、移送中の
汚染防止も考慮しなければならない。In addition, the conventional method requires a means for collecting the cassette, a place for cleaning and storing, and a large number of cassettes. Furthermore, a means for transferring from the storage location to each process is also required, and consideration must be given to prevention of contamination during transfer.
【０００５】[0005]
【発明の解決課題】本発明の目的は、ウエ−ハを収納す
るカセットを、細部まで確実に洗浄できるようにしたカ
セット洗浄処理装置を提供することである。また、本発
明の他の目的は、カセットの移送、保管、汚染等の問題
を生ぜず、清浄な状態でウエ−ハをカセットに収納でき
るようにしたカセット及びウエ−ハの洗浄処理装置を提
供することである。SUMMARY OF THE INVENTION It is an object of the present invention to provide a cassette cleaning processing apparatus capable of surely cleaning the details of a cassette containing a wafer. Another object of the present invention is to provide a cassette and a wafer cleaning apparatus which can store the wafer in a clean state without causing problems such as transfer, storage and contamination of the cassette. It is to be.
【０００６】[0006]
【課題解決の手段】本発明によれば、カセットに紫外線
照射等をして表面に付着した汚れを酸化させ分解する乾
式洗浄槽と、該乾式洗浄槽において処理されたカセット
を界面活性剤等の洗浄液に浸漬して洗浄する洗浄液槽
と、該洗浄液槽から取出したカセットを純水リンスする
純水洗浄槽を具備するカセット洗浄処理装置が提供さ
れ、上記目的が達成される。According to the present invention, a dry cleaning tank for irradiating an ultraviolet ray or the like to a cassette to oxidize and decompose dirt adhering to the surface, and a cassette treated in the dry cleaning tank are treated with a surfactant or the like. A cassette cleaning processing apparatus is provided which is provided with a cleaning liquid tank which is immersed in a cleaning liquid for cleaning, and a pure water cleaning tank which rinses a cassette taken out from the cleaning liquid tank with pure water, thereby achieving the above object.
【０００７】また、本発明によれば、カセットから取り
出したウエ−ハを枚葉式に洗浄するウエ−ハ洗浄処理部
と、空になったカセットをウエ−ハ洗浄処理部の入口か
ら出口に向けて搬送し、この間にカセットを洗浄するカ
セット洗浄処理部を有し、該カセット洗浄処理部から出
た洗浄済のカセットを上記ウエ−ハ洗浄処理部の出口に
待機させる待機部を設けたことを特徴とするカセット及
びウエ−ハの洗浄処理装置が提供され、上記目的が達成
される。Further, according to the present invention, a wafer cleaning processing unit for cleaning the wafer taken out from the cassette in a single-wafer manner and an empty cassette from the entrance to the exit of the wafer cleaning processing unit. A cassette cleaning processing unit that conveys the cassette to the cassette and cleans the cassette during this time is provided, and a standby unit that waits for the cleaned cassette ejected from the cassette cleaning processing unit at the exit of the wafer cleaning processing unit is provided. A cassette and wafer cleaning apparatus characterized by the above are provided, and the above object is achieved.
【０００８】[0008]
【作用】ウエ−ハ洗浄処理部の入口にウエ−ハを運んで
空になったカセットは、ウエ−ハ洗浄処理部とは別の搬
送路を通ってウエ−ハ洗浄処理部の出口に向かう。その
間に、カセットは、洗浄処理される。ここでは、カセッ
トは先ず乾式洗浄槽に入り、紫外線照射等され、表面に
付着した汚れが酸化され分解される。次いで洗浄液槽に
浸漬される。そして上記のように分解されてカセットの
表面に浮き上った汚れは、洗浄液により溶解されたり、
分離除去される。The cassette, which has been emptied by carrying the wafer to the entrance of the wafer cleaning processing unit, goes to the exit of the wafer cleaning processing unit through a transport path different from the wafer cleaning processing unit. . Meanwhile, the cassette is washed. Here, the cassette first enters the dry cleaning tank, is irradiated with ultraviolet rays, and the dirt adhering to the surface is oxidized and decomposed. Then, it is immersed in the cleaning liquid tank. And the dirt that has been disassembled as described above and floated on the surface of the cassette is dissolved by the cleaning liquid,
Separated and removed.
【０００９】このようにして、洗浄されたカセットは、
ウエ−ハ洗浄処理部の出口に設けられた待機部に搬送さ
れ、上記ウエ−ハ洗浄処理部で洗浄されたウエ−ハは直
ちに該カセットに収納される。The thus cleaned cassette is
The wafer that has been transported to the standby unit provided at the exit of the wafer cleaning processing unit and cleaned by the wafer cleaning processing unit is immediately stored in the cassette.
