JPH047130A - Heat treatment of aromatic polyamide film - Google Patents
Heat treatment of aromatic polyamide filmInfo
- Publication number
- JPH047130A JPH047130A JP10982190A JP10982190A JPH047130A JP H047130 A JPH047130 A JP H047130A JP 10982190 A JP10982190 A JP 10982190A JP 10982190 A JP10982190 A JP 10982190A JP H047130 A JPH047130 A JP H047130A
- Authority
- JP
- Japan
- Prior art keywords
- film
- heat treatment
- aromatic polyamide
- heat
- polyamide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 50
- 239000004760 aramid Substances 0.000 title claims abstract description 28
- 229920003235 aromatic polyamide Polymers 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 32
- 230000008602 contraction Effects 0.000 claims description 6
- 239000000463 material Substances 0.000 abstract description 5
- 229910000679 solder Inorganic materials 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000011810 insulating material Substances 0.000 abstract description 3
- 229920000642 polymer Polymers 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 230000037303 wrinkles Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- MGLZGLAFFOMWPB-UHFFFAOYSA-N 2-chloro-1,4-phenylenediamine Chemical compound NC1=CC=C(N)C(Cl)=C1 MGLZGLAFFOMWPB-UHFFFAOYSA-N 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000009998 heat setting Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- MSWAXXJAPIGEGZ-UHFFFAOYSA-N 2-chlorobenzene-1,4-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C(Cl)=C1 MSWAXXJAPIGEGZ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 229910017053 inorganic salt Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000013557 residual solvent Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- ZHDTXTDHBRADLM-UHFFFAOYSA-N hydron;2,3,4,5-tetrahydropyridin-6-amine;chloride Chemical group Cl.NC1=NCCCC1 ZHDTXTDHBRADLM-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
Landscapes
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は芳香族ポリアミドフィルムの熱処理方法に関し
、更に詳しくは連続的に製造されたフィルムをリフロー
あるいはフローはんだ工程に対応できる程度に低熱収縮
率化するための熱処理方法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for heat treatment of aromatic polyamide films, and more specifically to a method for heat treatment of aromatic polyamide films, and more specifically, a method for processing continuously produced films with a low heat shrinkage rate to the extent suitable for reflow or flow soldering processes. The present invention relates to a heat treatment method for oxidation.
[従来の技術]
芳香族ポリアミドフィルムは優れた機械特性、耐熱性を
有することから種々の電気絶縁材料への応用が提案され
、特にフレキシブルプリント配線板(F P C)等の
回路基板材料として期待されている。[Prior Art] Aromatic polyamide films have excellent mechanical properties and heat resistance, and have been proposed for application to various electrical insulating materials, and are particularly expected to be used as circuit board materials such as flexible printed circuit boards (FPC). has been done.
従来耐熱性が要求される絶縁フィルムとしてはポリイミ
ドフィルムが多用されており、耐はんだ性が必要なFP
C材料には高温下での寸法安定性という面から、はとん
どがポリイミドフィルムが使用されている。Conventionally, polyimide films have been widely used as insulation films that require heat resistance, and FPs that require solder resistance
Polyimide film is usually used as the C material from the viewpoint of dimensional stability under high temperatures.
[発明が解決しようとする課題]
一方、芳香族ポリアミドフィルムはポリイミドフィルム
より優れた面はあるものの、高温下での寸法安定性にお
いて若干劣るため、ことに回路パターンの細密なFPC
についてはその展開が進展しないでいる。[Problems to be Solved by the Invention] On the other hand, although aromatic polyamide films are superior to polyimide films, they are slightly inferior in dimensional stability at high temperatures, so they are particularly suitable for FPCs with detailed circuit patterns.
However, no progress has been made in this regard.
熱収縮率の小さな芳香族ポリアミドフィルムの製造方法
として製膜工程中での熱処理方法はこれまでにも多く提
案されてはいるが、連続的な製膜工程では装置上の制約
から各種の応力がフィルムに掛ることが避けられないた
めに、フィルムの残留歪みを消失させることは実際上非
常に困難であり、また製膜工程を複雑化することによる
コストアップの要因ともなり現実的ではない場合がほと
んどである。Many heat treatment methods during the film-forming process have been proposed as a method for manufacturing aromatic polyamide films with low thermal shrinkage, but the continuous film-forming process suffers from various stresses due to equipment limitations. It is actually very difficult to eliminate residual strain on the film because it is unavoidable, and it is sometimes impractical as it complicates the film forming process and increases costs. Almost.
