JP6649428B2 - イオン感応性電荷蓄積回路および方法 - Google Patents
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Description
本出願は、2010年6月30日に出願された米国仮特許出願第61/360,493号、2010年7月1日に出願された米国仮特許出願第61/360,495号、および2010年7月3日に出願された米国仮特許出願第61/361,403号に対する優先権を主張し、これらの各々は、その全体が参照により本明細書に組み込まれる。
電子装置および構成部品は、特に、様々な化学的および生物反応の検出および測定、ならびに各種化合物の識別、検出および測定のために、化学および生物学(より一般には「生命科学」)において多数の応用を見出した。このような電子装置の1つは、イオン感応電界効果トランジスタと称され、「ISFET」(またはpHFET)として、関連文献においてしばしば示されている。ISFETは、溶液の水素イオン濃度(一般的に「pH」として示される)の測定を容易にするために、主として学術的な研究コミュニティにおいて、従来から調査されている。本明細書で参照される化学的感応性センサを、ISFET、phFET、chemFetまたは同様の機能を実行することができる他のいくつかのトランジスタ装置を用いて実行してもよい。
以下に、本発明の基本的な諸特徴および種々の態様を列挙する。
[1]
第1の電極に印加された第1の制御信号に呼応してゲート半導体領域への電荷の進入を制御するための、該第1の電極の半導体領域の上方にある第1の電荷制御電極と、
流体を受け入れるように構成された、ゲート半導体領域上且つイオン感応性パッシベーション表面下の電気的フローティングゲート構造と、
第2の電極に印加された第2の制御信号に呼応して該ゲート半導体領域外およびドレイン拡散領域内への複数の電荷パケットの転送を制御するための、該第2の電極の半導体領域の上方にある第2の電荷制御電極と、
該第2の電極の半導体領域を介して該ゲート半導体領域から該複数の電荷パケットを受け入れるための、ドレイン拡散領域と
を備える、該流体のイオン濃度に応じて該複数の電荷パケットを蓄積するための電荷蓄積デバイス、
出力電圧が溶液のイオン濃度を表す、該電荷蓄積デバイスの該ドレイン拡散領域に蓄積された該複数の電荷パケットに応じて該出力電圧を生成するための、少なくとも1つの制御および読み出しトランジスタ
を備える、イオン感応性回路。
[2]
前記第1の電極の半導体領域を介して前記ゲート半導体領域内に電荷を注入するための注入制御信号を発生させかつ供給するように構成された、制御回路
をさらに備える、[1]に記載のイオン感応性回路。
[3]
前記第1の電極の半導体領域に隣接したソース拡散領域をさらに備え、前記注入制御信号が、該ソース拡散領域を介して前記ゲート半導体領域内および該第1の電極の半導体領域内に前記電荷を注入するために該ソース拡散領域に供給された電源制御信号を含む、[2]に記載のイオン感応性回路。
[4]
前記ゲート半導体領域から前記第2の電極の半導体領域を介して前記ドレイン拡散領域に各々の前記複数の電荷パケットを個々に1つずつ移動させるために、前記第2の制御電極に対する前記第2の制御信号を発生させかつ供給するための、制御回路
をさらに備える、[1]に記載のイオン感応性回路。
[5]
前記ゲート半導体領域から前記ドレイン拡散領域に前記複数の電荷パケットを個々に1つずつ移動させた後に、出力信号を発生させるために前記少なくとも1つの読み出しトランジスタに対する読み出し制御信号を発生させかつ供給するための、制御回路
をさらに備える、[1]に記載のイオン感応性回路。
[6]
前記電荷蓄積デバイスおよび前記少なくとも1つの読み出しトランジスタが、画素回路を形成し、且つ前記イオン感応性回路が、イオン感応性画素アレイに配置された複数の該画素回路をさらに備える、[1]に記載のイオン感応性回路。
[7]
前記画素アレイが、画素回路の複数の行と複数の列とを含み、各行が1つ以上の行制御およびデータ線を含み、且つ各列が、1つ以上の列制御およびデータ線を含む、[6]に記載のイオン感応性回路。
