JPH04190843A - Gas reaction apparatus - Google Patents

Abstract

PURPOSE:To enhance earthquake resistance and to prevent the generation of breakage or a gas leak by loosely fitting gas reaction tubes in the holes of a common support plate to limit the movable range of the gas reaction tubes. CONSTITUTION:Projections 17 are formed to the intermediate parts of the outer surfaces of the gas reaction tubes 15a being at least the partial regions of gas reaction tubes 15 and a disc-shape support 18 having a diameter smaller than the inner diameter of the lining heat insulating material 3 of a pressure container 1 is placed on the projections 17 so that the reaction tubes 15a are loosely fitted in the support holes 19 of the support 18. Each of the support holes 19 has a diameter smaller than the max outer diameter of each gas reaction tube 15a having a diameter larger than the outer diameter of each gas reaction tube 15 and said holes 19 are provided at the same position intervals as the mounting positions of the gas reaction tubes 15 planted in a manifold 4. Therefore, the individual movement of the upper end parts of the gas reaction tubes 15 in a horizontal direction is not restricted with the range of the difference between the inner diameter of each of the support holes 19 and the outer diameter of each of the gas reaction tubes 15 but restricted out of the range and the apparatus becomes earthquake-resistant.

Description

[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention can be used, for example, to reform untreated hydrocarbon fuel in a fuel cell power plant into a hydrogen-rich gaseous fuel. This invention relates to a gas reactor.

(Prior Art) As is conventionally known, a fuel cell uses hydrogen gas as a cathode fuel, and requires a large amount of fuel to operate as a power generation plant. For this reason, commercial power plants generate electricity by treating untreated hydrocarbon fuels such as natural gas or naphtha at high temperatures using catalysts and reforming them into hydrogen-rich gaseous fuels. In addition, power generation plants are becoming larger due to higher power generation efficiency (and fewer problems such as pollution), and along with this, gas reactors for reforming are also becoming larger.

For example, such a gas reaction device is known as
No. 3-222002.

Hereinafter, one conventional gas reactor will be explained with reference to FIGS. 8 and 9.

FIG. 8 is a longitudinal cross-sectional view, and FIG. 9 is a cross-sectional view. In the figure, reference numeral 1 denotes a cylindrical pressure vessel with a plurality of legs 2 fixed to its outer bottom, and a heat insulating material 3 is placed on the inner surface of the pressure vessel 1. A manifold 4 is disposed in the lower part of the pressure vessel 1 and is connected to the inner wall surface of the pressure vessel 1 by six hangers 5. The manifold 4 is an annular first manifold having different diameters. Second. Third manifold 4
a.

4b, 4c, each manifold 4a,
4b.

4C are arranged concentrically and connected to each other through a plurality of connecting pipes 6 so as to communicate with each other. Furthermore, one end of a discharge pipe 70 provided through the wall surface of the pressure vessel 1 is connected to the second manifold 4b, and is configured to discharge the treated gas in the manifold 4 to the outside of the pressure vessel 1. has been done. The temperature inside the pressure vessel 1 rises and falls due to a heat source (not shown) provided inside the pressure vessel 1, and the thermal deformation of the manifold 4 caused by expansion and contraction due to this temperature change is caused by the displacement of the hanging tool 5. Absorbed.

In addition, each manifold 4a, 4b, and 4c includes a plurality of gas reaction tubes 8 having a long double circular tube structure and having a length of several meters.
However, the lower end opening of the inner tube 8a is connected to the manifolds 4a and 4b.

4C and are connected to each other in communication with each other, and are implanted so that the upper end is a free end. The gas reaction tube 8 is provided with an outer tube 8b coaxially with the inner tube 8a, and a flow path communicating with the upper end opening of the inner tube 8a is formed between the inner tube 8a and the outer tube 8b.

The flow passages between the outer tube 8b and the inner tube 8a of each gas reaction tube 8 are communicated with each other by providing a connecting tube 9. Furthermore, one end of a supply pipe 10 provided through the wall surface of the pressure vessel 1 is connected to some of the outer pipes 8b,
Untreated gas can be introduced from outside the pressure vessel 1 into the flow path between the outer tube 8b and the inner tube 8a.