【００１０】[0010]
【実施例】以下実施例と共に説明する。図１は、本発明
の全体の構成を示す平面図である。図において、ウエ−
ハ（１）を収納したカセット（２）は、投入口（３）よ
り本体（４）に搬入される。該本体内には、該カセット
（２）内のウエ−ハ（１）をウエ−ハ洗浄処理部（５）
へ移送する押出装置（６）を設けてあり、すべてのウエ
−ハ（１）はウエ−ハ洗浄処理部の入口に設けた、エレ
ベ−タ−により昇降する専用カセット（７）内に移送さ
れる。EXAMPLES Examples will be described below. FIG. 1 is a plan view showing the overall configuration of the present invention. In the figure,
The cassette (2) accommodating the c (1) is carried into the main body (4) through the input port (3). In the main body, the wafer (1) in the cassette (2) is loaded with a wafer cleaning processing section (5).
An extruding device (6) for transferring to the wafer is provided, and all the wafers (1) are transferred into a dedicated cassette (7) which is lifted and lowered by an elevator provided at the entrance of the wafer cleaning processing section. It
【００１１】上記のようにして空になったカセット
（２）を、上記ウエ−ハ洗浄処理部（５）の出口に向け
て搬送する搬送路を有するカセット洗浄処理部（８）
が、該ウエ−ハ洗浄処理部（５）に沿って設けられてい
る。該搬送路は、トンネル状に形成され、内部に適宜の
搬送ロボット（９）を設けてあり、カセット（２）を矢
印（10）方向に搬送する。A cassette cleaning processing unit (8) having a transfer path for transferring the empty cassette (2) as described above toward the exit of the wafer cleaning processing unit (5).
Are provided along the wafer cleaning section (5). The transfer path is formed in a tunnel shape, and an appropriate transfer robot (9) is provided inside, and transfers the cassette (2) in the direction of the arrow (10).
【００１２】搬送路内を進行するカセット（２）は、最
初に、乾式洗浄槽(11)内にエレベ−タ−(12)により収納
される。図において、該乾式洗浄槽(11)には、紫外線照
射等をする光化学洗浄ユニット(13)を設けてあるが、プ
ラズマ洗浄ユニットを設けることもできる。上記紫外線
照射により、カセット表面の有機汚染物は強力に酸化分
解され、除去される。The cassette (2) moving in the transport path is first stored in the dry cleaning tank (11) by the elevator (12). In the figure, the dry cleaning tank (11) is provided with a photochemical cleaning unit (13) for irradiating with ultraviolet rays, but a plasma cleaning unit may be provided. By the above-mentioned ultraviolet irradiation, the organic contaminants on the cassette surface are strongly oxidatively decomposed and removed.
【００１３】上記乾式洗浄を経たカセットを湿式洗浄す
るよう上記乾式洗浄槽(11)に隣接して洗浄液槽(14)を設
けてある。該洗浄液槽(14)内には、図において界面活性
剤が入れられているが、薬品水溶液、有機溶剤その他適
宜の洗浄液を使用することができ、また適宜位置に超音
波発生ユニットを設けてある。A cleaning liquid tank (14) is provided adjacent to the dry cleaning tank (11) so as to wet-clean the cassette that has undergone the dry cleaning. Although a surfactant is put in the washing liquid tank (14) in the figure, an aqueous solution of chemicals, an organic solvent or other appropriate washing liquid can be used, and an ultrasonic wave generating unit is provided at an appropriate position. .
【００１４】上記洗浄液槽(14)内にエレベ−タ−(15)に
より収納されたカセット（２）は、上記洗浄液により洗
浄される。この際、上記乾式洗浄槽(11)においてカセッ
トの汚れは酸化分解されているので、大部分の汚れは除
去されており、細部に残存する汚れも酸化分解によりカ
セットの表面上に浮き上っているから、容易にカセット
から除去される。The cassette (2) housed in the washing liquid tank (14) by the elevator (15) is washed with the washing liquid. At this time, since the dirt on the cassette has been oxidatively decomposed in the dry cleaning tank (11), most of the dirt has been removed, and the dirt remaining in the details also floats on the surface of the cassette due to oxidative decomposition. Therefore, it is easily removed from the cassette.
