JPH04186508A - Thin-film magnetic head - Google Patents
Thin-film magnetic headInfo
- Publication number
- JPH04186508A JPH04186508A JP31649490A JP31649490A JPH04186508A JP H04186508 A JPH04186508 A JP H04186508A JP 31649490 A JP31649490 A JP 31649490A JP 31649490 A JP31649490 A JP 31649490A JP H04186508 A JPH04186508 A JP H04186508A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic head
- film magnetic
- thin film
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 53
- 239000000758 substrate Substances 0.000 claims description 6
- 238000000059 patterning Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000005530 etching Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 101000606504 Drosophila melanogaster Tyrosine-protein kinase-like otk Proteins 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
- G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
- G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/488—Disposition of heads
- G11B5/4886—Disposition of heads relative to rotating disc
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は薄膜磁気ヘッドに係わり、特にハードディスク
型磁気記録再生装置に適用して好適な薄膜磁気ヘッドに
係わる。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head, and particularly to a thin film magnetic head suitable for application to a hard disk type magnetic recording/reproducing device.
本発明は、薄膜磁気ヘッドに係わり、磁気記録媒体面と
ほぼ平行を成す基体面上に、共通の磁性薄膜がパターン
化されて、互いの磁気ギャップが非平行の配置関係をも
って形成された1対以上の水平型薄膜磁気ヘッド素子が
形成されて成ることにより、記録密度の向上及び生産性
の向上をはかる。The present invention relates to a thin-film magnetic head, in which a common magnetic thin film is patterned on a substrate surface substantially parallel to a magnetic recording medium surface, and a pair of magnetic thin-film heads are formed with magnetic gaps arranged non-parallelly to each other. By forming the horizontal thin film magnetic head element described above, it is possible to improve recording density and productivity.
[従来の技術]
ハードディスク型磁気記録装置においても、近年記録密
度の大幅な増大化が求められており、トラック幅、ガー
トバンド共にその幅を小さくする方向となっている。[Prior Art] In recent years, there has been a demand for a significant increase in recording density in hard disk type magnetic recording devices, and the trend is to reduce both the track width and the guard band width.
しかしながら、例えばトラック間の間隔即ちガートバン
ドの幅をOとすると、トラッキング誤差によって隣接す
るトラック上に磁気ヘッドの一部が跨ることによって発
生するオフトラック・クロストークが大となるという不
都合が生じる。However, if, for example, the width of the spacing between tracks, that is, the width of the guard band, is O, a problem arises in that off-track crosstalk, which occurs when a portion of the magnetic head straddles an adjacent track due to a tracking error, becomes large.
この問題を回避する方法として、VTRに使用されてい
るアジマス記録方式がある。この方式をハードディスク
の浮上型ヘッドドライブ装置に適用する場合、磁気記録
媒体上の等磁位面と磁気ギャップとを角度θをもって傾
斜させ、このθを適切に選定することによって、同一の
浮上磁気ヘッドスライダー上に逆向きのアジマス角をも
たせた一対のヘッドを搭載して、隣り合うトラック同士
は常に異なるヘッドで記録再生を行うこととして、トラ
ッキング誤差によって生じるクロストークを大幅に低減
化することができる。As a method to avoid this problem, there is an azimuth recording method used in VTRs. When this method is applied to a hard disk floating head drive device, the equipotential plane on the magnetic recording medium and the magnetic gap are inclined at an angle θ, and by appropriately selecting this θ, the same floating magnetic head A pair of heads with opposite azimuth angles are mounted on the slider, and adjacent tracks are always recorded and played back using different heads, greatly reducing crosstalk caused by tracking errors. .
このようなアジマス記録方式を採用するためには、スラ
イダー上に2つの磁気ヘッドを一定の間隔をもって精度
よく形成することが必要となる。In order to employ such an azimuth recording method, it is necessary to accurately form two magnetic heads on a slider with a constant interval.