一旦芳香族ポリアミドを製造し、後処理として熱処理を
行なうことについては、実験室レベルの小面積のフィル
ム片を処理するのは容易であっても、工業的には色々な
問題があった。例えば、数百〜数千mの長さの長尺のフ
ィルムではカットシート程度のフィルムとは同様の熱処
理方法が採れないこと、あるいは熱処理によるフィルム
の着色、劣化、平面性の悪化などの事柄は大量のフィル
ムを製造する場合において初めて問題となるものである
。Although it is easy to process small-area film pieces on a laboratory level, there are various problems in industrially producing aromatic polyamides and then performing heat treatment as a post-treatment. For example, it is not possible to use the same heat treatment method for long films that are several hundred to several thousand meters long, or that heat treatment can cause discoloration, deterioration, and deterioration of flatness of the film. This only becomes a problem when producing large quantities of film.
本発明はかかる課題を解決するため、耐はんだ性(熱収
縮率)において優れた芳香族ポリアミドフィルムを工業
的に得るために、−旦製造されたフィルムを後処理とし
て熱処理を行なう方法を提供することを目的とする。In order to solve this problem, the present invention provides a method of heat-treating a previously produced film as a post-treatment in order to industrially obtain an aromatic polyamide film with excellent solder resistance (heat shrinkage rate). The purpose is to
[課題を解決するための手段]
本発明は250℃での熱収縮率が3.0%以下、熱膨張
係数が4.5XIC)5(1/℃)以下の連続的に製造
された芳香族ポリアミドフィルムを、式(1)〜(3)
の範囲で示される温度(T 0C)および時間(t時間
)で、かつ無張力下または0. 5 (kg/ m r
d )以下の張力下で熱処理することを特徴とするもの
である。[Means for Solving the Problems] The present invention provides a continuously produced aromatic compound having a thermal contraction rate of 3.0% or less at 250°C and a thermal expansion coefficient of 4.5XIC)5 (1/°C) or less. The polyamide film is formed by formulas (1) to (3)
at the temperature (T 0C) and time (t time) shown in the range of , and under no tension or 0. 5 (kg/m r
d) It is characterized by heat treatment under the following tension.
50t+200≦T≦−25t+300・・・・・・
式(1)
150≦T ・・・・・・ 式(2)
0.01≦t ・・・・・・ 式(3
)本発明における芳香族ポリアミドフィルムとは、−数
式、
NH−Art −NHC−Ar2 −C−N H−A
r 3 C
で示される繰返し構成単位を単独または共重合の形で含
む芳香族ポリアミド重合体から成るフィルムで、上記構
成単位を70モル%以上、好ましくは90モル%以上含
むフィルムである。ここでArl、Ar2.Ar3は少
なくとも1個の芳香環を含み、同一でも異なっていても
よく、代表例としては次のものが挙げられる。50t+200≦T≦-25t+300...
Formula (1) 150≦T... Formula (2)
0.01≦t... Formula (3
) The aromatic polyamide film in the present invention has the following formula: NH-Art -NHC-Ar2 -C-NH-A
A film made of an aromatic polyamide polymer containing a repeating structural unit represented by r 3 C either alone or in copolymerized form, and containing the above structural unit in an amount of 70 mol% or more, preferably 90 mol% or more. Here, Arl, Ar2. Ar3 contains at least one aromatic ring, which may be the same or different, and representative examples include the following.
これらの芳香環の環上の水素原子の一部が、ハロゲン基
、ニトロ基、C1〜C3のアルキル基、01〜C3のア
ルコキシ基から選ばれる置換基で置換されているものも
含み、またXは、
−O−、−CH2−、−3o2−、−8−−C−−C−
CH3
の中から選ばれる。These aromatic rings include those in which some of the hydrogen atoms on the ring are substituted with a substituent selected from a halogen group, a nitro group, a C1-C3 alkyl group, and a 01-C3 alkoxy group, and is selected from -O-, -CH2-, -3o2-, -8--C--C- CH3.
