JPH03255087A - Novel cephem compound and its salt - Google Patents
Novel cephem compound and its saltInfo
- Publication number
- JPH03255087A JPH03255087A JP5323390A JP5323390A JPH03255087A JP H03255087 A JPH03255087 A JP H03255087A JP 5323390 A JP5323390 A JP 5323390A JP 5323390 A JP5323390 A JP 5323390A JP H03255087 A JPH03255087 A JP H03255087A
- Authority
- JP
- Japan
- Prior art keywords
- ester
- salts
- compound
- acid
- carboxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 cephem compound Chemical class 0.000 title claims abstract description 60
- 150000003839 salts Chemical class 0.000 title claims abstract description 25
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 27
- 125000005236 alkanoylamino group Chemical group 0.000 claims abstract description 4
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims abstract description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 16
- 125000003277 amino group Chemical group 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 25
- 239000003795 chemical substances by application Substances 0.000 abstract description 2
- 239000003960 organic solvent Substances 0.000 abstract description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 abstract 1
- 239000003242 anti bacterial agent Substances 0.000 abstract 1
- 125000004181 carboxyalkyl group Chemical group 0.000 abstract 1
- QQVDYSUDFZZPSU-UHFFFAOYSA-M chloromethylidene(dimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)=CCl QQVDYSUDFZZPSU-UHFFFAOYSA-M 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- HQOQSFITXGQQDM-SSDOTTSWSA-N methyl (6R)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound COC(=O)C1=CCS[C@@H]2CC(=O)N12 HQOQSFITXGQQDM-SSDOTTSWSA-N 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 21
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical class OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 150000002148 esters Chemical group 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 125000005907 alkyl ester group Chemical group 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 238000004440 column chromatography Methods 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 3
- 238000010531 catalytic reduction reaction Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- HQKMJHAJHXVSDF-UHFFFAOYSA-L magnesium stearate Chemical compound [Mg+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O HQKMJHAJHXVSDF-UHFFFAOYSA-L 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- IZDROVVXIHRYMH-UHFFFAOYSA-N methanesulfonic anhydride Chemical compound CS(=O)(=O)OS(C)(=O)=O IZDROVVXIHRYMH-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- LWFWUJCJKPUZLV-UHFFFAOYSA-N n-trimethylsilylacetamide Chemical compound CC(=O)N[Si](C)(C)C LWFWUJCJKPUZLV-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- 239000000825 pharmaceutical preparation Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000002861 (C1-C4) alkanoyl group Chemical group 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide Chemical compound CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- AMOYMEBHYUTMKJ-UHFFFAOYSA-N 2-(2-phenylethoxy)ethylbenzene Chemical compound C=1C=CC=CC=1CCOCCC1=CC=CC=C1 AMOYMEBHYUTMKJ-UHFFFAOYSA-N 0.000 description 1
- DWOXYRJWYZFHNE-UHFFFAOYSA-N 2-[[1-(5-amino-1,2,4-thiadiazol-3-yl)-2-methylsulfonyloxy-2-oxoethylidene]amino]oxy-2-methylpropanoic acid Chemical compound OC(=O)C(C)(C)ON=C(C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 DWOXYRJWYZFHNE-UHFFFAOYSA-N 0.000 description 1
- AVZBOAGCVKEESJ-UHFFFAOYSA-O 2-ethyl-1,2-benzoxazol-2-ium-7-ol Chemical class C1=CC(O)=C2O[N+](CC)=CC2=C1 AVZBOAGCVKEESJ-UHFFFAOYSA-O 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- GUBGYTABKSRVRQ-XLOQQCSPSA-N Alpha-Lactose Chemical compound O[C@@H]1[C@@H](O)[C@@H](O)[C@@H](CO)O[C@H]1O[C@@H]1[C@@H](CO)O[C@H](O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-XLOQQCSPSA-N 0.000 description 1
- 208000035143 Bacterial infection Diseases 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- 241000283690 Bos taurus Species 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- 229920002261 Corn starch Polymers 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical class C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- GUBGYTABKSRVRQ-QKKXKWKRSA-N Lactose Natural products OC[C@H]1O[C@@H](O[C@H]2[C@H](O)[C@@H](O)C(O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@H]1O GUBGYTABKSRVRQ-QKKXKWKRSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 240000007817 Olea europaea Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 235000010419 agar Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229940024606 amino acid Drugs 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000001484 arginines Chemical class 0.000 description 1
- 125000003435 aroyl group Chemical group 0.000 description 1
- 150000007860 aryl ester derivatives Chemical class 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 229940009098 aspartate Drugs 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 208000022362 bacterial infectious disease Diseases 0.000 description 1
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Inorganic materials [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 1
- HKNWKTRXBJXGMT-UHFFFAOYSA-N barium palladium Chemical compound [Pd].[Ba] HKNWKTRXBJXGMT-UHFFFAOYSA-N 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Inorganic materials [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- JUHORIMYRDESRB-UHFFFAOYSA-N benzathine Chemical class C=1C=CC=CC=1CNCCNCC1=CC=CC=C1 JUHORIMYRDESRB-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 125000001589 carboacyl group Chemical group 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical compound ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229940110456 cocoa butter Drugs 0.000 description 1
- 235000019868 cocoa butter Nutrition 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000008120 corn starch Substances 0.000 description 1
- 229940099112 cornstarch Drugs 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- HCUYBXPSSCRKRF-UHFFFAOYSA-N diphosgene Chemical compound ClC(=O)OC(Cl)(Cl)Cl HCUYBXPSSCRKRF-UHFFFAOYSA-N 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- WMYNMYVRWWCRPS-UHFFFAOYSA-N ethynoxyethane Chemical group CCOC#C WMYNMYVRWWCRPS-UHFFFAOYSA-N 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229930195712 glutamate Natural products 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005935 hexyloxycarbonyl group Chemical group 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000008101 lactose Substances 0.000 description 1
- 235000015122 lemonade Nutrition 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 235000019359 magnesium stearate Nutrition 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical class CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- UHAAFJWANJYDIS-UHFFFAOYSA-N n,n'-diethylmethanediimine Chemical compound CCN=C=NCC UHAAFJWANJYDIS-UHFFFAOYSA-N 0.000 description 1
- JVHPKYBRJQNPAT-UHFFFAOYSA-N n-cyclohexyl-2,2-diphenylethenimine Chemical compound C1CCCCC1N=C=C(C=1C=CC=CC=1)C1=CC=CC=C1 JVHPKYBRJQNPAT-UHFFFAOYSA-N 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- JQPTYAILLJKUCY-UHFFFAOYSA-N palladium(ii) oxide Chemical compound [O-2].[Pd+2] JQPTYAILLJKUCY-UHFFFAOYSA-N 0.000 description 1
- 238000007911 parenteral administration Methods 0.000 description 1
- 230000001717 pathogenic effect Effects 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- RUPAXCPQAAOIPB-UHFFFAOYSA-N tert-butyl formate Chemical group CC(C)(C)OC=O RUPAXCPQAAOIPB-UHFFFAOYSA-N 0.000 description 1
- NYBWUHOMYZZKOR-UHFFFAOYSA-N tes-adt Chemical class C1=C2C(C#C[Si](CC)(CC)CC)=C(C=C3C(SC=C3)=C3)C3=C(C#C[Si](CC)(CC)CC)C2=CC2=C1SC=C2 NYBWUHOMYZZKOR-UHFFFAOYSA-N 0.000 description 1
- 230000001225 therapeutic effect Effects 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 238000011200 topical administration Methods 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Cephalosporin Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、高い抗菌活性を有する新規なセフエト化合
物に関するものであり医療の分肝で利用される。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a novel cefete compound having high antibacterial activity, and is used in medical fields.