例えば特開昭63−200313号公開公報では、スラ
イダーの一部に切り欠き部を設けて、ここに例えば巻線
型の磁気ヘットを無機接着剤等によって嵌合固着して成
る構造が採られている。しかしながら、このような構造
とする場合、その精度に問題があり、またその製造が煩
雑であるため生産性の向上をはかる上で問題がある。For example, in Japanese Patent Application Laid-Open No. 63-200313, a structure is adopted in which a notch is provided in a part of the slider, and a wire-wound magnetic head, for example, is fitted and fixed therein with an inorganic adhesive or the like. . However, when using such a structure, there is a problem in its accuracy, and its manufacturing is complicated, so there are problems in improving productivity.
これに対して、例えば薄膜磁気ヘッド素子をスライダー
上に形成する方法が考えられる。薄膜磁気ヘッド素子は
、例えば第4図にその路線的断面図を示すように、スラ
イダーそのもの或いはスライダーに取付けられる絶縁基
板(21)上に磁性材より成り、一端部において接続さ
れて成る下部コア(22)と上部コア(23)とが、絶
縁層(24)及びへ、7ト巻線部(7)とを介して積層
して構成される。そしてこの上部コア(22)と下部コ
ア(23)との他の端部においては、その間が一部狭小
化されて成り、薄い非磁性絶縁層が介在されて磁気ギ・
ヤンブgとされる。この磁気ギャップgは、磁気記録媒
体と対向するいわゆるABS(Air Bearing
5urface)面(25)に臨むように、ABS面
(25)の形成と共にラッピングされて鏡面加工が施さ
れた構造となっている。On the other hand, for example, a method of forming a thin film magnetic head element on a slider can be considered. A thin film magnetic head element, as shown in a cross-sectional view in FIG. 4, is made of a magnetic material and is connected at one end to a lower core ( 22) and an upper core (23) are laminated via an insulating layer (24) and a winding portion (7). At the other end of the upper core (22) and the lower core (23), the space between them is partially narrowed, and a thin non-magnetic insulating layer is interposed to provide magnetic gear.
It is said to be Yanbu G. This magnetic gap g is the so-called ABS (Air Bearing) facing the magnetic recording medium.
It has a structure in which the ABS surface (25) is formed and lapped to a mirror finish so as to face the surface (25).
この場合、この磁気ギャップgにアジマス角を設けるた
めには、この下部コア(22)及び上部コア(23)と
の間の間隙を、第4図紙面に対して垂直な方向に向かっ
て漸次その絶縁基板(21)からの高さを変化させた所
要の傾きをもった構造とする必要があるため、その製造
方法は極めて難しくなり、実際上不可能である。In this case, in order to provide the magnetic gap g with an azimuth angle, the gap between the lower core (22) and the upper core (23) must be gradually increased in the direction perpendicular to the plane of FIG. 4. Since it is necessary to have a structure with a required inclination by varying the height from the insulating substrate (21), the manufacturing method thereof becomes extremely difficult and is practically impossible.
〔発明が解決しようとする課題]
本発明は、上述したような薄膜磁気ヘットの高記録密度
化にあたって、簡単かつ精度良く形成し得る構造を提供
するものであり、これにより薄膜磁気ヘットの記録密度
の向上及び生産性の向上をはかる。[Problems to be Solved by the Invention] The present invention provides a structure that can be easily and accurately formed to increase the recording density of the thin-film magnetic head as described above, thereby increasing the recording density of the thin-film magnetic head. and improve productivity.
本発明薄膜磁気ヘッドの一例の路線的拡大斜視図を第1
図に示す。The first enlarged perspective view of an example of the thin film magnetic head of the present invention is shown in FIG.
As shown in the figure.