上記芳香族ポリアミドの中では、アミド結合がパラ位で
結合されているベンゼン環が全芳香環の50%以上、好
ましくは70%以上であるものが、耐熱性や機械特性が
向上し熱膨張係数が小さくなる点で好ましく、またベン
ゼン環上の水素原子の一部がハロゲン基、特にクロル基
で置換されているベンゼン環が全芳香環の30%以上、
好ましくは50%以上であるポリマーが、湿度膨張係数
や吸湿率を小さくする上で好ましく用いられる。Among the aromatic polyamides mentioned above, those in which benzene rings with amide bonds bonded at the para position account for 50% or more, preferably 70% or more of the total aromatic rings have improved heat resistance and mechanical properties, and have a coefficient of thermal expansion. It is preferable in that the hydrogen atoms on the benzene ring are partially substituted with a halogen group, especially a chlorine group, making up 30% or more of the total aromatic rings.
A polymer having a content of preferably 50% or more is preferably used in order to reduce the humidity expansion coefficient and moisture absorption rate.
本発明で使用する芳香族ポリアミドフィルムは250℃
での熱収縮率が3.0%以下、好ましくは1.5%以下
であることが必要である。熱収縮率が3.0%より大き
いと熱処理条件および後述する熱処理の方法によらず、
熱処理中にフィルムに皺や筋が入ったり、ロール形状で
の熱処理ではフィルム層が座屈するなどして平面性が著
しく損なわれるため、本発明のような後処理での寸法安
定化は適用できなかった。The aromatic polyamide film used in the present invention is heated to 250°C.
It is necessary that the heat shrinkage rate at 3.0% or less, preferably 1.5% or less. If the heat shrinkage rate is greater than 3.0%, regardless of the heat treatment conditions and the heat treatment method described below,
Dimensional stabilization through post-processing as in the present invention cannot be applied because the film becomes wrinkled or streaked during heat treatment, and when heat treated in roll form, the film layer buckles, resulting in a significant loss of flatness. Ta.
また熱処理前のフィルムの熱膨張係数は4.5×105
(1/℃)以下、更には4.0XIO′5(1/℃)以
下であることが好ましく、熱膨張係数が大きいと熱処理
中に同時に起こる不可逆的な熱収縮と可逆的な熱膨張と
のバランスがとれず、上記と同様のフィルム平面性の悪
化(皺、筋、座屈の発生)が起こりやすい。The coefficient of thermal expansion of the film before heat treatment is 4.5×105
(1/℃) or less, more preferably 4.0 The balance is not maintained, and the same deterioration in film flatness as described above (occurrence of wrinkles, streaks, and buckling) is likely to occur.
フィルム中の残留溶媒はポリマ重量に対して1゜0重量
%以下であることが好ましく、特にロール形状あるいは
フィルムを断裁して積重ねた状態で熱処理する場合にフ
ィルムのブロッキング(フィルム同士の接着)を防止す
る意味から好ましい。The residual solvent in the film is preferably 1.0% by weight or less based on the weight of the polymer, and it is particularly important to prevent blocking of the film (adhesion between films) when heat-treating the film in roll form or in a cut and stacked state. This is preferable from the viewpoint of prevention.
フィルム中の残留無機塩については、熱処理中のポリマ
の分解を防止する点から、無機塩重量は200 ppm
以下が好ましく、15oppm以下が更に好ましい。Regarding the residual inorganic salt in the film, the weight of the inorganic salt is 200 ppm in order to prevent the decomposition of the polymer during heat treatment.
The following is preferable, and 15 oppm or less is more preferable.
本発明における芳香族ポリアミドフィルムは、公知の溶
液製膜法によって製造されたものを使用する。この溶液
製膜法には、脱溶媒の方法によって乾式、湿式、乾湿式
の各法があるが特に限定されない。また製膜中には通常
、フィルム長手方向、幅方向に1.0〜5.0倍程度の
延伸と、250〜350℃での熱固定が行なわれ、これ
らの操作条件は本発明で使用する芳香族ポリアミドフィ
ルムの特性を決定する上で、ポリマーの組成と同様に重
要である。一般に延伸倍率が大きい程、熱収縮率が大き
く、熱膨張係数は小さくなる傾向にあり、熱固定温度が
高い程、熱収縮率は小さく、熱膨張係数は大きくなる傾
向にある。したがって、本発明では、ポリマー組成と製
膜工程条件の種々の組合せの中から選ばれた所定の物性
値を有する芳香族ポリアミドフィルムを使用することが
必要である。The aromatic polyamide film used in the present invention is produced by a known solution casting method. This solution film forming method includes dry, wet, and wet-dry methods depending on the method of solvent removal, but is not particularly limited. Furthermore, during film formation, the film is usually stretched by about 1.0 to 5.0 times in the longitudinal and width directions and heat set at 250 to 350°C, and these operating conditions are used in the present invention. Equally important in determining the properties of aromatic polyamide films is the composition of the polymer. Generally, the higher the stretching ratio, the higher the thermal contraction rate and the lower the thermal expansion coefficient, and the higher the heat setting temperature, the lower the thermal expansion coefficient. Therefore, in the present invention, it is necessary to use an aromatic polyamide film having predetermined physical property values selected from various combinations of polymer composition and film forming process conditions.