「従来の技術]
セフェム化合物は数多く知られているが、この発明の下
記−数式[1]で示されるセフェム化合物は知られてい
ない。"Prior Art" Many cephem compounds are known, but the cephem compound represented by the following formula [1] of the present invention is not known.
[発明が解決しようとする課題]
抗菌活性を有し、医薬として有用なセフェム化合物は数
多く知られているが、この発明はさらに優れた医薬品の
開発を意図してなされたものである。[Problems to be Solved by the Invention] Many cephem compounds that have antibacterial activity and are useful as medicines are known, but this invention was made with the intention of developing even better medicines.
[課題を解決するための手段]
目的とするセフェム化合物およびその塩類は新規であり
、下記の一般式[1]で表すことができる。[Means for Solving the Problems] The target cephem compound and its salts are novel and can be represented by the following general formula [1].
「式中、R1はアミ7基または保護されたアミノ一
M、、R2はカルボキシ(低級)アルキル基または保護
されたカルボキシ(低級)アルキルノλ、R3はヒドロ
キシ(低級)アルキルノ、(、R4は低級アルカノイル
アミ7基またはカルバモイルアミノ2.r、、R5は水
素または低級アルキル基をそれぞれ意味する。]
目的化合物N]については下記の点に留意することが必
要である。すなわち、目的化合物[1]にはシン異性体
、アンチ異性体およびそれらの混合物が含まれる。シン
異性体とは、式:物はすべてこの発明の範囲内に包含さ
れる。"In the formula, R1 is an amine group or a protected amino group, R2 is a carboxy (lower) alkyl group or a protected carboxy (lower) alkyl group, R3 is a hydroxy (lower) alkyl group, (, R4 is a lower Alkanoylamino 7 group or carbamoylamino 2.r, R5 means hydrogen or a lower alkyl group, respectively.] Regarding target compound N], it is necessary to keep in mind the following points: Namely, target compound [1] includes syn isomers, anti isomers and mixtures thereof. Syn isomers are all of the formula: are included within the scope of this invention.
この明細書においては、これらの幾何異性体およびそれ
らの混合物の部分構造は便宜−に下記式で(式中、R1
およびR2はそれぞれ前と同じ意味)。In this specification, the partial structures of these geometric isomers and mixtures thereof are conveniently represented by the following formula (wherein R1
and R2 each have the same meaning as before).
留意すべきもう一つの点は、化合物[1]のピラゾリオ
部分は互変異性の形で存在することができ、そのような
互変異性平衝は下記式、で示すこと(式中、RIおよび
R’はそれぞれ前と同じ意味)で示される部分構造を有
する一つの幾何異性体をR2−0−N
(式中、RIおよびR2はそれぞれ前と同じ意味)で示
される部分構造を有する別の幾何異性体を意味し、その
ような幾何異性体およびそれらの混合(式中、R3R4
およびR’はそれぞれ前と同じ意味)。Another point to note is that the pyrazolio moiety of compound [1] can exist in a tautomeric form, and such tautomeric equilibrium is represented by the following formula, where RI and One geometric isomer having a partial structure represented as Geometric isomers and such geometric isomers and mixtures thereof (wherein R3R4
and R' each have the same meaning as before).
」1記互変異性はいずれもこの発明の範囲内に包含され
るが、この明細書においては、目的化合物「I]を便宜
上式(A)のビラゾリオ基の一つの表現で示すことにす
る。Although any of the tautomerisms mentioned above are included within the scope of the present invention, in this specification, the target compound "I" will be represented by one expression of the virazolio group of formula (A) for convenience.
この発明のセフェム化合物[+]は、下記反応式で示さ
れる製造法によって製造することができる。The cephem compound [+] of this invention can be produced by the production method shown by the following reaction formula.
またはその塩類
[■]
またはその塩類
十
[■コ
またはその塩類
↓
Nb]
またはその塩類
[式中、R’ R’ R3R’およびR5はそれぞ
れ前と同じ意味であり、
RAは保護されたカルボキシ(低級)アルキル基、RH
はカルボキシ(低級)アルキル基をそれぞれ意味する]
この明細書の以上および以下の記載において、この発明
の範囲内に包含される種々の定義の好適な例および説明
を以下詳細に説明する。or its salts [■] or its salts [■ or its salts ↓ Nb] or its salts [wherein, R'R'R3R' and R5 each have the same meaning as before, and RA is a protected carboxy ( lower) alkyl group, RH
each represents a carboxy(lower)alkyl group] In the above and following descriptions of this specification, preferred examples and explanations of various definitions included within the scope of this invention will be explained in detail below.
低級の語は、特にことわらない限り、lないし6個の炭
素原子を有する基を含むものとして用いる。The term lower is used, unless otherwise specified, to include groups having 1 to 6 carbon atoms.