Note that a flow path between the inner tube 8a and the outer tube 8b of the gas reaction tube 8 is filled with a catalyst, and a manifold 4 and a Flexible tubes 11 , 12 are provided which accommodate variations in the position of the reaction tube 8 .

Reforming of untreated gas, that is, untreated hydrocarbon fuel such as natural gas or naphtha in the apparatus configured as described above is carried out as follows.

First, the inside of the pressure vessel 1 is heated by a heat source (not shown),
The gas reaction tube 8 is maintained at a high temperature. Next, a supply pipe 1 is inserted into the flow path between the outer pipe 8b and the inner pipe 8a of the high-temperature gas reaction tube 8.
When untreated gas is introduced from outside the pressure vessel 1 through 0, the untreated gas becomes high temperature and circulates, and is reformed by a catalytic reaction by the catalyst in the flow passage to become treated gas, that is, hydrogen-rich gas. It becomes fuel and flows into the manifold 4.

The treated gas that has flowed into the manifold 4 is taken out of the pressure vessel 1 via the discharge pipe 7.

(Problem to be Solved by the Invention) However, in the above-mentioned conventional technology, it is essential to heat the inside of the pressure vessel 1 to a high temperature in order to reform the gas, and the manifold 4 is not restrained against thermal expansion. In addition, in order to increase the space occupation rate and perform efficient reforming, the gas reaction tubes 8 installed in the manifold 4 naturally have many long lengths. Therefore, the natural frequency is as low as several Hz, and in the event of an earthquake or the like having a frequency as low as several Hz, the gas reaction tube 8 will resonate and vibrate greatly. In some cases, adjacent gas reaction tubes 8 may collide with each other, or the gas reaction tubes 8 may collide with the inner wall of the pressure vessel 1, leading to damage to the apparatus or gas leakage.

The present invention was developed in view of the above circumstances, and its purpose is to prevent thermal expansion and contraction so that there is no risk of damage or gas leakage in the event of an earthquake, etc. It is an object of the present invention to provide a gas reaction device that is supported so as not to be constrained, has improved earthquake resistance, and can be made large-scale.

[Structure of the Invention] (Means for Solving the Problems) The gas reaction apparatus of the present invention includes a pressure vessel, a manifold disposed at a lower part of the pressure vessel, and a device having one end fixed to the manifold and implanted. The gas reaction tube includes a support plate common to at least some of the gas reaction tubes, and a support hole formed in the support plate to provide a predetermined gap. It is characterized in that it fits loosely and its movable range is limited by the support plate.

(Function) In the gas reaction apparatus configured as described above, a common support plate is loosely fitted to at least some of the gas reaction tubes, and each gas reaction tube is horizontally aligned within a predetermined gap. Although there is no restriction on displacement, when the displacement is larger, the entire gas reaction tube is restrained by the support plate and the range of movement is restricted. For this reason, when the entire gas reaction tube is restrained, its rigidity is high, and even if an earthquake occurs and the gas reaction tube is vibrated at a low frequency, the gas reaction tube will not resonate and vibrate greatly. Excessive stress will not be generated in the reaction tube, and damage to the device will not occur.

(Example) Hereinafter, an example of the present invention will be described with reference to FIGS. 1 to 7. It should be noted that the same parts as in the prior art are given the same reference numerals, and the explanation thereof will be omitted, and the structure of the present invention that is different from the conventional one will be explained.

First, a first embodiment will be explained with reference to FIGS. 1 and 2.