連続的に製造された芳香族ポリアミドフィルムは、本発
明で規定する熱処理条件で後処理することで低熱収縮率
化がなされる。The continuously produced aromatic polyamide film can be post-treated under the heat treatment conditions specified in the present invention to have a low heat shrinkage rate.
熱処理温度(T ℃) と時間(t時間)の組合せが
次式
%式%
を満たすような高温、長時間の場合は、フィルムの着色
が起こり易く、更にはポリマーの部分分解によるフィル
ムの脆化が生じるため不適であり、またフィルムの平面
性が悪化するという点からも好ましくない。反対に温度
と時間が次式7式%
を満たすような低温、短時間の場合には、リフローソル
ダリング200〜250°C,フローソルダリング24
0〜280℃というはんだ実装工程における有効な低熱
収縮率が成し得す、本発明の目的を達成することができ
ない。If the combination of heat treatment temperature (T °C) and time (t time) satisfies the following formula (%) at high temperatures and for long periods of time, the film is likely to become discolored, and furthermore, the film may become brittle due to partial decomposition of the polymer. This is unsuitable because it causes the formation of turbidity, and it is also undesirable because the flatness of the film deteriorates. On the other hand, if the temperature and time are low and short enough to satisfy the following formula 7%, reflow soldering is 200 to 250°C, flow soldering is 24
The object of the present invention, which is achieved by an effective low thermal shrinkage rate in the solder mounting process of 0 to 280°C, cannot be achieved.
熱処理の具体的な方法としては、コーティング装置の乾
燥機のような加熱炉内に長尺のフィルムを連続的に走行
させて加熱する方法、フィルムをロール状に巻取ったも
のを直接、に熱風オーブン等に入れて加熱する方法、フ
ィルムを断裁して積重ねたものを熱風オーブン等で加熱
する方法などがある。Specific methods for heat treatment include heating a long film by continuously running it in a heating furnace such as a dryer in a coating equipment, and heating the film by winding it into a roll directly. There are methods such as heating the film by placing it in an oven or the like, or heating the film by cutting and stacking it in a hot air oven or the like.
加熱炉内にフィルムを走行させる場合、幅方向へは無張
力の状態であるが、長手方向へは若干の張力を掛けなけ
ればフィルムを走行させることはできない。この時の張
力は0. 5 (kg/mm)以下、好ましくは0.1
(kg/mi)以下であることが必要であり、張力が
大きいと低熱収縮率化の効果が十分得られないばかりか
、フィルムに長手方向の折れ筋が生じるなどの問題が起
こる。When a film is run in a heating furnace, there is no tension in the width direction, but the film cannot run in the longitudinal direction unless some tension is applied. The tension at this time is 0. 5 (kg/mm) or less, preferably 0.1
(kg/mi) or less, and if the tension is too large, not only will the effect of lowering the thermal shrinkage rate not be sufficiently obtained, but also problems such as longitudinal folds will occur in the film.
ロール状に巻取った長尺フィルムを熱処理する場合も、
巻取り時の張力は0. 5 (ks/mar)以下、好
ましくは0. 2 (ks/mm)以下とすることが、
前記と同様な理由から必要である。特にロール状での熱
処理では、ロール外周の一部が内側へ落ち込んだような
窪み状の皺を作る座屈と呼ばれる現象が起こり易く、こ
のためロールの巻き芯(コア)に熱収縮性の材質のもの
を使用したり、コアに予めポリエチレンフィルムのよう
な軟化温度の低いものを巻いておく、更には熱処理前に
コアを抜取るというような方法が有効である。When heat treating a long film wound into a roll,
The tension during winding is 0. 5 (ks/mar) or less, preferably 0.5 (ks/mar) or less. 2 (ks/mm) or less,
This is necessary for the same reason as above. In particular, when heat-treating rolls, a phenomenon called buckling occurs, where a part of the roll's outer periphery appears to have sunk inward. It is effective to use a material that has a low softening temperature, such as a polyethylene film, wrapped around the core in advance, or to remove the core before heat treatment.