「保護されたアミノ基」の好適な「保護基」としては、
例えばホルミル、アセチル、プロピオニル、ピバロイル
、ヘキサノイル等の低級アルカノイル基、例えばクロロ
アセチル、ブロモアセチル、ジクロロアセチル、トリフ
ルオロアセチル等のモノ(もしくはジもしくはトリ)ハ
ロ(低級)アルカノイル基、例えばメトキシカルボニル
、エトキシカルボニル、プロポキシカルボニル1、第三
級ブトキシカルボニル、第三級ペンチルオキシカルボニ
ル、ヘキシルオキシカルボニル等の低級アルコキシカル
ボニル基、カルバモイル基、例えばベンゾイル、トルオ
イル、ナフトイル等のアロイル基、例えばフェニルアセ
チル、フェニルプロピオニル等のアル(低級)アルカノ
イル基、例えばフェノキシカルボニル、ナフチルオキシ
カルボニル等のアリールオキシカルボニル基、例えばフ
ェノキンアセチル、75ノキンプロピオニル等のアリー
ルオキシ(低級)アルカノイル基、例えばフェニルグリ
オキシロイル、ナフチルグリオキシロイル等のアリール
グリオキンロイル基、例えばベンジルオキシカルボニル
、フェネチルオキシカルボニル、p−二トロベンジルオ
キシ力ルボニル等の、適当な置換基を有してもよいアル
(低級)アルコキシカルボニル基、例えばベンジリデン
、ヒドロキシベンジリデン等の置換されたまたは非置換
アル(低級)アルキリデン基、例えばベンジル、フェネ
チル、ベンズヒドリル、トリチル等のモノ(マたはジま
たはトリ)フェニル(低級)アルキル基のようなアル(
低級)アルキル基等が挙げられ、それらの中で好ましい
ものとしては、低級アルカメイル基またはカルバモイル
基、さらに好ましいものとしてはC1〜C4アルカノイ
ル基またはカルバモイル基が挙げられる。Suitable "protecting groups" for "protected amino groups" include:
Lower alkanoyl groups such as formyl, acetyl, propionyl, pivaloyl, hexanoyl, mono(or di or tri)halo(lower)alkanoyl groups such as chloroacetyl, bromoacetyl, dichloroacetyl, trifluoroacetyl, e.g. methoxycarbonyl, ethoxy Lower alkoxycarbonyl groups such as carbonyl, propoxycarbonyl 1, tertiary butoxycarbonyl, tertiary pentyloxycarbonyl, hexyloxycarbonyl, carbamoyl groups, such as aroyl groups such as benzoyl, toluoyl, naphthoyl, etc., such as phenylacetyl, phenylpropionyl, etc. Al(lower)alkanoyl groups such as phenoxycarbonyl, aryloxycarbonyl groups such as naphthyloxycarbonyl, aryloxy(lower)alkanoyl groups such as fenoquinacetyl, 75noquinepropionyl, such as phenylglyoxyloyl, naphthylglyoxy arylglyochineloyl groups such as loyl, for example benzyloxycarbonyl, phenethyloxycarbonyl, p-nitrobenzyloxycarbonyl, a(lower) alkoxycarbonyl group optionally having a suitable substituent, for example benzylidene; Substituted or unsubstituted al(lower)alkylidene groups such as hydroxybenzylidene, mono(ma- or di- or tri)phenyl(lower)alkyl groups such as benzyl, phenethyl, benzhydryl, trityl, etc.
(lower) alkyl groups, etc., and among them, preferred are lower alkameyl groups or carbamoyl groups, and more preferred are C1-C4 alkanoyl groups or carbamoyl groups.
好適な「低級アルキル基」、ならびに「カルボキシ(低
級)アルキル基j1 「保護されたカルボキシ(低級)
アルキル基および「ヒドロキシ(低級)アルキル基」の
好適な「低級アルキル部分」としては、メチル、エチル
、プロピル、イソプロピル、ブチル、イソブチル、第三
級ブチル、ペンチル、ヘキシル等のような直鎖アルキル
または分枝鎖アルキルが挙げられ、それらの中で好まし
いものとしてはC1〜C4アルキル基が挙げられる。Suitable "lower alkyl group" and "carboxy (lower) alkyl group j1 "protected carboxy (lower)
Preferred "lower alkyl moieties" of alkyl groups and "hydroxy (lower) alkyl groups" include straight chain alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, pentyl, hexyl, etc. Branched chain alkyl groups are mentioned, and preferred among them are C1-C4 alkyl groups.
「保護されたカルボキシ(低級)アルキル基」の好適な
「保護されたカルボキシ基」としては、エステル化され
たカルボキシ基が挙げられ、そのエステル化されたカル
ボキシ基のエステル部分の具体例としては、適当な置換
基を有していてもよい例えばメチルエステル、エチルエ
ステル、プロピルエステル、イソプロピルエステル、ブ
チルエステル、イソブチルエステル、第三級ブチルエス
テル、ペンチルエステル、第三級ペンチルエステル、ヘ
キシルエステル、1−シクロプロピルエステル等の低級
アルキルエステル、その例として、例えばアセトキシメ
チルエステル、プロピオニルオキシメチルエステル、ブ
チリルオキシメチルエステル、インブチリルオキシメチ
ルエステル、バレリルオキシメチルエステル、ピバロイ
ルオキシメチルエステル、1−アセトキシエチルエステ
ル、1−フロピオニルオキシエチルエステル、2−プロ
ピオニルオキシエチルエステル、ヘキサノイルオキシメ
チルエステル等の低級アルカノイルオキン(低級)アル
キルエステル、例えば2−メシルエチルエステル等の低
級アルカンスルホニル(低級)アルキルエステル、また
は例えば2−ヨードエチルエステル、2,2.21リク
ロロエチルエステル等のモノ(もしくはジもしくはトす
)ハロ(低級)アルキルエステル、;例えばビニルエス
テル、アリルエステル等の低級アルケニルエステル;例
えばエチニルエステル、プロピニルエステル等の低級ア
ルキニルエステル:例えばベンジルエステル、4−メト
キシベンジルエステル、4二l・ロベンジルエステル、
フェネチルエステル、トリチルエステル、ベンズヒドリ
ルエステル、ビ0
ス(3−メトキシフェニル)メチルエステル、3゜4−
ジメトキシベンジルエステル、4−ヒドロキシ−3,5
−ジ第三級ブチルベンジルエステル等の適当な置換基を
有していてもよいアル(低級)アルキルエステル;例え
ばフェニルエステル、4クロロフエニルエステル、トリ
ルエステル、4第三級プチルフ品ニルエステル、牛シリ
ルエステル、メシチルエステル、クメニルエステル等の
適当な置換基を有していてもよいアリールエステル等の
ようなものが挙げられる。Suitable "protected carboxy groups" of "protected carboxy (lower) alkyl groups" include esterified carboxy groups, and specific examples of the ester moieties of the esterified carboxy groups include: For example, methyl ester, ethyl ester, propyl ester, isopropyl ester, butyl ester, isobutyl ester, tertiary butyl ester, pentyl ester, tertiary pentyl ester, hexyl ester, 1- which may have an appropriate substituent. Lower alkyl esters such as cyclopropyl esters, such as acetoxymethyl ester, propionyloxymethyl ester, butyryloxymethyl ester, imbutyryloxymethyl ester, valeryloxymethyl ester, pivaloyloxymethyl ester, 1 -Lower alkanoyl ookine (lower) alkyl esters such as acetoxyethyl ester, 1-propionyloxyethyl ester, 2-propionyloxyethyl ester, hexanoyloxymethyl ester, lower alkanesulfonyl (lower) alkyl esters such as 2-mesylethyl ester, etc. lower) alkyl esters, or mono(or di- or tos)halo(lower) alkyl esters, such as e.g. 2-iodoethyl ester, 2,2.21-lichloroethyl ester; lower alkenyls, e.g. vinyl esters, allyl esters, etc. Esters; for example, lower alkynyl esters such as ethynyl ester and propynyl ester; for example, benzyl ester, 4-methoxybenzyl ester, 42l-lovenzyl ester,
Phenethyl ester, trityl ester, benzhydryl ester, bis(3-methoxyphenyl)methyl ester, 3゜4-
Dimethoxybenzyl ester, 4-hydroxy-3,5
- Al (lower) alkyl esters which may have suitable substituents such as di-tertiary butyl benzyl ester; e.g. phenyl ester, 4-chlorophenyl ester, tolyl ester, 4-tertiary butyl benzyl ester, bovine silyl Examples include aryl esters which may have appropriate substituents such as esters, mesityl esters, and cumenyl esters.
