JPH0226229U - - Google Patents
Info
- Publication number
- JPH0226229U JPH0226229U JP10320488U JP10320488U JPH0226229U JP H0226229 U JPH0226229 U JP H0226229U JP 10320488 U JP10320488 U JP 10320488U JP 10320488 U JP10320488 U JP 10320488U JP H0226229 U JPH0226229 U JP H0226229U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- plasma
- cleaning process
- measurement means
- transmission section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000004886 process control Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図及び第２図は本考案に係る一実施例を示
すもので、第１図は構成図、第２図はプラズマ処
理時間と発光強度との特性図である。
１……反応室、２……アノード電極、３……カ
ソード電極、４……高周波電源、５……試料、６
……ガス導入口、７……ガス排気口、８……透過
窓、９……光検出器、１０……信号処理装置、１
１……判定回路、１２……クリーニング処理制御
ユニツト。
FIGS. 1 and 2 show an embodiment of the present invention, with FIG. 1 being a configuration diagram and FIG. 2 being a characteristic diagram of plasma processing time and emission intensity. DESCRIPTION OF SYMBOLS 1... Reaction chamber, 2... Anode electrode, 3... Cathode electrode, 4... High frequency power supply, 5... Sample, 6
...Gas inlet, 7...Gas exhaust port, 8...Transmission window, 9...Photodetector, 10...Signal processing device, 1
1... Judgment circuit, 12... Cleaning processing control unit.
Claims (1)
外部に上記プラズマ処理におけるプラズマ発光を
透過するための透過部を有する反応室と、 上記透過部を透過する上記プラズマ発光の透過
光の強度変化を測定する測定手段と、 該測定手段からの信号により、上記反応室内の
クリーニング処理の開始及び終了時期を判断する
判定回路と、 該判定回路の判定信号により、上記反応室内の
クリーニング処理を制御するクリーニング処理制
御ユニツトとを具備したことを特徴とするプラズ
マ処理装置。[Scope of claim for utility model registration] In addition to performing plasma processing on wafers internally,
a reaction chamber externally having a transmission section for transmitting the plasma emission in the plasma processing; a measurement means for measuring the intensity change of the transmitted light of the plasma emission transmitted through the transmission section; and a signal from the measurement means. , a plasma comprising: a determination circuit that determines when to start and end a cleaning process in the reaction chamber; and a cleaning process control unit that controls the cleaning process in the reaction chamber based on a determination signal from the determination circuit. Processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10320488U JPH0226229U (en) | 1988-08-05 | 1988-08-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10320488U JPH0226229U (en) | 1988-08-05 | 1988-08-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0226229U true JPH0226229U (en) | 1990-02-21 |
Family
ID=31333814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10320488U Pending JPH0226229U (en) | 1988-08-05 | 1988-08-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0226229U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0805481A2 (en) * | 1990-08-29 | 1997-11-05 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
| JP2014045113A (en) * | 2012-08-28 | 2014-03-13 | Shimadzu Corp | Endpoint detector |
-
1988
- 1988-08-05 JP JP10320488U patent/JPH0226229U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0805481A2 (en) * | 1990-08-29 | 1997-11-05 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
| EP0805481B1 (en) * | 1990-08-29 | 2006-06-21 | Hitachi, Ltd. | Operating method for vacuum processing apparatus |
| JP2014045113A (en) * | 2012-08-28 | 2014-03-13 | Shimadzu Corp | Endpoint detector |
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