JP6534577B2 - Substrate processing equipment - Google Patents

Description

  The present invention relates to a substrate processing apparatus that detects a leak of a fluid used in a substrate processing apparatus.

  Substrate processing equipment that processes substrates such as glass substrates for organic EL displays, glass substrates for liquid crystal displays, panel substrates for solar cells, glass substrates for plasma displays, glass substrates for photomasks, substrates for optical disks, semiconductor wafers, etc. A variety of fluids such as liquids such as treatment liquids and gases such as inert gases are used. The fluid is controlled by the opening and closing operation of the valve.

  In such a substrate processing apparatus, it is necessary to detect fluid leakage from the valve. Patent Document 1 discloses a substrate processing apparatus that detects the leakage of the processing liquid by a suck back method. In the substrate processing apparatus described in Patent Document 1, after the valve is closed, the suction operation of the processing liquid piping is performed by the suction device. And the structure which detects the leak of a process liquid is employ | adopted by whether the process liquid is detected with a liquid level sensor.

Patent No. 5030767

  In the substrate processing apparatus described in Patent Document 1, since it is necessary to execute the suction operation of the processing liquid piping when preventing the processing liquid from leaking, not only the time required for suction is required but also the processing liquid There is a problem that the processing liquid in the piping is wasted.

  On the other hand, in general, a flowmeter is often provided in such a processing liquid supply path, and it is not impossible to detect the leakage of the processing liquid using this flowmeter. However, in order to detect a slight leak of the processing solution, it is necessary to use an expensive flow meter capable of detecting a minute flow rate. In addition, when the processing liquid is flowing a certain amount, it is possible to accurately detect the flow rate by the flow meter, but in the state where the processing liquid flow is stopped, the flow meter misdetects due to bubbling in the processing liquid. May cause.

  The present invention has been made to solve the above-described problems, and has an object of providing a substrate processing apparatus capable of accurately detecting a fluid leakage used in a substrate processing apparatus while having a simple configuration. I assume.

According to one aspect of the present invention, a valve disposed in the flow path of the treatment solution used in the substrate processing apparatus, is disposed downstream of the valve, the leakage of the treatment liquid from the valve A substrate processing apparatus comprising: a leak detection unit for detecting, wherein the leak detection unit includes a hollow member in which a flow path of the processing liquid is formed, and a flow of the processing liquid in the hollow member. And a sensor for detecting the position of the movable member, wherein the hollow member subtracts the cross-sectional area of the movable member from the cross-sectional area of the flow path of the processing liquid. the opening is constant, or, with a larger movement area toward the downstream side from the upstream side of the flow path of the treatment liquid, and a open area greater than the opening the moving area, the valve When the leakage occurs during the closing of the As well as detected by the sensor that it has moved by moving area, in a state in which the valve is opened, characterized in that said movable member is moved to the open area.

According to a second aspect of the present invention, there is provided a valve disposed in a flow path of a processing liquid used in a substrate processing apparatus, and a valve disposed downstream of the valve, the leakage of the processing liquid from the valve. A substrate processing apparatus comprising: a leak detection unit for detecting, wherein the leak detection unit includes a hollow member in which a flow path of the processing liquid is formed, and a flow of the processing liquid in the hollow member. And a sensor for detecting the position of the movable member, wherein the hollow member subtracts the cross-sectional area of the movable member from the cross-sectional area of the flow path of the processing liquid. The valve includes: a moving area whose opening degree is constant or increases as going from the upstream side to the downstream side of the flow path of the processing liquid ; and a retraction area where the movable member retracts from the flow path , the valve When the leakage occurs during the closing of the As well as detected by the sensor that it has moved by-pass, in a state in which the valve is opened, characterized in that said movable member is retracted into the save area.

  According to the first and second aspects of the invention, by detecting the position of the movable member by the sensor, it is possible to accurately detect the fluid leakage.

It is a schematic diagram for explaining the composition of the substrate processing device concerning this invention. It is a schematic diagram showing leak detection part 40 concerning a 1st embodiment with opening and closing valve 23. It is a block diagram which shows the main control systems in this substrate processing apparatus. It is a schematic diagram showing leak detection part 40 concerning a 2nd embodiment with opening and closing valve 23. It is a schematic diagram showing leak detection part 40 concerning a 3rd embodiment with opening and closing valve 23. It is a schematic diagram showing leak detection part 40 concerning a 4th embodiment with opening and closing valve 23.