目的化合物[1]の適当な塩類としては、医薬上許容さ
れる塩類、特に慣用される非毒性塩が含まれ、例えばナ
トリウム塩、カリウム塩等のアルカリ金属塩および例え
ばカルシウム塩、マグネシウム塩等のアルカリ土類金属
塩のような金属塩、アンモニウム塩、例えばトリエチル
アミン塩、ピリジン塩、ビフリン塩、ジシクロヘキシル
アミン塩、N、N’ −ジベンジルエチレンジアミン塩
等の有機塩機塩、例えば塩酸塩、臭化水素酸塩、硫酸塩
、燐酸塩等の無機酸塩、例えばぎ酸塩、酢酸塩、トリフ
ルオロ酢酸塩、マレイン酸塩、酒石酸塩、メタンスルホ
ン酸塩、ヘンゼンスルホン酸塩、1) −)ルエンスル
ホン酸塩等の有機酸塩、アルギニン塩、アスパラギン酸
塩、グルタミン酸塩等のアミノ酸との塩類が挙げられる
。Suitable salts of the target compound [1] include pharmaceutically acceptable salts, especially commonly used non-toxic salts, such as alkali metal salts such as sodium salts and potassium salts, and calcium salts and magnesium salts. Metal salts such as alkaline earth metal salts, ammonium salts such as triethylamine salts, pyridine salts, bifrin salts, dicyclohexylamine salts, organic salts such as N,N'-dibenzylethylenediamine salts, such as hydrochlorides, bromide salts, etc. Inorganic acid salts such as hydroxides, sulfates, phosphates, such as formates, acetates, trifluoroacetates, maleates, tartrates, methanesulfonates, Hensensulfonates, 1) -) Examples include organic acid salts such as luenesulfonate, salts with amino acids such as arginine salt, aspartate, and glutamate.
目的化合物[1]の好ましい実施態様は下記のとおりで
ある。Preferred embodiments of the target compound [1] are as follows.
R1の好ましい実施態様はアミ7基、
R2の好ましい実施態様はカルボキン(低級)アルキル
基[さらに好ましくはカルボキシ(C。A preferred embodiment of R1 is an ami7 group, and a preferred embodiment of R2 is a carboxyl (lower) alkyl group [more preferably a carboxy (C) group.
〜C4)アルキル基、最も好ましくはカルボキシメチル
基または1−カルボキシ−1−メチルエチル基]または
エステル化されたカルボキシ(低級)アルキル基「さら
に好ましくは低級アルコキシカルボニル(低級)アルキ
ル基、最も好ましくは低級アルコキシカルボニル(01
〜C4)アルキル基]R3の好ましい実施態様はヒドロ
キシ(C,〜C4)アルキル基、さらに好ましくはヒド
ロキシエチル基]、
R4の好ましい実施態様は低級アルカノイルアミノ基ま
たはカルバモイルアミノ21(、R’の好ましい実施態
様は水素または(C,〜C4)アルキル基「さらに好ま
しくはメチル基コである。~C4) an alkyl group, most preferably a carboxymethyl group or a 1-carboxy-1-methylethyl group] or an esterified carboxy(lower)alkyl group, more preferably a lower alkoxycarbonyl(lower)alkyl group, most preferably a Lower alkoxycarbonyl (01
~C4) alkyl group] A preferred embodiment of R3 is a hydroxy (C, ~C4) alkyl group, more preferably a hydroxyethyl group], a preferred embodiment of R4 is a lower alkanoylamino group or carbamoylamino 21 (a preferred embodiment of R') Embodiments include hydrogen or a (C, to C4) alkyl group, more preferably a methyl group.
目的化合物[1]の製造法を以下詳細に説明する。The method for producing the target compound [1] will be explained in detail below.
製造法1
目的化合物[+]またはその塩類は、化合物〔■]また
はその塩類を、化合物[IrI]またはまたはその塩類
と反応させることにより製造することができる。Production method 1 The target compound [+] or its salts can be produced by reacting the compound [■] or its salts with the compound [IrI] or its salts.
化合物[11]および[III]の好適な塩類としては
、化合物[1]について例示したものを挙げる事ができ
る。Suitable salts for compounds [11] and [III] include those exemplified for compound [1].
反応は通常、水、例えばメタノール、エタノール等のア
ルコール、アセトン、ジオキサン、アセトニトリル、ク
ロロホルム、塩化メチレン、塩化エチレン、テトラヒド
ロフラン、酢酸エチル、NlN−ジメチルホルムアミド
、ピリジンのような常用の溶媒中で行われるが、反応に
悪影響を及ぼさない溶媒であればその他のいかなる有機
溶媒中でも反応を行うことができる。これらの常用の溶
媒は水との混合物として使用してもよい。The reaction is usually carried out in conventional solvents such as water, alcohols such as methanol, ethanol, acetone, dioxane, acetonitrile, chloroform, methylene chloride, ethylene chloride, tetrahydrofuran, ethyl acetate, NlN-dimethylformamide, pyridine, etc. The reaction can be carried out in any other organic solvent as long as it does not adversely affect the reaction. These conventional solvents may be used in mixtures with water.