長尺フィルムを断裁したもの数十〜数千枚積み重ねて熱
処理する方法は、無張力状態ではあるが本発明の条件以
外で処理を行なった場合には、皺などを生じ易く良好な
平面性を維持することはできない。これは大量のフィル
ムを工業的に処理しようとする時初めて明らかになった
ことで、実験レベルで1〜2枚のフィルムを熱処理する
のとは本質的に状況が異なるからである。The method of stacking tens to thousands of sheets of cut long film and heat-treating them is in a tension-free state, but if the treatment is performed under conditions other than those specified in the present invention, wrinkles may easily occur and good flatness may not be achieved. It cannot be maintained. This first became clear when attempting to industrially process a large amount of film, and the situation is essentially different from heat-treating one or two films at an experimental level.
加熱方法としては熱風加熱が一般的ではあるが、他に近
赤外線、遠赤外線等による加熱方法を採ってもよく特に
限定されない。また加熱雰囲気については、空気中より
も窒素中などの不活性ガス中の方がポリマーの酸化防止
の点では好ましい。The heating method is generally hot air heating, but other heating methods such as near infrared rays, far infrared rays, etc. may also be used, and there is no particular limitation. Regarding the heating atmosphere, an inert gas such as nitrogen is more preferable than air in terms of preventing oxidation of the polymer.
以上のようにして熱処理された芳香族ポリアミドフィル
ムは、リフローはんだ、フローはんだ等の温度下でも十
分な寸法安定性を有し、電気絶縁材料、特にFPC用材
料として好適に使用される。The aromatic polyamide film heat-treated as described above has sufficient dimensional stability even under the temperatures of reflow soldering, flow soldering, etc., and is suitably used as an electrical insulating material, particularly as a material for FPC.
[特性の評価方法] 本発明の特性値の評価方法は次のとおりである。[Characteristics evaluation method] The method for evaluating characteristic values of the present invention is as follows.
(1)熱収縮率
幅10mm、試長200Mのフィルムサンプルを無荷重
の状態で熱風オーブンにより所定の温度で10分間熱処
理を行ない次式によって熱収縮率を算出した。(1) Heat Shrinkage A film sample with a width of 10 mm and a sample length of 200M was heat treated in a hot air oven at a predetermined temperature for 10 minutes without any load, and the heat shrinkage was calculated using the following formula.
熱収縮率(%)
Q)熱膨張係数
熱機械分析計(TMA)を用いて、熱収縮や吸脱湿の影
響を除くためにフィルムを一旦150℃まで加熱後、徐
々に冷却した時の80℃〜150℃の間の範囲における
寸法変化量から算出した。Thermal contraction rate (%) Q) Using a thermal expansion coefficient thermomechanical analyzer (TMA), the film was heated to 150°C and then gradually cooled to remove the effects of thermal contraction and moisture absorption and desorption. It was calculated from the amount of dimensional change in the range between 150°C and 150°C.
[実施例コ 本発明を実施例に基づいて説明する。[Example code] The present invention will be explained based on examples.
実施例1
N−メチルピロリドン(NMP)中に0.8モル比に相
当する2−クロル−パラフェニレンジアミンと0. 2
モル比に相当する4、4′−ジアミノジフェニルエーテ
ルとを溶解させ、これに0゜8モル比に相当する2−ク
ロル−テレフタル酸クロリドと0.2モル比に相当する
テレフタル酸クロリドとを添加し、30〜50℃の範囲
で2時間攪拌して重合を完了した。これに炭酸カルシウ
ムを発生塩化水素に当量添加して中和を行ない、ポリマ
ー濃度12重量%、粘度4100ボイズの芳香族ポリア
ミド溶液を得た。Example 1 2-chloro-paraphenylenediamine and 0.8 molar ratio of 2-chloro-paraphenylenediamine in N-methylpyrrolidone (NMP). 2
4,4'-diaminodiphenyl ether corresponding to a molar ratio was dissolved, and 2-chloro-terephthalic acid chloride corresponding to a 0.8 molar ratio and terephthalic acid chloride corresponding to a 0.2 molar ratio were added thereto. The polymerization was completed by stirring at a temperature of 30 to 50° C. for 2 hours. An equivalent amount of calcium carbonate was added to the generated hydrogen chloride to neutralize it, thereby obtaining an aromatic polyamide solution with a polymer concentration of 12% by weight and a viscosity of 4100 voids.