本発明は、磁気記録媒体面とほぼ平行を成す基体面(2
OA)上に、共通の磁性薄膜がバクーン化されて、互い
の磁気ギャップg1及びg2が非平行の配置関係をもっ
て形成された1対以上の水平型薄膜磁気ヘッド素子(3
0)を形成する。The present invention provides a substrate surface (2
One or more pairs of horizontal thin film magnetic head elements (3 OA) are formed by forming a common magnetic thin film into a backcoon so that magnetic gaps g1 and g2 are arranged in a non-parallel manner.
0) is formed.
[作用]
上述したように、本発明薄膜磁気ヘッドでは、磁気記録
媒体面とほぼ平行を成す基体面(2OA)上に1対以上
の水平型薄膜磁気ヘッド素子(30)を形成するもので
あるがミこのような水平型薄膜磁気−・ラド素子(30
)の形成方法は、例えば基体面(204)上に絶縁層、
磁性層等を被着した後、上面からのパターニングによっ
て順次形成する方法を採ることができる。このため、こ
のような磁気ギヤツブgにアジマス角を有する水平型薄
膜磁気ヘッド素子(30)を形成する場合、ギャップ部
を構成する磁性薄膜を1回のパターニングによってそれ
ぞれ形成することができると共に、複数の素子(30)
の磁気ギャップg、及びg2の互いの成す角度を共通の
パターンによって精度よく同時に形成することができる
こととなる。[Function] As described above, in the thin film magnetic head of the present invention, one or more pairs of horizontal thin film magnetic head elements (30) are formed on the base surface (2OA) substantially parallel to the magnetic recording medium surface. However, such a horizontal thin film magnetic rad element (30
), for example, an insulating layer on the base surface (204),
After a magnetic layer or the like is deposited, a method can be adopted in which the magnetic layer is sequentially formed by patterning from the top surface. Therefore, when forming a horizontal thin film magnetic head element (30) having an azimuth angle on such a magnetic gear g, it is possible to form each of the magnetic thin films constituting the gap part by one patterning, and also to form a plurality of magnetic thin films by one patterning. element (30)
The mutual angles formed by the magnetic gaps g and g2 can be simultaneously formed with high precision using a common pattern.
[実施例]
以下、第1図〜第3図を参照して本発明薄膜磁気ヘッド
について詳細に説明する。[Example] Hereinafter, the thin film magnetic head of the present invention will be described in detail with reference to FIGS. 1 to 3.
この例では、磁気記録媒体面上にほぼこの磁気記録媒体
面と平行に浮上して走行するスライダーとなる基体(2
0)上に水平型薄膜磁気−・ラド素子(30)を一体に
形成する場合で、第1図に示すように、基体(20)の
磁気記録媒体面と対向する側には、磁気記録媒体との相
対的走行によって空気流を発生して基体(20)即ちス
ライダーを浮上させる、直線状の平行する凸部より成る
第1及び第2のレール(51)及び(52)が設けられ
る。そして第1及び第2のレール(51)及び(52)
の一端の基体面(2OA)上に、例えば1対の水平型薄
膜磁気ヘット素子(30)を形成する。In this example, a base (2
0) When a horizontal thin film magnetic-rad element (30) is integrally formed on the base body (20), as shown in FIG. First and second rails (51) and (52) are provided which are made of linear parallel convex portions that generate airflow and levitate the base (20), ie, the slider, by running relative to the slider. and first and second rails (51) and (52)
For example, a pair of horizontal thin film magnetic head elements (30) are formed on the base surface (2OA) at one end of the substrate.