  Hereinafter, embodiments of the present invention will be described based on the drawings. FIG. 1 is a schematic view for explaining the configuration of a substrate processing apparatus according to the present invention.

  The substrate processing apparatus is for processing the substrate 100 by supplying a processing solution to a circular substrate 100 such as a semiconductor wafer. The substrate processing apparatus includes a support pin 11 for supporting a substrate 100 at its edge, and a spin chuck 12 that rotates around an axis facing the substrate 100 along the vertical direction.

  The substrate processing apparatus also includes a processing liquid nozzle 15 for supplying a processing liquid to the substrate 100. The treatment liquid nozzle 15 is supported by a swing arm 14 connected to the rotation shaft 13, and swings around the rotation shaft 13 together with the swing arm 14. Further, the treatment liquid nozzle 15 is connected to the treatment liquid supply mechanism 20. The front end of the processing liquid nozzle 15 is moved along a circular arc-shaped locus including the rotation center and the edge of the substrate 100 held by the spin chuck 12 so that the entire surface of the substrate 100 is scanned while scanning the surface. It is possible to supply the processing solution to the

  The substrate processing apparatus also includes a pre-dispensing pod 31 for pre-dispensing the processing liquid in the processing liquid nozzle 15 before applying the processing liquid to the substrate 100. The pre-dispensing pod 31 is connected to a processing liquid recovery unit (not shown) via a drainage pipe 32.

  The treatment liquid supply mechanism 20 includes treatment liquid pipes 26 and 27 for feeding the treatment liquid from the treatment liquid tank 21 storing the treatment liquid to the treatment liquid nozzle 15. The processing liquid piping 26 includes a pump 22 for pressure-feeding the processing liquid in the processing liquid tank 21, an open / close valve 23 for supplying and stopping the processing liquid, and the processing liquid supplied to the processing liquid nozzle 15. A flow control valve 24 and a flow meter 25 for adjusting the flow rate are provided.

  Further, a leak detection unit 40, which is a feature of the present invention for detecting a leak of the processing liquid, is disposed between the processing liquid pipe 26 and the processing liquid pipe 27. In the substrate processing apparatus, when the processing liquid leaks due to the failure of the on-off valve 23, the processing liquid flows out from the processing liquid nozzle 15. Therefore, in the substrate processing apparatus, the leakage detection unit 40 is disposed between the on-off valve 23 downstream of the on-off valve 23 and the processing liquid nozzle 15 in order to detect the leakage of the processing liquid. There is.

  FIG. 2 is a schematic view showing the leak detection unit 40 according to the first embodiment together with the on-off valve 23. In FIG. 2, the flow control valve 24 and the flow meter 25 shown in FIG. 1 are omitted. FIG. 2 (a) shows a state in which the treatment liquid has not leaked, and FIG. 2 (b) shows a state in which the treatment liquid has leaked.

  The leak detection unit 40 reciprocates along the flow direction of the processing liquid from the processing liquid pipe 26 to the processing liquid pipe 27 in the hollow member 41 in which the flow path of the processing liquid is formed, and in the hollow member 41. The movable member 44 includes a movable member 44, and a sensor 53 (see FIG. 3 described later) including a light emitting unit 51 and a light receiving unit 52 for detecting the position of the movable member 44.

  The hollow member 41 has an opening 45 serving as an inlet for the processing liquid disposed at the lower end thereof, a moving area 42, an open area 43, and an opening serving as an outlet for the processing liquid disposed at the upper end thereof. And 46. In the movement region 42, the opening degree of the hollow member 41 obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid increases as going from the upstream side to the downstream side of the flow path of the treatment liquid Region. Further, the open area 43 is an area of the hollow member 41 in which the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid is larger than the movement area 42.

  The movable member 44 has a spherical shape, and is made of a material having a specific gravity greater than that of the processing liquid flowing in the hollow member 41. The sensor 53 including the light emitting unit 51 and the light receiving unit 52 is configured to detect whether the movable member 44 is at the lower end of the moving area 42.

  FIG. 3 is a block diagram showing a main control system in this substrate processing apparatus. In addition, in this figure, only the control system concerning leak detection is shown.

  The substrate processing apparatus includes a CPU that executes a logical operation, a ROM that stores an operation program required to control the apparatus, a RAM that temporarily stores data etc. during control, and a control unit that controls the entire apparatus. 50 is provided. The control unit 50 is connected to the above-described open / close valve 23 and the sensor 53 including the light emitting unit 51 and the light receiving unit 52. The control unit 50 is also connected to a warning display unit 59 that generates a warning display and a warning sound.