この反応において化合物[]Tl]を遊離の形またはそ
の塩の形で使用する場合には、N、N’ −ジシクロへ
キシルカルボジイミド・N−シクロヘキシル−N′−モ
ルホリノエチルカルボジイミド;N−7クロヘキシルー
N” −(4−ジエチルアミノシクロヘキシル)カルボ
ジイミド;N、N″ジエチルカルボジイミドN、N“
−ジイソプロピルカルボジイミド;N−エチル−N’−
(3ジメチルアミノプロピル)カルボジイミド;NlN
゛ −カルボニルビス−(2−メチルイミダゾール);
ペンタメチレンケテン−N−シクロヘキシルイミン°ジ
フェニルケテン−N−シクロヘキシルイミン;エトキシ
アセチレン;1−アルコキシル1−クロロエチレン;亜
燐酸トリアルキル;ポリ燐酸イソプロピル;オキシ塩化
燐(塩化ホスホリル);三塩化燐:塩化チオニル;塩化
オキサリ3
4
ル;例えばクロロギ酸エチル、クロロギ酸イソプロヒル
等のハロギ酸低級アルキル;l・ジフェニルホスフィン
;2−エチル−7−ヒドロキシベンズイソオキサゾリウ
ム塩;2−エチル−5−(mスルホフェニル)インオキ
サシリウムヒドロキシド・分子内塩;I−(p−クロロ
ベンゼンスルホニルオキシ)−6−クロロ−] ]H−
ベン7’l−リアゾール;N、N−ジメチルホルムアミ
ドと塩化チオニル、ホスゲン、クロロギ酸トリクロロメ
チル、オキシ塩化燐等との反応によって調製されるいわ
ゆるビルスマイヤー試薬等のような常用の縮合剤の存在
下に反応を行うのが好ましい。When the compound []Tl] is used in the free form or its salt form in this reaction, N,N'-dicyclohexylcarbodiimide/N-cyclohexyl-N'-morpholinoethylcarbodiimide; N-7chlorohexyl-N "-(4-diethylaminocyclohexyl)carbodiimide; N, N"diethylcarbodiimide N, N"
-diisopropylcarbodiimide; N-ethyl-N'-
(3dimethylaminopropyl)carbodiimide; NlN
゛ -Carbonylbis-(2-methylimidazole);
Pentamethyleneketene-N-cyclohexylimine ° diphenylketene-N-cyclohexylimine; Ethoxyacetylene; 1-Alkoxyl-1-chloroethylene; Trialkyl phosphite; Isopropyl polyphosphate; Phosphorus oxychloride (phosphoryl chloride); Phosphorus trichloride: Chloride thionyl; oxalyl chloride; lower alkyl haloformate such as ethyl chloroformate, isoproyl chloroformate; l-diphenylphosphine; 2-ethyl-7-hydroxybenzisoxazolium salt; 2-ethyl-5-(m sulfophenyl)inoxacillium hydroxide inner salt; I-(p-chlorobenzenesulfonyloxy)-6-chloro-] ]H-
Ben7'l-lyazole; prepared by the reaction of N,N-dimethylformamide with thionyl chloride, phosgene, trichloromethyl chloroformate, phosphorous oxychloride, etc. in the presence of a conventional condensing agent such as the so-called Vilsmeier's reagent, etc. It is preferable to carry out the reaction.
反応はまたアルカル金属炭酸水素塩、トリ(低級)アル
キルアミン、ピリジン、N−(低級)アルキルモルホリ
ン、N、N−ジ(低級)アルキルベンジルアミン等のよ
うな無機塩基または有機塩基の存在下に反応を行っても
よい。The reaction can also be carried out in the presence of inorganic or organic bases such as alkali metal bicarbonates, tri(lower)alkylamines, pyridine, N-(lower)alkylmorpholines, N,N-di(lower)alkylbenzylamines, etc. A reaction may also be carried out.
反応温度は特に限定されないが、通常は冷却下ないし加
温下に反応が行われる。Although the reaction temperature is not particularly limited, the reaction is usually carried out under cooling or heating.
製造法2
目的化合物[1b]またはその塩類は、化合物[1a]
またはその塩類を、R4およびR5におけるカルボキシ
保接基の脱離反応に付すことにより製造することができ
る。Production method 2 Target compound [1b] or its salt is compound [1a]
or its salts can be produced by subjecting it to an elimination reaction of the carboxy covalent group at R4 and R5.
この反応は加水分解、還元等のような慣用の方法により
行うことができる。This reaction can be carried out by conventional methods such as hydrolysis, reduction, etc.
加水分解は塩基、または酸(ルイス酸も含む)の存在下
に行うのが好ましい。好適な塩基としては、例えばすト
リウム、カリウム等のアルカリ金属、例えばマグネシウ
ム、カルシウム等のアルカリ土金属、それらの水酸化物
または炭酸塩または炭酸水素塩、例えば(・リメチルア
ミン、トリエチルアミン等のトリアルキルアミン、ピコ
リン、1゜5−ジアザビシクロ[4,3,0]ノン−5
−エン、I、4−ジアザビシクロ[2,2,2]オクタ
ン、1,8−ジアザビシクロ[5,4,0] ウンデク
−7−エン等のような無機塩基および有機塩基が挙げら
れる。Hydrolysis is preferably carried out in the presence of a base or an acid (including a Lewis acid). Suitable bases include, for example, alkali metals such as thorium and potassium; alkaline earth metals such as magnesium and calcium; hydroxides or carbonates or bicarbonates thereof; , picoline, 1°5-diazabicyclo[4,3,0]non-5
Inorganic and organic bases such as -ene, I,4-diazabicyclo[2,2,2]octane, 1,8-diazabicyclo[5,4,0]undec-7-ene, and the like.
好適な酸としては、例えばギ酸、酢酸、プロピオン酸、
I・リクロロ酢酸、j・リフルオロ酢酸等の有機酸およ
び例えば塩酸、臭化水素酸、硫酸、塩化水素、臭化水素
等の無機酸が挙げられる。Suitable acids include, for example, formic acid, acetic acid, propionic acid,
Examples include organic acids such as I.lichloroacetic acid and J.lifluoroacetic acid, and inorganic acids such as hydrochloric acid, hydrobromic acid, sulfuric acid, hydrogen chloride, and hydrogen bromide.
例えば、トリクロロ酢酸、トリフルオロ酢酸等のトリハ
ロ酢酸等のようなルイス酸を使用する脱離は、例えばア
ニソール、フェノール等の陽イオン捕捉剤の存在下に行
うのが好ましい。For example, desorption using a Lewis acid such as a trihaloacetic acid such as trichloroacetic acid, trifluoroacetic acid, etc. is preferably carried out in the presence of a cation scavenger such as anisole, phenol, etc.
反応は通常、水、例えばメタノール、エタノール等のア
ルコール、塩化メチレン、テトラヒドロフランのような
溶媒中またはそれらの混合物中で行われるが、反応に悪
影響を及ぼさない溶媒であればその他のいかなる溶媒中
でも反応を行うことができる。液状の塩基または酸も溶
媒として使用することができる。The reaction is usually carried out in a solvent such as water, an alcohol such as methanol or ethanol, methylene chloride, tetrahydrofuran, or a mixture thereof, but the reaction may be carried out in any other solvent that does not adversely affect the reaction. It can be carried out. Liquid bases or acids can also be used as solvents.