この水平型薄膜磁気ヘッド素子(30)の−例を、その
路線的拡大断面図を示す第2図を参照して詳細に説明す
る。例えばAizOz4iC,CaTi0:+、 フェ
ライト系セラミック、結晶化ガラス等より成る絶縁基板
(21)上に例えばNiFe等より成る下部コア(1)
をフレームメツキ等により形成し、その上を覆って全面
的にSing等より成る非磁性の絶縁層(2)を被着し
た後平坦化し、更にこの絶縁層(2)上に例えばCuよ
り成る導電層を全面的に被着した後、フォトリソグラフ
ィ等の適用即ち例えばフォトレジストの塗布、パターン
露光、現像、イオンミリング等による選択的エツチング
を行って所要のパターンにバターニングし、コイル即ち
ヘッド巻線部(4)を形成する。そしてこのヘッド巻線
部(4)の上を覆って全面的に例えばSiO□より成る
絶縁層(5)を比較的厚く被着形成し、この厚い絶縁層
(5)上にRIE(反応性イオンエツチング)等の異方
性エンチングにより、一定の角度をもった2方向からの
異方性エツチング、いわゆるテーパエツチングを行い、
更ユニ磁気ギャンプgを形成すべき領域上に所要の狭小
なる幅をもって形成した多層レジスト(図示せず)を形
成し、これをマスクとしてIBB(イオンヒームエッチ
ング)等の異方性エツチングを行い、所要の幅及び高さ
を有するギャップ部(5A)とそれに続くテーバ状の絶
縁層(5)を形成する。そしてこの絶縁層(5)の所要
部分例えば下層に形成した下部コア(1)の外縁部上に
この下部コア(1)に達する深さに接続部穴(6^)を
フォトリソグラフィ等を適用してRIE等によって形成
した後、この接続部穴(6A)内を埋込むように例えば
NiFeをメツキ等により被着して上下部コア(22)
及び(23)を磁気的に接続する磁性接続部(6)を埋
込んで形成する。そして絶縁N(5)上にNiFe等よ
り成る磁性層をスパフタリング等により被着した後所要
のパターンにバターニングして上部コア(7)を形成し
、更に厚い絶縁層(8)を被着する。そして、この絶縁
層(8)、上部コア(7)及び絶縁層より成るギャップ
部(5A)が鏡面な一平面となるように研磨を行ってA
BS面(25)を形成して、水平型薄膜磁気ヘッド素子
(30)を得ることができる。An example of this horizontal thin film magnetic head element (30) will be described in detail with reference to FIG. 2, which shows an enlarged sectional view thereof. For example, a lower core (1) made of NiFe etc. is placed on an insulating substrate (21) made of AizOz4iC, CaTi0:+, ferrite ceramic, crystallized glass, etc.
A non-magnetic insulating layer (2) made of Sing or the like is deposited on the entire surface and then flattened, and a conductive layer made of, for example, Cu is formed on this insulating layer (2) by frame plating or the like. After the layer has been completely deposited, it is patterned into the desired pattern by applying photolithography, e.g. coating of photoresist, pattern exposure, development, selective etching by ion milling, etc., to form the coil or head winding. Form part (4). Then, a relatively thick insulating layer (5) made of SiO□, for example, is formed on the entire surface of the head winding part (4), and RIE (reactive ionization) is applied on this thick insulating layer (5). By anisotropic etching such as etching), we perform anisotropic etching from two directions at a certain angle, so-called taper etching.
Furthermore, a multilayer resist (not shown) with a required narrow width is formed on the region where the unimagnetic gap g is to be formed, and using this as a mask, anisotropic etching such as IBB (ion beam etching) is performed. , a gap portion (5A) having a required width and height and a tapered insulating layer (5) following the gap portion (5A) are formed. Then, photolithography or the like is applied to form a connection hole (6^) in a required part of this insulating layer (5), for example, on the outer edge of the lower core (1) formed in the lower layer, to a depth that reaches this lower core (1). After forming the upper and lower cores (22) by RIE or the like, for example, NiFe is applied by plating or the like so as to fill the inside of the connection hole (6A).
and (23) are embedded and formed. Then, a magnetic layer made of NiFe or the like is deposited on the insulating N (5) by sputtering or the like, and then patterned into a desired pattern to form an upper core (7), and then covered with a thicker insulating layer (8). wear it. Then, polishing is performed so that the insulating layer (8), the upper core (7), and the gap part (5A) made of the insulating layer become one mirror-like plane.