このポリマー溶液をステンレス製のエンドレスベルト上
を流延し、170℃の熱風で1.8分間加熱して溶媒乾
燥を行ない自己保持性を得たフィルムを連続的にベルト
から剥離した。剥離したフィルムは続いて50℃の水槽
中へ導入して残存溶媒と中和で生じた無機塩の抽出を行
ない、次にテンターへ導入して水分の乾燥と熱処理をし
て厚さ20μmの芳香族ポリアミドフィルムを得た。こ
の工程間にフィルム長手方向、幅方向各々に1゜15倍
、1.25倍の延伸を行ない、熱処理は310℃で1.
5分間であった。This polymer solution was cast on a stainless steel endless belt and heated with hot air at 170° C. for 1.8 minutes to dry the solvent, and the film that had obtained self-retention properties was continuously peeled off from the belt. The peeled film is then introduced into a water bath at 50°C to extract the remaining solvent and inorganic salts generated during neutralization, and then introduced into a tenter where water is dried and heat treated to create an aromatic film with a thickness of 20 μm. A group polyamide film was obtained. During this step, the film was stretched by 1.15 times and 1.25 times in the longitudinal and width directions, respectively, and heat treated at 310°C for 1.25 times.
It was 5 minutes.
得られたフィルムの物性値はフィルム長手方向、幅方向
各々について、250℃の熱収縮率1.4%、1.2%
、熱膨張係数1.6×10−5(1/℃) 、1.7x
lO’ (1/℃)であった。またフィルム中の残存
溶媒量は0.02重量%、残存無機塩(Ca、Naその
他)は2appmであった。The physical property values of the obtained film were a heat shrinkage rate of 1.4% and 1.2% at 250°C in the film longitudinal direction and width direction, respectively.
, thermal expansion coefficient 1.6×10-5 (1/℃), 1.7x
It was lO' (1/°C). Further, the amount of residual solvent in the film was 0.02% by weight, and the amount of residual inorganic salts (Ca, Na, etc.) was 2 appm.
以上のようにして連続的に製造した長尺の芳香族ポリア
ミドフィルムを、−数的な連続コーティング装置の加熱
炉内へ通して熱処理を行なった。The long aromatic polyamide film produced continuously as described above was passed through a heating furnace of a continuous coating apparatus and subjected to heat treatment.
加熱炉温度は240℃、加熱時間は1.1分、フィルム
への引取り張力は0. 06 (kg/mu?)であっ
た。熱処理後のフィルム物性値は長手方向、幅方向各々
について、250℃の熱収縮率0.7%、0.6%、熱
膨張係数1.7xlO’ (1/℃) 、1.7xlO
’ (1/℃)であり寸法安定性が良好となった。また
熱処理による皺、筋等は生じず平面性も良好に保たれた
。The heating furnace temperature was 240°C, the heating time was 1.1 minutes, and the tension on the film was 0. 06 (kg/mu?). The physical properties of the film after heat treatment are: thermal contraction rate at 250°C of 0.7%, 0.6%, thermal expansion coefficient of 1.7xlO' (1/°C), 1.7xlO in the longitudinal direction and width direction, respectively.
' (1/°C), and the dimensional stability was good. Furthermore, no wrinkles or streaks were caused by the heat treatment, and good flatness was maintained.
また径6inchの紙製コアに芳香族ポリアミドフィル
ムを巻取り張力0. 2 (ks/mm)で300m巻
取り、これをそのまま熱風オーブン内で室温から230
℃まで1時間かけて昇温し同温度で更に0.5時間、熱
処理した。In addition, an aromatic polyamide film was wound around a paper core with a diameter of 6 inches and the tension was 0. 2 (ks/mm) and roll it up to 300m in a hot air oven from room temperature to 230m.
The temperature was raised to 0.degree. C. over 1 hour, and heat treatment was continued at the same temperature for an additional 0.5 hour.
更にフィルムを500揶角に断裁したものを200枚重
ねて熱風オーブン内に入れ、230℃で2時間の熱処理
も試みた。Furthermore, 200 sheets of the film cut into 500 wafers were stacked together, placed in a hot air oven, and heat treated at 230° C. for 2 hours.