【００１５】上記洗浄液槽(14)に隣接して純水リンスを
するための純水洗浄槽(16)が設けられている。エレベ−
タ−(17)により該槽(16)内に入れられたカセット（２）
は純水リンスされ、確実に洗浄される。なお、該純水洗
浄槽(16)内にも超音波発生ユニットを設けることができ
る。また、上記洗浄液槽や純水洗浄槽等は、所望により
複数設けたり、途中に別の処理工程を加えることもでき
る。A pure water cleaning tank (16) for rinsing with pure water is provided adjacent to the cleaning liquid tank (14). Elevation
Cassette (2) put in the tank (16) by a tape (17)
Is rinsed with pure water and surely washed. An ultrasonic wave generation unit may be provided in the pure water cleaning tank (16). If desired, a plurality of cleaning liquid tanks or pure water cleaning tanks may be provided, or another processing step may be added during the process.
【００１６】上記のようにしてカセット洗浄処理部
（８）で洗浄されたカセット（２）は、上記ウエ−ハ洗
浄処理部（５）の出口に設けた待機部(18)に搬送され
る。図に示すように、上記洗浄液槽(14)から待機部へ上
記カセット（２）を搬送するには搬送ロボット(19)を用
いているが、複数のロボットを用いてもよい。The cassette (2) cleaned by the cassette cleaning processing section (8) as described above is conveyed to the standby section (18) provided at the exit of the wafer cleaning processing section (5). As shown in the figure, the transfer robot (19) is used to transfer the cassette (2) from the cleaning liquid tank (14) to the standby unit, but a plurality of robots may be used.
【００１７】上記待機部(18)は、種々の態様に構成する
ことができる。図においては、純水をオ−バ−フロ−さ
せた槽(20)内にエレベ−タ−(21)によりカセット（２）
を浸漬し、上記ウエ−ハ洗浄処理部（５）から出たウエ
−ハを直接上記カセット（２）内に収納するようにして
いる。The standby section (18) can be constructed in various modes. In the figure, the cassette (2) is placed by the elevator (21) in the tank (20) in which pure water is overflowed.
And the wafer discharged from the wafer cleaning section (5) is directly stored in the cassette (2).
【００１８】図２は、他の実施例を示し、待機部(18)に
おいて、窒素ガス等の不活性ガスを封入した槽(22)を設
け、該槽(22)内にカセット（２）を収納し、カセット内
に窒素ガス等を充填する。そして、ウエ−ハ洗浄処理部
から出たウエ−ハ（１）をチャック(23)で保持してスピ
ンドライし、直ちに上記カセット（２）内に収納する。
このようにすれば、ウエ−ハやカセットの酸化が防止さ
れ、一層清浄状態を維持することができる。FIG. 2 shows another embodiment in which a tank (22) filled with an inert gas such as nitrogen gas is provided in the standby section (18), and the cassette (2) is placed in the tank (22). Store and fill the cassette with nitrogen gas. Then, the wafer (1) discharged from the wafer cleaning processing section is held by the chuck (23) and spin-dried, and immediately stored in the cassette (2).
In this way, the wafer and the cassette are prevented from being oxidized, and the clean state can be maintained.
【００１９】なお、図１に示す実施例では、上記待機部
(18)において全部の収納部にウエ−ハを収納したカセッ
ト（２）は、搬送ロボット(19)により乾燥槽(24)に送ら
れる。該乾燥槽(24)は、図に示すものでは、特開平２−
１５６５３１号公報に示された如きリフトドライ装置を
用い、純水中に起立状態でウエ−ハを浸漬し、ゆっくり
と水中から引き上げて乾燥しているが、その他適宜の乾
燥槽を用いることができる。In the embodiment shown in FIG. 1, the standby unit
The cassette (2) in which wafers are stored in all the storage sections in (18) is sent to the drying tank (24) by the transfer robot (19). The drying tank (24) shown in the figure is not disclosed in
The wafer is immersed in pure water in a standing state using a lift dryer as shown in Japanese Patent No. 156531 and slowly pulled out of the water for drying, but other suitable drying tanks can be used. ..
【００２０】その後、カセットは搬送ロボットによりア
ンロ−ダ部(25)へ送られ、取出口（26）より取り出され
る。Thereafter, the cassette is sent to the unloader section (25) by the transfer robot and taken out from the take-out port (26).