反応温度は特に限定されないが、通常は冷却下ないし加
温下に反応が行われる。Although the reaction temperature is not particularly limited, the reaction is usually carried out under cooling or heating.
この脱離反応に適用されうる還元法としては化学的還元
および接触還元が挙げられる。Reduction methods that can be applied to this elimination reaction include chemical reduction and catalytic reduction.
化学的還元に使用される好適な還元剤は、例えばスズ、
亜鉛、鉄等の金属または例えば塩化クロム、酢酸クロム
等の金属化合物と、例えばギ酸、酢酸、プロピオン酸、
トリフルオロ酢酸、p−トルエンスルホン酸、塩酸、臭
化水素酸等の有機酸または無機酸との組合わせである。Suitable reducing agents used for chemical reduction include, for example, tin,
Metals such as zinc and iron or metal compounds such as chromium chloride and chromium acetate, and formic acid, acetic acid, propionic acid,
It is a combination with an organic or inorganic acid such as trifluoroacetic acid, p-toluenesulfonic acid, hydrochloric acid, or hydrobromic acid.
接触還元に使用される好適な触媒は、例えば白金板、白
金海綿、白金黒、コロイド白金、酸化白金、白金線等の
白金触媒、例えばパラジウム海綿、パラジウム黒、酸化
パラジウム、パラジウム−炭素、コロイドパラジウム、
パラジウム−硫酸バリウム、パラジウム−炭酸バリウム
等のパラジウム触媒、例えば還元ニッケル、酸化ニッケ
ル、ラネニッケル等のニッケル触媒、例えば還元コバル
ト、ラネーコバルト等のコバルト触媒、例えば還元鉄、
ラネー鉄等の鉄触媒、例えば還元銅、ラネ銅、ウルマン
銅等の銅触媒等のような常用のものである。Suitable catalysts used for catalytic reduction are platinum catalysts such as platinum plates, platinum sponges, platinum black, colloidal platinum, platinum oxide, platinum wires, e.g. palladium sponges, palladium black, palladium oxide, palladium-carbon, colloidal palladium. ,
Palladium catalysts such as palladium-barium sulfate and palladium-barium carbonate; nickel catalysts such as reduced nickel, nickel oxide, and Raney nickel; cobalt catalysts such as reduced cobalt and Raney cobalt; reduced iron;
Commonly used iron catalysts such as Raney iron, copper catalysts such as reduced copper, Raney copper, Ullmann copper, and the like.
還元は通常、水、メタノール、エタノール、プロパツー
ル、N、N−ジメチルホルムアミドのような反応に悪影
響を及ぼさない慣用の溶媒中、またはそれらの混合物中
で行われる。The reduction is usually carried out in conventional solvents that do not adversely affect the reaction, such as water, methanol, ethanol, propatool, N,N-dimethylformamide, or mixtures thereof.
さらに、化学的還元に使用される上記酸が溶液7
=18
である場合にはそれらも溶媒として使用することができ
る。さらに、接触還元に使用される好適な溶媒としては
、上記溶媒のほか、ジエチルエーテル、ジオキガン、テ
トラヒドロフラン等のような慣用の溶媒またはそれらの
混合物が挙げられる。Furthermore, if the acids used in the chemical reduction are in solution 7 = 18 they can also be used as solvents. Further, suitable solvents used in the catalytic reduction include, in addition to the above-mentioned solvents, conventional solvents such as diethyl ether, diokigan, tetrahydrofuran, etc., or mixtures thereof.
この還元の反応温度は特に限定されないが、通常は冷却
下ないし加温下に反応が行われる。The reaction temperature for this reduction is not particularly limited, but the reaction is usually carried out under cooling or heating.
治療を目的として投与するために、この発明の目的化合
物[1]およびその塩は、経口投与、非経口投与および
外用投与に適した有機もしくは無機固体状もしくは液状
賦形剤のような医薬として許容される担体と混合して、
前記化合物を有効成分として含有する慣用の医薬製剤の
形で使用することができる。To be administered for therapeutic purposes, the object compound [1] of the present invention and its salts may be prepared in pharmaceutically acceptable organic or inorganic solid or liquid excipients suitable for oral, parenteral and topical administration. mixed with a carrier to be
The compounds can be used in the form of customary pharmaceutical preparations containing them as active ingredients.
医薬製剤はカプセル、錠剤、顆粒、粉末のような固体状
であっても、溶液、懸濁液、シロップ、エマルジョン、
レモネード等のような液状であってもよい。Pharmaceutical preparations may be in solid form such as capsules, tablets, granules, or powders, solutions, suspensions, syrups, emulsions,
It may be in liquid form such as lemonade.
必要に応じて上記製剤中に、助剤、安定剤、湿潤剤およ
びその他の通常使用される乳糖、クエン酸、酒石酸、ス
テアリン酸、ステアリン酸マグネシウム、白土、蔗糖、
コーンスターチ、タルク、ゼラチン、寒天、ペクチン、
落下生部、オリーブAb、カカオ脂、エチレングリコー
ル等のような添加剤がふくまれていてもよい。If necessary, auxiliary agents, stabilizers, wetting agents and other commonly used lactose, citric acid, tartaric acid, stearic acid, magnesium stearate, terra alba, sucrose,
Cornstarch, talc, gelatin, agar, pectin,
Additives such as droplets, olive Ab, cocoa butter, ethylene glycol, etc. may be included.
化合物「1]の投与量は患者の年令、条件、疾患の種類
、適用する化合物の種類等によって変化する。一般的に
は患者に1日当りI mg〜約4000■の量もしくは
それ以上投与すればよい。この発明の目的化合物N]は
病原菌感染症治療に平均1回投与量約50mg、]00
0mg250 mg、500mg、1000mg、20
00 mgを使用すればよい。The dosage of compound "1" varies depending on the patient's age, condition, type of disease, type of compound to be applied, etc. Generally, the dose of compound "1" is administered to the patient in an amount of I mg to about 4000 μg per day or more. The object compound N of the present invention is administered at an average dose of about 50 mg for the treatment of pathogenic bacterial infections.
0mg250mg, 500mg, 1000mg, 20
00 mg may be used.
以下実施例に従ってこの発明をさらに詳細に説明する。The present invention will be described in more detail below with reference to Examples.