FIG. 1 is a longitudinal cross-sectional view, and FIG. 2 is a cross-sectional view. In the figure, reference numeral 15 denotes a plurality of gas reaction tubes with a double circular tube structure installed in the manifold 4 as in the conventional example, and at least some gas reaction tubes 15a of these gas reaction tubes 15 have a central part on the outer surface. A protrusion 17 is formed at the portion. Reference numeral 18 denotes a disk-shaped support plate having a diameter smaller than the inner diameter of the heat insulating material 3 lined in the pressure vessel 1. This support plate 18
, the gas reaction tubes 15 a having a diameter larger than the outer diameter of the gas reaction tubes 15 and including the height of the projections 17 are installed at the same position intervals as the attachment positions of the gas reaction tubes 15 implanted in the manifold 4 . A support hole 19 having a diameter smaller than the maximum external dimension and having a predetermined gap between it and the gas reaction tube 15 even at high temperatures.
is formed through it. Further, the support plate 18 is formed with a plurality of heat flow holes 20 passing through the support plate 18 in order to reduce the temperature difference within the pressure vessel 1 between the upper surface side and the lower surface side of the support plate 18 .

The support plate 18 loosely fits into the support hole 19 in the gas reaction tube 15, and is supported substantially horizontally by being placed on the protrusion 17 of the gas reaction tube 15a. As a result, each movement in the horizontal direction at the upper end of the gas reaction tube 15 is controlled by the support hole 1.
It is not restricted within the range of the difference between the inner diameter of the gas reaction tube 9 and the outer diameter of the gas reaction tube 15, but it is restricted outside the range.

According to the present embodiment formed as described above, the inside of the pressure vessel 1 is heated by a heat source (not shown) to raise the temperature, as in the conventional example,
The untreated gas is passed through the gas reaction tube 15 filled with a reforming catalyst and reformed by a catalytic reaction to obtain a treated gas rich in hydrogen.

The deformation caused by expansion and contraction of the manifold 4 during this process is absorbed by the displacement of the hanger 5, as in the conventional example. Further, the gas reaction tube 15 has a support hole 19 larger than the outer diameter of the gas reaction tube 15, and a support plate 18 that has a support hole 19 larger than the outer diameter of the gas reaction tube 15.
Since it is simply placed on the protrusion 17 of 5a and does not constrain the upper end portion in the axial direction, no thermal stress is generated even if it is deformed due to expansion and contraction.

Furthermore, when an earthquake or the like occurs and the entire device is vibrated at a low frequency of several Hz, the gas reaction tubes 15 are restrained from relative displacement by the support plate 18, and multiple gas reaction tubes 15 are Although relative displacement of the entire gas reaction tube 15 with respect to the pressure vessel 1 is allowed, the rigidity is increased and excessive stress is not generated. That is, the gas reaction tube 15 does not resonate and vibrate greatly as in the conventional example. Therefore, adjacent gas reaction tubes 15 do not collide with each other, or the gas reaction tubes 15 do not collide with the inner wall of the pressure vessel 1, causing damage to the apparatus. Further, the gas reaction tube 15 can be made long, and a larger amount of gas can be reformed with respect to the occupied area, making it possible to increase the scale of the power generation plant.

Next, a second embodiment will be explained with reference to FIGS. 3 and 4.

FIG. 3 is a cross-sectional view, and FIG. 4 is a partial perspective view of the support plate. In the figure, reference numeral 21 denotes a support plate having a structure arranged in a circular lattice shape and having a diameter smaller than the inner diameter of the heat insulating material 3 lined in the pressure vessel 1. This support plate 21 has a continuous peripheral wall 22 formed along the outer periphery, and a lattice-like assembly structure 23 is formed inside the peripheral wall 22. In addition, since the support plate 21 has a lattice-like structure, the upper surface side and the lower surface side of the support plate 21 communicate with each other through the square holes 24 of the lattice.

Further, the supporting plate 21 is provided with gas having a diameter larger than the outer diameter of the gas reaction tube 15 and including the height of the protrusion 17 at the same positional interval as the attachment position of the gas reaction tube 15 implanted in the manifold 4. has a diameter smaller than the maximum external dimension of the reaction tube 15a,
A support hole 25 is formed through the support hole 25 to have a predetermined gap between the support hole 25 and the gas reaction tube 15 even at high temperatures.

The support plate 21 formed as described above loosely fits into the support hole 25 in the gas reaction tube 15 in the same manner as in the first embodiment, and is placed on the protrusion 17 of the gas reaction tube 15a. It is supported substantially horizontally within the container 1.