【００２１】上記ウエ−ハ洗浄処理部（５）は、ウエ−
ハを枚葉式に洗浄するよう種々に構成することができ
る。図においては、入口に設けた専用カセット（７）か
ら、エレベ−タ−を１段づつ移動させることによりウエ
−ハ（１）はウオ−タ・スライダ(27)に１枚づつ送ら
れ、搬送ロボット(28)でウエ−ハ洗浄槽(29)に運ばれ、
適宜の洗浄液によって洗浄される。その後、上記ロボッ
ト(28)で純水リンス槽(30)に送られ純水洗浄した後、ウ
オ−タ・スライダ(31)に送られ、押出装置(32)により出
口から上記待機部(18)のカセット（２）内に挿入され
る。上記洗浄槽、純水リンス槽等は、図示する実施例の
他、種々に構成することができ、また上記入口から出口
に至る間に他の処理工程を加えることもできる。The wafer cleaning processing section (5) is a wafer cleaning unit.
It can be variously configured to clean the single-wafer type. In the figure, the wafers (1) are sent to the water slider (27) one by one by moving the elevator one step at a time from the dedicated cassette (7) provided at the entrance, and are transported. It is carried to the wafer cleaning tank (29) by the robot (28),
It is washed with an appropriate washing liquid. After that, the robot (28) sends it to the pure water rinsing tank (30) to wash it with pure water, and then sends it to the water slider (31), and the extruder (32) from the exit to the standby part (18) It is inserted in the cassette (2). The cleaning tank, the pure water rinsing tank, and the like can be configured in various ways other than the illustrated embodiment, and other treatment steps can be added between the inlet and the outlet.
【００２２】図に示す実施例においては、上記ウエ−ハ
洗浄処理部において、最初のウエ−ハが洗浄されて出口
に達する間に、上記カセット洗浄処理部において空にな
ったカセットが洗浄され待機部(18)に到着するようにし
てあるが、順次空になったカセットを上記洗浄処理部に
搬送し、洗浄済のカセットから順に上記待機部へ搬送す
るようにしてもよい。In the embodiment shown in the drawing, while the first wafer is cleaned in the wafer cleaning processing section and reaches the exit, the cassette cleaning processing section cleans and waits for an empty cassette. Although the cassettes arrive at the section (18), the empty cassettes may be sequentially conveyed to the cleaning processing section, and the cleaned cassettes may be sequentially conveyed to the standby section.
【００２３】[0023]
【発明の効果】本発明は以上のように構成され、カセッ
トは乾式洗浄槽で紫外線照射等を受け、表面に付着して
いる汚れは酸化分解され、次に洗浄液槽に浸漬すること
により上記汚れは溶解、分離等されて表面から除去さ
れ、最後にカセットは純水洗浄槽で洗浄されるので、細
部まできわめて清浄に洗浄することができる。その上、
ウエ−ハ洗浄処理部においてウエ−ハを枚葉式に洗浄し
ている間に、空になったカセットを洗浄し、洗浄済カセ
ットに洗浄済ウエ−ハを直ちに収納するようにしたか
ら、カセット汚染の問題はなく、清浄状態のカセットに
ウエ−ハを収納でき、またウエ−ハのストック場所、移
送、数量等の問題を解決することができる。なお、上記
カセット洗浄処理装置自体を独立して使用したり、ウエ
−ハ洗浄工程以外の適宜の処理工程に組み込んで使用す
ることもできる。The present invention is constructed as described above. The cassette is exposed to ultraviolet rays in a dry cleaning tank, the dirt adhering to the surface is oxidatively decomposed, and the dirt is then immersed in the cleaning liquid tank. Are dissolved, separated, etc. and removed from the surface, and finally the cassette is cleaned in a pure water cleaning tank, so that the details can be cleaned extremely cleanly. Moreover,
While the wafer was washed in the wafer cleaning section in a single wafer method, the empty cassette was cleaned and the cleaned wafer was immediately stored in the cleaned cassette. There is no problem of contamination, wafers can be stored in a cassette in a clean state, and problems such as wafer stock location, transfer and quantity can be solved. The cassette cleaning apparatus itself may be used independently, or may be used by incorporating it in an appropriate processing step other than the wafer cleaning step.
【図１】本発明の一実施例を示す平面図である。FIG. 1 is a plan view showing an embodiment of the present invention.
【図２】他の実施例を示す側面図である。FIG. 2 is a side view showing another embodiment.