実施例1
7β−アミノ−3−[3−カルバモイルアミノ−2−(
2−ヒドロキシエチル)−1−ビラゾワオコメチルー3
−セフェム−4−カルボキシラード・二塩酸塩(0,6
g)とN−トリメチルシリルアセトアミド(1,73g
)の塩化メチレン(12+nf)溶液に、水冷下で撹拌
しなから2−(5−アミノ−1,2,4チアジアゾール
−3−イル)−2−(+−カルボキシ−1−メチルエト
キシイミノ)酢酸メタンスルホン酸無水物ニル(シン異
性体) (0,557g)を加える。室温で2時間撹
拌後、反応混合物をジエチルエーテル(240d )中
に注ぐ。生成する沈澱を濾取し、乾燥する。得られた粉
末を水(30+d )に溶解して、IN塩酸でpH2、
Oに調整する。この溶液を非イオン性吸着樹脂「ダイヤ
イオンHP2O」(商標二三菱化成社製)を使用するカ
ラムクロマトグラフィーに付し、10%イソプロピルア
ルコール水溶液で溶出する。目的物を含む画分を集め、
減圧下イソプロピルアルコールを留去し、次いで凍結乾
燥して、7β−[2−(5−アミノ−]。Example 1 7β-amino-3-[3-carbamoylamino-2-(
2-Hydroxyethyl)-1-virazowaokomethyl-3
-cephem-4-carboxilade dihydrochloride (0,6
g) and N-trimethylsilylacetamide (1,73 g
) in methylene chloride (12+nf) while stirring under water cooling, add 2-(5-amino-1,2,4thiadiazol-3-yl)-2-(+-carboxy-1-methylethoxyimino)acetic acid. Add methanesulfonic anhydride (syn isomer) (0,557 g). After stirring for 2 hours at room temperature, the reaction mixture is poured into diethyl ether (240d). The precipitate formed is filtered and dried. The obtained powder was dissolved in water (30+d) and adjusted to pH 2 with IN hydrochloric acid.
Adjust to O. This solution is subjected to column chromatography using a nonionic adsorption resin "Diaion HP2O" (trade name, manufactured by Mitsubishi Kasei Co., Ltd.) and eluted with a 10% aqueous isopropyl alcohol solution. Collect fractions containing the target product,
The isopropyl alcohol was distilled off under reduced pressure and then lyophilized to give 7β-[2-(5-amino-]).
2.4−チアジアゾール−3−イル)−2−(1−カル
ボキシ−1−メチルエトキシイミノ)アセトアミトコ−
3−「3−カルバモイルアミノ−2−(2−ヒドロキシ
エチル)−1−ビラグリオコメチル−3セフエム−4−
カルボキシラード(シン異性体)(0,IQ8rr、
)を得る。2.4-thiadiazol-3-yl)-2-(1-carboxy-1-methylethoxyimino)acetamitoco-
3-'3-carbamoylamino-2-(2-hydroxyethyl)-1-bilagliocomethyl-3cephem-4-
Carboxilad (syn isomer) (0, IQ8rr,
).
I R(ヌジコール i−’): 1770,15
7ON M R(D、O,δ): 1.60(s、
611)、 3. l0and3.50(ABq、 2
11J=+81k)、 3.90(t、 211. J
=61k)、 4.50〜4.70(m、2H)。IR (nudicol i-'): 1770,15
7ON M R (D, O, δ): 1.60 (s,
611), 3. l0and3.50(ABq, 2
11J=+81k), 3.90(t, 211.J
=61k), 4.50-4.70 (m, 2H).
5、25(d、 1.H,J=51k)、 5.34(
brs、 2)1)、 5.86(d、 1.!LJ・
s+h)、 s、 a5(d、 u+、 、+−a+b
)、 s、15(d、 III、 J・3ル)実施例2
7β−アミノ−3−[3−アセトアミド−2−(2−ア
セトキシエチル、)−1−ビラゾリオ]メチル3−セフ
ェム−4−カルボキシラードのジ(トリフルオロ酢酸)
塩<1.0g>とN−トリメチルシリルアセトアミド<
2.01rc)の塩化メチレン(2〇−)溶液に、水冷
下で撹拌しなから2−(5−アミノ−1,2,4−チア
ジアゾール−3−イル) −2−<1−力ルボキシ−
1−メチルエトキシイミノ)酢酸メタンスルホン酸無水
物(シン異性体) (0,85g)を加える。室温で
2時間撹拌後、反応混合物をジエチルエーテル(240
mg)中に注ぐ。生成する沈澱を濾取し、乾燥する。得
られた粉末を水(30mj2)に溶解する。IN水酸化
ナトリウム水溶液でp H1−
22−
I3に調整し、水冷下で2時間撹拌する。この溶液をI
N塩酸でp H2に調整し、非イオン性吸着樹脂「ダイ
ヤイオンI P−20J (商標二三菱化成社製)を
使用するカラムクロマトグラフィーに付し、10%イソ
プロピルアルコール水溶液で溶出する。5, 25 (d, 1.H, J=51k), 5.34 (
brs, 2)1), 5.86(d, 1.!LJ・
s+h), s, a5(d, u+, , +-a+b
), s, 15(d, III, J.3) Example 2 7β-amino-3-[3-acetamido-2-(2-acetoxyethyl,)-1-virazolio]methyl 3-cephem-4- Carboxilade di(trifluoroacetic acid)
Salt <1.0g> and N-trimethylsilylacetamide <
2-(5-amino-1,2,4-thiadiazol-3-yl)-2-<1-carboxy-
Add 1-methylethoxyimino)acetic acid methanesulfonic anhydride (syn isomer) (0.85 g). After stirring at room temperature for 2 hours, the reaction mixture was diluted with diethyl ether (240
mg). The precipitate formed is filtered and dried. The powder obtained is dissolved in water (30 mj2). The pH was adjusted to 1-22-13 with IN aqueous sodium hydroxide solution and stirred for 2 hours under water cooling. This solution is
The pH was adjusted to 2 with N-hydrochloric acid, and the mixture was subjected to column chromatography using a nonionic adsorption resin "Diaion IP-20J (trade name, manufactured by Mitsubishi Kasei Corporation)" and eluted with a 10% aqueous isopropyl alcohol solution.
目的物を含む画分を集め、減圧下イソプロピルアルコー
ルを留去し、次いで凍結乾燥して、7β[2−(5−ア
ミノ−1,2,4−チアジアゾール−3イル)−2−(
1−カルボキシ−I−メチルエトキシイミノ)アセトア
ミド] −1[3−アセチルアミノ−2−(2−ヒドロ
キシエチル)−1−ビラゾリオ]メチルー3−セフェム
−4−カルボキシラード(シン異性体)(0,15g)
を得る。Fractions containing the target product were collected, the isopropyl alcohol was distilled off under reduced pressure, and then lyophilized to give 7β[2-(5-amino-1,2,4-thiadiazol-3yl)-2-(
1-carboxy-I-methylethoxyimino)acetamide]-1[3-acetylamino-2-(2-hydroxyethyl)-1-virazolio]methyl-3-cephem-4-carboxilade (syn isomer) (0, 15g)
get.