As a result, individual movements in the horizontal direction at the upper end of the gas reaction tube 15 are not restricted within the range of the difference between the inner diameter of the support hole 25 and the outer diameter of the gas reaction tube 15, or are restricted outside the range. becomes.

Also in this embodiment formed as described above, a treated gas rich in hydrogen can be obtained by reforming the untreated gas through a catalytic reaction, as in the first embodiment. The same functions and effects as in the first embodiment can be obtained even during the reforming process or when an earthquake or the like occurs and the vibration is applied at a low frequency of several Hz.

Furthermore, in this embodiment, the support plate 21 has a lattice-like structure, so it can be made lightweight, and the temperature difference between the upper surface side and the lower surface side of the support plate 21 is small because the heat flow is carried out smoothly. It is possible to do this.

Next, a third embodiment will be explained with reference to FIG.

FIG. 5 is a cross-sectional view, and in the figure, reference numeral 26 denotes a fan-shaped support plate in which a disk whose diameter is smaller than the inner diameter of the heat insulating material 3 lined in the pressure vessel 1 is divided into approximately six equal parts. It is. This support plate 26 has the same positional spacing as the mounting position of the gas reaction tubes 15, which are divided into six equal parts so that the mounting positions of the plurality of gas reaction tubes 15 installed in the manifold 4 are divided into the same shape. A support hole 27 is formed penetratingly at a position such that .

This support hole 27 has a diameter larger than the outer diameter of the gas reaction tube 15 and smaller than the maximum external dimension of the gas reaction tube 15a including the height of the protrusion 17, so that the support hole 27 has a diameter that is larger than the outer diameter of the gas reaction tube 15 and smaller than the maximum external dimension of the gas reaction tube 15a including the height of the protrusion 17. There is a predetermined gap between them. Furthermore, the support plate 26
In order to reduce the temperature difference in the pressure vessel 1 between the upper surface side and the lower surface side of the support plate 2B, a plurality of heat flow holes 2 are provided through the support plate 2B.
8 is formed.

The six support plates 26 are provided with support holes 27 in the gas reaction tube 15.
is loosely fitted and placed on the protrusion 17 of the gas reaction tube 15a, thereby being supported substantially horizontally. In addition, support plate 2
6 is arranged in a substantially disk shape and placed on the gas reaction tube 15a, so that a gap is provided between each support plate 2B even at high temperatures. As a result, individual movements in the horizontal direction at the upper end of the gas reaction tube 15 are not restricted within the range of the difference between the inner diameter of the support hole 27 and the outer diameter of the gas reaction tube 15, but are restricted outside the range. becomes.

Also in this embodiment formed as described above, a treated gas rich in hydrogen can be obtained by reforming the untreated gas through a catalytic reaction as in the first embodiment. The same functions and effects as in the first embodiment can be obtained even during the reforming process or when an earthquake or the like occurs and the vibration is applied at a low frequency of several Hz.

Furthermore, in this embodiment, since the support plate 26 is divided into six parts, it is easier to construct and is effective for large-sized devices. Furthermore, since they are formed into the same shape, their manufacturability and workability are even better.

Next, a fourth embodiment will be explained with reference to FIGS. 6 and 7.

FIG. 6 is a cross-sectional view, and FIG. 7 is a perspective view of the main part.

In the figure, reference numeral 29 denotes a plurality of gas reaction tubes with a double circular tube structure installed in the manifold 4 as in the conventional example, and among these gas reaction tubes 29, the outermost first manifold 4a
A flange-like protrusion 30 is formed on the entire outer circumference of the intermediate portion of the outer gas reaction tube 29a implanted in the outer gas reaction tube 29a. Also second. The first and second inner gas reaction tubes 29b, 29c installed in the third manifolds 4b, 4c have the first and second inner gas reaction tubes 29b, 2 on the outer peripheral surface of the intermediate portion.
The fan-shaped protrusions 31a, 3 are formed by dividing an annular plate along the circumference, which is formed by arranging the 9c, into approximately equal parts in the circumferential direction.
1b is formed. Note that the protrusion 31a and the protrusion 3
The height of the gas reaction tube 29 in the tube axis direction is the same as that of 1b.