２ カセット ５ ウエ−ハ洗浄処理部 ８ カセット洗浄処理部 11 乾式洗浄槽 14 洗浄液槽 16 純水洗浄槽 18 待機部 24 乾燥槽 2 cassette 5 wafer cleaning processing section 8 cassette cleaning processing section 11 dry cleaning tank 14 cleaning liquid tank 16 pure water cleaning tank 18 standby section 24 drying tank
Claims (5)
をし表面に付着した汚れを酸化させ分解する乾式洗浄槽
と、該乾式洗浄槽において汚れが分解されたカセットを
界面活性剤等の洗浄液に浸漬して洗浄する洗浄液槽と、
該洗浄液槽から取出したカセットを純水リンスする純水
洗浄槽を具備するカセット洗浄処理装置。1. A dry cleaning tank for irradiating an ultraviolet ray or the like on a wafer storage cassette to oxidize and decompose dirt adhering to the surface, and a cassette in which dirt is decomposed in the dry cleaning tank for cleaning liquid such as a surfactant. A cleaning liquid tank that is immersed in and washed
A cassette cleaning processing apparatus comprising a pure water cleaning tank for rinsing the cassette taken out from the cleaning liquid tank with pure water.
受取り枚葉式にウエ−ハを洗浄するウエ−ハ洗浄処理部
と、上記空になったカセットを洗浄するカセット洗浄処
理部を有し、上記ウエ−ハ洗浄処理部において洗浄処理
されたウエ−ハを直ちに洗浄済のカセットに収納するよ
う上記カセット洗浄処理部からのカセットを上記ウエ−
ハ洗浄処理部の出口で待機させる待機部を設けたカセッ
ト及びウエ−ハの洗浄処理装置。2. A wafer cleaning processing unit for receiving a wafer from a wafer storage cassette and cleaning the wafer in a single-wafer manner, and a cassette cleaning processing unit for cleaning the empty cassette. Then, the cassette from the cassette cleaning processing unit is loaded into the wafer so that the wafer cleaned in the wafer cleaning processing unit is immediately stored in the cleaned cassette.
(C) A cassette and a wafer cleaning device provided with a standby part for waiting at the exit of the cleaning process part.
等をし表面に付着した汚れを酸化させ分解する乾式洗浄
槽と、該乾式洗浄槽において汚れが分解されたカセット
を界面活性剤等の洗浄液に浸漬して洗浄する洗浄液槽
と、該洗浄液槽から取出したカセットを純水リンスする
純水洗浄槽を具備する請求項２に記載のカセット及びウ
エ−ハの洗浄処理装置。3. The cassette cleaning unit is a dry cleaning tank for irradiating ultraviolet rays or the like to oxidize and decompose dirt adhering to the surface, and a cassette in which dirt has been decomposed in the dry cleaning tank is cleaned with a cleaning solution such as a surfactant. 3. The apparatus for cleaning a cassette and a wafer according to claim 2, further comprising: a cleaning liquid tank that is immersed in the cleaning solution for cleaning, and a pure water cleaning tank that rinses the cassette taken out from the cleaning liquid tank with pure water.
て不活性ガスが封入されている請求項２又は３に記載の
カセット及びウエ−ハの洗浄処理装置。4. The cassette and wafer cleaning apparatus according to claim 2, wherein the cleaned cassette has an inert gas filled in a standby portion.
セットは乾燥槽で乾燥される請求項３に記載のカセット
及びウエ−ハの洗浄処理装置。5. The cassette and wafer cleaning apparatus according to claim 3, wherein the cassette containing the cleaned wafer is dried in a drying tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4029912A JPH07123117B2 (en) | 1992-01-22 | 1992-01-22 | Cleaning equipment for cassettes and wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4029912A JPH07123117B2 (en) | 1992-01-22 | 1992-01-22 | Cleaning equipment for cassettes and wafers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05198545A true JPH05198545A (en) | 1993-08-06 |
| JPH07123117B2 JPH07123117B2 (en) | 1995-12-25 |
Family
ID=12289207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4029912A Expired - Lifetime JPH07123117B2 (en) | 1992-01-22 | 1992-01-22 | Cleaning equipment for cassettes and wafers |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07123117B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
| KR100954467B1 (en) * | 2007-12-15 | 2010-04-22 | 주식회사 동부하이텍 | Wafer cassette stocker having cleaning function and method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6333824A (en) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | Cleaning method for surface |
| JPH04249320A (en) * | 1991-02-05 | 1992-09-04 | Mitsubishi Electric Corp | Transport system of automatic cleaning apparatus |
-
1992
- 1992-01-22 JP JP4029912A patent/JPH07123117B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6333824A (en) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | Cleaning method for surface |
| JPH04249320A (en) * | 1991-02-05 | 1992-09-04 | Mitsubishi Electric Corp | Transport system of automatic cleaning apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
| US6319330B1 (en) | 1998-09-29 | 2001-11-20 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
| KR100954467B1 (en) * | 2007-12-15 | 2010-04-22 | 주식회사 동부하이텍 | Wafer cassette stocker having cleaning function and method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07123117B2 (en) | 1995-12-25 |
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