IR(ヌジゴール a−’): 1770.156O
N M R,(D20.δ) :1.53(s、 6H
)、 2.26(s、 311)、 3.13and3
、50(ABQ、 2H,18ル)、 3.86(t、
2+1. J=61k)、 4.50〜4、70(m
、 2B)、 5.20〜5.50(m、 2H)、
5.25(d、 [1゜J=!J)、 5.84(d、
1)1. J=5ル)、 6.92(d、 IIL
J=31k)。IR (nujigor a-'): 1770.156O
NMR, (D20.δ): 1.53(s, 6H
), 2.26(s, 311), 3.13and3
, 50 (ABQ, 2H, 18ru), 3.86 (t,
2+1. J=61k), 4.50~4,70(m
, 2B), 5.20-5.50 (m, 2H),
5.25(d, [1°J=!J), 5.84(d,
1)1. J=5le), 6.92(d, IIL
J=31k).
8、16(d、 III、 J=3k)実施例3
7β−アミノ 3−[3−ホルムアミド−4−メチル−
1(2−ホルミルオキンエチル)−1−ビラゾリオ]メ
チルー3−セフェム−4−カルボキシラードのジ(トリ
フルオロ酢酸)塩(1,0g)およびN−トリメチルン
リルアセトアミド(2,06g)の塩化メチレン(20
+n1)溶液に、水冷下、2−(5アミノ−1,2,4
−チアジアゾール−3−イル)2−(1−カルホキシー
1−メチルエトキシイミノ)酢酸メタンスルホン酸無水
物(シン異性体)(0゜66g)を加える。室温で1時
間撹拌後、反応化合物をジエチルエーテル(200mf
f)中へ注ぎ、析出する粉末を濾取する。この粉末を水
(2On+N )に注ぎ、溶液を水冷下IN水酸化ナト
リウム水溶液にてpH12に調整し、同温にて10分間
撹拌した後、IN塩酸でr) H7に調整する。この溶
液を非イオン性吸着樹脂「ダイヤイオンHP −20J
(商ti +三菱化成社製)を使用するカラムクロ
マトグラフィーに付し、水で溶出する。目的物を含む画
分を集め、IN塩酸にてp1]2に調整し、非イオン性
吸着樹脂「ダイヤイオンHP−20J(商標:三菱化成
社製)を使用するカラムクロマトグラフィーに付し、水
(300m&)で洗浄後、7.5%イソプロピルアルコ
ール水溶液で溶出し、目的物を含む画分を集め、減圧下
インプロピルアルコールを留去シ、次いで凍結乾燥して
、7β−[2−(5−アミノ−12,4−チアジアゾー
ル−3−イル) −2−(1−カルボキシ−I−メチル
エトキシイミノ)アセトアミド]−:(−[3−ホルミ
ルアミノ−4−メチル−2(2−ヒドロキシエチル)−
1−ビラゾリオ]メチルー3−セフェム−4−カルボキ
シラード(シン異性体) (o、2g8g)を得る。8, 16 (d, III, J=3k) Example 3 7β-amino 3-[3-formamido-4-methyl-
Di(trifluoroacetic acid) salt of 1(2-formyluochynethyl)-1-virazolio]methyl-3-cephem-4-carboxilade (1,0 g) and N-trimethylnrylacetamide (2,06 g) in methylene chloride (20
+n1) solution under water cooling, add 2-(5 amino-1,2,4
-Thiadiazol-3-yl)2-(1-carboxy-1-methylethoxyimino)acetic acid methanesulfonic anhydride (syn isomer) (0°66 g) is added. After stirring for 1 hour at room temperature, the reaction compound was dissolved in diethyl ether (200 mf
f) Pour into the container and filter the precipitated powder. This powder is poured into water (2On+N), and the solution is adjusted to pH 12 with an IN aqueous solution of sodium hydroxide under water cooling, stirred for 10 minutes at the same temperature, and then adjusted to r) H7 with IN hydrochloric acid. This solution was added to the nonionic adsorption resin “Diaion HP-20J”.
The resultant mixture was subjected to column chromatography using commercial ti + manufactured by Mitsubishi Kasei Co., Ltd., and eluted with water. Fractions containing the target product were collected, adjusted to p1]2 with IN hydrochloric acid, and subjected to column chromatography using a nonionic adsorption resin "Diaion HP-20J (trademark: manufactured by Mitsubishi Chemical Corporation). After washing with (300 m&), it was eluted with a 7.5% isopropyl alcohol aqueous solution, the fractions containing the target product were collected, the inpropyl alcohol was distilled off under reduced pressure, and then lyophilized. -amino-12,4-thiadiazol-3-yl) -2-(1-carboxy-I-methylethoxyimino)acetamide]-:(-[3-formylamino-4-methyl-2(2-hydroxyethyl) −
1-virazolio]methyl-3-cephem-4-carboxilade (syn isomer) (o, 2g, 8g) is obtained.
Claims (1)
R^2はカルボキシ(低級)アルキル基または保護され
たカルボキシ(低級)アルキル基、R^3はヒドロキシ
(低級)アルキル基、R^4は低級アルカノイルアミノ
基またはカルバモイルアミノ基、R^5は水素または低
級アルキル基をそれぞれ意味する。] で示される新規セフェム化合物およびその塩類。[Claims] General formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R^1 is an amino group or a protected amino group,
R^2 is a carboxy (lower) alkyl group or a protected carboxy (lower) alkyl group, R^3 is a hydroxy (lower) alkyl group, R^4 is a lower alkanoylamino group or carbamoylamino group, R^5 is hydrogen or a lower alkyl group, respectively. ] A novel cephem compound and its salts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5323390A JPH03255087A (en) | 1990-03-05 | 1990-03-05 | Novel cephem compound and its salt |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5323390A JPH03255087A (en) | 1990-03-05 | 1990-03-05 | Novel cephem compound and its salt |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03255087A true JPH03255087A (en) | 1991-11-13 |
Family
ID=12937094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5323390A Pending JPH03255087A (en) | 1990-03-05 | 1990-03-05 | Novel cephem compound and its salt |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03255087A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007505895A (en) * | 2003-09-18 | 2007-03-15 | アステラス製薬株式会社 | Cephem compound |
-
1990
- 1990-03-05 JP JP5323390A patent/JPH03255087A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007505895A (en) * | 2003-09-18 | 2007-03-15 | アステラス製薬株式会社 | Cephem compound |
JP4643577B2 (en) * | 2003-09-18 | 2011-03-02 | アステラス製薬株式会社 | Cephem compound |
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