[8]
前記ゲート半導体領域から前記第2の電極の半導体領域を介して前記ドレイン拡散領域に選択可能な電荷パケット蓄積頻度で前記複数の電荷パケットの各々を個々に移動させるための前記電荷蓄積デバイスを制御するように構成された、制御回路
をさらに備える、[1]に記載のイオン感応性回路。
[9]
前記電荷蓄積デバイスと、前記ドレイン拡散領域に蓄積された前記複数の電荷パケットに応じて選択可能な出力発生頻度で出力信号を発生させるための前記少なくとも1つの読み出しトランジスタとを制御するように構成された、制御回路
をさらに備える、[1]に記載のイオン感応性回路。
[10]
前記少なくとも1つの制御および読み出しトランジスタが、
前記電荷蓄積デバイスの前記ドレイン拡散領域に、行制御線に、および列制御線に接続された、リセットトランジスタと、
該電荷蓄積デバイスの該ドレイン拡散領域に、該列制御線に、および列データ線に接続された、第1および第2の読み出しトランジスタと
を備え、
該第1の読み出しトランジスタがソースフォロアー構成において接続され、且つ該第2の読み出しトランジスタがカスコード構成において接続される、
[1]に記載のイオン感応性回路。
[11]
前記少なくとも1つの制御および読み出しトランジスタが、
前記電荷蓄積デバイスの前記ドレイン拡散領域に、行制御線に、および列制御線に接続された、リセットトランジスタと、
該電荷蓄積デバイスの該ドレイン拡散領域に、該電荷蓄積デバイスのソース拡散領域に、該列制御線に、および列データ線に接続された、読み出しトランジスタと
を備える、[1]に記載のイオン感応性回路。
[12]
前記少なくとも1つの制御および読み出しトランジスタが、
前記電荷蓄積デバイスの前記ドレイン拡散領域に、行制御線に、および列制御線に接続された、リセットトランジスタと、
該電荷蓄積デバイスの該ドレイン拡散領域に、該列制御線に、および列データ線に接続された、読み出しトランジスタと
を備える、[1]に記載のイオン感応性回路。
[13]
前記電荷蓄積デバイスが、前記第1の電極の半導体領域に隣接したソース拡散領域を備え、該第1の電極の半導体領域が、前記ゲート半導体領域に隣接し、該ゲート電極半導体領域が、前記第2の電極の半導体領域に隣接し、且つ該第2の電極の半導体領域が、前記ドレイン拡散領域に隣接している、[1]に記載のイオン感応性回路。
[14]
前記電荷蓄積デバイスが、前記複数の電荷パケットを前記ドレイン拡散領域に移動させる前に第3の電極の半導体領域内の該複数の電荷パケットの前記蓄積を制御するために、該第3の電極の半導体領域の上方にある第3の電荷制御電極を備える、[1]に記載のイオン感応性回路。
[15]
イオン感応性回路の電荷蓄積デバイスのゲート構造の上方にあるイオン感応性パッシベーション表面において、イオン濃度をもつ流体を通過させるステップと、
該流体内のイオン濃度に応じて、該ゲート構造下の該電荷蓄積デバイスのゲート半導体領域内において、複数の電荷パケットを1つずつ個々に形成するステップと、
該ゲート半導体領域からの該電荷パケットの1つずつの転送を制御するために、該電荷蓄積デバイスの電極の半導体領域の上方にある制御電極に制御信号を印加するステップと、
選択可能な電荷パケット蓄積頻度で、該電荷蓄積デバイスのドレイン拡散領域に該複数の電荷パケットを蓄積するステップと、
該ドレイン領域に蓄積された該複数の電荷パケットに応じて、選択可能な出力信号発生頻度で、少なくとも1つの制御および読み出しトランジスタを用いて出力信号を発生させるステップであって、該出力信号が該流体内のイオン濃度の大きさを表す、ステップと
を含む、該流体の該イオン濃度を検出する方法。
[16]
前記制御電極に前記制御信号を印加する前記ステップに呼応して、該電極の半導体領域を介して前記複数の電荷パケットを1つずつ個々に転送するステップをさらに含む、[15]に記載の方法。
[17]
前記電荷パケットを形成するための電荷を供給するために、第2の制御電極領域を介してソース領域から前記ゲート半導体領域内に電荷を注入するステップをさらに含む、[15]に記載の方法。
[18]