By forming the BS surface (25), a horizontal thin film magnetic head element (30) can be obtained.
このように水平型薄膜磁気ヘッド素子(30)は、磁気
ギャップgの形状を通常のフォトリソグラフィ等を適用
したバターニングによって容易に変化させることができ
ると共に、上述の方法によって複数の薄膜磁気ヘッド素
子を同時に形成することができる。In this way, the horizontal thin film magnetic head element (30) can easily change the shape of the magnetic gap g by patterning using ordinary photolithography, etc. can be formed simultaneously.
このようにして水平型薄膜磁気ヘッド素子(30)を例
えば1対形成する場合、例えば第3図にその要部の路線
的拡大上面図を示すように、各磁気ギャップg1及びg
2を非平行となるように形成する。図において磁気記録
媒体との相対的走行方向をX方向とし、これと直交し、
第3図紙面に沿う方向をX方向とすると、磁気ギャップ
g1のX方向からの角度α1 と、磁気ギャップg2の
X方向からの角度α2とを、例えばα2−−α、とじて
形成する。このとき磁気記録媒体と薄膜磁気ヘッドとの
相対的な傾斜角θは2αとなる。When forming, for example, one pair of horizontal thin film magnetic head elements (30) in this way, each magnetic gap g1 and g
2 are formed so as to be non-parallel. In the figure, the relative running direction with respect to the magnetic recording medium is the X direction, and it is perpendicular to this,
Assuming that the direction along the plane of FIG. 3 is the X direction, the angle α1 of the magnetic gap g1 from the X direction and the angle α2 of the magnetic gap g2 from the X direction are, for example, α2−α. At this time, the relative tilt angle θ between the magnetic recording medium and the thin film magnetic head is 2α.
また、隣り合うトラックが常にこの異なる薄膜磁気ヘッ
ド素子(30)によって記録再生かなされるようにする
ため、各水平型薄膜磁気ヘット素子(30)の間隔は、
例えば磁気ギャップg、及びg2のそれぞれのX方向に
おける中心間の間隔をdとして、磁気ギャップg1及び
g2のX方向の輻即ちトラック幅をKとすると、この各
磁気ギャップ間の間隔がd = (2n+1)W (n
は自然数)となるように配置する。Further, in order to ensure that adjacent tracks are always recorded and reproduced by different thin film magnetic head elements (30), the interval between each horizontal thin film magnetic head element (30) is set as follows.
For example, if the distance between the centers of the magnetic gaps g and g2 in the X direction is d, and the radius or track width of the magnetic gaps g1 and g2 in the X direction is K, then the distance between the magnetic gaps is d = ( 2n+1)W (n
is a natural number).
一例として、このような水平型の薄膜磁気ヘッド(30
)のアジマス角θについて考察する。As an example, such a horizontal thin film magnetic head (30
) will be considered.
磁気記録媒体上の等磁位面と磁気ギャップとの成す角度
がθであるとき、トラック幅を−とすると次式で示すア
ジマス損失Laが発生することが知られている。It is known that when the angle between the equipotential plane on the magnetic recording medium and the magnetic gap is θ, and if the track width is -, an azimuth loss La expressed by the following equation occurs.
La = 20Log I。La = 20 Log I.
X l [5in((πW/λ) tanθ)]/[(
πW/λ)tanθ)] l [dB]この式において
、X=(π−/λ)tanθと置いてこのXをパラメー
タとする古、アジマス損失Laは第5図に示すように、
複数のピークP o、 P +・・・・を有する曲線で
示される。X l [5in((πW/λ) tanθ)]/[(
πW/λ) tan θ)] l [dB] In this formula, X = (π-/λ) tan θ, and the azimuth loss La with this X as a parameter is as shown in Figure 5.
It is shown by a curve having multiple peaks P o, P + .