  In the leak detection unit 40 of the substrate processing apparatus having the above configuration, when the on-off valve 23 is closed and the processing liquid is blocked at the on-off valve 23, the specific gravity of the movable member 44 is larger than the processing liquid Thus, as shown in FIG. 2A, the movable member 44 is disposed at the lower end portion of the moving area 42 of the hollow member 41. At this time, as shown by the arrow in FIG. 2A, the light emitted from the light emitting unit 51 in the sensor 53 is blocked by the movable member 44 and does not reach the light receiving unit 52. In the control unit 50, in the state where the open / close valve 23 is closed and the sensor 53 detects the movable member 44 (that is, the light from the light projecting unit 51 has not reached the light receiving unit 52) It is determined that the treatment liquid has not leaked.

  On the other hand, when leakage occurs while the on-off valve 23 is closed, the processing liquid flows into the hollow member 41 from the opening 45 of the hollow member 41. Then, as shown in FIG. 2B, the movable member 44 floats upward from the lower end portion of the moving region 42 of the hollow member 41 shown in FIG. 2A by the flow of the processing liquid. That is, in the moving area 42, the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid increases from the upstream side to the downstream side of the flow path of the treatment liquid. Thus, even when the processing liquid with a small flow rate flows into the hollow member 41, the movable member 44 floats upward.

  When the movable member 44 floats up, as shown by the arrow in FIG. 2B, the light emitted from the light projector 51 in the sensor 53 is not blocked by the movable member 44, and the light receiver 52 as it is. To reach. In the control unit 50, in the state where the open / close valve 23 is closed and the sensor 53 does not detect the movable member 44 (that is, the light from the light projection unit 51 reaches the light reception unit 52) It is determined that the treatment liquid has leaked. Then, the control unit 50 transmits a signal for performing a warning display to the warning display unit 59.

  Immediately after the on-off valve 23 is closed, a small amount of processing solution may pass through the hollow member 41. For this reason, after a predetermined time has elapsed since the on-off valve 23 is closed, the determination of leakage may be made.

  When the on-off valve 23 is opened to supply the processing liquid from the processing liquid nozzle 15 to the substrate 100, a large amount of processing liquid flows into the hollow member 41. At this time, as shown by a phantom line in FIG. 2B, the movable member 44 has an opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid From the moving area 42 which becomes larger as going to the downstream side, the opening surface ascends to an open area 43 where the degree of opening is larger than the moving area 42. In the open area 43, the movable member 44 interferes with the supply of the treatment liquid because the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid is sufficiently large. There is no need to

  According to the leak detection unit 40 having such a configuration, it is not necessary to perform the suction operation of the process liquid pipes 26, 27 to detect a leak as in the substrate processing apparatus described in Patent Document 1 described above. Also, as in the case of detecting a leak using a flow meter, there is no fear of malfunction due to bubbling of the processing solution. Further, by adjusting the height positions of the light emitting unit 51 and the light receiving unit 52 in the sensor 53, it is possible to change the flow rate of the processing liquid for detecting the leak.

  Next, another embodiment of the present invention will be described. FIG. 4 is a schematic view showing the leak detection unit 40 according to the second embodiment together with the on-off valve 23. Here, about the member similar to 1st Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted. In FIG. 4, the flow control valve 24 and the flow meter 25 shown in FIG. 1 are omitted. FIG. 4 (a) shows a state in which the treatment liquid has not leaked, and FIG. 4 (b) shows a state in which the treatment liquid has leaked.

  In the leak detection unit 40 according to the first embodiment described above, the light projection unit 51 and the light reception unit 52 in the sensor 53 detect the movable member 44 when the treatment liquid does not leak, and the leak occurs. The movable member 44 is disposed at a height position at which the movable member 44 is not detected. On the other hand, in the leak detection unit 40 according to the second embodiment, the light projection unit 51 and the light reception unit 52 in the sensor 53 are moved on the side where the movable member 44 moves when the treatment liquid leaks. The point arrange | positioned in the height position differs from 1st Embodiment mentioned above.