前記複数の電荷パケットを蓄積する前に、前記ドレイン拡散領域にあらかじめ蓄積されたあらゆる電荷パケットを取り除くステップをさらに含む、[15]に記載の方法。
[19]
前記出力信号発生頻度が、前記電荷パケット蓄積頻度未満である、[15]に記載の方法。
イオン感応性回路は、流体のイオン濃度に応じて複数の電荷パケットを蓄積するための電荷蓄積デバイスと、蓄積された複数の電荷パケットに応じて出力信号を発生させるための少なくとも1つの制御および読み出しトランジスタとを備えることができ、その出力信号は、溶液のイオン濃度を表す。電荷蓄積デバイスは、第1の電極の半導体領域の上方にある第1の電荷制御電極と、ゲート半導体領域上且つイオン感応性パッシベーション表面下の電気的フローティングゲート構造と、第2の電極の半導体領域の上方にある第2の電荷制御電極と、ドレイン拡散領域とを備えることができる。第1の制御電極は、第1の制御信号に呼応して、ゲート半導体領域への電荷の進入を制御することができる。イオン感応性パッシベーション表面は、流体を受け入れるように構成することができる。第2の電荷制御電極は、第2の制御信号に呼応して、ゲート半導体領域外およびドレイン拡散領域内への複数の電荷パケットの転送を制御することができる。ドレイン拡散領域は、第2の電極の半導体領域を介してゲート半導体領域から複数の電荷パケットを受け入れることができる。
Claims (14)
- 基板上のゲート酸化物層が形成された、該基板と、
第1の電極に印加された第1の制御信号に呼応してゲート半導体領域への電荷の進入を制御するための、該第1の電極の半導体領域上に形成され、かつ該ゲート酸化物層上に配置された第1の電荷制御電極と、
流体を受け入れるように構成された、ゲート半導体領域上且つイオン感応性パッシベーション表面下の電気的フローティングゲート構造であって、該電気的フローティングゲートが、ゲート電極、少なくとも2つの金属層電極、およびそれに対応するビア相互接続を含み、ならびに該ビア相互接続が、該ゲート電極と、該少なくとも2つの金属層電極を接続するように構成された、電気的フローティングゲート構造と、
第2の電極に印加された第2の制御信号に呼応して該ゲート半導体領域外およびドレイン拡散領域内への複数の電荷パケットの転送を制御するための、該第2の電極の半導体領域上に形成され、かつ該ゲート酸化物層上に配置された第2の電荷制御電極と、
該第2の電極の半導体領域を介して該ゲート半導体領域から該複数の電荷パケットを受け入れるための、ドレイン拡散領域と
を備える、該流体のイオン濃度に応じて該複数の電荷パケットを蓄積するための電荷蓄積デバイス、
出力電圧が溶液のイオン濃度を表す、該電荷蓄積デバイスの該ドレイン拡散領域に蓄積された該複数の電荷パケットに応じて該出力電圧を生成するための、少なくとも1つの制御および読み出しトランジスタ
を備える、イオン感応性回路。 - 前記第1の電極の半導体領域を介して前記ゲート半導体領域内に電荷を注入するための注入制御信号を発生させかつ供給するように構成された、制御回路
をさらに備える、請求項1に記載のイオン感応性回路。 - 前記第1の電極の半導体領域に隣接したソース拡散領域をさらに備え、前記注入制御信号が、該ソース拡散領域を介して前記ゲート半導体領域内および該第1の電極の半導体領域内に前記電荷を注入するために該ソース拡散領域に供給された電源制御信号を含む、請求項2に記載のイオン感応性回路。
- 前記ゲート半導体領域から前記第2の電極の半導体領域を介して前記ドレイン拡散領域に各々の前記複数の電荷パケットを個々に1つずつ移動させるために、前記第2の電荷制御電極に対する前記第2の制御信号を発生させかつ供給するための、制御回路
をさらに備える、請求項1に記載のイオン感応性回路。 - 前記ゲート半導体領域から前記ドレイン拡散領域に前記複数の電荷パケットを個々に1つずつ移動させた後に、出力信号を発生させるために前記少なくとも1つの読み出しトランジスタに対する読み出し制御信号を発生させかつ供給するための、制御回路
をさらに備える、請求項1に記載のイオン感応性回路。 - 前記電荷蓄積デバイスおよび前記少なくとも1つの読み出しトランジスタが、画素回路を形成し、且つ前記イオン感応性回路が、イオン感応性画素アレイに配置された複数の該画素回路をさらに備える、請求項1に記載のイオン感応性回路。