一般に、オントラック・クコストーク自体はアジマス角
θがθ=90°のとき最小となるが、オフトラック時の
位相変動を考えるとθはなるべく小さくすることが望ま
れる。Generally, the on-track Kukostalk itself is at its minimum when the azimuth angle θ is 90°, but in consideration of phase fluctuations during off-track, it is desirable to make θ as small as possible.
しかしながら、実際上はある程度のアジマス損失が得ら
れることが必要であり、実用的には例えば、第5図中P
1で示す第1のピークの値以下のアジマス損失を得るこ
とが望ましく、このためには、X≧X、)であれば良い
。このX。を求めると、x o=2.566となる。利
用する記録波長のうち最長の波長をλ1Thax とす
ると、
x=(πW/λmax) tanθ≧2.566となる
。この式からθの条件を導くと、θ≧jan−’ (0
,817Xλ、、X/W)となる。例えばトラック幅病
−10μm、7m a x−2μmとすると、
θ29.3 [degl
となり、トランク幅−一5μm、λIII a X ”
” 2μm七すると、
0218.1 [degl
となる。However, in practice, it is necessary to obtain a certain degree of azimuth loss, and in practice, for example, P
It is desirable to obtain an azimuth loss equal to or less than the value of the first peak indicated by 1, and for this purpose, it is sufficient if X≧X,). This X. The result is x o = 2.566. If the longest wavelength among the recording wavelengths used is λ1Thax, then x=(πW/λmax) tanθ≧2.566. Deriving the condition for θ from this equation, θ≧jan-' (0
,817Xλ,,X/W). For example, if the track width is −10 μm and 7 m a x −2 μm, then θ29.3 [degl, trunk width −15 μm, and λIII a X ”
” If it is 2 μm, it becomes 0218.1 [degree].
従って、特にハードディスク型の磁気記録装置において
は、VTRと異なりオフトラック量に対しての位相変動
量が小さくなるため、アジマス角度θを上述したように
充分大きくとることが可能となり、クロストークを減少
させる効果をより大とすることができる。Therefore, especially in a hard disk type magnetic recording device, unlike a VTR, the amount of phase fluctuation with respect to the off-track amount is small, so the azimuth angle θ can be set sufficiently large as described above, and crosstalk can be reduced. The effect can be further increased.
尚、第1図に示す例では水平型薄膜磁気ヘラ)素子(3
0)をスライダーとなる基体(20)の各レール(51
)及び(52)上に設ける場合を示したが、例えば第3
図に示すように、−のレール上に対の水平型薄膜磁気ヘ
ッド素子(30)を設けてもよく、また水平型薄膜磁気
ヘッド素子(30)は1対以上設けてもよく、その他種
々の構成を採ることができる。In the example shown in FIG. 1, the horizontal thin film magnetic spatula element (3
0) on each rail (51) of the base (20) that becomes the slider.
) and (52), but for example, the third
As shown in the figure, a pair of horizontal thin film magnetic head elements (30) may be provided on the - rail, one or more pairs of horizontal thin film magnetic head elements (30) may be provided, and various other configuration can be adopted.
また第2図に示した例に瞑らず、水平型薄膜磁気ヘッド
素子としては、例えばMR(磁気抵抗効果)素子を利用
したいわゆる1型の水平型薄膜磁気ヘンドを用いてもよ
い。Furthermore, without following the example shown in FIG. 2, a so-called type 1 horizontal thin film magnetic head using, for example, an MR (magnetoresistive effect) element may be used as the horizontal thin film magnetic head element.
(発明の効果]
上述したように、本発明薄膜磁気ヘッドによれば、1対
以上の水平型薄膜磁気ヘッド素子の磁気ギャップを、1
回のバターニングによってそれぞれ所要の角度をもって
精度よ(形成することができるため、磁気ギャップにア
ジマス角を設けた薄膜磁気ヘッドの製造が可能となり、
高記録密度化を行う場合において製造工程の簡単化及び
生産性の向上をはかることができる。(Effects of the Invention) As described above, according to the thin film magnetic head of the present invention, the magnetic gap of one or more pairs of horizontal thin film magnetic head elements is reduced to 1.