熱処理後の250℃の熱収縮率は(長手方向、幅方向)
、ロール状での熱処理品は0.5%、0゜4%、断裁品
では0.3%、0.3%となって寸法安定性が非常に良
好となり、また両方ともにフィルム平面性は良好であっ
た。Thermal shrinkage rate at 250℃ after heat treatment (longitudinal direction, width direction)
, the heat-treated product in roll form was 0.5%, 0°4%, and the cut product was 0.3%, 0.3%, resulting in very good dimensional stability, and both films had good flatness. Met.
比較例1
実施例1で作成した芳香族ポリアミドフィルムについて
次の条件で熱処理を行なった。Comparative Example 1 The aromatic polyamide film prepared in Example 1 was heat treated under the following conditions.
条件A:コーターの加熱炉内でフィルムを走行させ15
0℃、30秒間の熱処理。Condition A: Run the film in the heating furnace of the coater for 15 minutes.
Heat treatment at 0°C for 30 seconds.
張力は0. 06 (ke/mff1)。Tension is 0. 06 (ke/mff1).
条件B:コーターの加熱炉内でフィルムを走行させ30
0℃、2分間の熱処理。Condition B: Run the film in the heating furnace of the coater for 30 minutes.
Heat treatment at 0°C for 2 minutes.
張力は0.06 (k8/mm)。Tension is 0.06 (k8/mm).
条件C:ロール状態で熱風オーブンにより270℃、3
時間の熱処理。Condition C: Rolled in a hot air oven at 270°C, 3
Heat treatment for hours.
条件Aでは熱収縮率は1.4%、1.2%(長手方向、
幅方向)で全く効果がなかった。条件Bでは熱収縮率は
0.4%、0.4%であったが、フィルムはかなり褐色
に着色し、条件Cでは熱収縮率は0.2%、0.1%と
非常に小さくなったが、フィルムは着色がひどく脆化し
たようであり、またロールに座屈が生じて平面性が悪化
した。Under condition A, the heat shrinkage rate was 1.4%, 1.2% (longitudinal direction,
(width direction) had no effect at all. Under condition B, the heat shrinkage rate was 0.4%, 0.4%, but the film was colored considerably brown, and under condition C, the heat shrinkage rate was very small, 0.2%, 0.1%. However, the film appeared to be severely colored and brittle, and the roll buckled, resulting in poor flatness.
比較例2
0.6モル比に相当する2−クロル−パラフェニレンジ
アミンと0. 4モル比に相当する4、4−ジアミノジ
フェニルエーテルをジアミン成分とし、0.8モル比に
相当する2−クロル−テレフタル酸クロリドと0. 2
モル比に相当するイソフタル酸クロリドから実施例1と
同様の重合、製膜方法で厚さ16μmのフィルムを製膜
した。但し延伸は1.05倍、1.17倍(長手方向、
幅方向)、熱固定は320℃で1.5分間とした。Comparative Example 2 2-chloro-paraphenylenediamine corresponding to a molar ratio of 0.6 and 0.6 molar ratio. The diamine component is 4,4-diaminodiphenyl ether corresponding to a molar ratio of 4,4, and 2-chloro-terephthalic acid chloride corresponding to a molar ratio of 0.8. 2
A film with a thickness of 16 μm was formed using the same polymerization and film forming method as in Example 1 from isophthalic acid chloride corresponding to the molar ratio. However, the stretching is 1.05 times, 1.17 times (longitudinal direction,
(width direction), and heat setting was performed at 320° C. for 1.5 minutes.
得られたフィルムの物性値は長手方向、幅方向各々につ
いて、熱収縮率2.7%、2.4%、熱膨張係数5.l
Xl0″′5(1/℃)、5.1×10−’ (1/
℃)であった。このフィルムを実施例1と同様のロール
状での熱処理を行なったところ、座屈および皺が多く生
じ平面性が非常に悪かった。The physical properties of the obtained film were a thermal shrinkage rate of 2.7% and 2.4%, and a thermal expansion coefficient of 5.0% in the longitudinal direction and width direction, respectively. l
Xl0'''5 (1/℃), 5.1×10-' (1/
℃). When this film was heat treated in roll form in the same manner as in Example 1, there were many buckles and wrinkles and the flatness was very poor.