  In this second embodiment, a multi-optical axis type sensor 53 (three axes are illustrated in FIG. 4 for convenience of explanation) is used. The movement of the movable member 44 changes the number of optical axes blocked by the movable member 44, thereby detecting the leakage of the processing liquid. That is, when no leakage occurs, one optical axis is blocked by the movable member 44 as shown in FIG. 4 (a). On the other hand, when leakage occurs, all the optical axes are blocked by the movable member 44, as shown in FIG. 4 (b). Thus, by detecting the change in the number of optical axes blocked by the movable member 44, it is possible to detect the movement of the movable member 44 with high accuracy even when the movement distance of the movable member 44 is small. . When using such a multi-axis type sensor 53, a configuration may be adopted in which all the optical axes are not blocked by the movable member 44 when no leak occurs.

  The other configuration, leak detection operation, and the like in the leak detection unit 40 according to the second embodiment are the same as in the first embodiment described above.

  Next, still another embodiment of the present invention will be described. FIG. 5 is a schematic view showing the leak detection unit 40 according to the third embodiment together with the on-off valve 23. Here, about the member similar to 1st Embodiment and 2nd Embodiment which were mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted. In FIG. 5, the flow control valve 24 and the flow meter 25 shown in FIG. 1 are omitted. 5 (a) shows a state in which the treatment liquid has not leaked, and FIG. 5 (b) shows a state in which the treatment liquid has leaked.

  In the leak detection unit 40 according to the first embodiment and the second embodiment described above, the movable member 44 is made of a material having a specific gravity larger than that of the treatment liquid flowing in the hollow member 41, and the treatment liquid leaks. Thus, the sensor 53 detects that the movable member 44 floats up. On the other hand, in the leak detection unit 40 according to the third embodiment, the movable member 44 is made of a material whose specific gravity is smaller than that of the processing liquid flowing in the hollow member 41, and the processing liquid leaks. A configuration is employed in which the sensor 53 detects that the movable member 44 sinks.

  The leak detection unit 40 according to the third embodiment includes the hollow member 41 in which the flow path of the treatment liquid is formed, and the flow of the treatment liquid from the treatment liquid pipe 26 to the treatment liquid pipe 27 in the hollow member 41. And a sensor 53 including a light emitter 51 and a light receiver 52 for detecting the position of the movable member 44.

  The hollow member 41 has an opening 45 serving as an inlet for the treatment liquid disposed at the upper end thereof, a moving area 42, an open area 43, and an opening serving as an outlet for the treatment liquid disposed at the lower end thereof. And 46. In the movement region 42, the opening degree of the hollow member 41 obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid increases as going from the upstream side to the downstream side of the flow path of the treatment liquid Region. Further, the open area 43 is an area of the hollow member 41 in which the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid is larger than the movement area 42.

  The movable member 44 has a spherical shape and is made of a material having a smaller specific gravity than the processing liquid flowing in the hollow member 41. The sensor 53 including the light emitting unit 51 and the light receiving unit 52 is configured to detect whether the movable member 44 is at the upper end of the moving area 42.

  In the leak detection unit 40 of the substrate processing apparatus according to the third embodiment, when the on-off valve 23 is closed and the processing liquid is blocked at the on-off valve 23, the specific gravity of the movable member 44 is smaller than the processing liquid Thus, as shown in FIG. 5A, the movable member 44 is disposed at the upper end portion of the moving area 42 of the hollow member 41. At this time, as indicated by an arrow in FIG. 5A, the light emitted from the light projecting unit 51 in the sensor 53 is blocked by the movable member 44 and does not reach the light receiving unit 52. In the control unit 50, in the state where the open / close valve 23 is closed and the sensor 53 detects the movable member 44 (that is, the light from the light projecting unit 51 has not reached the light receiving unit 52) It is determined that the treatment liquid has not leaked.

  On the other hand, when leakage occurs while the on-off valve 23 is closed, the processing liquid flows into the hollow member 41 from the opening 45 of the hollow member 41. Then, as shown in FIG. 5B, the movable member 44 sinks downward from the lower end portion of the moving region 42 of the hollow member 41 shown in FIG. 5A due to the flow of the processing liquid. That is, in the moving area 42, the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid increases from the upstream side to the downstream side of the flow path of the treatment liquid. Thus, even when the processing liquid with a small flow rate flows into the hollow member 41, the movable member 44 sinks downward.

  When the movable member 44 is sunk, as shown by an arrow in FIG. 5B, the light emitted from the light projecting portion 51 in the sensor 53 is not blocked by the movable member 44, and the light receiving portion 52 as it is. To reach. In the control unit 50, in the state where the open / close valve 23 is closed and the sensor 53 does not detect the movable member 44 (that is, the light from the light projection unit 51 reaches the light reception unit 52) It is determined that the treatment liquid has leaked. Then, the control unit 50 transmits a signal for performing a warning display to the warning display unit 59.