Further, 32 is a heat insulating material 3 whose outer diameter is lined inside the pressure vessel 1.
This is an annular support plate formed to have an inner diameter smaller than the inner diameter of the inner gas reaction tube 29b and larger than the diameter of the circle formed by the protruding portion 31a of the inner gas reaction tube 29b. This support plate 32 has gas reaction tubes 2 installed in the first manifold 4a.
It has a diameter larger than the outer diameter of the gas reaction tube 29a and smaller than the outer diameter of the protrusion 30 at the same distance as the mounting position of the gas reaction tube 9a, and has a predetermined distance between the gas reaction tube 29a and the gas reaction tube 29a even at high temperatures. A support hole 33 having a gap is formed therethrough. Furthermore, a plurality of heat flow holes 33 are formed in the support plate 32 in order to reduce the temperature difference within the pressure vessel 1 between the upper surface side and the lower surface side of the support plate 32 .

The support plate 32 loosely fits into the support hole 33 in the gas reaction tube 29a, and is supported substantially horizontally by being placed on the protrusion 30. Note that the support plate 32 is supported so that the height in the tube axis direction is the same as that of the protrusion 31a. Further, the support plate 32 and the gas reaction tube 29b are placed on the gas reaction tube 29a.

The protrusions 31a and 31b of 29c are formed so that a gap is provided between them even at high temperatures. As a result, individual movements in the horizontal direction at the upper end of the gas reaction tube 29a are not restricted within the range of the difference between the inner diameter of the support hole 33 and the outer diameter of the gas reaction tube 29a, but are restricted outside the range. becomes.

Furthermore, the individual movements of the gas reaction tubes 29b and 29c in the horizontal direction are not restricted within the range of the gaps between the protrusions 31a and 31b, but are restricted outside the range.

Also in this embodiment formed as described above, a treated gas rich in hydrogen can be obtained by reforming the untreated gas through a catalytic reaction, as in the first embodiment. The same functions and effects as in the first embodiment can be obtained even during the reforming process or when an earthquake or the like occurs and the vibration is applied at a low frequency of several Hz.

In each of the above embodiments, the support plate is provided in the middle of the gas reaction tube, but it may also be provided in the upper end, and the shape is not limited to the above. However, the present invention can be practiced with appropriate modifications within a scope without departing from the scope of the invention.

[Effects of the Invention] As is clear from the above description, the present invention has a configuration in which a common support plate is loosely fitted to at least some of the gas reaction tubes to limit the movable range of the gas reaction tubes. The following effects can be obtained. In other words, it improves seismic resistance while supporting it so as not to restrict it against thermal expansion and contraction, and allows for large-scale construction without the risk of damage or gas leaks even in the event of an earthquake, etc. that excites at a low frequency. This has the effect of making it possible to

[Brief explanation of the drawing]

FIG. 1 is a longitudinal cross-sectional view showing the first embodiment of the present invention, FIG. 2 is a cross-sectional view in the same direction as the ■-■ arrow in FIG. 1, and FIG. 3 is a cross-sectional view showing the second embodiment. , FIG. 4 is a partial perspective view of the support plate in the second embodiment, FIG. 5 is a cross-sectional view showing the third embodiment, FIG. 6 is a cross-sectional view showing the fourth embodiment, and FIG.
The figure is a perspective view of the main part in the fourth embodiment, FIG. 8 is a vertical sectional view showing the conventional example, and FIG. 9 is IX-IXX in FIG. 8.
FIG. 3 is a cross-sectional view in the force direction. 1...Pressure vessel, 4, 4a, 4b, 4cm...manifold, 15,
15a... Gas reaction tube, 17... Protrusion, 18.
...Support plate, 19...Support hole. Agent Patent Attorney Nori Ogo Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 29 29b Figure 7

Claims (1)

[Claims] A pressure vessel, a manifold disposed in the lower part of the pressure vessel, and a plurality of gas reaction tubes implanted with one end fixed to the manifold, the gas reaction tubes comprising: A support plate common to at least some of the gas reaction tubes is loosely fitted through a support hole formed in the support plate with a predetermined gap, and a range of movement is limited by the support plate. A gas reaction device characterized by: