JP6767661B2 - Gray tones low emissivity glass - Google Patents
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- 239000005344 low-emissivity glass Substances 0.000 title claims description 35
- 239000010408 film Substances 0.000 claims description 155
- 239000011521 glass Substances 0.000 claims description 85
- 230000031700 light absorption Effects 0.000 claims description 83
- 230000004888 barrier function Effects 0.000 claims description 27
- 238000002834 transmittance Methods 0.000 claims description 19
- 239000012788 optical film Substances 0.000 claims description 12
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 7
- 229910001120 nichrome Inorganic materials 0.000 claims description 7
- 239000010935 stainless steel Substances 0.000 claims description 7
- 229910001220 stainless steel Inorganic materials 0.000 claims description 7
- 230000000007 visual effect Effects 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 273
- 239000007789 gas Substances 0.000 description 41
- 230000000052 comparative effect Effects 0.000 description 29
- 238000000034 method Methods 0.000 description 20
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- 239000002356 single layer Substances 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 6
- 230000007935 neutral effect Effects 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229910007717 ZnSnO Inorganic materials 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 239000005361 soda-lime glass Substances 0.000 description 4
- 229910001316 Ag alloy Inorganic materials 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 241001074085 Scophthalmus aquosus Species 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000008033 biological extinction Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000013041 optical simulation Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical group [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Building Environments (AREA)
- Special Wing (AREA)
- Optical Filters (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Description
本発明は、目視による外観がグレー色調を呈する低放射ガラスに関し、特にＡｇ層が１層であるグレー色調低放射ガラスに関する。 The present invention relates to a low-emissivity glass having a grayish appearance visually, and particularly to a gray-colored low-emissivity glass having one Ag layer.
近年、冷暖房効率の向上を目的として、低放射性の積層膜（以下、低放射膜と記載することもある）を形成した低放射ガラスを使用した窓ガラスが普及しつつある。この低放射ガラスは、室内に可視光を取り入れ、窓ガラスに要求される採光性を満たす一方で、前記の低放射膜が近赤外域から赤外域の光を反射するため、太陽光による室内の温度上昇を抑制できる。また、室内から室外への熱の伝達を遮断するため、室内を保温、断熱する能力も高い。 In recent years, windowpanes using low-emissivity glass on which a low-radioactive laminated film (hereinafter, also referred to as a low-emissivity film) is formed have become widespread for the purpose of improving cooling and heating efficiency. This low-emissivity glass takes in visible light into the room and satisfies the daylighting required for the window glass, while the low-emissivity film reflects light in the near-infrared region to the infrared region. The temperature rise can be suppressed. In addition, since it blocks the transfer of heat from the room to the outside, it has a high ability to keep the room warm and insulate.
上記の低放射膜は、通常Ａｇ層と誘電体層とを積層したものが用いられているが、各層の厚みや厚みの比率等を特定の範囲内とすることによって、透過色と反射色等を所望のものとすることが可能である。低放射膜の上記のような色の特性を活かし、クリア（ほぼ無色）や彩度の低いブルー、グリーンやイエロー等の透過色と、ブルーやグリーン等の反射色と、を有する低放射ガラスが用いられていた。また、より壁面との一体感を求めたガラスとして、彩度や明度を抑えた透過色、主張しすぎない反射率と反射色を有する低放射ガラスも求められている。 The above low emissivity film is usually a laminate of an Ag layer and a dielectric layer, but by setting the thickness of each layer and the ratio of the thickness within a specific range, the transmitted color, the reflected color, etc. Can be desired. Taking advantage of the above-mentioned color characteristics of the low-emission film, low-emission glass having clear (almost colorless) or low-saturation transparent colors such as blue, green and yellow, and reflective colors such as blue and green It was used. Further, as a glass for which a sense of unity with the wall surface is desired, a low-emission glass having a transmissive color with suppressed saturation and lightness, and a reflectance and a reflective color that are not overstated is also required.
低放射ガラスの所望の透過色や反射色を得る手法としては、前述した各層の膜厚や比率を特定の範囲内とする他に、可視光を吸収する光吸収層を用いるものが提案されている。例えば特許文献１には、Ａｇ等の低放射層、Ｎｉ、Ｃｒ、ＮｉとＣｒの合金、Ｔｉ等の光吸収金属層、シリコンナイトライド層、及び誘電体層をこの順に積層した低放射ガラスが提案されている。当該文献では、該光吸収金属層が可視光を一定部分吸収することによって、低放射ガラスが所定の色を有するようにすると記載されている。 As a method for obtaining a desired transmitted color or reflected color of low-emissivity glass, a method using a light absorbing layer that absorbs visible light has been proposed in addition to setting the film thickness and ratio of each layer within a specific range as described above. There is. For example, Patent Document 1 describes low-radiation glass in which a low-radiation layer such as Ag, an alloy of Ni, Cr, Ni and Cr, a light-absorbing metal layer such as Ti, a silicon nitride layer, and a dielectric layer are laminated in this order. Proposed. The document describes that the light absorbing metal layer absorbs visible light to a certain extent so that the low emissivity glass has a predetermined color.
また、特許文献２には、Ａｇ層を２層用いて、Ａｇ層上に吸収層を設けた低放射ガラスが提案されている。当該文献によると、吸収材の適切な選択によりガラスの透過色を制御し、透過色をニュートラルな色とすることが可能である旨が記載されている。また、実施例において、透過色は灰色で緑から青い色合いに調整可能であると開示されている。 Further, Patent Document 2 proposes a low-emissivity glass in which two Ag layers are used and an absorption layer is provided on the Ag layer. According to the document, it is possible to control the transmitted color of glass by appropriately selecting an absorbent material, and to make the transmitted color a neutral color. Further, in the embodiment, it is disclosed that the transparent color is gray and can be adjusted from green to blue.
また、特に吸収層と色の関係について明言されていないが、例えば特許文献３には、Ａｇ層より基材側にＴｉ等の高吸収主層を設けた低放射ガラスが開示されている。当該文献には、透過色は青色又は青緑色であり、反射色は青緑色である旨が記載されている。 Further, although the relationship between the absorption layer and the color is not clearly stated, for example, Patent Document 3 discloses a low-emissivity glass in which a high absorption main layer such as Ti is provided on the substrate side of the Ag layer. The document describes that the transmitted color is blue or blue-green and the reflected color is blue-green.
前述したように、近年、建物の外観品質の向上への要求が高まりつつある。具体的には、より壁面との一体感を有する建築用の窓ガラスが求められており、目視による外観がグレー色調を呈する低放射ガラスが求められている。 As mentioned above, in recent years, there has been an increasing demand for improving the appearance quality of buildings. Specifically, there is a demand for architectural windowpanes that have a greater sense of unity with the wall surface, and there is a demand for low-emissivity glass that has a grayish appearance visually.
目視による外観がグレー色調を呈するためには、可視光透過率を低く抑え、さらに透過色がグレー色である低放射ガラスを用いるのが一般的である。その一方で、人間の目には透過色と反射色が合わさって視認されることから、実際に目で見た時の色の印象は反射色の影響も大きく受けることが知られている。ここで、従来、目視で外観を見た場合に特定の色を呈していないように感じるものとして、クリア色調やシルバー色調の低放射ガラスが知られており、通常、可視光透過率が７５〜８０％程度のものをクリア色調、可視光透過率が７０％程度、及び可視光反射率が２０％程度のものをシルバー色調等と呼んでいる。上記のようなクリア色調やシルバー色調の場合、人の目に色味を帯びて視認されるのを防ぐために、反射色を淡い青色とすることが多かった。 In order for the visual appearance to have a gray color tone, it is common to use low-emission glass in which the visible light transmittance is kept low and the transmitted color is gray. On the other hand, since the transmitted color and the reflected color are combined and visually recognized by the human eye, it is known that the impression of the color actually seen by the eye is greatly affected by the reflected color. Here, conventionally, low-emission glass having a clear color tone or a silver color tone is known as one that does not seem to exhibit a specific color when visually viewed, and usually has a visible light transmittance of 75 to 5. A color tone of about 80% is called a clear color tone, a color tone having a visible light transmittance of about 70%, and a color tone having a visible light reflectance of about 20% are called a silver color tone. In the case of the above-mentioned clear color tone or silver color tone, the reflected color is often pale blue in order to prevent the human eye from seeing the color tone.
目視でグレー色調を呈する低放射ガラスについて本発明者が検討を行ったところ、低放射ガラスのうちＡｇ層が１層である低放射膜を用いると、２層用いた場合よりも色味を抑えたグレー色調を呈することがわかった。そこでＡｇが１層の低放射膜を用いて検討を進めると、可視光透過率を低く抑え、透過色をグレー色とした低放射ガラスでは、反射色の色味を強く視認し易くなる場合があると新たに分かった。 When the present inventor examined a low-emissivity glass that visually exhibits a gray color tone, the use of a low-emissivity film having one Ag layer among the low-emissivity glasses suppresses the color tone as compared with the case of using two layers. It was found that it exhibited a gray color tone. Therefore, if we proceed with the study using a low-emission film with one Ag layer, the visible light transmittance may be kept low and the low-emission glass with a gray transmitted color may make it easier to see the reflected color strongly. I found out that there is.
従って本発明は、目視による外観がグレー色調を呈する低放射ガラスにおいて、反射色の色味を抑制可能なグレー色調低放射ガラスを得ることを目的とした。 Therefore, an object of the present invention is to obtain a gray-colored low-emissivity glass capable of suppressing the tint of the reflected color in the low-emissivity glass having a gray-colored appearance visually.
上記の課題に対して本発明者らが鋭意検討を行ったところ、反射色がニュートラル〜青色である低放射ガラスであれば、色味を抑制した良好なグレー色調が得られることがわかった。そこで、上記のような透過色と反射色を達成するために、さらなる検討を行ったところ、Ａｇ層を１層用いた低放射膜の特定の位置に可視光を吸収する光吸収層を設けると、可視光透過率を６５％以下に下げ、透過色をグレー色とすることが可能となることがわかった。また、一方で特定の位置に光吸収層を設けただけでは、透過色がグレー色でありながら淡い色味を呈してしまう場合があったり、反射色に赤色味が混ざったりなどして外観が好ましくなくなるという新たな問題がわかった。当該問題についてさらに検討を行ったところ、低放射膜の各層を特定の膜厚範囲内とすることによって、上記の色味の問題を抑制し、反射色をニュートラル〜青色とすることが可能になった。 As a result of diligent studies by the present inventors on the above problems, it was found that a low-emissivity glass having a reflected color of neutral to blue can obtain a good gray color tone with suppressed tint. Therefore, in order to achieve the above-mentioned transmitted color and reflected color, further studies were carried out, and it was found that a light absorbing layer that absorbs visible light was provided at a specific position of the low radiation film using one Ag layer. It was found that it is possible to reduce the visible light transmittance to 65% or less and make the transmitted color gray. On the other hand, if the light absorption layer is provided at a specific position, the transmitted color may be gray but a pale color may be exhibited, or the reflected color may be mixed with red to give an appearance. A new problem was found that was unfavorable. Further examination of this problem revealed that by setting each layer of the low emissivity film within a specific film thickness range, the above-mentioned problem of tint can be suppressed and the reflected color can be set to neutral to blue. It was.
すなわち本発明は、ガラス板表面に、Ａｇ層を１層有する低放射膜が形成された、透過色がグレー色調を呈するグレー色調低放射ガラスにおいて、該低放射膜が、ガラス板表面から順に、第１誘電体層、Ａｇ層、第２誘電体層、光吸収層、及び第３誘電体層、が積層されたものであり、該第１誘電体層の光学膜厚が４５〜８０ｎｍ、該Ａｇ層の物理膜厚が７〜１０ｎｍ、該第２誘電体層と該第３誘電体層の光学膜厚の合計が７５〜１１０ｎｍ、及び該第２誘電体層と該第３誘電体層の膜厚の合計値に対する、該第２誘電体層の膜厚が１８〜５５％であることを特徴とするグレー色調低放射ガラスである。 That is, according to the present invention, in a gray-colored low-radiation glass in which a low-radiating film having one Ag layer is formed on the glass plate surface and the transmitted color exhibits a gray-colored tone, the low-radiating film is sequentially applied from the glass plate surface. A first dielectric layer, an Ag layer, a second dielectric layer, a light absorbing layer, and a third dielectric layer are laminated, and the optical film thickness of the first dielectric layer is 45 to 80 nm. The physical film thickness of the Ag layer is 7 to 10 nm, the total optical film thickness of the second dielectric layer and the third dielectric layer is 75 to 110 nm, and the second dielectric layer and the third dielectric layer. It is a gray-colored low-emission glass characterized in that the film thickness of the second dielectric layer is 18 to 55% with respect to the total value of the film thickness.
また、前記光吸収層は、Ｔｉ、ＮｉＣｒ、Ｎｂ、及びステンレス鋼からなる群から選ばれる少なくとも１つを有するものとしてもよい。 Further, the light absorption layer may have at least one selected from the group consisting of Ti, NiCr, Nb, and stainless steel.
また、前記光吸収層がＴｉを有するものであり、該光吸収層の物理膜厚が３〜８ｎｍであるものとしてもよい。 Further, the light absorption layer may have Ti, and the physical film thickness of the light absorption layer may be 3 to 8 nm.
また、前記Ａｇ層は、直上にバリア層を有するものとしてもよい。 Further, the Ag layer may have a barrier layer directly above it.
また、グレー色調低放射ガラスの可視光透過率が、５５〜６５％であるものとしてもよい。 Further, the visible light transmittance of the gray color low emissivity glass may be 55 to 65%.
また、前記グレー色調低放射ガラスと、ガラス板とを、中空層を介して一体化させた複層ガラスとしてもよい。 Further, the gray-colored low-emissivity glass and the glass plate may be integrated with each other via a hollow layer to form double glazing.
本発明により、目視による外観がグレー色調を呈する低放射ガラスにおいて、反射色の色味を抑制可能なグレー色調低放射ガラスを得ることが可能となり、建物の外観品質の向上へ寄与する窓ガラス板を提供できる。 INDUSTRIAL APPLICABILITY According to the present invention, it is possible to obtain a gray color tone low radiation glass capable of suppressing the tint of a reflected color in a low radiation color glass having a gray color tone visually, which contributes to improvement of the appearance quality of a building. Can be provided.
１：用語の説明 1: Explanation of terms
（光学特性）
本明細書において、以下の各種光学特性は、いずれも自記分光光度計（日立製作所製、Ｕ−４０００）を用いて測定した結果を用いた。
(optical properties)
In the present specification, the following various optical characteristics are all measured using a self-recording spectrophotometer (manufactured by Hitachi, Ltd., U-4000).
（可視光透過率、可視光反射率）
本明細書における「可視光透過率」及び「可視光反射率（以下「反射率」と記載することもある）」は、ガラス板の厚みが３ｍｍの時の、ＪＩＳ Ｒ３１０６（１９９８）に準拠する方法で算出した。
(Visible light transmittance, visible light reflectance)
The "visible light transmittance" and "visible light reflectance" (hereinafter, also referred to as "reflectance") in the present specification conform to JIS R3106 (1998) when the thickness of the glass plate is 3 mm. Calculated by the method.
（グレー色調）
本明細書における「グレー色調」は、目視による外観がグレー色を呈することを指すものとする。ただし、目視観察の結果を具体的に数値化するのは困難である為、本明細書では、以下の「透過光の光学特性」及び「反射光の光学特性」が所定の数値内に入るものを「グレー色調」とした。
(Gray color)
As used herein, the term "gray color" refers to the appearance of a visual appearance being gray. However, since it is difficult to concretely quantify the result of visual observation, in the present specification, the following "optical characteristics of transmitted light" and "optical characteristics of reflected light" fall within predetermined values. Was set to "gray color tone".
（透過光の光学特性）
本明細書におけるグレー色調は、透過光の可視光透過率が６５％以下であり、透過色がグレー色となる。透過光の「グレー色」とは、ガラス板の厚みが３ｍｍの時の、ＪＩＳ Ｚ８７８１−４に準拠して算出した低放射ガラスの透過色をＣＩＥ Ｌ＊ａ＊ｂ＊色度座標図で表した値において、ａ＊が−４以上、０以下、ｂ＊が−４以上、１以下の範囲内にあることを指すものとする。また、好ましくは可視光透過率が５５〜６５％、ａ＊が−３以上、０以下、ｂ＊が−３以上、０以下としてもよい。
(Optical characteristics of transmitted light)
In the gray color tone in the present specification, the visible light transmittance of the transmitted light is 65% or less, and the transmitted color is gray. The "gray color" of transmitted light is a CIE L * a * b * chromaticity coordinate diagram of the transmitted color of low-emission glass calculated in accordance with JIS Z8781-4 when the thickness of the glass plate is 3 mm. It is assumed that a * is within the range of -4 or more and 0 or less, and b * is within the range of -4 or more and 1 or less. Further, the visible light transmittance may be preferably 55 to 65%, a * may be -3 or more and 0 or less, and b * may be -3 or more and 0 or less.
（反射光の光学特性）
本明細書におけるグレー色調を得るための、反射光の可視光反射率は２０％未満であり、反射色はニュートラル〜青色となる。また、反射光は非成膜面であるガラス板面側の反射（以下、「ガラス面反射」と記載することもある）及び低放射膜面側の反射（以下、「膜面反射」と記載することもある）の両方を評価し、本明細書のグレー色調においては、ガラス面反射及び膜面反射のどちらの反射色も、ニュートラル〜青色となる。上記の「ニュートラル〜青色」とは、ガラス板の厚みが３ｍｍの時の、ＪＩＳ Ｚ８７８１−４に準拠して算出したそれぞれの反射色を、ＣＩＥ Ｌ＊ａ＊ｂ＊色度座標図で表した値において、ａ＊が−５以上、０以下、及びｂ＊が−２０以上、０以下であることを指すものとする。また、好ましくは、ガラス面反射においてａ＊が−３以上、０以下、及びｂ＊が−１０以上、−５以下、膜面反射においてａ＊が−４以上、０以下、及びｂ＊が−１５以上、−５以下の範囲内であるとしてもよい。
(Optical characteristics of reflected light)
The visible light reflectance of the reflected light for obtaining the gray color tone in the present specification is less than 20%, and the reflected color is neutral to blue. In addition, the reflected light is reflected on the glass plate surface side, which is a non-deposited surface (hereinafter, may be referred to as "glass surface reflection") and reflection on the low emission film surface side (hereinafter, referred to as "film surface reflection"). Both are evaluated, and in the gray tone of the present specification, both the reflection color of the glass surface reflection and the film surface reflection are neutral to blue. The above "neutral to blue" means each reflected color calculated in accordance with JIS Z8781-4 when the thickness of the glass plate is 3 mm, and is represented by a CIE L * a * b * chromaticity coordinate diagram. In terms of values, a * is -5 or more and 0 or less, and b * is -20 or more and 0 or less. Preferably, in the glass surface reflection a * is -3, 0 or less, and b * is -10 or more, -5 or less, the film surface reflection a * -4 or more, 0 or less, and b * - It may be in the range of 15 or more and -5 or less.
（物理膜厚）
物理膜厚とは、一般的に用いられる膜厚と同じ意味であり、単なる薄膜の厚さである。本明細書においては、低放射膜作製時と同様の成膜条件で作製した単層膜の膜厚と基材の搬送速度との積から、該単層膜を作製する際の成膜速度を求め、該成膜速度を用いて低放射膜の該当する層の膜厚を算出した値である。
(Physical film thickness)
The physical film thickness has the same meaning as a generally used film thickness, and is simply the thickness of a thin film. In the present specification, the film formation rate at the time of producing the single layer film is determined from the product of the film thickness of the single layer film produced under the same film formation conditions as at the time of producing the low radiation film and the transport speed of the base material. It is a value obtained and calculated the film thickness of the corresponding layer of the low radiation film using the film formation rate.
（光学膜厚）
光学膜厚とは、物理膜厚と屈折率の積で表される値であり、本明細書においては低放射膜作製時と同様の成膜条件で作製した単層膜の波長５５０ｎｍにおける屈折率と膜厚との積から算出した値である。本発明における該屈折率は、単層膜の透過率と反射率とを測定し、得られた値から光学シミュレーション（Ｒｅｆｌｅｃｔａｎｃｅ−ｔｒａｎｓｍｉｔｔａｎｃｅ法）によって算出した。
(Optical film thickness)
The optical film thickness is a value represented by the product of the physical film thickness and the refractive index. In the present specification, the refractive index at a wavelength of 550 nm of a single-layer film produced under the same film formation conditions as when producing a low-emission film. It is a value calculated from the product of the film thickness. The refractive index in the present invention was calculated by measuring the transmittance and reflectance of the monolayer film and using the obtained values by an optical simulation (Reflectance-transmitance method).
（膜の記載）
本明細書において「ＺｎＡｌ」とは、ＺｎにＡｌを混合した膜を示しており、ＺｎとＡｌが１：１で混合する事を示すものではない。Ａｌの含有量は適宜選択されるが、例えば１〜１０ｗｔ％としてもよい。また、ＺｎＡｌが酸化された膜を「ＺｎＡｌＯ」と記載するが、これもＺｎ：Ａｌ：Ｏが１：１：１になることを示すものではない。
(Description of membrane)
In the present specification, "ZnAl" refers to a film in which Zn is mixed with Al, and does not mean that Zn and Al are mixed at a ratio of 1: 1. The Al content is appropriately selected, but may be, for example, 1 to 10 wt%. Further, the film in which ZnAl is oxidized is described as "ZnAlO", but this also does not indicate that Zn: Al: O is 1: 1: 1.
また、「ＮｉＣｒ」とは、ＮｉとＣｒを主として含む合金膜を示しており、ＮｉとＣｒが１：１で混合する事を示すものではない。上記成分の含有量は適宜選択されればよいが、例えばＮｉの含有量を５５〜８５ｗｔ％、Ｃｒの含有量を１０〜２５ｗｔ％としてもよい。また、Ｆｅなどの他の元素を含んでも良い。 Further, "NiCr" indicates an alloy film mainly containing Ni and Cr, and does not indicate that Ni and Cr are mixed at a ratio of 1: 1. The content of the above components may be appropriately selected, and for example, the Ni content may be 55 to 85 wt% and the Cr content may be 10 to 25 wt%. It may also contain other elements such as Fe.
また、「ステンレス鋼」とは、Ｆｅ、Ｃｒ、及びＮｉが混合したものを特に指し、以下「ＳＵＳ」と記載することもある。上記の３成分の含有量は適宜選択されればよいが、例えばＦｅを５０〜８０ｗｔ％、Ｃｒを１０〜２５ｗｔ％、Ｎｉを０〜２０ｗｔ％含有するとしてもよい。また、ＭｎやＭｏなどの他の元素を含んでも良い。 Further, "stainless steel" particularly refers to a mixture of Fe, Cr, and Ni, and may be hereinafter referred to as "SUS". The contents of the above three components may be appropriately selected, and for example, Fe may be contained in an amount of 50 to 80 wt%, Cr may be contained in an amount of 10 to 25 wt%, and Ni may be contained in an amount of 0 to 20 wt%. It may also contain other elements such as Mn and Mo.
また、「ＺｎＳｎ」とは、ＺｎにＳｎを混合した膜を示しており、ＺｎとＳｎが１：１で混合する事を示すものではない。Ｓｎの含有量は適宜選択されるが、例えば３０〜７０ｗｔ％としてもよい。また、ＺｎＳｎが酸化された膜を「ＺｎＳｎＯ」と記載するが、これもＺｎ：Ｓｎ：Ｏが１：１：１になることを示すものではない。 Further, "ZnSn" indicates a film in which Zn is mixed with Sn, and does not mean that Zn and Sn are mixed at a ratio of 1: 1. The Sn content is appropriately selected, but may be, for example, 30 to 70 wt%. Further, the film in which ZnSn is oxidized is described as "ZnSnO", but this also does not indicate that Zn: Sn: O is 1: 1: 1.
（光吸収層）
本明細書における「光吸収層」とは、該光吸収層単層の可視光吸収率が２０〜３０％の層である。通常、本発明のような低放射ガラスの場合、低放射膜内の特定の層のみの光学特性を測定するのは容易ではないため、本明細書では以下の方法で算出した可視光吸収率を「光吸収層単層の可視光吸収率」とした。
(Light absorption layer)
The "light absorption layer" in the present specification is a layer having a visible light absorption rate of 20 to 30% of the light absorption layer single layer. Usually, in the case of low emissivity glass as in the present invention, it is not easy to measure the optical characteristics of only a specific layer in the low emissivity film. Therefore, in the present specification, the visible light absorption rate calculated by the following method is used. It was defined as "visible light absorption rate of a single layer of light absorption layer".
まず、厚み３ｍｍのソーダライムガラス板上に、ガラス板／光吸収層／任意の誘電体層をこの順で形成し、ＪＩＳ Ｒ３１０６（１９９８）に準拠する方法で可視光吸収率Ａを算出した。次に、上記と同様のガラス板、及び任意の誘電体層を、ガラス板上に、ガラス板／任意の誘電体層の順に形成し、可視光吸収率Ｂを算出した。次に、可視光吸収率Ａ−可視光吸収率Ｂを算出し、得られた値を光吸収層の可視光吸収率とした。 First, a glass plate / a light absorption layer / an arbitrary dielectric layer was formed in this order on a soda lime glass plate having a thickness of 3 mm, and the visible light absorption rate A was calculated by a method according to JIS R3106 (1998). Next, a glass plate similar to the above and an arbitrary dielectric layer were formed on the glass plate in the order of the glass plate / the arbitrary dielectric layer, and the visible light absorption rate B was calculated. Next, the visible light absorption rate A-visible light absorption rate B was calculated, and the obtained value was used as the visible light absorption rate of the light absorption layer.
なお、上記の光吸収層は、作製する低放射膜と同様の種類及び膜厚とする。また、光吸収層の上に形成する任意の誘電体層は、作製する低放射膜において光吸収層の上に形成する誘電体層と同様の種類及び同等の膜厚を用いればよい。本発明者らが検討を行ったところ、光吸収層の上に形成する誘電体層の膜厚が変わっても、光吸収層の可視光吸収率に大きな変化が見られないことがわかった。これは、光吸収層の上に誘電体層が形成される初期段階では、該光吸収層が表面側から酸化や酸窒化されるものの、誘電体層がある程度形成された後は、光吸収層の酸化や酸窒化がさらに膜厚方向へ進むことはない為であると考えられる。 The light absorption layer is of the same type and film thickness as the low emissivity film to be produced. Further, as the arbitrary dielectric layer formed on the light absorption layer, the same type and the same film thickness as the dielectric layer formed on the light absorption layer may be used in the low emissivity film to be produced. As a result of studies by the present inventors, it was found that even if the film thickness of the dielectric layer formed on the light absorption layer changes, the visible light absorption rate of the light absorption layer does not change significantly. This is because the light absorption layer is oxidized or acid nitrided from the surface side at the initial stage when the dielectric layer is formed on the light absorption layer, but after the dielectric layer is formed to some extent, the light absorption layer is formed. It is considered that this is because the oxidation and oxynitride of the material do not proceed further in the film thickness direction.
２：低放射ガラスの各構成
本発明は、ガラス板表面に、Ａｇ層を１層有する低放射膜が形成された、透過色がグレー色調を呈するグレー色調低放射ガラスにおいて、該低放射膜が、ガラス板表面から順に、第１誘電体層、Ａｇ層、第２誘電体層、光吸収層、及び第３誘電体層、が積層されたものであり、該第１誘電体層の光学膜厚が４５〜８０ｎｍ、該Ａｇ層の物理膜厚が７〜１０ｎｍ、該第２誘電体層と該第３誘電体層の光学膜厚の合計が７５〜１１０ｎｍ、及び該第２誘電体層と該第３誘電体層の膜厚の合計値に対する、該第２誘電体層の膜厚が１８〜５５％であることを特徴とするグレー色調低放射ガラスである。
2: Each configuration of low-radiation glass In the present invention, in a gray-colored low-radiation glass in which a low-radiating film having one Ag layer is formed on the surface of a glass plate and the transmitted color exhibits a gray tone, the low-radiating film is formed. , The first dielectric layer, the Ag layer, the second dielectric layer, the light absorption layer, and the third dielectric layer are laminated in this order from the surface of the glass plate, and the optical film of the first dielectric layer. The thickness is 45 to 80 nm, the physical film thickness of the Ag layer is 7 to 10 nm, the total optical film thickness of the second dielectric layer and the third dielectric layer is 75 to 110 nm, and the second dielectric layer. It is a gray-colored low-emission glass characterized in that the thickness of the second dielectric layer is 18 to 55% with respect to the total thickness of the third dielectric layer.
本発明の好適な実施形態の１つを図１に示した。以下に各構成について説明する。 One of the preferred embodiments of the present invention is shown in FIG. Each configuration will be described below.
（ガラス板Ｇ）
使用するガラス板Ｇは特に限定されるものではないが、例えば、通常使用されているソーダ石灰ガラス、無アルカリガラス、高透過ガラス、風冷強化ガラス、化学強化ガラス、網入りガラス、線入りガラス、ホウケイ酸塩ガラス、低膨張ガラス、ゼロ膨張ガラス、低膨張結晶化ガラス、ゼロ膨張結晶化ガラス等を用いることが可能である。
(Glass plate G)
The glass plate G to be used is not particularly limited, but for example, commonly used soda lime glass, non-alkali glass, highly transparent glass, wind-cooled reinforced glass, chemically reinforced glass, wire-reinforced glass, and wire-reinforced glass. , Bosilicate glass, low expansion glass, zero expansion glass, low expansion crystallized glass, zero expansion crystallized glass and the like can be used.
上記のガラス板Ｇの他に、樹脂等の透明基板を用いてもよく、例えばポリエチレンテレフタレート樹脂、ポリエチレンナフタレート樹脂、ポリエーテルサルホン樹脂、ポリカーボネート樹脂、ポリ塩化ビニール樹脂等が挙げられる。 In addition to the above glass plate G, a transparent substrate such as a resin may be used, and examples thereof include polyethylene terephthalate resin, polyethylene naphthalate resin, polyether sulfone resin, polycarbonate resin, and polyvinyl chloride resin.
ガラス板Ｇの厚みは特に限定するものではないが、一般的に建築用窓ガラスとして使用される３〜１９ｍｍとしてもよい。 The thickness of the glass plate G is not particularly limited, but may be 3 to 19 mm, which is generally used as a window glass for construction.
（誘電体層）
誘電体層１１、１２、１３はＡｌ、Ｓｉ、Ｔｉ、Ｚｎ、Ｉｎ、及びＳｎからなる群から選ばれる少なくとも１つを含む酸化物、窒化物、又は酸窒化物の透明な薄膜であることが好ましい。当該誘電体層の第１層１１、第２層１２、第３層１３は低放射膜の反射色や透過色を調整するものであり、各膜厚を特定の範囲内とすることにより所望の低放射ガラスを得ることが可能となる。また、各層は２種類以上の膜が積層したものでもよい。
(Dielectric layer)
The dielectric layers 11, 12, and 13 may be transparent thin films of oxides, nitrides, or oxynitrides containing at least one selected from the group consisting of Al, Si, Ti, Zn, In, and Sn. preferable. The first layer 11, the second layer 12, and the third layer 13 of the dielectric layer adjust the reflection color and the transmission color of the low emissivity film, and are desired by setting each film thickness within a specific range. It is possible to obtain low emissivity glass. Further, each layer may be a laminated layer of two or more types of films.
（第１誘電体層１１）
第１誘電体層１１は、ガラス板ＧとＡｇ層２との間に形成される層であり、光学膜厚を４５〜８０ｎｍとする。４５ｎｍ未満だとガラス面側の反射率が高くなり過ぎることや膜面側の反射色の青色味が強くなり過ぎることがあり、また、８０ｎｍを超えると反射色が赤色味を呈するようになる。好ましくは下限値を６０ｎｍ以上、上限値を８０ｎｍ以下としてもよい。また、該第１誘電体層１１として酸化亜鉛構造を有する膜を用い、当該膜の直上にＡｇ層２を形成すると、該Ａｇ層２の結晶性が向上するため好ましい。
(First Dielectric Layer 11)
The first dielectric layer 11 is a layer formed between the glass plate G and the Ag layer 2, and has an optical film thickness of 45 to 80 nm. If it is less than 45 nm, the reflectance on the glass surface side may become too high, or the bluish tint of the reflected color on the film surface side may become too strong, and if it exceeds 80 nm, the reflected color becomes reddish. Preferably, the lower limit value may be 60 nm or more and the upper limit value may be 80 nm or less. Further, it is preferable to use a film having a zinc oxide structure as the first dielectric layer 11 and to form the Ag layer 2 directly above the film because the crystallinity of the Ag layer 2 is improved.
（第２誘電体層１２、第３誘電体層１３）
第２誘電体層１２及び第３誘電体層１３は、Ａｇ層２の上に形成される層であり、該第２誘電体層１２と該第３誘電体層１３との間に光吸収層４を形成することによって、透過色をグレー色とすることが可能となる。また、第２誘電体層１２と第３誘電体層１３の光学膜厚の合計値、及び当該合計値に対する第２誘電体層の膜厚の比率を特定の範囲内とすることによって、所望の反射色を得る事が可能となった。
(2nd Dielectric Layer 12, 3rd Dielectric Layer 13)
The second dielectric layer 12 and the third dielectric layer 13 are layers formed on the Ag layer 2, and are light absorbing layers between the second dielectric layer 12 and the third dielectric layer 13. By forming 4, the transparent color can be gray. Further, by setting the total value of the optical film thicknesses of the second dielectric layer 12 and the third dielectric layer 13 and the ratio of the film thickness of the second dielectric layer to the total value within a specific range, it is desired. It became possible to obtain a reflected color.
本発明では、第２誘電体層１２と第３誘電体層１３の光学膜厚の合計を７５〜１１０ｎｍとする。７５ｎｍ未満だと反射色が赤色味を帯びることがあり、さらに斜めから見た場合に反射色の赤色味が強く生じ易くなる。また、１１０ｎｍを超えると透過色が黄色味を帯びたりガラス面側の反射率が高くなり過ぎたりして、好ましくない外観となることがある。好ましくは下限値を８０ｎｍ以上、上限値を１００ｎｍ以下としてもよい。また、本発明では、第２誘電体層１２と第３誘電体層１３の膜厚の合計値に対する、第２誘電体層１２の膜厚を１８〜５５％とする。１８％未満、又は５５％を超えると膜面側やガラス面側の反射色が赤色味を帯びることがある。好ましくは下限値を２０％以上、上限値を４５％以下としてもよい。 In the present invention, the total optical film thickness of the second dielectric layer 12 and the third dielectric layer 13 is 75 to 110 nm. If it is less than 75 nm, the reflected color may be reddish, and when viewed from an angle, the reflected color tends to be strongly reddish. On the other hand, if it exceeds 110 nm, the transmitted color may be yellowish or the reflectance on the glass surface side may become too high, resulting in an unfavorable appearance. Preferably, the lower limit value may be 80 nm or more and the upper limit value may be 100 nm or less. Further, in the present invention, the film thickness of the second dielectric layer 12 is 18 to 55% of the total film thickness of the second dielectric layer 12 and the third dielectric layer 13. If it is less than 18% or more than 55%, the reflected color on the film surface side or the glass surface side may be reddish. Preferably, the lower limit value may be 20% or more and the upper limit value may be 45% or less.
また、第３誘電体層１３には、耐湿性や物理的・化学的耐久性に優れた材料を用いるのが好ましい。中でも誘電体層１３のガラス板Ｇから最も遠い層（以下、「最上層」と記載することもある）には、物理的・化学的耐久性を有する層を配置することが好ましい。例えば、耐湿性に優れたＺｎＳｎＯ層と物理的・化学的耐久性に優れたＴｉＯ２の積層構造等を用いるのが好ましい。 Further, it is preferable to use a material having excellent moisture resistance and physical / chemical durability for the third dielectric layer 13. Among them, it is preferable to arrange a layer having physical and chemical durability in the layer of the dielectric layer 13 farthest from the glass plate G (hereinafter, may be referred to as “top layer”). For example, it is preferable to use a laminated structure of a ZnSnO layer having excellent moisture resistance and TiO 2 having excellent physical and chemical durability.
（Ａｇ層２）
Ａｇ層２は赤外線を反射する機能を有する層であり、本発明においてＡｇ層２は１層である。該Ａｇ層２は、Ａｇ膜又はＡｇを主成分とするＡｇ合金膜である。該Ａｇ合金膜としては、例えばパラジウム、金、白金、ニッケル、銅等の金属をそれぞれ５ｗｔ％以下の範囲内で含むものとしてもよい。
(Ag layer 2)
The Ag layer 2 is a layer having a function of reflecting infrared rays, and the Ag layer 2 is one layer in the present invention. The Ag layer 2 is an Ag film or an Ag alloy film containing Ag as a main component. The Ag alloy film may contain metals such as palladium, gold, platinum, nickel, and copper in a range of 5 wt% or less.
本発明では、Ａｇ層２の物理膜厚を７〜１０ｎｍとする。７ｎｍ未満だと膜厚が薄くなり過ぎて膜質の低下や膜の不連続性が生じ易くなったり、赤外線の反射性能が不十分になったりすることがある。また、１０ｎｍを超えると反射色が赤色味や青色味を強く呈することがある。 In the present invention, the physical film thickness of the Ag layer 2 is 7 to 10 nm. If it is less than 7 nm, the film thickness may become too thin, and the film quality may be deteriorated, the film may be discontinuous, or the infrared reflection performance may be insufficient. Further, if it exceeds 10 nm, the reflected color may strongly exhibit a reddish or bluish tint.
（バリア層３）
一般的に、バリア層とはＡｇ層の直上に形成されるものであり、さらに上層に誘電体層等を形成する際、Ａｇ層が酸素ガス等の反応性ガスによって劣化するのを抑制するものである。通常、バリア層は形成時にＡｇ層を劣化させないようにする為、金属膜や合金膜が用いられる。金属膜や合金膜は可視光を吸収するものが多いが、該バリア層の直上に他の誘電体層を形成すると、この時使用する酸素や窒素を含むガスに起因して酸化や酸窒化され、可視光の吸収量を小さくすることが可能となる。従って、一般的には、ＺｎＡｌ、Ｔｉ、ＮｉＣｒ、Ｎｂ及びステンレス鋼等をＡｇ層上に形成し、後の誘電体層を形成する工程で十分に酸化や酸窒化させ、可視光吸収率を極力小さくした層が用いられている。
(Barrier layer 3)
Generally, the barrier layer is formed directly above the Ag layer, and when a dielectric layer or the like is formed on the upper layer, the Ag layer is prevented from being deteriorated by a reactive gas such as oxygen gas. Is. Usually, a metal film or an alloy film is used as the barrier layer so as not to deteriorate the Ag layer at the time of formation. Many metal films and alloy films absorb visible light, but if another dielectric layer is formed directly above the barrier layer, it will be oxidized or oxynitride due to the gas containing oxygen and nitrogen used at this time. , It is possible to reduce the amount of visible light absorbed. Therefore, in general, ZnAl, Ti, NiCr, Nb, stainless steel, etc. are formed on the Ag layer and sufficiently oxidized or oxynitrided in the subsequent step of forming the dielectric layer to maximize the visible light absorption rate. A smaller layer is used.
本発明においても、上記のようなバリア層を用いるのが好ましい。用いる場合、バリア層３はＡｇ層２の直上に形成する。また、本発明者らが検討を行った結果、バリア層３の可視光の吸収が大きいと、透過色がグレー色にならなかったり、反射色が色味を強く呈してしまったりして、所望の低放射ガラスにならないことがわかった。従って、バリア層３は低放射膜の全層を形成後に極力可視光を吸収しないことが望ましい。なお、Ａｇ層２の直上の層を形成する際に、Ａｇ層２を劣化させるようなガスを使用しない場合は、バリア層３を用いなくともよい。 Also in the present invention, it is preferable to use the barrier layer as described above. When used, the barrier layer 3 is formed directly above the Ag layer 2. Further, as a result of studies by the present inventors, if the barrier layer 3 absorbs a large amount of visible light, the transmitted color does not become gray or the reflected color strongly exhibits a tint, which is desired. It turned out that it does not become low-emission glass. Therefore, it is desirable that the barrier layer 3 does not absorb visible light as much as possible after forming all the layers of the low emissivity film. When forming the layer directly above the Ag layer 2, if a gas that deteriorates the Ag layer 2 is not used, the barrier layer 3 may not be used.
使用するバリア層３としては、前述したように一般的に利用されている膜を用いればよい。使用する膜の種類や成膜条件によって、十分に酸化や酸窒化可能な膜厚が異なるが、例えばＺｎＡｌは１．５〜３．５ｎｍ、Ｔｉは１．０〜２．５ｎｍ、ＮｉＣｒは１．０〜２．０ｎｍ、Ｎｂは１．０〜２．０ｎｍ、及びステンレス鋼は１．５〜２．５ｎｍとしてもよい。 As the barrier layer 3 to be used, a film generally used as described above may be used. The film thickness that can be sufficiently oxidized or nitrided varies depending on the type of film used and the film forming conditions. For example, ZnAl is 1.5 to 3.5 nm, Ti is 1.0 to 2.5 nm, and NiCr is 1. 0 to 2.0 nm, Nb may be 1.0 to 2.0 nm, and stainless steel may be 1.5 to 2.5 nm.
（光吸収層４）
光吸収層４は、第２誘電体層１２と第３誘電体層１３との間に形成される層である。本発明は、光吸収層４を第２誘電体層１２と第３誘電体層１３との間に形成することによって、透過光の可視光透過率を６５％以下、及び透過色をグレー色とすることを可能としたものである。
(Light absorption layer 4)
The light absorption layer 4 is a layer formed between the second dielectric layer 12 and the third dielectric layer 13. In the present invention, by forming the light absorption layer 4 between the second dielectric layer 12 and the third dielectric layer 13, the visible light transmittance of transmitted light is 65% or less, and the transmitted color is gray. It is possible to do.
本明細書における光吸収層４は、前述した測定方法で得られる単層での可視光吸収率が２０〜３０％となるものを用いた。また、バリア層３よりも可視光吸収率が高い膜であるとしてもよい。なお、本明細書では前述したように光吸収層４の可視光吸収率を算出したが、可視光吸収率の測定は必ずしも本手法である必要はない。 As the light absorption layer 4 in the present specification, a layer having a visible light absorption rate of 20 to 30% in a single layer obtained by the above-mentioned measurement method was used. Further, the film may have a higher visible light absorption rate than the barrier layer 3. In this specification, the visible light absorption rate of the light absorption layer 4 is calculated as described above, but the measurement of the visible light absorption rate does not necessarily have to be the present method.
光吸収層４としては、可視域での消衰係数が１以上の材料を用いるのが好ましい。また、前述したバリア層３と同様に金属膜や合金膜を用いるのがより好ましく、例えばＴｉ、ＮｉＣｒ、Ｎｂ、及びステンレス鋼からなる群から選ばれる少なくとも１つを有するとしてもよい。金属膜や合金膜は、該光吸収層４の上層に誘電体層（例えば第３誘電体層１３等）を形成する際、酸素や窒素を含むガスを用いると光吸収層４の表面が酸化や酸窒化され、可視光透過率が上昇する。そのため、光吸収層４は完全に酸化や酸窒化されないよう膜厚を厚くするのが望ましい。好適な膜厚は使用する膜の種類によって適宜選択されればよく、例えば前述したバリア層３を超える膜厚にすればよいが、例えば、光吸収層４がＴｉを有するものであり、該光吸収層４の物理膜厚が３〜８ｎｍであるのが好ましい。 As the light absorption layer 4, it is preferable to use a material having an extinction coefficient of 1 or more in the visible region. Further, it is more preferable to use a metal film or an alloy film as in the barrier layer 3 described above, and it may have at least one selected from the group consisting of, for example, Ti, NiCr, Nb, and stainless steel. When a dielectric layer (for example, a third dielectric layer 13 or the like) is formed on the upper layer of the light absorption layer 4, the surface of the light absorption layer 4 is oxidized by using a gas containing oxygen or nitrogen. It is oxynitride and the visible light transmittance increases. Therefore, it is desirable to increase the film thickness of the light absorption layer 4 so that it is not completely oxidized or nitrided. The suitable film thickness may be appropriately selected depending on the type of film to be used. For example, the film thickness may exceed the barrier layer 3 described above. For example, the light absorption layer 4 has Ti, and the light absorption layer 4 has Ti. The physical film thickness of the absorption layer 4 is preferably 3 to 8 nm.
（低放射膜）
得られる低放射膜は、ガラス板Ｇの表面に第１誘電体層１１を有するように形成するのが望ましい。また、各種性能を損ねない程度であれば、ガラス板Ｇと低放射膜との間、低放射膜の各層間、又は低放射膜の最上層に、任意の層を形成してもよい。
(Low emissivity membrane)
It is desirable that the obtained low emissivity film is formed so as to have the first dielectric layer 11 on the surface of the glass plate G. Further, an arbitrary layer may be formed between the glass plate G and the low emissivity film, between each layer of the low emissivity film, or in the uppermost layer of the low emissivity film as long as various performances are not impaired.
３：低放射ガラスの製造方法
以下に本発明の低放射ガラスの製造方法の一例を説明する。なお、本発明は以下に限定するものではない。
3: Method for producing low-emissivity glass An example of the method for producing low-emissivity glass of the present invention will be described below. The present invention is not limited to the following.
本発明の低放射ガラスの低放射膜はスパッタリング法、電子ビーム蒸着法やイオンプレーティング法等で形成されることが好ましいが、生産性、均一性を確保しやすいという点でスパッタリング法が適している。 The low emissivity film of the low emissivity glass of the present invention is preferably formed by a sputtering method, an electron beam deposition method, an ion plating method, or the like, but the sputtering method is suitable because it is easy to secure productivity and uniformity. There is.
スパッタリング法による低放射膜の形成は、各層の材料となるスパッタリングターゲットが設置された装置内を、ガラス板を搬送させながら行う。この時、装置内に設けられている膜形成を行う真空チャンバー内にはスパッタリング時に用いる雰囲気ガスが導入されており、ターゲットに負の電位を印加することにより装置内にプラズマを発生させてスパッタリングを行う。 The low emissivity film is formed by the sputtering method while the glass plate is conveyed in the apparatus in which the sputtering target, which is the material of each layer, is installed. At this time, the atmospheric gas used for sputtering is introduced into the vacuum chamber that forms the film provided in the device, and by applying a negative potential to the target, plasma is generated in the device to perform sputtering. Do.
また、所望の膜厚を得る方法はスパッタリング装置の形式によって異なるため特に限定しないが、ターゲットへの投入電力や導入ガス条件の調整により、成膜速度を変化させることで膜厚を制御する方法や、基板の搬送速度を調整することで膜厚を制御する方法などが広く用いられている。 Further, the method of obtaining the desired film thickness is not particularly limited because it differs depending on the type of the sputtering apparatus, but a method of controlling the film thickness by changing the film forming speed by adjusting the input power to the target and the introduced gas conditions , A method of controlling the film thickness by adjusting the transport speed of the substrate is widely used.
前記各誘電体層を形成する場合、使用するターゲットはセラミックターゲット、金属ターゲット、どちらを用いても構わない。いずれにおいても使用する雰囲気ガスのガス条件は特に限定するものでなく、例えばＡｒガス、Ｏ２ガス、及びＮ２ガス等から目的とする膜に従ってガス種、混合比を適宜決めれば良い。また、真空チャンバーに導入するガスとして、Ａｒガス、Ｏ２ガス、Ｎ２ガス以外の任意の第３成分を含んでも良い。 When forming each of the dielectric layers, either a ceramic target or a metal target may be used as the target. In any case, the gas conditions of the atmospheric gas to be used are not particularly limited, and for example, the gas type and the mixing ratio may be appropriately determined from Ar gas, O 2 gas, N 2 gas and the like according to the target membrane. Further, as the gas to be introduced into the vacuum chamber, any third component other than Ar gas, O 2 gas and N 2 gas may be contained.
また、前記のバリア層を用いる場合は、第２誘電体層を形成する際にバリア層を酸化や酸窒化可能なように、Ｏ２ガス、Ｎ２ガス、ＣＯ２ガス等の反応性ガス雰囲気中で成膜するのが好ましい。 When the barrier layer is used, a reactive gas atmosphere such as O 2 gas, N 2 gas, or CO 2 gas is used so that the barrier layer can be oxidized or oxynitride when the second dielectric layer is formed. It is preferable to form a film inside.
Ａｇ層を形成する場合、使用するターゲットにはＡｇターゲット又はＡｇ合金ターゲットを用いる。この時導入する雰囲気ガスにはＡｒガスを用いるのが好ましいが、Ａｇ膜の光学特性を損なわない程度であれば異なる種類のガスを混合してもよい。 When forming the Ag layer, an Ag target or an Ag alloy target is used as the target to be used. Ar gas is preferably used as the atmospheric gas to be introduced at this time, but different types of gases may be mixed as long as the optical characteristics of the Ag film are not impaired.
バリア層を形成する場合、使用するターゲットは適宜選択すればよく、導入する雰囲気ガスにはＡｒ等の不活性ガスを用いればよい。またこの時、バリア層は後工程で酸化や酸窒化が可能な程度の膜厚にする。 When forming the barrier layer, the target to be used may be appropriately selected, and an inert gas such as Ar may be used as the atmospheric gas to be introduced. At this time, the barrier layer is made thick enough to be oxidized or oxynitrided in a subsequent process.
光吸収層を形成する場合、使用するターゲットは適宜選択すればよく、導入する雰囲気ガスにはＡｒ等の不活性ガスを用いればよい。また、好ましくは可視域での消衰係数が１以上の材料のターゲットを用いるのが好ましく、例えばＴｉ、ＮｉＣｒ、Ｎｂ、及びステンレス鋼からなる群から選ばれる少なくとも１つを有するとしてもよい。また、光吸収層を形成する際、酸素等の反応性ガスを用いると、酸化や酸窒化された膜となり、可視光吸収率が小さくなってしまう場合があることから、Ａｒ等の不活性ガスを用いるのが望ましい。 When forming the light absorption layer, the target to be used may be appropriately selected, and an inert gas such as Ar may be used as the atmospheric gas to be introduced. Further, it is preferable to use a target of a material having an extinction coefficient of 1 or more in the visible region, and it may have at least one selected from the group consisting of, for example, Ti, NiCr, Nb, and stainless steel. Further, when a reactive gas such as oxygen is used when forming the light absorption layer, an oxidized or acid nitrided film may be formed and the visible light absorption rate may be reduced. Therefore, an inert gas such as Ar is used. It is desirable to use.
光吸収層は、光吸収層に用いる材料と、後の第３誘電体層形成時に使用するガスとの組み合わせによっては、層表面が酸化や酸窒化されることがある。酸化や酸窒化が生じると前述したように可視光吸収性能を損なってしまうことから、酸化や酸窒化される材料を用いる場合は、第３誘電体層形成後にも酸化や酸窒化されない部分が十分残る程度の膜厚とするのが望ましい。例えば、光吸収層がＴｉの場合は、該光吸収層４の物理膜厚を３〜８ｎｍとするのが好ましい。 The surface of the light absorption layer may be oxidized or acidnitrided depending on the combination of the material used for the light absorption layer and the gas used at the time of forming the third dielectric layer later. As described above, if oxidation or oxynitriding occurs, the visible light absorption performance is impaired. Therefore, when a material that is oxidized or oxynitrided is used, a portion that is not oxidized or oxynitrided even after the formation of the third dielectric layer is sufficient. It is desirable that the film thickness is such that it remains. For example, when the light absorption layer is Ti, the physical film thickness of the light absorption layer 4 is preferably 3 to 8 nm.
プラズマ発生源には直流電源、交流電源、及び交流と直流を重畳した電源等、いずれも用いられるが、誘電体層を形成する際に異常放電が生じやすい場合は、直流電源にパルスを印加した電源又は交流電源を用いるのが好ましい。 A DC power supply, an AC power supply, or a power supply in which AC and DC are superimposed are used as the plasma generation source, but if abnormal discharge is likely to occur when forming the dielectric layer, a pulse is applied to the DC power supply. It is preferable to use a power source or an AC power source.
４：複層ガラス
また本発明の低放射ガラスを、建物用の単板や合せガラスとして使用してもよいが、複層ガラスとして使用すると低放射膜を保護することが可能であり、かつ高い断熱性を示すため建物用の窓ガラスとして好ましい。すなわち本発明の好適な実施形態のひとつは、前述したグレー色調低放射ガラスと、ガラス板とを、中空層を介して一体化させた複層ガラスである。当該複層ガラスは外観がグレー色調であることから、壁面に対して調和し建物の外観品質を向上させることが可能である。
4: Double glazing The low emissivity glass of the present invention may be used as a single plate or laminated glass for buildings, but when used as double glazing, it is possible to protect the low emissivity film and it is expensive. It is preferable as a window glass for a building because it exhibits heat insulating properties. That is, one of the preferred embodiments of the present invention is a double glazing in which the above-mentioned gray-colored low-emissivity glass and a glass plate are integrated via a hollow layer. Since the appearance of the double glazing is gray, it is possible to improve the appearance quality of the building in harmony with the wall surface.
複層ガラスとして用いる場合、低放射ガラスの低放射膜が形成された面を他のガラス板と中空層を形成するように所定間隔を隔て対向させ、周辺部をスペーサーやシール材で封止する。該中空層はＡｒ、Ｈｅ、Ｎｅ、Ｋｒ、Ｘｅ等の不活性ガス、乾燥空気、Ｎ２等が封入されるものであり、通常は乾燥空気を用いるが、より断熱性能や遮音性能を向上させることを目的としてＡｒガスやＮｅガスなどを用いてもよい。 When used as double glazing, the surfaces of low emissivity glass on which the low emissivity film is formed face each other at predetermined intervals so as to form a hollow layer with other glass plates, and the peripheral portion is sealed with a spacer or a sealing material. .. The hollow layer is filled with an inert gas such as Ar, He, Ne, Kr, Xe, dry air, N 2, etc. Normally, dry air is used, but the heat insulation performance and sound insulation performance are further improved. For this purpose, Ar gas, Ne gas, or the like may be used.
前記スペーサーは内部に乾燥剤を有し、少なくとも２枚のガラス板間にブチルゴムやシリコーン等のシール材を介して固定されるものであり、軽量なアルミ材や樹脂材が用いられる。当該スペーサー、低放射ガラス、及びガラス板で囲まれた部分が中空層であり、該中空層の厚みや封入する気体の種類によって、複層ガラスの断熱性を変化させることが可能である。 The spacer has a desiccant inside and is fixed between at least two glass plates via a sealing material such as butyl rubber or silicone, and a lightweight aluminum material or resin material is used. The portion surrounded by the spacer, the low emissivity glass, and the glass plate is a hollow layer, and the heat insulating property of the double glazing can be changed depending on the thickness of the hollow layer and the type of gas to be enclosed.
本発明の実施例及び比較例を以下に記載する。なお、本発明は以下の様態に限定されるものではない。 Examples and comparative examples of the present invention are described below. The present invention is not limited to the following aspects.
いずれの実施例及び比較例も、厚み３ｍｍのソーダライムガラス上に、マグネトロンスパッタリング装置を用いて成膜を行った。また、いずれの実施例及び比較例においてもガラス板及び膜は非加熱とし、成膜時にスパッタリングに由来してガラス板温度が上昇する場合を除いて、特に加熱は行わなかった。 In each of the Examples and Comparative Examples, a film was formed on soda lime glass having a thickness of 3 mm using a magnetron sputtering apparatus. Further, in each of the Examples and Comparative Examples, the glass plate and the film were not heated, and no particular heating was performed except when the temperature of the glass plate rises due to sputtering during film formation.
各層はガラス板の搬送速度を調整する事により表１に記載した膜厚を得た。また、上記の搬送速度は、予め膜の種類ごとに単層膜を形成し成膜速度を求めておき、この成膜速度を使用して算出した。なお、表１、２、及び４の記載において、誘電体層は光学膜厚、Ａｇ層、バリア層及び光吸収層は物理膜厚で記載した。また、表１において、第１誘電体層をＤ１、第２誘電体層をＤ２、第３誘電体層をＤ３、Ａｇ層をＡｇ、バリア層をＢ、光吸収層をＡ、及びＤ２／（Ｄ２＋Ｄ３）×１００で表されるＤ２の比率を比率（％）と記載した。 The film thickness of each layer was obtained as shown in Table 1 by adjusting the transport speed of the glass plate. Further, the above-mentioned transport speed was calculated by forming a single-layer film for each type of film in advance and determining the film-forming speed, and using this film-forming speed. In Tables 1, 2, and 4, the dielectric layer is described by the optical film thickness, and the Ag layer, the barrier layer, and the light absorption layer are described by the physical film thickness. Further, in Table 1, the first dielectric layer is D 1 , the second dielectric layer is D 2 , the third dielectric layer is D 3 , the Ag layer is Ag, the barrier layer is B, the light absorption layer is A, and so on. The ratio of D 2 represented by D 2 / (D 2 + D 3 ) × 100 is described as the ratio (%).
（実施例１〜１１、比較例１〜７）
まず、ガラス板を基材ホルダーに保持させ、各真空チャンバー内に所望のターゲットを設置した。該ターゲットは裏側にマグネットが配置されている。次に、真空チャンバー内を真空ポンプによって排気した。
(Examples 1 to 11, Comparative Examples 1 to 7)
First, the glass plate was held by the base material holder, and a desired target was placed in each vacuum chamber. A magnet is arranged on the back side of the target. Next, the inside of the vacuum chamber was exhausted by a vacuum pump.
次に、第１誘電体層をガラス板上に成膜した。ターゲットにはＡｌが２ｗｔ％添加されたＺｎ（以下ＺｎＡｌと記載することもある）ターゲットを用い、ＺｎＡｌターゲットへ電源ケーブルを通じてＤＣ電源より１１００Ｗの電力を投入した。この時、真空ポンプを連続的に稼動させながら、真空チャンバー内にアルゴンガスを２０ｓｃｃｍ、酸素ガスを４０ｓｃｃｍで導入し、圧力を０．４Ｐａになるよう調節した。以上よりＺｎＡｌＯ膜を得た。 Next, the first dielectric layer was formed on the glass plate. A Zn (hereinafter sometimes referred to as ZnAl) target to which 2 wt% of Al was added was used as the target, and 1100 W of electric power was applied to the ZnAl target from a DC power source through a power cable. At this time, while the vacuum pump was continuously operated, argon gas was introduced into the vacuum chamber at 20 sccm and oxygen gas was introduced at 40 sccm, and the pressure was adjusted to 0.4 Pa. From the above, a ZnAlO film was obtained.
次に、ＺｎＡｌＯ膜の上にＡｇ層を成膜した。ターゲットにＡｇターゲット、真空チャンバー内の雰囲気ガスはアルゴンガスを４５ｓｃｃｍで導入し、圧力は０．３Ｐａに調節した。また、ＤＣ電源より投入する電力は３００Ｗとした。以上よりＡｇ膜を得た。 Next, an Ag layer was formed on the ZnAlO film. The Ag target was introduced into the target, argon gas was introduced at 45 sccm as the atmosphere gas in the vacuum chamber, and the pressure was adjusted to 0.3 Pa. The power input from the DC power supply was set to 300 W. From the above, an Ag film was obtained.
次に、Ａｇ膜の上にバリア層を成膜した。ターゲットにＺｎＡｌターゲット、真空チャンバー内の雰囲気ガスはアルゴンガスを１００ｓｃｃｍで導入し、圧力は０．７Ｐａに調節した。また、ＤＣ電源より投入する電力は４５０Ｗとした。以上よりＺｎＡｌ膜を得た。 Next, a barrier layer was formed on the Ag film. A ZnAl target was introduced into the target, argon gas was introduced at 100 sccm as the atmosphere gas in the vacuum chamber, and the pressure was adjusted to 0.7 Pa. The power input from the DC power supply was 450 W. From the above, a ZnAl film was obtained.
次に、バリア層の上に第２誘電体層としてＺｎＡｌＯ膜を成膜した。所望の膜厚を得る為に搬送速度を調整した他は、成膜条件を第１誘電体層と同様とした。 Next, a ZnAlO film was formed as a second dielectric layer on the barrier layer. The film forming conditions were the same as those of the first dielectric layer, except that the transport speed was adjusted to obtain a desired film thickness.
次に、第２誘電体層の上に光吸収層としてＴｉ膜を成膜した。ターゲットにＴｉターゲット、真空チャンバー内の雰囲気ガスはアルゴンガスを８０ｓｃｃｍで導入し、圧力は０．６Ｐａに調節した。また、ＤＣ電源より投入する電力は３３０Ｗとした。以上よりＴｉ膜を得た。 Next, a Ti film was formed as a light absorption layer on the second dielectric layer. A Ti target was introduced into the target, argon gas was introduced at 80 sccm as the atmosphere gas in the vacuum chamber, and the pressure was adjusted to 0.6 Pa. The power input from the DC power supply was set to 330 W. From the above, a Ti film was obtained.
次に、光吸収層の上に第３誘電体層としてまずＺｎＳｎＯ膜を成膜した。ターゲットにＳｎが５０ｗｔ％添加されたＺｎ（以下「ＺｎＳｎ」と記載することもある）ターゲット、真空チャンバー内の雰囲気ガスはアルゴンガスを１０ｓｃｃｍ、酸素ガスを５０ｓｃｃｍで導入し、圧力は０．４Ｐａに調節した。また、ＤＣ電源により投入する電力は１１００Ｗとした。以上よりＺｎＳｎＯ膜を得た。 Next, a ZnSnO film was first formed on the light absorption layer as a third dielectric layer. Zn (hereinafter sometimes referred to as "ZnSn") target in which 50 wt% of Sn is added to the target, the atmosphere gas in the vacuum chamber is introduced with argon gas at 10 sccm and oxygen gas at 50 sccm, and the pressure is 0.4 Pa. Adjusted. The power input by the DC power supply was set to 1100 W. From the above, a ZnSnO film was obtained.
次に、最上層としてＺｎＳｎＯ膜の上に、ＴｉＯ２膜を成膜した。ターゲットにＴｉターゲット、真空チャンバー内の雰囲気ガスはアルゴンガスを４０ｓｃｃｍ、酸素ガスを４０ｓｃｃｍで導入し、圧力を０．５Ｐａになるよう調節した。また、２０ｋＨｚのパルスを印加したＤＣ電源により投入する電力は３０５０Ｗとした。以上よりＴｉＯ２膜を得た。 Next, a TiO 2 film was formed on the ZnSnO film as the uppermost layer. A Ti target was introduced into the target, argon gas was introduced at 40 sccm and oxygen gas was introduced at 40 sccm as the atmosphere gas in the vacuum chamber, and the pressure was adjusted to 0.5 Pa. Further, the power input by the DC power supply to which the pulse of 20 kHz was applied was set to 3050 W. From the above, a TiO 2 film was obtained.
上記の方法と同様の方法で、各層の膜厚を表１に記載した通りとし、実施例１〜１１及び比較例１〜７のサンプルを得た。 By the same method as the above method, the film thickness of each layer was set as shown in Table 1, and samples of Examples 1 to 11 and Comparative Examples 1 to 7 were obtained.
（各種光学特性の測定）
得られた各サンプルについて、以下の各種光学特性を測定した。測定はいずれも自記分光光度計（日立製作所製、Ｕ−４０００）を用いた。また、得られた結果について、表２、３に記載した。
(Measurement of various optical characteristics)
The following various optical characteristics were measured for each of the obtained samples. A self-recording spectrophotometer (manufactured by Hitachi, Ltd., U-4000) was used for all measurements. The results obtained are shown in Tables 2 and 3.
（可視光透過率、可視光反射率）
可視光透過率及び可視光反射率は、ＪＩＳ Ｒ３１０６（１９９８）に準拠する方法で算出した。
(Visible light transmittance, visible light reflectance)
Visible light transmittance and visible light reflectance were calculated by a method conforming to JIS R3106 (1998).
（透過色、反射色）
透過色及び反射色は、ＪＩＳ Ｚ８７８１−４に準拠して、ａ＊及びｂ＊の値を算出した。また、反射色については、膜面反射とガラス面反射についてそれぞれａ＊及びｂ＊を求めた。
(Transparent color, reflective color)
For the transmitted color and the reflected color, the values of a * and b * were calculated in accordance with JIS Z8781-4. As for the reflected color, a * and b * were obtained for the film surface reflection and the glass surface reflection, respectively.
（光吸収層の確認）
実施例４、５、７、及び比較例５で用いた光吸収層について、可視光吸収率を以下の方法で算出した。まず、厚み３ｍｍのソーダライムガラス板上に、ガラス板／光吸収層／第３誘電体層をこの順でサンプルを形成し、ＪＩＳ Ｒ３１０６（１９９８）に準拠する方法で可視光吸収率Ａを算出した。ただし、上記実施例及び比較例では第３誘電体層として２層を積層している。本検討においては、光吸収層と接触している膜のみを「第３誘電体層」として用いることにした。次に、上記と同様のガラス板、及び第３誘電体層を、ガラス板上に、ガラス板／該第３誘電体層の順に形成し、可視光吸収率Ｂを算出した。次に、可視光吸収率Ａ−可視光吸収率Ｂを算出し、得られた値を光吸収層の可視光吸収率とした。なお、上記の光吸収層、第３誘電体層は、各実施例及び比較例と同様の種類及び膜厚とした。
(Confirmation of light absorption layer)
The visible light absorption rate of the light absorption layers used in Examples 4, 5, 7 and Comparative Example 5 was calculated by the following method. First, a sample of a glass plate / light absorption layer / third dielectric layer is formed in this order on a soda lime glass plate having a thickness of 3 mm, and the visible light absorption rate A is calculated by a method conforming to JIS R3106 (1998). did. However, in the above Examples and Comparative Examples, two layers are laminated as the third dielectric layer. In this study, only the film in contact with the light absorption layer is used as the "third dielectric layer". Next, the same glass plate and the third dielectric layer as described above were formed on the glass plate in the order of the glass plate / the third dielectric layer, and the visible light absorption rate B was calculated. Next, the visible light absorption rate A-visible light absorption rate B was calculated, and the obtained value was used as the visible light absorption rate of the light absorption layer. The light absorption layer and the third dielectric layer were of the same type and film thickness as those of the Examples and Comparative Examples.
次に、比較例２、３で用いたバリア層についても、上記と同様の手法で可視光吸収率を算出した。この時、ガラス板／バリア層／第２誘電体層の順でサンプルを形成した。以上の結果を表２に示した。 Next, for the barrier layers used in Comparative Examples 2 and 3, the visible light absorption rate was calculated by the same method as described above. At this time, samples were formed in the order of glass plate / barrier layer / second dielectric layer. The above results are shown in Table 2.
実施例及び比較例の中で、実施例４の光吸収層は最も膜厚が薄く、実施例５の光吸収層は最も膜厚が厚い。どちらの場合も可視光吸収率が２０〜３０％の範囲内となった。また、実施例７と比較例５は光吸収層は同じ厚みだが、上に形成した第３誘電体層の膜厚が２倍以上異なる。どちらも可視光吸収率は同程度であり、上に形成する第３誘電体層の膜厚の影響は大きくないことがわかった。 Among the examples and comparative examples, the light absorption layer of Example 4 has the thinnest film thickness, and the light absorption layer of Example 5 has the thickest film thickness. In both cases, the visible light absorption rate was in the range of 20 to 30%. Further, in Example 7 and Comparative Example 5, the light absorption layer has the same thickness, but the film thickness of the third dielectric layer formed above is more than twice as different. It was found that the visible light absorption rate was about the same in both cases, and the influence of the film thickness of the third dielectric layer formed on the upper layer was not large.
また、参考例としてバリア層の可視光吸収率を測定したところ、可視光吸収率は６％未満となった。また、上に形成する第２誘電体層の厚みが変わっても、前述した光吸収層の場合と同様、可視光吸収率に大きな差はないことがわかった。 Moreover, when the visible light absorption rate of the barrier layer was measured as a reference example, the visible light absorption rate was less than 6%. Further, it was found that even if the thickness of the second dielectric layer formed above changes, there is no significant difference in the visible light absorption rate as in the case of the light absorption layer described above.
（比較例８〜１５）
各層の積層順及び各膜厚を表４に記載した通りとした他は、実施例１と同様の方法で低放射ガラスを得た。なお、光吸収層を形成した位置は、比較例８、１２では第１誘電体層とガラス板との間、比較例９、１３では第１誘電体層を２層として該第１誘電体層の２層の間、比較例１０、１４では第１誘電体層とＡｇ層との間、及び比較例１１、１５ではＡｇ層と第２誘電体層との間とした。
(Comparative Examples 8 to 15)
Low emissivity glass was obtained in the same manner as in Example 1 except that the stacking order of each layer and each film thickness were as shown in Table 4. In Comparative Examples 8 and 12, the position where the light absorption layer was formed was between the first dielectric layer and the glass plate, and in Comparative Examples 9 and 13, the first dielectric layer was used as two layers and the first dielectric layer was formed. Between the two layers, in Comparative Examples 10 and 14, it was between the first dielectric layer and the Ag layer, and in Comparative Examples 11 and 15, it was between the Ag layer and the second dielectric layer.
比較例８〜１５について、前述した光学特性の測定方法と同様の方法で、可視光透過率、可視光反射率、及び透過光と反射光の色を求めた。得られた結果を表５に記載した。 With respect to Comparative Examples 8 to 15, the visible light transmittance, the visible light reflectance, and the colors of the transmitted light and the reflected light were determined by the same method as the above-mentioned method for measuring the optical characteristics. The results obtained are shown in Table 5.
実施例１〜１１、及び比較例１〜１５の各光学特性について、図２に透過光のａ＊とｂ＊をプロットした図、図３に膜面反射のａ＊とｂ＊をプロットした図、図４にガラス面反射のａ＊とｂ＊をプロットした図、をそれぞれ示した。図２〜４より、実施例１〜１１は、いずれもグレー色調を示す数値の範囲内であることがわかった。また、いずれの実施例も可視光透過率は６５％以下であり、グレー色調を示す数値の範囲内となった。さらに、膜面反射の可視光反射率が７％以下、ガラス面反射の可視光反射率が１９％以下であり、目視観察においてもギラつき等を生じないものだった。 For each optical characteristic of Examples 1 to 11 and Comparative Examples 1 to 15, a diagram in which transmitted light a * and b * are plotted in FIG. 2 and a diagram in which film surface reflections a * and b * are plotted in FIG. , A figure in which a * and b * of the glass surface reflection are plotted is shown in FIG. 4, respectively. From FIGS. 2 to 4, it was found that all of Examples 1 to 11 were within the range of numerical values indicating a gray color tone. In addition, the visible light transmittance was 65% or less in each of the examples, which was within the range of the numerical values indicating the gray color tone. Further, the visible light reflectance of the film surface reflection was 7% or less, and the visible light reflectance of the glass surface reflection was 19% or less, so that no glare or the like occurred even in visual observation.
一方で、Ａｇ層が１１ｎｍである比較例１は、膜面反射の反射色のａ＊が赤色味を呈する値となり、また、ｂ＊が濃い青色味を呈する値となり、本発明の目的には適さないものとなった。また、第２誘電体層の膜厚の比率が請求項１の範囲外である比較例２、３は、膜面反射又はガラス面反射の反射色が赤色味を帯びた。また、第２誘電体層と第３誘電体層の膜厚の合計値が請求項１の範囲外となる比較例４、５は、ガラス面反射の反射色が赤色味を帯びたり、透過色が黄色味を帯びたりしてガラス面反射率が高くなった。また、第１誘電体層の膜厚が請求項１の範囲外となる比較例６、７は、膜面反射の反射光の青色味が濃くなりガラス面反射率が高くなってしまい、膜面反射及びガラス面反射において、赤色味を呈してしまうものとなった。 On the other hand, in Comparative Example 1 in which the Ag layer is 11 nm, the reflected color a * of the film surface reflection has a value of reddish color, and b * has a value of exhibiting a deep blue color, which is the object of the present invention. It became unsuitable. Further, in Comparative Examples 2 and 3 in which the ratio of the film thickness of the second dielectric layer was out of the range of claim 1, the reflection color of the film surface reflection or the glass surface reflection was reddish. Further, in Comparative Examples 4 and 5 in which the total value of the film thicknesses of the second dielectric layer and the third dielectric layer is out of the range of claim 1, the reflected color of the glass surface reflection is reddish or the transmitted color. However, it became yellowish and the glass surface reflectance became high. Further, in Comparative Examples 6 and 7 in which the film thickness of the first dielectric layer is out of the range of claim 1, the bluish tint of the reflected light reflected on the film surface becomes deep and the glass surface reflectance becomes high, so that the film surface becomes high. In the reflection and the glass surface reflection, it became reddish.
比較例８〜１１は、低放射膜のうちで光吸収層を形成する位置を変えた例であるが、いずれの比較例においてもグレー色調が得られなかった。また、比較例１２〜１５は、光吸収層を比較例８〜１１と同様の位置に形成した低放射膜において、グレー色調に近付ける為に各層の膜厚を変えた例である。しかし、いずれの場合もグレー色調を得る事が出来なかった。 Comparative Examples 8 to 11 are examples in which the position of forming the light absorption layer in the low emissivity film was changed, but no gray color tone was obtained in any of the comparative examples. Further, Comparative Examples 12 to 15 are examples in which the film thickness of each layer is changed in order to bring the light absorption layer closer to the gray color tone in the low emissivity film formed at the same position as Comparative Examples 8 to 11. However, in either case, it was not possible to obtain a gray color tone.
Ｇ：ガラス板、２：Ａｇ層、３：バリア層、４：光吸収層、１１：第１誘電体層、１２：第２誘電体層、１３：第３誘電体層 G: Glass plate, 2: Ag layer, 3: Barrier layer, 4: Light absorption layer, 11: First dielectric layer, 12: Second dielectric layer, 13: Third dielectric layer
Claims (6)
該低放射膜が、ガラス板表面から順に、第１誘電体層、Ａｇ層、第２誘電体層、光吸収層、及び第３誘電体層、が積層されたものであり、
該第１誘電体層の光学膜厚が４５〜８０ｎｍ、
該Ａｇ層の物理膜厚が７〜１０ｎｍ、
該第２誘電体層と該第３誘電体層の光学膜厚の合計が７５〜１１０ｎｍ、及び
該第２誘電体層と該第３誘電体層の膜厚の合計値に対する、該第２誘電体層の膜厚が１８〜５５％であり、
透過光の可視光透過率が６５％以下であり、透過色がグレー色であり、
反射光の可視光反射率は２０％未満であり、反射色がニュートラル〜青色であることを特徴とするグレー色調低放射ガラス。 In gray-colored low-emissivity glass in which a low-emissivity film having one Ag layer is formed on the surface of a glass plate and the visual appearance is grayish.
The low emissivity film is formed by laminating a first dielectric layer, an Ag layer, a second dielectric layer, a light absorption layer, and a third dielectric layer in order from the surface of the glass plate.
The optical film thickness of the first dielectric layer is 45 to 80 nm.
The physical film thickness of the Ag layer is 7 to 10 nm.
The total optical film thickness of the second dielectric layer and the third dielectric layer is 75 to 110 nm, and the second dielectric is relative to the total film thickness of the second dielectric layer and the third dielectric layer. the thickness of the body layer Ri 18-55% der,
The visible light transmittance of the transmitted light is 65% or less, the transmitted color is gray, and the transmitted color is gray.
Visible light reflectance of the reflected light is less than 20%, gray tone low emissivity glass reflected color characterized by neutral-blue der Rukoto.
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| JP7225734B2 (en) * | 2018-11-26 | 2023-02-21 | Tdk株式会社 | Transparent conductors, dimming bodies and transparent heating elements |
| WO2020198480A1 (en) | 2019-03-28 | 2020-10-01 | Vitro Flat Glass Llc | Article having a high visible light reflectance and a neutral color |
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