By repeating patterning, it is possible to precisely form the required angles, making it possible to manufacture thin-film magnetic heads with an azimuth angle in the magnetic gap.
In the case of high recording density, it is possible to simplify the manufacturing process and improve productivity.
また特に、ハードディスク型の磁気記録装置に本発明薄
膜磁気ヘッドを適用する場合においては、VTRと異な
りオフトラック量に対しての位相変動量が小さくなるた
め、アジマス角度θを充分大きくとることが可能となり
、クロストークを減少させる効果をより大とすることが
できて、特性の向上をはかることができる。In particular, when the thin-film magnetic head of the present invention is applied to a hard disk type magnetic recording device, unlike a VTR, the amount of phase fluctuation with respect to the off-track amount is small, so the azimuth angle θ can be set sufficiently large. Therefore, the effect of reducing crosstalk can be further increased, and characteristics can be improved.
第1図は本発明薄膜磁気ヘッドの一例の路線的拡大斜視
図、第2図は水平型薄膜磁気へ、ト素子の路線的拡大断
面図、第3図は本発明薄膜磁気ヘッドの要部の路線的拡
大上面図、第4図は薄膜磁気ヘッド素子の一例の路線的
拡大断面図、第5図はアジマス損失を示す図である。
(20)は基体、(2OA)は基体面、・(30)は水
平型薄膜磁気ヘッド素子、g、g+及びg2は磁気ギヤ
ツブである。FIG. 1 is an enlarged perspective view of an example of the thin film magnetic head of the present invention, FIG. 2 is an enlarged cross-sectional view of a horizontal thin film magnetic element, and FIG. 3 is an enlarged perspective view of the main parts of the thin film magnetic head of the invention. FIG. 4 is a linearly enlarged top view, FIG. 4 is a linearly enlarged sectional view of an example of a thin film magnetic head element, and FIG. 5 is a diagram showing azimuth loss. (20) is a base, (2OA) is a base surface, (30) is a horizontal thin film magnetic head element, and g, g+, and g2 are magnetic gears.
Claims (1)
性薄膜がパターン化されて、互いの磁気ギャップが非平
行の配置関係をもって形成された1対以上の水平型薄膜
磁気ヘッド素子が形成されて成る ことを特徴とする薄膜磁気ヘッド。[Claims] One or more pairs of horizontal types in which a common magnetic thin film is patterned on a substrate surface substantially parallel to the surface of a magnetic recording medium, and magnetic gaps are formed in a non-parallel arrangement relationship. A thin film magnetic head comprising a thin film magnetic head element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2316494A JP2946743B2 (en) | 1990-11-21 | 1990-11-21 | Thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2316494A JP2946743B2 (en) | 1990-11-21 | 1990-11-21 | Thin film magnetic head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04186508A true JPH04186508A (en) | 1992-07-03 |
JP2946743B2 JP2946743B2 (en) | 1999-09-06 |
Family
ID=18077726
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2316494A Expired - Fee Related JP2946743B2 (en) | 1990-11-21 | 1990-11-21 | Thin film magnetic head |
Country Status (1)
Country | Link |
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JP (1) | JP2946743B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004084192A1 (en) * | 2003-03-17 | 2004-09-30 | Fujitsu Limited | Magnetic disk device |
-
1990
- 1990-11-21 JP JP2316494A patent/JP2946743B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004084192A1 (en) * | 2003-03-17 | 2004-09-30 | Fujitsu Limited | Magnetic disk device |
US7379257B2 (en) | 2003-03-17 | 2008-05-27 | Fujitsu Limited | Magnetic disk drive |
Also Published As
Publication number | Publication date |
---|---|
JP2946743B2 (en) | 1999-09-06 |
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