また同じ原料から延伸倍率1.25倍、1.30倍、熱
固定290℃で1.5分間の条件で作成したフィルムの
物性値は、熱収縮率3.8%、3゜6%、熱膨張係数3
.6X10″6 (1/℃) 、3゜4xlO′5 (
1/℃)であった。このフィルムを実施例1と同様のロ
ール状での熱処理を行なったところ、やはり座屈や皺が
生じ平面性は非常に損われた状態であった。In addition, the physical properties of films made from the same raw materials under the conditions of stretching ratios of 1.25 times and 1.30 times and heat setting at 290°C for 1.5 minutes are as follows: heat shrinkage rate of 3.8%, heat shrinkage of 3°6%, Expansion coefficient 3
.. 6X10''6 (1/℃), 3゜4xlO'5 (
1/°C). When this film was heat treated in roll form in the same manner as in Example 1, buckling and wrinkles occurred and the flatness was severely impaired.
[発明の効果]
本発明では特定の熱的特性を有する芳香族ポリアミドフ
ィルムを、特定の熱処理条件によって後処理することに
より、高温下での寸法安定性に優れた芳香族ポリアミド
フィルムを工業的にかつ他の品質を損なうことなく提供
することができる。[Effect of the invention] In the present invention, by post-treating an aromatic polyamide film having specific thermal properties under specific heat treatment conditions, it is possible to industrially produce an aromatic polyamide film with excellent dimensional stability under high temperatures. and can be provided without compromising other qualities.
Claims (1)
.5×10^−^5(1/℃)以下の連続的に製造され
た芳香族ポリアミドフィルムを、式(1)〜(3)の範
囲で示される温度(T℃)および時間(t時間)で、か
つ無張力下または0.5(kg/mm^2)以下の張力
下で熱処理することを特徴とする芳香族ポリアミドフィ
ルムの熱処理方法。 −50t+200≦T≦−25t+300・・・・・・
式(1) 150≦T・・・・・・式(2) 0.01≦t・・・・・・式(3)[Claims] Thermal contraction rate at 250°C is 3.0% or less, and the thermal expansion coefficient is 4.
.. A continuously produced aromatic polyamide film of 5×10^-^5 (1/℃) or less is heated at a temperature (T℃) and a time (t time) shown in the range of formulas (1) to (3). A method for heat treating an aromatic polyamide film, characterized in that the heat treatment is carried out under no tension or under a tension of 0.5 (kg/mm^2) or less. -50t+200≦T≦-25t+300...
Formula (1) 150≦T・・・Formula (2) 0.01≦t・・・Formula (3)
Priority Applications (1)
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JP10982190A JP2773382B2 (en) | 1990-04-24 | 1990-04-24 | Heat treatment method of aromatic polyamide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10982190A JP2773382B2 (en) | 1990-04-24 | 1990-04-24 | Heat treatment method of aromatic polyamide film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH047130A true JPH047130A (en) | 1992-01-10 |
JP2773382B2 JP2773382B2 (en) | 1998-07-09 |
Family
ID=14520062
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100294904B1 (en) * | 1994-12-28 | 2001-09-17 | 구광시 | Polyimide film and preparation method thereof |
WO2001082663A3 (en) * | 2000-04-20 | 2002-01-24 | Honeywell Int Inc | Removing inherent stress via high temperature annealing |
JP2007261263A (en) * | 2006-03-01 | 2007-10-11 | Toray Ind Inc | Manufacturing method for integrated aromatic polyamide film and flexible circuit board |
WO2012043174A1 (en) * | 2010-09-29 | 2012-04-05 | 大日本印刷株式会社 | Method for heating plastic film, and method for producing color filter |
-
1990
- 1990-04-24 JP JP10982190A patent/JP2773382B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100294904B1 (en) * | 1994-12-28 | 2001-09-17 | 구광시 | Polyimide film and preparation method thereof |
US6489184B1 (en) | 1999-08-04 | 2002-12-03 | Honeywell International Inc. | Removing inherent stress via high temperature annealing |
WO2001082663A3 (en) * | 2000-04-20 | 2002-01-24 | Honeywell Int Inc | Removing inherent stress via high temperature annealing |
JP2007261263A (en) * | 2006-03-01 | 2007-10-11 | Toray Ind Inc | Manufacturing method for integrated aromatic polyamide film and flexible circuit board |
WO2012043174A1 (en) * | 2010-09-29 | 2012-04-05 | 大日本印刷株式会社 | Method for heating plastic film, and method for producing color filter |
JP2012071540A (en) * | 2010-09-29 | 2012-04-12 | Dainippon Printing Co Ltd | Method for heating plastic film, and method for producing color filter |
Also Published As
Publication number | Publication date |
---|---|
JP2773382B2 (en) | 1998-07-09 |
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