  When the on-off valve 23 is opened to supply the processing liquid from the processing liquid nozzle 15 to the substrate 100, a large amount of processing liquid flows into the hollow member 41. At this time, as indicated by a phantom line in FIG. 5B, the movable member 44 has an opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid From the movement area 42 which becomes larger as going to the downstream side, the opening sinks to an open area 43 where the opening degree is larger than the movement area 42. In the open area 43, similarly to the leak detection unit 40 according to the first embodiment, the open area obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid is designed to be sufficiently large. Therefore, the movable member 44 does not disturb the supply of the processing liquid.

  Next, still another embodiment of the present invention will be described. FIG. 6 is a schematic view showing the leak detection unit 40 according to the fourth embodiment together with the on-off valve 23. Here, about the member similar to 1st Embodiment and 2nd Embodiment which were mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted. In FIG. 6, illustration of the flow control valve 24 and the flow meter 25 shown in FIG. 1 is omitted. 6 (a) shows a state in which the treatment liquid has not leaked, and FIG. 6 (b) shows a state in which the treatment liquid has leaked.

  The leak detection unit 40 according to the fourth embodiment includes the hollow member 61 in which the flow path of the treatment liquid is formed, and the movable member capable of reciprocating in the hollow member 61 along the flow direction of the treatment liquid. And a sensor 53 including a light emitting unit 51 and a light receiving unit 52 for detecting the position of the movable member 64.

  The hollow member 61 has an opening 65 as an inlet for the treatment liquid disposed at the lower end thereof, a moving area 62, a withdrawal area 63, and an opening as an outlet for the treatment liquid disposed on the side thereof. And 66. The movement area 62 is an area in the hollow member 61 where the opening degree obtained by subtracting the cross-sectional area of the movable member 64 from the cross-sectional area of the flow path of the treatment liquid becomes constant. In addition, the retraction area 63 is an area in the hollow member 61 where the movable member 64 retracts from the flow path of the treatment liquid.

  Although not shown in FIG. 6, the evacuation region 63 is connected with a treatment liquid supply pipeline for filling the hollow member 41 with the treatment liquid at the start of the treatment.

  The movable member 64 has a spherical shape whose diameter is slightly smaller than the inner diameter of the moving region 62, and is made of a material having a specific gravity greater than that of the processing liquid flowing in the hollow member 61. The sensor 53 including the light emitting unit 51 and the light receiving unit 52 is configured to detect whether the movable member 64 is at the lower end of the moving area 62.

  In the leak detection unit 40 of the substrate processing apparatus according to the fourth embodiment having the above-described configuration, when the on-off valve 23 is closed and the processing liquid is blocked at the on-off valve 23, As shown in FIG. 6A, the movable member 64 is disposed at the lower end portion of the movement area 62 of the hollow member 61 because the specific gravity is larger than that of the treatment liquid. At this time, as shown by the arrow in FIG. 6A, the light emitted from the light projecting unit 51 in the sensor 53 is blocked by the movable member 64 and does not reach the light receiving unit 52. In the control unit 50 shown in FIG. 2, the open / close valve 23 is closed, and the sensor 53 detects the movable member 64 (that is, the light from the light projection unit 51 does not reach the light reception unit 52 ), It is determined that the treatment liquid has not leaked.

  On the other hand, when leakage occurs during closing of the on-off valve 23, the processing liquid flows into the hollow member 61 from the opening 65 of the hollow member 61. Then, the flow of the processing liquid causes the movable member 64 to float upward from the lower end portion of the moving area 62 in the hollow member 61 shown in FIG. That is, in the moving area 62, the opening degree obtained by subtracting the cross-sectional area of the movable member 64 from the cross-sectional area of the flow path of the processing liquid is extremely small. Also, the movable member 64 will float upward.

  When the movable member 64 floats up, the light emitted from the light projector 51 in the sensor 53 reaches the light receiver 52 without being blocked by the movable member 64. In the control unit 50, in the state where the open / close valve 23 is closed and the sensor 53 does not detect the movable member 64 (that is, the light from the light projection unit 51 reaches the light reception unit 52) It is determined that the treatment liquid has leaked. Then, the control unit 50 transmits a signal for performing a warning display to the warning display unit 59.

  When the on-off valve 23 is opened to supply the processing liquid from the processing liquid nozzle 15 to the substrate 100, a large amount of processing liquid flows into the hollow member 61. At this time, as shown in FIG. 6B, the movable member 64 ascends from the movement area 62 to the retraction area 63. As a result, the movable member 64 retracts from the flow path of the treatment liquid, and the movable member 64 does not disturb the supply of the treatment liquid.

  In the leak detection unit 40 of the substrate processing apparatus according to the fourth embodiment, the arrangement of the sensors 53 is changed as in the relationship between the first embodiment and the second embodiment described above, or the first embodiment. As in the relationship between the second embodiment and the third embodiment, a configuration may be adopted in which the upper and lower relationship is reversed.

  In all the embodiments described above, the case where the present invention is applied to a processing liquid as a fluid used in a substrate processing apparatus has been described, but the present invention may be applied to other liquids. In addition, the present invention may be applied to a gas such as an inert gas or dry air used to dry the substrate.

  Moreover, although the spherical thing is used as movable member 44,64 in the embodiment mentioned above, you may use a conical thing and a cylindrical thing.

  In each of the above-described embodiments, although the transmission type sensor is used as the sensor 53, a reflection type sensor may be used. Further, the sensor 53 is not limited to the optical type, and other types of sensors such as a sensor that identifies the position of the movable members 44 and 64 by electrostatic capacitance may be used.

  In the first to third embodiments described above, the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the treatment liquid as the movement region 42 is from the upstream side of the flow path of the treatment liquid Although the thing of the shape which becomes large as going downstream is employ | adopted, the shape where this opening degree is constant may employ | adopt a cylindrical movement area | region. In this case, the movable member 44 may be guided from the open area 43 to the movable area by attaching an auxiliary member to the movable member 44 as necessary.

  In the first to third embodiments described above, although the open area 43 has a constant cross-sectional area from the upstream side to the downstream side of the flow path of the treatment liquid, The cross-sectional area may increase as going from the upstream side to the downstream side of the flow path. In the open area 43, the amount of change in the opening degree may be significantly increased as compared to the movement area 42.

  In the fourth embodiment described above, although the movement area 62 has a constant opening degree, the opening degree of the movement area 62 goes from the upstream side to the downstream side of the flow path of the processing liquid. The shape which becomes large according to may be adopted.

12 spin chuck 15 treatment solution nozzle 20 treatment solution supply mechanism 23 opening and closing valve 26 treatment solution piping 27 treatment solution piping 40 leak detection unit 41 hollow member 42 movement region 43 opening region 44 movable member 45 opening 46 opening 50 control unit 51 Light emitting unit 52 Light receiving unit 53 Sensor 59 Warning display unit 61 Hollow member 62 Moving area 63 Relief area 64 Movable member 65 Opening 66 Opening 100 Substrate

Claims (2)

It has a valve disposed in the flow path of the processing liquid used in the substrate processing apparatus, and a leakage detection unit disposed downstream of the valve and detecting leakage of the processing liquid from the valve. Substrate processing apparatus, and
The leak detection unit includes a hollow member in which a flow path of the processing liquid is formed, a movable member capable of reciprocating in the hollow member along the flow direction of the processing liquid , and a position of the movable member. And a sensor for detecting
In the hollow member, the opening degree obtained by subtracting the cross-sectional area of the movable member from the cross-sectional area of the flow path of the treatment liquid is constant or increases as going from the upstream side to the downstream side of the flow path of the treatment liquid And an open area where the opening degree is larger than the movement area ,
The sensor detects that the movable member has moved in the movement area when leakage occurs during closing of the valve, and the movable member moves to the open area when the valve is opened. Substrate processing apparatus characterized in that. It has a valve disposed in the flow path of the processing liquid used in the substrate processing apparatus, and a leakage detection unit disposed downstream of the valve and detecting leakage of the processing liquid from the valve. Substrate processing apparatus, and
The leak detection unit includes a hollow member in which a flow path of the processing liquid is formed, a movable member capable of reciprocating in the hollow member along the flow direction of the processing liquid , and a position of the movable member. And a sensor for detecting
In the hollow member, the opening degree obtained by subtracting the cross-sectional area of the movable member from the cross-sectional area of the flow path of the treatment liquid is constant or increases as going from the upstream side to the downstream side of the flow path of the treatment liquid A moving region, and a retracting region in which the movable member retracts from the flow passage ,
The sensor detects that the movable member has moved in the movement area by the sensor when leakage occurs during closing of the valve, and the movable member retracts to the retraction area when the valve is opened. Substrate processing apparatus characterized in that.

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