- 前記画素アレイが、画素回路の複数の行と複数の列とを含み、各行が1つ以上の行制御およびデータ線を含み、且つ各列が、1つ以上の列制御およびデータ線を含む、請求項6に記載のイオン感応性回路。
- 前記ゲート半導体領域から前記第2の電極の半導体領域を介して前記ドレイン拡散領域に選択可能な電荷パケット蓄積頻度で前記複数の電荷パケットの各々を個々に移動させるための前記電荷蓄積デバイスを制御するように構成された、制御回路
をさらに備える、請求項1に記載のイオン感応性回路。 - 前記電荷蓄積デバイスと、前記ドレイン拡散領域に蓄積された前記複数の電荷パケットに応じて選択可能な出力発生頻度で出力信号を発生させるための前記少なくとも1つの読み出しトランジスタとを制御するように構成された、制御回路
をさらに備える、請求項1に記載のイオン感応性回路。 - 前記少なくとも1つの制御および読み出しトランジスタが、
前記電荷蓄積デバイスの前記ドレイン拡散領域に、行制御線に、および列制御線に接続された、リセットトランジスタと、
該電荷蓄積デバイスの該ドレイン拡散領域に、該列制御線に、および列データ線に接続された、第1および第2の読み出しトランジスタと
を備え、
該第1の読み出しトランジスタがソースフォロアー構成において接続され、且つ該第2の読み出しトランジスタがカスコード構成において接続される、
請求項1に記載のイオン感応性回路。 - 前記少なくとも1つの制御および読み出しトランジスタが、
前記電荷蓄積デバイスの前記ドレイン拡散領域に、行制御線に、および列制御線に接続された、リセットトランジスタと、
該電荷蓄積デバイスの該ドレイン拡散領域に、該電荷蓄積デバイスのソース拡散領域に、該列制御線に、および列データ線に接続された、読み出しトランジスタと
を備える、請求項1に記載のイオン感応性回路。 - 前記少なくとも1つの制御および読み出しトランジスタが、
前記電荷蓄積デバイスの前記ドレイン拡散領域に、行制御線に、および列制御線に接続された、リセットトランジスタと、
該電荷蓄積デバイスの該ドレイン拡散領域に、該列制御線に、および列データ線に接続された、読み出しトランジスタと
を備える、請求項1に記載のイオン感応性回路。 - 前記電荷蓄積デバイスが、前記第1の電極の半導体領域に隣接したソース拡散領域を備え、該第1の電極の半導体領域が、前記ゲート半導体領域に隣接し、該ゲート半導体領域が、前記第2の電極の半導体領域に隣接し、且つ該第2の電極の半導体領域が、前記ドレイン拡散領域に隣接している、請求項1に記載のイオン感応性回路。
- 前記電荷蓄積デバイスが、前記複数の電荷パケットを前記ドレイン拡散領域に移動させる前に第3の電極の半導体領域内の該複数の電荷パケットの前記蓄積を制御するために、該第3の電極の半導体領域の上方にある第3の電荷制御電極を備える、請求項1に記載のイオン感応性回路。
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TWI547688B (zh) | 2016-09-01 |
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US20140367750A1 (en) | 2014-12-18 |
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JP2013533482A (ja) | 2013-08-22 |
JP2018109654A (ja) | 2018-07-12 |
TW201221950A (en) | 2012-06-01 |
TWI624665B (zh) | 2018-05-21 |
JP2016128841A (ja) | 2016-07-14 |
CN103154718B (zh) | 2015-09-23 |
JP2020073910A (ja) | 2020-05-14 |
AU2011226767B1 (en) | 2011-11-10 |
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